CN119012816B

CN119012816B - Display panel, preparation method thereof and display device

Info

Publication number: CN119012816B
Application number: CN202411027448.2A
Authority: CN
Inventors: 鲁松; 王宏宇; 孙大卫; 韩凯伟
Original assignee: Hefei Visionox Technology Co Ltd
Current assignee: Hefei Visionox Technology Co Ltd
Priority date: 2024-07-29
Filing date: 2024-07-29
Publication date: 2025-11-21
Anticipated expiration: 2044-07-29
Also published as: CN119012816A

Abstract

This application relates to a display panel and its manufacturing method, as well as a display device. The display panel includes a substrate, an isolation structure, and a light-emitting structure. The isolation structure forms a plurality of isolation openings. The isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located between the second isolation portion and the substrate. The second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion. The first sub-region and the second sub-region are disposed opposite each other in a first direction, and in the first direction, the orthographic projection length of the first sub-region on the substrate is smaller than the orthographic projection length of the second sub-region on the substrate. The light-emitting structure is located within the isolation openings and includes a light-emitting unit and a first electrode. Within the same isolation opening, the first electrode overlaps with the first isolation portion on the corresponding side of the first sub-region in the first direction. This application can improve the poor overlap of electrodes (such as cathodes) within the isolation openings.

Description

Display panel, preparation method thereof and display device

Technical Field

The application relates to the technical field of display, in particular to a display panel, a preparation method thereof and a display device.

Background

In the conventional display panel manufacturing process, patterning of light emitting sub-pixels is typically achieved through a fine mask (FMM). The FMM technology is mature and the mass production experience is rich. However, the FMM technology has the problems of limited precision, high development cost, long development period and the like.

The sub-pixel patterning is realized through the photoetching process, so that the method is not limited by the precision of the FMM, and the resolution can be effectively improved. However, this technique is prone to the problem of poor bridging of the electrodes (e.g., cathodes) within the isolated opening.

Disclosure of Invention

Accordingly, it is desirable to provide a display panel, a method for manufacturing the same, and a display device capable of improving the poor overlap of electrodes (e.g., cathodes) in the isolation openings.

A display panel, comprising:

A substrate;

The isolation structure is positioned on the substrate and is surrounded into a plurality of isolation openings, the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is positioned between the second isolation part and the substrate, the second isolation part is provided with a first subarea and a second subarea which extend from the top surface of the first isolation part to the periphery, the first subarea and the second subarea are oppositely arranged in a first direction, and in the first direction, the orthographic projection length of the first subarea on the substrate is smaller than the orthographic projection length of the second subarea on the substrate;

The light-emitting structure is positioned in the isolation opening and comprises a light-emitting unit and a first electrode, and the first electrode is positioned on one side, far away from the substrate, of the light-emitting unit;

Within the same isolation opening, the first electrode overlaps the first isolation portion on the corresponding side of the first sub-region in the first direction.

In one embodiment, the overlapping area of the orthographic projection of the light emitting unit on the substrate and the orthographic projection of the first sub-region on the substrate is smaller than the overlapping area of the orthographic projection of the light emitting unit on the substrate and the orthographic projection of the second sub-region on the substrate.

In one embodiment, in the first direction, the length of the orthographic projection of the first sub-region on the substrate is a first length, the length of the orthographic projection of the second sub-region on the substrate is a second length, and the second length is k times of the first length, 1<k is less than or equal to 5.

In one embodiment, in the same isolation opening, the first isolation part and the light emitting unit are arranged at intervals;

optionally, in the same isolation opening, the light emitting unit and the first isolation parts located at two sides of the light emitting unit in the first direction are all arranged at intervals;

Optionally, in the same isolation opening, in the first direction, the orthographic projection of the light emitting unit on the substrate is concentric with the orthographic projection of the opening surrounded by the first isolation portion on the substrate.

In one embodiment, the first isolation part comprises a support part, the orthographic projection of the second isolation part on the substrate covers the orthographic projection of the surface of the support part, which is far away from the substrate, on the substrate, and the first electrode is connected with the side wall of the support part;

Optionally, the first isolation part further includes an adhesive part between the support part and the substrate, and the first electrode extends to the support part side wall via the adhesive part.

In one embodiment, the substrate includes a pixel defining layer and a second electrode, the pixel defining layer covers the second electrode, and the pixel defining layer has a pixel opening therein exposing the second electrode, the pixel opening communicates with the isolation opening, and the isolation structure is located on the pixel defining layer.

A display panel, comprising:

A substrate;

In the same isolation opening, the first electrode is overlapped with the first isolation parts on two sides of the first electrode in the first direction, and the overlap area of the first isolation part on one side of the first electrode corresponding to the first sub-zone is larger than that of the first isolation part on one side of the first electrode corresponding to the second sub-zone.

In one embodiment, the climbing height of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the climbing height of the first electrode on the isolation structure on the side corresponding to the second sub-region.

In one embodiment, the climbing thickness of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the climbing thickness of the first electrode on the isolation structure on the side corresponding to the second sub-region.

A method of manufacturing a display panel, comprising:

Providing a substrate;

Forming an isolation structure on the substrate, wherein the isolation structure is surrounded into a plurality of isolation openings, the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is positioned between the second isolation part and the substrate, the second isolation part is provided with a first subarea and a second subarea which extend from the top surface of the first isolation part to the periphery, the first subarea and the second subarea are oppositely arranged in a first direction, and in the first direction, the orthographic projection length of the first subarea on the substrate is smaller than the orthographic projection length of the second subarea on the substrate;

Evaporating a luminescent material layer on the substrate with the isolation structure through a first evaporation source;

Evaporating a first electrode material layer on the luminescent material layer through a second evaporation source;

and carrying out patterning treatment on the first electrode material layer and the evaporation luminescent material layer to form a first electrode and a luminescent unit.

In one embodiment, in the process of evaporating the luminescent material layer, an evaporation angle of the first evaporation source facing the first sub-region is larger than an evaporation angle of the first evaporation source facing the second sub-region, and the evaporation angle is an included angle between an evaporation direction and a direction parallel to the substrate.

In one embodiment, before the evaporation of the luminescent material layer on the substrate with the isolation structure formed by the first evaporation source, the method includes:

And adjusting the evaporation angle of the first evaporation source.

In one embodiment, the adjusting the evaporation angle of the first evaporation source includes:

The position of the angle limiting plate and/or the first evaporation source is adjusted in a first direction such that the first evaporation source is offset from the opening center of the angle limiting plate and is close to the opening edge of the angle limiting plate towards the first sub-zone.

The first evaporation source is tilted to increase an evaporation angle at which the first evaporation source is tilted toward the first sub-region.

