CN118225388A - A laser parameter integrated measurement device - Google Patents
A laser parameter integrated measurement device Download PDFInfo
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- CN118225388A CN118225388A CN202211651979.XA CN202211651979A CN118225388A CN 118225388 A CN118225388 A CN 118225388A CN 202211651979 A CN202211651979 A CN 202211651979A CN 118225388 A CN118225388 A CN 118225388A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J11/00—Measuring the characteristics of individual optical pulses or of optical pulse trains
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
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- Chemical & Material Sciences (AREA)
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Abstract
A laser parameter integrated measurement device, comprising: the device comprises a first spectroscope, a second spectroscope, a third spectroscope, a first focusing lens, a second focusing lens and a light beam quality analyzer; the light beams are reflected by the first spectroscope and sequentially pass through the second spectroscope and the third spectroscope, and the light beams reflected by the second spectroscope and the third spectroscope are respectively transmitted to a light beam quality analyzer; first and second focusing lenses are respectively arranged among the second spectroscope, the third spectroscope and the light beam quality analyzer; the beam propagation distance between the first focusing lens and the beam quality analyzer is equal to the focal length of the first focusing lens; the beam propagation distance from the laser light outlet to the second focusing lens and the beam propagation distance from the second focusing lens to the beam quality analyzer are both equal to twice the focal length of the second focusing lens; a total reflection mirror is provided between the second focusing lens and the beam quality analyzer to extend the beam propagation length. The scheme can realize synchronous measurement of the quality of the far-near field light beam.
Description
Technical Field
The application relates to the technical field of laser measurement, in particular to a laser multi-parameter integrated measurement device.
Background
In order to meet the requirements of a semiconductor wafer lithography machine, omnidirectional performance parameter measurement needs to be performed on output laser of an excimer laser serving as a light source of the lithography machine, such as laser polarization Degree (DOP), laser average power, laser pulse energy stability (Pulse to pulse stability), spectral linewidth (FWHM), spectral purity (E95), absolute center wavelength, laser pulse width, laser pulse repetition frequency, spot size, spot shape symmetry, beam divergence angle, spot position stability and spot pointing stability.
The existing excimer laser testing instrument can only conduct integrated measurement on one or more parameters of spectral characteristics, energy characteristics, beam characteristics, pulse characteristics and polarization characteristics, so that in the testing process of excimer laser performance parameters, the measuring instrument or the measuring device is needed to be used one by one, for example, when the far-field divergence angle and near-field light spot intensity distribution of a measuring beam are solved, a single camera is adopted to conduct measurement by sequentially translating two positions along an optical path, or two optical paths are divided into two optical paths to conduct measurement respectively, the measurement is time-consuming and labor-consuming, and large measurement errors are introduced by adjustment of the measuring instrument in the optical paths.
Disclosure of Invention
The application provides a laser parameter integrated measuring device, which solves the problems of the prior laser parameter measuring device.
The application provides a laser parameter integrated measuring device, which comprises: the device comprises a first spectroscope, a second spectroscope, a third spectroscope, a first focusing lens, a second focusing lens and a light beam quality analyzer;
The laser beam to be measured sequentially passes through a second spectroscope and a third spectroscope after being reflected by the first spectroscope, and the light beams reflected by the second spectroscope and the third spectroscope are respectively transmitted to a light beam quality analyzer;
A first focusing lens and a second focusing lens are respectively arranged among the second spectroscope, the third spectroscope and the light beam quality analyzer; the beam propagation distance between the first focusing lens and the beam quality analyzer is equal to the focal length of the first focusing lens; the beam propagation distance from the laser light outlet to the second focusing lens is equal to the beam propagation distance from the second focusing lens to the beam quality analyzer, and is equal to twice the focal length of the second focusing lens; the beam propagation length is extended by providing a total reflection mirror between the second focusing lens to the beam quality analyzer.
