CN1162718C - Process device for producing polarizer - Google Patents
Process device for producing polarizer Download PDFInfo
- Publication number
- CN1162718C CN1162718C CNB011204028A CN01120402A CN1162718C CN 1162718 C CN1162718 C CN 1162718C CN B011204028 A CNB011204028 A CN B011204028A CN 01120402 A CN01120402 A CN 01120402A CN 1162718 C CN1162718 C CN 1162718C
- Authority
- CN
- China
- Prior art keywords
- liquid crystal
- substrate
- thin slice
- lyotropic liquid
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title description 40
- 239000000758 substrate Substances 0.000 claims abstract description 98
- 239000000463 material Substances 0.000 claims abstract description 27
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims description 63
- 239000011248 coating agent Substances 0.000 claims description 56
- 239000004976 Lyotropic liquid crystal Substances 0.000 claims description 47
- 239000012528 membrane Substances 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 238000006073 displacement reaction Methods 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 abstract description 16
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 12
- 230000015572 biosynthetic process Effects 0.000 abstract description 11
- 239000000975 dye Substances 0.000 abstract description 10
- 230000002535 lyotropic effect Effects 0.000 abstract 1
- 230000010287 polarization Effects 0.000 description 22
- 239000000243 solution Substances 0.000 description 22
- 239000010410 layer Substances 0.000 description 17
- 239000007788 liquid Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000001035 drying Methods 0.000 description 6
- 210000002858 crystal cell Anatomy 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000005315 distribution function Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000011197 physicochemical method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
- B05C5/0212—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles only at particular parts of the articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1039—Recovery of excess liquid or other fluent material; Controlling means therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0245—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
- B05C5/025—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web only at particular part of the work
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3016—Polarising elements involving passive liquid crystal elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
Abstract
The invention pertains to technological apparatus for production of polarizers, obtained from lyotropic liquid crystals (LLC) based on organic compounds, in particular, dyes. The technological production line for polarizer formation comprises at least one system of formation of polarizer films from LLC of at least one organic compound, at least one system of local removal of the polarizer film material obtained from LLC of at least one organic compound, at least one substrate holder and at least one means of relative movement. Also introduced, an apparatus for formation of polarizer films from LLC of at least one organic compound and a system of localized removal of polarizer films obtained from LLC of at least one organic compound.
Description
Technical field
The present invention is applicable to that based on organic compound particularly the lyotropic liquid crystal of dyestuff is produced polariscopic process unit.
Background technology
Known a kind of liquid crystal solution with organic dyestuff is the polariscope [1] that the basis obtains.Use this technology, with another kind of known method the liquid crystalline dyes solution film is coated on glass or the polymer matrix film and obtains polariscope.This technology is characterised in that in the process that is oriented in coated film of dye molecule and takes place, so forms heat-resisting polarization shallow layer immediately after the drying on substrate.This film can be used as polariscope in various optical devices.Can be applicable to the new design of LCD, wherein polariscope can directly form in surface, outside and the inside of liquid crystal cell (liquid crystal cell).
The modern technologies made from display are the same, and polariscopic coating has certain feature relevant with water absorptivity with its little thickness in display.Therefore, for example, be positioned under the outside situation at polariscope, it must adopt some protective device in case mechanical destruction.Furtherly, the zone that protective layer covers, should ratio polarization mirror zone bigger, contact with any of environment so that prevent polariscope fully, and prevent penetrating of moisture.Be positioned under the situation of liquid crystal cell inside at it, should be at the bonded areas polariscope around the liquid crystal cell circumference, secondly this is because it will jeopardize bond quality, and, will with contact on every side.Therefore, the polariscope perform region that should only cover display does not cover around it.Consider that the minority display is formed by single substrate, proposed to form the necessity of pattern on its surface.This can be coated on the substrate by polariscope is located, or removes the polarization layer that is coated on the whole surface of substrate in advance by the location and carry out, and in the appropriate area of substrate it is protected.
For existing multiple coating method of this film and device [2].The coating of LC solution can utilize slit (slot), rod or roller to realize.But, since be difficult to form uniform 15-10 μ m thick do not have line and in the working range of whole substrate the even wet coated film of orientation of molecule, known devices does not allow to obtain having the repeatably polariscope of characteristic.In addition, these devices do not allow to obtain the polariscope on the separation region that polarization layer is coated on substrate.
Known formation is based on the polarizing coating method of patterning [3] of lyotropic liquid crystal (LLC) compound.According to [3], film forms by cylindrical engraved roll, and wherein engraving adopts the groove on the roller surface within the border of pattern.Groove is full of LLC solution, and it then rolls across substrate surface by roller and is transferred on the substrate surface.Because the high viscosity of LLC makes this method that shortcoming be arranged, can be used for having the quality of roller to guarantee to apply no longer than the 3cm diameter, therefore be difficult to formation and have along coating direction length dimension greater than the 10cm pattern.In addition, the use of this method largely depends on the thickness of the film of the viscosity of LLC and formation.Especially, degree of molecular orientation is obvious than poor in film in thick film.Therefore, in order to form pattern on polariscope, suitable method is the whole surface applied one deck polariscope at substrate, and removes from the part surface location subsequently, stays suitable polariscope figure.
