CN119812913A - A 193nm band ultraviolet laser generating device - Google Patents
A 193nm band ultraviolet laser generating device Download PDFInfo
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Abstract
本发明的一种产生193nm波段紫外激光的装置及方法，包括依次连接的近红外激光驱动单元1、非线性频率变换系统2和紫外激光产生系统3。近红外激光驱动单元为一台高功率皮秒激光器产生波长为1064nm的近红外激光。其通过分束镜后变为两部分，其中一部分倍频后作为第一光参量振荡器(OPO1)的泵浦光，产生的波长为840nm激光经过四倍频后变为210nm；另一部分直接作为第二光参量振荡器(OPO2)的泵浦光，产生波长为2380nm的激光。在最后的紫外激光产生系统中，210nm和2380nm的两束激光经过和频过程最终实现193nm波段紫外激光的输出。本发明利用成熟的非线性晶体、非线性频率变换过程，为真空紫外193nm波段固体激光器发展提供了一种新的思路和技术路线。
The present invention discloses a device and method for generating ultraviolet laser in the 193nm band, comprising a near-infrared laser driving unit 1, a nonlinear frequency conversion system 2 and an ultraviolet laser generating system 3 connected in sequence. The near-infrared laser driving unit is a high-power picosecond laser that generates near-infrared laser with a wavelength of 1064nm. It is divided into two parts after passing through a beam splitter, one part of which is used as the pump light of the first optical parametric oscillator (OPO1) after frequency doubling, and the generated wavelength of 840nm laser is changed to 210nm after quadruple frequency doubling; the other part is directly used as the pump light of the second optical parametric oscillator (OPO2) to generate a laser with a wavelength of 2380nm. In the final ultraviolet laser generating system, the two laser beams of 210nm and 2380nm are subjected to a sum frequency process to finally realize the output of ultraviolet laser in the 193nm band. The present invention uses mature nonlinear crystals and nonlinear frequency conversion processes to provide a new idea and technical route for the development of vacuum ultraviolet 193nm band solid lasers.
Description
Technical Field
The invention belongs to the technical field of lasers, and particularly relates to a device for generating 193nm band ultraviolet laser.
Background
193Nm band ultraviolet laser is an important tool for research of high-resolution spectroscopy, surface science, photochemistry, fiber bragg grating preparation, integrated circuit etching, precise laser processing and the like. The development of 193nm band ultraviolet laser has important significance and wide application prospect. Currently, the main way to obtain 193nm band ultraviolet laser is by means of ArF excimer gas lasers, which use a combination of rare gas and reactive gas under high pressure conditions to generate ultraviolet laser light. However, the method has the defects of harmful gas hazard to personal safety, environmental pollution, high cost, limited repetition frequency, poor light beam quality, poor coherence and the like, and severely limits the development of related researches and applications. Compared with a gas laser, the solid 193nm wave band laser has the advantages of adjustable repetition frequency, good beam quality, good coherence, small volume, tunable wavelength and the like. With the continuous development of lasers, nonlinear crystals and related technologies, the advantages obtained by utilizing frequency multiplication, sum frequency and the like to generate 193nm band ultraviolet laser through nonlinear frequency conversion are more and more obvious compared with those obtained by utilizing a gas laser.
At present, a scheme based on nonlinear frequency conversion is widely applied to 193nm band ultraviolet laser generation, but has the problems of high requirements on a driving light source and related nonlinear crystals, low output power and low conversion efficiency. In addition, the ultraviolet continuous laser generating system combines the fiber laser and the diamond Raman technology, utilizes the diamond crystal to generate the diamond Raman laser, and further generates 193nm band ultraviolet laser by frequency conversion on the basis. However, the requirement on driving the light source is high, and the diamond crystal needs to be subjected to special cooling treatment, so that the complexity of the experiment is increased.
Therefore, how to stably and efficiently generate high-power 193nm band ultraviolet laser by using a driving light source and develop various technical routes for generating 193nm band ultraviolet laser are the problems to be solved by researchers in the field.
