CN115464673A - Photoelectric sensor for wafer detection of manipulator end effector and manipulator - Google Patents

Abstract

The invention provides a photoelectric sensor and a manipulator for wafer detection of a manipulator end effector, and relates to the technical field of semiconductor manufacturing. The photoelectric sensor includes a photosensitive element and a circuit control module. The circuit control module is electrically connected to the photosensitive element. signal and compare the sensing signal with a threshold value to determine the state of the wafer; it is also used to adjust the brightness of the input light of the photosensitive element, and to adjust the wafer according to the specifications of the wafer sensed by the photosensitive element Adjust the above threshold. Through the circuit control module, the sensing signal is compared with the threshold, and then the state of the wafer can be determined; by adjusting the brightness of the input light of the photosensitive element, and adjusting the threshold according to the specifications of the wafer sensed by the photosensitive element, so that The photosensitive element can detect the status of wafers of different specifications, ensuring that the photosensitive element has high accuracy for wafers of different specifications, and increasing the use range of the photosensitive element.

Description

Photoelectric sensor and manipulator for wafer detection of manipulator end effector

technical field

The invention relates to the technical field of semiconductor manufacturing, in particular to a photoelectric sensor and a manipulator for wafer detection of a manipulator end effector.

Background technique

Wafer transfer is scattered in almost every link of the wafer manufacturing process. The most commonly used equipment is such as wafer transfer and rewinder (Wafer Sorter), EFEM, etc. Among them, the R-θ atmospheric vacuum robot has been widely used in the FAB factory, as shown in the figure As shown in 1, the R-θ atmospheric vacuum manipulator is often designed in a dual-arm mode because it is not as flexible as a scada manipulator, which can improve work efficiency, and the dual-arm mode puts higher requirements on the structural design of the end effector of the manipulator. The thickness of the end effector of the manipulator designed with double arms is relatively thin, about 3mm, and the distance between the double end effectors is generally about 10mm, and the structure design is compact.

Due to the variety of wafer specifications and different reflectivity, the existing sensors will cause misjudgment by the sensor when the specification of the wafer changes or the material on the back of the end effector of the upper arm reflects light, which seriously affects the sensor detection. Accuracy, which limits the range of use of the sensor.

Contents of the invention

The invention provides a photoelectric sensor for wafer detection of a manipulator end effector, which is used to solve the problems that the existing sensors of the arm end effector cannot match wafers of different specifications and the detection accuracy is low.

The invention provides a photoelectric sensor for wafer detection of a manipulator end effector, comprising:

The photosensitive element is used to sense the state of the wafer and output the sensing signal;

The circuit control module is electrically connected to the photosensitive element, and the circuit control module is used to receive the sensing signal and compare the sensing signal with a threshold value to determine the state of the wafer; it is also used to adjust the the brightness of the input light of the photosensitive element, and adjust the threshold according to the specification of the wafer sensed by the photosensitive element.

A photoelectric sensor for wafer detection of a manipulator end effector provided according to an embodiment of the present invention further includes:

The signal amplification output module is electrically connected to the circuit control module and the control terminal respectively, and the signal amplification output module is used to amplify the signal output by the circuit control module and output it to the control terminal; The circuit control module is electrically isolated from the control terminal.

A photoelectric sensor for wafer detection of a manipulator end effector provided according to an embodiment of the present invention further includes:

The communication module is electrically connected with the circuit control module and the interactive terminal respectively.

