CN117004911A - A kind of column arc source magnetic field device - Google Patents
A kind of column arc source magnetic field device Download PDFInfo
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- CN117004911A CN117004911A CN202210467836.7A CN202210467836A CN117004911A CN 117004911 A CN117004911 A CN 117004911A CN 202210467836 A CN202210467836 A CN 202210467836A CN 117004911 A CN117004911 A CN 117004911A
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- permanent magnet
- magnetic field
- transition
- straight
- curve
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a column arc source magnetic field device, which comprises: magnetic axis, straight permanent magnet group, transition permanent magnet group and curve permanent magnet group; the magnetic shaft comprises an assembly section and a magnetic yoke section; the magnetic shaft magnetic yoke section adopts a ladder structure and is provided with a permanent magnet mounting groove for mounting the permanent magnet group. The magnetic field device has a simple and compact structure, can form a closed-loop arched magnetic field with two magnetic field transverse component intensities uniformly distributed on the surface of a column target, improves the stability of a coating process and the utilization rate of a target material, and achieves the purposes of improving the coating quality and reducing the coating cost.
Description
Technical Field
The invention belongs to the technical field of cathode arc source equipment of key components of vacuum coating technology, and particularly relates to a column arc source magnetic field device.
Background
The principle of arc ion plating is that cold field arc discharge generated by a cathode arc source is utilized to evaporate a target material, high-density electron flow, metal ion flow and metal vapor flow are emitted, and the metal ionization rate is as high as 60% -90%. The arc ion plating is the highest ionization rate in various ion plating techniques, and the generated metal ion energy is higher, and the metal ion is easy to combine with reaction gas in the deposition process to generate a hard coating, so the technique is widely applied to the field of industrialized preparation of superhard wear-resistant coatings. The cathode arc source is a core component of arc ion coating equipment, wherein the column arc source is one of the types of arc source industrialized application, the target material is in a tubular structure, a magnetic field device is arranged in the tube, a closed arch-shaped restraining magnetic field can be generated on the outer surface of the target tube to limit the arc spot etching track, and the arc spot can rapidly move on the surface of the column target through uniform rotation of the target material or the magnetic field device, so that the concentration of the discharge power of the target surface is reduced, the generation of metal molten drops is reduced, and finally the aim of improving the quality of a film layer is achieved.
The existing column arc source magnetic field device mainly comprises two forms of permanent magnet groups and electromagnetic coils matched with the permanent magnets: the permanent magnet group is generally composed of a straight permanent magnet embedded at one side of a magnetic shaft and permanent magnets at two ends, and the whole structure is simple and compact and can generate an arch magnetic field distributed in a closed loop on a target surface; however, the distribution of the magnetic field intensity generated by the permanent magnet group arrangement mode on the target surface is uneven, wherein the transverse (along the horizontal direction of the target surface) component shows a trend of strong middle and weak two ends in the magnetic field closed-loop distribution, so that the arc spot moving speed is high and low in the middle and the two ends, the concentrated etching phenomenon is caused at the two ends of the target material, and the stability of the film coating process and the target material utilization rate are finally reduced. The electromagnetic coil is matched with the permanent magnet, so that a uniform closed-loop magnetic field can be formed on the target surface, and the configuration and intensity distribution of the magnetic field can be adjusted by changing the coil current; however, as the coating process is carried out, the temperature of the coil is gradually increased, so that the demagnetization phenomenon of the permanent magnet is easily aggravated, and the arc control effect of the magnetic field is finally affected; in addition, the space inside the target tube is limited, the space matching of the electromagnetic coil and the permanent magnet is limited to a certain extent, and the complexity of the structure is increased. Therefore, a column arc source magnetic field device in the form of a permanent magnet group is urgently needed, not only can the compactness of the structure be ensured, but also the uniform distribution of the transverse component strength of a closed-loop arched magnetic field formed on a target surface can be satisfied, the stability of a coating process and the utilization rate of the target material are improved, and the purposes of improving the coating quality and reducing the coating cost are achieved.
