CN119800297A

CN119800297A - A method for preparing household knives with ultra-long sharpness retention using arc ion plating

Info

Publication number: CN119800297A
Application number: CN202510088846.3A
Authority: CN
Inventors: 李亮; 黄婵娟
Original assignee: Individual
Current assignee: Individual
Priority date: 2025-01-20
Filing date: 2025-01-20
Publication date: 2025-04-11

Abstract

The present application belongs to the technical field of arc ion plating, and in particular, relates to a method for preparing household knives with ultra-long sharpness retention by using arc ion plating; the method for preparing household knives with ultra-long sharpness retention provided by the present application, on the basis of an axial magnetic field perpendicular to the target surface and a radial magnetic field parallel to the target surface, introduces a plane arc spot runway tangential magnetic field perpendicular to the radial magnetic field on the surface of the cathode target, resulting in an accelerated movement speed of the arc spot, a finer droplet size, and a reduced change in the angle of the blade of the household knives caused by the coating, so that the blade of the household knives is not easy to become blunt; the film layer structure is more delicate, the bonding force is stronger, and the sharpness retention is doubled; and due to the change in the magnetic field mode in the present application, the arc starting point position of the target surface can be closer to the center of the target and more random, which makes the target surface etching more uniform and improves the utilization rate of the alloy target material; thereby solving the technical problem of poor sharpness retention of household knives after coating in the prior art.

Description

Method for preparing household cutter with ultra-long sharpness retention by using arc ion plating

Technical Field

The application belongs to the technical field of arc ion plating, and particularly relates to a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating.

Background

The cathode arc ion plating is a surface treatment technology, arc discharge is carried out on a cathode target material under a vacuum environment to form arc spots, so that metal materials serving as the target material are ionized to generate metal plasmas, the metal plasmas are deposited on the surface of a substrate under the condition that the substrate is loaded with negative bias to form a plating layer, the cathode arc ion plating can be used for preparing wear-resistant hard plating layers on the surfaces of stainless steel vessels such as pots and basins, and can also be used for preparing wear-resistant hard plating layers on the surfaces of various tools, for example, the cathode arc ion plating technology can be used for preparing the wear-resistant hard plating layers on the surfaces of household tools so as to improve the performance of the household tools.

However, in the process of improving the performance of the cutter by using the cathodic arc ion plating technology, for industrial cutters with large-angle cutting edges and high strength, such as drills and milling cutters or turning tools (the cutting edge angle is 50-90 degrees and the strength is more than 2000 Mpa), the service performance of the industrial cutter can be improved by the cathodic arc ion plating technology in a multiple way, but for household cutters, the service performance of the household cutters is improved by the cathodic arc ion plating technology in a limited way, because the household cutters are cutters with small-angle cutting edges (16-45 degrees) and low strength (the strength is 1000-2000 Mpa), in the process of etching, cleaning and coating by using the cathodic arc ion plating technology, the angle of the cutter cutting edge is enlarged due to the fact that ion energy is difficult to control by the conventional cathodic arc ion plating technology, and meanwhile, arc spots on cathode targets can generate a large number of metal droplets and deposit on the cutter coating film because of high temperature, so that the initial degree of the household cutters is greatly reduced; the evaluation criteria of the use performance of the household cutter are mainly evaluated by the initial sharpness (ICP) and sharpness retention (TCC), in which the standard cut test pieces are cut under a prescribed load at a standard cutting speed and a standard cutting distance, the sum of the thicknesses of the previous 3 times of cut test pieces is the initial sharpness (ICP) of the household cutter, the sum of the thicknesses of the 60 times of cut test pieces is the sharpness retention (TCC) of the household cutter, so that for the household cutter which becomes dull after the use of cathodic arc ion plating and whose initial sharpness is greatly reduced, the surface is provided with a hard coating with wear resistance, the thickness of each time of cut test piece is not reduced, however, the thickness of the single-cut test paper is smaller, so that the sharpness maintaining force (TCC) of the household cutters is also general, and the sharpness maintaining force (TCC) of the household cutters is usually increased by a few percent or tens of percent before and after cathodic arc ion plating, and the sharpness maintaining force (TCC) of the household cutters cannot be improved by times.

According to previous researches, the magnetic field on the cathode target, the movement of arc spots on the cathode target and the sizes of metal liquid drops and particles are related, in the cathode arc ion plating process, the movement of the arc spots on the surface of the cathode target can be thinned by controlling the movement of the arc spots on the surface of the cathode target, the size of the metal liquid drops can be reduced, the shape change of the cutting edge of a household cutter in the plating process can be reduced, the cutting edge of the household cutter is not easy to be dulled, the initial sharpness (ICP) is reduced slightly, the sharpness retention (TCC) is greatly improved, in the absence of a magnetic field, the arc spots on the cathode target move randomly, the arc spots move in a circular motion path and the movement speed are influenced by the vertical magnetic field and the planar magnetic field on the surface of the cathode target after being influenced by the vertical magnetic field and the planar magnetic field on the surface of the cathode target, when the plane magnetic field of the cathode target is changed strongly, the movement speed of the arc spots is higher, the metal liquid drops are released at the position of the arc spots is less, the surface of the cutter is not easy to be polluted by large particles, the shape change of the household cutter is smaller, the shape change of the household cutter is easier to be more, the surface of the arc is not easy to be dulled, the plane magnetic field is more easily changed, the plane magnetic field is more difficult to be the planar magnetic field is more influenced by the planar magnetic field on the surface of the cathode target, the cathode surface, the arc surface is more difficult to be more influenced by the planar magnetic field, and the planar magnetic field, the planar magnetic field is more has the planar magnetic field, and has the planar magnetic field and has better the magnetic field.

