CN118073167B9 - A multi-piece anti-winding plating automatic pick-and-place cavity mechanism - Google Patents
A multi-piece anti-winding plating automatic pick-and-place cavity mechanism Download PDFInfo
- Publication number
- CN118073167B9 CN118073167B9 CN202410475198.2A CN202410475198A CN118073167B9 CN 118073167 B9 CN118073167 B9 CN 118073167B9 CN 202410475198 A CN202410475198 A CN 202410475198A CN 118073167 B9 CN118073167 B9 CN 118073167B9
- Authority
- CN
- China
- Prior art keywords
- lifting
- carrier
- reaction chamber
- group
- sliding block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Abstract
本发明涉及半导体设备技术领域，具体公开了一种多片式防绕镀自动取放腔机构，包括：反应腔组，反应腔组包括反应腔外箱体，载具组包括若干组载具盘，载具组的一侧设置有机械爪组；还包括提升驱动组，提升驱动组包括驱动器和提升杆；本发明通过设置的提升驱动组的提升杆上下运动和机械爪组自动抓取基体材料相互配合，能够实现自动放置和拿取基体材料的效果，时间短，效率高；通过设置的遮挡组件能够对提升通孔进行遮挡，避免提升通孔暴漏导致原子沉积反应时基体材料底面靠近提升通孔的位置有原子沉积附着；通过设置的驱动件，能够带动辅助限位挡杆进行移动，便于基体材料准确移动至放置槽的内部，有利于原子沉积反应使用。
The invention relates to the technical field of semiconductor equipment, and specifically discloses a multi-chip anti-winding plating automatic pick-and-place chamber mechanism, comprising: a reaction chamber group, the reaction chamber group comprising a reaction chamber outer box body, a carrier group comprising a plurality of carrier plates, and a mechanical claw group being arranged on one side of the carrier group; and also comprising a lifting drive group, the lifting drive group comprising a driver and a lifting rod; the invention can achieve the effect of automatically placing and taking the substrate material by cooperating with each other through the lifting rod of the lifting drive group that moves up and down and the mechanical claw group that automatically grabs the substrate material, with short time and high efficiency; the lifting through hole can be shielded by the shielding component that is arranged, so as to avoid the lifting through hole being exposed and causing atomic deposition to be attached to the bottom surface of the substrate material near the lifting through hole during the atomic deposition reaction; and the driving member that is arranged can drive the auxiliary limit stopper rod to move, so as to facilitate the accurate movement of the substrate material to the inside of the placement groove, which is beneficial to the use of the atomic deposition reaction.
Description
Technical Field
The invention belongs to the technical field of semiconductor equipment, and particularly relates to a multi-piece type winding plating-preventing automatic cavity taking and placing mechanism.
Background
Anti-winding plating, which is a technical term for preventing atoms from depositing a plating film on the bottom surface of a matrix material; in the field of semiconductor equipment, especially, in order to realize automatic picking and placing of a substrate, a common structure is to form a relatively large hole at the bottom of a carrier and then move up and down by a designed lifting column to realize picking and placing of the substrate, but the hole diameter formed at the bottom of the carrier is too large, and a large amount of precursor atoms are deposited on the bottom surface of the substrate, so that the anti-winding plating cannot be ensured. In order to ensure the anti-winding plating and prevent the atomic deposition of the bottom surface of the matrix material, a fully sealed structural design is adopted for the surface of a carrier for containing the matrix material, the bottom surface of the matrix material is fully attached to the surface of the carrier, and the chemical reaction atoms are ensured to be deposited only on the surface of the matrix material. However, in this case, it is common to place a plurality of base materials on a carrier one by one in a manual manner, which is not only time-consuming and inefficient, but also the base materials are likely to deviate and be damaged when being placed on the carrier for holding the base materials by bonding and wrapping, which affects the surface coating of the base materials, and the phenomenon of uneven atomic deposition on the surface and bottom atomic deposition of the base materials occurs, which is inconvenient to use.
Disclosure of Invention
The invention aims to provide a multi-piece type anti-winding plating automatic cavity taking and placing mechanism so as to solve the problems in the background technology.
In order to achieve the above purpose, the present invention provides the following technical solutions:
A multi-piece anti-coiling plating automatic cavity taking and placing mechanism, comprising:
The reaction chamber set comprises a reaction chamber outer box body, a heater is arranged in the reaction chamber outer box body, a heating device in the prior art can provide heat required by chemical reaction of a precursor source, an inlet is formed in one side of the reaction chamber outer box body, the other side of the reaction chamber outer box body is connected with a reaction chamber outer box door through a guiding driving set, a carrier set is arranged on one side, close to the reaction chamber outer box body, of the reaction chamber outer box door, the carrier set comprises a plurality of carrier plates, the carrier plates are connected to one side of the reaction chamber outer box door, a plurality of groups of carrier plates are provided with placing grooves for placing matrix materials, the matrix materials are placed in the placing grooves to realize atomic deposition adhesion reaction of the surface chemical precursor source in the reaction chamber outer box body, one side of the carrier set is provided with a mechanical claw set, and is an automatic grabbing mechanism capable of grabbing matrix materials and moving in the prior art, the carrier set can be grabbed and placed on the upper end of a lifting rod, and the carrier is convenient to place the lifting end of the lifting rod on the carrier plate placed in the placing groove;
Still include lifting drive group, lifting drive group is located the below of carrier group, lifting drive group includes driver and lifting rod, the output of driver is connected with the lifting rod, the driver is for can driving the lifting rod in the prior art and carry out the device that reciprocates, and the driver is cylinder etc. offer on the carrier dish with lifting rod matched with promotes the through-hole, be favorable to the lifting rod to pass and jack up the base material, the driver of setting can drive the lifting rod and reciprocate, is favorable to the lifting rod to place the base material in the inside of the standing groove of carrier dish or with the base material from the inside ejection of standing groove of carrier dish, is favorable to the base material to place in place.
