CN118007107A - Art pipe - Google Patents
Art pipe Download PDFInfo
- Publication number
- CN118007107A CN118007107A CN202410418848.XA CN202410418848A CN118007107A CN 118007107 A CN118007107 A CN 118007107A CN 202410418848 A CN202410418848 A CN 202410418848A CN 118007107 A CN118007107 A CN 118007107A
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- Prior art keywords
- tube
- inner tube
- spiral
- peripheral wall
- pipe
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- 230000002093 peripheral effect Effects 0.000 claims abstract description 51
- 238000000034 method Methods 0.000 claims abstract description 40
- 238000007789 sealing Methods 0.000 claims abstract description 29
- 229910000639 Spring steel Inorganic materials 0.000 claims description 49
- 239000012530 fluid Substances 0.000 claims description 30
- 239000012790 adhesive layer Substances 0.000 claims description 11
- 230000000903 blocking effect Effects 0.000 claims description 11
- 238000004891 communication Methods 0.000 claims description 7
- 238000001816 cooling Methods 0.000 claims description 6
- 239000000110 cooling liquid Substances 0.000 claims description 5
- 238000009434 installation Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims description 3
- 238000005452 bending Methods 0.000 claims description 2
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 238000005192 partition Methods 0.000 claims 2
- 239000012945 sealing adhesive Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 abstract description 54
- 239000004065 semiconductor Substances 0.000 abstract description 15
- 238000007747 plating Methods 0.000 abstract description 6
- 238000012545 processing Methods 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 description 16
- 238000005229 chemical vapour deposition Methods 0.000 description 15
- 239000012495 reaction gas Substances 0.000 description 14
- 239000010410 layer Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 239000010453 quartz Substances 0.000 description 7
- 230000008602 contraction Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229920001971 elastomer Polymers 0.000 description 5
- 238000003780 insertion Methods 0.000 description 5
- 230000037431 insertion Effects 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 4
- 238000005304 joining Methods 0.000 description 4
- 238000012423 maintenance Methods 0.000 description 4
- 230000002035 prolonged effect Effects 0.000 description 4
- 238000007493 shaping process Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000012634 fragment Substances 0.000 description 3
- 239000003292 glue Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000003466 welding Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45512—Premixing before introduction in the reaction chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The application relates to the technical field of semiconductor processing, and provides a process tube which comprises an inner tube, an outer tube and a spiral piece, wherein one end of the inner tube is hermetically arranged and provided with flow passage holes with two through sides; the outer tube is fixedly arranged on the outer peripheral side of the inner tube, one end of the outer tube, which is close to the runner hole, is hermetically arranged, and the other end of the outer tube is connected with the inner tube through a sealing structure; a gas flow channel is formed between the inner pipe and the outer pipe, the spiral piece is arranged in the gas flow channel, and the spiral piece is spirally extended along the axial direction of the inner pipe; the outer side wall of the inner pipe is respectively fixed with an air inlet flange and an air outlet flange, the air inlet flange is communicated with the air flow channel, and the air outlet flange is communicated with the inner part of the inner pipe. Based on this, uniformity after mixing various gases can be improved to facilitate formation of a plating layer or a thin film having a uniform thickness, thereby improving quality of the manufactured semiconductor chip.
Description
Technical Field
The application relates to the technical field of semiconductor processing, in particular to a process tube.
Background
Common thin film preparation methods in current production include physical Vapor Deposition (Physical Vapor Deposition, PVD for short), chemical Vapor Deposition (Chemical Vapor Deposition, CVD for short) and plasma Vapor Deposition (PLASMA CHEMICAL Vapor Deposition, PCVD for short); chemical Vapor Deposition (CVD) is a process technique in which reactive species chemically react under atmospheric conditions to produce a solid species that is deposited on the surface of a heated solid substrate, thereby producing a solid material. CVD is the most widely used preparation method at present, and can be applied to the preparation of oxide layers, insulating layers or conductive layers of semiconductor chips, and film forming processes on the surfaces of the chips.
The CVD process at the present stage is usually carried out in a process tube, wherein the process tube comprises an inner tube and an outer tube which are both in an open-ended structure; the outer tube is sleeved on the outer peripheral side of the inner tube and is coaxial with the inner tube, the opening side of the inner tube and the opening side of the outer tube are positioned on the same side, and the outer tube and the inner tube are blocked by the sealing component, so that a closed gas flow passage can be formed between the outer tube and the inner tube; the gas flow passage is communicated with the inside of the inner tube, and the semiconductor chip to be processed is placed in the inside of the inner tube. When chemical vapor deposition is carried out, reaction gas with chemical substances enters the inner tube through the gas flow passage, and the chemical substances can be deposited and grown on the surface of the chip by controlling the temperature and the pressure of the process tube, so that a plating layer or a film is formed.
However, in the process of forming certain special coatings, a plurality of reaction gases need to be introduced into the gas flow channels, and the specific number of the reaction gases can be two, three, four or even more; after various gases enter the inner tube and are deposited around the chip, the situation that the gas is unevenly mixed possibly affects the normal formation of a plating layer or a film on the surface of the chip and the situation that the thickness of the plating layer or the film is unevenly formed occurs is needed to be improved.
Disclosure of Invention
Based on the above, the application provides a process tube which can improve the uniformity of various gases after being mixed so as to be beneficial to forming a plating layer or a film with uniform thickness, thereby improving the quality of the manufactured semiconductor chip.
The technical scheme adopted by the process tube provided by the application is as follows:
a process tube comprises an inner tube, an outer tube and a spiral piece, wherein one end of the inner tube is arranged in a sealing way and is provided with flow passage holes with two through sides; the outer tube is fixedly arranged on the outer peripheral side of the inner tube, one end of the outer tube, which is close to the runner hole, is hermetically arranged, and the other end of the outer tube is connected with the inner tube through a sealing structure;
A gas flow channel is formed between the inner pipe and the outer pipe, the spiral piece is arranged in the gas flow channel, and the spiral piece is spirally extended along the axial direction of the inner pipe;
The outer side wall of the inner pipe is respectively fixed with an air inlet flange and an air outlet flange, the air inlet flange is communicated with the air flow channel, and the air outlet flange is communicated with the inner part of the inner pipe.
