CN116603700B - A method for preparing a support grid - Google Patents
A method for preparing a support grid Download PDFInfo
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- CN116603700B CN116603700B CN202210119214.5A CN202210119214A CN116603700B CN 116603700 B CN116603700 B CN 116603700B CN 202210119214 A CN202210119214 A CN 202210119214A CN 116603700 B CN116603700 B CN 116603700B
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- patterned metal
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- 239000000463 material Substances 0.000 claims description 64
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 6
- 239000004645 polyester resin Substances 0.000 claims description 6
- 229920001225 polyester resin Polymers 0.000 claims description 6
- 229920002050 silicone resin Polymers 0.000 claims description 6
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000009832 plasma treatment Methods 0.000 claims description 4
- 239000004814 polyurethane Substances 0.000 claims description 4
- 229920002635 polyurethane Polymers 0.000 claims description 4
- 238000002834 transmittance Methods 0.000 claims description 4
- 239000004743 Polypropylene Substances 0.000 claims description 3
- 239000004809 Teflon Substances 0.000 claims description 3
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- 238000003848 UV Light-Curing Methods 0.000 description 1
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/301—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements flexible foldable or roll-able electronic displays, e.g. thin LCD, OLED
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
There is provided a method of making a support grid comprising the steps of: providing a lining plate; a patterned metal grid is arranged on the lining plate; coating a photosensitive polymer material on the patterned metal grid; irradiating the photosensitive polymer material with ultraviolet light to cure the photosensitive polymer material to form the support grid plate. The method can obtain the supporting grid plate with uniform thickness, thereby improving the fitting degree of the supporting grid plate and the display screen and being beneficial to the subsequent stamping process; meanwhile, the process is convenient, simple and environment-friendly.
Description
Technical Field
The application relates to the field of electronic product accessories, in particular to a preparation method of a support grid plate.
Background
With the increasing maturity of full screen technology, foldable, retractable and rollable products in mobile terminals are receiving a wide market attention. For foldable products, the viscoelastic properties of the hinge structure and the screen's own materials lead to problems of screen folds, poor durability, etc., which greatly limit its marketing. The telescopic product can well solve the problems, but the film surface of the telescopic product in the related technology is uneven, so that the film can not be tightly attached to the display screen during assembly, the subsequent stamping process is influenced, and further popularization and use are influenced.
Disclosure of Invention
The present application aims to solve at least one of the technical problems in the related art to some extent.
Therefore, the embodiment of the application provides a method for preparing the support grid plate, so that the support grid plate with uniform thickness can be obtained, the fitting degree of the support grid plate and a display screen is improved, and the subsequent stamping process is facilitated. Meanwhile, the preparation method provided by the embodiment of the application uses the metal grating which can be used as a mask, so that the alignment precision is not required to be selectively adjusted in the curing process, and the process is convenient and simple. In addition, the preparation method provided by the embodiment of the application is based on the photosensitive polymer coating, and the cured photosensitive material has high intermolecular crosslinking degree and has the characteristics of water resistance, acid and alkali resistance, chemical solvent resistance and the like, so that the uncured material can be thoroughly cleaned in the subsequent treatment without affecting the cured material. Therefore, the preparation method can produce the supporting grid plate with no organic residue on the surface and no chemical pollution, thereby effectively reducing the chemical pollution, being environment-friendly and realizing the optimization of the technical process.
In an embodiment of the present application, a method of preparing a support grid includes the steps of:
Providing a lining plate;
a patterned metal grid is arranged on the lining plate;
Coating a photosensitive polymer material on the patterned metal grid;
irradiating the photosensitive polymer material with ultraviolet light to cure the photosensitive polymer material to form the support grid plate.
After the lining plate is provided by the method for preparing the support grid plate, the patterning metal grid is arranged on the lining plate, the photosensitive polymer material is coated on the patterning metal grid, and then the photosensitive polymer material is irradiated by ultraviolet light, so that the photosensitive polymer material is solidified to form the support grid plate, and the photosensitive polymer material is solidified in a self-aligned exposure mode, so that the high controllability of the gap filling depth of the support grid plate is realized, the fitting degree of the support grid plate and a display screen is improved, and the technical process is optimized.