Known multiple method from the thin isotropic membrane of substrate surface removing is not by the mechanical removal at separated region, uses mask (protective mask) exactly in etching.But they all have many significant disadvantages, and this has limited the scope of application of their removing polarization layer.Especially, mechanical means needs the material fall to be eliminated clearly from service part continually, and the dust that forms in process of the reason that will constantly disappear.Etching by using mask or rinsing are removed the method for polarization layer with the location, because they comprise several and the relevant processing step of formation mask, cause productive capacity lower and cost is higher.In addition, the use of mask and follow-up removing on polarization layer can cause polariscope structure destruction to a certain degree inevitably.
Summary of the invention
The objective of the invention is to develop be used for producing on the whole surface of substrate and only in its required zone, make the device of thickness and the uniform polarizer layer of molecular orientation with LC solution.
Technical result of the present invention is the innovation that is used for producing the device of the polarizing coating of making at substrate surface, based on the LLC of organic compound.The device that is proposed can improve molecular orientation in the polarized material, optical anisotropy, and, as a result of, the polarization efficiency of the film with same thickness is improved, whole surface thickness homogeneity improves, in the application rate range expansion that does not cause under the restrictive condition that forms the defective line on the polariscope.
Technical result of the present invention also is to be used for innovation that the no mask of the separated region location, polarization layer is removed.Technological process and device provide: the polarization layer that keeps being retained and on every side and all functions characteristic of the parts of on substrate, introducing in advance constant in, form polariscopic possibility in the needed zone of substrate; Remove and be eliminated the pollution of material polariscopic perform region and substrate; The structure that keeps film forms the straight flange of polarization layer and does not disturb the orientation of the molecule that closes on fringe region; And keep along structure and the integrality of removing edges of regions and the polarizing coating on polariscopic whole perform region.
Technical result of the present invention also is a kind of like this creation of device, and it allows the coating polarizing coating to substrate, and removes in the appropriate area location, simultaneously, keeps the integrality and the structure of film in desirable zone.In addition, the location of membrane material remove can be in film any stage of moisture carry out, this allows the reset procedure of dry and material is combined, the optimum condition that keeps dry in the cycle of whole polariscope formation.This not only because the minimizing of production operation is boosted productivity, and because the crystallization process in dry run causes comprising the additional molecular orientation along fringe region, improves the polariscope that generates, particularly in the quality at edge.Therefore, remove the location of membrane material, does not only form the edge that destroys, and because additional crystallization process provides " reparation " to keep the chance of coating edge.
Technical result of the present invention, in fact obtain being used for forming polariscopic device from lyotropic liquid crystal based at least a organic compound, this device comprises an application system, this application system is coated at least one with LLC and is placed on the substrate on the substrate holder, a system that on LLC, applies dipole-dipole force, and a device is used for supporting that this system makes it to have the possibility of relative displacement with at least one substrate holder, this system that applies dipole-dipole force comprises at least one thin slice, the one end is fixed, when thin slice and substrate holder relatively move, at least the part on the surface of this thin slice does not move on the surface of the film of coating limitedly, to be provided at the additional dipole-dipole force of LLC.
In said apparatus, at least one application system can comprise the method for at least a supply LLC.The method of at least a supply LLC can comprise that at least one is used for supplying with the nozzle of LLC, and/or at least one transfer roller system, and/or at least one has the passage of feeding dosimeter.At least one application system can comprise at least one adopt at least one rotation roller and/or at least one stationary roll and/or at least one slit and/or at least one rod be used for LLC is coated to on-chip parts.Can introduce impression (pattern) on the surface of at least one roller.On at least a portion thin slice (plate) surface, can have hydrophilic and/or oleophilic properties.On at least a portion sheet surface, can introduce impression (pattern).Thin slice usable polymers material or rubber, or at least two kinds of different materials, the independent sector of laminating and/or the layer of laminating.But can being mounted to, at least one application system has with respect to the substrate holder vertical moving.The installation of at least one application system can move horizontally with respect to substrate holder.One end of thin slice can be fixed on one or the different clamper with application system, or directly at least one application system.At least one application system can adopt at least one to be mounted to the stationary roll with ability that moves that the thin slice that clamps the film that forms is provided.The device of the film that at least a clamping thin slice and formation are housed can add at least one dipole-dipole force system.Thin slice can adopt rectangular shape.Device can add at least one anti-shake system and/or the control and/or the control system of forming process automatically are housed.
Technical result in fact also is to obtain by the device that the polarizing coating material that obtains from the LLC of at least a organic compound is removed in the location, at least one solvent feed system adopts at least one conduit, at least one solvent and/or reaction product and/or solution removal system to adopt at least one conduit, can be connected to carry and/or vacuum system.Technical result in fact also is in the device perpendicular to the position on the plane of at least one substrate holder its longitudinal axis to reach by feed system and scavenge system can be installed.Feed system can have ability vertical and/or that move horizontally with scavenge system.At the feed system and the scavenge system of a side with can have the possibility of relative displacement at the substrate holder of opposite side.Feed system and scavenge system can be mounted to fixed relative to one another or have the possibility that relatively moves.Feed system and scavenge system can adopt it to remove the coaxial pipeline of pipeline internal diameter greater than solution supply line internal diameter.Feed system and scavenge system can be in the fixing position of mutual distance.Device can add the system that automatic control is housed and/or controls whole location reset procedure.But the device additional equipment has at least one anti-shake system.