Optionally, the system further comprises a first power meter and a second power meter; the direction and the position of the first spectroscope are adjusted so that the laser beam to be measured is incident at the Brewster angle, and the first power meter and the second power meter are respectively arranged in the transmission and reflection directions of the laser beam to be measured after passing through the first spectroscope so as to be used for measuring the transmission and reflection light power.
Optionally, the first spectroscope is an optical wedge.
Optionally, the device further comprises an energy meter, and the light transmitted by the third spectroscope is input to the energy meter;
Optionally, the optical system further comprises a fourth spectroscope arranged in the light path of the light emitting side of the second focusing lens, the transmitted light beam passing through the fourth spectroscope is transmitted to a first light guide optical fiber connector, and the first light guide optical fiber connector is connected with an absolute wavelength meter through an optical fiber.
Optionally, the device further comprises a sixth spectroscope, the light beam reflected by the fourth spectroscope is transmitted to the photoelectric detector after being transmitted by the sixth spectroscope, and the light beam is transmitted to the light beam quality analyzer after being reflected by the sixth spectroscope.
Optionally, the device further comprises a fifth spectroscope arranged in the light-emitting side light path of the first focusing lens, the transmitted light beam passing through the fifth spectroscope is transmitted to a second light guide optical fiber connector, the second light guide optical fiber connector is connected with the spectrometer through an optical fiber, and the transmitted light beam reflected by the fifth spectroscope is transmitted to the light beam quality analyzer.
Optionally, light homogenizers are disposed before the first light guide fiber connector, the second light guide fiber connector and the photodetector.
Optionally, all or part of the devices are arranged in a nitrogen purging sealing box, and a light inlet is arranged on the nitrogen purging sealing box and is used for being in sealing connection with a light outlet of the excimer laser to be tested.
Optionally, all spectroscopes are deep ultraviolet optical window sheets with the rear surfaces plated with the deep ultraviolet wavelength antireflection films.
Optionally, the second beam splitter, the third beam splitter, the fourth beam splitter and the fifth beam splitter form an angle of approximately 45 degrees with the optical axis of the laser to be measured in the normal direction.
In addition, the application also provides a laser parameter integrated measuring device, which comprises: the nitrogen purging sealing box is provided with a light inlet, and a first spectroscope, a first power meter, a second spectroscope, a third spectroscope, an energy meter, a first focusing lens, a second focusing lens, a fourth spectroscope, a first light-homogenizing device, a first light-guiding optical fiber joint, a fifth spectroscope, a second light-homogenizing device, a second light-guiding optical fiber joint, a sixth spectroscope, a third light-homogenizing device, a photoelectric detector, a first total reflector, a second total reflector, a beam quality analyzer, a spectrometer and an absolute wavelength meter are arranged in the nitrogen purging sealing box;
After the laser beam to be measured is split by the first spectroscope, the reflected light is transmitted to the energy meter after being transmitted by the second spectroscope and the third spectroscope in sequence; the reflected light passing through the second spectroscope and the third spectroscope respectively passes through the first focusing lens, and is respectively projected to the fifth spectroscope) and the fourth spectroscope after passing through the second focusing lens), and the transmitted light passing through the fifth spectroscope) and the fourth spectroscope respectively passes through the second light equalizer and the first light equalizer for light equalizing, and is respectively received by the second light guide optical fiber connector and the first light guide optical fiber connector, and the second light guide optical fiber connector and the first light guide optical fiber connector are respectively connected with the spectrometer and the absolute wavelength meter through optical fibers; the reflected light passing through the fifth spectroscope is projected to a beam quality analyzer; the reflected light passing through the fourth spectroscope is transmitted by the sixth spectroscope, is uniformly projected to the photoelectric detector by the third light homogenizer, and is projected to the light beam quality analyzer after passing through the first total reflection mirror and the second total reflection mirror in sequence; the first power meter and the second power meter respectively receive the transmitted light and the reflected light which are incident to the first spectroscope at the Brewster angle;
The first spectroscope frame can rotate around the normal direction and is supported on a platform which can translate along the direction perpendicular to the incident laser direction; the normal directions of the second spectroscope, the third spectroscope, the fourth spectroscope and the fifth spectroscope form an angle of approximately 45 degrees with the optical axis of the incident laser, and the sixth spectroscope, the first total reflection mirror and the second total reflection mirror form an angle of approximately 30 degrees with the optical axis of the incident laser;
The propagation distance from the laser beam to be measured to the beam quality analyzer through the first focusing lens is the focal length of the first focusing lens; the distance of the laser beam from the light inlet to the second focusing lens is equal to the distance of the laser beam from the second focusing lens to the beam quality analyzer, and the distance is equal to twice the focal length of the second focusing lens.