By adopting the technical scheme, the inner tube and the outer tube are mutually assembled to form the whole process tube, a gas flow channel is formed between the inner tube and the outer tube, various reaction gases are added into the gas flow channel through the air inlet flange, need to rise to the sealing end of the outer tube, enter the inner tube through the flow channel hole and are deposited around the semiconductor chip, so that the normal formation of a chip surface coating or film is facilitated; the flow path of the gases is effectively prolonged, so that various reaction gases have sufficient time for diffusion mixing.
In addition, the spiral piece arranged in the gas flow channel divides the gas flow channel into a spiral rotating channel path, so that the residence time of the reaction gas in the gas flow channel is prolonged, the reaction gas needs to rise along the spiral path, the mutual diffusion and mixing of various reaction gases are facilitated, and the uniformity of the mixed reaction gases is improved; the reaction gas can be heated in the gas flow channel for enough time to reach the temperature required by vapor deposition, so as to be favorable for forming a coating or film with uniform thickness, thereby improving the quality of the prepared semiconductor chip.
Optionally, the spiral member is partially wound with a plurality of coil spring steel strips, and all the coil spring steel strips are distributed at intervals along the spiral extending direction of the spiral member; one end of the coil spring steel belt is connected with the spiral piece, the other end of the coil spring steel belt is freely arranged, and when the spiral piece is arranged on the gas flow passage, the coil spring steel belt naturally relaxes and abuts against the inner peripheral wall of the outer tube and the outer peripheral wall of the inner tube.
Through adopting foretell technical scheme, through setting up a plurality of coil spring steel bands in the periphery side of screw, after inner tube and outer tube are assembled each other and are accomplished, utilize the outside tension and relaxation of coil spring steel band itself to make the screw position in the gas flow path keep, the contactless location between screw and inner tube, screw and the outer tube has been realized, and then in carrying out chemical vapor deposition, when heating the process tube, still can keep the interval with the screw after the expansion with heat and contraction with cold phenomenon appears in inner tube or outer tube, can effectively reduce the possibility that the cracked appears in inner tube or outer tube.
Optionally, the spiral piece comprises a plurality of spiral short pipes, and each spiral short pipe is sequentially arranged along the axial direction of the inner pipe; each coil spring steel belt is respectively and correspondingly arranged at the end part of each spiral short pipe, and adjacent coil spring steel belts are detachably connected through a connecting component.
By adopting the technical scheme, the spiral piece spirally arranged in the application has the defect of complex processing technology, and the possibility of cracking possibly caused by thermal expansion and contraction after being heated. The spiral piece is formed by mutually splicing the plurality of spiral short pipes, the length of a single spiral short pipe is short, the processing process is simple, when a part of the spiral short pipe is broken, the adjacent coil spring steel strip is separated by dismantling the connecting component, so that the broken spiral short pipe can be conveniently detached and replaced, the maintenance cost of the process pipe is reduced, and the economic benefit is improved.
Optionally, one end of the spiral short tube close to the adjacent spiral short tube is provided with an extension part, and the outer diameter of the extension part is smaller than that of the spiral short tube; one end of the extension part, which is far away from the spiral short pipe, is provided with a limiting part, and the outer diameter of the limiting part is larger than that of the extension part;
The coil spring steel belt comprises a narrow section and a wide section which are integrally formed, and one end of the narrow section, which is far away from the wide section, is connected with the extension part; the width of the wide segment is larger than that of the narrow segment, one side edge between the wide segment and the narrow segment is flush, and when the coil spring steel strip is in a natural relaxation state, an installation area for the limit part to be matched and clamped in is formed between the wide segment and the narrow segment; the connecting member is connected between two adjacent wide segments of adjacent coil spring steel strips.
Through adopting foretell technical scheme, when the coil spring steel band is in automatic relaxation state, the narrow fragment is shorter than the position of wide fragment and forms the installation region, through making spacing portion matching card go into spacing region in, the narrow fragment of coil spring steel band can support to paste in spacing portion and be close to the one end of place spiral nozzle stub, and then restriction coil spring steel band is to the direction removal that is close to adjacent spiral nozzle stub. Then, the connecting member is used for fixedly connecting two adjacent coil spring steel belts, so that the coil spring steel belts can be limited to move in the direction away from the adjacent spiral short pipes, and the two adjacent spiral short pipes can be stably connected.
Optionally, the screw member is welded and fixed to the outer peripheral wall of the inner tube, and a gap exists between the outer edge of the screw member and the inner peripheral wall of the outer tube.
Through adopting foretell technical scheme, through being fixed in the inner tube peripheral wall with the screw welding, the installation of screw of can being convenient for is fixed to the biggest external diameter of screw is less than the internal diameter of outer tube, can reduce the butt between screw and the outer tube inner wall when the outer tube cover locates the inner tube, in order to do benefit to the smooth equipment of outer tube and inner tube. In addition, after the outer tube and the inner tube are assembled, a gap exists between the spiral piece and the inner peripheral wall of the outer tube, and after the outer tube is subjected to expansion with heat and contraction with cold, the gap can be kept between the spiral piece and the spiral piece, so that the possibility that the outer tube or the spiral piece is broken is effectively reduced.