Technical result of the present invention comprises that by the polariscopic production line that forms at least one is used for removing from device, at least one location that the LLC of at least a organic compound forms polarizing coating device, at least one substrate holder and at least a device that they relatively move of the polarizing coating material that obtains from the LLC of at least a organic compound and obtains.Technical result of the present invention also since in fact at least one device and at least one location scavenge unit that in production line, is used for forming film can adopt device to reach according to claim.At least one is used for forming the device of film, device that at least one is used for locating removing and at least one substrate holder and can be on one or the pedestal that separates.Production line can be placed in the storehouse, or adopts the protectiveness shell.But at least one operating means of production line additional equipment is used for transmitting or shipping products.Production line can add and comprise at least one worktable, transmission and/or storage between being used to operate.But at least a drying device of production line additional equipment, be installed at least one device of production line, and/or between the device of production line, and/or before at least one device that is used for forming, and/or at least one is used for locating after the device of removing, and/or at least one substrate holder and/or under.At least a drying device can adopt well heater or blower system or pass through radiator system.Production line can add and comprise at least a antivibration device.But the automaton of production line additional equipment process and/or control the system of whole process.
The process unit of introducing can make the production line that is used for making the LC display.The position that this system is installed in the production line is definite by the polariscopic position of application, and relevant with its subsequent operation, and depends on that polariscope is in liquid crystal cell outside or inside.Here, for external and built-in polariscope, adopt the device of similar coating polarizing coating.
Key factor the technology that forms polarizing coating from the liquid crystal solution of organic substance, be actually the orientation as the main shaft of the molecular complex of structure in this solution and moving cell, the direction vector with liquid flow velocity in the zone that forms film in the volume of liquid film overlaps.Therefore, all the unevenness of any velocity distribution in the liquid capacity all will cause the unevenness in polarization layer after its drying.So,, be exactly even orientation and the uniform thickness thereof that this system must be provided at molecule in whole volumes of the liquid crystal solution film in the coating process for the major requirement that is used for forming the polariscope device.Further, the thickness of wet coating should be within the scope of 5-10 μ m.
In order to introduce the orientation of molecule, the method for coating should be provided at shearing or the stretching in the liquid level, and this directly is defined as the method for coated film the method for roller, rod and fluting (slot).
The essential condition that produces even molecular orientation in the LC solution coatings is to form laminar flow, even orientation liquid flow between the service part of substrate surface and application system, also have, when forming the zone from film and leave, the rectilinearity of the circuit that liquid breaks away from from the service part of application system.The non-newtonian flow change nature of liquid crystal solution, high virtual viscosity depend on shear rate and temperature from 1.5 to 0.5Pa*s variations, and about 70 dynes per centimeter (dyne is a unit of force, 10
-5Newton) high surface tension in fact stops this condition that produces.When coating had the solution of this character in film, the line of different-thickness and molecular orientation appearred easily.
The thickness of considering wet film has proposed special requirement on the vibration characteristics of device within 10 μ m.Application system all will be regulated the instantaneous distribution of the thickness of film and the velocity in liquid along the vibration of any direction.Therefore, for example, can regulate the thickness of film perpendicular to the vibration of the rod on thin slice plane.Furtherly, also can regulate the instantaneous distribution of liquid velocity, and as a result of, this will be the local direction of polarization axle.The vibration of application system or worktable on horizontal plane, perpendicular to the coating direction of film, the direction that can regulate the addition speed vector, and, inevitably, the molecular orientation direction of influence in the plane of film.This vibration can influence the polarization efficiency of the film that obtains significantly.All these show, for the mobile homogeneity of application system or worktable, and avoid the requirement vibrated very high.
Therefore, can determine simply, form as follows based on the polariscopic principal feature of liquid crystal solution:
1. the little thickness (＜10 μ m) of the wet coating of the LLC of Xing Chenging
2.LLC high virtual viscosity (～0.3Pa*s)
3. low-level vibration (perpendicular to substrate plane＜1 μ m)
4. the high uniformity of application system and worktable moves.
Description of drawings
Main points of the present invention obtain explanation by Fig. 1 to 6.
Fig. 1 is used for forming from liquid crystal solution total synoptic diagram of polariscopic production line.
Fig. 2 is used for forming the installation drawing of polarizing coating.
Fig. 3 alignment system installation method synoptic diagram.
The device synoptic diagram of the polarizing coating that Fig. 4 formation and substrate edge are angled.
Fig. 5 a and Fig. 5 b are used for locating the schematic representation of apparatus of removing the polarizing coating material.
Fig. 6 is used for locating the device that the system that removes polarized material constitutes by one group.