Disclosure of Invention

In view of the above, the application provides a method for preparing a household cutter with ultra-long sharpness retention by arc ion plating, which is used for solving the technical problem of poor sharpness retention of the household cutter after coating in the prior art.

The first aspect of the present application provides a method for manufacturing an ultra-long sharpness retention household tool using arc ion plating, the manufacturing method comprising the steps of:

step S1, placing a household cutter matrix in a vacuum chamber of a cathode arc ion plating machine for ion cleaning to obtain a cleaned household cutter matrix;

And S2, controlling a permanent magnetic field mode and an electromagnetic field mode of the cathode arc ion plating machine, applying a vertical target surface magnetic field, a radial magnetic field of a cathode target surface and a tangential magnetic field of a cathode target surface runway perpendicular to the radial magnetic field on a cathode target, and performing arc ion plating on the cleaned household cutter matrix to obtain the household cutter with ultra-long sharpness retention.

Preferably, in step S2, the electromagnetic field mode of the cathodic arc ion plating machine is a waveform parameter for controlling the scanning voltage of the electromagnetic coil in the cathodic arc ion plating machine.

Preferably, the waveform of the electromagnetic coil scanning voltage in the cathodic arc ion plating machine is at least one of triangular wave, square wave or trapezoidal wave and sine wave.

Preferably, the waveform parameters of the scanning voltage are that the frequency range is 1-50 Hz, the duty ratio range is 1-100%, and the corresponding coil voltage range is-50V.

Preferably, in step S2, the permanent magnetic field mode of the cathodic arc ion plating machine is designed to be an arrangement structure of permanent magnets in the cathodic arc ion plating machine.

Preferably, in a first permanent magnetic field mode constructed by the arrangement structure of the permanent magnets in the designed cathodic arc ion plating machine, the cathode bulls-eye is taken as an axis, and the variation range of the vertical target surface magnetic field is-56-96T when the cathode bulls-eye rotates for one circle at intervals of 36 degrees;

In the constructed second permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the variation range of the vertical target surface magnetic field is-88-56T when the cathode bulls-eye rotates for one circle at intervals of 36 degrees;

In the constructed third permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the variation range of the magnetic field of the vertical target surface is-79-71T when the cathode bulls-eye rotates for one circle at intervals of 36 degrees;

In the constructed fourth permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the variation range of the magnetic field of the vertical target surface is 31-116T when the cathode bulls-eye rotates for one circle at intervals of 60 degrees;

In the constructed fifth permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the change range of the planar magnetic field is 3-116T or-88-44T when the cathode bulls-eye rotates for one circle at intervals of 45 degrees;

in the constructed sixth permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the change range of the planar magnetic field is-12-62T or-8-44T when the cathode bulls-eye rotates for one circle at intervals of 45 degrees;

in the constructed seventh permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the change range of the planar magnetic field is-11-51T or 5-54T when the cathode bulls-eye rotates for one circle at intervals of 45 degrees;

In the eighth constructed permanent magnetic field mode, the cathode bulls-eye is taken as the axis, and the change range of the plane magnetic field is-9-82T or-77-57T when the cathode bulls-eye rotates for one circle at intervals of 45 degrees.

Preferably, in step S2, the arc ion plating process includes:

S21, performing arc ion plating by using a metal cathode target of the bonding layer to obtain an ion plating bonding layer;

And S22, performing arc ion plating by using the functional layer metal cathode target to obtain an ion plating functional layer.

Preferably, after the step S21, before the step S22, according to the plating requirement, the method further comprises the step of performing arc ion plating by using the cathode target to obtain an ion plating transition layer.

Preferably, the metal element in the bond layer metal cathode target is selected from nine (e.g., ti, zr, hf, V, nb, ta, cr, mo, W) of three sub-groups (groups IVB, VB, and VIB) of transition metal elements or nitrides thereof (e.g., tiN, crn..and the like) and alloys thereof (e.g., tiAl, alcr..and the like) with individual elements in the third, fourth main groups (e.g., al, si, b..and the like) and nitrides thereof (e.g., tiAlN, cran..and the like) and borides (e.g., tiB ₂..and the like).

Preferably, the bonding layer metal cathode target is selected from at least one of a Ti-Al cathode target, a Ti cathode target, a Cr-Al cathode target, and a Cr cathode target.