Compared with the prior art, the application has the advantages that on one hand, the same detector (light beam quality analyzer) is used, the synchronous measurement of the near-field far-field light beam quality can be realized, the measurement error is reduced, and the purpose of compact design is achieved by folding the light path. The reflected light paths of the front surfaces of the three optical wedges are used for measuring the far-field beam quality, and the reflected light paths are not affected by absorption scattering damage of the base material of the optical element, so that the measuring precision is high. When near-field light beam quality is measured, light is transmitted through an optical wedge, and light is reflected by an optical element, so that the influence of absorption and scattering damage of a substrate material of the optical element is reduced as much as possible.
On the other hand, the device has a compact structure, can measure the laser polarization Degree (DOP), the laser average power, the laser pulse energy stability (Pulse to pulse stability), the spectrum linewidth (FWHM), the spectrum purity (E95), the absolute center wavelength, the laser pulse width, the laser pulse repetition frequency, the light spot size, the light spot shape symmetry, the light beam divergence angle, the light spot position stability and the light spot pointing stability which characterize the excimer laser performance for lithography in one step, not only avoids time and labor waste when repeatedly constructing a light path, but also greatly improves the measurement accuracy.
Drawings
FIG. 1 is a schematic diagram of a laser parameter integration measuring device according to an embodiment of the application.
Detailed Description
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may be embodied in many other forms than those herein described, and those skilled in the art will readily appreciate that the present invention may be similarly embodied without departing from the spirit or essential characteristics thereof, and therefore the present invention is not limited to the specific embodiments disclosed below.
It should be noted that in the description of the present application, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying any particular order or sequence. The specific meaning of the above terms in the present application will be understood in specific cases by those of ordinary skill in the art. Furthermore, in the description of the present application, the term "plurality" means two or more, unless otherwise indicated. The term "and/or" describes an association relationship of associated objects, meaning that there may be three relationships, e.g., a and/or B, which may represent: a exists alone, A and B exist together, and B exists alone. The character "/" generally indicates that the context-dependent object is an "or" relationship. The terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed or inherent to such process, method, article, or apparatus.
As previously described, excimer lasers are critical laser sources for use in semiconductor lithography, and embodiments of the present disclosure provide a parametric integrated measurement device comprising laser polarization Degree (DOP), laser average power, laser pulse energy stability (Pulse to pulse stability), spectral linewidth (FWHM), spectral purity (E95), absolute center wavelength, laser pulse width, laser pulse repetition frequency, spot size, spot shape symmetry, beam divergence angle, spot position stability, spot pointing stability.