Embodiment
The major part that is used for applying the device (Fig. 1) of polarization layer is: support 1 (pedestal); all working system dress thereon; worktable 2 (substrate holder) is used for placing substrate; form the system 3 of polarizing coating, the system 4 of polarizing coating material, banded drying system 5 are removed in the location; the device (not shown) that worktable moves relative to machinery on support; control device 6, anti-shake system 7 is used for device 8 to the perform region proofing dust and protecting.In addition, device can comprise and is automatically fed on the worktable and removes the system of work substrate from worktable, LLC and perform region thermostat, and any other provide substrate to handle automatically, improves the system and the machinery of polariscope quality or device throughput rate.In Fig. 1, banded drying system and provides optimal polarization layer moisture when removing between formation system and location scavenge system.But, the system that polarization layer is removed in the location can be located immediately at after the application system or on, remove the wet film of LLC from substrate at desired area.
According to the structure of display, in general, the polarization axle of polarizing coating is necessary with respect to certain orientation of the optical axis of other parts.It is necessary on the angle with the limit of rectangle substrate is not the angle of 0 ° and 90 °, not apply polariscope.Therefore, be used to place the worktable of substrate, can have the device that horizontally rotates its plane with respect to moving direction.
The main operation carried out of device: the orientation that in advance LLC solution is coated on the substrate, it distributes from the teeth outwards becomes thin oriented layer, additional orientation, changes substrate is removed to the location of required angle, polarizing coating material, 90 ° of rotary substrates, is that remove the location of polarizing coating material for the second time then.Depend on that also according to polariscopic coating method, some operation can be saved or be carried out simultaneously in the orientation on the limit of the substrate angle with respect to moving direction.Under more common situation, when the substrate random orientation, the coating of polarizing coating is carried out in two steps: the surface at whole work substrate (it can further be used as a sheet in display) forms continuous coating, removes polariscope then, only keeps its part surface in the position of needs.The sequence of operation of device as shown in fig. 1.Substrate is positioned on the worktable 2, and LLC is coated on it.When substrate moves, just form polarizing coating, and, if necessary, the orientation of adding.After substrate left application system, with respect to the angled state of moving direction, the orientation that rotates to those limits was parallel to the state of moving direction from the orientation on its limit for it.When being moved further, substrate enters the operating area of system 4 that the material of polarizing coating is removed in the location, and in the position of hope from the membrane removal of substrate supernatant.After arriving the end of device, worktable rotates 90 ° and moving to travelling backwards.Here, polariscopic removing takes place on perpendicular to the direction of removing for the first time direction.Movable workbench is replaced by a new substrate to the reprocessed substrate of original position.Under scavenge system was located immediately at situation in the film coating system, device is compact (having littler size) more, because the maximum moving distance of substrate is limited by the Diagonal Dimension of substrate only, and under the situation in front, this distance is more than the twice.But, in this structure, substrate must move two and move circulation to finish the process that polariscope forms fully: form continuous film when mobile from left to right, when the reverse removing polariscope of locating for the first time when mobile, when second round-robin is mobile from left to right, finish for the second time and remove, and once sky moves so that substrate returns initial position.
For boosting productivity, device can have such bed dimension, and several substrates can be placed on it.Here, device can correspondingly have a plurality of coatings and scavenge system, so that also form polariscope simultaneously independently on each substrate.
Fig. 2 represents to be used for applying polariscopic system, and the service part that wherein produces polariscopic alignment films is a rod.The critical piece of system is an objective table 9, and 12 of balladeur trains that are equipped with the worktable 10 of vacuum fixer of work substrate and transmission system thereon.Worktable should be equipped with and be used for accurately placing the holder of substrate.Balladeur train 12 roles are that rod 13 usefulness clampers 14 are fixed thereon.Bar holder must reach it and be easy to install, and rigidly fixes and adjustable ground clamps the surface of substrate equably along its whole length.In addition, clamper can have parts fixed thereon 15, and it provides the power of the additional orientation on the LLC film.
Objective table 9 also has thereon system 16 of position, it be used for along the form coating LLC of the line of the whole length of rod to substrate.The reservoir of LLC is equipped with in system's 16 representatives that are used for LLC coating, LLC under the pressure of needs through pipeline by calibrated needle-like nozzle from the surface that wherein is coated to substrate.Nozzle can be crossed over substrate with the speed of needs along its whole width and move.Control to device is undertaken by control desk 18.
The objective table of device is placed on the worktable with antivibration protective device.
The operation of device is undertaken by following order.Initial balladeur train is positioned at leftmost position, thereby rod 13 is outside the border of substrate 11, and is supported to and is higher than it.Be used to apply the nozzle 17 of the system 16 of LLC this moment, be applied on the substrate, be positioned at the position of the top, edge of substrate by its LLC.In when beginning operation, nozzle is reduced to the height of hope, and the solution under pressure is sent the passage of nozzle to, and when solution began to be ejected on the surface of substrate, nozzle began to cross over substrate with the speed of hope and moves.The amount of coating material will be by the translational speed decision of pressure and nozzle.After arriving marginal position, nozzle is mentioned and is got back to reference position.Balladeur train begins to move, and when its arrives the edge of substrate, and rod lowers and begins on the surface of substrate with the speed developing solution of hope.In this course, parts 15 produce additional orientation influence on wet film, remove the interference of being brought out by rod in the coating mutually of polarizing coating in molecular orientation.After arriving leftmost position, balladeur train stops.In this course, rod mentions subsequently that balladeur train turns back to reference position.
