CN110197801A - A kind of storage device and substrate equipment for after-treatment of processing substrate liquid - Google Patents

Abstract

The invention relates to the technical field of chemical mechanical polishing post-processing, and discloses a storage device for substrate processing liquid and substrate post-processing equipment. The substrate post-processing equipment includes a substrate cleaning module and a substrate drying module, and the substrate drying module includes a storage device. The storage device includes a storage main body, a first pipeline, a second pipeline and a third pipeline, and the storage main body has a first connection port, a second connection port and a third connection port which are respectively airtightly connected to the pipeline; The pipeline is used to feed gas into the storage main body to increase the pressure in the storage main body; the second pipeline is airtightly connected to the pressure detection part; the third pipeline is airtightly connected to the processing liquid supply pipe and discharge pipe, and the supply pipe and discharge pipe are airtightly connected. The tubes are respectively provided with independent switch assemblies, so that the treatment liquid can be added to the storage body or discharged from the storage body through the third pipeline.

Description

Storage device for substrate processing liquid and substrate post-processing equipment

technical field

The invention relates to the technical field of chemical mechanical polishing post-processing, in particular to a storage device for substrate processing liquid and substrate post-processing equipment.

Background technique

Chemical Mechanical Planarization (CMP) is an ultra-precision surface processing technology for global planarization in integrated circuit manufacturing. Since the chemical reagents and abrasives used in chemical mechanical polishing will cause contamination on the surface of the substrate, after polishing, a post-treatment process is required to remove the contaminants on the substrate surface. The post-treatment process generally consists of cleaning and drying to provide smoothness. Clean substrate surface.

The purpose of cleaning after polishing is to remove particles and various chemical substances on the surface of the substrate, and to avoid corrosion and damage to the surface and internal structure during the cleaning process. Cleaning after polishing can be divided into wet and dry methods. Environmental cleaning, such as detergent immersion, mechanical scrubbing, wet chemical cleaning, etc.

After the substrate is cleaned, a lot of water or cleaning solution residues will remain on the surface of the substrate. Since there are impurities dissolved in the residues of these waters or cleaning solutions, if these residual liquids are allowed to evaporate and dry by themselves, these impurities will rebond to the surface of the substrate, causing contamination and even destroying the structure of the wafer. For this reason, it is necessary to dry the surface of the substrate to remove these residual liquids.

For example, patent CN104956467B discloses a substrate cleaning equipment for chemical mechanical planarization, in which the cleaning part includes several cleaning modules and drying modules arranged in parallel to allow the substrates to pass through sequentially, and the substrates are vertically placed in the chamber of the cleaning module for further processing. Scrub, after scrubbing, send it to the drying module for drying.

As the last process of post-processing, substrate drying plays a vital role in ensuring the surface quality and processing yield of the substrate. The drying technology commonly used in the industry is isopropanol (IPA, Iso-Propyl Alcohol) vapor drying, which uses the surface tension gradient generated by isopropanol vapor on water to induce a strong Marangoni effect, thereby promoting the adsorption of water on the substrate surface. Membrane peeled off.

When using IPA equipment, it is necessary to add isopropanol liquid from the supply source to the IPA liquid storage tank. Because isopropanol is highly volatile and easy to vaporize, its storage state is unstable, and the air pressure in the tank is unstable or even changes drastically. There are potential safety hazards, and safety accidents such as explosions may also occur. Therefore, how to safely and efficiently utilize and store isopropanol has become an urgent problem to be solved.

Contents of the invention

Embodiments of the present invention provide a substrate processing liquid storage device and substrate post-processing equipment, aiming to solve at least one of the technical problems existing in the prior art.

The first aspect of the embodiments of the present invention provides a substrate processing liquid storage device, including a storage main body, a first pipeline, a second pipeline and a third pipeline, and the storage main body has a first gas-tight connection with the pipelines respectively. A connection port, a second connection port and a third connection port; the first pipeline is used to feed gas into the storage body to increase the pressure in the storage body; the second pipeline is airtightly connected to the pressure detection part; the third tube The pipeline is airtightly connected to the processing liquid supply pipe and the discharge pipe, and the supply pipe and the discharge pipe are respectively provided with independent switch components, so that the processing liquid can be added to the storage body or discharged from the storage body through the third pipeline.

In one embodiment, the first pipeline is airtightly connected to the pressurization tube and the pressure release tube, the pressurization tube is used to introduce gas into the storage body, and the pressure release tube is used to discharge gas from the storage body.