Disclosure of Invention
In order to overcome the defects existing in the prior art, the invention provides the following technical scheme: a column arc source magnetic field device comprises a magnetic shaft, an upper straight-way permanent magnet group, an upper transition permanent magnet group, an upper curve permanent magnet group, a lower straight-way permanent magnet group, a lower transition permanent magnet group and a lower curve permanent magnet group.
Further, the magnetic shaft includes a mounting section and a yoke section.
Further, the structure and the external dimension of the magnetic shaft assembly section are determined by combining with the integral structure of the column arc source.
Further, the magnetic shaft magnetic yoke section adopts a ladder structure and is provided with a permanent magnet installation groove, the permanent magnet installation groove comprises a straight permanent magnet installation groove, a transition permanent magnet installation groove and a curved permanent magnet installation groove, and the specific size is determined by combining the overall size of the target material and the overall size of the permanent magnet.
Further, the high-temperature wear-resistant elastic layer is arranged in the permanent magnet mounting groove, so that the permanent magnet is clamped and replaced repeatedly.
Further, the upper straight permanent magnet group comprises an upper inner straight permanent magnet, an upper first outer straight permanent magnet and an upper second outer straight permanent magnet, and the upper straight permanent magnet group is arranged in the straight permanent magnet mounting groove.
Further, the upper side transition permanent magnet group comprises two upper side inner transition permanent magnets, two upper side first outer transition permanent magnets and two upper side second outer transition permanent magnets, and the upper side transition permanent magnets are arranged in the transition permanent magnet mounting groove.
Further, the upper side curve permanent magnet group comprises an upper side first curve permanent magnet and an upper side second curve permanent magnet, and the upper side first curve permanent magnet and the upper side second curve permanent magnet are installed in the curve permanent magnet installation groove.
Further, the lower side straight permanent magnet group comprises a lower side inner straight permanent magnet, a lower side first outer straight permanent magnet and a lower side second outer straight permanent magnet, and the lower side straight permanent magnet group is arranged in the straight permanent magnet mounting groove.
Further, the lower side transition permanent magnet group comprises two lower side inner transition permanent magnets, two lower side first outer transition permanent magnets and two lower side second outer transition permanent magnets, and the lower side inner transition permanent magnets, the two lower side first outer transition permanent magnets and the two lower side second outer transition permanent magnets are arranged in the transition permanent magnet mounting groove.
Further, the lower side curve permanent magnet group comprises a lower side first curve permanent magnet and a lower side second curve permanent magnet, and the lower side first curve permanent magnet and the lower side second curve permanent magnet are installed in the curve permanent magnet installation groove.
Further, all the permanent magnets included in the permanent magnet group consist of cubic permanent magnets with the same size, and the magnetizing direction and the magnetizing intensity are the same.
Drawings
In order to more clearly illustrate the embodiments of the present invention, the drawings that are required to be used in the embodiments will be briefly described.
FIG. 1 is a schematic diagram of a magnetic axis structure in a column arc source magnetic field device;
FIG. 2 is a schematic diagram of a three-dimensional structure of a column arc source magnetic field device;
FIG. 3 is a front view of a column arc source magnetic field apparatus;
FIG. 4 is a cross-sectional view of a column arc source magnetic field apparatus, FIG. 4 (a) is a cross-sectional view of A-A in FIG. 3, FIG. 4 (B) is a cross-sectional view of B-B in FIG. 3, and FIG. 4 (C) is a cross-sectional view of C-C in FIG. 4 (a);
fig. 5 is a schematic diagram of the polarity arrangement of the permanent magnet group of the magnetic field device, fig. 5 (a) is a schematic diagram of the polarity arrangement of the upper permanent magnet group, and fig. 5 (b) is a schematic diagram of the polarity arrangement of the lower permanent magnet group;
FIG. 6 is a cross-sectional magnetic field line distribution diagram, FIG. 6 (a) is a cross-sectional magnetic field line distribution diagram of FIG. 3 A-A, and FIG. 6 (B) is a cross-sectional magnetic field line distribution diagram of FIG. 3B-B;
FIG. 7 is a schematic diagram showing simulation of the intensity distribution of the transverse component of the magnetic field on the upper and lower sides of the cylindrical target.
Reference numerals illustrate:
1. a magnetic axis; 101. an assembly section; 102. a yoke section; 1021. a permanent magnet mounting groove; 1021A, a straight permanent magnet mounting groove; 1021B, transition permanent magnet mounting slots; 1021C, bend permanent magnet mounting slots; 2. an upper straight permanent magnet group; 201. an upper inner straight permanent magnet; 202. a first outer straight permanent magnet on the upper side; 203. a second outer straight permanent magnet on the upper side; 3. an upper transition permanent magnet group; 301. an upper inner transition permanent magnet; 302. an upper first outer transition permanent magnet; 303. a second outer transition permanent magnet on the upper side; 4. an upper curve permanent magnet group; 401. a first curve permanent magnet on the upper side; 402. a second curve permanent magnet on the upper side; 5. a lower straight permanent magnet set; 501. a lower inner straight permanent magnet; 502. a first outer straight permanent magnet at the lower side; 503. a second outer straight permanent magnet at the lower side; 6. a lower transition permanent magnet set; 601. a lower inner transition permanent magnet; 602. a first outer transition permanent magnet on the lower side; 603. a second outer transition permanent magnet on the lower side; 7. a lower curve permanent magnet set; 701. a first curve permanent magnet at the lower side; 702. a second curve permanent magnet at the lower side; 8. a columnar target; D. a high temperature wear resistant elastic layer; s, arc magnetic force lines.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
It should be noted that, in this embodiment, all the expressions of "first" and "second" are used for distinguishing two parameters of the same name but not the same entity, and it is noted that the "first" and "second" are only used for convenience of expression, and should not be construed as limiting the present invention, and the following descriptions will not be given.
Terms such as "upper", "lower", "vertical", "horizontal", "inner", "outer", and the like, which indicate an azimuth or a positional relationship, are referred to in the present invention, are based on the azimuth or the positional relationship shown in the drawings, and are merely for convenience of description and simplification of description, not limitation of the present invention.
The present embodiment provides a column arc source magnetic field device, the basic structure of which is shown in fig. 1, 2, 3 and 4: the magnetic field device comprises a magnetic shaft 1, an upper straight permanent magnet group 2, an upper transition permanent magnet group 3, an upper curve permanent magnet group 4, a lower straight permanent magnet group 5, a lower transition permanent magnet group 6 and a lower curve permanent magnet group 7.
The magnetic shaft 1 is divided into an assembly section 101 and a magnetic yoke section 102; determining the structure and the external dimension of the magnetic shaft assembly section 101 in combination with the overall structure of the column arc source; the magnetic shaft yoke section 102 adopts a step structure and is provided with permanent magnet mounting grooves 1021, and comprises a straight permanent magnet mounting groove 1021A, a transition permanent magnet mounting groove 1021B and a curve permanent magnet mounting groove 1021C, wherein the specific size is determined by combining the overall dimensions of a target material and a permanent magnet.
The upper straight permanent magnet group 2 comprises an upper inner straight permanent magnet 201, an upper first outer straight permanent magnet 202 and an upper second outer straight permanent magnet 203, and is arranged in a straight permanent magnet mounting groove 1021A; the upper side transition permanent magnet group 3 comprises two upper side inner transition permanent magnets 301, two upper side first outer transition permanent magnets 302 and two upper side second outer transition permanent magnets 303 which are arranged in the transition permanent magnet mounting grooves 1021B; the upper side curve permanent magnet group 4 includes an upper side first curve permanent magnet 401 and an upper side second curve permanent magnet 402, which are mounted in the curve permanent magnet mounting groove 1021C.
The lower straight permanent magnet group 5 comprises a lower inner straight permanent magnet 501, a lower first outer straight permanent magnet 502 and a lower second outer straight permanent magnet 503, and is arranged in a straight permanent magnet mounting groove 1021A; the lower side transition permanent magnet group 6 comprises two lower side inner transition permanent magnets 601, two lower side first outer transition permanent magnets 602 and two lower side second outer transition permanent magnets 603, and is arranged in a transition permanent magnet mounting groove 1021B; the lower curve permanent magnet group 7 includes a lower first curve permanent magnet 701 and a lower second curve permanent magnet 702, which are mounted in the curve permanent magnet mounting groove 1021C.
Some key positions and external dimensions in this embodiment:
(1) Permanent magnet dimensions: all the permanent magnets contained in the permanent magnet group consist of cubic permanent magnets, and the length, width and height are respectively 8mm, 8mm and 10mm;
(2) Distance from the inner side pole face of the permanent magnet close to the target tube to the central axis of the magnetic shaft:
(3) Included angle of central axis between the permanent magnets:
(4) Target size: the column target adopts a tubular structure, the inner diameter of the target tube is 56mm, and the outer diameter of the target tube is 70mm.
In the magnetic field device of the embodiment, the high-temperature wear-resistant elastic layer D is arranged in the magnetic shaft permanent magnet mounting groove 1021, and the clamping and repeated replacement work of the permanent magnet are facilitated by adopting a polypropylene material.
In the magnetic field device of this embodiment, the upper permanent magnet group and the lower permanent magnet group have the same polarity arrangement, and the upper permanent magnet group has the polarity arrangement as shown in fig. 5 (a), and the upper first outer straight permanent magnet 202, the upper second outer straight permanent magnet 203, the two upper first outer transition permanent magnets 302, the two upper second outer transition permanent magnets 303 and the upper curved permanent magnet group 4 have the S (N) pole at the end near the inner side of the target material, and the upper inner straight permanent magnet 201 and the two upper inner transition permanent magnets 301 have the N (S) pole at the end near the inner side of the target material; as shown in fig. 5 (b), the polarity arrangement of the lower permanent magnet group is that the lower first outer straight permanent magnet 502, the lower second outer straight permanent magnet 503, the two lower first outer transition permanent magnets 602, the two lower second outer transition permanent magnets 603 and the lower curve permanent magnet group 6 are S (N) poles near the inner side of the target, and the lower inner straight permanent magnet 501 and the two lower inner transition permanent magnets 601 are N (S) poles near the inner side of the target; all the permanent magnets used in the embodiment are magnetized along the height direction of the cubic permanent magnet, and the magnetizing intensity is the same, so that the technical cost of the magnetic field device can be reduced, and the influence of demagnetization on the magnetic field distribution uniformity in the film coating process can be reduced.
The permanent magnet groups in the magnetic field device of the embodiment can jointly act to generate an arch magnetic field with closed annular distribution on the surfaces of the upper and lower side column targets, the distribution of magnetic force lines of the section is shown in figure 6, wherein figure 6 (a) is the distribution of magnetic force lines of the section of a straight permanent magnet section, and figure 6 (b) is the distribution of magnetic force lines of the section of a transition permanent magnet section; the simulation of the transverse component intensity distribution of the arched magnetic field formed on the surface of the cylindrical target by the permanent magnet group is shown in fig. 7, wherein (a) is the transverse component intensity distribution of the magnetic field on the upper side of the cylindrical target, and (b) is the transverse component intensity distribution of the magnetic field on the lower side of the cylindrical target, so that the transverse component intensity of the closed-loop arched magnetic field generated on the surface of the cylindrical target can be seen to be uniformly distributed in a closed ring shape.
The beneficial effects of the invention are as follows: the column arc source magnetic field device provided by the invention adopts a permanent magnet group form, has a simple and compact overall structure, can generate a closed-loop arch magnetic field with two magnetic field transverse component intensities uniformly distributed on the target surface, ensures that arc spots move on the column target surface at a uniform speed, avoids the occurrence of a concentrated etching phenomenon, improves the stability of a coating process and the utilization rate of a target material, and achieves the purposes of improving the coating quality and reducing the coating cost; meanwhile, the permanent magnets used by the magnetic field device have the same magnetizing intensity, so that the technical cost of the magnetic field device is reduced, and the influence of demagnetization on the uniformity of magnetic field distribution in the film coating process is reduced.
Finally, it should be noted that: the present invention has been described in terms of preferred embodiments, and is intended to enable those skilled in the art to understand the invention without limiting the scope of the invention, but various modifications and equivalent substitutions of these features and embodiments are intended to be included within the scope of the invention without departing from the spirit and scope of the invention.
Claims (9)
1. A column arc source magnetic field apparatus comprising: the magnetic shaft (1), an upper straight permanent magnet group (2), an upper transition permanent magnet group (3), an upper curve permanent magnet group (4), a lower straight permanent magnet group (5), a lower transition permanent magnet group (6) and a lower curve permanent magnet group (7).
2. A pole arc source magnetic field apparatus as claimed in claim 1, wherein: the magnetic shaft (1) comprises a fitting section (101) and a yoke section (102); the magnetic yoke section (102) adopts a ladder structure and is provided with a permanent magnet mounting groove (1021).
3. A pole arc source magnetic field apparatus as claimed in claim 2, wherein: the permanent magnet mounting groove (1021) comprises a straight permanent magnet mounting groove (1021A), a transition permanent magnet mounting groove (1021B) and a curve permanent magnet mounting groove (1021C), and a high-temperature wear-resistant elastic layer D is arranged in the permanent magnet mounting groove (1021).
4. A pole arc source magnetic field apparatus as claimed in claim 3, wherein: the upper straight permanent magnet group (2) comprises an upper inner straight permanent magnet (201), an upper first outer straight permanent magnet (202) and an upper second outer straight permanent magnet (203), and is arranged in the straight permanent magnet mounting groove (1201A).
5. A pole arc source magnetic field apparatus as claimed in claim 3, wherein: the upper side transition permanent magnet group (3) comprises two upper side inner transition permanent magnets (301), two upper side first outer transition permanent magnets (302) and two upper side second outer transition permanent magnets (303), and the upper side transition permanent magnets are installed in the transition permanent magnet installation groove (1021B).
6. A pole arc source magnetic field apparatus as claimed in claim 3, wherein: the upper curve permanent magnet group (4) comprises an upper first curve permanent magnet (401) and an upper second curve permanent magnet (402) which are arranged in the curve permanent magnet mounting groove (1021C).
7. A pole arc source magnetic field apparatus as claimed in claim 3, wherein: the lower straight permanent magnet group (5) comprises a lower inner straight permanent magnet (501), a lower first outer straight permanent magnet (502) and a lower second outer straight permanent magnet (503) which are arranged in the straight permanent magnet mounting groove (1201A).
8. A pole arc source magnetic field apparatus as claimed in claim 3, wherein: the lower side transition permanent magnet group (6) comprises two lower side inner transition permanent magnets (601), two lower side first outer transition permanent magnets (602) and two lower side second outer transition permanent magnets (603), and the lower side inner transition permanent magnets are arranged in the transition permanent magnet mounting grooves (1021B).
