CN116009366A - Light irradiation device and photomask drawing device using the light irradiation device - Google Patents
Light irradiation device and photomask drawing device using the light irradiation device Download PDFInfo
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- CN116009366A CN116009366A CN202310140114.5A CN202310140114A CN116009366A CN 116009366 A CN116009366 A CN 116009366A CN 202310140114 A CN202310140114 A CN 202310140114A CN 116009366 A CN116009366 A CN 116009366A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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Abstract
本发明提供一种光照射装置,在不使用积分器透镜的前提下能实现照射面上的高照度和均匀性。利用多个LED(12)、与各LED(12)对应且将来自各LED(12)的光(L)平行化的多个准直透镜(14)、将来自各准直透镜(14)的光(L)朝照射面(A)会聚的聚光透镜(16)、以及调整准直透镜(14)相对于LED(12)的位置的位置调整机构(18)来构成光照射装置(10)。而且,在各LED(12)形成具有几何形状的外形的发光部(22),将一部分的LED(12)的配置角度设为与剩余部分当中的至少一部分的LED(12)的配置角度相比旋转了与该几何形状对应的角度后的状态。
The invention provides a light irradiation device, which can realize high illuminance and uniformity on the irradiation surface without using an integrator lens. Using a plurality of LEDs (12), a plurality of collimating lenses (14) corresponding to each LED (12) and parallelizing the light (L) from each LED (12), the light from each collimating lens (14) A condenser lens (16) for converging light (L) toward the irradiation surface (A), and a position adjustment mechanism (18) for adjusting the position of the collimator lens (14) relative to the LED (12) constitute a light irradiation device (10) . Moreover, a light emitting part (22) having a geometrical outer shape is formed on each LED (12), and the arrangement angle of a part of the LEDs (12) is set to be compared with the arrangement angle of at least a part of the LEDs (12) in the remaining part. The state rotated by the angle corresponding to the geometry.
Description
技术领域technical field
本发明涉及例如在半导体曝光用的光掩模的制造(描绘)中所使用的光照射装置以及利用光照射装置的光掩模描绘装置。The present invention relates to, for example, a photoirradiation device used for manufacturing (drawing) a photomask for exposing a semiconductor, and a photomask drawing device using the photoirradiation device.
背景技术Background technique
从以往,在制造集成密度高的半导体时,开发了使用作为电路图案的原版的光掩模来进行步进器曝光的方法。Conventionally, when manufacturing a semiconductor with a high integration density, a method of performing stepper exposure using a photomask as an original plate of a circuit pattern has been developed.
在制造(描绘)该光掩模时,从以往起使用了电子束、激光,而以光掩模制造(描绘)用的光照射装置的降本为目的,探讨了使用LED(发光二极管)。Electron beams and lasers have conventionally been used in manufacturing (drawing) such photomasks, but use of LEDs (Light Emitting Diodes) has been considered for cost reduction of light irradiation devices for photomask manufacturing (drawing).
例如,若是半导体曝光装置用的光源,则开发了众多使用LED的光源(专利文献1),但难以将这样的光源直接适用于光掩模描绘装置。For example, many light sources using LEDs have been developed as light sources for semiconductor exposure devices (Patent Document 1), but it is difficult to directly apply such light sources to photomask drawing devices.
现有技术文献prior art literature
专利文献patent documents
专利文献1:日本特开2020-86393号公报Patent Document 1: Japanese Patent Laid-Open No. 2020-86393
发明内容Contents of the invention
(发明要解决的课题)(The problem to be solved by the invention)
这是由于,用于光掩模描绘装置的光照射装置要求照射面上的高照度和均匀性。This is because a light irradiation device used in a photomask drawing device requires high illuminance and uniformity on the irradiation surface.