In one embodiment, the pressurizing pipe is connected to the distribution pipe, and the distribution pipe and the discharge pipe are jointly connected to the vaporizer, so as to mix the gas and the treatment liquid and vaporize them for discharge.

In one embodiment, the third pipeline has an extension part located inside the storage body, and the distance between the bottom end of the extension part and the inner bottom surface of the storage body is less than a preset value.

In one embodiment, the third connection port is located at the lower part of the side wall of the storage body.

In one embodiment, the switch assembly provided on the supply pipe includes a one-way valve so that the treatment liquid can only flow into the storage body through the supply pipe.

In one embodiment, the storage device further includes a fourth pipeline, one end of the fourth pipeline is airtightly connected to the fourth connection port of the storage body, and the other end of the fourth pipeline is airtightly connected to the liquid level detection part.

In one embodiment, the storage body includes a cover, a storage part, and a stepped part for connecting the cover and the storage part, so as to store the treatment liquid in the storage part.

In one embodiment, the storage part is a cylindrical hollow cylinder with an open upper end, the step part is annular, the inner ring of the step part is airtightly connected with the lower end of the cover body, and the outer ring of the step part is airtightly connected with the upper end of the storage part .

In one embodiment, the treatment fluid is isopropanol fluid.

A second aspect of the embodiments of the present invention provides a substrate post-processing equipment, including a substrate cleaning module and a substrate drying module, where the substrate drying module includes the above-mentioned storage device.

The beneficial effects of the present invention include: realizing safe and efficient utilization and storage of isopropanol.

Description of drawings

The advantages of the present invention will become clearer and easier to understand through the detailed description in conjunction with the following drawings, but these drawings are only schematic and do not limit the protection scope of the present invention, wherein:

FIG. 1 is a schematic structural diagram of a storage device provided by an embodiment of the present invention;

FIG. 2 is a schematic structural diagram of a storage device provided by another embodiment of the present invention;

FIG. 3 is a schematic diagram of the appearance of a storage device provided by an embodiment of the present invention;

FIG. 4 is a schematic structural diagram of a storage device provided by another embodiment of the present invention;

FIG. 5 is a schematic diagram of the appearance of a storage device provided by another embodiment of the present invention;

Explanation of reference signs:

10. Storage main body; 101. Cover body; 102. Storage part; 103. Step part; 11. First connection port; 12. Second connection port; 13. Third connection port; 14. Fourth connection port;

20. The first pipeline; 21. The pressurized pipe; PV1, the first control valve; CV1, the first one-way valve; 22. The pressure relief pipe; PV4, the fourth control valve; 23. The shunt pipe; PV5, the fifth Control valve; MFC1, the first mass flow controller;

30. The second pipeline; 31. The pressure detection part;

40, the third pipeline; 41, the supply pipe; PV2, the second control valve; CV2, the second one-way valve; 42, the discharge pipe; PV3, the third control valve; MFC2, the second mass flow controller; 43, extension;

50. The fourth pipeline; 51. The liquid level detection part.

Detailed ways

The technical solutions of the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings. The examples described here are specific implementations of the present invention and are used to illustrate the concept of the present invention; these descriptions are all explanatory and exemplary, and should not be construed as limiting the implementation of the present invention and the protection scope of the present invention . In addition to the embodiments described here, those skilled in the art can also adopt other obvious technical solutions based on the claims of the application and the contents disclosed in the specification, and these technical solutions include adopting any modifications made to the embodiments described here. Obvious alternatives and modified technical solutions. It should be understood that, unless otherwise specified, for ease of understanding, the following descriptions of the specific embodiments of the present invention are all based on the natural state that the relevant equipment, devices, components, etc. are originally stationary and not given external control signals and driving forces describe.

The embodiment of the present invention provides a storage device for substrate treatment liquid, which is applied to the drying process in substrate post-treatment. The substrates to be dried include semiconductor wafers, glass substrates for photomasks, glass substrates for liquid crystal displays, and plasma displays. Glass substrates, substrates for optical discs, etc.