Disclosure of Invention
The invention provides a device and a method for generating 193nm wave band ultraviolet laser aiming at the problems in the prior art, and the technical scheme of the invention is as follows:
A device for generating 193nm band ultraviolet laser comprises a near infrared laser driving unit, a nonlinear frequency conversion system and an ultraviolet laser generating system which are sequentially connected, wherein the near infrared laser driving unit generates near infrared laser with the wavelength of lambda 1, in the nonlinear frequency conversion system, near infrared laser with the wavelength of lambda 1 generated by the near infrared driving unit is divided into two parts after passing through a beam dividing mirror, one part of the near infrared laser passes through a frequency multiplication process to generate laser with the wavelength of lambda 2, lambda 2＝λ1/2, then laser with the wavelength of lambda 2 is used as pumping light to pump a first optical parametric oscillator (OPO 1), laser with the wavelength of lambda 3 is generated, then the laser with the wavelength of lambda 4 is generated through a quadruple frequency process, lambda 4＝λ3/4 is directly pumped into a second optical parametric oscillator (OPO 2), laser with the wavelength of lambda 5 is generated, and then two laser beams with the wavelengths of lambda 4 and lambda 5 enter the ultraviolet laser generating system, and finally the 193nm ultraviolet laser with the wavelength of lambda 6 is generated in a sum frequency mode, and the ultraviolet laser with the wavelength of 1/lambda 6＝1/λ4+1/λ5 is generated.
The near infrared laser driving unit comprises an optical fiber seed source, a stretcher, a pre-amplifier, a main amplifier and a compressor;
the seed source is an optical fiber seed source, and seed laser with the central wavelength of 1064nm and the energy of nano-focal level is generated;
The stretcher is a CFBG stretcher which is responsible for stretching the pulse width of the seed laser to hundreds of picoseconds or even nanoseconds;
the pre-amplifier is a regenerative amplifier, and has the advantages of good beam quality and simple structure;
The main amplifier is a double-pass amplifier which is responsible for further improving the laser energy output by the pre-amplifier;
The compressor adopts a single grating compressor, can provide negative second-order dispersion for the pulse, is conjugated with the stretcher, adjusts the dispersion amount by adjusting the incident angle and the delay position, and compresses the amplified pulse to the picosecond level;
The nonlinear frequency conversion system comprises a beam splitter, a first focusing system, a first nonlinear crystal, a first collimating system, a first optical parametric oscillator module, a second collimating system, a second focusing system, a third nonlinear crystal, a third collimating system, a third focusing system, a second optical parametric oscillator module and a fourth collimating system.
The first nonlinear crystal is used as a frequency multiplication crystal, frequency multiplication light with the wavelength of lambda 2 is generated in a single-pass frequency multiplication mode, a double-pass frequency multiplication mode or a cascade single-pass frequency multiplication mode, lambda 2＝λ1/2 is generated, the first optical parametric oscillator module takes the frequency multiplication light with the wavelength of lambda 2 generated by frequency multiplication as pump light, the second nonlinear crystal is used as a frequency conversion device to generate signal light with the wavelength of lambda 3, the third nonlinear crystal is used as a quadruple frequency crystal, the signal light with the wavelength of lambda 3 generated by the first optical parametric oscillator module is used as fundamental frequency light, the quadruple frequency light with the wavelength of lambda 4 is generated in a quadruple frequency multiplication mode, and the second optical parametric oscillator module takes picosecond laser with the wavelength of lambda 1 output by the near infrared laser driving unit as pump light, and the fourth nonlinear crystal is used as a frequency conversion device to generate idle light with the wavelength of lambda 5.
The first nonlinear crystal refers to a monolithic nonlinear crystal used for realizing single-pass frequency multiplication or double-pass frequency multiplication, or a plurality of cascaded nonlinear crystals used for realizing cascade single-pass frequency multiplication, such as beta-barium metaborate crystal, lithium triborate crystal, bismuth triborate crystal, lithium cesium borate crystal, potassium titanyl phosphate crystal, potassium titanyl arsenate crystal, potassium dihydrogen phosphate crystal, potassium dideuterium phosphate crystal, ammonium dihydrogen phosphate crystal, ammonium dideuterium phosphate crystal, guanidine tetrafluoroborate crystal, yttrium calcium oxide crystal, periodically polarized lithium niobate crystal doped with magnesium oxide, periodically polarized potassium titanyl phosphate crystal or periodically polarized potassium titanyl arsenate crystal, the second nonlinear crystal refers to a nonlinear crystal used for realizing frequency conversion of wavelengths lambda 2 to lambda 3, such as lithium triborate crystal, barium borate crystal, bismuth borate crystal and the like, the third nonlinear crystal refers to a nonlinear crystal used for realizing four-time frequency multiplication, such as lambda 42 4 to lambda frequency conversion of lambda 42 4, such as the second nonlinear crystal used for realizing frequency conversion of lambda 5, such as the second nonlinear crystal used for realizing frequency conversion of lambda-linear oscillation module of lambda 5;
The ultraviolet laser generation system comprises a fourth focusing system, a fifth nonlinear crystal and a fifth collimation system;
the fifth nonlinear crystal is used as a sum frequency crystal, and two beams of light with wavelengths lambda 4 and lambda 5 are used as fundamental frequency light, and sum frequency light with wavelengths lambda 6 is generated in a sum frequency mode.