Preferably, the metal elements in the transition layer and functional layer metal cathode targets are selected from nitrides (e.g., tiN, crn..and the like) or carbonitrides (e.g., tiCN, crcn...and the like) and borides (e.g., tiB ₂,HfB₂..and the like) composed of nine (e.g., ti, zr, hf, V, nb, ta, cr, mo, W) of the three sub-groups (group IVB, group VB and group VIB) of elements and their third, ternary nitrides (e.g., tiAlN, crAlN, tiSiN...and the like) or carbonitrides (e.g., tiAlCN, crAlCN, tiSiCN...and the like) or quaternary nitrides (e.g., tiAlBN, tiAlSiN, crAlBN, crAlSiN...and the like) or carbonitrides (e.g., tiAlBCN, tiAlSiCN, crAlBCN, crAlSiCN...and the like) or polynitrides (e.g., tiCrAlB, tiCrAlSiN, tiAlSiWN, tiAlSiVN, crAlSiWN, crAlBWN...and the like) or carbonitrides (e.g., tiCrAlBCN, tiCrAlSiCN, tiAlSiWCN, tiAlSiVCN, crAlSiWCN, crAlBWCN...and the like) of individual elements (e.g., al, si, b..and the like) in the fourth main group.

Preferably, the transition layer and the functional layer metal cathode targets are at least one selected from Ti-Al-Si cathode targets, ti-B cathode targets, ti cathode targets, cr-Al-B cathode targets, ti-Al cathode targets, cr-Al cathode targets and Cr cathode targets.

Preferably, in step S1, the home tool base is a home tool base made of martensitic stainless steel.

Preferably, the martensitic stainless steel material is selected from martensitic chromium steel material or martensitic chromium nickel steel material.

Preferably, in the process of arc ion plating, the working current of the cathode target arc discharge ranges from 20 to 450A, the negative bias voltage ranges from not more than 200V, the working pressure ranges from 0.2 Pa to 10Pa, the working temperature ranges from 100 ℃ to 550 ℃, and the working pressure comprises nitrogen partial pressure, argon partial pressure, hydrogen partial pressure and the like.

Preferably, in the ion cleaning process, the range of the negative bias is not more than a specific value between 0 and 500v, the range of the arc target working current is a specific value between 50 and 400 amperes, the range of the working air pressure is a specific value between 0.2 and 10pa, the working temperature is a certain temperature not more than 550 ℃, the working air pressure comprises argon partial pressure and/or hydrogen partial pressure, and the hydrogen partial pressure is continuously changed or fixed at a certain value between not more than 50%.

Compared with the prior art, the method for preparing the household cutter with the ultra-long sharpness retention by using the arc ion plating provided by the application at least comprises the following beneficial effects:

1. In the method for preparing the ultra-long sharpness maintaining household cutter, the tangential magnetic field of the planar runway is introduced into the target surface, the tangential magnetic field of the planar runway is perpendicular to the radial magnetic field of the planar runway, and the tangential magnetic field of the planar runway and the radial magnetic field of the planar form the planar magnetic field of the target surface, so that the control of the arc spot on the target surface of the cathode is enhanced, the stability and the movement speed of the arc spot are accelerated, the temperature of the target surface is reduced, the metal liquid drops sprayed out from the arc spot are reduced and deposited on the film of the cutter, and the sharpness maintaining capability (TCC) of the household cutter after ion film plating is improved.

2. In the method for preparing the household cutter with ultra-long sharpness retention, the position where the vertical magnetic field component Bn of the target surface is equal to 0 is closer to the target, the arcing point of the arc spot is closer to the target, the arcing probability from the cathode target to one half of the edge of the cathode target is higher, the movement track radius of the arc spot can be wider, the arc spot cannot be limited to the edge of the target surface, the target surface is etched more uniformly, and the utilization rate of the cathode target is improved.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are needed in the description of the embodiments or the prior art will be briefly described, and it is obvious that the drawings in the description below are some embodiments of the present application, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.

FIG. 1 is a schematic diagram of a prior art cathodic arc ion coater when coating an arc target;

FIG. 2 is a graph showing the distribution of the intensity of the magnetic field of the vertical target surface, the radial magnetic field of the target surface and the tangential magnetic field of the runway of the target surface perpendicular to the radial magnetic field in the method for manufacturing the household cutter with ultra-long sharpness by using the arc ion plating;

Fig. 3 is a schematic diagram of a first permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness by arc ion plating, wherein a curve in the diagram is a distribution state diagram of magnetic field intensity of a vertical target surface when the cathode target center is used as an axis and rotates at intervals of 36 degrees for one circle;

Fig. 4 is a schematic diagram of a second permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness by arc ion plating, wherein a curve in the diagram is a distribution state diagram of magnetic field intensity of a vertical target surface when the cathode target center is used as an axis and rotates at intervals of 36 degrees for one circle;

fig. 5 is a schematic diagram of a third permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness by arc ion plating, wherein a curve in the diagram is a distribution state diagram of magnetic field intensity of a vertical target surface when the cathode target center is used as an axis and rotates at intervals of 36 degrees for one circle;

fig. 6 is a schematic diagram of a fourth permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness retention by arc ion plating, wherein a curve in the diagram is a distribution state diagram of magnetic field intensity of a vertical target surface when the cathode target center is used as an axis and rotates for one circle at intervals of 60 degrees;

Fig. 7 is a schematic diagram of a fifth permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness retention by arc ion plating, wherein a curve in the diagram is a state diagram of magnetic field intensity distribution of a parallel target surface when the cathode bulls-eye is taken as an axis and rotated at 45 degrees for one circle;

fig. 8 is a schematic diagram of a sixth permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness retention by arc ion plating, wherein a curve in the diagram is a state diagram of magnetic field intensity distribution of a parallel target surface when the cathode bulls-eye is used as an axis and rotates at 45 degrees for one circle;