As shown in FIG. 1 , an embodiment of the present invention provides a storage device for substrate processing liquid, including a storage main body 10, a first pipeline 20, a second pipeline 30 and a third pipeline 40. The storage main body 10 has respectively The first connection port 11, the second connection port 12 and the third connection port 13 which are airtightly connected with the pipeline; the first pipeline 20 is used to pass gas into the storage body 10 to increase the pressure in the storage body 10; The second pipeline 30 is airtightly connected to the pressure detection part 31; the third pipeline 40 is airtightly connected to the processing liquid supply pipe 41 and the discharge pipe 42, and the supply pipe 41 and the discharge pipe 42 are respectively provided with an independent switch assembly, so that it can pass The third pipeline 40 adds processing liquid into the storage body 10 or discharges the processing liquid from the storage body 10 .

In this embodiment, the processing liquid stored in the storage body 10 is isopropanol liquid.

The gas that the first pipeline 20 passes into the storage body 10 is an inert gas, such as nitrogen. The bottom end of the first pipeline 20 is higher than the liquid interface in the storage body 10 . When the first pipeline 20 injects nitrogen gas into the storage body 10 through the first connection port 11 , the air pressure in the storage body 10 increases to discharge the isopropanol liquid to perform the substrate drying process.

The second pipeline 30 connects the pressure detection part 31 with the inside of the storage body 10, so that the pressure detection part 31 can measure the air pressure in the storage body 10 in real time, and send the air pressure data to the control system for display, so that it is convenient for the operator to monitor the storage device The internal state and operation of the system, and timely troubleshooting when the pressure is abnormal. The pressure detection unit 31 may be a pressure gauge.

The part of the third pipeline 40 located outside the storage main body 10 has two branches, that is, a supply pipe 41 and a discharge pipe 42 . The supply pipe 41 is used for adding isopropanol liquid into the storage body 10 through the third pipeline 40 . The inlet of the supply pipe 41 is connected to a processing liquid supply source. The discharge pipe 42 is used to discharge the isopropanol liquid from the storage body 10 through the third pipeline 40 . The supply pipe 41 and the discharge pipe 42 are respectively provided with independent switch assemblies to control their respective on-off times.

In the embodiment of the present invention, gas is introduced into the storage body 10 through the first pipeline 20 to increase the pressure in the storage body 10, the processing liquid is discharged from the storage body 10 through the discharge pipe 42, and the processing liquid is added to the storage body 10 through the supply pipe 41 At the same time, a pressure detection unit 31 is provided to monitor the internal pressure of the storage main body 10 in real time, which can prevent abnormal pressure and realize safe and efficient utilization and storage of the processing liquid.

As shown in Figure 1, in one embodiment, the storage device further includes a fourth pipeline 50, one end of the fourth pipeline 50 is airtightly connected to the fourth connection port 14 of the storage body 10, and the other end of the fourth pipeline 50 One end is airtightly connected to the liquid level detection unit 51 . The liquid level detection part 51 may include a photoelectric switch sensor disposed in the storage body 10 to determine the liquid level. When the liquid level detection part 51 detects that the liquid level in the storage body 10 is higher or lower than a preset position, an alarm signal is sent to the control system, so that the control system executes a corresponding processing program. The processing procedure may be to control the switch assembly of the discharge pipe 42 to open to discharge the liquid or notify the operator for processing.

It can be understood that the pressure detection part 31, the liquid level detection part 51 and the switch components of each pipeline are all connected to the control system.

In an embodiment of the present invention, as shown in FIG. 1 , the first connection port 11 , the second connection port 12 , the third connection port 13 and the fourth connection port 14 are all provided on the upper part of the storage body 10 . The third pipeline 40 has an extension portion 43 inside the storage body 10 , and the distance between the bottom end of the extension portion 43 and the inner bottom surface of the storage body 10 is smaller than a preset value. The preset value can be 0.1 cm to 10 cm, preferably 0.5 cm. In a normal state, the bottom end of the extension portion 43 is lower than the interface of the liquid in the storage body 10 .

As shown in FIG. 1 , the bottom surface of the storage body 10 has a certain angle with the horizontal plane, and the angle is less than 5 degrees. The bottom surface extends obliquely in such a way that the height decreases from the edge to the position corresponding to the extension part 43 to form a recess at the position corresponding to the extension part 43, so that the extension part 43 can extend into the recess, so that it can be more completely emptied The isopropyl alcohol liquid inside the main body 10 is stored. A support portion is also provided at the bottom of the storage body 10 so that the storage body 10 can be placed horizontally.

As a possible implementation, as shown in FIG. 1 , the first pipeline 20 includes a pressurized tube 21 , and the pressurized tube 21 is used for introducing gas, such as nitrogen, into the storage body 10 . The inlet of the pressurizing tube 21 is connected to a gas supply source.