The laser parameter integrated measuring apparatus of the present application will be described in detail with reference to fig. 1, as shown in fig. 1,
The parameter integration measuring device of the embodiment comprises a nitrogen purging sealing box 24 provided with a light inlet 1, a first spectroscope 2, a first power meter 3, a second power meter 4, a second spectroscope 5, a third spectroscope 6, an energy meter 7, a first focusing lens 8, a second focusing lens 9, a fourth spectroscope 10, a first light-even device 11, a first light-guiding optical fiber joint 12, a fifth spectroscope 13, a second light-even device 14, a second light-guiding optical fiber joint 15, a sixth spectroscope 16, a third light-even device 17, a photoelectric detector 18, a first total reflection mirror 19, a second total reflection mirror 20 and a light beam quality analyzer 21, wherein the first spectroscope 2, the first power meter 3, the second power meter 4, the second spectroscope 5, the third spectroscope 6, the energy meter 7, the first focusing lens 8, the second focusing lens 9, the fourth spectroscope 10, the first light-even device 11, the first light-guiding optical fiber joint 15, the sixth spectroscope 16, the third light-even device 17, the third light-even device 18, the third light-level detector 18 and the third light-even device 17; and includes a spectrometer 22, an absolute wavelength meter 23;
After the laser beam to be measured is split by the first spectroscope 2, the reflected light is transmitted to the energy meter 7 after being transmitted by the second spectroscope 5 and the third spectroscope 6 in sequence; the reflected light passing through the second spectroscope 5 and the third spectroscope 6 respectively passes through the first focusing lens 8 and the second focusing lens 9 and then respectively projects to the fifth spectroscope 13 and the fourth spectroscope 10, and after the transmitted light passing through the fifth spectroscope 13 and the fourth spectroscope 10 respectively passes through the second light homogenizer 14 and the first light homogenizer 11 for homogenizing, the transmitted light is respectively received by the second light guide optical fiber connector 15 and the first light guide optical fiber connector 12, and the second light guide optical fiber connector 15 and the first light guide optical fiber connector 12 are respectively connected with the spectrometer 22 and the absolute wavelength meter 23 through optical fibers; the reflected light passing through the fifth spectroscope 13 is projected to the beam quality analyzer 21; the reflected light passing through the fourth spectroscope 10 is transmitted through the sixth spectroscope 16, is homogenized by the third homogenizer 17 and then is projected to the photoelectric detector 18, and the reflected light passing through the sixth spectroscope 16 is projected to the beam quality analyzer 21 after passing through the first total reflection mirror 19 and the second total reflection mirror 20 in sequence; the first power meter 3 and the second power meter 4 respectively receive the transmitted light and the reflected light after being incident to the first spectroscope 2 at the brewster angle;
The first spectroscope 2 is rotatable around the normal direction and is supported on a platform which can translate along the direction perpendicular to the incident laser direction; specifically, the first spectroscope 2 lens frame is an electric control lens frame, the first spectroscope 2 lens frame can rotate 360 degrees around the normal direction of the first spectroscope 2, the first spectroscope 2 support base can be an electric control rotary table, the first spectroscope 2 support base rotary table can rotate 360 degrees on an incident plane, the first spectroscope 2 support base rotary table is arranged on a one-dimensional electric control translation table, and the first spectroscope 2 support base rotary table can translate on the incident plane along the direction perpendicular to the incident laser direction.
The normal directions of the second spectroscope 5, the third spectroscope 6, the fourth spectroscope 10 and the fifth spectroscope 13 form an angle of approximately 45 degrees with the optical axis of the incident laser, and the sixth spectroscope 16, the first total reflection mirror 19 and the second total reflection mirror 20 form an angle of approximately 30 degrees with the optical axis of the incident laser;
The propagation distance of the laser beam to be measured reaching the beam quality analyzer 21 through the first focusing lens 8 is the focal length of the first focusing lens 8; the distance of the laser beam propagating from the light inlet to the second focusing lens 9 is equal to the distance of the laser beam propagating from the second focusing lens 9 to the beam quality analyzer 21, which is equal to twice the focal length of the second focusing lens 9.
In this embodiment, all the spectroscopes are deep ultraviolet optical window sheets with the rear surfaces coated with the deep ultraviolet wavelength antireflection film, wherein the first focusing lens 8 (in this embodiment, the focal length of the first focusing lens 8 is 1 m) and the second focusing lens 9 (the focal length of the second focusing lens 9 is 0.5 m) are made of deep ultraviolet optical materials with the front and rear surfaces coated with the deep ultraviolet wavelength antireflection film. Of course, an antireflection film may be coated on the surfaces of the spectroscope and the focusing lens.