Fig. 9 is a schematic diagram of a seventh permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness retention by arc ion plating, wherein a curve in the diagram is a state diagram of magnetic field intensity distribution of a parallel target surface when the cathode bulls-eye is used as an axis and rotates at 45 degrees for one circle;

Fig. 10 is a schematic diagram of an eighth permanent magnetic field mode constructed by a permanent magnet arrangement structure in a cathodic arc ion plating machine in the method for preparing a household cutter with ultra-long sharpness by arc ion plating, wherein a curve in the diagram is a state diagram of magnetic field intensity distribution of a parallel target surface when the cathode bulls-eye is used as an axis and rotates at 45 degrees for one circle;

FIG. 11 is a graph of target surface arc spots in the method of preparing an ultra-long sharpness retention household tool using arc ion plating provided by the present application;

FIG. 12 is the results of initial sharpness (ICP) and sharpness retention (TCC) tests for a household tool prior to coating in the method for producing a household tool with ultra-long sharpness retention using arc ion plating provided in example 1 of the present application;

FIG. 13 is the results of initial sharpness (ICP) and sharpness retention (TCC) tests for a coated home knife in a method for manufacturing a home knife with ultra-long sharpness retention using arc ion plating as provided in example 1 of the present application.

Detailed Description

The application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which is used for solving the technical problem of poor sharpness retention of the household cutter after film plating in the prior art.

The following description of the embodiments of the present application will be made apparent and complete in conjunction with the accompanying drawings, in which it is evident that the embodiments described are some, but not all embodiments of the present application. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.

Example 1

The embodiment 1 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

The household cutter pretreatment step comprises the steps of preparing a household cutter with a machined and cut edge, and applying ultrasonic waves to clean the household cutter.

And (3) carrying out ion etching cleaning on the household cutter, namely hanging the ultrasonically cleaned household cutter on a rotating frame, putting the rotating frame into a vacuum chamber of an ion plating machine, vacuumizing to 5 multiplied by 10 ^-3 Pa, heating to a certain temperature of not more than 550 ℃, selecting a correct negative bias parameter, regulating the negative bias to a certain specific value of not more than 500V, switching on an arc source special for an etching device to control a certain specific value of 50-400 amperes of working current, regulating the flow of argon and hydrogen in a gas mixer, controlling the working pressure of the vacuum chamber to a certain specific value of 0.2-10 Pa, continuously changing or fixing the partial pressure of the hydrogen to a certain value, and carrying out ion etching on the household cutter for a certain specific time length of 30-120 minutes to obtain the cleaned household cutter matrix.

The steps of the household cutter arc ion plating comprise:

Turning off a power supply of an ion etching system, selecting a Ti-Al cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 0.1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Ti-Al cathode target, a radial magnetic field Bt on a Ti-Al cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Ti-Al cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V as shown in figure 2, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 60 minutes on a household cutter to obtain a plating bonding layer on the surface of the household cutter;

Then selecting a Ti-Si cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 0.5 and 5 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn, a radial magnetic field Bt on a Ti-Si cathode target plane and an arc track tangential magnetic field Br perpendicular to the radial magnetic field on the Ti-Si cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V as shown in a figure 2, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating on a household cutter for a certain specific time length between 30 and 120 minutes to obtain an ion plating transition layer on the surface of the household cutter;

Next, selecting a Ti-B cathode target, introducing argon, controlling the working pressure to be a certain specific value between 0.5 and 5 Pa, applying a vertical magnetic field Bn on the Ti-B cathode target, a radial magnetic field Bt on a Ti-B cathode target plane and an arc spot runway tangential magnetic field Br on the Ti-B cathode target plane, which is perpendicular to the radial magnetic field, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling the working current to be a certain specific value between 50 and 400 Pa, and performing arc ion plating on a household cutter for a certain specific time length between 30 and 120 minutes to obtain an ion plating functional layer plated on the surface of the household cutter;

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is realized by controlling the permanent magnet structure, namely, the arrangement structure of the permanent magnets in the cathode arc ion plating machine is designed, so that the distribution state of the magnetic field intensity of the permanent magnetic field mode constructed by the permanent magnet arrangement structure is obviously different from that of the target surface magnetic field constructed by the traditional double-ring permanent magnet as shown in any one of figures 3-10, the distribution state of the magnetic field intensity of the vertical target surface and the magnetic field intensity of the parallel target surface are obviously different from those of the magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the scanning voltage of an electromagnetic coil, the waveform of the scanning voltage is at least one of triangular wave, square wave, trapezoidal wave or sine wave, the frequency is 1-50 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-50V.

According to the embodiment, by controlling the energy of the coating ions and the size of the metal liquid drops, the increase of the angle of the cutting edge caused by ion bombardment sputtering in the ion cleaning and coating processes and the increase of the angle of the cutting edge caused by the film deposition rate of the cutting edge changed by the sharp angle effect generated by the negative bias at the cutting edge in the deposition process are reduced, so that the damage to the cutting edge of the household cutter caused by etching cleaning and coating by using a cathodic arc ion plating technology is avoided as much as possible, and the prepared household cutter with ultra-long sharpness maintaining power (ICP) is 113mm and sharpness maintaining power (TCC) is 2325.7mm.