Rod can use usually said Meyer rod (Mayer rod), has tightly the metal bar around the metal wire of the standard of thereon circular section.This rod allows to obtain the film of necessary thickness and high degree of uniformity.Molecular orientation at the same time has some distribution function that is brought out by the periodic structure on rod surface.This molecular orientation distribution function makes the polarization characteristic variation, and this is especially obvious in thick film.The introducing of additional orientation parts 15 can be eliminated this shortcoming, makes the distribution of orientations of molecule more even.
Being used for the parts 15 of additional orientation is the organic material flexible flake (or film) with smooth or smooth surface.In the coating process of polarizing coating, also slide thereon in the surface of this sheet contact LLC, because surface tension is producing uniform dipole-dipole force on the whole width additional, at substrate on the molecule of LLC.The length of selecting sheet to contact with the LLC film, so that reach best molecular orientation, and between the scope of 1-500mm.
Fig. 4 has represented to be used for applying the device of polarizing coating under the optical axis of polarization should be done the situation of have a certain degree (from 0 ° to 90 °) with the edge of display.Being formed in two steps of polarizing coating takes place.The first step, application roll 19 coating one deck dyestuffs are to substrate 11, and dyestuff, is pressed desired thickness and formed coating and orientation by resilient roller 20 pressed against substrates by parts (polymer sheet) 15 then.Dyestuff 21 is extracted and is sent on the intermediate calender rolls 23 by roller 22, and its surface has carried out deepening so that outstanding part is boxed out on substrate.Dyestuff can be sent on the application roll 19 on outstanding part, and further to substrate 11.Substrate is fixed on the rotary table 24 with vacuum.The coating of film and being oriented in the moving process of worktable takes place.Move to outside the border of application system when substrate after, worktable rotates to an angle, so that two limits of substrate are parallel to moving of worktable.Worktable then moves then, and substrate enters and is used for removing polariscopic device in essential regions.
Fig. 5 illustrates the implementation that two examples are used for locating the device of removing the polarizing coating material, based on a principle: remove at the regional dilute with water film of needs and with vacuum pump.Difference only is to be used for producing the method for additional hydraulic pressure in it is fed into the process of desired zone of substrate.In the system shown in Fig. 5 a, water can feeding under the pressure that several different methods produces; In second kind of system shown in Fig. 5 b, the pressure of water is produced by pull of vacuum.
In the device shown in Fig. 5 a, water is fed into the pipeline 27 through pump 26 from accumulator 25, its dilution dye film then, and removed by vacuum pump by pipeline 28.
A pipeline is arranged, at substrate 11 1 side openings in the device shown in Fig. 5 b.In the process of device near substrate, in pipe 30, produce negative pressure, water is drawn into the pipeline 29 from accumulator 31, and its dilutes dye film and removes by pipeline 30 then.Valve 33 control inflows.
Do not consider to make the method for water generates additonal pressure, this service part one-tenth composite component capable of being combined (Fig. 6).In this case, they will be worked simultaneously and be and remove polariscope film or one group of film bandedly.It will be suitable in applying device two groups of this parts being installed, and one works in the process that worktable moves forward, and another group works in the process that moves backward.Therefore the distance between the parts is corresponding with the width of display in one group, and is corresponding with the length of display in another group simultaneously.
In both cases, proposed device all allows to remove polarizing coating and has nothing to do with its moisture.The optimum moisture content of film is to select to remove at a high speed, keep the height-oriented condition in sharp edge and the edge region.
Realize the condition of the feasibility of this polariscope sweep-out method, be decided by the contrast of the application rate of the clearance rate of the dilution rate of polarizer materials and generation, solution and polarization layer.The rate dependent of coating can be from 5 to 200mm/ seconds in the viscosity of LLC solution.For the distance of this speed range and the 1cm between water feeding and vacuum pump passage, the duration of contact between water and the polariscope between 2 to 0.05 seconds.Show that rule of thumb control feedwater speed and the vacuum of granting solution might reach the removing fully of the thick dry polarizing coating of about 1 μ m, prove the technical feasibility of this method thus for location removing polarizing coating.
The high-quality of the polarizing coating that obtains has been confirmed in the research of carrying out, the anisotropy and the high polarization efficiency of height.Remove in the process of polarized material in the location, the edge of institute's reserve area and surface have desirable structure, and the zone is from have homogeneous thickness in its scope.Investigation shows, has reached the technical result of each device of listing above really.