The first light homogenizer 11, the second light homogenizer 14 and the third light homogenizer 17 are ground on the front surface made of a deep ultraviolet optical material, and ground on the rear surface are ground glass lenses coated with a deep ultraviolet wavelength antireflection film. The first light homogenizer 11, the second light homogenizer 14 and the third light homogenizer 17 can move back and forth along the light path, and the change of the laser energy on the surface of the detector can be realized so as to reach the sensitive detection range of the detector.
The first total reflection mirror 19 and the second total reflection mirror 20 are used for extending the length of the optical path so as to satisfy the distance relationship of the optical path propagation between the second focusing lens 9 and the beam quality analyzer, of course, according to actual needs, no or more total reflection mirrors may be used to change the optical path length, and no further description is repeated.
The light inlet 1 can be in sealing connection with the laser output laser light path according to the test requirement, or a deep ultraviolet optical window sheet is arranged for sealing.
How the various parameters of the laser beam to be measured are measured is described below in connection with fig. 1.
In order to reduce the polarization measurement error during the measurement of the polarization degree, as described above, the mirror holder where the first spectroscope 2 is located is an electrically controlled mirror holder capable of rotating 360 ° around the normal direction of the mirror surface, the support base is an electrically controlled base capable of rotating 360 ° on the incident plane, and the electrically controlled base is mounted on a one-dimensional electrically controlled translation stage capable of translating along the direction perpendicular to the direction of the incident laser. When the polarization degree of the laser beam to be measured is measured, the rotating support base and the one-dimensional translation table of the first spectroscope 2 are firstly adjusted, and the normal direction of the spectroscope 2 is adjusted to be close to the position of the brewster angle with the optical axis of the incident laser beam, so that the laser beam can completely penetrate the spectroscope to reach the detection surface of the first power meter 3, and the reflected beam of the laser reflected by the spectroscope 2 completely reaches the detection surface of the second power meter 4. Then, near the Brewster angle, the rotary support base of the spectroscope 2 is finely adjusted by observing the reading of the second power meter 4, the rotary support base is locked after the position with the minimum power reading is found, the spectroscope is rotated around the normal direction of the spectroscope 2, meanwhile, the reading of the second power meter 4 is observed, and the rotary mirror bracket is locked after the position with the minimum power reading is obtained. At this time, p-light in the reflected light is zero or close to zero. Let the incident laser power be P1, the s-ray power in the incident laser be Ps, the P-ray power be Pp, p1=ps+pp=p3+p4. Where P3 is the first power meter reading and P4 is the second power meter reading. The reflectivity of the first spectroscope 2 for s-light is Rs, the transmissivity for s-light is ts=1-Rs, and Rs and Ts can be calculated by fresnel formula according to the refractive index of the spectroscope material at the measured laser wavelength, which is not described herein. At this time, it can be considered that the first power meter 3 reads transmitted light power p3=pp+ps×ts, the second power meter 4 reads reflected light power p4=ps×rs, and the final calculation formula of the available polarization degree of dop= |pp-ps|/(pp+ps) combined with the calculation formula of the polarization degree is dop= |p3-p4 (ts+1)/rs|/(p3+p4).
In this embodiment, the optical wedge is used as the polarization measurement light splitting element, so that the influence of the absorption, scattering and damage of the material of the optical element on the measurement accuracy of the laser polarization can be avoided, the excimer laser light spot is generally rectangular, if a parallel plane mirror is used, the thickness is insufficient to separate the laser light spots reflected by the front surface and the rear surface, so that the detector receives two light spots simultaneously, the light spots reflected by the rear surface are influenced by the material scattering, absorption and damage, the power is unstable, and the measurement result is influenced.