The fifth nonlinear crystal refers to a nonlinear crystal for realizing sum frequency, such as a lithium triborate crystal;
The first focusing system, the second focusing system, the third focusing system and the fourth focusing system adopt a single lens or a lens group.
The near infrared laser driving unit further comprises a first space isolator and a second space isolator, wherein the first space isolator is connected between the stretcher and the preamplifier, and the second space isolator is connected between the preamplifier and the main amplifier.
The invention has the advantages that:
1. according to the device and the method for generating 193nm band ultraviolet laser, provided by the invention, the picosecond laser generated by the ytterbium-doped picosecond solid laser is used as a driving light source, and the laser system is greatly simplified without the assistance of other lasers.
2. Compared with the existing ArF excimer gas laser, the invention has the advantages of no risk of endangering personal safety and environmental pollution, expandable repetition frequency, good beam quality, good coherence, small volume, adjustable pulse width, tunable wavelength and the like, and compared with the diamond Raman laser, the crystal utilized by frequency conversion is very mature, and has the characteristics of high efficiency, low cost, easy maintenance and stable operation.
3. The frequency conversion related by the invention is a nonlinear process, has good flexibility, can realize wavelength tunable output, and provides convenience for generating high-power 193nm wave band ultraviolet laser.
Drawings
FIG. 1 is a schematic diagram of an apparatus and method for generating 193nm band ultraviolet laser according to the present invention;
FIG. 2 is a schematic diagram of a near infrared driving unit included in the system of the present invention;
FIG. 3 is a schematic diagram of a nonlinear frequency conversion system included in the system of the present invention;
FIG. 4 is a schematic diagram of an ultraviolet laser generating system included in the system of the present invention;
FIG. 5 is a schematic diagram of an optical path of a first optical parametric oscillator module included in the system of the present invention;
FIG. 6 is a schematic diagram of an optical path of a second optical parametric oscillator module included in the system of the present invention;
In the drawing, a near infrared laser driving unit 1, a seed source 11, a stretcher 12, a spatial isolator 13, a preamplifier 14, a spatial isolator 15, a main amplifier 16, a compressor 17, a nonlinear frequency conversion system 2, a beam splitter 21, a first focusing system 22, a first nonlinear crystal 23, a first collimating system 24, a first optical parametric oscillator module 25, a second collimating system 26, a second focusing system 27, a third nonlinear crystal 28, a third collimating system 29, a third focusing system 210, a second optical parametric oscillator module 211, a fourth collimating system 212, an ultraviolet laser generating system 3, a fourth focusing system 31, a fifth nonlinear crystal 32, a fifth collimating system 33, a first dichroic mirror 251a, a second dichroic mirror 251b, a second nonlinear crystal 252, a first end mirror 253, a first coupling-out mirror 254, a third dichroic mirror 2111a, a fourth dichroic mirror 2111b, a fourth nonlinear crystal 2112, a second end mirror 2113, and a second coupling-out 2114.
Detailed Description
The present invention will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present invention more apparent. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
The invention relates to a device and a method for generating 193nm band ultraviolet laser, which are shown in figure 1 and comprise a near infrared laser driving unit 1, a nonlinear frequency conversion system 2 and an ultraviolet laser generating system 3. The near infrared laser driving unit 1 is used for generating near infrared laser with the wavelength of 1064nm as a system driving light source, the nonlinear frequency conversion system 2 obtains laser with a required wave band through nonlinear processes such as frequency multiplication, optical parametric oscillation, frequency quadrupling and the like, and ultraviolet laser with the wave band of 193nm is generated in the final ultraviolet laser generating system 3 through a frequency summation process.
As shown in fig. 2, the near infrared laser driving unit 1 includes a seed source 11, a stretcher 12, a first spatial isolator 13, a preamplifier 14, a second spatial isolator 15, a main amplifier 16, and a compressor 17.
The Seed source 11 is a sunlight fiber Seed source HR-Seed-ps which can generate Seed laser with a central wavelength of 1064.3nm and energy of nano-focal level.