Preferably, the inside of reaction chamber outer box is equipped with interior cavity, can be used for carrying out the coating film reaction of matrix material, isolated external environment, the inside of interior cavity is provided with the heat screen, the heat screen adopts thermal-insulated pottery to make, has thermal-insulated heat preservation effect, can control the rate that heat lost, will follow the heat of matrix material external reflection again simultaneously and get back, maintains the inside heat of interior cavity, reduces the outside heat of transmission to the reaction chamber.
Preferably, the interval between two adjacent groups the carrier dish equals, and precursor source air current is at uniform velocity when guaranteeing the inside coating film of reaction inner chamber, and the inner chamber internal flow field is stable, guarantees that matrix material surface coating film is even, it is located respectively to promote the through-hole to set up to four groups, every two groups are located both sides around the carrier dish, promote the through-hole partly run through the standing groove, be favorable to when the lifting lever passes the lifting through-hole, its partly can pass the standing groove and jack-up matrix material, and can place matrix material in the inside of standing groove when the lifting lever descends.
Preferably, the upper end of the lifting rod is close to one side of the placing groove, a groove is formed in one side of the groove, one side of the groove is set to be a straight surface, the side edge of the base material is clamped, namely, the front side and the rear side of the base material are limited, the straight surface of the groove and the edge of the placing groove are located on the same vertical surface, the side edge of the base material is placed in the groove of the lifting rod, and when the lifting rod moves downwards, the base material is driven to move downwards until the base material is just placed in the placing groove.
Preferably, the guiding driving group comprises a driving element and a guiding shaft, the outer box body of the reaction cavity is close to the corner position of one side of the outer box door of the reaction cavity, the driving element is arranged at the output end of the driving element, the guiding shaft is connected with the corner position of the outer box door of the reaction cavity, and when the guiding driving group is in operation, the guiding shaft is driven to move through the driving element, so that the outer box door of the reaction cavity moves towards the direction close to the outer box body of the reaction cavity, and the outer box door of the reaction cavity drives the carrier disc to move into the outer box body of the reaction cavity and closes the outer box body of the reaction cavity.
Preferably, the inside of promotion through-hole is provided with and shelters from the subassembly, can shelter from the promotion through-hole, and there is atomic deposition in the position that the base material bottom surface is close to the promotion through-hole when preventing atomic deposition reaction, shelter from the subassembly and including connecting seat and lotus flower separation blade, the inside of promotion through-hole is installed through the bolt the connecting seat, the through-hole has been seted up to the inside of connecting seat, is favorable to the lift lever to pass through, the upper end of connecting seat is provided with a plurality of groups lotus flower separation blade, a plurality of groups lotus flower separation blade with the axis of promotion through-hole is the centre of a circle array setting, and then makes dry group the lotus flower separation blade can shelter from the promotion through-hole, and the position that the base material bottom surface is close to the promotion through-hole is avoided atomic deposition reaction has the deformation ability, and a plurality of groups lotus flower separation blade all has the ability of upwards deforming promptly for when the lift lever passed the promotion through-hole, can upwards jack up the lotus flower separation blade, makes its deformation when the lift lever is driven off the promotion through the through-hole, lotus flower separation blade can restore the state and shelter from the promotion through-hole again.
Preferably, the lower end of the connecting seat is provided with a cambered surface protruding downwards, so that the lower end of the connecting seat protrudes out of the horizontal plane of the bottom surface of the carrier disc, when in atomic deposition reaction, air flows from the left side inside the outer box body of the reaction chamber to the right side, namely when the air flows along the carrier disc, the air flows along the cambered surface of the lower end of the connecting seat, and the air flow speed of the lower end of the connecting seat is greater than the speed of the upper end of the connecting seat, so that the pressure of the lower end of the connecting seat is smaller than the pressure of the upper end of the connecting seat, and further, the air flow can be prevented from entering the lifting through holes from the lower end of the connecting seat and pushing the lotus flower baffle plate open, and the atomic deposition on the bottom surface of the base material can be further avoided when in atomic deposition reaction.
Preferably, the left and right sides of carrier dish all is provided with supplementary spacing pin, supplementary spacing pin has smooth outer end, and the matrix material of being convenient for slides along its outer end, can carry out spacingly to the left and right sides of matrix material, and cooperate the lifter to carry out spacingly to the front and back both sides of matrix material, further can carry out spacingly to four groups sides of matrix material, be favorable to the matrix material can be directly over the standing groove, and then the matrix material of being convenient for accurately remove to the inside of standing groove, supplementary spacing pin includes vertical section and inclined section, the side of vertical section aligns with the side of standing groove, inclined section inclines to the direction of keeping away from the standing groove, is favorable to when the gripper group snatchs matrix material and places it in the recess of four groups lifter inside, when matrix material moves a bit position for the left side or right side of standing groove, because receive the spacing effect of supplementary spacing pin, its side can slide along the inclined section and guide to along vertical section when making it move down, and then make matrix material be in the direction of just to the standing groove, the matrix material of being convenient for remove to the inside of standing groove.