In some embodiments, the patterned metal grid and the backing plate are surface treated, preferably by surface plasma treatment or surface blasting, prior to the application of the photosensitive polymeric material to the patterned metal grid.
In some embodiments, the photosensitive polymeric material is selected from at least one of the following: the photosensitive polymer material is selected from at least one of the following: UV curable polyurethane, UV curable polyester resin, UV curable acrylate, UV curable modified silicone resin, and mixtures thereof.
In some embodiments, the photosensitive polymeric material is coated on the patterned metal grid at a spray flow rate of 1 to 5ml/s, optionally at a spray rate of 200 to 1000 cm/min.
In some embodiments, after the photosensitive type polymeric material is coated on the patterned metal grid, the photosensitive type polymeric material is leveled for at least 10 minutes, preferably 1 to 7 minutes, preferably 1 to 5 minutes, preferably 1 to 3 minutes, more preferably 2 minutes, and then the photosensitive type polymeric material is heated at a temperature lower than 100 ℃, preferably 70 to 90 ℃, more preferably 80 ℃ to dry the surface thereof.
In some embodiments, the photosensitive polymeric material has a solids content of 30% to 100%, preferably 50% to 80%, more preferably 60%.
In some embodiments, the backing plate is a high ultraviolet light transmittance material, preferably quartz glass, teflon, and polypropylene film.
In some embodiments, ultraviolet light is used to irradiate the photosensitive polymer material from the side of the lining plate away from the patterned metal grid to cure the photosensitive polymer material,
Optionally, the photosensitive polymeric material is irradiated with an ultraviolet light energy of 500 to 5000mj/cm 2, preferably 850 to 3500mj/cm 2, more preferably 900 to 2500mj/cm 2, more preferably 1000 to 2000mj/cm 2.
In some embodiments, the curing depth of the photosensitive polymer material is positively correlated with the ultraviolet light energy, preferably, when the ultraviolet light energy is 500-5000mJ/cm 2, the curing depth is 15-320 μm; preferably, the curing depth is 20 μm to 200 μm when the ultraviolet light energy is 850 to 3500mJ/cm 2; preferably, the curing depth is 30 μm to 180 μm when the ultraviolet light energy is 900 to 2500mJ/cm 2; preferably, the depth of cure is 40-150 μm at an ultraviolet energy of 1000-2000mJ/cm 2.
In some embodiments, the ultraviolet light is at least one of UVA and UVB, preferably UVB.
In some embodiments, after the irradiating the photosensitive type polymer material with ultraviolet light to cure the photosensitive type polymer material, the method further comprises:
Removing the uncured photosensitive polymer material.
According to the preparation method of the support grid plate, the curing depth of the high polymer material in the gap is controlled to be cured through the self-aligned exposure process, so that the bonding degree of the support grid plate and the display screen is improved. In addition, the preparation method of the support grid plate thoroughly removes uncured polymer materials on the surface of the support grid plate on the basis of the photosensitive polymer coating, so that the support grid plate has the advantages of no organic residues on the surface and no chemical pollution.
According to one or more technical schemes provided in the embodiments of the present application, at least the following technical effects and advantages are provided:
According to the method for preparing the supporting grid plate, disclosed by the embodiment of the application, the photosensitive high polymer coating is used, the light curing characteristic of the photosensitive high polymer material and the patterning structure of the grid plate are utilized, meanwhile, the ultraviolet light energy is utilized to control the curing depth of the photosensitive high polymer material, so that the photosensitive high polymer material is cured in a self-aligned exposure mode, the high controllability of the curing depth is realized, the bonding degree of the supporting grid plate and a display screen is improved, and the stamping problem after the supporting grid plate is assembled is solved. In addition, the preparation method of the embodiment of the application is based on the photosensitive polymer coating, and the cured photosensitive material has high intermolecular crosslinking degree and has the characteristics of water resistance, acid and alkali resistance, chemical solvent resistance and the like, so that the uncured material can be thoroughly cleaned in the subsequent treatment without affecting the cured material. Therefore, the production of the supporting grid plate with no organic residue and no chemical pollution on the surface is realized, the environment is friendly, and the optimization of the technical process is realized.