一般而言,使用LED的光照射装置1如图7所示,具有多个LED2、使从该LED2放射的光成为平行光的准直透镜3、将来自准直透镜3的光朝给定的照射面会聚的聚光透镜4、以及来自各LED2的光叠加于照射面的积分器透镜5。In general, as shown in FIG. 7, a
若想要尽量提高照射面上的照度,则需要将准直透镜3以及聚光透镜4分别尽可能地接近焦点位置地进行配置。如此,配置于LED2的发光部内的电极、附着于LED2的异物等保持原状地被投影至照射面,会在照射面形成暗部,因此存在发生了该照射面上的照度的不均这样的问题。为了消除这样的不均,使用了积分器透镜5。In order to increase the illuminance on the irradiated surface as much as possible, it is necessary to arrange the collimator lens 3 and the
然而,可以知晓,若使用积分器透镜5,则会发生别的问题。即,若使用积分器透镜5,则会发生透镜的制作精度的问题、在将2片透镜进行组合的情况下透镜位置偏离所导致的光损失。另外,在构成积分器透镜5的各透镜之间的接缝处也会发生光损失。进而,积分器透镜5的制作原本就需要高级技术,价格昂贵。However, it can be understood that if an integrator lens 5 is used, another problem occurs. That is, if the integrator lens 5 is used, there will be a problem with the manufacturing accuracy of the lens, and light loss due to lens position deviation when two lenses are combined. In addition, light loss also occurs at joints between the respective lenses constituting the integrator lens 5 . Furthermore, the manufacture of the integrator lens 5 inherently requires advanced technology and is expensive.
本发明鉴于上述问题而提出,其目的在于,提供一种光照射装置以及利用光照射装置的光掩模描绘装置,在不使用积分器透镜的前提下能够实现照射面上的高照度和均匀性。The present invention was made in view of the above problems, and its object is to provide a light irradiation device and a photomask drawing device using the light irradiation device, which can achieve high illuminance and uniformity on the irradiation surface without using an integrator lens. .
(用于解决课题的技术方案)(Technical solution to solve the problem)
根据本发明的一形态,提供一种光照射装置,具备:According to an aspect of the present invention, there is provided a light irradiation device comprising:
多个LED;Multiple LEDs;
多个准直透镜,与各所述LED对应,将来自各所述LED的光平行化;a plurality of collimating lenses, corresponding to each of said LEDs, to parallelize light from each of said LEDs;
聚光透镜,将来自各所述准直透镜的光朝照射面会聚;以及a condensing lens that condenses the light from each of the collimating lenses toward the irradiating surface; and
位置调整机构,调整所述准直透镜相对于所述LED的位置,a position adjustment mechanism for adjusting the position of the collimator lens relative to the LED,
各所述LED包含具有几何形状的外形的发光部,each of said LEDs includes a light emitting portion having a geometric shape,
一部分所述LED的配置角度与剩余部分当中的至少一部分所述LED的配置角度相比,呈旋转了与所述几何形状对应的角度后的状态。The arrangement angle of some of the LEDs is rotated by an angle corresponding to the geometric shape compared to the arrangement angle of at least some of the LEDs in the remaining part.
优选地,Preferably,
各所述LED分布于多个模块进行配置,Each of the LEDs is distributed in multiple modules for configuration,
配置于1个所述模块的所述LED全部呈相同的所述配置角度,all the LEDs arranged in one of the modules have the same arrangement angle,
在配置于不同的所述模块的所述LED中,所述配置角度呈旋转后的状态。In the LEDs arranged in different modules, the arrangement angle is in a rotated state.
优选地,Preferably,
各所述LED分布于多个模块进行配置,Each of the LEDs is distributed in multiple modules for configuration,
在配置于1个所述模块的所述LED中,所述配置角度呈旋转后的状态。In the LED arranged in one of the modules, the arrangement angle is in a rotated state.
优选地,Preferably,
所述几何形状为长方形,The geometric shape is a rectangle,
所述配置角度为90°。The configuration angle is 90°.
优选地,Preferably,
所述位置调整机构调整所述LED与所述准直透镜之间的距离。The position adjusting mechanism adjusts the distance between the LED and the collimating lens.