Example 2

Embodiment 2 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

And (3) carrying out ion etching cleaning on the household cutter, namely hanging the ultrasonically cleaned household cutter on a rotating frame, putting the rotating frame into a vacuum chamber of an ion plating machine, vacuumizing to 5 multiplied by 10 ^-3 Pa, heating to a certain temperature of not more than 550 ℃, selecting a correct negative bias parameter, regulating the negative bias to a certain specific value of not more than 500V, switching on an arc source special for an etching device to control a certain specific value of 50-400A of working current, regulating the flow of argon and hydrogen in a gas mixer, controlling the working pressure of the vacuum chamber to a certain specific value of 0.2-10 Pa, continuously changing or fixing the partial pressure of hydrogen to a certain value, and carrying out ion etching on the household cutter for a certain specific time length of 30-120 minutes to obtain the cleaned household cutter matrix.

The steps of the household cutter arc ion plating comprise:

Turning off a power supply of an ion etching system, selecting a Cr-Al cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 0.1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Cr-Al cathode target, a radial magnetic field Bt on a Cr-Al cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Cr-Al cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 60 minutes on a household cutter to obtain a plating bonding layer on the surface of the household cutter;

And then selecting a Cr-Al-B cathode target, introducing argon, controlling the working pressure to be a specific value between 1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Cr-Al-B cathode target, a radial magnetic field Bt on a Cr-Al-B cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Cr-Al-B cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a specific value not more than 200V as shown in a drawing 2, switching on an ion plating arc source, controlling a specific value between 50 and 400A of working current, and performing arc ion plating on a household cutter for a specific time length between 30 and 120 minutes to obtain the household cutter with an ion plating functional layer on the surface of the household cutter.

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet arrangement structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, so that the distribution state of the magnetic field intensity of the permanent magnetic field mode constructed by the permanent magnet arrangement structure is obviously different from that of the target surface magnetic field constructed by the traditional double-ring permanent magnet as shown in any one of figures 3-10, and the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, wherein the waveform of the scanning voltage is at least one of triangular wave, square wave, trapezoidal wave or sine wave, the frequency is 5-40 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-40V.

According to the embodiment, by controlling the energy of the coating ions and the size of the metal liquid drops, the increase of the angle of the cutting edge caused by ion bombardment sputtering in the ion cleaning and coating processes and the increase of the angle of the cutting edge caused by the film deposition rate of the cutting edge changed by the sharp angle effect generated by the negative bias at the cutting edge in the deposition process are reduced, so that the damage to the cutting edge of the household cutter caused by etching cleaning and coating by using a cathodic arc ion plating technology is avoided as much as possible, and the initial sharpness (ICP) and sharpness retention (TCC) of the prepared household cutter with ultra-long sharpness retention are above 100mm and above 2000 mm.

Example 3

Embodiment 3 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

The steps of the household cutter arc ion plating comprise:

Then selecting a Ti-Si cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 0.5 and 5 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn, a radial magnetic field Bt on a Ti-Si cathode target plane and an arc track tangential magnetic field Br perpendicular to the radial magnetic field on the Ti-Si cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 120 minutes on a household cutter to obtain the household cutter with an ion plating functional layer on the surface of the household cutter, thereby obtaining the household cutter with ultra-long sharpness retention;

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet arrangement structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, so that the waveform curve of the intensity of the permanent magnetic field mode magnetic field constructed by the permanent magnet arrangement structure is shown in any one of figures 3-10, the distribution states of the intensity of the vertical target surface magnetic field and the intensity of the parallel target surface magnetic field are obviously different from those of the target surface magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, the scanning waveform is at least one of triangular wave, square wave trapezoidal wave or sine wave, the frequency is 1-40 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-40-50V.

According to the embodiment, by controlling the energy of the coating ions and the size of the metal liquid drops, the increase of the angle of the cutting edge caused by ion bombardment sputtering in the ion cleaning and coating processes and the increase of the angle of the cutting edge caused by the film deposition rate of the cutting edge changed by the sharp angle effect generated by the negative bias at the cutting edge in the deposition process are reduced, so that the damage to the cutting edge of the household cutter caused by etching cleaning and coating by using a cathodic arc ion plating technology is avoided as much as possible, and the initial sharpness (ICP) and sharpness retention (TCC) of the prepared household cutter with ultra-long sharpness retention are above 100mm and above 1500 mm.

Example 4

Embodiment 4 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

And (3) carrying out ion etching cleaning on the household cutter, namely hanging the ultrasonically cleaned household cutter on a rotating frame, putting the rotating frame into a vacuum chamber of an ion plating machine, vacuumizing to 5 multiplied by 10 ^-3 Pa, heating to a certain temperature of not more than 550 ℃, selecting a correct negative bias parameter, regulating the negative bias to a certain specific value of not more than 500V, switching on an arc source special for an etching device to control a certain specific value of 50-400A of working current, regulating the flow of argon and hydrogen in a gas mixer, controlling the working pressure of the vacuum chamber to a certain specific value of 0.5-10 Pa, continuously changing or fixing the partial pressure of hydrogen to a certain value of not more than 100%, and carrying out ion etching on the household cutter for a certain specific time length of 30-120 minutes to obtain the cleaned household cutter matrix.