In one embodiment, before the evaporating the first electrode material layer on the luminescent material layer by the second evaporating source, the method includes:

And adjusting the evaporation angle of the second evaporation source.

In one embodiment, the adjusting the evaporation angle of the second evaporation source includes:

The second evaporation source is tilted to reduce the evaporation angle at which the second evaporation source is tilted towards the first sub-zone.

the position of the angle limiting plate and/or the second evaporation source is adjusted such that the second evaporation source is offset from the opening center of the angle limiting plate and away from the opening edge of the angle limiting plate towards the first sub-zone in a first direction.

In one embodiment, before the evaporating the first electrode material layer on the luminescent material layer by the second evaporating source, the method further includes:

and rotating the substrate on which the luminescent material layer is formed by 180 degrees by taking the perpendicular bisector of the substrate as a rotation axis.

The display panel and the preparation method thereof form an isolation structure with an asymmetric first sub-region and a second sub-region. The length of the first sub-zone in the first direction is smaller than the length of the second sub-zone in the first direction. Therefore, when the first electrode is evaporated, the shielding effect of the first subarea is smaller, so that the first electrode can extend more below the first subarea. Therefore, the first electrode in the isolation opening has a larger overlap area with the first isolation portion on the corresponding side of the first sub-region 211, so that the problem of poor overlap of the first electrode (such as the cathode) in the isolation opening can be effectively improved.

A method of manufacturing a display panel, comprising:

Providing a substrate;

forming an isolation structure on the substrate, wherein the isolation structure is surrounded into a plurality of isolation openings, the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is positioned between the second isolation part and the substrate, the second isolation part is provided with a first sub-zone and a second sub-zone which extend from the top surface of the first isolation part to the periphery, and the first sub-zone and the second sub-zone are oppositely arranged in a first direction;

Evaporating a luminescent material layer on the substrate with the isolation structure through a first evaporation source, wherein in the process of evaporating the luminescent material layer, the evaporation angle of the first evaporation source facing the first sub-zone is larger than the evaporation angle of the first evaporation source facing the second sub-zone, and the evaporation angle is an included angle between the evaporation direction and the direction parallel to the substrate;

A display panel, comprising:

A substrate;

The isolation structure is positioned on the substrate and is surrounded into a plurality of isolation openings, the isolation structure comprises a first isolation part and a second isolation part, the first isolation part is positioned between the second isolation part and the substrate, the second isolation part is provided with a first sub-area and a second sub-area which extend from the top surface of the first isolation part to the periphery, and the first sub-area and the second sub-area are oppositely arranged in a first direction;

in the same isolation opening, the first electrode is overlapped with at least the first isolation part on one side corresponding to the first sub-zone in the first direction, and the overlapping area of the orthographic projection of the light emitting unit on the substrate and the orthographic projection of the first sub-zone on the substrate is smaller than the overlapping area of the orthographic projection of the light emitting unit on the substrate and the orthographic projection of the second sub-zone on the substrate.

According to the display panel and the preparation method of the display panel, the light emitting units are asymmetrically distributed under the first subarea and the second subarea, so that the overlap joint of the light emitting units and the first isolation part on the side corresponding to the first subarea can be reduced, the overlap joint area of the first electrode and the first isolation part on the side corresponding to the first subarea can be increased, and the problem of poor overlap joint of the first electrode (such as a cathode) in the isolation opening can be effectively solved.

A display device comprises the display panel.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments or the conventional techniques of the present application, the drawings required for the descriptions of the embodiments or the conventional techniques will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments of the present application, and other drawings may be obtained according to the drawings without inventive effort for those skilled in the art.

FIG. 1 is a schematic diagram of a manufacturing process of a display panel according to an embodiment;

FIG. 2 is a schematic partial cross-sectional view of a spacer structure formed during fabrication of a display panel according to an embodiment;

FIG. 3 is a schematic view of an evaporation angle of a first evaporation source according to an embodiment;

FIG. 4 is a schematic partial cross-sectional view of a luminescent material layer formed during the manufacturing process of a display panel according to an embodiment;

FIG. 5 is a schematic view of an evaporation angle of a second evaporation source according to an embodiment;

FIG. 6a is a schematic partial cross-sectional view illustrating a first electrode material layer formed during the manufacturing process of the display panel according to one embodiment;

FIG. 6b is a schematic partial cross-sectional view illustrating a first electrode material layer formed during the fabrication of a display panel according to another embodiment;

FIG. 7a is a schematic partial cross-sectional view of a display panel formed by one embodiment;

FIG. 7b is a schematic partial cross-sectional view of a display panel formed by another embodiment;

FIG. 8 is a schematic view of the evaporation angle of a first evaporation source according to another embodiment;

FIG. 9 is a schematic partial cross-sectional view illustrating a luminescent material layer formed during the fabrication of a display panel according to another embodiment;

fig. 10 is a schematic partial cross-sectional view of a display panel in yet another embodiment.

Reference numerals illustrate:

100-substrate, 110-substrate, 120-second electrode, 130-pixel defining layer, 200-isolation structure, 200 a-isolation opening, 210-second isolation portion, 211-first sub-region, 212-second sub-region, 220-first isolation portion, 221-support portion, 222-bonding portion, 300-light emitting structure, 310-light emitting unit, 3101-light emitting material layer, 320-first electrode, 3201 first electrode material layer, 400-first evaporation source, 500-second evaporation source.

Detailed Description

In order that the application may be readily understood, a more complete description of the application will be rendered by reference to the appended drawings. Preferred embodiments of the present application are shown in the drawings. This application may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.

It will be understood that when an element is referred to as being "fixed to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like are used herein for illustrative purposes only.

In the drawings, the size of layers and regions may be exaggerated for clarity of illustration. It will be understood that when a layer or element is referred to as being "on" another layer or substrate, it can be directly on the other layer or substrate, or intervening layers may also be present. In addition, it will also be understood that when a layer is referred to as being "between" two layers, it can be the only layer between the two layers, or one or more intervening layers may also be present. In addition, like reference numerals refer to like elements throughout.

In the following embodiments, when a layer, region or element is "connected," it can be construed that the layer, region or element is not only directly connected but also connected through other constituent elements interposed therebetween. For example, when a layer, region, element, etc. is described as being connected or electrically connected, the layer, region, element, etc. can be connected or electrically connected not only directly or electrically connected but also through another layer, region, element, etc. interposed therebetween.

Hereinafter, although terms such as "first", "second", etc. may be used to describe various components, these components are not necessarily limited to the above terms. The above terms are used only to distinguish one component from another. It will also be understood that the use of the expression "a" or "an" includes the plural unless the singular is in a context clearly different.

