CN116903257A - Etching additive capable of improving light transmittance of photovoltaic glass and etching method - Google Patents
Etching additive capable of improving light transmittance of photovoltaic glass and etching method Download PDFInfo
- Publication number
- CN116903257A CN116903257A CN202310914793.7A CN202310914793A CN116903257A CN 116903257 A CN116903257 A CN 116903257A CN 202310914793 A CN202310914793 A CN 202310914793A CN 116903257 A CN116903257 A CN 116903257A
- Authority
- CN
- China
- Prior art keywords
- etching
- photovoltaic glass
- glass
- light transmittance
- additive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
本发明公开一种可以提高光伏玻璃透光率的刻蚀添加剂及刻蚀方法，刻蚀添加剂包括如下质量分数的组分：无机盐3.0～5.0%、有机溶剂1.0～2.0%、加速剂0.1～0.5%以及余量水；加速剂用于缩减光伏玻璃刻蚀时间，且加速剂可电离出氢氧根离子。刻蚀方法包括：S1、配制光伏玻璃刻蚀用碱液；S2、将刻蚀添加剂与碱液混合，得到玻璃刻蚀液；S3、将光伏玻璃置于玻璃刻蚀液中刻蚀，然后清洗光伏玻璃表面，完成刻蚀。本发明的方法能够在光伏玻璃上刻蚀出片状的微结构，这些片状的微结构紧密相连形成大面积的网状结构；这样的网状结构能够表现出一定的绒面效果且具有合适的折射率，从而有效降低了玻璃的反射率，提高了透射光，能使得光伏玻璃的平均透光率能增加5%左右。
The invention discloses an etching additive and an etching method that can improve the light transmittance of photovoltaic glass. The etching additive includes the following mass fraction components: 3.0-5.0% of inorganic salts, 1.0-2.0% of organic solvents, and 0.1-0.1% of accelerators. 0.5% and the balance water; the accelerator is used to reduce the photovoltaic glass etching time, and the accelerator can ionize hydroxide ions. The etching method includes: S1, prepare an alkali solution for etching photovoltaic glass; S2, mix the etching additive with the alkali solution to obtain a glass etching solution; S3, place the photovoltaic glass in the glass etching solution to etch, and then clean it The photovoltaic glass surface is etched. The method of the present invention can etch sheet-like microstructures on photovoltaic glass, and these sheet-like microstructures are closely connected to form a large-area network structure; such a network structure can show a certain suede effect and has suitable The refractive index effectively reduces the reflectivity of the glass and increases the transmitted light, which can increase the average transmittance of photovoltaic glass by about 5%.
Description
Technical Field
The application relates to the technical field of photovoltaic glass, in particular to an etching additive capable of improving the light transmittance of the photovoltaic glass and an etching method of the photovoltaic glass.
Background
In recent years, with the rapid development of the photovoltaic industry, the share of the photovoltaic glass in China in the global market is kept above 90%, and the photovoltaic glass is the biggest photovoltaic glass production country in the world. Along with the development of photovoltaic industry technology and the continuous expansion of enterprise productivity, the photovoltaic industry in China is expected to keep on a global leading position in the future. Photovoltaic glass is generally used as a packaging panel of a photovoltaic module, and is one of core auxiliary materials of the photovoltaic module. The light transmittance of a photovoltaic module refers to the proportion of light that can pass through the module and be converted into electrical energy after shining from the sun onto the surface of the photovoltaic module. The higher the light transmittance, the more light energy the solar panel can convert, and therefore light transmittance is an important parameter of the solar panel. The photovoltaic glass is taken as an important component of the photovoltaic cell assembly package, is directly applied to a solar photovoltaic power generation assembly, and the light transmittance of the photovoltaic glass is an important factor influencing the conversion efficiency of the solar photovoltaic cell.