The steps of the household cutter arc ion plating comprise:

And then selecting a Ti-Si cathode target, introducing nitrogen and acetylene, controlling the partial pressure of the acetylene gas to be a specific value within a range of not more than 50% or continuously changing, controlling the working pressure to be a specific value within a range of 1-10 Pa, applying a vertical magnetic field Bn on the Ti-Si cathode target, a radial magnetic field Bt on a Ti-Si cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Ti-Si cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a specific value within a range of not more than 200V, switching on an ion plating arc source, controlling the specific value within a range of 50-400A of working current, performing arc ion plating for a specific time length within a range of 30-120 Pa on the household cutter, and obtaining the household cutter with an ion plating functional layer Ti-Si-C-N on the surface of the household cutter.

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, so that the permanent magnetic field mode magnetic field intensity waveform curve constructed by the permanent magnet arrangement structure is shown in any one of figures 3-10, the distribution states of the vertical target surface magnetic field intensity and the parallel target surface magnetic field intensity are obviously different from those of the target surface magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, the waveform of the scanning voltage is selected from at least one of triangular wave, square wave, trapezoidal wave or sine wave, the frequency is 5-50 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-50-40V.

Example 5

Embodiment 5 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

And (3) carrying out ion etching cleaning on the household cutter, namely hanging the ultrasonically cleaned household cutter on a rotating frame, putting the rotating frame into a vacuum chamber of an ion plating machine, vacuumizing to 5 multiplied by 10 ^-3 Pa, heating to a certain temperature of not more than 550 ℃, selecting a correct negative bias parameter, adjusting the negative bias to a certain specific value of not more than 500V, switching on an arc source special for an etching device to control a certain specific value of 50-400 amperes of working current, adjusting the flow of argon and hydrogen in a gas mixer, controlling the working pressure of the vacuum chamber to a certain specific value of 0.2-10 Pa, and carrying out ion etching on the household cutter for a certain specific time length of 30-120 minutes to obtain the cleaned household cutter matrix.

The steps of the household cutter arc ion plating comprise:

Then selecting a Cr-Al-Si cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Cr-Al-Si cathode target, a radial magnetic field Bt on a Cr-Al-Si cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Cr-Al-Si cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V as shown in figure 2, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 120 minutes on a household cutter to obtain the household cutter with the ion plating functional layer Cr-Al-Si-N on the surface of the household cutter, thereby obtaining the super-length sharpness maintaining household cutter.

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, so that the permanent magnetic field mode magnetic field intensity waveform curve constructed by the permanent magnet arrangement structure is shown in any one of figures 3-10, the distribution states of the vertical target surface magnetic field intensity and the parallel target surface magnetic field intensity are obviously different from those of the target surface magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, the waveform of the scanning voltage is selected from at least one of triangular wave, square wave, trapezoidal wave or sine wave, the frequency is 2-50 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-45V.

Example 6

Embodiment 6 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

The steps of the household cutter arc ion plating comprise:

Turning off a power supply of an ion etching system, selecting a Ti cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 0.1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Ti cathode target, a radial magnetic field Bt on a Ti cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Ti cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 60 minutes on a household cutter to obtain a plating bonding layer on the surface of the household cutter;

Then selecting a Ti-Al cathode target, introducing nitrogen, controlling the working pressure to be a specific value between 1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Ti-Al cathode target, a radial magnetic field Bt on a Ti-Al cathode target plane and an arc track tangential magnetic field Br perpendicular to the radial magnetic field on the Ti-Al cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a specific value not more than 200V, switching on an ion plating arc source, controlling the specific value between 50 and 400A of working current, and performing arc ion plating for a specific time length between 30 and 120 minutes on a household cutter to obtain the household cutter with the ultra-long sharpness retention.

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, the distribution state of the vertical target surface magnetic field intensity and the parallel target surface magnetic field intensity is obviously different from the target surface magnetic field constructed by the traditional double-ring permanent magnet, so that the waveform curve of the permanent magnetic field mode magnetic field intensity constructed by the permanent magnet arrangement structure is shown as any drawing in figures 3-10, the distribution state of the vertical target surface magnetic field intensity and the parallel target surface magnetic field intensity is obviously different from the target surface magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, the waveform of the scanning voltage is selected from at least one of triangular wave, square wave, trapezoidal wave or sine wave, the frequency is 5-50 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-40-45V.

Example 7

Embodiment 7 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

And (3) carrying out ion etching cleaning on the household cutter, namely hanging the ultrasonically cleaned household cutter on a rotating frame, putting the rotating frame into a vacuum chamber of an ion plating machine, vacuumizing to 5 multiplied by 10 ^-3 Pa, heating to a certain temperature of not more than 550 ℃, selecting a correct negative bias parameter, regulating the negative bias to a certain specific value of not more than 500V, switching on an arc source special for an etching device to control a certain specific value of 50-400A of working current, regulating the flow of argon and hydrogen in a gas mixer, controlling the working pressure of the vacuum chamber to a certain specific value of 0.5-10 Pa, continuously changing or fixing the partial pressure of hydrogen to a certain value, and carrying out ion etching on the household cutter for a certain specific time length of 30-120 minutes to obtain the cleaned household cutter matrix.