Preferably, a driving piece is further arranged in the carrier disc and can drive the auxiliary limit stop lever to move, the driving piece comprises a first inclined plane sliding block, a first sliding connecting rod, a first piston block, a piston channel, a reset spring, a second piston block, a second sliding connecting rod, a second inclined plane sliding block and a third inclined plane sliding block, the piston channel is formed in the inner part of the corner position of the carrier disc, the piston channel is L-shaped, the inner part of the piston channel, which is close to one end of the lifting through hole, is provided with the first piston block, one end of the first piston block is connected with the first sliding connecting rod, one end of the first sliding connecting rod is connected with the first inclined plane sliding block, one end of the first sliding connecting rod is provided with a first mounting groove matched with the first inclined plane sliding block, one side of the first inclined plane sliding block is used for moving to the inner part of the first mounting groove, one side of the first mounting groove is provided with a second mounting groove, the inner part of the second mounting groove is provided with a reset spring, one end of the second piston block is close to the second piston block is connected with the second piston block, one end of the second piston block is further connected with the second piston block, one end of the second piston block is connected with the second piston block, the second end of the piston block is provided with the second piston block, the second end is matched with the second sliding block, and the second sliding block is provided with the second sliding block, the lower extreme of supplementary spacing pin be connected with two matched with of inclined plane sliding block three, further, the outer end of sliding connection pole one and sliding connection pole two all is provided with the sealing layer, prevent that piston passageway sealed effect is not good, during operation, when the lifting lever passed the promotion through-hole, the tip of lifting lever cooperatees with the gliding face of inclined plane sliding block one for inclined plane sliding block one is driven away from the inside of promotion through-hole, and drive piston block one through the sliding connection pole and remove, make it to the direction that is close to piston block two remove, and then make piston block two drive inclined plane sliding block two through sliding connection pole two remove, and then make inclined plane sliding block two and inclined plane sliding block three cooperate, and jack-up upwards with supplementary spacing pin through inclined plane sliding block three, and then supplementary spacing pin can rise and play spacing effect to the left and right sides of base material when the base material of being convenient for when the lifting lever kept away from the promotion through-hole, reset spring that sets up can drive inclined plane sliding block one and inclined plane sliding block two again and reset.
Preferably, the first inclined plane sliding block is configured into a disc shape capable of shielding the lifting through hole, namely, after the lifting rod descends and places the base material in the placing groove, the first inclined plane sliding block can shield the lifting through hole, when an atomic deposition reaction is performed, atomic deposition on the bottom surface of the base material is avoided, the bottom surface of the first inclined plane sliding block is configured into an inclined plane capable of being matched with the lifting rod, namely, when the lifting rod passes through the lifting through hole and pushes the first inclined plane sliding block, the lifting rod can be driven away from the inside of the lifting through hole.
Compared with the prior art, the invention has the beneficial effects that:
1. For the coating film of the multi-layer matrix material, the lifting rod of the lifting driving group moves up and down and the mechanical claw group automatically grabs the matrix material to be matched with each other, so that the effects of automatically placing and taking the matrix material can be realized, the time is short, and the efficiency is high;
2. The lifting rods of the lifting drive groups are designed into a plurality of small cylindrical lifting rods, and when the lifting rods are in operation, the lifting rods sequentially penetrate through the lifting through holes of the carrier plates, so that a plurality of groups of base materials can be placed and taken, the carrier plates are convenient for atomic deposition reaction, the lifting through holes can be shielded by the shielding assembly, and atomic deposition adhesion at the position, close to the lifting through holes, of the bottom surface of the base material during atomic deposition reaction caused by the leakage of the lifting through holes is avoided;
3. through the driving piece that sets up, can drive supplementary spacing pin and remove, place in the inside in-process of standing groove at matrix material and assist it spacing, the matrix material of being convenient for accurately removes to the inside of standing groove, and inclined plane sliding block one can shelter from the promotion through-hole, avoids matrix material bottom surface to have atomic deposition to adhere to, is favorable to atomic deposition reaction to use.
Drawings
FIG. 1 is a schematic diagram of the overall structure of the present invention;
FIG. 2 is a side view of the present invention;
FIG. 3 is a top view of the base material of the present invention mounted inside a placement slot of a carrier tray;
FIG. 4 is a schematic view of the installation of the screen assembly of the present invention;
FIG. 5 is a sectional view of the installation of the screen assembly of the present invention;
FIG. 6 is a top view of the shield assembly of the present invention;
FIG. 7 is an enlarged schematic view of a carrier tray of the present invention;
FIG. 8 is a top cross-sectional view of the carrier platter of the present invention;
FIG. 9 is an enlarged schematic view of FIG. 8C in accordance with the present invention;
FIG. 10 is a sectional view of the installation of the first ramp block of the present invention;
FIG. 11 is an installation side cross-sectional view of the auxiliary limit stop lever of the present invention;
FIG. 12 is an enlarged schematic view of the lift rod of the present invention;
in the figure: 10. a reaction chamber group; 11. an outer box body of the reaction cavity; 12. the reaction chamber outer chamber door;
20. a carrier set; 21. a carrier tray; 22. lifting the through hole; 23. a shielding assembly; 24. a connecting seat; 25. lotus flower baffle plates;
30. A guide driving group; 31. a driving element; 32. a guide shaft;
40. a lifting drive group; 41. a lifting rod;
50. an auxiliary limit stop lever; 51. an inclined plane sliding block I; 52. a first sliding connecting rod; 53. a piston block I; 54. a piston passage; 55. a return spring; 56. a piston block II; 57. a second sliding connecting rod; 58. a second inclined plane sliding block; 59. and a slope sliding block III.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to be within the scope of the invention.