优选地,Preferably,
所述位置调整机构调整所述准直透镜在与所述LED的光轴正交的平面上的位置。The position adjustment mechanism adjusts the position of the collimator lens on a plane perpendicular to the optical axis of the LED.
根据本发明的另一形态,提供一种光掩模描绘装置,具备上述光照射装置。According to another aspect of the present invention, there is provided a photomask drawing device including the above-mentioned light irradiation device.
(发明效果)(invention effect)
根据本发明所涉及的光照射装置,各LED包含具有几何形状的外形的发光部,一部分的LED的配置角度与剩余部分的LED的配置角度相比,呈旋转了与该几何形状对应的角度后的状态。由此,虽然在将准直透镜以及聚光透镜分别尽量接近焦点位置地进行了配置时,配置于1个LED的发光部内的电极、附着于该LED的异物等保持原状地被投影至照射面,会在照射面形成暗部,但以与1个LED不同的配置角度进行了配置的别的LED中的包含上述暗部的发光部会以略微错开的位置被投影至照射面,因此其结果是,在不使用积分器透镜的前提下能够减少照射面上的照度的不均。According to the light irradiation device according to the present invention, each LED includes a light emitting part having a geometric shape, and the arrangement angle of some of the LEDs is rotated by an angle corresponding to the geometric shape compared with the arrangement angle of the rest of the LEDs. status. As a result, even if the collimator lens and the condenser lens are arranged as close as possible to the focus position, the electrodes arranged in the light emitting part of one LED, foreign objects attached to the LED, etc. are projected onto the irradiation surface as they are. , a dark portion is formed on the irradiated surface, but the light-emitting portion including the dark portion of another LED arranged at a different arrangement angle from that of one LED is projected onto the irradiated surface at a slightly shifted position. As a result, in The unevenness of illuminance on the irradiation surface can be reduced without using an integrator lens.
此外,本发明所涉及的光照射装置具备对准直透镜相对于LED的位置进行调整的位置调整机构,因此通过根据光照射装置所要求的照度与均匀性的关系来调整准直透镜相对于LED的位置,从而稍微牺牲一些照度,能使均匀性提高相应的量,反之,稍微牺牲一些均匀性,能使照度提高相应的量。In addition, the light irradiation device according to the present invention has a position adjustment mechanism for adjusting the position of the collimator lens relative to the LED, so by adjusting the position of the collimator lens relative to the LED according to the relationship between the illuminance and uniformity required by the light irradiation device Therefore, a little sacrifice of illuminance can increase the uniformity by a corresponding amount; on the contrary, a slight sacrifice of some uniformity can increase the illuminance by a corresponding amount.
附图说明Description of drawings
图1是表示适用本发明的实施方式所涉及的光照射装置10的图。FIG. 1 is a diagram showing a
图2是表示适用本发明的实施方式所涉及的LED12以及模块20的图。FIG. 2 : is a figure which shows LED12 and the
图3是表示LED12中的发光部22的图。FIG. 3 is a diagram showing a
图4是将图2的中央部分(Z部分)放大后的图。FIG. 4 is an enlarged view of the center portion (Z portion) of FIG. 2 .
图5是表示从1个LED12投影至照射面A的发光部22以及暗部X的图。FIG. 5 is a diagram showing the
图6是表示从1个LED12和以与该LED12不同的配置角度配置的别的LED12分别投影至照射面A的发光部22以及暗部X的图。FIG. 6 is a diagram showing the
图7是表示现有技术所涉及的光照射装置1的图。FIG. 7 is a diagram showing a conventional
具体实施方式Detailed ways
(光照射装置10的构成)(Configuration of Light Irradiation Device 10 )
以下,针对适用本发明的实施方式所涉及的光照射装置10进行说明。作为一例,在光掩模描绘装置中所使用的光照射装置10如图1所示,大致具备LED12、准直透镜14、聚光透镜16以及位置调整机构18。Hereinafter, the
LED12是放射给定的照度及波长的光(在本实施方式中,光掩模描绘用的光)L的构件。如图2所示,在本实施方式中,LED12在1个模块20中配置有22个。另外,在本实施方式中使用了4个模块20。关于配置于1个模块20的LED12的数量以及用于光照射装置10的模块20的数量,不作特别限定。The
此外,在本实施方式中,优选将从LED12放射的光L的主波长设为365nm以下。这是由于,若是比365nm长的波长的光,则能以石英以外的廉价的材料形成透镜类,且积分器透镜的制作容易,使用积分器透镜为好。Moreover, in this Embodiment, it is preferable to make the dominant wavelength of the light L radiated from LED12 into 365 nm or less. This is because, for light having a wavelength longer than 365 nm, lenses can be formed of inexpensive materials other than quartz, and an integrator lens is easy to manufacture, so it is preferable to use an integrator lens.