Drawings
The foregoing and/or additional aspects and advantages of the application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:
FIG. 1 is a flow chart of a method of making a support grid according to an embodiment of the present application;
FIG. 2 is a schematic view of a method of making a support grid according to an embodiment of the present application;
FIG. 3 is another schematic view of a method of making a support grid according to an embodiment of the present application;
FIG. 4 is a further schematic view of a method of making a support grid according to an embodiment of the present application;
fig. 5 is a further schematic view of a method of making a support grid in accordance with an embodiment of the present application.
Reference numerals:
11: a lining plate;
12: patterning the metal grid;
13: a photosensitive polymer material;
14: and an ultraviolet light source.
Detailed Description
Embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings, are described in detail below. The embodiments described below by referring to the drawings are exemplary and intended for the purpose of explaining the present disclosure and are not to be construed as limiting the present disclosure.
The present application has been made based on the findings and knowledge of the inventors regarding the following facts and problems: in the related art, a thermosetting polymer material is coated on a metal grid and cured by heating and baking, so that the curing process is gradually performed from the outside to the inside (i.e., from the outer circumference toward the center). The cured films obtained in this way are generally of non-uniform thickness and therefore cannot be closely adhered to the display screen after assembly, adversely affecting the subsequent stamping process. In addition, the heat curing process by heating and baking generally requires the introduction of an organic solvent, and the cured film formed after curing has low crosslinking degree and does not have the characteristics of water resistance, acid and alkali resistance, chemical solvent resistance and the like, so that the surface of the cured film cannot be thoroughly cleaned, and serious organic solvent residues exist on the surface of the cured film.
The method of preparing a support grid provided in an embodiment of the present application is described below with reference to fig. 1.
FIG. 1 is a flow chart of a method of making a support grid in accordance with an embodiment of the present application. As shown in fig. 1, the method comprises the steps of:
step 101: providing a lining plate;
step 102: a patterned metal grid is arranged on the lining plate;
Step 103: coating a photosensitive polymer material on the patterned metal grid;
Step 104: irradiating the photosensitive polymer material with ultraviolet light to cure the photosensitive polymer material to form the support grid plate.
According to the method for preparing the supporting grid plate, provided by the embodiment of the application, the photosensitive high polymer coating is used, the light curing characteristic of the photosensitive high polymer material and the patterning structure of the grid plate are utilized, and meanwhile, the ultraviolet light energy is utilized to control the curing depth of the photosensitive high polymer material, so that the photosensitive high polymer material is cured in a self-aligned exposure mode, the high controllability of the curing depth is realized, the bonding degree of the supporting grid plate and the display screen is improved, and the stamping problem after the supporting grid plate is assembled is solved. In addition, the preparation method of the embodiment of the application is based on the photosensitive polymer coating, and the cured photosensitive material has high intermolecular crosslinking degree and has the characteristics of water resistance, acid and alkali resistance, chemical solvent resistance and the like, so that the uncured material can be thoroughly cleaned in the subsequent treatment without affecting the cured material. Therefore, the production of the supporting grid plate with no organic residue and no chemical pollution on the surface is realized, the environment is friendly, and the optimization of the technical process is realized.
In the embodiment of the application, the "supporting grid plate" is a supporting plate of a display screen in an electronic product, which is prepared by taking a patterned metal grid as a basic structure and filling the metal grid with a polymer material. It will be appreciated that any suitable size metal grid may be selected for the fabrication of the support grid. In some embodiments, the metal grid size is 50 x 150mm to 150 x 200mm, wherein the gap depth of the grid is 100 μm to 200 μm. The patterned metal grid is used as a basic structure and can be used as a mask, so that the alignment precision is not required to be selectively adjusted in the curing process, and the process is convenient and simple.