According to a photoelectric sensor for wafer detection of a manipulator end effector provided by an embodiment of the present invention, the circuit control module includes a controller, a signal conversion unit, a filter unit, a comparator and a first resistor, and the first resistor of the controller The connection end is connected to the first connection end of the signal conversion unit, the second connection end of the signal conversion unit and the first connection end of the comparator are connected to the second connection end of the controller, and the comparison The second connection end of the filter, the first connection end of the filter unit, the third connection end of the controller, and the first connection end of the first resistor are commonly connected to the first connection end of the photosensitive element, so The third connection end of the comparator, the second connection end of the filter unit, the second connection end of the photosensitive element and the third connection end of the photosensitive element are connected to the power supply unit in common, and the fourth connection end of the photosensitive element The connection ends are respectively connected to the third connection end and the fourth connection end of the controller, the second connection end of the first resistor, the fourth connection end of the comparator and the sixth connection end of the controller Both are connected to the power supply unit, the fifth connection end of the comparator is connected to the signal amplification output module, and the seventh connection end of the controller is connected to the communication module.

According to a photoelectric sensor for wafer detection of a manipulator end effector provided in an embodiment of the present invention, the circuit control module further includes:

The second resistor, the fourth connection end of the photosensitive element is connected to the first end of the second resistor, and the second end of the second resistor is respectively connected to the third connection end and the fourth connection end of the controller. connect.

According to an embodiment of the present invention, there is provided a photoelectric sensor for wafer detection of a manipulator end effector, wherein the controller is an MCU controller.

According to a photoelectric sensor for wafer detection of a manipulator end effector provided in an embodiment of the present invention, the signal amplification output module includes an amplifier and a third resistor, and the first connection end of the third resistor is connected to the first connection end of the comparator. The five connection terminals are connected, the second connection terminal of the third resistor is connected to the first terminal of the amplifier, and the second terminal of the amplifier is connected to the control terminal.

According to a photoelectric sensor for wafer detection of a manipulator end effector provided by an embodiment of the present invention, the communication interface of the communication module is RS232 or RS485.

According to a photoelectric sensor for wafer detection of a manipulator end effector provided in an embodiment of the present invention, the interactive terminal is a PC, and the control terminal is a PLC control module.

The present invention also provides a manipulator, including a manipulator end effector, and a photoelectric sensor for wafer detection of the manipulator end effector described in any one of the above, wherein the photosensitive element is embedded in the manipulator end effector.

The photoelectric sensor for wafer detection of the manipulator end effector provided by the embodiment of the present invention compares the sensing signal with the threshold value through the circuit control module, and then can determine the state of the wafer; by adjusting the brightness of the input light of the photosensitive element, And adjust the threshold according to the specifications of the wafer sensed by the photosensitive element, so that the photosensitive element can detect the state of wafers of different specifications, ensure that the photosensitive element has high accuracy for wafers of different specifications, and increase the size of the photosensitive element range of use.

Description of drawings

In order to more clearly illustrate the present invention or the technical solutions in the prior art, the accompanying drawings that need to be used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the accompanying drawings in the following description are the present invention. For some embodiments of the invention, those skilled in the art can also obtain other drawings based on these drawings without creative effort.

FIG. 1 is a schematic diagram of a three-dimensional structure of a manipulator end effector provided by an embodiment of the present invention;

FIG. 2 is a schematic structural diagram of a photoelectric sensor for wafer detection of a manipulator end effector provided by an embodiment of the present invention;

FIG. 3 is a specific circuit diagram of the photoelectric sensor for wafer detection of the manipulator end effector provided by the embodiment of the present invention.

Reference signs:

100. Photosensitive element; 110. In-position sensor; 120. Offset sensor; 130. Upper arm; 140. Lower arm; 200. Circuit control module; 210. Controller; 220. Signal conversion unit; 230. Filter unit; 250 , comparator; 260, first resistor; 270, second resistor; 300, signal amplification output module; 310, amplifier; 320, third resistor; 400, communication module; 500, power supply unit; 600, control terminal; 700, interactive terminal.

detailed description

Embodiments of the present invention will be further described in detail below in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but should not be used to limit the scope of the present invention.

In the description of the embodiments of the present invention, it should be noted that the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right" , "vertical", "horizontal", "top", "bottom", "inner", "outer" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing this The embodiments and simplified descriptions of the invention do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore should not be construed as limiting the embodiments of the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and should not be construed as indicating or implying relative importance.