另外,在各模块20的表面,不仅如上所述配置有多个LED12,而且形成有用于对这些LED12供电的电路等(未图示)。Moreover, on the surface of each
进而,在各模块20分别形成有两处定位销插通孔26,该定位销插通孔26供从配置有多个准直透镜14的准直透镜基板15突出的定位销24插通。该定位销24相对于各LED12的光轴平行延伸,因此在位置调整机构18调整LED12与准直透镜14之间的距离时,能够防止准直透镜14在与LED12的光轴正交的平面上的位置发生偏离。Furthermore, two positioning pin insertion holes 26 through which the positioning pins 24 protruding from the
各LED12如图3所示,包含具有几何形状的外形的发光部22。该发光部22是接受电力的供给来放射光L的部分,在本实施方式所涉及的LED12中,外形形成为长方形(几何形状)。Each LED12 includes the
另外,各LED12以给定的配置角度配置于各模块20。例如,若着眼于4个模块20汇集的图2的中央部分(Z部分),则如图4所示,配置于图中右上处的模块20a的LED12配置为:各个LED12中的发光部22的长方形的配置形状沿图中左右方向延伸。接下来,图中右下处的模块20b的LED12与配置于图中右上处的模块20a的LED12相比,以旋转了90°的配置角度进行配置。另外,图中左下处的模块20c的LED12与配置于图中右下处的模块20b的LED12相比,以旋转了90°的配置角度进行配置。也就是,与配置于图中右上处的模块20a的LED12相比,以旋转了180°的配置角度进行配置。进而,图中左上处的模块20d的LED12与配置于图中左下处的模块20c的LED12相比,以旋转了90°的配置角度进行配置。也就是,与配置于图中右上处的模块20a的LED12相比,以旋转了270°的配置角度进行配置,与配置于图中右下处的模块20b的LED12相比,以旋转了180°的配置角度进行配置。Moreover, each LED12 is arrange|positioned at the each
回到图1,准直透镜14是具有将从LED12放射的光L平行化的功能的透镜,与各LED12一一对应地配置有多个准直透镜14。另外,以使各准直透镜14的焦点尽量接近照射面A的方式配置有各准直透镜14。Returning to FIG. 1 , the
聚光透镜16是将来自各准直透镜14的光L朝照射面A会聚的透镜,在本实施方式中,在1个光照射装置10中使用了1个聚光透镜16。此外,也可以取代该构成,与各LED12以及准直透镜14一一对应地配置多个聚光透镜16。另外,以使聚光透镜16的焦点尽量接近照射面A的方式配置有该聚光透镜16。The condensing
此外,在本实施方式中,优选基于准直透镜14以及聚光透镜16,LED12中的各发光部22的形状以5倍至100倍的放大率被投影至照射面A。这是由于,技术上难以实现小于5倍的投影率,反之,若是大于100倍的放大率,则积分器透镜的单元数为少量即可,因此使用积分器透镜为好。In addition, in this embodiment, it is preferable that the shape of each light-emitting
位置调整机构18是具有对准直透镜14相对于LED12的位置进行调整的功能的机构。本实施方式所涉及的位置调整机构18能使各准直透镜14相对于各LED12的光轴平行移动,也就是,能调整各LED12与各准直透镜14之间的距离。The
(光照射装置10的特征)(Features of Light Irradiation Device 10)
根据本实施方式所涉及的光照射装置10,各LED12包含具有几何形状的外形的发光部22,一部分的LED12的配置角度与剩余部分的LED12的配置角度相比,呈以与该几何形状对应的角度即90°为单位进行了旋转后的状态。由此,虽然在将准直透镜14以及聚光透镜16分别尽量接近焦点位置地进行了配置时,如图5所示,配置于1个LED12的发光部22内的电极、附着于该LED12的异物等保持原状地被投影至照射面A,会在照射面A形成暗部X,但以与1个LED12不同的配置角度进行了配置的别的LED12中的包含上述暗部X的发光部22会以略微错开的位置被投影至照射面,因此其结果如图6所示,在不使用积分器透镜的前提下能够减少照射面上的照度的不均。According to the