The pressurizing tube 21 is provided with a first switch assembly to realize on-off control of the pressurizing tube 21 . The first switch assembly includes a first control valve PV1 and a first one-way valve CV1 connected in series. When the first control valve PV1 is opened, nitrogen gas enters the storage body 10 through the first one-way valve CV1 and the first one-way valve CV1 can prevent Nitrogen flow out in reverse. The inlet of the first check valve CV1 is close to the inlet side of the pressurizing pipe 21 , and the outlet thereof is close to the side of the storage body 10 .

As shown in Figure 1, the supply pipe 41 of the third pipeline 40 is provided with a second switch assembly, the second switch assembly includes a second control valve PV2 and a second one-way valve CV2 connected in series, when the second control valve PV2 is opened , the isopropanol liquid enters the storage body 10 through the second one-way valve CV2 and the second one-way valve CV2 can prevent the isopropanol liquid from flowing backward. The inlet of the second one-way valve CV2 is close to the inlet side of the supply pipe 41 , and its outlet is close to the side of the storage body 10 , so that the treatment liquid can only flow into the storage body 10 through the supply pipe 41 .

As shown in FIG. 1 , the discharge pipe 42 of the third pipeline 40 is provided with a third switch assembly, including a third control valve PV3. When the third control valve PV3 is opened, the isopropanol liquid is discharged from the storage body 10 .

In one embodiment, the third switch assembly of the discharge pipe 42 may further include a one-way valve, so that the processing liquid can only be discharged from the storage body 10 through the discharge pipe 42 .

As shown in FIG. 1 , the working process of the storage device provided by an embodiment of the present invention is as follows: open the first control valve PV1 and the third control valve PV3 , pass nitrogen gas into the storage body 10 , and discharge the isopropanol liquid. When the liquid level detection part 51 detects that the liquid level in the storage body 10 is too low, the first control valve PV1 and the third control valve PV3 are closed, and the second control valve PV2 is opened to make the isopropanol liquid into the storage body 10 . During this period, the pressure detection unit 31 continues to detect the internal air pressure.

As another possible implementation manner, as shown in FIG. 2 , the first pipeline 20 is airtightly connected to the pressurization pipe 21 and the pressure relief pipe 22 . The pressurizing tube 21 is used for passing gas into the storage body 10 to increase the pressure inside the body, thereby pressing out the isopropanol liquid through the discharge tube 42 . The pressure relief pipe 22 is used to discharge gas from the storage body 10 to reduce the pressure inside the body, so that the isopropanol liquid is added into the storage body 10 through the supply pipe 41 .

The pressure relief pipe 22 is provided with a fourth switch assembly, including a fourth control valve PV4. When the fourth control valve PV4 is opened, the gas in the storage body 10 is discharged through the pressure relief pipe 22 .

As shown in Figure 2, the pressurizing pipe 21 is also connected to the shunt pipe 23, and the shunt pipe 23 and the discharge pipe 42 are jointly connected to the vaporizer to mix and vaporize the gas and the treatment liquid, that is, to mix the nitrogen gas and the isopropanol liquid and Vaporize to obtain a mixed gas of isopropanol and nitrogen for output. The shunt pipe 23 is provided with a fifth control valve PV5 and a first mass flow controller MFC1. Nitrogen gas enters the shunt pipe 23 and then enters the vaporizer through the fifth control valve PV5 and the first mass flow controller MFC1, and the isopropanol liquid is passed into and discharged. The pipe 42 then enters the vaporizer through the third control valve PV3 and the second mass flow controller MFC2, and the vaporizer vaporizes the isopropanol liquid and mixes it with nitrogen to discharge the mixed gas of isopropanol and nitrogen.

A mass flow controller (MFC, Mass Flow Controller) has a steady flow function, which can control the flow of gas or liquid passing therethrough, so as to control the mixing ratio of nitrogen and isopropanol. The mass flow controller is connected with the control system, and the user can set the flow rate according to the needs. The mass flow controller can automatically keep the flow constant at the set value, even if the ambient pressure fluctuates or the ambient temperature changes, the flow rate will not be affected. deviate from the set value.