At present, in industrial production, common methods for etching glass mainly comprise a chemical etching method and a physical processing method:
wherein: (1) chemical etching method: with the development of glass processing and deep processing industry, the most mainly adopted etchant in the chemical etching method is hydrofluoric acid; however, the use of hydrofluoric acid not only increases the operational risk, but also causes environmental pollution. It is well known that ingestion of about 1.5g of hydrofluoric acid by the human body can lead to death. Inhalation of high concentration hydrofluoric acid mist can also cause bronchitis and hemorrhagic pulmonary edema. Hydrofluoric acid can also be absorbed transdermally and cause severe poisoning, potentially fatal when exposed to hydrofluoric acid at a concentration of 50ppm for several minutes. Therefore, the use of hydrofluoric acid is eliminated in chemical etching. (2) physical laser etching method: the laser processing of glass has the advantages of large investment, high cost, higher requirements on the shape and strength of the glass, complex process, high breakage rate, large energy consumption, difficult control and production process limited by raw materials, production equipment, production technology and the like, thereby greatly limiting the development of the photovoltaic glass.
Disclosure of Invention
The application aims at: aiming at the problems of high damage to human bodies and high risk of hydrofluoric acid adopted in the existing chemical etching method, an etching additive for etching photovoltaic glass is developed, and the etching additive can effectively improve the light transmittance of the photovoltaic glass when being used for etching the photovoltaic glass, so that the power of a photovoltaic module is improved.
The application is realized by the following technical scheme:
the etching additive capable of improving the light transmittance of the photovoltaic glass is characterized by comprising the following components in percentage by mass:
3.0 to 5.0 weight percent of inorganic salt, 1.0 to 2.0 weight percent of organic solvent, 0.1 to 0.5 weight percent of accelerator and the balance of water; the accelerator is used for shortening the etching time of the photovoltaic glass, and hydroxide ions can be ionized by the accelerator.
Further, an etching additive capable of improving the light transmittance of the photovoltaic glass: the etching additive comprises the following components in percentage by mass:
3.0wt% of inorganic salt, 1.0wt% of organic solvent, 0.1wt% of accelerator and the balance of water.
Furthermore, an etching additive capable of improving the light transmittance of the photovoltaic glass: the inorganic salt is sodium carbonate or sodium bicarbonate.
Furthermore, an etching additive capable of improving the light transmittance of the photovoltaic glass: the organic solvent is N, N-dimethylformamide.
Furthermore, an etching additive capable of improving the light transmittance of the photovoltaic glass: the accelerator is sodium tert-butoxide or sodium ethoxide.
An etching method capable of improving the light transmittance of photovoltaic glass is characterized by adopting the etching additive, and comprises the following steps:
s1, preparing alkali liquor for etching photovoltaic glass;
s2, mixing the etching additive with the alkali liquor to obtain glass etching liquid;
and S3, placing the photovoltaic glass in the glass etching liquid for etching, and then cleaning the surface of the photovoltaic glass to finish etching.
Further, an etching method capable of improving the light transmittance of the photovoltaic glass comprises the following steps: the alkali liquor in the step S1 is potassium hydroxide solution with the concentration of 3.0-5.0wt%.
Further, an etching method capable of improving the light transmittance of the photovoltaic glass comprises the following steps: the volume ratio of the etching additive to the alkali liquor in the step S2 is (1-5): 100.
further, an etching method capable of improving the light transmittance of the photovoltaic glass comprises the following steps: and S3, placing the photovoltaic glass in the glass etching liquid, keeping the photovoltaic glass in a vertical state, etching for 30-60 minutes at 80-90 ℃, and then cleaning the surface with deionized water to finish the etching of the photovoltaic glass.
The application has the beneficial effects that:
(1) The application provides an etching additive with simple components and low cost and a method for etching photovoltaic glass by using alkali liquor, and the scheme of the application can etch sheet-shaped microstructures on the photovoltaic glass, and the sheet-shaped microstructures are tightly connected to form a large-area net-shaped structure; the net structure can show a certain suede effect and has a proper refractive index, so that the reflectivity of the glass is effectively reduced, the proportion of transmitted light is increased, and the average light transmittance of the photovoltaic glass can be increased by about 5% after etching.
(2) The accelerator component in the etching additive provided by the application is one of the keys, so that on one hand, the etching time of the photovoltaic glass can be greatly shortened, and the production efficiency is effectively improved; on the other hand, the accelerator can provide additional OH for the solution after being dissolved in water - ，OH - Easily causes the breakage of silicon oxygen bond (Si-O bond) in the glass during the subsequent glass etching process, thereby separating out Si element from the glass and mixing with sodium ion (Na + ) To form soluble sodium silicate (Na 2 SiO 3 ) Then the glass is dissolved in water to form a net structure on the surface of the glass, thereby achieving the effects of reducing the reflectivity of the glass and improving the light transmittance.