When a representation such as at least one (individual) "in the" a.m. is located after a column of elements (elements), the entire column of elements (elements) is modified, rather than modifying individual elements (elements) in the column. The term "and/or" as used herein includes any and all combinations of one or more of the associated listed items. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items. It will be further understood that the terms "comprises" and/or "comprising," and/or the like, specify the presence of stated features, integers, steps, operations, elements, components, or groups thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, or groups thereof.

An electronic or electrical device and/or any other related device or component (e.g., a display device including a display panel and a display panel driver, wherein the display panel driver further includes a drive controller, a gate driver, a gamma reference voltage generator, a data driver, and an emission driver) in accordance with embodiments of the inventive concepts described herein may be implemented using any suitable hardware, firmware (e.g., application specific integrated circuits), software, or a combination of software, firmware, and hardware. For example, the various components of these devices may be formed on one Integrated Circuit (IC) chip or on separate IC chips. In addition, various components of these devices may be implemented on a flexible printed circuit film, tape Carrier Package (TCP), printed Circuit Board (PCB), or formed on one substrate. Additionally, the various components of these devices may be processes or threads running on one or more processors in one or more computing devices to execute computer program instructions and interact with other system components to perform the various functions described herein. The computer program instructions may be stored in a memory that may be implemented in a computing device using standard storage means, such as, for example, random Access Memory (RAM), but may also be stored in other non-transitory computer readable media, such as, for example, a CD-ROM, flash memory drive, etc., moreover, those skilled in the art will appreciate that the functionality of the various computing devices may be combined or integrated into a single computing device, or that the functionality of a particular computing device may be distributed over one or more other computing devices without departing from the spirit and scope of exemplary embodiments of the inventive concepts.

Although exemplary embodiments of a display panel and a display device including the display panel have been particularly described herein, many modifications and variations will be apparent to those skilled in the art. It will thus be appreciated that the present application may also protect display panels and display devices comprising display panels constructed in accordance with the principles of the present application, other than as specifically described herein. The application is also defined in the claims and their equivalents.

Related art solutions for isolation structures are described in patent applications PCT/CN2023/134518, 202310759370.2, 202310740412.8, 202310707209.0, 202311346196.5, the contents of which are incorporated herein by reference.

In one embodiment, referring to fig. 1, a method for manufacturing a display panel is provided, including the following steps:

In step S10, referring to fig. 2, a substrate 100 is provided.

The substrate 100 may include a substrate 110, a circuit layer (not shown) formed on the substrate 110, and the like. The substrate 110 may be a rigid substrate or a flexible substrate. The circuit layer may include a plurality of wiring layers, a dielectric layer isolating the wiring layers, and the like, and a pixel circuit and the like may be formed in the circuit layer.

In step S20, please continue to refer to fig. 2, an isolation structure 200 is formed on the substrate 100, the isolation structure 200 is surrounded by a plurality of isolation openings 200a, and the isolation structure 200 includes a first isolation portion 220 and a second isolation portion 210, the first isolation portion 220 is located between the second isolation portion 210 and the substrate 100, the second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending from a top surface of the first isolation portion 220 to an outer periphery, the first sub-region 211 and the second sub-region 212 are disposed opposite to each other in the first direction, and a front projection length of the first sub-region 211 on the substrate 100 is smaller than a front projection length of the second sub-region 212 on the substrate 100 in the first direction.

A layer of isolation material may be first formed on the substrate 100. The isolation material layer may then be patterned by wet etching to form the isolation structures 200.

In particular, the isolation material layer may include a first sub-isolation material layer and a second sub-isolation material layer. After patterning the first sub-isolation material layer and the second sub-isolation material layer, the isolation opening 200a may be formed, and the first isolation portion 220 and the second isolation portion 210 may be formed. It is understood that the isolation opening 200a is formed by the first isolation portion 220 and the second isolation portion 210.

As an example, the first sub-insulation material layer may include a support material layer, and the first insulation portion 220 includes a support portion 221. At this time, after patterning the spacer material layer, the support material layer may form the support portion 221.

As another example, the first sub-insulation material layer may include a support material layer and an adhesive material layer. The adhesive material layer is located between the support material layer and the substrate 100, thereby increasing the adhesion therebetween. At this time, after patterning the spacer material layer, the support material layer may form the support portion 221, and the adhesive material layer may form the adhesive portion 222. The first isolation portion 220 includes a supporting portion 221 and an adhesive portion 222, as shown in fig. 10.

Meanwhile, during wet etching, the etching rates of the second sub-isolation material layer and the first sub-isolation material layer may be different, so that the edge of the second isolation portion 210 may exceed the top surface of the first isolation portion 220, thereby forming an eave structure.

The eave structure of the first spacer 220 may include a first sub-region 211 and a second sub-region 212 disposed opposite in the first direction. In the first direction, the length of the orthographic projection of the first sub-region 211 on the substrate 100 may be MA1, and the length of the orthographic projection of the second sub-region 212 on the substrate 100 may be MA2.MA1 is smaller than MA2, so that the first sub-zone 211 and the second sub-zone 212 are arranged on both sides of the first partition 220 in an asymmetric manner.

As an example, MA2 may be set to k times MA1, 1<k≤5. The k value can be set according to the requirements.

In step S40, referring to fig. 3 and 4, a luminescent material layer 3101 is deposited on the substrate 100 with the isolation structure 200 formed thereon by a first evaporation source 400.

As an example, in the process of evaporating the light emitting material layer 3101, an evaporation angle of the first evaporation source 400 toward the first sub-region 211 may be larger than an evaporation angle of the first evaporation source 400 toward the second sub-region 212, which is an angle between an evaporation direction and a direction parallel to the substrate.

The display panel may include a plurality of different colored subpixels. The sub-pixels of a plurality of different colors are sub-pixels emitting a plurality of different colors of light. In the process of manufacturing the display panel, the manufacturing of the sub-pixels of one color may be completed after the manufacturing of the sub-pixels of the other color is completed. The different colored subpixels may be formed using the same manufacturing process.

The light emitting material layer 3101 deposited in this step may be the light emitting material layer 3101 of the current processing color. The first evaporation source 400 is an evaporation source of the light emitting material layer 3101.

In the process of evaporating the luminescent material layer 3101, the eave structure (including the first sub-region 211 and the second sub-region 212) of the second isolation portion 210 isolates the luminescent material layer 3101 in the isolation opening 200a from the luminescent material layer 3101 above the second isolation portion 210. Meanwhile, the first evaporation source 400 may have a certain evaporation angle such that the light emitting material layer 3101 may extend under the first sub-region 211 and the second sub-region 212.