In the description of the embodiments of the present invention, it should be noted that unless otherwise specified and limited, the terms "connected" and "connected" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection, Or integrated connection; it can be mechanical connection or electrical connection; it can be direct connection or indirect connection through an intermediary. Those of ordinary skill in the art can understand the specific meanings of the above terms in the embodiments of the present invention in specific situations.

In the embodiments of the present invention, unless otherwise specified and limited, the first feature may be in direct contact with the first feature or the first feature and the second feature may pass through the middle of the second feature. Media indirect contact. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.

In the description of this specification, descriptions referring to the terms "one embodiment", "some embodiments", "example", "specific examples", or "some examples" mean that specific features described in connection with the embodiment or example , structure, material or feature is included in at least one embodiment or example of the embodiments of the present invention. In this specification, the schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the described specific features, structures, materials or characteristics may be combined in any suitable manner in any one or more embodiments or examples. In addition, those skilled in the art can combine and combine different embodiments or examples and features of different embodiments or examples described in this specification without conflicting with each other.

The photoelectric sensor for wafer detection of the manipulator end effector according to the embodiment of the present invention will be described below with reference to FIGS. 1-3 .

Fig. 1 illustrates the schematic diagram of the three-dimensional structure of the end effector of the manipulator provided by the embodiment of the present invention. As shown in Fig. 1, the photoelectric sensor of the present invention is arranged on the end effector of the manipulator. Before introducing the photoelectric sensor, the end effector of the manipulator is first Make an introduction. Since the end effector transfers wafers in a small and restricted space, the size of the end effector is limited, especially the thickness. The R-θ atmospheric vacuum manipulator is designed as a double-arm mode, that is, an upper arm 130 and a lower arm 140, and the distance between the two arms is fixed at 10mm±0.1. As shown in FIG. 1 , the photoelectric sensor may be an in-position sensor 110 or an offset sensor 120 disposed on the end effector of the manipulator. The photoelectric sensor is embedded in the groove of the end designator, and the depth of the groove is less than the thickness (3mm) of the end effector. When the photoelectric sensor of the present invention is arranged on the lower arm 140, it can avoid the interference of the upper arm 130 and improve the detection efficiency. precision.

FIG. 2 illustrates a schematic structural diagram of a photoelectric sensor for wafer detection of a manipulator end effector provided by an embodiment of the present invention. As shown in FIG. 2 , the photoelectric sensor for wafer detection of a manipulator end effector includes a photosensitive element 100 and a circuit control module 200, The photosensitive element 100 is used for sensing the state of the wafer and outputting a sensing signal. The circuit control module 200 is electrically connected to the photosensitive element 100, and the circuit control module 200 is used to receive the sensing signal and compare the sensing signal with a threshold to determine the state of the wafer; it is also used to adjust the brightness of the input light of the photosensitive element 100, And the threshold is adjusted according to the specification of the wafer sensed by the photosensitive element 100 . Since the light reflectance of wafers of different specifications is not the same, when changing different wafers, the light reflectance of the wafer will also change, so it is necessary to adjust the brightness and threshold of the input light of the photosensitive element 100 to make the photoelectric The sensor can accurately identify the status of wafers with different specifications. By adjusting the threshold, the influence of light reflection from the material on the back of the upper arm end effector can be eliminated.

The photoelectric sensor for wafer detection of the manipulator end effector provided by the embodiment of the present invention compares the sensing signal with the threshold value through the circuit control module 200, and then can determine the state of the wafer; adjust, and adjust the threshold according to the specifications of the wafers sensed by the photosensitive element 100, so that the photosensitive element 100 can detect the state of wafers of different specifications, and ensure that the photosensitive element 100 has higher accuracy for wafers of different specifications, The use range of the photosensitive element 100 is increased.