The list of references of quoting from
[1]WO?94/28073，12/08/94
[2]RU?21148884，10/07/98
[3]RU?2110818，10/05/98
[4] " physico-chemical process that semiconductor surface is handled " (" Physico-chemical methods of surfaceprocessing of semiconductors "), Luft B.D., M.:, broadcasting equipment and circuit (Radio and connection), 1982, P107
Claims (25)
1. be used for forming polariscopic device from lyotropic liquid crystal based at least a organic compound, comprise an application system, described application system is coated at least one with lyotropic liquid crystal and is placed on the substrate on the substrate holder, a system that on lyotropic liquid crystal, applies dipole-dipole force, and a device is used for supporting that described system makes it to have the possibility that relatively moves with described substrate holder; It is characterized in that, the described system that applies dipole-dipole force comprises at least one thin slice, the one end is fixed, at described thin slice when described substrate holder moves, the part on the surface of described at least thin slice moves on the surface of the film that applies without restriction, is provided at the additional dipole-dipole force on the lyotropic liquid crystal.
2. device according to claim 1, wherein said application system comprises the device of supplying with lyotropic liquid crystal, is used for described lyotropic liquid crystal is supplied to described substrate.
3. device according to claim 2, the device of wherein said supply lyotropic liquid crystal comprises at least one nozzle.
4. device according to claim 2, the device of wherein said supply lyotropic liquid crystal comprises at least one roller.
5. device according to claim 4, the device of wherein said supply lyotropic liquid crystal comprise that at least one has the passage of feeding dosimeter.
6. according to any one described claim among the claim 1-3, wherein said application system comprises that at least one is used for applying described lyotropic liquid crystal to described on-chip parts and at least one roller.
7. device according to claim 2, wherein said application system comprises at least one rod.
8. device according to claim 6 wherein has embossment on the surface of described at least one roller.
9. device according to claim 1 and 2, the surface of wherein said at least a portion thin slice has hydrophilic or oleophilic properties.
10. device according to claim 1 and 2 has embossment on the surface of wherein said at least a portion thin slice.
11. device according to claim 1 and 2, wherein said thin slice are to be made of polymeric material or rubber.
12. device according to claim 2, wherein said application system is mounted to the ability that has perpendicular displacement with respect to described substrate holder.
13. device according to claim 2, wherein said application system is mounted to the ability that has horizontal shift with respect to described substrate holder.
14. device according to claim 1, wherein said application system adopt at least one fixing roller, and are mounted to and have locomotivity, make thin slice to the afterburning moulding of film.
15. device according to claim 1, wherein said thin slice adopts rectangular shape.
16. device according to claim 1 also comprises an anti vibration mounting.
17. device according to claim 1 also comprises a control moulding disposal system automatically.
18. device according to claim 1, also comprise the device that remove the polarizing coating material location that is used for the lyotropic liquid crystal from least a organic compound is obtained, the device that remove described location comprises: a feed system, be used for the delivery film material solvent, this feed system adopts at least one pilot conduits; With at least one scavenge system, be used for membrane material by vacuum removing solvent and dissolving.
19. device according to claim 18, wherein said feed system are mounted to its longitudinal axis with scavenge system and are positioned at the direction vertical with the plane of substrate holder.
20. according to claim 18 or 19 described devices, wherein said feed system and scavenge system are mounted to respect to described substrate holder and carry out vertical and/or move horizontally.
21. device according to claim 18, wherein said feed system and described scavenge system are mounted to relative to each other and can move.
22. device according to claim 18, wherein said feed system and described scavenge system are made of coaxitron, and the internal diameter of described scavenge system pipe is greater than the internal diameter of described solvent service pipe.
23. device according to claim 18, wherein said feed system and described scavenge system are mounted to distance fixed relative to one another.
24. device according to claim 1, wherein said thin slice comprise at least two layers being made by different materials.
25. device according to claim 1, wherein said thin slice comprise at least two independent parts being made by different materials.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2000117957/28A RU2226285C2 (en) | 2000-07-11 | 2000-07-11 | Gear to form polarizer, device for local removal of polarizer film and production line to form polarizers |