Meanwhile, it can be understood that the evaporation angle of one evaporation source toward the first sub-region 211, i.e., the evaporation angle toward the first sub-region 211 within one isolation opening 200a when the evaporation source is opposite to the isolation opening 200a, is set. The evaporation angle of one evaporation source toward the second sub-region 212 is set to be the evaporation angle of the second sub-region 212 in the isolation opening 200a when the evaporation source is opposite to the isolation opening 200 a.

The evaporation angle a1 of the first evaporation source 400 towards the first sub-zone 211 is larger than the evaporation angle a2 of the first evaporation source 400 towards the second sub-zone 212. The area of the luminescent material layer 3101 falling under the first sub-region 211 is smaller than the area of the luminescent material layer 3101 falling under the second sub-region 212.

Therefore, although the length MA1 of the first sub-region 211 is smaller, the extension length of the light emitting material layer 3101 under the first sub-region 211 in the isolation opening 200a may not be too long, so that the light emitting material layer 3101 may be prevented from extending too much toward the first sub-region 211, and even overlapping the first isolation portion 220 on the corresponding side of the first sub-region 211, thereby affecting the available overlapping area of the first isolation portion 220.

In step S70, referring to fig. 5 and fig. 6a (or fig. 6 b), a first electrode material layer 3201 is evaporated on the light emitting material layer 3101 by the second evaporation source 500.

The second evaporation source 500 is an evaporation source of the first electrode material layer 3201.

In the process of evaporating the first electrode material layer 3201, the eave structure (including the first sub-region 211 and the second sub-region 212) of the second isolation portion 210 isolates the first electrode material layer 3201 in the isolation opening 200a from the first electrode material layer 3201 above the second isolation portion 210. Meanwhile, the second evaporation source 500 may have a certain evaporation angle such that the first electrode material layer 3201 may extend under the first sub-region 211 and the second sub-region 212.

As an example, the evaporation angle of the second evaporation source 500 toward the first sub-region 211 may be set smaller than the evaporation angle of the second evaporation source 500 toward the second sub-region 212, thereby more facilitating the one-sided lapping of the first electrode material layer 3201 with the first separator 220 on the side corresponding to the first sub-region 211. Of course, the first electrode material layer 3201 may overlap with the first separator 220 on both sides thereof in the first direction.

Meanwhile, the length MA1 of the first sub-region 211 is smaller, so that the shielding effect on the first electrode material layer 3201 is smaller, and therefore, the first electrode material layer 3201 can extend more below the first sub-region 211 and can be reliably overlapped with the first isolation part 220. At this time, the first electrode material layer 3201 may have a larger overlap area with the first separator 220 at a side corresponding to the first sub-region 21. Also, the overlapping thickness of the first electrode material layer 3201 on the side corresponding to the first sub-region 21 may be thicker. When the first electrode material layer overlaps the sidewall of the first isolation portion 220, the climbing height of the isolation structure of the first electrode material layer 3201 on the side corresponding to the first sub-region 21 may also be greater.

It will be appreciated that the smaller the evaporation angle, the longer it extends under the eave structure. The evaporation angle of the second evaporation source 500 towards the first sub-region 211 is smaller than the evaporation angle of the first evaporation source 400 towards the first sub-region 211, so that the first electrode material layer 3201 may have more extension below the first sub-region 211.

In step S80, referring to fig. 7a (or fig. 7 b), the first electrode material layer 3201 and the evaporated luminescent material layer 3101 are patterned to form the first electrode 320 and the light emitting unit 310.

A packaging material layer may also be formed on the first electrode material layer 3201 by a Chemical Vapor Deposition (CVD) process or the like before the patterning process is performed.

Thereafter, a patterned photoresist is formed on the encapsulation material layer. The patterned photoresist covers the isolation openings 200a corresponding to the current process color. As an example, the patterned photoresist may also extend from the isolation opening 200a to a portion above the second isolation portion 210.

Then, the encapsulation material layer exposed by the patterned photoresist may be removed by dry etching, thereby forming an encapsulation layer in the isolation opening 200a corresponding to the current processing color.

Thereafter, the patterned photoresist exposed first electrode material layer 3201 and the light emitting material layer 3101 may be wet etched, and the first electrode material layer 3201 and the light emitting material layer 3101 in the isolation opening 200a corresponding to the current processing color may be maintained.

The first electrode material layer 3201 remaining in the isolation openings 200a forms the first electrode 320, and the first electrode 320 is connected to the first isolation portion 220 on the corresponding side of the first sub-region 211 in the first direction. Specifically, for example, the first electrode 320 overlaps the sidewall of the supporting portion 221 on the side corresponding to the first sub-region 211 in the first direction, or the first electrode 320 overlaps the sidewall of the supporting portion 221 on the side corresponding to the first sub-region 211 via an adhesive layer in the first direction.

The luminescent material layer 3101 remaining in the isolation opening 200a forms the light emitting cell 310 of the current processing color.

And when the evaporation angle of the first evaporation source 400 towards the first sub-region 211 is larger than the evaporation angle of the first evaporation source 400 towards the second sub-region 212 during the evaporation of the luminescent material layer 3101, the area of the light emitting unit 310 located under the first sub-region 211 is smaller than the area of the light emitting unit 310 located under the second sub-region 212. I.e. the overlapping area of the front projection of the light emitting unit 310 onto the substrate 100 and the front projection of the first sub-area 211 onto the substrate 100 is smaller than the overlapping area of the front projection of the light emitting unit 310 onto the substrate 100 and the front projection of the second sub-area 212 onto the substrate 100.

In this embodiment, the isolation structure 200 having the first sub-region 211 and the second sub-region 212 with asymmetry is formed first. The length of the first sub-zone 211 in the first direction is smaller than the length of the second sub-zone 212 in the first direction. Therefore, the shielding effect of the first sub-region 211 is smaller when the first electrode material layer 3201 is evaporated, so that the first electrode material layer 3201 can extend more below the first sub-region 211. Therefore, the first electrode 320 in the isolation opening 200a has more overlap area with the first isolation portion 220 on the corresponding side of the first sub-region 211. Therefore, the present embodiment can effectively improve the problem of poor overlap of the first electrode 320 (e.g., cathode) in the isolation opening 200 a.

Meanwhile, in some examples, during evaporation of the luminescent material layer 3101, an evaporation angle of the first evaporation source 400 toward the first sub-region 211 is greater than an evaporation angle of the first evaporation source 400 toward the second sub-region 212. Thus, although the length MA1 of the first sub-region 211 is smaller, the extension length of the light emitting material layer 3101 within the isolation opening 200a under the first sub-region 211 may not be too long. Therefore, by matching the asymmetric vapor deposition angles of the asymmetric first sub-region 211 and the second sub-region 212 with the first evaporation source 400, it is further ensured that the first electrode 320 in the isolation opening 200a has a larger overlap area with the first isolation portion 220 on the side corresponding to the first sub-region 211.