此外,本实施方式所涉及的光照射装置10具备对LED12与准直透镜14之间的距离进行调整的位置调整机构18,因此通过根据光照射装置10所要求的照度与均匀性的关系来调整LED12与准直透镜14之间的距离,从而稍微牺牲一些照度,能使均匀性提高相应的量,反之,稍微牺牲一些均匀性,能使照度提高相应的量。In addition, since the
另外,各LED12分布于多个模块20进行配置,配置于1个模块20的LED12全部呈相同的配置角度,在配置于不同的模块20的LED12中,配置角度呈旋转后的状态。由此,能够以模块20为单位来进行LED12的更换,因此LED12的更换作业变得容易。Moreover, each LED12 is distributed and arrange|positioned in the some
(变形例1)(Modification 1)
在上述实施方式所涉及的光照射装置10中,位置调整机构18对LED12与准直透镜14之间的距离进行调整,但也可以取代该构成,由位置调整机构18对准直透镜14在与LED12的光轴正交的平面上的位置进行调整。如此,在对准直透镜14在与LED12的光轴正交的平面上的位置进行了移动调整的情况下也同样,稍微牺牲一些照度,能使均匀性提高相应的量,反之,稍微牺牲一些均匀性,能使照度提高相应的量。In the
当然,也可以利用位置调整机构18对LED12与准直透镜14之间的距离、以及准直透镜14在与LED12的光轴正交的平面上的位置进行调整。Of course, the distance between the
(变形例2)(Modification 2)
在上述实施方式所涉及的光照射装置10中,将LED12分布于多个模块20进行了配置,但也可以取代该构成,仅准备1个模块20,并在该模块20中配置全部的LED12。在此情况下也同样,一部分的LED12的配置角度与剩余部分的LED12的配置角度相比,呈旋转了与几何形状对应的角度后的状态。In the
(变形例3)(Modification 3)
发光部22的配置所涉及的几何形状不限于上述“长方形”,例如也可以是“正方形”。在为“正方形”的情况下,若将配置角度设为90°,则1个LED12中的发光部22和以与1个LED12相差90°的配置角度进行了配置的别的LED12中的发光部22在照射面A上重叠于彼此相同的位置,但只要各LED12的发光部22中所含的暗部X不重叠于彼此相同的位置,则配置角度为90°就没有问题。The geometric shape related to the arrangement of the
若各LED12的发光部22中所含的暗部X重叠于彼此相同的位置,则优选设定90°的倍数以外的配置角度。When the dark part X contained in the
另外,在几何形状为“正六边形”的情况下,基于同样的理由,存在即使是60°的倍数也没有问题的情况,但优选设定60°的倍数以外的配置角度。进而,在几何形状为“正八边形”的情况下,基于同样的理由,存在即使是45°的倍数也没有问题的情况,但优选设定45°的倍数以外的配置角度。In addition, when the geometric shape is "regular hexagon", there may be no problem even if it is a multiple of 60° for the same reason, but it is preferable to set an arrangement angle other than a multiple of 60°. Furthermore, when the geometric shape is "regular octagon", for the same reason, there may be no problem even if it is a multiple of 45°, but it is preferable to set an arrangement angle other than a multiple of 45°.