In the embodiment of the present invention, the photoelectric sensor for wafer detection of the manipulator end effector also includes a signal amplification output module 300, the signal amplification output module 300 is electrically connected to the circuit control module 200 and the control terminal 600 respectively, and the signal amplification output module 300 is both It functions as an output circuit of the circuit control module 200 and also functions as an input circuit of the control terminal 600 . On the one hand, the signal amplification output module 300 is used to amplify the signal output by the circuit control module 200 and then output it to the control terminal 600. By amplifying the signal, the output signal of the circuit control module 200 meets the interface requirements of the input module of the control terminal 600 . The control terminal 600 is a PLC control module. Of course, the type of the control terminal 600 is not limited thereto, and it can also be other types of controllers 210 . On the other hand, the signal amplification and output module 300 is also used to provide electrical isolation between the circuit control module 200 and the control terminal 600 .

In the embodiment of the present invention, the photoelectric sensor for wafer detection of the manipulator end effector further includes a communication module 400 , and the communication module 400 is electrically connected to the circuit control module 200 and the interactive terminal 700 respectively. The communication module 400 is used to realize the communication between the circuit control module 200 and the interactive terminal 700, and the communication interface of the communication module 400 is RS232 or RS485. The interactive terminal 700 is a PC, and the communication module 400 is directly connected to the PC through the communication interface. The PC is provided with a display and a human-computer interaction interface, which can monitor the current photosensitive amount and threshold value, and the operator can directly adjust it through the human-computer interaction interface.

In an embodiment of the present invention, FIG. 3 illustrates a specific circuit diagram of a photoelectric sensor for wafer detection of a manipulator end effector provided in an embodiment of the present invention. As shown in FIG. 3 , the circuit control module 200 includes a controller 210, a signal conversion unit 220, filter unit 230, comparator 250 and first resistor 260, the first connection end of controller 210 is connected with the first connection end of signal conversion unit 220, the second connection end of signal conversion unit 220 is connected with the first connection end of comparator 250 One connection terminal is connected to the second connection terminal of the controller 210, the second connection terminal of the comparator 250, the first connection terminal of the filter unit 230, the third connection terminal of the controller 210 and the first connection terminal of the first resistor 260 The first connection end of the photosensitive element 100 is connected in common, the third connection end of the comparator 250, the second connection end of the filter unit 230, the second connection end of the photosensitive element 100, and the third connection end of the photosensitive element 100 are commonly connected to the power supply unit 500, the fourth connection end of the photosensitive element 100 is respectively connected with the third connection end and the fourth connection end of the controller 210, the second connection end of the first resistor 260, the fourth connection end of the comparator 250 and the controller 210 The sixth connection end is connected to the power supply unit 500 , the fifth connection end of the comparator 250 is connected to the signal amplification output module 300 , and the seventh connection end of the controller 210 is connected to the communication interface.

In an embodiment of the present invention, as shown in FIG. 3 , the circuit control module 200 further includes a second resistor 270, the fourth connection end of the photosensitive element 100 is connected to the first end of the second resistor 270, and the first end of the second resistor 270 The two terminals are respectively connected to the third connection terminal and the fourth connection terminal of the controller 210 .

In the embodiment of the present invention, the controller 210 is an MCU controller 210. On the one hand, the controller 210 is used to adjust the brightness of the input light of the photosensitive element 100; 100 Due to the different wafer specifications, the amount of reflection is different, so as to adapt to the needs of different environments and perform reliable detection. At the same time, the controller 210 can also detect the photosensitive state and the threshold value, and adjust the response with reference to the detected value.