(3) The addition of N, N-dimethylformamide (organic solvent) in the etching additive provided by the application can lead the formed net structure to be more compact and uniform, and the physical properties such as the viscosity and the surface tension of the solution are improved after the N, N-dimethylformamide is mixed with water, so that each additive component can be uniformly distributed in the solution, thereby improving the uniformity of the structure.
(4) The existing chemical etching method adopts hydrofluoric acid, which has great harm to human body and environment; the existing physical laser etching method has the defects that the energy consumption is too high, the laser equipment is expensive, and the etching cost is greatly increased; the etching method provided by the application has the advantages of simple process, low raw material cost, environmental friendliness and less manpower and material resources.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present application, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a microstructure of a photovoltaic glass surface etched according to example 1 of this application;
fig. 2 is a graph showing the result of the transmittance test of photovoltaic glass etched by the embodiment of example 1 and comparative example 1 of the present application.
Detailed Description
The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the application. The following description of at least one exemplary embodiment is merely exemplary in nature and is in no way intended to limit the application, its application, or uses. All other embodiments, which can be made by those skilled in the art based on the embodiments of the application without making any inventive effort, are intended to be within the scope of the application.
Example 1
The etching additive capable of improving the light transmittance of the photovoltaic glass is characterized by comprising the following components in percentage by mass: sodium bicarbonate (inorganic salt) 3.0wt%, N-dimethylformamide (organic solvent) 1.0wt%, sodium tert-butoxide (accelerator) 0.1wt% and the balance water (95.9 wt%).
An etching method capable of improving the light transmittance of photovoltaic glass is provided, the etching method adopts the etching additive provided in the embodiment 1, and the method comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 5.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 10ml of the etching additive prepared in the embodiment 1 with 1000ml of alkali liquor to obtain glass etching liquid;
and S3, placing the photovoltaic glass in the glass etching liquid, keeping the photovoltaic glass in a vertical state, etching at 90 ℃ for 60 minutes, and cleaning the residual salt on the surface by using deionized water to finish the etching of the photovoltaic glass.
The micro characterization of the etched photovoltaic glass surface of the embodiment 1 is shown in fig. 1, and it can be seen that a plurality of closely connected sheet microstructures are formed on the surface of the photovoltaic glass after etching, so as to form a net structure, and the microstructures can show a certain suede effect, and can provide a proper refractive index for light, reduce the surface reflectivity of the photovoltaic glass, and further enable the light transmittance to obtain an effective gain.
Example 2
The etching additive capable of improving the light transmittance of the photovoltaic glass is characterized by comprising the following components in percentage by mass: 5.0wt% of sodium carbonate (inorganic salt), 1.5wt% of N, N-dimethylformamide (organic solvent), 0.3wt% of sodium ethoxide (accelerator) and the balance of water (93.2 wt%).
An etching method capable of improving the light transmittance of the photovoltaic glass is provided, the etching method adopts the etching additive in the embodiment 2, and the method comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 3.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 50ml of the etching additive prepared in the embodiment 2 with 1000ml of alkali liquor to obtain glass etching liquid;
and S3, placing the photovoltaic glass in the glass etching liquid, keeping the photovoltaic glass in a vertical state, etching at 80 ℃ for 30 minutes, and cleaning the residual salt on the surface by deionized water to finish the etching of the photovoltaic glass.
Example 3
The etching additive capable of improving the light transmittance of the photovoltaic glass is characterized by comprising the following components in percentage by mass: sodium bicarbonate (inorganic salt) 4.0wt%, N-dimethylformamide (organic solvent) 2.0wt%, sodium tert-butoxide (accelerator) 0.5wt% and the balance water (93.5 wt%).
An etching method capable of improving the light transmittance of the photovoltaic glass is provided, the etching method adopts the etching additive in the embodiment 3, and the method comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 4.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 30ml of the etching additive prepared in the embodiment 3 with 1000ml of alkali liquor to obtain glass etching liquid;
and S3, placing the photovoltaic glass in the glass etching liquid, keeping the photovoltaic glass in a vertical state, etching for 45 minutes at 85 ℃, and cleaning the residual salt on the surface by using deionized water to finish the etching of the photovoltaic glass.