Example 1:
Referring to fig. 1-6, a multi-piece anti-winding plating automatic cavity picking and placing mechanism includes:
The reaction chamber set 10, the reaction chamber set 10 includes the reaction chamber outer box 11, the inside of the reaction chamber outer box 11 has heaters, it is the heating device in the prior art, can provide the heat that the chemical reaction of precursor source needs, one side of the reaction chamber outer box 11 has imports, help the air current that the atomic deposition adheres to the reaction to pass through, the other side of the reaction chamber outer box 11 is connected with the reaction chamber outer box door 12 through the guiding drive group 30, one side of the reaction chamber outer box door 12 close to the reaction chamber outer box 11 has carrier sets 20, carrier sets 20 include several groups of carrier plates 21, several groups of carrier plates 21 connect on one side of the reaction chamber outer box door 12, several groups of carrier plates 21 have all offered the standing groove used for placing the matrix material in the standing groove, the matrix material is placed in the reaction chamber outer box 11 to realize the surface chemical precursor source atomic deposition and adheres to the reaction, one side of carrier sets 20 has mechanical claw groups, can grasp the matrix material and move the automatic grasping mechanism in the prior art, will not describe in detail here, omit in the figure, can grasp the matrix material on the lifting rod 21 and place the end on the carrier 41 of the carrier is placed on the standing groove of the matrix material;
Still include lifting drive group 40, lifting drive group 40 is located the below of carrier group 20, lifting drive group 40 includes driver and lifting rod 41, the output of driver is connected with lifting rod 41, the driver is for the device that can drive lifting rod 41 and reciprocate among the prior art, the driver is cylinder etc. has been omitted in the drawing, set up on the carrier dish 21 with lifting rod 41 matched with lifting through hole 22, be favorable to lifting rod 41 to pass and jack up the base material, the driver of setting can drive lifting rod 41 and reciprocate, be favorable to lifting rod 41 to place the base material in the inside of the standing groove of carrier dish 21 or with the base material from the inside ejection of standing groove of carrier dish 21, be favorable to the base material to place.
Further, the inside of reaction chamber outer box 11 is equipped with interior cavity, can be used for carrying out the coating film reaction of matrix material, and isolated external environment, the inside of interior cavity is provided with the heat screen, and the heat screen adopts thermal-insulated pottery to make, has thermal-insulated heat preservation effect, can control the rate that heat lost, and the heat that will outwards reflect from matrix material is reflected again simultaneously, maintains the inside heat of interior cavity, reduces the outside heat of transmission to the reaction chamber.
Further, the intervals between the two adjacent groups of carrier plates 21 are equal, the precursor source air flow is uniform when film coating is carried out in the inner cavity of the reaction, the flow field in the inner cavity is stable, film coating on the surface of the base material is guaranteed to be uniform, the lifting through holes 22 are arranged into four groups, each two groups of lifting through holes are respectively located on the front side and the rear side of the carrier plate 21, a part of each lifting through hole 22 penetrates through the placing groove, when the lifting rod 41 is favorable for penetrating through the lifting through holes 22, a part of each lifting rod can penetrate through the placing groove and jack up the base material, and when the lifting rod 41 descends, the base material can be placed in the placing groove.
Further, the upper end of the lifting rod 41 is provided with a groove on one side close to the placing groove, one side of the groove is provided with a straight surface, the side edge of the base material is clamped, namely, the front side and the rear side of the base material are limited, the straight surface of the groove and the edge of the placing groove are located on the same vertical surface, the side edge of the base material is placed in the groove of the lifting rod 41, and when the lifting rod 41 moves downwards, the base material is driven to move downwards until the base material is just placed in the placing groove.
Further, the direction drive group 30 includes actuating element 31 and guiding axle 32, actuating element 31 is all installed to the corner position that reaction chamber outer box 11 is close to reaction chamber outer box door 12 one side, actuating element 31's output is connected with guiding axle 32, the one end of guiding axle 32 is connected with reaction chamber outer box door 12's corner position, during operation, drive guiding axle 32 through the actuating element 31 that sets up and remove, and then make reaction chamber outer box door 12 remove to the direction that is close to reaction chamber outer box 11, and then can make reaction chamber outer box door 12 drive carrier dish 21 remove to the inside of reaction chamber outer box 11 and close reaction chamber outer box 11.
Further, the inside of promotion through-hole 22 is provided with shielding assembly 23, can shelter from promotion through-hole 22, the position that the base material bottom surface is close to promotion through-hole 22 has atomic deposition when preventing atomic deposition reaction, shielding assembly 23 includes connecting seat 24 and lotus flower separation blade 25, the inside of promotion through-hole 22 is through bolt mounting connecting seat 24, the through-hole has been seted up to the inside of connecting seat 24, be favorable to lifting rod 41 to pass through, the upper end of connecting seat 24 is provided with a plurality of groups lotus flower separation blade 25, a plurality of groups lotus flower separation blade 25 use the axis of promotion through-hole 22 as centre of a circle array setting, and then make dry group lotus flower separation blade 25 can shelter from promotion through-hole 22, avoid atomic deposition to react the position that the base material bottom surface is close to promotion through-hole 22, a plurality of groups lotus flower separation blade 25 all have the deformability, namely have the ability of upwards deforming, make it take place the deformation when lifting rod 41 passes promotion through-hole 22, when lifting rod 41 leaves lotus flower separation blade 22, lotus flower separation blade 25 can resume the state and shelter from promotion through-hole 22 again, the top end is not placed with the base material that the top end of a plurality of groups lotus flower separation blade 25 is equal.
Further, the lower end of the connection seat 24 has a downward protruding arc surface, so that when the lower end of the connection seat 24 protrudes from the horizontal plane of the bottom surface of the carrier plate 21, the air flow blows to the right from the left side inside the reaction chamber outer box 11 during the atomic deposition reaction, that is, when the air flow flows along the arc surface of the lower end of the connection seat 24, the air flow speed of the lower end of the connection seat 24 is greater than the speed of the upper end of the connection seat 24, and the pressure of the lower end of the connection seat 24 is less than the pressure of the upper end of the connection seat, so that the air flow can be prevented from entering the lifting through holes 22 from the lower end of the connection seat 24 and pushing the lotus flower baffle 25, and when the atomic deposition reaction is further performed, the pressure of the bottom surface of the base material is further prevented from being atomic deposition, and further, the pressure of the upper end of the connection seat 24 is greater than the pressure of the lower end, and the base material can be better installed inside the placement groove.