In the present embodiment, the "polymer material" is a material based on a polymer compound. In some embodiments, the "polymer material" may be a polymer material, which is a material formed by using a polymer compound as a matrix and further adding other additives (auxiliaries). In some embodiments, the "polymeric material" is a material to which no solvent is added. The polymer materials can be classified into thermosetting polymer materials and photosensitive polymer materials according to their fixing methods. In some embodiments, a photosensitive polymeric material is used. It is understood that the photosensitive polymeric material may be any photosensitive curable material or combination thereof. In some embodiments, the photosensitive polymeric material is selected from at least one of the following: UV curable polyurethane, UV curable polyester resin, UV curable acrylate, UV curable modified silicone resin, and mixtures thereof. In the preparation method of the support grid plate, the photocuring characteristics of the photosensitive polymer material enable the photosensitive polymer material to adjust the curing depth according to the exposure, so that the curing filling depth in the gaps of the metal grid plate is adjusted and controlled, the fitting degree of the prepared support grid plate and the display screen is improved, and the stamping problem after the support grid plate is assembled is solved.
In some embodiments, the "liner" in step 101 is a high ultraviolet light transmittance material. Preferably, the backing plate is quartz glass, teflon and polypropylene film. It can be appreciated that by using a material with high ultraviolet light transmittance as the liner plate, ultraviolet light is made to efficiently penetrate the liner plate and transfer ultraviolet light energy to the photosensitive polymer material to be cured, thereby improving the utilization rate of the ultraviolet light.
In some embodiments, before the coating of the photosensitive polymeric material on the patterned metal grid in step 103, the method further comprises: and carrying out surface treatment on the patterned metal grid and the lining plate.
In particular, the surface treatment may be in any form of treatment for surface pretreatment. Preferably, the surface treatment is a surface plasma treatment or a surface blasting treatment, more preferably, the surface treatment is a surface plasma treatment. In some embodiments, the treated metal grid surface has a water drop angle of 0 to 5 °. Therefore, the surface-treated metal grille is favorable for the subsequent coating and curing of the high polymer material.
In step 103, a photosensitive polymer material is coated on the patterned metal grid.
Specifically, when the photosensitive polymer material is coated on the patterned metal grating, the solid content, the spraying flow and the spraying speed of the polymer material are adjusted and determined according to the gap and the film thickness of the metal grating. In some embodiments, the photosensitive polymeric material is coated on the patterned metal grid at a spray flow rate of 1 to 5ml/s, optionally at a spray rate of 200 to 1000cm/min, the photosensitive polymeric material having a solids content of 30% to 100%, preferably 50% to 80%, more preferably 60%. Therefore, the homogenization of the coating of the high polymer material is realized by adjusting the solid content, the spraying flow and the spraying speed of the high polymer material, and the subsequent leveling and solidification are facilitated.
In some embodiments, after the photosensitive polymeric material is coated on the patterned metal grid in step 103, the method further comprises: the photosensitive polymer material is leveled for at least 10 minutes, preferably 1 to 7 minutes, preferably 1 to 5 minutes, preferably 1 to 3 minutes, more preferably 2 minutes, and then heated at a temperature lower than 100 ℃, preferably 70 to 90 ℃, more preferably 80 ℃ to dry the surface thereof.
"Leveling" refers to the process of gradually shrinking to a minimum area due to surface tension after coating application, before it has not yet formed a film. In some embodiments, after the photosensitive polymer material is coated on the patterned metal grid in step 103, the photosensitive polymer material is subjected to a leveling process. Wherein the leveling time is selected according to the property of the photosensitive polymer material. In some embodiments, leveling is for at least 10 minutes, preferably 1 to 3 minutes, more preferably 2 minutes. Therefore, the spreading of the photosensitive polymer material on the patterned metal grating is realized. The support grid plate prepared by the process has uniform thickness and high fitting degree with the display screen.