Comparative example 1
Providing an etching additive A, wherein the etching additive A comprises the following components in percentage by mass: sodium bicarbonate (inorganic salt) 3.0wt%, N-dimethylformamide (organic solvent) 1.0wt%, t-butanol and sodium hydroxide together 0.1wt% and the balance water (95.9 wt%).
The etching method of the photovoltaic glass adopts the etching additive A provided in the comparative example 1, and comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 5.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 10ml of the etching additive A prepared in the comparative example 1 with 1000ml of alkali liquor to obtain glass etching liquid A;
and S3, placing the photovoltaic glass in the glass etching liquid A, keeping the photovoltaic glass in a vertical state, etching at 90 ℃ for 60 minutes, and cleaning the surface with deionized water to finish the etching of the photovoltaic glass.
The difference between the comparative example 1 and the example 1 is that: comparative example 1 sodium t-butoxide (accelerator) in example 1 was replaced with t-butanol and sodium hydroxide, with the remaining conditions being the same.
The initial photovoltaic glass used and the photovoltaic glass etched in example 1 and comparative example 1 were subjected to a light transmittance test, and the results are shown in fig. 2; the results show that the process of the present application (example 1) can give an increase of about 5% in the average light transmittance of the photovoltaic glass.
The photovoltaic glass before and after etching in comparative example 1 was subjected to a light transmittance test, and the test result showed that: after the accelerator in example 1 was replaced, etching at 90℃for 60 minutes only increased the average light transmittance of the photovoltaic glass by about 2.0% (as shown in FIG. 2). Maintaining the temperature of the glass etching solution A in the comparative example 1, continuing etching the photovoltaic glass which has been etched for 60 minutes, and testing the transmittance again, and finding that the actual transmittance of the comparative example 1 is not increased, which indicates that the etching process of the photovoltaic glass is basically completed after the etching additive A provided in the comparative example 1 is used for 60 minutes, and increasing the etching time has no actual effect on the increase of the transmittance.
Compared with the prior art, the accelerator adopted by the application can effectively increase the light transmittance of etched glass, and has remarkable effect.
Comparative example 2
An etching additive B is provided, wherein the etching additive B comprises the following components in percentage by mass: 1.0wt% of N, N-dimethylformamide (organic solvent), 0.1wt% of sodium tert-butoxide (accelerator) and the balance of water (98.9 wt%).
The etching additive B provided in the comparative example 2 is used for etching the photovoltaic glass, and the etching process comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 5.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 10ml of the etching additive B provided in the comparative example 2 with 1000ml of alkali liquor to obtain glass etching liquid B;
and S3, placing the photovoltaic glass in the glass etching liquid B, keeping the photovoltaic glass in a vertical state, etching at 90 ℃ for 60 minutes, and cleaning the surface with deionized water to finish the etching of the photovoltaic glass.
The etching additive B provided in comparative example 2 is different from the etching additive in example 1 in that: sodium bicarbonate (inorganic salt) was not added to the component of comparative example 2.
The photovoltaic glass before and after etching in comparative example 2 was subjected to a light transmittance test, and the test result showed that: the etching additive B provided in the comparative example 2 can only increase the average light transmittance of the photovoltaic glass by about 1.5% under the same etching condition (60 minutes of etching at 90 ℃); maintaining the etching temperature, and after the etching is continued for 60 minutes, testing the light transmittance of the glass again, wherein the average light transmittance is increased to about 2.5 percent; from this, it can be seen that, because the etching additive B provided in comparative example 2 lacks inorganic salt, the etching effect is lower than that of example 1, and the etching rate is slower, so that the inorganic salt component in the application can also be used as an etching accelerator, which can promote the improvement of the etching rate of glass and is beneficial to the improvement of the production efficiency.
Comparative example 3
Providing an etching additive C, wherein the etching additive C comprises the following components in percentage by mass: sodium bicarbonate (inorganic salt) 3.0wt%, N-dimethylformamide (organic solvent) 1.0wt% and the balance water (96.0 wt%).
Comparative example 3 provides an etching additive C that differs from the etching additive of example 1 in that: no sodium tert-butoxide (accelerator) was added to the component of comparative example 3.