As shown in FIG. 2 , the bottom surface of the storage body 10 has a certain included angle with the horizontal surface, and the included angle is less than 5 degrees. The bottom surface extends obliquely in such a way that the height decreases from the edge to the position corresponding to the extension part 43 to form a recess at the position corresponding to the extension part 43, so that the extension part 43 can extend into the recess, so that it can be more completely emptied The isopropyl alcohol liquid inside the main body 10 is stored. A support portion is also provided at the bottom of the storage body 10 so that the storage body 10 can be placed horizontally.

As shown in Figure 2, the working process of the storage device provided by another embodiment of the present invention is: in the IPA output state, the first control valve PV1, the fifth control valve PV5 and the third control valve PV3 are all opened, and the second control valve Both PV2 and the fourth control valve PV4 are closed, and the nitrogen gas provided by the nitrogen gas supply source is passed into the storage body 10 through the pressurized pipe 21 to pressurize the isopropanol liquid to be discharged through the discharge pipe 42. The mass flow controller MFC1 makes a certain flow of nitrogen flow into the vaporizer, and the second mass flow controller MFC2 provided with the discharge pipe 42 makes a certain flow of isopropanol liquid flow into the vaporizer, thereby making a fixed ratio of nitrogen and isopropanol flow into the vaporizer. After mixing, discharge the mixed gas of isopropanol and nitrogen.

In the IPA input state, the first control valve PV1, the fifth control valve PV5 and the third control valve PV3 are all closed, the second control valve PV2 and the fourth control valve PV4 are all open, and the isopropanol liquid provided by the isopropanol supply source The gas enters the storage body 10 through the supply pipe 41, and at the same time, the gas in the storage body 10 is discharged through the pressure relief pipe 22 to ensure the stability of the air pressure.

As shown in FIG. 3 , as an embodiment, the storage body 10 includes a cover 101 , a storage part 102 and a step part 103 for connecting the cover 101 and the storage part 102 to store the treatment liquid in the storage part 102 .

As shown in FIG. 3 , the cover body 101 is columnar, preferably columnar. The storage part 102 is a cylindrical hollow cylinder with an open upper end, preferably cylindrical. The stepped portion 103 is annular, preferably circular, and the stepped portion 103 includes an inclined surface with a certain angle with the plane.

The diameter of the cover body 101 is smaller than that of the storage part 102 , the inner ring of the step part 103 is airtightly connected with the lower end of the cover body 101 , and the outer ring of the step part 103 is airtightly connected with the upper end of the storage part 102 .

As an alternative, the diameter of the cover body 101 is larger than that of the storage portion 102 , the outer ring of the step portion 103 is airtightly connected to the lower end of the cover body 101 , and the inner ring of the step portion 103 is airtightly connected to the upper end of the storage portion 102 .

In one embodiment, the storage body 10 further includes a support portion 104 located at the bottom of the storage portion 102, the support portion is an annular column, the upper end of the support portion is connected to the bottom end of the side wall of the storage portion 102, and the diameter of the support portion is larger than that of the storage portion. The diameter of the portion 102 makes the storage body 10 more stable when placed and avoids tipping over.

In Fig. 3, the first connecting port 11, the second connecting port 12, the third connecting port 13 and the first connecting port 11, the second connecting port 12, the third connecting port 13 and The fourth connection ports 14 (not shown) are all provided on the upper part of the storage body 10 , preferably at the step part 103 . Wherein, the third pipeline 40 has an extension portion 43 located inside the storage body 10 , and the bottom end of the extension portion 43 is lower than the liquid level in the storage body 10 .

As shown in Figure 4, as another embodiment of the present invention, the third connection port 13 is located at the bottom of the side wall of the storage body 10, near the bottom surface of the storage body 10, and the distance between the third connection port 13 and the bottom surface of the storage body 10 can be It is 1cm to 10cm, preferably 2cm.

Therefore, the third pipeline 40 protrudes from the lower part of the side wall of the storage body 10 , and its bottom end is lower than the liquid level in the storage body 10 without extending into the storage body 10 .

The composition structure and connection relationship of each pipeline are the same as the embodiment shown in Fig. 1 and Fig. 2, and will not be repeated here.

Correspondingly, as shown in FIG. 5, the first connecting port 11, the second connecting port 12 and the fourth connecting port 14 (not shown) are respectively used to connect the first pipeline 20, the second pipeline 30 and the fourth pipeline 50. shown) are arranged on the upper part of the storage main body 10; the third connection port 13 (not shown) for connecting the third pipeline 40 is arranged on the lower part of the side wall of the storage main body 10.