Example 2:
Referring to fig. 1, fig. 2, fig. 7, fig. 8, fig. 9, fig. 10, fig. 11 and fig. 12, the left and right sides of the carrier plate 21 are respectively provided with an auxiliary limit stop lever 50, the auxiliary limit stop lever 50 has a smooth outer end, so that when the base material slides along the outer ends thereof, the left and right sides of the base material can be limited, and the front and rear sides of the base material are limited by matching with the lifting rod 41, four groups of sides of the base material can be further limited, so that the base material can be positioned right above the placing groove, and further, the base material can be conveniently and accurately moved to the inside of the placing groove, the auxiliary limit stop lever 50 comprises a vertical section and an inclined section, the sides of the vertical section are aligned with the sides of the placing groove, and the inclined section is inclined towards a direction away from the placing groove, so that when the mechanical claw group grabs the base material and places the base material in the groove inside of the four groups of lifting rods 41, when the base material is deviated to the left side or the right side by a point position relative to the placing groove, the base material can slide along the inclined section and guide the inclined section to the side along the vertical section to the side of the placing groove due to the limiting effect of the auxiliary limit stop lever 50, so that the sides of the base material can slide along the inclined section and slide along the inclined section to the inclined section, and guide the side to the side of the base material to the side right.
Further, a driving part is further arranged in the carrier plate 21 and can drive the auxiliary limit stop lever 50 to move, the driving part comprises a first inclined surface sliding block 51, a first sliding connecting rod 52, a first piston block 53, a piston channel 54, a return spring 55, a second piston block 56, a second sliding connecting rod 57, a second inclined surface sliding block 58 and a third inclined surface sliding block 59, the piston channel 54 is arranged in the corner position of the carrier plate 21, the piston channel 54 is L-shaped, the piston block 53 is arranged in the part, close to one end of the lifting through hole 22, of the piston channel 54, one end of the first piston block 53 is connected with the first sliding connecting rod 52, the inclined surface sliding block 51 is arranged in the lifting through hole 22, one end of the first sliding connecting rod 52 is connected with the first inclined surface sliding block 51, a mounting groove I matched with the first inclined surface sliding block 51 is formed in the carrier plate 21 at one side of the lifting through hole 22, the device is used for moving the inclined plane sliding block I51 into the installation groove I, the installation groove II is arranged in the installation groove I-to-one side carrier plate 21, the reset spring 55 is arranged in the installation groove II, one end of the reset spring 55 is connected with the inclined plane sliding block I51, the upper end of the carrier plate 21 is provided with a vertical installation groove matched with the auxiliary limit stop lever 50, the auxiliary limit stop lever 50 is arranged in the vertical installation groove, the piston channel 54 is provided with a piston block II 56 near the inside of one end of the vertical installation groove, one end of the piston block II 56 is connected with a sliding connection rod II 57, one end of the sliding connection rod II 57 is connected with an inclined plane sliding block II 58, the inside of the carrier plate 21 is also provided with a transverse groove matched with the inclined plane sliding block II 58, the transverse groove is communicated with the vertical installation groove, the lower end of the auxiliary limit stop lever 50 is connected with an inclined plane sliding block III 59 matched with the inclined plane sliding block II 58, further, the outer ends of the first sliding connecting rod 52 and the second sliding connecting rod 57 are respectively provided with a sealing layer, so that the sealing effect of the piston channel 54 is poor, when the lifting rod 41 passes through the lifting through hole 22 in operation, the end part of the lifting rod 41 is matched with the lower sliding surface of the first inclined limiting stop rod 51, the first inclined limiting stop rod 51 drives away from the inside of the lifting through hole 22, the first sliding connecting rod 52 drives the first sliding block 53 to move in the direction close to the second sliding block 56, the second sliding block 56 drives the second inclined limiting stop rod 58 through the second sliding connecting rod 57, the second inclined limiting stop rod 58 is matched with the third inclined limiting stop rod 59 in an upward jacking mode through the third inclined limiting stop rod 59, the auxiliary limiting stop rod 50 can be lifted up after the auxiliary limiting stop rod is lifted, the left side and the right side of the base material when the base material is placed conveniently, the base material is placed accurately, and when the lifting rod 41 is far away from the lifting through hole 22, the reset spring 55 drives the first inclined limiting stop rod 51 and the second inclined limiting stop block 58 to reset.
Example 3: as shown in fig. 10, the first inclined surface sliding block 51 is configured into a disc shape capable of shielding the lifting through hole 22, that is, after the lifting rod 41 descends and the substrate is placed in the placing groove, the first inclined surface sliding block 51 is configured to shield the lifting through hole 22, and when the atomic deposition reaction is performed, atomic deposition on the bottom surface of the substrate is avoided, the bottom surface of the first inclined surface sliding block 51 is configured into an inclined surface capable of being matched with the end portion of the lifting rod 41, that is, when the lifting rod 41 passes through the lifting through hole 22 and pushes the first inclined surface sliding block 51, the lifting rod can be driven away from the inside of the lifting through hole 22.