The etching additive C provided in the comparative example 3 is used for etching the photovoltaic glass, and the etching process comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 5.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 10ml of the etching additive C provided in the comparative example 3 with 1000ml of alkali liquor to obtain glass etching liquid C;
and S3, placing the photovoltaic glass in the glass etching liquid C, keeping the photovoltaic glass in a vertical state, etching at 90 ℃ for 60 minutes, and cleaning the surface with deionized water to finish the etching of the photovoltaic glass.
The photovoltaic glass before and after etching in comparative example 3 was subjected to a light transmittance test, and the test result showed that: the etching additive C provided in comparative example 3 only increased the average light transmittance of the photovoltaic glass by about 2.3% under the same etching conditions. And continuously maintaining the etching temperature at 90 ℃, continuously etching for 120 minutes, and then testing the light transmittance of the glass again, wherein the average light transmittance is increased by about 3.5 percent compared with that of the unetched glass. It can be seen that the etching additive C provided in comparative example 3, due to the lack of the accelerator (sodium t-butoxide), on the one hand, makes the etching effect (i.e., the light transmittance gain effect) lower than that of example 1, and more importantly, greatly reduces the etching rate.
As can be seen from the above comparative examples 2 and 3, the use of either the inorganic salt or the accelerator alone is disadvantageous in terms of the improvement of the transmittance of the etched glass, and the etching rate is also slow when used alone. According to the application, through the common use of the inorganic salt and the accelerator, the effective improvement of the light transmittance of the etched glass is realized, and the gain effect of the light transmittance of the etched glass after the common use of the inorganic salt and the accelerator is better than that of the etched glass after the common use of the inorganic salt and the accelerator, and the effect of 1+1 & gt2 is obtained; meanwhile, the inorganic salt or the accelerator adopted in the application has the effect of improving the etching rate, effectively shortens the etching process time and can effectively improve the effective efficiency of glass etching.
Comparative example 4
An etching additive D is provided, which is characterized by comprising the following components in percentage by mass: 10.0wt% of sodium bicarbonate (inorganic salt), 1.0wt% of N, N-dimethylformamide (organic solvent), 2.0wt% of sodium tert-butoxide (accelerator) and the balance of water (87.0 wt%).
The etching additive D provided in comparative example 4 is different from the etching additive in example 1 in that: the inorganic salt and the accelerator in comparative example 4 were excessively added.
The etching additive D provided in the comparative example 4 is used in glass etching, and the etching process comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 5.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 10ml of the etching additive D prepared in the comparative example 4 with 1000ml of alkali liquor to obtain glass etching liquid D;
s3, placing the photovoltaic glass in the glass etching liquid D, keeping the photovoltaic glass in a vertical state, etching at 90 ℃ for 60 minutes, and cleaning the surface of the glass by deionized water; in the process, a large amount of inorganic salt and accelerator are found to be adhered to the surface of the glass to form a netlike microstructure, and the netlike microstructure cannot be cleaned and removed, so that the light transmittance of the glass is greatly affected, the light transmittance of the glass etched by the etching additive D is reversely lower, and the excessive inorganic salt and accelerator are not beneficial to the improvement of the light transmittance.
Comparative example 5
An etching additive E is provided, which is characterized by comprising the following components in percentage by mass: sodium bicarbonate (inorganic salt) 1.0wt%, N-dimethylformamide (organic solvent) 1.0wt%, sodium tert-butoxide (accelerator) 0.05wt% and the balance water.
The etching additive E provided in comparative example 5 is different from the etching additive in example 1 in that: the inorganic salt and the accelerator in comparative example 5 were added in a small amount.
The etching additive E provided in the comparative example 5 is used in glass etching, and the etching process comprises the following specific steps:
s1, preparing 1000ml of alkali liquor (namely potassium hydroxide solution with the concentration of 5.0 wt%) for etching the photovoltaic glass;
s2, uniformly mixing 10ml of the etching additive E prepared in the comparative example 5 with 1000ml of alkali liquor to obtain glass etching liquid E;
and S3, placing the photovoltaic glass in the glass etching liquid E, keeping the photovoltaic glass in a vertical state, etching at 90 ℃ for 60 minutes, and cleaning the surface of the glass by deionized water to finish the etching process of the glass.