"Surface dry" also referred to as dry-to-touch refers to the stage at which the wet film coating has reached surface dryness, the film coating transitions from a flowable liquid state to a state in which it is relatively non-flowable and the surface begins to conjunctiva. In the embodiment of the application, after the photosensitive polymer material is subjected to leveling treatment, the photosensitive polymer material is subjected to surface drying treatment. It is understood that the corresponding tack-free time is selected according to the condition of the photosensitive polymer material coating. In some embodiments, the photosensitive polymeric material is surface-dried using a tunnel oven, and the surface-drying temperature is set to a temperature lower than 100 ℃, preferably 70 to 90 ℃, more preferably 80 ℃, to heat the photosensitive polymeric material to dry the surface thereof. The surface drying is favorable for coating films not to adhere light and small particles, and the support grid plate prepared by the process has uniform thickness and high degree of adhesion with a display screen.
In step 104, the photosensitive polymer material is irradiated with ultraviolet light to cure the photosensitive polymer material to form a support grid.
In some embodiments, ultraviolet light is used to irradiate the photosensitive polymeric material from the side of the liner plate remote from the patterned metal grid to cure it. It will be appreciated that "self-aligned exposure" is achieved by illuminating the side of the patterned metal grid away from the liner (i.e. the backside) as shown in fig. 4.
Specifically, "self-aligned exposure" means that no deliberate alignment is required during curing of the polymeric coating, the photosensitive polymeric coating between the grids will be cured due to the shielding of the patterned metal grids, and the coating material shielded by the grids will not be cured. That is, the self-aligned exposure is based on far field diffraction of light, and the pattern of the metal grating is used as a mask, so that the curing of the polymer material filled with the material gap is realized through ultraviolet exposure. It is understood that the "mask" refers to a metal grid, and the photosensitive polymer material without the grid can be cured due to the irradiation of ultraviolet light, while the photosensitive polymer material with the grid cannot be cured due to the shielding of the metal grid by ultraviolet light. According to the embodiment of the application, the photosensitive polymer material is cured by using a self-aligned exposure process, so that the high controllability of the gap curing depth of the support grid plate is realized, the bonding degree of the support grid plate and the display screen is improved, and the stamping problem after the support grid plate is assembled is solved.
In some embodiments, the photosensitive polymeric material is irradiated with an ultraviolet light energy of 500 to 5000mj/cm 2, preferably 850 to 3500mj/cm 2, more preferably 900 to 2500mj/cm 2, more preferably 1000 to 2000mj/cm 2. It can be understood that the curing depth of the photosensitive polymer material in the gap of the patterned metal grid can be controlled by adjusting the ultraviolet light energy according to specific requirements and practical situations (such as specific situations of the molecular structure, the number and position of polar groups, the number and position of double bonds, the initiating efficiency and the number of the initiator and the like of the photosensitive polymer material), wherein the curing depth is positively related to the ultraviolet light energy, i.e. the higher the ultraviolet light energy is, the deeper the curing depth is. In some embodiments, the depth of cure is 15 μm to 320 μm when the ultraviolet light energy is 500 to 5000mJ/cm 2; when the ultraviolet light energy is 850-3500mJ/cm 2, the curing depth is 20-200 mu m; when the ultraviolet energy is 900-2500mJ/cm 2, the curing depth is 30-180 mu m; the curing depth is 40-150 μm when the ultraviolet energy is 1000-2000mJ/cm 2. Therefore, the height of the filling depth of the high polymer material in the metal grid gap is controllable, the fitting degree of the supporting grid plate and the display screen is improved, and the stamping problem after the supporting grid plate is assembled is solved.
It will be appreciated that any wavelength of uv light or combination thereof in the UVA and UVB bands that is capable of passing through the backing plate may be used as desired. In some embodiments, the ultraviolet light is at least one of UVA and UVB, preferably UVB. That is, the ultraviolet light has at least one of wavelengths of 275 to 400 nm. Preferably, the wavelength of the ultraviolet light is 280-320nm. Therefore, the ultraviolet light can effectively pass through the lining plate and the energy of the ultraviolet light is used for curing the photosensitive polymer material, so that the process of controlling the curing depth by the ultraviolet light energy is realized.