The steps of the household cutter arc ion plating comprise:

Turning off a power supply of an ion etching system, selecting a Ti cathode target, introducing argon, controlling the working pressure to be a certain specific value between 0.1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Ti cathode target, a radial magnetic field Bt on a Ti cathode target plane and an arc runway tangential magnetic field Br perpendicular to the radial magnetic field on the Ti cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 60 minutes on a household cutter to obtain a plating bonding layer on the surface of the household cutter;

then selecting a Ti cathode target, introducing nitrogen, controlling the working pressure to be a certain specific value between 0.5 and 5 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn, a radial magnetic field Bt on a Ti cathode target plane and an arc track tangential magnetic field Br perpendicular to the radial magnetic field on the Ti cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 120 minutes on a household cutter to obtain an ion plating transition layer Ti-N plated on the surface of the household cutter;

And then selecting a Ti cathode target, introducing nitrogen and acetylene, wherein the partial pressure of the acetylene gas is in a certain specific value or continuously changes within a range of not more than 50%, controlling the working pressure to be in a certain specific value within 1-10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn, a radial magnetic field Bt on a Ti cathode target plane and an arc spot runway tangential magnetic field Br perpendicular to the radial magnetic field on the Ti cathode target plane on the Ti cathode target, selecting a correct negative bias parameter, regulating the negative bias to be in a certain specific value within a range of not more than 200V as shown in a figure 2, switching on an ion plating arc source, controlling the working current to be in a certain specific value within a range of 50-400 Pa, and performing arc ion plating for a certain specific time length within 30-120 minutes on a household cutter to obtain the household cutter with an ion plating functional layer Ti-C-N on the surface of the household cutter, thereby obtaining the household cutter with ultra-sharpness maintaining force.

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, so that the permanent magnetic field mode magnetic field intensity waveform curve constructed by the permanent magnet arrangement structure is shown in any one of figures 3-10, the distribution states of the vertical target surface magnetic field intensity and the parallel target surface magnetic field intensity are obviously different from those of the target surface magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, the waveform of the scanning voltage is selected from at least one of triangular wave, square wave, trapezoidal wave or sine wave, the frequency is 2-40 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-40-45V.

Example 8

Embodiment 8 of the application provides a method for preparing a household cutter with ultra-long sharpness retention by using arc ion plating, which comprises the steps of pretreatment of the household cutter, ion etching and cleaning of the household cutter and arc ion plating of the household cutter.

The steps of the household cutter arc ion plating comprise:

Turning off a power supply of an ion etching system, selecting a Cr cathode target, introducing argon, controlling the working pressure to be a certain specific value between 0.1 and 10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Cr cathode target, a radial magnetic field Bt on a Cr cathode target plane and an arc runway tangential magnetic field Br on the Cr cathode target plane, which is perpendicular to the radial magnetic field, selecting a correct negative bias parameter, adjusting the negative bias to be a certain specific value not more than 200V, switching on an ion plating arc source, controlling a certain specific value between 50 and 400A of working current, and performing arc ion plating for a certain specific time length between 30 and 60 minutes on a household cutter to obtain a plating bonding layer on the surface of the household cutter;

Then selecting a Cr cathode target, introducing nitrogen, controlling the working pressure to be a specific value between 0.5 and 5 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn on the Cr cathode target, a radial magnetic field Bt on a Cr cathode target plane and an arc track tangential magnetic field Br perpendicular to the radial magnetic field on the Cr cathode target plane, selecting a correct negative bias parameter, adjusting the negative bias to be a specific value not more than 200V, switching on an ion plating arc source, controlling a specific value between 50 and 400A of working current, and performing arc ion plating for a specific time length between 30 and 120 minutes on a household cutter to obtain an ion plating transition layer Cr-N plated on the surface of the household cutter, wherein the negative bias parameter is shown in the figure 2;

Then selecting a Cr cathode target, introducing nitrogen and acetylene, controlling the partial pressure of the acetylene gas to be a specific value within a range of not more than 50% or continuously changing, controlling the working pressure to be a specific value within a range of 1-10 Pa, selecting a permanent magnetic field mode and an electromagnetic field mode of a cathode arc ion plating machine, applying a vertical magnetic field Bn, a radial magnetic field Bt on a Cr cathode target plane and an arc spot runway tangential magnetic field Br perpendicular to the radial magnetic field on the Cr cathode target plane on the Cr cathode target, selecting a correct negative bias parameter, regulating the negative bias to be a specific value within a range of not more than 200V as shown in a figure 2, switching on an ion plating arc source, controlling the working current to be a specific value within a range of 50-400 Pa, and performing arc ion plating for a specific time length of 30-120 min on a household cutter to obtain the household cutter with an ion plating functional layer Cr-C-N on the surface of the household cutter, thereby obtaining the household cutter with ultra-sharpness retention.