In one embodiment, step S40 further includes, before evaporating the luminescent material layer 3101 on the substrate 100 on which the isolation structure 200 is formed, by the first evaporation source 400:

In step S30, the evaporation angle of the first evaporation source 400 is adjusted.

The evaporation angle of the first evaporation source 400 is adjusted so that the evaporation angle of the first evaporation source 400 toward the first sub-region 211 is larger than the evaporation angle of the first evaporation source 400 toward the second sub-region 212.

As an example, step S30 may include:

in step S31, the position of the angle limiting plate and/or the first evaporation source 400 is adjusted in the first direction such that the first evaporation source 400 is offset from the opening center of the angle limiting plate and is close to the opening edge of the angle limiting plate towards the first sub-zone 211, see fig. 3 and 4.

When the first evaporation source 400 is deviated from the opening center position of the angle limiting plate, the opening edges on both sides of the angle limiting plate in the first direction are the same distance from the first evaporation source 400, and the evaporation angle of the first evaporation source 400 toward the first sub-region 211 is the same as the evaporation angle of the first evaporation source 400 toward the second sub-region 212.

The relative positions of the angle limiting plate and/or the first evaporation source 400 may be changed by moving the positions of the two in the first direction, thereby causing the first evaporation source 400 to deviate from the opening center of the angle limiting plate.

The first evaporation source 400 is close to the opening edge of the angle limiting plate, which faces the first sub-zone 211, so that the evaporation angle of the first evaporation source 400, which faces the first sub-zone 211, can be increased, and the evaporation angle of the first evaporation source 400, which faces the second sub-zone 212, is decreased, so that the evaporation angle of the first evaporation source 400, which faces the first sub-zone 211, is larger than the evaporation angle of the first evaporation source 400, which faces the second sub-zone 212.

It will be appreciated that during evaporation, the evaporation source and the angle limiting plate may be stationary in position, while the substrate 100 may be moved in the first direction. The first evaporation source 400 is close to the opening edge of the angle limiting plate towards the first sub-zone 211, i.e. the first evaporation source 400 is close to the opening edge of the angle limiting plate towards the first sub-zone 211 within one of the isolation openings 200a when the first evaporation source 400 and the angle limiting plate are opposite to the isolation opening 200 a.

As another example, step S30 includes:

in step S32, the first evaporation source 400 is tilted to increase the evaporation angle at which the first evaporation source 400 is tilted toward the first sub-region 211.

The first evaporation source 400 may be rotated such that the first evaporation source 400 is tilted such that the evaporation angle of the first evaporation source 400 towards the first sub-zone 211 may be made larger and the evaporation angle of the first evaporation source 400 towards the second sub-zone 212 becomes smaller, such that it is achieved that the evaporation angle of the first evaporation source 400 towards the first sub-zone 211 is larger than the evaporation angle of the first evaporation source 400 towards the second sub-zone 212.

The effective adjustment of the vapor deposition angle of the first evaporation source 400 can be effectively achieved both by adjusting the angle limiting plate and/or the position of the first evaporation source 400 in the first direction and by tilting the first evaporation source 400. Either or both of which may be selected for effective adjustment as desired.

In one embodiment, the first isolation portion 220 to which the first electrode 320 is connected and the light emitting unit 310 are disposed at a distance from each other within the same isolation opening 200a by adjusting an appropriate evaporation angle of the first evaporation source 400. At this time, the light emitting unit 310 may be not overlapped with the first separator 220, so that the overlapping of the first electrode 320 and the first separator 220 is not affected.

In one embodiment, by adjusting the evaporation angle of the first evaporation source 400, the light emitting units 310 are disposed at intervals from the first spacers 220 located at both sides thereof in the first direction within the same isolation opening 200 a.

Within the same isolation opening 200a, the light emitting unit 310 may be centrally disposed between the first isolation parts 220 at both sides thereof in the first direction. Of course, the light emitting unit 310 may not be centrally disposed.

As an example, the substrate 100 may further include a pixel defining layer 130 and a second electrode 120. The second electrode 120, the light emitting unit 310, and the first electrode 320 may form a subpixel. The second electrode 120 may be provided as an anode and the first electrode 320 as a cathode. The first electrode 320 may be provided as an anode, and the second electrode 120 as a cathode.

The pixel defining layer 130 covers the second electrode 120, and the pixel defining layer 130 has a pixel opening therein exposing the second electrode 120, the pixel opening is in communication with the isolation opening 200a, and the isolation structure 200 is located on the pixel defining layer 130.

When the light emitting unit 310 is connected to the first isolation part 220 located at either side thereof in the first direction, current may directly flow from the second electrode 120 to the first isolation part 220 through the light emitting unit 310 when the light emitting sub-pixel operates, and thus a crosstalk problem may be caused.

In this embodiment, the light emitting units 310 and the first isolation portions 220 located at two sides of the light emitting units in the first direction are all arranged at intervals, so that when the light emitting sub-pixel works, current flows from the second electrode 120 to the first electrode 320 through the light emitting units 310 and then is transmitted to the first isolation portions 220 through the first electrode 320, thereby preventing the crosstalk problem. Meanwhile, the light emitting units 310 are disposed at intervals from the first isolation portions 220 located at both sides thereof in the first direction, so that the light emitting area of the sub-pixels of each isolation opening 200a is a preset area. The preset area can be set according to actual requirements.

In one embodiment, before step S70, further includes:

step S50, adjusting the evaporation angle of the second evaporation source 500.

By adjusting the vapor deposition angle of the first evaporation source 400, the vapor deposition angle of the second evaporation source 500 toward the first sub-region 211 can be further reduced, and the overlap area of the first spacer 220 on the side of the first electrode 320 corresponding to the first sub-region 211 in each of the spacer openings 200a can be further increased.

As an example, step S50 may include:

in step S51, the second evaporation source 500 is tilted to reduce the evaporation angle of the second evaporation source 500 toward the first sub-region 211, see fig. 5 and 6b.

For example, the evaporation angle of the second evaporation source 500 may be reduced from b1 to b2, which is inclined toward the first sub-region 211.

As another example, step S50 includes:

In step S52, the position of the angle limiting plate and/or the second evaporation source 500 is adjusted such that the second evaporation source 500 is offset from the opening center of the angle limiting plate in the first direction and away from the opening edge of the angle limiting plate toward the first sub-region 211.