After the measurement of the polarization degree is completed, the first spectroscope 2 is rotated until the normal direction of the mirror surface of the first spectroscope 2 forms an angle of 45 degrees with the optical axis direction of the incident laser, at this time, the first power meter 3 is considered to read P3, P polarized light in the excimer laser is not less than 96%, the rest 4% is S polarized light, it can be known that the laser power p1=p3/96% incident on the measuring device of the embodiment, the power incident on the energy meter 7 is p1×4% ×96% (the latter two 96% are P light transmitted by the second spectroscope (5) and the third spectroscope (6)), if the light inlet 1 of the device is sealed by a window, the first power meter 3 reads p3=96% > 96% > P1, and it is known that p1=p3/(96% > 96%), the power incident on the energy meter 7 is p7=p1=p96% > 4% > 96%, and in both cases, the laser power received by the energy meter 7 is not 4% of the incident laser power entering the measuring device, and does not exceed the damage threshold of the energy meter, and the pulse energy stability can be read by the energy meter.
The laser beam to be measured is reflected by the first spectroscope 2, reflected by the second spectroscope 5, transmitted by the first focusing lens 8, transmitted by the fifth spectroscope 13 and transmitted by the second light homogenizer 14, enters the deep ultraviolet optical fiber from the second light guide optical fiber joint 15 and is transmitted to the spectrometer 22, which is a high resolution deep ultraviolet spectrometer, at this time, the laser power is p22=p1×4% ×4% ×96% ×14×15<1.55 mill×14×15, wherein T14 is the transmissivity of the light homogenizer, and T15 is the laser power ratio receivable by the optical fiber joint. FWHM (spectral linewidth), E95 (spectral purity) can be measured by spectrometer 22.
Meanwhile, the laser beam to be measured is reflected by the first spectroscope 2, transmitted by the second spectroscope 5, reflected by the third spectroscope 6, transmitted by the second focusing lens 9, transmitted by the fourth spectroscope 10 and transmitted by the first light homogenizer 11, enters the deep ultraviolet optical fiber from the optical fiber connector 12 and is transmitted to the absolute wavelength meter 23, at this time, the laser power is p23=p1×4% ×96% ×4% ×96% ×11×12 is less than 1.5 mill T11×12, wherein T11 is the transmissivity of the light homogenizer, and T12 is the laser power ratio receivable by the optical fiber connector. The absolute wavelength meter 23 can measure the absolute wavelength of the laser beam.
The laser beam to be measured is reflected by the first spectroscope 2, transmitted by the second spectroscope 5, reflected by the third spectroscope 6, transmitted by the second focusing lens 9, reflected by the fourth spectroscope 10, transmitted by the sixth spectroscope 16 and transmitted by the third light homogenizer 17, and then reaches the photoelectric detector 18, wherein the laser power at the moment is p18=p1×4×96×4×4×96×96×17×18T 18<6×10-5×17×17T 18, wherein T17 is the transmittance of the light homogenizer, and T18 is the laser power ratio receivable by the photoelectric detector. The laser beam pulse width can be measured by a photodetector in combination with an oscilloscope.
After the laser beam to be measured is reflected by the first spectroscope 2, reflected by the second spectroscope 5, transmitted by the first focusing lens 8 and reflected by the fifth spectroscope 13, to the beam quality analyzer 21 located at the focal length position of the first focusing lens 8, the beam divergence angle can be obtained by the focal length method, the laser power at this time is p21=p1×4×4×4% <6.5×10-5×p1. At the same time, the incident laser is reflected by the first spectroscope 2, transmitted by the second spectroscope 5, reflected by the third spectroscope 6, transmitted by the second focusing lens 9, reflected by the fourth spectroscope 10, reflected by the sixth spectroscope 16, reflected by the first total reflection mirror 19 and reflected by the second total reflection mirror 20, and then reaches the beam quality analyzer 21 positioned at the position of double focal length of the second focusing lens 9, since the distance between the light inlet 1 of the device and the second focusing lens 9 is set to be twice the focal length of the second focusing lens 9, the imaging rule of the lens can be known, at this time, the light spot on the beam quality analyzer 21 is a real image which is inverted to the light spot at the light inlet 1 in equal size, at this time, the laser power is P21' =p1×4×96×4×4×4×4×4% <2.5×10-6×p1. Therefore, the light beam quality parameters such as the light spot size, the light spot shape symmetry, the light spot position stability, the light spot pointing stability and the like can be measured. By designing the distribution ratio of the energy of the light path, the same detector (light beam quality analyzer) can be used to realize the synchronous measurement of the near-field far-field light beam quality, reduce the measurement error and achieve the purpose of compact design by folding the light path.