The photovoltaic glass before and after etching in the comparative example 5 is subjected to light transmittance test, and the test result shows that: the light transmittance of the photovoltaic glass before and after etching is not obviously changed, and an ideal light transmittance gain effect is difficult to generate due to the small addition amount.
In summary, the preferable etching additive formula and proportion of the application can ensure that the transmittance of etched glass is effectively improved, and the etching rate is effectively improved.
The above-described preferred embodiments of the present application are only for illustrating the present application, and are not to be construed as limiting the present application. Obvious changes and modifications of the application, which are introduced by the technical solution of the present application, are still within the scope of the present application.
Claims (9)
1. The etching additive capable of improving the light transmittance of the photovoltaic glass is characterized by comprising the following components in percentage by mass:
3.0 to 5.0 weight percent of inorganic salt, 1.0 to 2.0 weight percent of organic solvent, 0.1 to 0.5 weight percent of accelerator and the balance of water; the accelerator is used for shortening the etching time of the photovoltaic glass, and hydroxide ions can be ionized by the accelerator.
2. The etching additive capable of improving the light transmittance of the photovoltaic glass according to claim 1, wherein the etching additive comprises the following components in percentage by mass:
3.0wt% of inorganic salt, 1.0wt% of organic solvent, 0.1wt% of accelerator and the balance of water.
3. An etching additive for improving the light transmittance of photovoltaic glass according to claim 1 or 2, wherein the inorganic salt is sodium carbonate or sodium bicarbonate.
4. An etching additive for improving the light transmittance of photovoltaic glass according to claim 1 or 2, wherein the organic solvent is N, N-dimethylformamide.
5. An etching additive capable of improving the light transmittance of photovoltaic glass according to claim 1 or 2, wherein the accelerator is sodium tert-butoxide or sodium ethoxide.
6. An etching method capable of improving the light transmittance of photovoltaic glass, which is characterized by adopting the etching additive as claimed in any one of claims 1 to 5, comprising the following steps:
s1, preparing alkali liquor for etching photovoltaic glass;
s2, mixing the etching additive with the alkali liquor to obtain glass etching liquid;
and S3, placing the photovoltaic glass in the glass etching liquid for etching, and then cleaning the surface of the photovoltaic glass to finish etching.
7. The etching method for improving the light transmittance of the photovoltaic glass according to claim 6, wherein the alkali solution in the step S1 is a potassium hydroxide solution with a concentration of 3.0-5.0 wt%.
8. The etching method for improving the light transmittance of the photovoltaic glass according to claim 6, wherein the volume ratio of the etching additive to the alkali solution in the step S2 is (1-5): 100.
9. the etching method capable of improving the light transmittance of the photovoltaic glass according to claim 6, wherein in the step S3, the photovoltaic glass is placed in the glass etching liquid and kept in a vertical state, the photovoltaic glass is etched for 30-60 minutes at 80-90 ℃, and then the surface is cleaned by deionized water, so that the photovoltaic glass etching is completed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310914793.7A CN116903257A (en) | 2023-07-25 | 2023-07-25 | Etching additive capable of improving light transmittance of photovoltaic glass and etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202310914793.7A CN116903257A (en) | 2023-07-25 | 2023-07-25 | Etching additive capable of improving light transmittance of photovoltaic glass and etching method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN116903257A true CN116903257A (en) | 2023-10-20 |
Family
ID=88350864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202310914793.7A Pending CN116903257A (en) | 2023-07-25 | 2023-07-25 | Etching additive capable of improving light transmittance of photovoltaic glass and etching method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN116903257A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118894653A (en) * | 2024-08-22 | 2024-11-05 | 彩虹集团（邵阳）特种玻璃有限公司 | Etching liquid and etching method of high-alumina silicate glass and anti-dizziness glass |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1203205A (en) * | 1997-06-25 | 1998-12-30 | 国际商业机器公司 | Selective Etching of Silicates |