Similarly, the principle of adjustment of the vapor deposition angle of the second evaporation source 500 is similar to that of the first evaporation source 400, and will not be described in detail here.

The effective adjustment of the vapor deposition angle of the second evaporation source 500 can be effectively achieved both by adjusting the position of the angle limiting plate and/or the second evaporation source 500 in the first direction and by tilting the second evaporation source 500. Either or both of which may be selected for effective adjustment as desired. Meanwhile, it can be understood that the adjustment range of adjusting the position of the angle limiting plate and/or the second evaporation source 500 in the first direction is limited, and a larger range of change in the evaporation angle can be achieved by changing the inclination of the second evaporation source 500 when it cannot meet the requirement.

In one embodiment, before step S70, further includes:

in step S60, the substrate 100 on which the luminescent material layer 3101 is formed is rotated 180 ° about the center line of the substrate 100 as the rotation axis.

At this time, in step S40, the light emitting material layer 3101 is deposited on the substrate 100 on which the isolation structure 200 is formed by the first evaporation source 400, as shown in fig. 8 and 9.

After the step 60, when the first electrode material layer 3201 is evaporated on the light emitting material layer 3101 by the second evaporation source 500 in the step S70, referring to fig. 5 and fig. 6a (or fig. 6 b), the positions of the first sub-region 211 and the second sub-region 212 in the isolation opening 200a are interchanged, so that the overlapping orientation of the first electrode 320 and the first isolation portion 220 can be changed, and the evaporation angle of the light emitting material layer 3101 and the first electrode material layer 3201 can be matched more flexibly.

It should be understood that, although the steps in the flowchart of fig. 1 are shown in order as indicated by the arrows, the steps are not necessarily performed in order as indicated by the arrows. The steps are not strictly limited to the order of execution unless explicitly recited herein, and the steps may be executed in other orders. Moreover, at least a portion of the steps in the figures may include steps or stages that are not necessarily performed at the same time, but may be performed at different times, nor does the order in which the steps or stages are performed necessarily performed in sequence, but may be performed alternately or alternately with other steps or at least a portion of the steps or stages in other steps.

In one embodiment, please refer to fig. 7a (or fig. 7 b), a display panel is further provided, which includes a substrate 100, an isolation structure 200, and a light emitting structure 300.

The isolation structure 200 is located on the substrate 100. And the isolation structure 200 is surrounded by a plurality of isolation openings 200a.

Meanwhile, the isolation structure 200 includes a first isolation portion 220 and a second isolation portion 210. It can be appreciated that the first isolation portion 220 and the second isolation portion 210 together enclose the isolation opening 200a. The material of the first isolation portion 220 is a conductive material. The material of the second isolation portion 210 may be a conductive material or an insulating material.

The first isolation part 220 is located between the second isolation part 210 and the substrate 100. The second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending from the top surface of the first isolation portion 220 toward the outer periphery. The first sub-area 211 is disposed opposite to the second sub-area 212 in the first direction. In the first direction, the forward projection length MA1 of the first sub-region 211 on the substrate 100 is smaller than the forward projection length MA2 of the second sub-region 212 on the substrate 100.

The light emitting structure 300 is located within the isolation opening 200 a. And the light emitting structure 300 includes a light emitting unit 310 and a first electrode 320. The first electrode 320 is located at a side of the light emitting unit 310 remote from the substrate 100.

Within the same isolation opening 200a, the first electrode 320 overlaps the first isolation portion 220 of the corresponding side of the first sub-region 211 in the first direction.

In the present embodiment, in the isolation opening 200a, by disposing the asymmetric first sub-region 211 and the second sub-region 212, the first electrode 320 in the isolation opening 200a has more overlap area with the first isolation portion 220 on the corresponding side of the first sub-region 211. Therefore, the present embodiment can effectively improve the problem of poor overlap of the first electrode 320 (e.g., cathode) in the isolation opening 200 a.

In one embodiment, the overlapping area of the front projection of the light emitting unit 310 on the substrate 100 and the front projection of the first sub-region 211 on the substrate 100 is smaller than the overlapping area of the front projection of the light emitting unit 310 on the substrate 100 and the front projection of the second sub-region 212 on the substrate 100.

At this time, the light emitting units 310 are asymmetrically distributed under the first sub-region 211 and the second sub-region 212, so that the overlapping of the first isolation portion 220 on the side corresponding to the first sub-region 211 and the light emitting units 310 can be prevented from affecting the overlapping of the first electrode 320 and the first isolation portion 220.

In one embodiment, in the first direction, the length of the orthographic projection of the first sub-region 211 on the substrate 100 is a first length, the length of the orthographic projection of the second sub-region 212 on the substrate 100 is a second length, and the second length is k times the first length, 1<k≤5.

In one embodiment, the first isolation portion 220 connected to the first electrode 320 is spaced apart from the light emitting unit 310 within the same isolation opening 200 a. At this time, the light emitting unit 310 does not overlap the first separator 220, so that overlapping of the first electrode 320 and the first separator 220 is not affected.

In one embodiment, the light emitting units 310 are spaced apart from the first spacers 220 located at both sides thereof in the first direction within the same isolation opening 200 a.

Within the same isolation opening 200a, in the first direction, the front projection of the light emitting unit 310 on the substrate 100 and the front projection of the opening surrounded by the first isolation portions on the substrate 100 may be concentric, i.e., in the first direction, the light emitting unit 310 may be centrally disposed between the first isolation portions 220 on both sides thereof. Of course, the light emitting unit 310 may not be centrally disposed.

At this time, when the light emitting sub-pixel operates, current flows from the second electrode 120 to the first electrode 320 through the light emitting unit 310 and then is transmitted from the first electrode 320 to the first isolation portion 220, but does not flow from the second electrode 120 to the first isolation portion 220 directly through the light emitting unit 310, so that the crosstalk problem can be prevented. Meanwhile, the light emitting units 310 are disposed at intervals from the first isolation portions 220 located at both sides thereof in the first direction, so that the light emitting area of the sub-pixels of each isolation opening 200a is a preset area. The preset area can be set according to actual requirements.

In one embodiment, the first spacer 220 includes a support 221. The orthographic projection of the second isolation portion 210 on the substrate 100 covers the orthographic projection of the surface of the support portion 221, which is far away from the substrate 100, on the substrate 100, and the first electrode 320 is connected to the sidewall of the support portion 221.

As an example, referring to fig. 10, the first spacer 220 may further include an adhesive portion 222. The bonding portion 222 is located between the supporting portion 221 and the substrate 100, so that the adhesion of both can be increased.