When the device works, the arranged drivers drive the lifting rods 41 to move upwards, and sequentially drive the lifting holes 22 of the plurality of groups of carrier plates 21 until the upper ends of the lifting rods 41 penetrate through the inside of the lifting holes 22 of the uppermost group of carrier plates 21, then continue to move upwards for a certain distance, then grasp the first group of matrix materials through the arranged automatic grasping mechanisms and place the first group of matrix materials in the grooves at the upper ends of the four groups of lifting rods 41, so that the matrix materials are clamped between the four groups of lifting rods 41, then the arranged drivers drive the lifting rods 41 to move downwards slowly until the first group of matrix materials are placed in the grooves of the uppermost group of carrier plates 21, then the lifting rods 41 continue to move downwards until the upper ends of the lifting rods 41 are positioned above the second group of carrier plates 21 for a certain distance, then grasp the second group of matrix materials through the arranged automatic grasping mechanisms and place the second group of matrix materials in the grooves at the upper ends of the four groups of lifting rods 41, so that the matrix materials are clamped between the four groups of lifting rods 41, then the arranged drivers drive the lifting rods 41 to move downwards slowly until the second group of matrix materials are placed in the grooves of the second group of carrier plates 21, and the second group of carrier plates 21 are placed in sequence, and the carrier plates are placed in the grooves of the carrier plates 20; then, the driving element 31 drives the guide shaft 32 to move, so that the reaction chamber outer box door 12 moves towards the direction close to the reaction chamber outer box 11, and the reaction chamber outer box door 12 can drive the carrier disc 21 to move into the reaction chamber outer box 11 and close the reaction chamber outer box 11; when the atomic deposition reaction is carried out, air flow enters the inside of the reaction cavity outer box 11 through the inlet and blows the air flow to the matrix material placed in the placing groove of the carrier plate 21, so that the upper end of the matrix material can carry out the atomic deposition reaction, and further, a plurality of groups of matrix materials can be simultaneously subjected to the atomic deposition reaction, and the efficiency is high; after the atomic deposition reaction is finished, the driving element 31 drives the guide shaft 32 to move and open the reaction chamber outer box 11, and then drives the lifting rod 41 to slowly lift again, so that the upper end of the lifting rod 41 passes through the inside of the lifting through hole 22 of the carrier disc 21 of the lowest layer and lifts up the matrix material inside the placing groove of the carrier disc 21 of the lowest layer, so that the matrix material is far away from the placing groove, then the matrix material of the lowest layer is grabbed and taken out by the automatic grabbing mechanism, and then the arranged driver drives the lifting rod 41 to slowly lift up again, so that the upper end of the lifting rod 41 passes through the inside of the lifting through hole 22 of the carrier disc 21 of the lowest second layer and lifts up the matrix material of the lowest second layer, and so on until the matrix material inside the placing groove of the carrier disc 21 of the highest layer is taken out by the automatic grabbing mechanism.
Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (5)
1. The utility model provides a multi-disc formula is prevented around plating automatic chamber mechanism of getting and is put which characterized in that includes: the reaction chamber group (10), reaction chamber group (10) are including reaction chamber outer box (11), the inside of reaction chamber outer box (11) is equipped with the heater, the import has been seted up to one side of reaction chamber outer box (11), the opposite side of reaction chamber outer box (11) is connected with reaction chamber outer chamber door (12) through direction drive group (30), one side that reaction chamber outer chamber door (12) is close to reaction chamber outer box (11) is provided with carrier group (20), carrier group (20) are including a plurality of groups carrier dish (21), a plurality of groups carrier dish (21) are connected one side of reaction chamber outer chamber door (12), a plurality of groups carrier dish (21) upper end all sets up the standing groove that is used for placing matrix material, one side of carrier group (20) is provided with the mechanical claw group, can snatch matrix material and place it in lifting rod (41) upper end;
The lifting device comprises a carrier set (20), and is characterized by further comprising a lifting driving set (40), wherein the lifting driving set (40) is positioned below the carrier set (20), the lifting driving set (40) comprises a driver and a lifting rod (41), the output end of the driver is connected with the lifting rod (41), and a lifting through hole (22) matched with the lifting rod (41) is formed in the carrier disc (21);
An inner cavity is arranged in the reaction cavity outer box body (11), a heat shield is arranged in the inner cavity, and the heat shield is made of heat-insulating ceramic;
The distance between two adjacent groups of carrier plates (21) is equal, the lifting through holes (22) are arranged into four groups, each two groups of lifting through holes are respectively positioned at the front side and the rear side of the carrier plate (21), and one part of the lifting through holes (22) penetrates through the placing groove;
a groove is formed in one side, close to the placing groove, of the upper end of the lifting rod (41), one surface of the groove is a straight surface, and the straight surface of the groove and the edge of the placing groove are located on the same vertical surface;
The guide driving group (30) comprises a driving element (31) and a guide shaft (32), the driving element (31) is arranged at the corner position of one side of the reaction chamber outer box body (11) close to the reaction chamber outer box door (12), the output end of the driving element (31) is connected with the guide shaft (32), and one end of the guide shaft (32) is connected with the corner position of the reaction chamber outer box door (12);
The inside of promotion through-hole (22) is provided with shielding subassembly (23), shielding subassembly (23) are including connecting seat (24) and lotus flower separation blade (25), the inside of promotion through-hole (22) is installed through the bolt connecting seat (24), the through-hole has been seted up to the inside of connecting seat (24), the upper end of connecting seat (24) is provided with a plurality of groups lotus flower separation blade (25), a plurality of groups lotus flower separation blade (25) use the axis of promotion through-hole (22) is the centre of a circle and becomes the array setting, a plurality of groups lotus flower separation blade (25) all have the deformability, a plurality of groups the top of lotus flower separation blade (25) all with the top of promotion through-hole (22) flushes.
2. The multi-piece anti-coiling plating automatic cavity picking and placing mechanism according to claim 1, wherein: the lower end of the connecting seat (24) is provided with a cambered surface protruding downwards, so that the lower end of the connecting seat (24) protrudes out of the horizontal plane of the bottom surface of the carrier disc (21).