Optionally, the sealing structure comprises a supporting baffle arranged on the outer peripheral wall of the inner tube and a fixed baffle arranged on the outer edge of the open end of the outer tube; the outer edge of the supporting baffle piece, which is close to one side of the fixed baffle table, is provided with a ring convex part, and an inserting space for the outer tube to enter is formed between the ring convex part and the outer peripheral wall of the inner tube;
The fixed blocking table comprises an inserting part for being matched and inserted with the inserting space and a blocking part for being abutted against the annular convex part, the outer peripheral wall of the inserting part and the outer end face of the blocking part are coated with a high-temperature resistant adhesive layer together, the outer peripheral wall of the inserting part is sleeved with a sealing rubber sleeve, and the sealing rubber sleeve is positioned on one side of the high-temperature resistant adhesive layer away from the blocking part;
the support baffle is also internally provided with a fluid cavity, and the outer side of the support baffle is provided with a cooling mechanism for adding cooling liquid into the fluid cavity.
Through adopting foretell technical scheme, through setting up support fender piece and fixed fender platform, after the outer tube cover was located the inner tube periphery side, the fender portion of fixed fender platform was supported in the ring convex part of support fender piece, and the grafting portion can get into and insert and establish the space inside, and the inner side inner wall in inserting establishing the space can be hugged closely to the sealed gum cover that utilizes grafting portion periphery wall, improves the leakproofness between support fender piece and the fixed fender platform, and then improves the sealed effect between inner tube and the outer tube. In addition, the high temperature resistant glue layer can play the effect of sealing and heat insulation to utilize cooling mechanism to add the coolant liquid to the inside circulation of fluid chamber, can take away the heat that supports the fender piece, and then reduce the inside temperature in space of inserting, be favorable to making the sealed gum cover keep good life.
Optionally, an inner concave ring groove is arranged on the inner peripheral wall of the ring convex part; one end of the plugging part, which is far away from the resisting part, is adhered with a bag, magnetorheological fluid is filled in the bag, and when the plugging part is plugged in the plugging space and abuts against the supporting baffle, the bag is pressed and deformed to enter the inner concave ring groove.
By adopting the technical scheme, under the normal state, magnetorheological fluid in the bag is in a fluid state, and the bag can gradually prop against the supporting baffle piece and force the bag to deform by inserting the inserting part into the inserting space, and finally the bag deforms and enters the inner concave ring groove; when chemical vapor deposition is carried out, the bag is in a magnetic field environment, and the magnetorheological fluid gradually has the characteristics of high viscosity and low fluidity, so that the inner tube and the outer tube can be well connected. After the reaction is finished, the bag is not in a magnetic field environment any more, and the magnetorheological fluid is restored to a fluid state at the moment, so that an operator can conveniently dismantle the inner tube and the outer tube for cleaning, and meanwhile, whether the spiral short tube is locally cracked or not can be conveniently checked, and further, the maintenance and the replacement can be timely carried out.
Optionally, the sealing structure comprises an outer ring baffle table arranged on the outer peripheral wall of the inner pipe, a forming part which is arranged in a bending way is integrally formed on the outer ring baffle table, a first mounting hole for fixing the air inlet flange is formed on the outer wall of the forming part, and a communication groove communicated with the first mounting hole is formed on the side surface of the forming part; the end wall protrusion of the open end of outer tube is equipped with inserts and joins in marriage the portion, inserts and joins in marriage the laminating with the shaping portion after the inner tube is located to the outer tube cover, and the intercommunication groove just is just to communicating in the gas runner.
Through adopting foretell technical scheme, the flange that admits air can be fixed in the inner tube periphery after installing in the first mounting hole of shaping portion, after the inner tube is located to the outer tube cover, the joining in marriage the portion of inserting of outer tube and can match the laminating with the shaping portion of inner tube, and then makes intercommunication groove and gas runner match the intercommunication, and reaction gas can be in proper order through flange and intercommunication groove, add to gas runner inside smoothly.
Optionally, a uniform flow baffle is fixed on the inner peripheral wall of the inner tube, and the uniform flow baffle is positioned at one end of the inner tube close to the flow passage hole; the uniform flow baffle is provided with a plurality of uniform flow holes in a penetrating way, and all the uniform flow holes are uniformly distributed on the surface of the uniform flow baffle.
By adopting the technical scheme, through setting up the uniform flow baffle, reaction gas needs to diffuse to each uniform flow hole after entering the gas runner through the uniform flow baffle, and then enters the inner tube inside through the uniform flow hole, is favorable to further improving the homogeneity after various reaction gas mixes.
Optionally, the device further comprises a thermocouple tube arranged on the inner side of the inner tube, wherein the outer peripheral wall of the inner tube is provided with a perforation, and the thermocouple tube is fixed on the perforation; the temperature sensing end of the thermocouple tube is positioned at the inner side of the inner tube, and the detection end of the thermocouple tube extends to the outer side of the inner tube.
By adopting the technical scheme, through setting up the thermocouple tube, make the temperature sensing end of thermocouple tube stretch into the inner tube inboard, the operating personnel can follow the temperature of the detection end survey temperature sensing end place region of thermocouple tube, and then monitor the inside reaction gas temperature of inner tube when carrying out chemical vapor deposition, ensure the quality of the semiconductor chip that prepares.
In summary, the present application includes at least one of the following beneficial technical effects:
1. The inner pipe and the outer pipe are mutually assembled to form the whole process pipe, a plurality of reaction gases are added into the gas flow passage through the air inlet flange, are required to rise to the sealing end of the outer pipe, enter the inner pipe through the flow passage hole and are deposited around the semiconductor chip, and the flow path of the gases is effectively prolonged, so that the various reaction gases are fully diffused and mixed for a long time;
2. The gas flow channel is divided into the channels which are spirally wound by the spiral piece, so that the residence time of the reaction gas in the gas flow channel is prolonged, the reaction gas needs to rise along a spiral path, the mutual diffusion and mixing of various reaction gases are facilitated, and the uniformity of the mixed reaction gases is improved;
3. Through setting up a plurality of wind spring steel bands in the periphery side of screw, can realize the contactless location between screw and inner tube, screw and the outer tube, and then after heating the technology pipe, still can keep the interval with the screw after the expansion with heat and contraction phenomenon appears in inner tube or outer tube, can effectively reduce the cracked possibility of inner tube or outer tube appearance.