In an embodiment of the present invention, as shown in FIG. 3 , the signal amplification output module 300 includes an amplifier 310 and a third resistor 320, the first connection end of the third resistor 320 is connected to the fifth connection end of the comparator 250, and the third The second terminal of the resistor 320 is connected to the first terminal of the amplifier 310 , and the second terminal of the amplifier 310 is connected to the control terminal 600 . In practical applications, the signal of the photosensitive element 100 must be fed back to the control system of the equipment. This invention mainly connects the signal to the commonly used PLC control module, so the amplifier 310 is connected behind the signal of the comparator 25. The first is to design it suitable for PLC Connecting to the circuit of the module, the second amplifier 310 makes the control circuit and the PLC control module electrically isolated to prevent mutual interference between the two modules.

The present invention also provides a manipulator, including a manipulator end effector, and a photoelectric sensor for wafer detection of the manipulator end effector described in any one of the above embodiments, where the photosensitive element 100 is embedded in the manipulator end effector.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those of ordinary skill in the art should understand that: it can still be Modifications are made to the technical solutions described in the foregoing embodiments, or equivalent replacements are made to some of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the various embodiments of the present invention.

Claims (10)

1. The utility model provides a photoelectric sensor of manipulator end effector wafer detection which characterized in that includes:

the photosensitive element is used for sensing the state of the wafer and outputting a sensing signal;

the circuit control module is electrically connected with the photosensitive element and is used for receiving the induction signal and comparing the induction signal with a threshold value so as to determine the state of the wafer; and the threshold value is adjusted according to the specification of the wafer sensed by the photosensitive element.

2. The robot end effector wafer detection photosensor according to claim 1 further comprising:

the signal amplification output module is respectively electrically connected with the circuit control module and the control terminal and is used for amplifying the signal output by the circuit control module and outputting the signal to the control terminal; and the circuit control module is also used for electrically isolating the circuit control module from the control terminal.

3. The robot end effector wafer detection photosensor according to claim 2 further comprising:

and the communication module is electrically connected with the circuit control module and the interactive terminal respectively.

4. The wafer detection photoelectric sensor for the manipulator end effector according to claim 2 or 3, wherein the circuit control module includes a controller, a signal conversion unit, a filter unit, a comparator and a first resistor, a first connection end of the controller is connected to a first connection end of the signal conversion unit, a second connection end of the signal conversion unit and a first connection end of the comparator are connected to a second connection end of the controller, a second connection end of the comparator, a first connection end of the filter unit, a third connection end of the controller and a first connection end of the first resistor are connected to a first connection end of the photosensitive element, a third connection end of the comparator, a second connection end of the filter unit, a second connection end of the photosensitive element and a third connection end of the photosensitive element are connected to a power supply unit, a fourth connection end of the photosensitive element is connected to a third connection end and a fourth connection end of the controller respectively, a second connection end of the first resistor, a fourth connection end of the comparator and a sixth connection end of the controller are connected to a fifth connection end of the comparator, and a signal amplification control module is connected to the comparison control signal amplification module.

5. The robot end effector wafer detection photosensor according to claim 4, wherein said circuit control module further comprises:

and a fourth connecting end of the photosensitive element is connected with a first end of the second resistor, and a second end of the second resistor is respectively connected with a third connecting end and a fourth connecting end of the controller.

6. The robotic end effector wafer inspection photosensor according to claim 4 wherein the controller is an MCU controller.

7. The wafer detection photoelectric sensor for the mechanical arm end effector as claimed in claim 4, wherein the signal amplification output module comprises an amplifier and a third resistor, a first connection end of the third resistor is connected with a fifth connection end of the comparator, a second connection end of the third resistor is connected with a first end of the amplifier, and a second end of the amplifier is connected with the control terminal.

8. The robot end effector wafer detection photoelectric sensor according to claim 2 or 3, wherein the communication interface of the communication module is RS232 or RS485.

9. The photoelectric sensor for wafer detection of a robot end effector of claim 2 or 3, wherein the interaction terminal is a PC, and the control terminal is a PLC control module.

10. A manipulator comprising a manipulator end effector, and further comprising a photoelectric sensor for wafer detection of the manipulator end effector of any one of claims 1 to 9, wherein the photosensitive element is embedded in the manipulator end effector.

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