Meanwhile, the first electrode 320 extends to the sidewall of the supporting portion 221 via the bonding portion 222. At this time, the first electrode 320 is also in contact with the upper surface of the bonding portion 222, so that the reliability of the overlap of the first electrode 320 and the first separator 220 can also be increased.

In one embodiment, the substrate 100 may further include a pixel defining layer 130 and a second electrode 120. The second electrode 120, the light emitting unit 310, and the first electrode 320 may form a subpixel. The second electrode 120 may be provided as an anode and the first electrode 320 as a cathode. The first electrode 320 may be provided as an anode, and the second electrode 120 as a cathode.

Specifically, the orthographic projection of the pixel opening on the substrate 100 may be located within the orthographic projection of the isolation opening 200a on the substrate 100. When the first isolation portion 220 connected to the first electrode 320 is spaced apart from the light emitting unit 310 within the same isolation opening 200a, the first electrode 320 may be insulated from the second electrode 120 by the pixel defining layer 130.

In one embodiment, a display panel is further provided, including a substrate 100, an isolation structure 200, and a light emitting structure 300.

Within the same isolation opening 200a, the first electrode 320 overlaps the first isolation portions 220 on both sides thereof in the first direction. And the overlap area of the first isolation portion 220 on the side corresponding to the first sub-region 211 and the first electrode 320 is larger than the overlap area of the first isolation portion 220 on the side corresponding to the second sub-region 212 and the first electrode 320.

In one embodiment, the height of the first electrode 320 on the isolation structure 200 on the corresponding side of the first sub-region 211 is greater than the height of the first electrode 320 on the isolation structure 200 on the corresponding side of the second sub-region 212.

In one embodiment, the thickness of the first electrode 320 on the isolation structure 200 on the corresponding side of the first sub-region 211 is greater than the thickness of the first electrode 320 on the isolation structure 200 on the corresponding side of the second sub-region 212.

In one embodiment, a method for manufacturing a display panel includes the steps of:

in step S100, a substrate 100 is provided.

In step S200, an isolation structure 200 is formed on the substrate 100, the isolation structure 200 is surrounded by a plurality of isolation openings 200a, and the isolation structure 200 includes a first isolation portion 220 and a second isolation portion 210, the first isolation portion 220 is located between the second isolation portion 210 and the substrate 100, the second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending from a top surface of the first isolation portion 220 to an outer periphery, and the first sub-region 211 and the second sub-region 212 are oppositely disposed in the first direction.

The eave structure of the first spacer 220 may include a first sub-region 211 and a second sub-region 212 disposed opposite in the first direction.

In step S300, the first evaporation source 400 is used to deposit the luminescent material layer 3101 on the substrate 100 with the isolation structure 200 formed thereon, and in the process of depositing the luminescent material layer 3101, the deposition angle of the first evaporation source 400 towards the first sub-region 211 is larger than the deposition angle of the first evaporation source 400 towards the second sub-region 212, where the deposition angle is the included angle between the deposition direction and the direction parallel to the substrate.

Therefore, the length of the luminescent material layer 3101 in the isolation opening 200a extending below the first sub-region 211 is smaller, so that the luminescent material layer 3101 may extend less towards the first sub-region 211, thereby increasing the available overlap area of the first isolation portion 220 on the corresponding side of the first sub-region 211.

Step S400, evaporating the first electrode material layer on the luminescent material layer through the second evaporation source.

As an example, the evaporation angle of the second evaporation source 500 toward the first sub-region 211 may be set smaller than the evaporation angle of the second evaporation source 500 toward the second sub-region 212, thereby more facilitating the one-sided lapping of the first electrode material layer 3201 with the first separator 220 on the side corresponding to the first sub-region 211.

In step S500, patterning the first electrode material layer and the evaporated luminescent material layer to form a first electrode and a luminescent unit.

In this embodiment, in the process of evaporating the light emitting material layer 3101, the evaporation angle of the first evaporation source 400 towards the first sub-region 211 is larger than the evaporation angle of the first evaporation source 400 towards the second sub-region 212, and the evaporation angle is the included angle between the evaporation direction and the direction parallel to the substrate, so that the first isolation portion 220 on the side of the first electrode material layer 3201 corresponding to the first sub-region 211 in the subsequent evaporation process has more overlap area, and the problem of poor overlap of the first electrode 320 (such as the cathode) in the isolation opening 200a can be effectively improved.

The isolation structure 200 is disposed on the substrate 100 and is surrounded by a plurality of isolation openings 200a. And the isolation structure includes a first isolation portion 220 and a second isolation portion 210. The first isolation part 220 is located between the second isolation part 210 and the substrate 100. The second isolation portion 210 has a first sub-region 211 and a second sub-region 212 extending from the top surface of the first isolation portion 220 toward the outer periphery. The first sub-area 211 is disposed opposite to the second sub-area 212 in the first direction.

The light emitting structure 300 is located in the isolation opening 200a and includes a light emitting unit 310 and a first electrode 320. The first electrode 320 is located at a side of the light emitting unit 310 remote from the substrate 100.

Within the same isolation opening 200a, the first electrode 320 overlaps at least the first isolation portion 220 of the corresponding side of the first sub-region 211 in the first direction. Specifically, the first electrode 320 may overlap the first spacer 220 on the corresponding side of the first sub-region 211 in the first direction on one side, and the first electrode 320 may overlap the first electrode 320 on both sides thereof in the first direction.

The overlapping area of the front projection of the light emitting unit 310 on the substrate 100 and the front projection of the first sub-region 211 on the substrate 100 is smaller than the overlapping area of the front projection of the light emitting unit 310 on the substrate 100 and the front projection of the second sub-region 212 on the substrate 100.

In the embodiment, the asymmetric distribution of the light emitting units 310 under the first sub-region 211 and the second sub-region 212 can reduce the overlap of the light emitting units 310 with the first spacers 220 on the corresponding side of the first sub-region 211, thereby increasing the overlap area of the first electrodes 320 with the first spacers 220 on the corresponding side of the first sub-region 211. Based on the same inventive concept, the embodiment of the present application also provides a display device (not shown) including the display panel in the above embodiment.

It may be understood that the display device in the embodiments of the present application may be any product or component having a display function, such as an OLED display device, a QLED display device, an electronic paper, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, a wearable device, and an internet of things device, which is not limited in the embodiments disclosed in the present application.

In the description of the present specification, reference to the terms "some embodiments," "other embodiments," "desired embodiments," and the like, means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, schematic descriptions of the above terms do not necessarily refer to the same embodiment or example.