Drawings
FIG. 1 is a schematic view of the process tube of example 1 in semi-section;
FIG. 2 is an enlarged view at A in FIG. 1;
FIG. 3 is a schematic view showing the structure of the outer tube in accordance with embodiment 1;
Fig. 4 is an enlarged view at B in fig. 1;
FIG. 5 is a partial view of the gas flow channel in example 2, mainly showing the manner in which the screw is positioned and held between the inner tube and the outer tube;
FIG. 6 is a schematic view showing the structure of a coil spring steel strip and a coil pipe in example 2;
FIG. 7 is a schematic view showing the assembly and disassembly of adjacent helical piping in example 2;
FIG. 8 is a schematic view of a seal structure portion of a process tube in example 3;
Fig. 9 is an enlarged view at C in fig. 8.
Reference numerals illustrate: 1. an inner tube; 11. a flow passage hole; 12. an outer ring baffle; 121. a molding part; 122. a communication groove; 123. a first mounting hole; 13. a support stopper; 131. a ring protrusion; 132. an inner concave ring groove; 133. a fluid chamber; 134. a liquid inlet; 14. perforating; 15. a flange plate; 16. a second mounting hole;
2. An outer tube; 21. a fixed baffle; 211. a plug-in part; 212. a resisting part; 213. sealing the rubber sleeve; 214. a high temperature resistant adhesive layer; 215. a pouch; 216. magnetorheological fluid; 22. an insertion portion; 3. a screw; 31. a spiral short pipe; 32. an extension; 321. a V-shaped groove; 33. a limit part;
4. A thermocouple tube; 5. a gas flow passage; 6. an air inlet flange; 7. an exhaust flange; 8. a uniform flow baffle; 81. a uniform flow hole; 9. a coiled spring steel strip; 91. a connecting member; 92. a narrow segment; 93. a wide segment; 94. and (3) a mounting area.
Detailed Description
The application is described in further detail below with reference to fig. 1-9.
Example 1
The embodiment of the application discloses a process tube.
Referring to fig. 1, a process tube comprises an inner tube 1, an outer tube 2, a screw member 3 and a thermocouple tube 4, wherein the inner tube 1, the outer tube 2 and the screw member 3 are all made of quartz materials, and the process tube has the characteristics of high temperature resistance and corrosion resistance and is a common raw material for chemical vapor deposition in semiconductor processing.
Wherein one end of the inner tube 1 is sealed, and the other end is arranged in an open way; referring to fig. 2, the sealing end of the inner tube 1 is provided with two through runner holes 11, and the runner holes 11 and the inner tube 1 are coaxially arranged; the inner tube 1 is internally fixed with a uniform flow baffle plate 8, the uniform flow baffle plate 8 is close to the sealing end of the inner tube 1, the uniform flow baffle plate 8 is communicated with a plurality of uniform flow holes 81, and all the uniform flow holes 81 are uniformly distributed on the surface of the uniform flow baffle plate 8 and are used for improving the uniformity of the reaction gas after entering the inner tube 1. The outer edge integrated into one piece of the open end of inner tube 1 is provided with ring flange 15, and the setting of ring flange 15 can be used for fixed quartz base, and the open end of inner tube 1 is in sealed state after the quartz base is fixed in ring flange 15.
The inner diameter of the outer tube 2 is larger than the outer diameter of the inner tube 1, the outer tube 2 is sleeved on the outer periphery side of the inner tube 1, and the outer tube 2 and the inner tube 1 are kept coaxial; the outer tube 2 is arranged close to one end of the runner hole 11 in a sealing way, and the other end of the outer tube 2 is connected with the inner tube 1 through a sealing structure, so that a gas runner 5 is formed between the inner tube 1 and the outer tube 2. The spiral piece 3 is arranged in the gas flow passage 5, and the spiral piece 3 is spirally extended along the axial direction of the inner tube 1; in the embodiment, the cross section of the screw 3 is rectangular, the inner side surface of the screw 3 is welded and fixed with the outer peripheral wall of the inner tube 1, and the used solder is quartz; a gap exists between the outer side surface of the screw 3 and the inner wall of the outer tube 2.
Referring to fig. 3, the sealing structure includes an outer ring baffle 12 disposed on the outer peripheral wall of the inner tube 1, the outer ring baffle 12 and the inner tube 1 are integrally formed, and the outer diameter of the outer ring baffle 12 is not smaller than the outer diameter of the outer tube 2; in the embodiment, after the outer tube 2 is sleeved on the inner tube 1, the open end of the outer tube 2 is abutted against the side surface of the outer ring baffle table 12, and the two are fixed through inorganic high-temperature adhesive; the specific components of the inorganic high-temperature glue are known to those skilled in the art, and can resist the high temperature of more than 1000 ℃ so as to ensure the stable connection between the outer tube 2 and the inner tube 1 and maintain good sealing.
The outer ring baffle 12 is naturally provided with a forming part 121 which is bent during forming, and the forming part 121 is convexly arranged towards the direction close to the open end of the inner tube 1; the end protrusion of the open end of outer tube 2 is provided with inserts joining in marriage portion 22, inserts joining in marriage portion 22 and outer tube 2 integrated into one piece and makes, and when outer tube 2 supported in outer loop fender platform 12, inserts joining in marriage portion 22 can match and laminate in shaping portion 121.
Referring to fig. 4, a communication groove 122 is formed on the side surface of the forming part 121, which is close to the outer tube 2, and a first mounting hole 123 communicated with the communication groove 122 is formed on the outer wall of the forming part 121, which is far away from the inner tube 1; the air inlet flange 6 fixed on the first mounting hole 123 is arranged on the outer side of the inner tube 1, and the air inlet flange 6 and the first mounting hole 123 can be fixed in a welding mode or an inorganic high-temperature adhesive mode, and can be selectively arranged according to actual needs.