3. The multi-piece anti-coiling plating automatic cavity picking and placing mechanism according to claim 1, wherein: the left and right sides of carrier dish (21) all is provided with supplementary spacing pin (50), supplementary spacing pin (50) have smooth outer end, supplementary spacing pin (50) are including vertical section and slope section, the side of vertical section aligns with the side of standing groove, the slope section is inclined towards the direction of keeping away from the standing groove.
4. A multi-piece anti-coiling plating automatic cavity picking and placing mechanism according to claim 3, characterized in that: the inside of the carrier disc (21) is also provided with a driving part, the driving part comprises a first inclined plane sliding block (51), a first sliding connecting rod (52), a first piston block (53), a first piston channel (54), a return spring (55), a second piston block (56), a second sliding connecting rod (57), a second inclined plane sliding block (58) and a third inclined plane sliding block (59), the inside of the corner position of the carrier disc (21) is provided with the first piston channel (54), the piston channel (54) is L-shaped, the inside of the piston channel (54) close to one end of the lifting through hole (22) is provided with the first piston block (53), one end of the first piston block (53) is connected with the first sliding connecting rod (52), one end of the first sliding connecting rod (52) is connected with the first inclined plane sliding block (51), the inside of the carrier disc (21) is provided with a mounting groove matched with the first inclined plane sliding block (51), one end of the first sliding connecting rod (22) is provided with a second inclined plane sliding block (55), one end of the first sliding connecting rod (55) is connected with the second inclined plane sliding block (51), the utility model discloses a vehicle is characterized by comprising a carrier disc (21), an auxiliary limit stop lever (50) and a piston channel (54), wherein the upper end of the carrier disc (21) is provided with a vertical mounting groove matched with the auxiliary limit stop lever (50), the auxiliary limit stop lever (50) is positioned in the vertical mounting groove, the piston channel (54) is close to the inside of one end of the vertical mounting groove and is provided with a piston block II (56), one end of the piston block II (56) is connected with a sliding connection rod II (57), one end of the sliding connection rod II (57) is connected with an inclined plane sliding block II (58), the inside of the carrier disc (21) is also provided with a transverse groove matched with the inclined plane sliding block II (58), the transverse groove is communicated with the vertical mounting groove and is connected with the vertical mounting groove, and the lower end of the auxiliary limit stop lever (50) is connected with an inclined plane sliding block III (59) matched with the inclined plane sliding block II (58).
5. The multi-piece anti-coiling plating automatic cavity picking and placing mechanism according to claim 4, wherein: the first inclined surface sliding block (51) is in a disc shape capable of shielding the lifting through hole (22), and the bottom surface of the first inclined surface sliding block (51) is an inclined surface capable of being matched with the end part of the lifting rod (41).
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410475198.2A CN118073167B9 (en) | 2024-04-19 | 2024-04-19 | A multi-piece anti-winding plating automatic pick-and-place cavity mechanism |
| PCT/CN2024/112880 WO2025218076A1 (en) | 2024-04-19 | 2024-08-16 | Multi-substrate anti-backside-deposition automatic pick-and-place cavity mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410475198.2A CN118073167B9 (en) | 2024-04-19 | 2024-04-19 | A multi-piece anti-winding plating automatic pick-and-place cavity mechanism |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| CN118073167A CN118073167A (en) | 2024-05-24 |
| CN118073167B CN118073167B (en) | 2024-07-05 |
| CN118073167B9 true CN118073167B9 (en) | 2024-09-03 |
Family
ID=91111576
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202410475198.2A Active CN118073167B9 (en) | 2024-04-19 | 2024-04-19 | A multi-piece anti-winding plating automatic pick-and-place cavity mechanism |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN118073167B9 (en) |
| WO (1) | WO2025218076A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118073167B9 (en) * | 2024-04-19 | 2024-09-03 | 南京原磊纳米材料有限公司 | A multi-piece anti-winding plating automatic pick-and-place cavity mechanism |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200403136A (en) * | 2002-07-19 | 2004-03-01 | Aixtron Ag | Loading and unloading device for coating unit |
| CN212299942U (en) * | 2020-02-10 | 2021-01-05 | 拉普拉斯(无锡)半导体科技有限公司 | Lifting structure for film coating equipment |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1074814A (en) * | 1996-08-29 | 1998-03-17 | Kokusai Electric Co Ltd | Wafer transfer method and semiconductor manufacturing apparatus |
| DE102006018514A1 (en) * | 2006-04-21 | 2007-10-25 | Aixtron Ag | Apparatus and method for controlling the surface temperature of a substrate in a process chamber |
| KR20080075609A (en) * | 2007-02-13 | 2008-08-19 | 삼성전자주식회사 | Wafer Lift Assembly of Semiconductor Manufacturing Equipment |
| KR100941070B1 (en) * | 2007-05-10 | 2010-02-09 | 세메스 주식회사 | Apparatus for Processing Substrate Using Plasma |
| CN102644062A (en) * | 2012-03-30 | 2012-08-22 | 北京七星华创电子股份有限公司 | On-line atomic layer deposition device and deposition method |