| RU2000117957 | 2000-07-11 | ||
| US09/844030 | 2001-04-26 | ||
| US09/844,030 US7108749B2 (en) | 2000-07-11 | 2001-04-26 | Technological machinery for production of polarizers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1334470A CN1334470A (en) | 2002-02-06 |
| CN1162718C true CN1162718C (en) | 2004-08-18 |
Family
ID=26654059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB011204028A Expired - Fee Related CN1162718C (en) | 2000-07-11 | 2001-07-11 | Process device for producing polarizer |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7106398B2 (en) |
| EP (1) | EP1174738A3 (en) |
| JP (1) | JP2002090547A (en) |
| CN (1) | CN1162718C (en) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004038463A1 (en) | 2002-10-25 | 2004-05-06 | Nitto Denko Corporation | Polarizer, method for manufacturing the same, optical film and image display |
| CN100388022C (en) * | 2002-10-25 | 2008-05-14 | 日东电工株式会社 | Polarizer, method for producing same, optical film and image display device |
| US20050104037A1 (en) * | 2003-09-23 | 2005-05-19 | Lazarev Pavel I. | Two-phase film materials and method for making |
| CN100439950C (en) * | 2003-09-23 | 2008-12-03 | 日东电工株式会社 | Two-phase thin film material and preparation method thereof |
| WO2005089094A2 (en) * | 2003-11-21 | 2005-09-29 | The Board Of Regents Of The University And Community College System Of Nevada | Materials and methods for the preparation of anisotropically-ordered solids |
| US7495644B2 (en) * | 2003-12-26 | 2009-02-24 | Semiconductor Energy Laboratory Co., Ltd. | Display device and method for manufacturing display device |
| TWI246608B (en) * | 2004-12-10 | 2006-01-01 | Hon Hai Prec Ind Co Ltd | Method and equipment for manufacturing a polarizer |
| EP1674898B1 (en) | 2004-12-21 | 2009-10-21 | Corning Incorporated | Light polarizing products and method of making same |
| WO2006081006A2 (en) | 2004-12-21 | 2006-08-03 | Corning Incorporated | Light polarizing products and method of making same |
| KR100928495B1 (en) * | 2005-06-20 | 2009-11-26 | 엘지디스플레이 주식회사 | Jig device for alignment film printing mask, cleaning equipment for alignment film printing mask using same and mask cleaning method using same |
| JP5142312B2 (en) | 2007-02-19 | 2013-02-13 | 日東電工株式会社 | Optical laminate manufacturing method and image display device |
| US9360596B2 (en) | 2013-04-24 | 2016-06-07 | Light Polymers Holding | Depositing polymer solutions to form optical devices |
| WO2015016631A1 (en) * | 2013-08-01 | 2015-02-05 | 주식회사 엘지화학 | Method for manufacturing polarizing film, polarizing film manufacturing device, and polarizing film manufactured using same |
| US9829617B2 (en) | 2014-11-10 | 2017-11-28 | Light Polymers Holding | Polymer-small molecule film or coating having reverse or flat dispersion of retardation |
| US9856172B2 (en) | 2015-08-25 | 2018-01-02 | Light Polymers Holding | Concrete formulation and methods of making |
| CN106399695B (en) * | 2016-10-09 | 2018-07-31 | 武汉华喻燃能工程技术有限公司 | The extracting method step by step of heavy metal element in a kind of petroleum coke |
| JP6858206B2 (en) | 2017-02-17 | 2021-04-14 | 富士フイルム株式会社 | Liquid crystal display device |
| US10962696B2 (en) | 2018-01-31 | 2021-03-30 | Light Polymers Holding | Coatable grey polarizer |
| US11370914B2 (en) | 2018-07-24 | 2022-06-28 | Light Polymers Holding | Methods of forming polymeric polarizers from lyotropic liquid crystals and polymeric polarizers formed thereby |
| US12072520B2 (en) | 2021-11-11 | 2024-08-27 | Light Polymers Holding | Linear polarizers and methods of forming a linear polarizer |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3015989A (en) * | 1958-01-27 | 1962-01-09 | Polaroid Corp | Light-polarizing film materials and process of preparation |
| US3235631A (en) * | 1962-08-23 | 1966-02-15 | Ind Biology Lab Inc | Polarization process |
| US3941901A (en) * | 1974-02-15 | 1976-03-02 | Hoffmann-La Roche Inc. | Surface alignment method for liquid crystal cells and production of polarizers therefor |
| US4056423A (en) * | 1975-04-23 | 1977-11-01 | Hercules Incorporated | Platemaking apparatus |
| US4797301A (en) * | 1986-09-22 | 1989-01-10 | Wellcome Australia Limited | Method of and apparatus for applying a fluid to a bulk commodity |
| GB8803923D0 (en) * | 1988-02-19 | 1988-03-23 | Gen Electric Co Plc | Optical storage devices |
| US5231525A (en) * | 1989-06-02 | 1993-07-27 | Idemitsu Kosan Co., Ltd. | Apparatus for orienting a liquid crystal material using a shear force and electric field |
| US5327285A (en) * | 1990-06-11 | 1994-07-05 | Faris Sadeg M | Methods for manufacturing micropolarizers |
| DE4121032A1 (en) * | 1991-06-26 | 1993-01-07 | Schmid Gmbh & Co Geb | DEVICE FOR TREATING PLATE-SHAPED OBJECTS, IN PARTICULAR BOARDS |
| RU2047643C1 (en) * | 1993-05-21 | 1995-11-10 | Хан Ир Гвон | Material for polarizing coating |
| EP0628847B1 (en) * | 1993-06-02 | 1998-10-07 | Nippon Oil Company, Limited | Liquid crystalline polymer film, process for producing same, and utilization thereof |
| DE69429751T2 (en) * | 1993-09-02 | 2002-08-22 | Matsushita Electric Industrial Co., Ltd. | Spatial light modulator, manufacturing method and projection type display device |