In this embodiment, the far-field beam quality is measured by using the reflected light paths of the front surfaces of the three wedges (the first beam splitter 2, the second beam splitter 5 and the fifth beam splitter 13), and the reflected light paths are not affected by the absorption scattering damage of the substrate material of the optical element, so that the measurement accuracy is high.
Near field beam quality measurement: light transmitted through one wedge (the second beam splitter 5) and reflected by the other optical element is utilized to minimize the effect of scattering damage absorbed by the base material of the optical element.
In this embodiment, the spectrometer 22 and the absolute wavelength meter 23 measure the frequency domain characteristic of the laser beam, and the photodetector 18 measures the time domain characteristic, so that the beam shrinkage and the light homogenization are used during measurement, and the influence of the spatial distribution non-uniformity of the laser beam on the measurement accuracy is reduced.
The device of this embodiment has compact structure (for example, the nitrogen purge seal box used by the device has a length of 80 cm, a width of 60 cm and a height of 35 cm), and can measure the laser polarization Degree (DOP), the laser average power, the laser pulse energy stability (Pulse to pulse stability), the spectral linewidth (FWHM), the spectral purity (E95), the absolute center wavelength, the laser pulse width, the laser pulse repetition frequency, the spot size, the spot shape symmetry, the beam divergence angle, the spot position stability and the spot pointing stability of the excimer laser for representing lithography at one step, thereby not only avoiding time and labor waste when repeatedly constructing the optical path, but also greatly improving the measurement accuracy.
Furthermore, it should be noted that while the laser parameter integration measuring apparatus described in the foregoing embodiments integrates a variety of laser beam parameter measurements, it should be understood that one skilled in the art may select all or part of the measuring components to achieve measurement of part of the parameters as desired. For example, the following embodiments describe an apparatus that includes far-field and near-field beam quality parameter measurements.
In addition, in the embodiment of the present application, an excimer laser parameter integration measurement apparatus is provided, which can refer to the part in fig. 1, and includes: a first spectroscope 2, a second spectroscope 5, a third spectroscope 6, a first focusing lens 8, a second focusing lens 9, and a beam quality analyzer 21;
the laser beam to be measured is reflected by the first spectroscope 2 and sequentially passes through the second spectroscope 5 and the third spectroscope 6, and the light beams reflected by the second spectroscope 5 and the third spectroscope 6 are respectively transmitted to the light beam quality analyzer 21;
wherein a first focusing lens 8 and a second focusing lens 9 are respectively arranged between the second spectroscope 5, the third spectroscope 6 and the beam quality analyzer 21; the beam propagation distance between the first focusing lens 8 and the beam quality analyzer 21 is equal to the focal length of the first focusing lens 8; the beam propagation distance from the laser light outlet to the second focusing lens 9 is equal to the beam propagation distance from the second focusing lens 9 to the beam quality analyzer 21, and is equal to twice the focal length of the second focusing lens 9; the beam propagation length is extended by providing a total reflection mirror between the second focusing lens 9 to the beam quality analyzer 21. The apparatus enables simultaneous measurement of far-field and near-field beam quality parameters, and the relevant indications may be referred to the description of the previous embodiments, which is not discussed here.
While the invention has been described in terms of preferred embodiments, it is not intended to be limiting, but rather, it will be apparent to those skilled in the art that various changes and modifications can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (12)
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| CN202211651979.XA CN118225388A (en) | 2022-12-21 | 2022-12-21 | A laser parameter integrated measurement device |
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| CN202211651979.XA CN118225388A (en) | 2022-12-21 | 2022-12-21 | A laser parameter integrated measurement device |
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