In the embodiment, the permanent magnetic field mode of the cathode arc ion plating machine is selected by controlling the permanent magnet structure, namely, the permanent magnet arrangement structure in the cathode arc ion plating machine is designed, so that the waveform curve of the intensity of the permanent magnetic field mode magnetic field constructed by the permanent magnet arrangement structure is shown in any one of figures 3-10, the distribution states of the intensity of the vertical target surface magnetic field and the intensity of the parallel target surface magnetic field are obviously different from those of the target surface magnetic field constructed by the traditional double-ring permanent magnet, the electromagnetic field mode is realized by controlling the waveform of the electromagnetic coil scanning voltage, the waveform of the scanning voltage is at least one of triangular wave, square wave trapezoidal wave or sine wave, the frequency is 2-50 Hz, the duty ratio range is 50-100%, and the corresponding coil voltage range is-45-50V.

Experimental example 1

The performance test of the ultra-long sharpness maintaining household cutter and the ultrasonic-cleaned household cutter provided in the embodiment 1 is carried out according to the EN ISO 8442-5.2005 standard of European Union, and the test results are shown in fig. 12 and 13.

As is apparent from comparing the attached drawings 12 and 13, the initial sharpness (ICP) of the cutter which is not subjected to arc ion plating is 129.4mm, but the sharpness maintaining force (TCC) is only 934.5mm, while the initial sharpness (ICP) of the cutter is slightly reduced, but the sharpness maintaining force (TCC) of the household cutter is multiplied to 2325.7mm, the sharpness maintaining force is improved by 249%, and as shown in the attached drawings 11, the arc spots of the target surface are regular and approximately circular, the preparation method provided by the embodiment 1 of the application enhances the control of the arc spots on the target surface of the cathode by introducing a planar runway tangential magnetic field on the target surface of the cathode, so that the stability of the arc spots is improved, arc extinction is difficult, the movement speed of the arc spots is faster, the target surface temperature is lower, a large number of high-temperature points are difficult to appear on the target surface, metal drops sprayed out from the arc spots are reduced and deposited on a film plating film, the large particle pollution of the film layer of the household cutter by plasma is reduced, and thus the sharpness maintaining force (TCC) of the household cutter is improved, and the arc spots of the cutter is not attenuated by the conventional magnetic field of the arc machine, as shown in the attached drawings 1, and the arc surface of the arc surface has a sharp magnetic field is generally perpendicular to the arc surface of the arc surface.

Meanwhile, as shown in figures 3-10, particularly in figure 3, the position where the vertical magnetic field component Bn is equal to 0 is about 4-5cm, so that the arcing point of the arc spot is easier to approach the target center, the radius of the motion track of the arc spot can be wider, the arc spot cannot be limited to the edge of the target surface, the target surface is etched more uniformly, and the utilization rate of the cathode target is improved.

Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that the technical solutions described in the foregoing embodiments may be modified or some or all of the technical features may be equivalently replaced, and these modifications or replacements do not depart from the spirit of the technical solutions of the embodiments of the present application.

Claims

1. A method of making an ultra-long sharpness retention household tool using arc ion plating comprising the steps of:

2. The method for manufacturing a home knife with ultra-long sharpness retention using arc ion plating according to claim 1, wherein in step S2, the electromagnetic field mode of the controlled cathodic arc ion plating machine is a waveform of a scanning voltage of an electromagnetic coil in the controlled cathodic arc ion plating machine.

3. The method of claim 2, wherein the waveform of the electromagnetic coil scanning voltage in the cathodic arc ion plating machine is at least one of a triangular wave, a square wave, a trapezoidal wave, or a sinusoidal wave.

4. The method for manufacturing a household cutter with ultra-long sharpness retention by using arc ion plating according to claim 1, wherein in step S2, the permanent magnetic field mode of the cathodic arc ion plating machine is controlled to design the arrangement structure of the permanent magnets in the cathodic arc ion plating machine.

5. The method for preparing the household cutter with ultra-long sharpness retention by using arc ion plating according to claim 4, wherein in the first permanent magnetic field mode constructed by the arrangement structure of the permanent magnets in the cathodic arc ion plating machine, the cathode bulls-eye is taken as the axis, and the variation range of the magnetic field of the vertical target surface is-56-96T when the cathode bulls-eye rotates for one circle at intervals of 36 degrees;

6. The method for manufacturing a home knife with ultra-long sharpness retention using arc ion plating according to claim 1, wherein the process of performing arc ion plating in step S2 comprises arc ion plating using a bonding layer metal cathode target, a transition layer metal cathode target and/or a functional layer metal cathode target in this order.

7. The method for manufacturing a super long sharpness maintaining home tool using arc ion plating according to claim 6, wherein the bonding layer metal cathode target, the transition layer metal cathode target, and the functional layer metal cathode target are selected from any one of Ti-Al cathode target, ti cathode target, cr-Al cathode target, cr cathode target, ti-Al-Si cathode target, ti-B cathode target, cr-Al-B cathode target.

8. The method of manufacturing a home knife having ultra-long sharpness retention using arc ion plating according to claim 1, wherein in step S1, the home knife base is a martensitic stainless steel home knife base.

9. The method of manufacturing an ultra-long sharpness retention household tool using arc ion plating according to claim 8, wherein the martensitic stainless steel material is selected from martensitic chromium steel material or martensitic chromium nickel steel material.

10. The method for manufacturing a home knife with ultra-long sharpness retention using arc ion plating according to claim 8, wherein the operating current of the cathodic target arc discharge ranges from 20 to 500 a.