For ease of understanding, a specific application scenario is taken as an example to describe the operation steps of the storage device.

1. If it is in the IPA output state, the isopropanol vapor will be discharged normally.

2. When it is in the non-IPA output state, judge whether the remaining isopropanol liquid weight in the storage body is lower than 60%, which can be judged according to the liquid level.

3. If it is not lower than 60%, wait for the next output of IPA;

4. If it is lower than 60%, turn off PV3.

5. Turn on PV4 and delay for 2s to release the pressure of the storage body;

6. Turn on PV2 and start filling isopropanol liquid.

7. If the output IPA signal is received during the automatic filling process, the filling will be interrupted, PV2 and PV4 will be closed, and the process 1-6 will be executed instead;

8. If the full signal is triggered, turn off PV2 and PV4, and go to process 1–7.

The above is only an optional implementation manner, and it is obvious to those skilled in the art that under different actual requirements, the operations may be performed in different order.

An embodiment of the present invention also provides a substrate post-processing equipment, including a substrate cleaning module and a substrate drying module, where the substrate drying module includes the storage device as described above.

The accompanying drawings in this specification are schematic diagrams, which assist in explaining the concept of the present invention, and schematically represent the shapes of various parts and their interrelationships. It should be understood that, in order to clearly show the structures of the components in the embodiments of the present invention, the drawings are not drawn in the same scale, and the same reference signs are used to represent the same parts in the drawings.

In the description of this specification, references to the terms "one embodiment," "some embodiments," "exemplary embodiments," "example," "specific examples," or "some examples" are intended to mean that the implementation A specific feature, structure, material, or characteristic described by an embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

Although the embodiments of the present invention have been shown and described, those skilled in the art can understand that various changes, modifications, substitutions and modifications can be made to these embodiments without departing from the principle and spirit of the present invention. The scope of the invention is defined by the claims and their equivalents.

Claims (11)

1. A storage device for substrate processing liquid, comprising a storage main body, a first pipeline, a second pipeline and a third pipeline, the storage main body has a first connection port that is airtightly connected to the pipelines, The second connection port and the third connection port; the first pipeline is used to pass gas into the storage body to increase the pressure in the storage body; the second pipeline is airtightly connected to the pressure detection part The third pipeline is airtightly connected to the treatment liquid supply pipe and the discharge pipe, and the supply pipe and the discharge pipe are respectively provided with independent switch assemblies, so that the treatment liquid can be added to the storage body through the third pipeline. liquid or discharge the processing liquid from the storage body. 2. The storage device according to claim 1, wherein the first pipeline is airtightly connected to a pressurization tube and a pressure release tube, and the pressurization tube is used to pass gas into the storage body, The pressure relief pipe is used to discharge gas from the storage body. 3. The storage device according to claim 2, wherein the pressurizing pipe is connected to a shunt pipe, and the shunt pipe and the discharge pipe are jointly connected to a vaporizer to mix the gas and the treatment liquid and vaporized out. 4. The storage device according to any one of claims 1 to 3, wherein the third pipeline has an extension located inside the storage body, and the bottom end of the extension is a distance from the storage body The distance of the inner bottom surface is smaller than the preset value. 5. The storage device according to any one of claims 1 to 3, wherein the third connection port is located at the lower part of the side wall of the storage body. 6 . The storage device according to claim 1 , wherein the switch assembly provided on the supply pipe includes a one-way valve so that the processing liquid can only flow into the storage main body through the supply pipe. 7. The storage device according to claim 1, further comprising a fourth pipeline, one end of the fourth pipeline is airtightly connected to the fourth connection port of the storage body, and the fourth pipeline The other end of the circuit is airtightly connected to the liquid level detection unit. 8. The storage device according to claim 1, wherein the storage main body comprises a cover, a storage part, and a stepped part for connecting the cover and the storage part, so as to store the treatment liquid in the storage part. in the storage section. 9. The storage device according to claim 1, wherein the storage part is a cylindrical hollow cylinder with an open upper end, the step part is ring-shaped, and the inner ring of the step part is in contact with the cover body. The lower end is airtightly connected, and the outer ring of the stepped portion is airtightly connected to the upper end of the storage portion. 10. The storage device according to claim 1, wherein the processing liquid is isopropanol liquid. 11. A substrate post-processing equipment, comprising a substrate cleaning module and a substrate drying module, the substrate drying module comprising the storage device according to any one of claims 1 to 10.