The stretcher 12 is a CFBG stretcher PWS-HPSR of Teraxion, which is responsible for stretching the seed laser pulse width to hundreds of picoseconds or even nanoseconds.
The pre-amplifier 14 is a regenerative amplifier, which has the advantages of good beam quality and simple structure.
The main amplifier 16 is a dual-pass amplifier which is responsible for further boosting the laser energy output by the pre-amplifier.
The first space isolator 13 and the second space isolator 15 are used for preventing the front-stage optical element and the device from being damaged by the return light.
The compressor 17 is a single grating compressor, which can provide negative second-order dispersion for the pulse, conjugate with the stretcher, adjust the dispersion amount by adjusting the incident angle and the delay position, and compress the amplified pulse to picosecond order.
As shown in fig. 3, 5 and 6, the nonlinear frequency conversion system 2 includes a beam splitter 21, a first focusing system 22, a first nonlinear crystal 23, a first collimating system 24, a first optical parametric oscillator module 25, a second collimating system 26, a second focusing system 27, a third nonlinear crystal 28, a third collimating system 29, a third focusing system 210, a second optical parametric oscillator module 211, a fourth collimating system 212, a first dichroic mirror 251a, a second dichroic mirror 251b, a second nonlinear crystal 252, a first end mirror 253, a first coupling-out mirror 254, a third dichroic mirror 2111a, a fourth dichroic mirror 2111b, a fourth nonlinear crystal 2112, a second end mirror 2113, and a second coupling-out mirror 2114.
The first nonlinear crystal 23 is used as a frequency multiplication crystal, generates frequency multiplication light with the wavelength of lambda 2 in a single-pass frequency multiplication, double-pass frequency multiplication or cascade single-pass frequency multiplication mode, lambda 2＝λ1/2, the first optical parametric oscillator module 25 generates frequency multiplication light with the wavelength of lambda 2 as pumping light, the pumping light enters the first optical parametric oscillator module through the first dichroic mirror 251a, the second nonlinear crystal 252 is used as a frequency conversion device, signal light with the wavelength of lambda 3 is generated, the second nonlinear crystal oscillates in a resonant cavity formed by the first dichroic mirror 251a, the second dichroic mirror 251b, the first end mirror 253 and the first coupling output mirror 254, and finally is output through the first coupling output mirror 254, the third nonlinear crystal 28 is used as a quadruple frequency crystal, the signal light with the wavelength of lambda 3 generated by the first optical parametric oscillator module generates quadruple frequency light with the wavelength of lambda 4 through the quadruple frequency multiplication mode, the second optical parametric oscillator module 211 generates signal light with the wavelength of lambda 1 output by a laser driving unit, the second light with the wavelength of lambda 1 is used as a near-infrared light with the second resonator 2111, the second resonator 2114 is formed by the second dichroic mirror 2114, the second resonator 2114 is output through the second dichroic mirror 2114, the second resonator 2114 is formed by the second end mirror 2114, and finally is output through the third nonlinear crystal 2114;
The first nonlinear crystal refers to a single nonlinear crystal for realizing single-pass frequency multiplication or double-pass frequency multiplication, or a plurality of cascaded nonlinear crystals for realizing cascaded single-pass frequency multiplication, and is selected from beta-barium metaborate crystal, lithium triborate crystal, bismuth triborate crystal, lithium cesium borate crystal, potassium titanyl phosphate crystal, potassium titanyl arsenate crystal, potassium dihydrogen phosphate crystal, potassium dideuterium phosphate crystal, ammonium dihydrogen phosphate crystal, ammonium dideuterium phosphate crystal, guanidine tetrafluoroborate crystal, yttrium calcium borate oxide crystal, periodically polarized lithium niobate crystal, magnesium oxide doped periodically polarized lithium niobate crystal, periodically polarized potassium titanyl phosphate crystal or periodically polarized potassium titanyl arsenate crystal.
The second nonlinear crystal is used for the first optical parametric oscillator module, and is used for realizing frequency conversion from the wavelength lambda 2 to lambda 3, and lithium triborate crystal, barium borate crystal and bismuth borate crystal are selected.
The third nonlinear crystal is a nonlinear crystal for realizing frequency multiplication, realizes frequency conversion from the wavelength lambda 3 to the wavelength lambda 4, and selects beta-barium metaborate crystal.
The fourth nonlinear crystal is a nonlinear crystal for the second optical parametric oscillator module to realize the frequency conversion of the wavelength lambda 1 to lambda 5, and a periodically polarized magnesium oxide doped lithium niobate crystal is selected.