In some embodiments, the irradiating the photosensitive polymer material with ultraviolet light in step 104 to cure the photosensitive polymer material further comprises: removing the uncured photosensitive polymer material.
In some embodiments, the uncured photosensitive polymeric material is physically removed, for example, using an organic solvent or using an air knife or the like. Optionally, organic solvents such as alcohols and ketones are used to remove the surface uncured photosensitive polymer material. In some embodiments, the surface uncured photosensitive polymeric material is removed by cleaning with a cleaning machine. It can be understood that the photosensitive polymer material is cured after being irradiated by the ultraviolet light, and the cured photosensitive polymer material has high intermolecular crosslinking degree and has the characteristics of water resistance, acid and alkali resistance, chemical solvent resistance and the like, so that the uncured material can be thoroughly cleaned by adopting the physical mode without affecting the cured material. Therefore, the preparation method can produce the supporting grid plate with no organic residue on the surface and no chemical pollution, thereby effectively reducing the chemical pollution, being environment-friendly and realizing the optimization of the technical process.
In some embodiments, after removing the uncured photosensitive polymeric material, further comprising: and (3) passing the support grid plate through an air knife, and then sending the support grid plate into a high-temperature unit for drying and ageing after drying.
Specifically, the support grid plate after the uncured photosensitive polymer material is removed is passed through an air knife to be primarily blow-dried and remove the trash on the surface of the support grid plate. It is understood that the air knife and the high temperature unit parameters are set and adjusted according to the specific situation of removing the uncured high polymer material. In some embodiments, the air knife speed is 15 to 20m/s. In some embodiments, the high temperature unit temperature is set to 110 to 140 ℃, and the treatment time is set to 20 to 45 minutes. It will be appreciated that the lower the temperature setting, the longer the processing time setting, when processed through the high temperature unit. The thickness of the produced support grid plate is uniform, and the degree of fitting with a display screen is high; meanwhile, the process is simple, and the process optimization is realized.
In some embodiments, after removing the uncured photosensitive polymeric material, further comprising: and taking out the supporting grid plate.
Specifically, after drying and aging by a high temperature unit, a carbon dioxide laser cutter is used to cut along the edges of the product (i.e., support grid) to separate it from the backing plate and remove the backing plate. And after the lining plate is removed, the original contact surface (namely the back surface of the product) of the supporting grid plate and the lining plate is covered with a protective film, then the high polymer material is coated with the protective film, the back surface protective film of the product is removed in a turnover manner, then the coated surface protective film is removed in a turnover manner, and the supporting grid plate is taken out. It will be appreciated that in production, the protective film is provided to prevent contamination of the product by the external environment and at the same time to prevent scratching of the product by hard objects. The support grid plate produced by the process has uniform thickness and high degree of fitting with the display screen, and is beneficial to the subsequent film printing process.
Example 1
The method of preparing a support grid in embodiment 1 of the present application is explained below with reference to fig. 2 to 5. Embodiment 1 of the present application shows a method for producing a support grid by spraying and curing a UV-type polymer material to form a cured filling, comprising:
1. Providing high-transparency quartz glass as a lining plate, and arranging a patterned metal grid on the lining plate, wherein the specific structure is shown in figure 2;
2. Using air plasma to treat the surfaces of the patterned metal grating and the lining plate, wherein the water drop angle of the treated surface of the metal grating is less than 5 degrees;
3. spraying a UV curing polyurethane coating (shown in figure 3), and after 2min of leveling time, drying in a tunnel furnace at 80 ℃ for 10 min;
4. Ultraviolet curing: the UV-curable polyurethane coating is irradiated on the side (namely the back) of the lining board by using 2000mj/cm 2 ultraviolet energy (the ultraviolet wavelength is 300 nm) to cure, and the curing depth is 150 mu m, as shown in FIG. 4;
5. Removing uncured UV-curable polyurethane material on the surface of the support grid plate: as shown in fig. 5, the supporting grid plate is passed through an air knife to remove uncured high polymer material on the surface, the speed of the air knife is set to be 15m/s, and then the air knife is dried and aged in a high-temperature unit, the high-temperature unit is set to be 110 ℃, and the treatment time is set to be 45min;
6. take out the product (i.e. support grid): and (3) using a carbon dioxide laser cutting machine to separate the polyurethane coating surface from the back lining plate along the edge of the product, turning over to remove the back protection film of the product, turning over to remove the coating surface protection film, and taking out the product.