After the outer tube 2 is sleeved on the outer peripheral side of the inner tube 1 and is adhered and fixed with the outer ring baffle 12, the communication groove 122 can be directly communicated with the gas flow channel 5, and the reaction gas can be added into the gas flow channel 5 through the gas inlet flange 6; referring back to fig. 3, it should be noted that, in this embodiment, the axial direction of the outer ring baffle 12 and the axial direction of the inner tube 1 are disposed at an acute angle, and correspondingly, the open end of the inner tube 1 is also disposed as an inclined surface, so that the outer tube 2 can be positioned at an angle when the outer tube 2 is sleeved on the inner tube 1, which is beneficial to the smooth mating and plugging of the plugging portion 22 and the forming portion 121.
In addition, the outer side of the inner pipe 1 is provided with an exhaust flange 7, the outer peripheral wall of the inner pipe 1 is provided with a second mounting hole 16 communicated with the inner part, and the exhaust flange 7 is fixedly connected with the second mounting hole 16; the fixing manner of the exhaust flange 7 is the same as that of the intake flange 6, and will not be described here again.
Returning to fig. 1, the outer peripheral wall of the inner tube 1 is further provided with a plurality of perforations 14, each perforation 14 being in communication with the interior of the inner tube 1; the number of thermocouple tubes 4 is equal to the number of perforations 14, each thermocouple tube 4 is fixed inside each perforation 14, in this embodiment, the specific number of thermocouple tubes 4 is 5, and all thermocouple tubes 4 are arranged side by side along the circumferential direction of the inner tube 1; in other embodiments, the number of the thermocouple tubes 4 can be 3, 4 or 6, and the thermocouple tubes can be selectively set according to actual needs.
The temperature sensing ends of the thermocouple tubes 4 are positioned at the inner side of the inner tube 1, and the temperature sensing ends of different thermocouple tubes 4 are positioned at different positions so as to be beneficial to measuring the temperature of the reaction gas at each position inside the inner tube 1; the detecting end of the thermocouple tube 4 extends to the outer side of the inner tube 1 for measurement by operators, so that the temperature of the reaction gas in the inner tube 1 is monitored, and the quality of the manufactured semiconductor chip is ensured.
The implementation principle of the embodiment 1 of the application is as follows:
The process tube of the embodiment is in a vertical state when in use and is placed in a heating environment; the semiconductor chip can be located inside the inner tube 1 by placing the semiconductor chip on a quartz boat and then mounting the quartz boat on a quartz susceptor. Then, a plurality of reaction gases are added into the gas flow channel 5 through the gas inlet flange 6, the reaction gases are fully mixed and absorb heat and raise temperature in the gas flow channel 5 along the spiral extending direction of the spiral piece 3, finally enter the inner tube 1 after passing through the flow channel hole 11 and the uniform flow hole 81 in sequence, and are deposited around the semiconductor chip downwards, so that a plating layer or a film with uniform thickness can be gradually formed on the surface of the chip through chemical reaction; the reaction gases and the gases produced by the chemical reaction are finally discharged via the exhaust flange 7.
Example 2
The embodiment of the application discloses a process tube.
Referring to fig. 5, in the process tube disclosed in the embodiment of the present application, the other components are the same as those in embodiment 1, and are not described in detail herein; the difference from embodiment 1 is that the cross-sectional shape of the screw member 3 is set to be circular in this embodiment, the screw member 3 is partially wound with a plurality of coil spring steel strips 9, and the coil spring steel strips 9 are arranged at intervals along the direction of spiral extension of the screw member 3; when the outer tube 2 is sleeved on the inner tube 1, the outer tube 2 is propped against the outer ring baffle 12 and is adhered and fixed with the outer ring baffle 12, the coil spring steel belt 9 is in a natural relaxation state, and can be propped against the inner peripheral wall of the outer tube 2 and the outer peripheral wall of the inner tube 1 at the same time, so that the positioning and the holding of the spiral piece 3 are realized.
Here, in order to increase the frictional resistance between the coil spring steel strip 9 and the inner peripheral wall of the outer tube 2 and between the coil spring steel strip 9 and the outer peripheral wall of the inner tube 1, the outer ring surface of the coil spring steel strip 9 may be roughened by polishing. After the process tube is assembled, gaps are reserved between the spiral piece 3 and the outer peripheral wall of the inner tube 1 and between the spiral piece 3 and the inner peripheral wall of the outer tube 2, so that the possibility of cracking of the inner tube 1 and the outer tube 2 due to expansion caused by heat and contraction caused by cold is reduced.
Referring to fig. 6, the screw 3 includes a plurality of helical short pipes 31, each helical short pipe 31 being arranged in order along the axial direction of the inner pipe 1; an extension part 32 is arranged at one end of each spiral short tube 31 close to the adjacent spiral short tube 31, the extension part 32 and the spiral short tube 31 are integrally formed, and the outer diameter of the extension part 32 is smaller than the outer diameter of the spiral short tube 31; one end of the extending part 32 far away from the spiral short pipe 31 is provided with a limiting part 33, the limiting part 33 can be fixed on the extending part 32 in a welding mode, and the outer diameter of the limiting part 33 is larger than that of the extending part 32. Referring to fig. 7 at the same time, the number of coil spring steel strips 9 is equal to the number of the limit parts 33, and each coil spring steel strip 9 is correspondingly installed to each limit part 33; a connecting member 91 is provided between the two coil spring steel strips 9 separately provided to the adjacent stopper 33, and the two coil spring steel strips 9 can be detachably connected by the connecting member 91.
Returning to fig. 6, the coiled spring steel strip 9 includes an integrally formed narrow section 92 and wide section 93; wherein, the end surface of the extension part 32 far away from the spiral short tube 31 is provided with a V-shaped groove 321, and two ends of the V-shaped groove 321 respectively penetrate through the peripheral wall of the extension part 32; the end of the narrow segment 92 far away from the wide segment 93 is matched and installed inside the V-shaped groove 321, and the end of the wide segment 93 far away from the narrow segment 92 is freely arranged. It should be noted that, the width of the wide segment 93 is greater than that of the narrow segment 92, one side edge of the wide segment 93 is flush with one side edge of the narrow segment 92, and the other side edge of the wide segment 93 is shorter than the narrow segment 92, so that when the coiled spring steel strip 9 is in a natural relaxation state, a mounting area 94 can be formed between the wide segment 93 and the narrow segment 92, and the limiting portion 33 can be engaged into the mounting area 94 in a matching manner, so as to limit the coiled spring steel strip 9 to move in a direction approaching to the adjacent coiled pipe 31.
The connecting member 91 in this embodiment is a ring-shaped hook needle, and the connecting member 91 is disposed through the wide segments 93 of two adjacent coiled spring steel strips 9, so as to limit the movement of the coiled spring steel strips 9 in a direction away from the adjacent coiled pipe 31, so that the two coiled pipe 31 are firmly connected. It will be appreciated that there may be a plurality of connecting members 91 to improve the securement of two adjacent coil spring strips 9 after connection.
The implementation principle of the embodiment 2 of the application is as follows:
After the screw member 3 of the embodiment is mounted on the outer peripheral side of the inner tube 1, the outer tube 2 is sleeved on the inner tube 1, the outer tube 2 and the outer ring baffle 12 are adhered and fixed, and the non-contact positioning between the screw member 3 and the inner tube 1 and between the screw member 3 and the outer tube 2 can be realized by utilizing the friction resistance between the coil spring steel strip 9 and the inner peripheral wall of the outer tube 2 and between the coil spring steel strip 9 and the outer peripheral wall of the inner tube 1, so that the possibility of fracture when the inner tube 1 or the outer tube 2 is abutted against the screw member 3 due to the heat expansion and cold contraction phenomenon is reduced. In addition, the spiral piece 3 is formed by assembling the spiral short pipes 31, when a part of a certain spiral short pipe 31 is broken, the adjacent coil spring steel belts 9 can be conveniently separated by dismantling the connecting member 91, and the broken spiral short pipe 31 can be conveniently dismantled and replaced after the coil spring steel belts 9 are dismantled, so that the maintenance cost of a process pipe is reduced, and the economic benefit is improved.
Example 3
The embodiment of the application discloses a process tube.
Referring to fig. 8, in the process tube disclosed in the embodiment of the present application, the other components are the same as those in embodiment 2, and are not described in detail herein; the difference from embodiment 1 is that the seal structure in this embodiment includes the support stopper 13 and the fixed stopper 21, both of which are made of an alloy material of low thermal conductivity, and in this embodiment, the support stopper 13 is adhesively fixed to the outer peripheral wall of the outer ring stopper 12.
In another embodiment, the outer circumferential wall of the inner tube 1 may be directly bonded to the outer circumferential wall of the inner tube 1 without providing the outer ring stopper 12.
In addition, in the present embodiment, the axial direction of the outer ring stopper 12 is disposed in the same direction as the axial direction of the inner tube 1 to facilitate the mounting and fixing of the support stopper 13.
The side of the supporting baffle 13, which is close to the fixed baffle table 21, is provided with an integrally formed annular convex part 131, the annular convex part 131 is positioned at the outer edge of the fixed baffle table 21, and the inner diameter of the annular convex part 131 is larger than the outer diameter of the inner tube 1, so that an inserting space is formed between the annular convex part 131 and the outer peripheral wall of the inner tube 1, and when the outer tube 2 is sleeved on the inner tube 1, the end part of the outer tube 2 can enter the inserting space. Referring to fig. 9, an inner circumferential wall of the ring protrusion 131 is provided with an inner concave groove 132, the inner concave groove 132 is located at a transition position between the ring protrusion 131 and the support stopper 13, and a groove width of the inner concave groove 132 gradually increases from a groove opening position of the inner concave groove 132 to a groove bottom position.
The fixed blocking table 21 comprises an integrally formed inserting part 211 and a blocking part 212, the inserting part 211 is sleeved on the outer peripheral side of the outer tube 2, and the inserting part 211 and the outer tube 2 are fixedly bonded, so that the fixed blocking table 21 is fixedly bonded to the outer tube 2; the plug part 211 is positioned at the outer edge of the open end of the outer tube 2, and the peripheral wall of the plug part 211 is sleeved with a sealing rubber sleeve 213.
The resisting part 212 is positioned at one side of the plug-in part 211 away from the open end of the outer tube 2, and the resisting part 212 is vertical to the plug-in part 211; the outer peripheral wall of the plugging portion 211 and the outer end surface of the resisting portion 212 are coated with a high temperature resistant adhesive layer 214, and the sealing rubber sleeve 213 is located on one side of the high temperature resistant adhesive layer 214 away from the resisting portion 212. During specific processing, the fixed baffle table 21 is placed in the special die, and an injection gap for injecting high-temperature-resistant waterproof glue is formed between the fixed baffle table 21 and the inner wall of the die; the inner wall of the mold is coated with a non-adhesive layer, and the high-temperature-resistant adhesive layer 214 can be formed after the high-temperature-resistant adhesive layer is solidified by injecting the high-temperature-resistant adhesive into the injection gap.
After the end part of the outer tube 2 enters the insertion space, the insertion part 211 is also positioned in the insertion space, and the sealing gum cover 213 can be utilized to keep the sealing between the insertion part 211 and the ring convex part 131, so that the gas flow passage 5 can keep good sealing effect; at this time, the high temperature resistant adhesive layer 214 can abut against the end face of the annular convex portion 131, thereby achieving the effect of sealing and heat insulation.
The end surface of the plug-in part 211, which is far away from the resisting part 212, is provided with a mounting groove which penetrates through the side surface of the plug-in part 211, which is far away from the outer tube 2; a bag 215 is arranged in the mounting groove in a matching way, and magnetorheological fluid 216 is filled in the bag 215; the pouch 215 in this embodiment is made of a heat resistant flexible material, such as silica glass fiber or silicone rubber, etc.; in a normal state, the magnetorheological fluid 216 is in a fluid state, and when the plug-in part 211 is plugged into the plug-in space and is abutted against the supporting baffle 13, the bag 215 can be pressed and deformed and enter the inner concave ring groove 132; when chemical vapor deposition is performed, the bag 215 is placed in a magnetic field environment, and the magnetorheological fluid 216 gradually has the characteristics of high viscosity and low fluidity, so that the inner tube 1 and the outer tube 2 can be well connected.
In addition, the support baffle 13 is internally provided with a fluid cavity 133, and the cross-sectional shape of the fluid cavity 133 is arc-shaped; the inner wall of the fluid chamber 133 is provided with a fluid inlet 134 and a fluid outlet (shown in the figure), both of which are communicated with the outer peripheral wall of the supporting baffle 13, and the fluid inlet 134 and the fluid outlet are respectively arranged at two side ends of the fluid chamber 133 in the arc direction.
The outside of the supporting baffle 13 is also provided with a cooling mechanism for adding cooling liquid into the fluid cavity 133, the cooling mechanism comprises a circulation box, a liquid inlet pipe and a liquid outlet pipe, one end of the liquid inlet pipe is connected with the circulation box, and the other end is connected with the liquid inlet 134; one end of the liquid discharge pipe is connected to the circulation box, the other end of the liquid discharge pipe is connected to the liquid discharge port, and a pump valve for circularly pumping cooling liquid and a refrigerating component for cooling the cooling liquid are arranged in the circulation box.
The implementation principle of the embodiment 3 of the application is as follows:
After the outer tube 2 of the embodiment is sleeved on the outer periphery of the inner tube 1, the bag 215 is propped against the side surface of the supporting baffle 13 and is pressed and deformed into the inner concave ring groove 132, and when chemical vapor deposition is carried out, the magnetorheological fluid 216 in the bag 215 gradually presents the characteristics of high viscosity and low fluidity by enabling the bag 215 to be in a magnetic field environment, so that good connection between the inner tube 1 and the outer tube 2 can be maintained; in the normal state, the magnetorheological fluid 216 is restored to the fluid state, and the outer tube 2 can be conveniently forced to be separated from the inner tube 1 by directly pumping the outer tube 2, so that the inner tube 1, the outer tube 2 or the screw 3 can be conveniently damaged for maintenance and replacement.
The above is a preferred embodiment of the present application, and is not intended to limit the scope of the present application in this way, therefore: all equivalent changes in structure, shape and principle of the application should be covered in the scope of protection of the application.
Claims (10)
1. A process tube, characterized in that: the device comprises an inner pipe (1), an outer pipe (2) and a spiral piece (3), wherein one end of the inner pipe (1) is arranged in a sealing way and is provided with runner holes (11) with two through sides; the outer tube (2) is fixedly arranged on the outer peripheral side of the inner tube (1), one end, close to the runner hole (11), of the outer tube (2) is arranged in a sealing mode, and the other end of the outer tube (2) is connected with the inner tube (1) through a sealing structure;
A gas flow channel (5) is formed between the inner tube (1) and the outer tube (2), the spiral piece (3) is arranged inside the gas flow channel (5), and the spiral piece (3) is spirally extended along the axial direction of the inner tube (1);
the inner pipe (1) outer side wall is fixed with respectively and admits air flange (6) and exhaust flange (7), admit air flange (6) and gas runner (5) are linked together, exhaust flange (7) are linked together with inner pipe (1) inside.
2. The process tube of claim 1, wherein: the spiral piece (3) is partially wound with a plurality of coil spring steel bands (9), and all the coil spring steel bands (9) are distributed at intervals along the spiral extending direction of the spiral piece (3); one end of the coil spring steel strip (9) is connected with the spiral piece (3), the other end of the coil spring steel strip is freely arranged, and after the spiral piece (3) is installed on the gas flow passage (5), the coil spring steel strip (9) naturally relaxes and abuts against the inner peripheral wall of the outer tube (2) and the outer peripheral wall of the inner tube (1).
3. The process tube of claim 2, wherein: the spiral piece (3) comprises a plurality of spiral short pipes (31), and each spiral short pipe (31) is sequentially arranged along the axial direction of the inner pipe (1); each coil spring steel strip (9) is respectively and correspondingly arranged at the end part of each spiral short pipe (31), and the adjacent coil spring steel strips (9) are detachably connected through a connecting component (91).
4. A process tube according to claim 3, wherein: an extension part (32) is arranged at one end of the spiral short pipe (31) close to the adjacent spiral short pipe (31), and the outer diameter of the extension part (32) is smaller than that of the spiral short pipe (31); one end of the extension part (32) far away from the spiral short pipe (31) is provided with a limiting part (33), and the outer diameter of the limiting part (33) is larger than that of the extension part (32);
The coil spring steel belt (9) comprises a narrow segment (92) and a wide segment (93) which are integrally formed, and one end, far away from the wide segment (93), of the narrow segment (92) is connected with the extension part (32); the width of the wide segment (93) is larger than that of the narrow segment (92), one side edge between the wide segment (93) and the narrow segment (92) is flush, and when the coil spring steel strip (9) is in a natural relaxation state, an installation area (94) for the limit part (33) to be matched and clamped in is formed between the wide segment (93) and the narrow segment (92); the connecting member (91) is connected between two adjacent wide segments (93) of adjacent coil spring strips (9).
5. The process tube of claim 1, wherein: the spiral piece (3) is welded and fixed on the outer peripheral wall of the inner tube (1), and a gap exists between the outer edge of the spiral piece (3) and the inner peripheral wall of the outer tube (2).
6. The process tube of claim 1, wherein: the sealing structure comprises a supporting baffle (13) arranged on the peripheral wall of the inner tube (1) and a fixed baffle (21) arranged on the outer edge of the open end of the outer tube (2); the outer edge of the supporting baffle (13) close to one side of the fixed baffle table (21) is provided with a ring convex part (131), and an inserting space for the outer tube (2) to enter is formed between the ring convex part (131) and the outer peripheral wall of the inner tube (1);
The fixing blocking table (21) comprises a plugging part (211) for being matched and plugged with the plugging space and a blocking part (212) for being abutted against the annular convex part (131), the outer peripheral wall of the plugging part (211) and the outer end face of the blocking part (212) are jointly coated with a high-temperature-resistant adhesive layer (214), the outer peripheral wall of the plugging part (211) is sleeved with a sealing adhesive sleeve (213), and the sealing adhesive sleeve (213) is positioned on one side, far away from the blocking part (212), of the high-temperature-resistant adhesive layer (214);
the inside of the supporting baffle (13) is also provided with a fluid cavity (133), and the outside of the supporting baffle (13) is provided with a cooling mechanism for adding cooling liquid into the fluid cavity (133).
7. The process tube of claim 6, wherein: an inner concave ring groove (132) is formed in the inner peripheral wall of the ring convex part (131); one end of the inserting part (211) far away from the resisting part (212) is adhered with a bag (215), magnetorheological fluid (216) is filled in the bag (215), and when the inserting part (211) is inserted into the inserting space and abuts against the supporting baffle (13), the bag (215) is pressed and deformed to enter the inner concave ring groove (132).
8. The process tube of claim 1, wherein: the sealing structure comprises an outer ring baffle table (12) arranged on the outer peripheral wall of the inner pipe (1), a forming part (121) which is arranged in a bending way is integrally formed on the outer ring baffle table (12), a first mounting hole (123) for fixing the air inlet flange (6) is formed in the outer wall of the forming part (121), and a communication groove (122) communicated with the first mounting hole (123) is formed in the side face of the forming part (121);
the end wall protrusion of the open end of the outer tube (2) is provided with an inserting and matching part (22), when the outer tube (2) is sleeved on the inner tube (1), the inserting and matching part (22) is matched with the forming part (121), and the communicating groove (122) is just opposite to the communicating gas flow passage (5).
9. The process tube of claim 1, wherein: the inner peripheral wall of the inner pipe (1) is fixed with a uniform flow baffle (8), and the uniform flow baffle (8) is positioned at one end of the inner pipe (1) close to the runner hole (11); the uniform flow partition plate (8) is provided with a plurality of uniform flow holes (81) in a penetrating mode, and all the uniform flow holes (81) are uniformly distributed on the surface of the uniform flow partition plate (8).
10. The process tube of claim 1, wherein: the thermocouple tube (4) is arranged at the inner side of the inner tube (1), a perforation (14) is arranged on the peripheral wall of the inner tube (1), and the thermocouple tube (4) is fixed on the perforation (14); the temperature sensing end of the thermocouple tube (4) is positioned at the inner side of the inner tube (1), and the detection end of the thermocouple tube (4) extends to the outer side of the inner tube (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410418848.XA CN118007107B (en) | 2024-04-09 | 2024-04-09 | Art pipe |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410418848.XA CN118007107B (en) | 2024-04-09 | 2024-04-09 | Art pipe |
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| CN118007107A true CN118007107A (en) | 2024-05-10 |
| CN118007107B CN118007107B (en) | 2024-06-14 |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4688319A (en) * | 1981-09-11 | 1987-08-25 | Heinz Gross | Multi-layer helical seam steel pipe |
| CN102794152A (en) * | 2012-09-14 | 2012-11-28 | 茂名重力石化机械制造有限公司 | Loop reactor |
| CN106369819A (en) * | 2016-08-25 | 2017-02-01 | 中国科学院合肥物质科学研究院 | Casing pipe type gas electric heating device |
| US20190345787A1 (en) * | 2018-05-10 | 2019-11-14 | Deep Casing Tools, Ltd. | Method for removing casing from a wellbore |
| CN113539881A (en) * | 2020-04-14 | 2021-10-22 | 圆益Ips股份有限公司 | Substrate processing equipment |
| CN114959647A (en) * | 2022-04-07 | 2022-08-30 | 江苏微导纳米科技股份有限公司 | Thin film deposition device and air inlet mechanism thereof |
| CN116447871A (en) * | 2023-04-18 | 2023-07-18 | 拉普拉斯(广州)半导体科技有限公司 | Furnace tube structure and heating furnace |
| CN219984693U (en) * | 2023-04-26 | 2023-11-10 | 茂名重力石化装备股份公司 | String pipe reactor with multi-head cyclone plates |
-
2024
- 2024-04-09 CN CN202410418848.XA patent/CN118007107B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4688319A (en) * | 1981-09-11 | 1987-08-25 | Heinz Gross | Multi-layer helical seam steel pipe |
| CN102794152A (en) * | 2012-09-14 | 2012-11-28 | 茂名重力石化机械制造有限公司 | Loop reactor |
| CN106369819A (en) * | 2016-08-25 | 2017-02-01 | 中国科学院合肥物质科学研究院 | Casing pipe type gas electric heating device |
| US20190345787A1 (en) * | 2018-05-10 | 2019-11-14 | Deep Casing Tools, Ltd. | Method for removing casing from a wellbore |
| CN113539881A (en) * | 2020-04-14 | 2021-10-22 | 圆益Ips股份有限公司 | Substrate processing equipment |
| CN114959647A (en) * | 2022-04-07 | 2022-08-30 | 江苏微导纳米科技股份有限公司 | Thin film deposition device and air inlet mechanism thereof |
| CN116447871A (en) * | 2023-04-18 | 2023-07-18 | 拉普拉斯(广州)半导体科技有限公司 | Furnace tube structure and heating furnace |
| CN219984693U (en) * | 2023-04-26 | 2023-11-10 | 茂名重力石化装备股份公司 | String pipe reactor with multi-head cyclone plates |
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