The technical features of the above-described embodiments may be arbitrarily combined, and all possible combinations of the technical features in the above-described embodiments are not described for brevity of description, however, as long as there is no contradiction between the combinations of the technical features, they should be considered as the scope of the description.

The above examples illustrate only a few embodiments of the application, which are described in detail and are not to be construed as limiting the scope of the application. It should be noted that it will be apparent to those skilled in the art that several variations and modifications can be made without departing from the spirit of the application, which are all within the scope of the application. Accordingly, the scope of protection of the present application is to be determined by the appended claims.

Claims

1. A display panel, characterized in that it comprises:

substrate;

An isolation structure is located on the substrate and surrounds a plurality of isolation openings. The isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located between the second isolation portion and the substrate. The second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion. The first sub-region and the second sub-region are arranged opposite to each other in a first direction. In the first direction, the orthographic projection length of the first sub-region on the substrate is smaller than the orthographic projection length of the second sub-region on the substrate.

A light-emitting structure, located within the isolation opening, includes a light-emitting unit and a first electrode, wherein the first electrode is located on the side of the light-emitting unit away from the substrate;

Within the same isolation opening, the first electrode overlaps with the first isolation portion on the side corresponding to the first sub-region in the first direction;

The overlapping area of the orthographic projection of the light-emitting unit on the substrate and the orthographic projection of the first sub-region on the substrate is smaller than the overlapping area of the orthographic projection of the light-emitting unit on the substrate and the orthographic projection of the second sub-region on the substrate.

The asymmetrical distribution of the light-emitting units in the first sub-region and the second sub-region prevents the overlap of the light-emitting units with the first isolation portion on the corresponding side of the first sub-region from affecting the overlap of the first electrode with the first isolation portion.

2. The display panel according to claim 1, wherein, in the first direction, the orthographic projection length of the first sub-region on the substrate is a first length, the orthographic projection length of the second sub-region on the substrate is a second length, the second length is k times the first length, and 1 < k ≤ 5.

3. The display panel according to claim 1, wherein the first isolation portion and the light-emitting unit are spaced apart within the same isolation opening.

4. The display panel according to claim 1, wherein the first isolation portion includes a support portion, the orthographic projection of the second isolation portion on the substrate covers the orthographic projection of the surface of the support portion away from the substrate on the substrate, and the first electrode is connected to the sidewall of the support portion.

5. The display panel according to claim 4, wherein the first isolation portion further includes an adhesive portion located between the support portion and the substrate, and the first electrode extends to the sidewall of the support portion via the adhesive portion.

6. The display panel according to claim 1, wherein the substrate includes a pixel definition layer and a second electrode, the pixel definition layer covers the second electrode, and the pixel definition layer has a pixel opening that exposes the second electrode, the pixel opening is in communication with the isolation opening, and the isolation structure is located on the pixel definition layer.

7. A display panel, characterized in that it comprises:

substrate;

Within the same isolation opening, the first electrode overlaps with the first isolation portions on both sides in the first direction, and the overlap area of the first electrode with the first isolation portion on the side corresponding to the first sub-region is greater than the overlap area of the first electrode with the first isolation portion on the side corresponding to the second sub-region.

8. The display panel according to claim 7, wherein the climbing height of the first electrode on the isolation structure on the corresponding side of the first sub-region is greater than the climbing height of the first electrode on the isolation structure on the corresponding side of the second sub-region.

9. The display panel according to claim 7, wherein the slope thickness of the first electrode on the isolation structure on the side corresponding to the first sub-region is greater than the slope thickness of the first electrode on the isolation structure on the side corresponding to the second sub-region.

10. A method for manufacturing a display panel, characterized in that it comprises:

Provide substrate;

An isolation structure is formed on the substrate, the isolation structure surrounds a plurality of isolation openings, and the isolation structure includes a first isolation portion and a second isolation portion. The first isolation portion is located between the second isolation portion and the substrate. The second isolation portion has a first sub-region and a second sub-region extending outward from the top surface of the first isolation portion. The first sub-region and the second sub-region are disposed opposite to each other in a first direction, and in the first direction, the orthographic projection length of the first sub-region on the substrate is smaller than the orthographic projection length of the second sub-region on the substrate.

The first evaporation source is used to deposit a light-emitting material layer on the substrate having an isolation structure;

The first electrode material layer is deposited onto the light-emitting material layer by a second evaporation source;

The first electrode material layer and the vapor-deposited light-emitting material layer are patterned to form the first electrode and the light-emitting unit;

During the deposition of the light-emitting material layer, the deposition angle of the first evaporation source toward the first sub-region is greater than the deposition angle of the first evaporation source toward the second sub-region, and the area of the light-emitting material layer falling under the first sub-region is smaller than the area of the light-emitting material layer falling under the second sub-region. The deposition angle is the angle between the deposition direction and the direction parallel to the substrate.

11. The method for manufacturing a display panel according to claim 10, characterized in that, before depositing a light-emitting material layer on the substrate having an isolation structure by evaporating a first evaporation source, the method comprises:

Adjust the evaporation angle of the first evaporation source.

12. The method for manufacturing a display panel according to claim 11, characterized in that adjusting the evaporation angle of the first evaporation source includes:

Adjust the position of the angle limiting plate and/or the first evaporation source in the first direction so that the first evaporation source is offset from the opening center of the angle limiting plate and close to the opening edge of the angle limiting plate facing the first sub-region.

13. The method for manufacturing a display panel according to claim 11, characterized in that adjusting the evaporation angle of the first evaporation source includes:

The first evaporation source is tilted to increase the evaporation angle of the first evaporation source toward the first sub-region.

14. The method for preparing a display panel according to claim 10, characterized in that, before depositing the first electrode material layer onto the light-emitting material layer by means of the second evaporation source, the method comprises:

Adjust the evaporation angle of the second evaporation source.

15. The method for manufacturing a display panel according to claim 14, wherein adjusting the evaporation angle of the second evaporation source includes:

The second evaporation source is tilted to reduce the evaporation angle of the second evaporation source toward the first sub-region.

16. The method for manufacturing a display panel according to claim 14, wherein adjusting the evaporation angle of the second evaporation source includes:

Adjust the position of the angle limiting plate and/or the second evaporation source so that, in a first direction, the second evaporation source is offset from the opening center of the angle limiting plate and away from the opening edge of the angle limiting plate facing the first sub-region.

17. The method for preparing a display panel according to claim 10, characterized in that, before depositing the first electrode material layer onto the light-emitting material layer by means of the second evaporation source, it further includes:

The substrate on which the light-emitting material layer is formed is rotated 180° with the vertical axis of the substrate as the axis of rotation.

18. A display device, characterized in that it includes a display panel as described in any one of claims 1-9.