Meanwhile, in the step 4, irradiation is performed by using different ultraviolet light energies to cure the UV-curable polyurethane coating, and specific ultraviolet light parameters and the obtained curing depth are shown in table 1.
Example 2
Example 2 of the present application shows a method of preparing a support grid using a UV curable polyester resin as a photosensitive polymer material, wherein in step 3 of example 1 described above, a UV curable polyester resin is used as a photosensitive polymer material, and irradiation is performed using different ultraviolet light energies, respectively, to cure a UV curable polyester resin coating, and the remaining steps are the same as example 1. The specific uv parameters and the resulting cure depths are shown in table 1.
Example 3
Example 3 of the present application shows a method of preparing a support grid using UV curable acrylate as a photosensitive polymer material, wherein in step 3 of example 1 described above, UV curable acrylate is used as a photosensitive polymer material, and irradiation is performed using different UV energies, respectively, to cure the UV curable acrylate coating, and the remaining steps are the same as example 1. The specific uv parameters and the resulting cure depths are shown in table 1.
Example 4
Example 4 of the present application shows a method of preparing a support grid using a UV-curable modified silicone resin as a photosensitive polymer material, wherein in step 3 of example 1 described above, a UV-curable modified silicone resin is used as a photosensitive polymer material, and irradiation is performed using different UV energies, respectively, to cure a UV-curable modified silicone resin coating, and the remaining steps are the same as example 1. The specific uv parameters and the resulting cure depths are shown in table 1.
Example 5
And detecting organic residues on the surface of the prepared support grid plate, attaching a display screen to the support grid plate, and evaluating the attaching degree of the display screen. The specific results are shown in Table 1.
TABLE 1
As can be seen from Table 1, the supporting grid plates prepared by the methods of examples 1-4 of the present application have a high degree of adhesion to the display screen, thereby solving the problem of stamping after the supporting grid plates are assembled. In addition, the method thoroughly eliminates the organic residues on the surface of the supporting grid plate, effectively reduces chemical pollution and realizes the optimization of the technical process.
In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings are merely for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element being referred to must have a specific orientation, be configured and operated in a specific orientation, and therefore should not be construed as limiting the present invention.
Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include at least one such feature. In the description of the present invention, the meaning of "plurality" means at least two, for example, two, three, etc., unless specifically defined otherwise.
In the present invention, unless expressly stated or limited otherwise, a first feature "up" or "down" a second feature may be the first and second features in direct contact, or the first and second features in indirect contact via an intervening medium. Moreover, a first feature being "above," "over" and "on" a second feature may be a first feature being directly above or obliquely above the second feature, or simply indicating that the first feature is level higher than the second feature. The first feature being "under", "below" and "beneath" the second feature may be the first feature being directly under or obliquely below the second feature, or simply indicating that the first feature is less level than the second feature.
For purposes of this disclosure, the terms "one embodiment," "some embodiments," "example," "a particular example," or "some examples," etc., mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the invention.