| JP3044681B2 (en) * | 1994-06-08 | 2000-05-22 | 富士写真フイルム株式会社 | Liquid crystal display |
| RU2114884C1 (en) | 1995-10-06 | 1998-07-10 | Поларайзер Интернэшнл, ЛЛСи. | Organic dyes capable of forming lyotropic liquid crystalline phase for dichroic light polarizers |
| RU2110818C1 (en) | 1995-07-31 | 1998-05-10 | Поларайзер Интернэшнл, ЛЛСи | Dichroic light polarizer and its manufacturing process |
| EP0774301A1 (en) * | 1995-10-19 | 1997-05-21 | Minnesota Mining And Manufacturing Company | Apparatus for removing material from a coated moving web and coating apparatus using such apparatus |
| US5952050A (en) * | 1996-02-27 | 1999-09-14 | Micron Technology, Inc. | Chemical dispensing system for semiconductor wafer processing |
| JP3449111B2 (en) * | 1996-04-18 | 2003-09-22 | 三菱電機株式会社 | Machining fluid storage device of electric discharge machine |
| US5826602A (en) * | 1996-04-30 | 1998-10-27 | Chen; We-Yu | Process and apparatus for flushing carbon deposits and contaminants from the fuel and air intake systems of an internal combustion engine |
| EP0840145B1 (en) * | 1996-05-14 | 2005-04-27 | Seiko Epson Corporation | Polarization converter, optical converter, electronic apparatus and process for producing polarization converter |
| GB2324881A (en) * | 1997-05-03 | 1998-11-04 | Sharp Kk | Patterned optical elements |
| DE19825156C1 (en) * | 1998-03-31 | 1999-10-07 | Vits Maschinenbau Gmbh | Device for applying a coating material to a continuous paper web |
| DE19946325A1 (en) * | 1999-09-28 | 2001-04-05 | Vits Maschinenbau Gmbh | Device for applying an abrasive coating compound to a continuous paper web |
-
2001
- 2001-07-11 CN CNB011204028A patent/CN1162718C/en not_active Expired - Fee Related
- 2001-07-11 JP JP2001210577A patent/JP2002090547A/en active Pending
- 2001-07-11 EP EP01305991A patent/EP1174738A3/en not_active Withdrawn
-
2002
- 2002-09-17 US US10/246,047 patent/US7106398B2/en not_active Expired - Fee Related
-
2006
- 2006-05-16 US US11/435,816 patent/US7327418B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US7106398B2 (en) | 2006-09-12 |
| US20030071940A1 (en) | 2003-04-17 |
| EP1174738A3 (en) | 2004-05-26 |
| EP1174738A2 (en) | 2002-01-23 |
| US20060215080A1 (en) | 2006-09-28 |
| CN1334470A (en) | 2002-02-06 |
| US7327418B2 (en) | 2008-02-05 |
| JP2002090547A (en) | 2002-03-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1162718C (en) | Process device for producing polarizer | |
| KR101195628B1 (en) | A method for focusing an optical device on a facing surface of a flat object | |
| EP1031398A2 (en) | Polishing media stabilizer | |
| CN1460282A (en) | Method of obtaining anisotropic crystalline films and device for implementation of method | |
| US20080293334A1 (en) | Methods and apparatus for using a bevel polishing head with an efficient tape routing arrangement | |
| RU2222429C2 (en) | Method and device for formation of anisotropic films | |
| US7108749B2 (en) | Technological machinery for production of polarizers | |
| US6758713B2 (en) | Package method and apparatus for organic electro-luminescent display | |
| US7528927B2 (en) | Fabrication method of liquid crystal display panel and seal pattern forming device using the same | |
| JP3963405B2 (en) | Manufacturing method of polarizing plate | |
| RU2001100534A (en) | A method of forming anisotropic films and a device for its implementation | |
| CN1979261A (en) | Apparatus and method for inspecting polarizing film | |
| RU2000117957A (en) | TECHNOLOGICAL LINE FOR PRODUCING POLARIZERS | |
| EP3312675A1 (en) | Pattern structure and method of manufacturing the pattern structure | |
| CN1260585C (en) | Device and method for forming anisotropic films | |
| JP4251718B2 (en) | Continuous production method of epoxy resin sheet | |
| JP5479259B2 (en) | Coating apparatus and optical film manufacturing method | |
| JPH08160429A (en) | Rubbing method, rubbing device and production of optical compensation sheet | |
| JP2008188743A (en) | Polishing sheet, polishing sheet manufacturing method, semiconductor wafer polishing method, and spraying device | |
| US20110132400A1 (en) | Method and System for Uniformly Applying a Multi-Phase Cleaning Solution to a Substrate | |
| JP4221785B2 (en) | Single plate continuous die coating equipment and coating method | |
| CN101256313A (en) | Method for producing liquid crystal polymer film with surface protective layer | |
| JP2009156926A (en) | Optical film | |
| JP2008238280A (en) | Abrasive particle transfer sheet and precision grinding tool | |
| US20010003698A1 (en) | Polishing machine having a plurality of abrasive pads |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: NITTO DENKO CORP. Free format text: FORMER OWNER: INSOLVENCY SERVICE GROUP CO.,LTD. Effective date: 20050930 Owner name: INSOLVENCY SERVICE GROUP CO.,LTD. Free format text: FORMER OWNER: OPTIVA CORP. Effective date: 20050930 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20050930 Address after: Osaka Patentee after: NITTO DENKO Corp. Address before: California, USA Patentee before: Bankruptcy Services Group Effective date of registration: 20050930 Address after: California, USA Patentee after: Bankruptcy Services Group Address before: California, USA Patentee before: OPTIVA, Inc. |
|
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20040818 |