| JP6419635B2 (en) * | 2014-04-23 | 2018-11-07 | 株式会社アルバック | Holding device, vacuum processing device |
| CN107627602A (en) * | 2017-09-30 | 2018-01-26 | 宁波华狮智能科技有限公司 | A kind of composite 3D printer and Method of printing |
| CN107904572B (en) * | 2017-12-19 | 2023-11-03 | 江苏微导纳米科技股份有限公司 | An atomic layer deposition automatic coating device |
| DE102019114249A1 (en) * | 2018-06-19 | 2019-12-19 | Aixtron Se | Arrangement for measuring the surface temperature of a susceptor in a CVD reactor |
| CN209276630U (en) * | 2018-07-02 | 2019-08-20 | 南京原磊纳米材料有限公司 | A kind of atomic layer deposition apparatus can and atomic layer deposition apparatus |
| CN109487228B (en) * | 2018-10-18 | 2023-02-21 | 芜湖研历光电科技有限公司 | Mask frame of plasma chemical vapor deposition equipment |
| CN110523909B (en) * | 2019-07-10 | 2021-02-05 | 南京航空航天大学 | An automatic nail feeding system and method based on robot vision |
| CN210826326U (en) * | 2019-11-29 | 2020-06-23 | 江西理工大学 | A physical chemical vapor deposition device |
| CN213772207U (en) * | 2020-02-10 | 2021-07-23 | 深圳市拉普拉斯能源技术有限公司 | PECVD coating machine |
| CN212795006U (en) * | 2020-05-12 | 2021-03-26 | 苏州欧力机器人有限公司 | Industrial robot gets a assembly quality fast |
| CN111471983A (en) * | 2020-05-28 | 2020-07-31 | 苏州拓升智能装备有限公司 | Substrate carrier, substrate carrier array and vapor deposition apparatus |
| CN113838732B (en) * | 2020-06-08 | 2023-10-31 | 中微半导体设备(上海)股份有限公司 | Focusing ring lifting mechanism, installation method and plasma processing device |
| CN212062407U (en) * | 2020-06-18 | 2020-12-01 | 苏州映真智能科技有限公司 | Full-automatic loading and unloading machine for silicon wafers |
| CN111705302B (en) * | 2020-08-18 | 2020-11-10 | 上海陛通半导体能源科技股份有限公司 | Vapor deposition equipment capable of realizing stable lifting of wafer |
| CN113643955A (en) * | 2021-08-09 | 2021-11-12 | 长鑫存储技术有限公司 | Semiconductor machine |
| CN115976489A (en) * | 2022-12-28 | 2023-04-18 | 苏州普锐仕精密光学科技有限公司 | Efficient and controllable diamond-like carbon film deposition device |
| CN117420365B (en) * | 2023-09-12 | 2024-07-12 | 法特迪精密科技（苏州）有限公司 | Chip test carrier, chip test equipment with same and chip test method |
| CN117845193B (en) * | 2024-03-08 | 2024-06-04 | 南京原磊纳米材料有限公司 | Atomic layer deposition device for multi-layer substrate |
| CN118073167B9 (en) * | 2024-04-19 | 2024-09-03 | 南京原磊纳米材料有限公司 | A multi-piece anti-winding plating automatic pick-and-place cavity mechanism |
-
2024
- 2024-04-19 CN CN202410475198.2A patent/CN118073167B9/en active Active
- 2024-08-16 WO PCT/CN2024/112880 patent/WO2025218076A1/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200403136A (en) * | 2002-07-19 | 2004-03-01 | Aixtron Ag | Loading and unloading device for coating unit |
| CN212299942U (en) * | 2020-02-10 | 2021-01-05 | 拉普拉斯(无锡)半导体科技有限公司 | Lifting structure for film coating equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2025218076A1 (en) | 2025-10-23 |
| CN118073167A (en) | 2024-05-24 |
| CN118073167B (en) | 2024-07-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN118073167B9 (en) | A multi-piece anti-winding plating automatic pick-and-place cavity mechanism | |
| CN206447294U (en) | The full-automatic type-setting machine of module product | |
| CN114887831B (en) | A wafer automatic glue coating equipment | |
| CN115097152A (en) | Full-automatic microorganism mass spectrum workstation | |
| CN207746156U (en) | A kind of automatic plate washing equipment for enzyme label plate | |
| CN113940238B (en) | Intelligent picking robot | |
| CN205928390U (en) | Gripper and battery pack equipment | |
| CN210765501U (en) | Wafer coating process device | |
| CN219009292U (en) | An executive device for loading and unloading containers | |
| CN206277860U (en) | A kind of feed mechanism of the automatic paving of mosaic | |
| CN116504686B (en) | Semiconductor heating plate based on liquid uniform temperature control | |
| CN203423150U (en) | Lamination workbench | |
| CN107512558A (en) | A kind of crankshaft cheek automatical feeding system | |
| CN218078792U (en) | Glue injection equipment capable of storing plates | |
| CN212102586U (en) | Automatic auxiliary line for automatic film coating | |
| CN216663212U (en) | Lens coating machine is used in optical lens processing | |
| CN212100903U (en) | Multifunctional automatic grabbing mechanism | |
| CN205790036U (en) | Tubular type PECVD graphite boat process point feeding device | |
| CN108807596A (en) | A kind of solar battery sheet integrally places glass panel device | |
| CN114904708B (en) | Automatic glue rolling equipment for PTC heating core insulating substrate | |
| CN223591998U (en) | Automatic tray filler for packing paper | |
| CN221987549U (en) | Automatic marking machine | |
| CN215560619U (en) | Movable three-dimensional heating device for vacuum heat treatment | |
| CN220895807U (en) | Automatic flaring liquid injection mechanism | |
| CN204927255U (en) | Wafer conveyor |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CI03 | Correction of invention patent |
Correction item: Denomination of Invention|Abstract|Claims|Description Correct: A multi piece anti winding plating automatic picking and placing chamber mechanism|correct False: A multi piece anti twist automatic picking and placing chamber mechanism|error Number: 27-02 Page: ?? Volume: 40 Correction item: Denomination of Invention Correct: A multi piece anti winding plating automatic picking and placing chamber mechanism False: A multi piece anti twist automatic picking and placing chamber mechanism Number: 27-02 Volume: 40 |
|
| CI03 | Correction of invention patent | ||
| OR01 | Other related matters | ||
| OR01 | Other related matters |