也就是,只要是能够避免1个LED12中的发光部22及其所包含的暗部X和以与1个LED12不同的配置角度进行了配置的别的LED12中的发光部22及其所含的暗部X在照射面A上重叠于彼此相同的位置这样的情形的配置角度,就称为“与几何形状对应的角度”。That is, as long as it is possible to avoid the
本实施例所涉及的LED12的配置角度如上所说明的那样,但不限于此,只要一部分的LED12的配置角度与剩余部分当中的至少一部分的LED12的配置角度相比,呈旋转了与发光部22的配置形状所涉及的几何形状对应的角度后的状态即可。The arrangement angles of the
(变形例4)(Modification 4)
进而,作为提高照射面A上的照度的均匀性的方法,可以调整对各LED12供给的电流值。Furthermore, as a method of improving the uniformity of the illuminance on the irradiation surface A, the electric current value supplied to each LED12 can be adjusted.
具体而言,设置能分别调整对各个LED12供给的电流值的电流调整单元(未图示)。而且,例如在1个LED12中发生异物混入等,因该异物被投影至照射面A从而损害照度的均匀性那样的情况下,通过利用电流调整单元来使去往LED12的电流的值下降(或者成为零),能够维持照度的均匀性。Specifically, the electric current adjustment means (not shown) which can adjust the electric current value supplied to each LED12 individually is provided. And, for example, when a foreign matter is mixed into one
电流值的调整既可以以各个LED12为单位来进行,也可以以配置于1个模块20的全部LED12为单位来进行,进而,还可以按配置于模块20的LED12当中的电气串联连接的每一组LED12来进行调整。The adjustment of the current value may be performed in units of
(变形例5)(Modification 5)
作为一例,上述实施方式所涉及的光照射装置10用在光掩模描绘装置中,但只要是追求照射面上的高照度和均匀性的用途,也可以在光掩模描绘装置以外的用途中使用该光照射装置10。As an example, the
应该认为,本次公开的实施方式在所有方面均为例示,绝无限制性。本发明的范围不是由上述说明而是由权利要求的范围示出,意图包含与权利要求的范围等同的含义以及范围内的全部的变更。It should be considered that the embodiment disclosed this time is an illustration in all points and is not restrictive at all. The scope of the present invention is shown not by the above-described description but by the scope of claims, and it is intended that all changes within the meaning and range equivalent to the scope of claims are included.
(标号说明)(Explanation of labels)
10光照射装置、12LED、14准直透镜、15准直透镜基板、16聚光透镜、18位置调整机构10 light irradiation device, 12 LED, 14 collimator lens, 15 collimator lens substrate, 16 condenser lens, 18 position adjustment mechanism
20模块、22发光部、24定位销、26定位销插通孔20 module, 22 light-emitting part, 24 positioning pin, 26 positioning pin insertion hole
L光、A照射面、X暗部。L light, A illuminated surface, X dark part.
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| CN101251650A (en) * | 2008-03-21 | 2008-08-27 | 清华大学 | LED three-dimensional optical system design method and optical system with given illuminance distribution |
| CN210717003U (en) * | 2019-09-23 | 2020-06-09 | 深圳市绎立锐光科技开发有限公司 | Light source module |
| CN111503533A (en) * | 2019-01-31 | 2020-08-07 | 佳能株式会社 | Light source apparatus, illumination device, exposure device, and method for manufacturing article |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101251650A (en) * | 2008-03-21 | 2008-08-27 | 清华大学 | LED three-dimensional optical system design method and optical system with given illuminance distribution |
| CN111503533A (en) * | 2019-01-31 | 2020-08-07 | 佳能株式会社 | Light source apparatus, illumination device, exposure device, and method for manufacturing article |
| CN210717003U (en) * | 2019-09-23 | 2020-06-09 | 深圳市绎立锐光科技开发有限公司 | Light source module |
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