The first and second dichroic mirrors are lenses having high transmittance for the wavelength band laser light with the wavelength of lambda 2 and high reflectance for the wavelength band laser light with the wavelength of lambda 3, and the third and fourth dichroic mirrors are lenses having high transmittance for the wavelength band laser light with the wavelength of lambda 1 and high reflectance for the wavelength band laser light with the wavelength of lambda 5.
The first end mirror is a lens with high reflectivity for all laser with the wavelength of lambda 2、λ3, and the second end mirror is a lens with high reflectivity for all laser with the wavelength of lambda 1、λ5.
The first coupling-out mirror is a lens with high reflectivity for the laser with the wavelength of lambda 2 and certain transmissivity for the laser with the wavelength of lambda 3, and the second coupling-out mirror is a lens with high reflectivity for the laser with the wavelength of lambda 1 and certain transmissivity for the laser with the wavelength of lambda 5.
As shown in fig. 4, the ultraviolet laser generating system 3 includes a fourth focusing system 31, a fifth nonlinear crystal 32, and a fifth collimating system 33, which are sequentially connected.
The five nonlinear crystals 32 are used as sum frequency crystals, and two beams of light with wavelengths lambda 4 and lambda 5 are used as fundamental frequency light, and sum frequency light with wavelengths lambda 6 is generated in a sum frequency mode.
The fifth nonlinear crystal is a nonlinear crystal for realizing that two beams of light with wavelengths lambda 4 and lambda 5 generate sum frequency light with a wavelength lambda 6, and lithium borate crystal is selected.
The first focusing system 22, the second focusing system 27, the third focusing system 210, and the fourth focusing system 31, the first collimating system 24, the second collimating system 26, the third collimating system 29, the fourth collimating system 212, and the fifth collimating system 33 may each employ a single lens or a group of lenses.
Examples
The high-power near-infrared laser with the wavelength of 1064nm generated by the near-infrared laser driving unit 1 enters the nonlinear frequency conversion system 2, is converted into two parts by the beam splitter 21, one part of the high-power near-infrared laser enters the beta-barium metaborate crystal after passing through the first focusing system 22, generates frequency doubling light with the wavelength of 532nm by frequency conversion, then enters the first optical parametric oscillator module, generates signal light with the wavelength of 840nm by frequency conversion of the lithium tetraborate crystal, then enters the beta-barium metaborate crystal after passing through the second focusing system 27, generates quadruple frequency light with the wavelength of 210nm by frequency conversion, and the other part of the high-power near-infrared laser enters the second optical parametric oscillator module, and generates idler frequency light with the wavelength of 2380nm by frequency conversion of the periodically polarized magnesium oxide doped lithium niobate crystal. The quadruple frequency light with the wavelength of 210nm and the idler frequency light with the wavelength of 2380nm enter the ultraviolet laser generating system 3, enter lithium triborate crystals after passing through the fourth focusing system 31, and generate ultraviolet laser with the wavelength of 193nm through frequency conversion.
It will be readily appreciated by those skilled in the art that the foregoing description is merely a preferred embodiment of the invention and is not intended to limit the invention, but any modifications, equivalents, improvements or alternatives falling within the spirit and principles of the invention are intended to be included within the scope of the invention.
Claims (10)
1. The 193nm band ultraviolet laser generating device is characterized by comprising a near infrared laser driving unit, a nonlinear frequency conversion system and an ultraviolet laser generating system which are sequentially connected, wherein the near infrared laser driving unit generates near infrared laser with the wavelength of lambda 1, lambda 1 is 1064nm, the nonlinear frequency conversion system divides the near infrared laser into two paths through a beam splitter, one path of the near infrared laser passes through a frequency multiplication process to generate visible laser with the wavelength of lambda 2 for pumping a first optical parametric oscillator (OPO 1), generates laser with the wavelength of lambda 3, then passes through a frequency quadrupling process to generate laser with the wavelength of lambda 4, the other path of the near infrared laser directly pumps a second optical parametric oscillator (OPO 2) to generate laser with the wavelength of lambda 5, and the ultraviolet laser generating system generates two beams of laser with the wavelengths of lambda 4 and lambda 5 in a sum frequency mode to generate ultraviolet laser with the wavelength of lambda 6 in a 193nm band.