Claims (24)
1. A method of making a support grid comprising the steps of:
Providing a lining plate;
a patterned metal grid is arranged on the lining plate;
Coating a photosensitive polymer material on the patterned metal grid;
Irradiating the photosensitive high polymer material with ultraviolet light to cure the photosensitive high polymer material to form the supporting grid plate; and
Removing the uncured photosensitive polymer material,
Wherein ultraviolet light is adopted to irradiate the photosensitive polymer material from one side of the lining plate far away from the patterned metal grid so as to solidify the photosensitive polymer material,
Wherein the photosensitive polymer material is irradiated with ultraviolet light energy of 500 to 5000mj/cm 2,
Wherein after said applying a photosensitive polymeric material to said patterned metal grid, leveling said photosensitive polymeric material for at least 10 minutes, then heating said photosensitive polymeric material at a temperature of less than 100 ℃ to dry the surface thereof, and
Wherein the photosensitive polymer material is selected from at least one of the following: UV curable polyurethane, UV curable polyester resin, UV curable acrylate, UV curable modified silicone resin, and mixtures thereof.
2. The method of claim 1, wherein the patterned metal grid and the backing plate are surface treated prior to the applying the photosensitive polymeric material to the patterned metal grid.
3. The method according to claim 2, wherein the surface treatment is a surface plasma treatment or a surface blasting treatment.
4. The method of claim 1, wherein the photosensitive polymeric material is coated on the patterned metal grid at a spray flow rate of 1 to 5 ml/s.
5. The method of claim 4, wherein the photosensitive polymeric material is coated on the patterned metal grid at a spray rate of 200 to 1000 cm/min.
6. The method according to claim 1, wherein after the photosensitive type polymer material is coated on the patterned metal grid, the photosensitive type polymer material is leveled for 1 to 7 minutes and then heated at a temperature lower than 100 ℃ to dry the surface thereof.
7. The method according to claim 6, wherein after the photosensitive type polymer material is coated on the patterned metal grid, the photosensitive type polymer material is leveled for 1 to 5 minutes and then heated at a temperature of 70 to 90 ℃ to dry the surface thereof.
8. The method according to claim 7, wherein after the photosensitive type polymer material is coated on the patterned metal grid, the photosensitive type polymer material is leveled for 1 to 3 minutes and then heated at a temperature of 70 to 90 ℃ to dry the surface thereof.
9. The method according to claim 8, wherein after the photosensitive type polymer material is coated on the patterned metal grid, the photosensitive type polymer material is leveled for 2 minutes and then heated at a temperature of 80 ℃ to dry the surface thereof.
10. The method of claim 1, wherein the photosensitive polymeric material has a solids content of 30% to 100%.
11. The method of claim 10, wherein the photosensitive polymeric material has a solids content of 50% to 80%.
12. The method of claim 11, wherein the photosensitive polymeric material has a solids content of 60%.
13. The method of claim 1, wherein the backing plate is a high ultraviolet light transmittance material.
14. The method of claim 13, wherein the backing plate is a quartz glass, teflon or polypropylene film.
15. The method according to claim 1, wherein the photosensitive polymeric material is irradiated with ultraviolet light energy of 850 to 3500mj/cm 2.
16. The method of claim 15, wherein the photosensitive polymeric material is irradiated with ultraviolet light energy of 900 to 2500mj/cm 2.
17. The method of claim 16, wherein the photosensitive polymeric material is irradiated with ultraviolet light energy of 1000 to 2000mj/cm 2.
18. The method of any one of claims 1 to 14, wherein the depth of cure of the photosensitive polymeric material is positively correlated with the uv light energy.
19. The method of claim 18, wherein the depth of cure is 15 μm to 320 μm when the uv energy is 500 to 5000mj/cm 2.
20. The method of claim 19, wherein the depth of cure is 20 μm to 200 μm when the ultraviolet light energy is 850-3500mj/cm 2.
21. The method of claim 20, wherein the depth of cure is from 30 μm to 180 μm when the ultraviolet light energy is from 900 to 2500mj/cm 2.
22. The method of claim 21, wherein the depth of cure is 40-150 μm when the uv energy is 1000-2000mj/cm 2.
23. The method according to any one of claims 1 to 14, wherein the ultraviolet light is at least one of UVA and UVB.
24. The method of claim 23, wherein the ultraviolet light is UVB.
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