9. A pole arc source magnetic field apparatus as claimed in claim 3, wherein: the lower curve permanent magnet group (7) comprises a lower first curve permanent magnet (701) and a lower second curve permanent magnet (702) which are arranged in the curve permanent magnet mounting groove (1021C).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210467836.7A CN117004911A (en) | 2022-04-30 | 2022-04-30 | A kind of column arc source magnetic field device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210467836.7A CN117004911A (en) | 2022-04-30 | 2022-04-30 | A kind of column arc source magnetic field device |
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| Publication Number | Publication Date |
|---|---|
| CN117004911A true CN117004911A (en) | 2023-11-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202210467836.7A Pending CN117004911A (en) | 2022-04-30 | 2022-04-30 | A kind of column arc source magnetic field device |
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| Country | Link |
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| CN (1) | CN117004911A (en) |
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|---|---|---|---|---|
| CN2292095Y (en) * | 1996-04-05 | 1998-09-23 | 永胜诚信工贸公司 | Column shaped plane type magnetic controlled sputter target |
| US20040094509A1 (en) * | 2000-09-01 | 2004-05-20 | Koji Miyata | Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator |
| KR20050087104A (en) * | 2004-02-24 | 2005-08-31 | 학교법인 성균관대학 | Sputtering apparatus of circle magnetron |
| JP2010158130A (en) * | 2008-12-29 | 2010-07-15 | Hitachi Ltd | Permanent magnet type rotating electric machine and elevator device using the same |
| CN102534513A (en) * | 2011-12-19 | 2012-07-04 | 东莞市汇成真空科技有限公司 | A Rectangular Planar Cathodic Arc Evaporation Source Combined with Magnetic Field |
| US20140085024A1 (en) * | 2011-05-30 | 2014-03-27 | Hitachi Metals, Ltd. | Racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering |
| CN203827146U (en) * | 2014-05-06 | 2014-09-10 | 广东合普动力科技有限公司 | Permanent-magnet synchronous motor rotor |
| US20180363660A1 (en) * | 2015-12-14 | 2018-12-20 | Flowserve Management Company | Permanent magnet submersible motor with a one-piece rotor/yoke configuration and resin embedded magnets |
| CN111418041A (en) * | 2017-09-29 | 2020-07-14 | Camvac有限公司 | Apparatus and method for treating, coating or curing substrates |
| CN217895731U (en) * | 2022-04-30 | 2022-11-25 | 成都大学 | A column arc source magnetic field device |
-
2022
- 2022-04-30 CN CN202210467836.7A patent/CN117004911A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2292095Y (en) * | 1996-04-05 | 1998-09-23 | 永胜诚信工贸公司 | Column shaped plane type magnetic controlled sputter target |
| US20040094509A1 (en) * | 2000-09-01 | 2004-05-20 | Koji Miyata | Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator |
| KR20050087104A (en) * | 2004-02-24 | 2005-08-31 | 학교법인 성균관대학 | Sputtering apparatus of circle magnetron |
| JP2010158130A (en) * | 2008-12-29 | 2010-07-15 | Hitachi Ltd | Permanent magnet type rotating electric machine and elevator device using the same |
| US20140085024A1 (en) * | 2011-05-30 | 2014-03-27 | Hitachi Metals, Ltd. | Racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering |
| CN102534513A (en) * | 2011-12-19 | 2012-07-04 | 东莞市汇成真空科技有限公司 | A Rectangular Planar Cathodic Arc Evaporation Source Combined with Magnetic Field |
| CN203827146U (en) * | 2014-05-06 | 2014-09-10 | 广东合普动力科技有限公司 | Permanent-magnet synchronous motor rotor |
| US20180363660A1 (en) * | 2015-12-14 | 2018-12-20 | Flowserve Management Company | Permanent magnet submersible motor with a one-piece rotor/yoke configuration and resin embedded magnets |
| CN111418041A (en) * | 2017-09-29 | 2020-07-14 | Camvac有限公司 | Apparatus and method for treating, coating or curing substrates |
| CN217895731U (en) * | 2022-04-30 | 2022-11-25 | 成都大学 | A column arc source magnetic field device |
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Application publication date: 20231107 |
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