2. The 193nm band ultraviolet laser generating device according to claim 1, wherein the near infrared laser driving unit comprises an optical fiber seed source, a stretcher, a preamplifier, a main amplifier and a compressor, wherein seed light with a central wavelength of 1064nm generated by the optical fiber seed source is stretched by the stretcher, sequentially enters the preamplifier and the main amplifier for amplification, and finally is compressed by the compressor to obtain high-power near infrared picosecond laser output.
3. The 193nm band ultraviolet laser generating apparatus as defined in claim 2, wherein said seed source is a commercial fiber seed source for generating seed light having a center wavelength of 1064nm and an energy of a nano-focal level, said stretcher is a chirped fiber grating (CFBG) stretcher, said preamplifier is a regenerative amplifier, said main amplifier is a bi-pass amplifier, and said compressor is a single grating compressor.
4. The 193nm band ultraviolet laser generating apparatus as defined in claim 2, wherein a first spatial isolator is connected between the stretcher and the pre-amplifier, and a second spatial isolator is connected between the pre-amplifier and the main amplifier.
5. The 193nm band ultraviolet laser generating apparatus as defined in claim 1, wherein said nonlinear frequency conversion comprises a beam splitter and two light paths for splitting the near infrared laser generated by said near infrared laser driving unit by said beam splitter, one path sequentially passing through a first focusing system, a first nonlinear crystal, a first collimating system, a first optical parametric oscillator module, a second collimating system, a second focusing system, a third nonlinear crystal, a third collimating system, and the other path sequentially passing through a third focusing system, a second optical parametric oscillator module, and a fourth collimating system;
The first nonlinear crystal is used as a frequency multiplication crystal, frequency multiplication light with the wavelength lambda 2 is generated in a single-pass frequency multiplication, double-pass frequency multiplication or cascade single-pass frequency multiplication mode, lambda 2＝λ1/2 is generated, the first optical parametric oscillator module takes the frequency multiplication light with the wavelength lambda 2 as pump light, the second nonlinear crystal is used as a frequency conversion device to generate signal light with the wavelength lambda 3, the third nonlinear crystal is used as a quadruple frequency crystal, the signal light with the wavelength lambda 3 generated by the first optical parametric oscillator module is used as fundamental frequency light, the quadruple frequency light with the wavelength lambda 4 is generated in a quadruple frequency multiplication mode, and the second optical parametric oscillator module takes picosecond laser with the wavelength lambda 1 output by the near infrared laser driving unit as pump light, and the fourth nonlinear crystal is used as a frequency conversion device to generate idler frequency light with the wavelength lambda 5.
6. The 193nm band ultraviolet laser generator according to claim 5, wherein the beam splitter is a non-polarizing beam splitter, the first nonlinear crystal is a beta-barium metaborate crystal, a lithium triborate crystal, a bismuth triborate crystal, a lithium cesium borate crystal, a potassium titanyl phosphate crystal, a potassium titanyl arsenate crystal, a potassium dihydrogen phosphate crystal, a potassium dideuterium phosphate crystal, an ammonium dihydrogen phosphate crystal, a dideuterium phosphate crystal, a guanidine tetrafluoroborate crystal, a calcium yttrium oxide borate crystal, a periodically polarized lithium niobate crystal, a magnesium oxide doped periodically polarized lithium niobate crystal, a periodically polarized potassium titanyl phosphate crystal, or a periodically polarized potassium titanyl arsenate crystal, the second nonlinear crystal is a lithium triborate crystal, a barium borate crystal, or a bismuth borate crystal, the third nonlinear crystal is a beta-barium metaborate crystal, and the fourth nonlinear crystal is a periodically polarized lithium magnesium oxide niobate crystal.
7. The 193nm band ultraviolet laser generating apparatus as defined in claim 5, wherein the first focusing system, the second focusing system, the third focusing system, the first collimating system, the second collimating system, the third collimating system and the fourth collimating system are a single lens or a group of lenses.
8. The 193nm band ultraviolet laser generating apparatus as defined in claim 1, wherein said ultraviolet laser generating system comprises a fourth focusing system, a fifth nonlinear crystal, and a fifth collimating system, wherein after two laser beams generated by said nonlinear frequency conversion system are focused by said fourth focusing system, two laser beams are combined by said fifth nonlinear crystal, and then collimated by said fifth collimating system for output.
9. The 193nm band ultraviolet laser generating apparatus as defined in claim 8, wherein said fifth nonlinear crystal is a lithium triborate crystal as a sum frequency crystal.
10. The 193nm band ultraviolet laser generating apparatus as defined in claim 8, wherein said fourth focusing system and said fifth collimating system are a single lens or a group of lenses.
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