| KR20120138417A (en) * | 2011-06-15 | 2012-12-26 | 삼성코닝정밀소재 주식회사 | Etching glass and method of manufacturing thereof |
| CN106430992A (en) * | 2016-08-31 | 2017-02-22 | 张源兴 | Etching solution for antiglare glass and preparation method thereof |
| CN115466059A (en) * | 2022-09-19 | 2022-12-13 | 中国建材国际工程集团有限公司 | Glass with high visible light transmittance and high emissivity, and preparation method and application thereof |
| CN116253524A (en) * | 2023-01-17 | 2023-06-13 | 常州时创能源股份有限公司 | Additive for photovoltaic glass etching and application thereof |
-
2023
- 2023-07-25 CN CN202310914793.7A patent/CN116903257A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1203205A (en) * | 1997-06-25 | 1998-12-30 | 国际商业机器公司 | Selective Etching of Silicates |
| KR20120138417A (en) * | 2011-06-15 | 2012-12-26 | 삼성코닝정밀소재 주식회사 | Etching glass and method of manufacturing thereof |
| CN106430992A (en) * | 2016-08-31 | 2017-02-22 | 张源兴 | Etching solution for antiglare glass and preparation method thereof |
| CN115466059A (en) * | 2022-09-19 | 2022-12-13 | 中国建材国际工程集团有限公司 | Glass with high visible light transmittance and high emissivity, and preparation method and application thereof |
| CN116253524A (en) * | 2023-01-17 | 2023-06-13 | 常州时创能源股份有限公司 | Additive for photovoltaic glass etching and application thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118894653A (en) * | 2024-08-22 | 2024-11-05 | 彩虹集团（邵阳）特种玻璃有限公司 | Etching liquid and etching method of high-alumina silicate glass and anti-dizziness glass |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN104576831B (en) | A kind of monocrystalline silicon piece is without alcohol process for etching and flocking additive thereof | |
| CN101735903B (en) | Electronic cleaning agent special for solar energy photovoltaic component | |
| CN106119977B (en) | Fine-hair maring using monocrystalline silicon slice additive and application | |
| CN111254497B (en) | Additives for Preparation of Porous Pyramid Structures by Secondary Texturing of Single Crystal Silicon Wafers and Their Applications | |
| CN104944794B (en) | One kind prepares graphene SiO2The method of anti-reflection film | |
| CN102270702A (en) | Rework process for texturing white spot monocrystalline silicon wafer | |
| CN102315113A (en) | Solar-battery monocrystalline-silicon floss-making fluid with low volatility and application thereof | |
| CN102593268A (en) | Method for carrying out cleaning and texture-surface-making on heterojunction solar cells by using texturing smoothing and rounding technique | |
| CN109554762B (en) | Polycrystalline silicon etching solution additive and application thereof | |
| CN106186713A (en) | A kind of anti-dazzle glas etching solution and the method utilizing this anti-dazzle liquid processing anti-dazzle glas | |
| CN113136144A (en) | Polishing agent for rapid alkali polishing of crystal silicon wafer and application method thereof | |
| CN108206225B (en) | A kind of fine-hair maring using monocrystalline silicon slice agent composition and its application | |
| JP2012526719A (en) | Method for manufacturing reflection-reducing window glass | |
| CN115975512A (en) | A kind of high-reflectivity crystalline silicon alkali polishing additive and its application method | |
| CN116903257A (en) | Etching additive capable of improving light transmittance of photovoltaic glass and etching method | |
| CN114990700A (en) | Additive and process for preparing terrace pyramid microstructure silicon wafer and obtained silicon wafer | |
| CN101691660A (en) | Additive for preparing monocrystalline silicon suede | |
| CN102674704A (en) | Preparation method of porous nano silicon dioxide anti-reflection film | |
| CN105977343A (en) | Monocrystalline silicon solar cell surface texture liquid having high stability and tannin extract and preparation method thereof | |
| KR101213147B1 (en) | Texturing agent compositions of single crystalline silicon wafers for solar cell and texturing method using the same | |
| CN112608799B (en) | Monocrystalline silicon wafer cleaning agent and application thereof | |
| CN106219992A (en) | A chemical etching preparation process for anti-glare glass | |
| CN116253524B (en) | Photovoltaic glass etching additive and application thereof | |
| CN107245761A (en) | Diamond wire polycrystalline silicon texturing adjuvant and its application | |
| CN101624700A (en) | Preparation method of surface texture of polycrystalline silicon solar cell |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |