CN114921817B - Ultra-thin electrolytic copper foil and its preparation method and application - Google Patents
Ultra-thin electrolytic copper foil and its preparation method and application Download PDFInfo
- Publication number
- CN114921817B CN114921817B CN202210648099.0A CN202210648099A CN114921817B CN 114921817 B CN114921817 B CN 114921817B CN 202210648099 A CN202210648099 A CN 202210648099A CN 114921817 B CN114921817 B CN 114921817B
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- Prior art keywords
- copper
- concentration
- containing compound
- copper foil
- complexing agent
- Prior art date
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 159
- 239000011889 copper foil Substances 0.000 title claims abstract description 110
- 238000002360 preparation method Methods 0.000 title claims abstract description 20
- 239000010949 copper Substances 0.000 claims abstract description 54
- 229910052802 copper Inorganic materials 0.000 claims abstract description 49
- 239000003792 electrolyte Substances 0.000 claims abstract description 37
- 239000011888 foil Substances 0.000 claims abstract description 27
- 239000007864 aqueous solution Substances 0.000 claims abstract description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000011521 glass Substances 0.000 claims abstract description 16
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 14
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 14
- 229920001940 conductive polymer Polymers 0.000 claims abstract description 10
- 238000004806 packaging method and process Methods 0.000 claims abstract description 10
- 238000001035 drying Methods 0.000 claims abstract description 5
- 238000005406 washing Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 58
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 55
- 239000000243 solution Substances 0.000 claims description 42
- 239000008139 complexing agent Substances 0.000 claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 30
- 239000011701 zinc Substances 0.000 claims description 19
- 229910052751 metal Inorganic materials 0.000 claims description 15
- 239000002184 metal Substances 0.000 claims description 15
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 14
- 229910052725 zinc Inorganic materials 0.000 claims description 14
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 12
- 239000001509 sodium citrate Substances 0.000 claims description 12
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 12
- 235000011083 sodium citrates Nutrition 0.000 claims description 12
- 230000008569 process Effects 0.000 claims description 9
- 230000003746 surface roughness Effects 0.000 claims description 9
- PMNLUUOXGOOLSP-UHFFFAOYSA-N 2-mercaptopropanoic acid Chemical compound CC(S)C(O)=O PMNLUUOXGOOLSP-UHFFFAOYSA-N 0.000 claims description 8
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 8
- 239000003513 alkali Substances 0.000 claims description 8
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 claims description 8
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 5
- 229920000128 polypyrrole Polymers 0.000 claims description 5
- 229910000368 zinc sulfate Inorganic materials 0.000 claims description 5
- 229960001763 zinc sulfate Drugs 0.000 claims description 5
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 claims description 4
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 4
- SHZGCJCMOBCMKK-UHFFFAOYSA-N D-mannomethylose Natural products CC1OC(O)C(O)C(O)C1O SHZGCJCMOBCMKK-UHFFFAOYSA-N 0.000 claims description 4
- PNNNRSAQSRJVSB-SLPGGIOYSA-N Fucose Natural products C[C@H](O)[C@@H](O)[C@H](O)[C@H](O)C=O PNNNRSAQSRJVSB-SLPGGIOYSA-N 0.000 claims description 4
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 claims description 4
- 239000004471 Glycine Substances 0.000 claims description 4
- SHZGCJCMOBCMKK-DHVFOXMCSA-N L-fucopyranose Chemical compound C[C@@H]1OC(O)[C@@H](O)[C@H](O)[C@@H]1O SHZGCJCMOBCMKK-DHVFOXMCSA-N 0.000 claims description 4
- 229920002873 Polyethylenimine Polymers 0.000 claims description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 4
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 claims description 4
- 235000018417 cysteine Nutrition 0.000 claims description 4
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 claims description 4
- DKUYEPUUXLQPPX-UHFFFAOYSA-N dibismuth;molybdenum;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mo].[Mo].[Bi+3].[Bi+3] DKUYEPUUXLQPPX-UHFFFAOYSA-N 0.000 claims description 4
- 229930182830 galactose Natural products 0.000 claims description 4
- 239000008103 glucose Substances 0.000 claims description 4
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 claims description 4
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 4
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 229960003975 potassium Drugs 0.000 claims description 4
- 239000011591 potassium Substances 0.000 claims description 4
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 claims description 4
- 229940074439 potassium sodium tartrate Drugs 0.000 claims description 4
- 235000011006 sodium potassium tartrate Nutrition 0.000 claims description 4
- 235000010265 sodium sulphite Nutrition 0.000 claims description 4
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 claims description 4
- WQZGKKKJIJFFOK-PHYPRBDBSA-N alpha-D-galactose Chemical compound OC[C@H]1O[C@H](O)[C@H](O)[C@@H](O)[C@H]1O WQZGKKKJIJFFOK-PHYPRBDBSA-N 0.000 claims description 3
- WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 claims description 3
- 229920000767 polyaniline Polymers 0.000 claims description 3
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 2
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 claims description 2
- ONIBWKKTOPOVIA-BYPYZUCNSA-N L-Proline Chemical compound OC(=O)[C@@H]1CCCN1 ONIBWKKTOPOVIA-BYPYZUCNSA-N 0.000 claims description 2
- HNDVDQJCIGZPNO-YFKPBYRVSA-N L-histidine Chemical compound OC(=O)[C@@H](N)CC1=CN=CN1 HNDVDQJCIGZPNO-YFKPBYRVSA-N 0.000 claims description 2
- ONIBWKKTOPOVIA-UHFFFAOYSA-N Proline Natural products OC(=O)C1CCCN1 ONIBWKKTOPOVIA-UHFFFAOYSA-N 0.000 claims description 2
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- 229960002433 cysteine Drugs 0.000 claims description 2
- 239000002526 disodium citrate Substances 0.000 claims description 2
- 235000019262 disodium citrate Nutrition 0.000 claims description 2
- CEYULKASIQJZGP-UHFFFAOYSA-L disodium;2-(carboxymethyl)-2-hydroxybutanedioate Chemical compound [Na+].[Na+].[O-]C(=O)CC(O)(C(=O)O)CC([O-])=O CEYULKASIQJZGP-UHFFFAOYSA-L 0.000 claims description 2
- 239000000174 gluconic acid Substances 0.000 claims description 2
- 235000012208 gluconic acid Nutrition 0.000 claims description 2
- 229960002449 glycine Drugs 0.000 claims description 2
- HNDVDQJCIGZPNO-UHFFFAOYSA-N histidine Natural products OC(=O)C(N)CC1=CN=CN1 HNDVDQJCIGZPNO-UHFFFAOYSA-N 0.000 claims description 2
- 229960002885 histidine Drugs 0.000 claims description 2
- 235000014304 histidine Nutrition 0.000 claims description 2
- 150000002823 nitrates Chemical class 0.000 claims description 2
- AVTYONGGKAJVTE-OLXYHTOASA-L potassium L-tartrate Chemical compound [K+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O AVTYONGGKAJVTE-OLXYHTOASA-L 0.000 claims description 2
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 claims description 2
- 239000001508 potassium citrate Substances 0.000 claims description 2
- 229960002635 potassium citrate Drugs 0.000 claims description 2
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 claims description 2
- 235000011082 potassium citrates Nutrition 0.000 claims description 2
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 claims description 2
- 229940098424 potassium pyrophosphate Drugs 0.000 claims description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 claims description 2
- 235000019252 potassium sulphite Nutrition 0.000 claims description 2
- 239000001472 potassium tartrate Substances 0.000 claims description 2
- 229940111695 potassium tartrate Drugs 0.000 claims description 2
- 235000011005 potassium tartrates Nutrition 0.000 claims description 2
- 229960002429 proline Drugs 0.000 claims description 2
- 235000013930 proline Nutrition 0.000 claims description 2
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 claims description 2
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 claims description 2
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 claims description 2
- 239000011684 sodium molybdate Substances 0.000 claims description 2
- 235000015393 sodium molybdate Nutrition 0.000 claims description 2
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 claims description 2
- 229940048086 sodium pyrophosphate Drugs 0.000 claims description 2
- 229940001482 sodium sulfite Drugs 0.000 claims description 2
- 239000001433 sodium tartrate Substances 0.000 claims description 2
- 229960002167 sodium tartrate Drugs 0.000 claims description 2
- 235000011004 sodium tartrates Nutrition 0.000 claims description 2
- 235000019818 tetrasodium diphosphate Nutrition 0.000 claims description 2
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- XAEWLETZEZXLHR-UHFFFAOYSA-N zinc;dioxido(dioxo)molybdenum Chemical compound [Zn+2].[O-][Mo]([O-])(=O)=O XAEWLETZEZXLHR-UHFFFAOYSA-N 0.000 claims description 2
- 238000005282 brightening Methods 0.000 claims 7
- 239000003795 chemical substances by application Substances 0.000 claims 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 3
- 239000002585 base Substances 0.000 claims 3
- 229910002651 NO3 Inorganic materials 0.000 claims 2
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 2
- 230000001105 regulatory effect Effects 0.000 claims 1
- 239000004289 sodium hydrogen sulphite Substances 0.000 claims 1
- 229910021653 sulphate ion Inorganic materials 0.000 claims 1
- JOKIQGQOKXGHDV-UHFFFAOYSA-N thiomorpholine-3-carboxylic acid Chemical compound [O-]C(=O)C1CSCC[NH2+]1 JOKIQGQOKXGHDV-UHFFFAOYSA-N 0.000 claims 1
- 239000011686 zinc sulphate Substances 0.000 claims 1
- 235000009529 zinc sulphate Nutrition 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 9
- 238000007254 oxidation reaction Methods 0.000 abstract description 9
- 238000004891 communication Methods 0.000 abstract description 7
- 230000000052 comparative effect Effects 0.000 description 20
- 239000008367 deionised water Substances 0.000 description 10
- 229910021641 deionized water Inorganic materials 0.000 description 10
- 238000005868 electrolysis reaction Methods 0.000 description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 9
- 239000010936 titanium Substances 0.000 description 9
- 229910052719 titanium Inorganic materials 0.000 description 9
- 230000008054 signal transmission Effects 0.000 description 8
- 239000010405 anode material Substances 0.000 description 7
- 239000010406 cathode material Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 238000011161 development Methods 0.000 description 6
- 229920002379 silicone rubber Polymers 0.000 description 6
- 239000004945 silicone rubber Substances 0.000 description 6
- 230000003064 anti-oxidating effect Effects 0.000 description 5
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 229910052741 iridium Inorganic materials 0.000 description 5
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 5
- 150000002736 metal compounds Chemical class 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- RZLVQBNCHSJZPX-UHFFFAOYSA-L zinc sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Zn+2].[O-]S([O-])(=O)=O RZLVQBNCHSJZPX-UHFFFAOYSA-L 0.000 description 5
- -1 electrons Chemical class 0.000 description 4
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910001416 lithium ion Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- MDEBHEMVODXCAC-UHFFFAOYSA-N thiomorpholine-3-carboxylic acid;hydrochloride Chemical compound Cl.OC(=O)C1CSCCN1 MDEBHEMVODXCAC-UHFFFAOYSA-N 0.000 description 3
- 238000001291 vacuum drying Methods 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000009864 tensile test Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 1
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 1
- CFOAUMXQOCBWNJ-UHFFFAOYSA-N [B].[Si] Chemical compound [B].[Si] CFOAUMXQOCBWNJ-UHFFFAOYSA-N 0.000 description 1
- VONLASUMRVUZLY-UHFFFAOYSA-N [Ir].[Ti].[Ta] Chemical compound [Ir].[Ti].[Ta] VONLASUMRVUZLY-UHFFFAOYSA-N 0.000 description 1
- HJPBEXZMTWFZHY-UHFFFAOYSA-N [Ti].[Ru].[Ir] Chemical compound [Ti].[Ru].[Ir] HJPBEXZMTWFZHY-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229940099427 potassium bisulfite Drugs 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
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Abstract
Description
技术领域Technical Field
本发明涉及铜箔技术领域,具体涉及一种极薄电解铜箔及其制备方法和应用。The present invention relates to the technical field of copper foil, and in particular to an ultra-thin electrolytic copper foil and a preparation method and application thereof.
背景技术Background technique
随着电子信息产业快速发展,电解铜箔的使用量越来越大,产品广泛应用于航空航天、通讯设备、锂离子电池、新能源汽车等领域,国内外市场对电解铜箔,尤其是高性能电解铜箔的需求日益增加。现代电子设备新增功能的拓展与性能提升导致组件数量日益增加,占用了更多的内部空间,电解铜箔除在动力电池、电路板方面应用,在高端应用领域将会开辟更多的应用空间,因此,对铜箔材料发展趋势提出了轻薄化、低轮廓、高光泽度、易剥离的新要求。With the rapid development of the electronic information industry, the use of electrolytic copper foil is increasing. The products are widely used in aerospace, communication equipment, lithium-ion batteries, new energy vehicles and other fields. The domestic and foreign markets have increasing demand for electrolytic copper foil, especially high-performance electrolytic copper foil. The expansion of new functions and performance improvement of modern electronic equipment have led to an increasing number of components, occupying more internal space. In addition to its application in power batteries and circuit boards, electrolytic copper foil will open up more application space in high-end application fields. Therefore, the development trend of copper foil materials has put forward new requirements for thinness, low profile, high gloss and easy peeling.
电解铜箔应用于IC载板、锂离子电池、5G信号高频高速传输领域等后端产品时,首先要保证所需的电解铜箔是超薄低轮廓铜箔(厚度≤1.5μm),铜箔的轮廓度(表面粗糙度)低是一个关键的性能指标,能够保证信号的稳定传输,否则会导致高频信号传输延迟大、效率低的问题;其次,锂离子电池用的双光面铜箔对耐高温防氧化、抗拉强度和延伸率有一定要求,确保在对负极片进行压平时铜箔能够充分变形,否则将会造成极片易断裂问题,从而影响电池的成品率和循环寿命;同时,铜箔层与阴极面可完整剥离也是对铜箔制备技术的一项挑战,工业上常常需用物理手段将铜箔从阴极上剥离,有时铜箔的粘结性太高将导致铜箔易撕裂,浪费箔材。然而,当前国内的极薄电解铜箔普遍存在轮廓度高、抗氧化性能差、铜箔层与阴极面难以完整剥离等问题,因此,发展适用于高端产品应用的低轮廓、高抗氧、易剥离的极薄铜箔制备技术,既可以保证信号的传输速率、减少信号传输的损失,显著改善后端应用,又能够节约制备成本,提高生产效率,这将成为现今以至未来铜箔技术发展中的一项重大研究课题。When electrolytic copper foil is used in back-end products such as IC substrates, lithium-ion batteries, and 5G signal high-frequency and high-speed transmission, the first thing to do is to ensure that the required electrolytic copper foil is ultra-thin and low-profile (thickness ≤ 1.5μm). The low profile (surface roughness) of the copper foil is a key performance indicator that can ensure stable signal transmission, otherwise it will lead to large delays in high-frequency signal transmission and low efficiency. Secondly, the double-sided copper foil used in lithium-ion batteries has certain requirements for high-temperature resistance and oxidation resistance, tensile strength and elongation to ensure that the copper foil can be fully deformed when the negative electrode is flattened, otherwise it will cause the electrode to break easily, thereby affecting the battery's yield and cycle life. At the same time, the complete peeling of the copper foil layer and the cathode surface is also a challenge to the copper foil preparation technology. In industry, physical means are often required to peel the copper foil from the cathode. Sometimes the copper foil's adhesion is too high, which will cause the copper foil to tear easily and waste foil. However, the current ultra-thin electrolytic copper foil in China generally has problems such as high profile, poor oxidation resistance, and difficulty in completely peeling off the copper foil layer and the cathode surface. Therefore, the development of low-profile, high-oxidation-resistance, and easy-to-peel ultra-thin copper foil preparation technology suitable for high-end product applications can not only ensure the signal transmission rate, reduce the loss of signal transmission, and significantly improve the back-end application, but also save preparation costs and improve production efficiency. This will become a major research topic in the development of copper foil technology now and in the future.
目前国内电子铜箔的制造企业常使用镀铬手段进行防氧化处理,虽然具有良好的耐热耐磨能力和化学稳定性,但六价铬剧毒,严重污染环境,随着国家新型环保形式的出现,电镀正逐渐向无铬化发展。铜箔产品的绿色环保表面处理对于国内发展新兴产业是一项极大的挑战。开展高性能的极薄铜箔的研究对铜箔工业、电子、通讯、能源、交通、航天、军事等产业的发展有重大意义。At present, domestic electronic copper foil manufacturers often use chrome plating for anti-oxidation treatment. Although it has good heat resistance, wear resistance and chemical stability, hexavalent chromium is highly toxic and seriously pollutes the environment. With the emergence of new environmental protection forms in the country, electroplating is gradually developing towards chromium-free. The green and environmentally friendly surface treatment of copper foil products is a great challenge for the development of emerging industries in China. The research on high-performance ultra-thin copper foil is of great significance to the development of copper foil industry, electronics, communications, energy, transportation, aerospace, military and other industries.
发明内容Summary of the invention
本发明的目的是为了克服现有技术中极薄铜箔难剥离、抗氧化性能差的问题,提供了一种极薄电解铜箔及其制备方法和应用。The purpose of the present invention is to overcome the problems in the prior art that ultra-thin copper foil is difficult to peel off and has poor anti-oxidation performance, and to provide an ultra-thin electrolytic copper foil and a preparation method and application thereof.
为了实现上述目的,本发明第一方面提供了一种极薄电解铜箔,其中,所述铜箔的厚度为0.5-3μm,表面粗糙度Rz为0.5-3.5μm,光亮度60°为 180-250GU,抗拉强度为320-430MPa,延伸率为1.5-3.2%,表面张力为 65-78mM/m以上;在220℃下放置2h不变色。In order to achieve the above-mentioned purpose, the first aspect of the present invention provides an ultra-thin electrolytic copper foil, wherein the copper foil has a thickness of 0.5-3 μm, a surface roughness R z of 0.5-3.5 μm, a brightness of 60° of 180-250 GU, a tensile strength of 320-430 MPa, an elongation of 1.5-3.2%, and a surface tension of 65-78 mM/m or more; and does not change color when placed at 220°C for 2 hours.
本发明第二方面提供了一种极薄电解铜箔的制备方法,其中,所述方法包括:A second aspect of the present invention provides a method for preparing an ultra-thin electrolytic copper foil, wherein the method comprises:
(1)将阴极和阳极置于含铜电解液中,通电进行电解处理,得到生箔;(1) placing a cathode and an anode in a copper-containing electrolyte, applying electricity for electrolysis, and obtaining a raw foil;
(2)将所述生箔置于含防氧化剂的水溶液中浸泡后水洗、烘干后,进行表面离子化处理;(2) soaking the raw foil in an aqueous solution containing an antioxidant, washing it with water, drying it, and then performing a surface ionization treatment;
其中,在步骤(1)中,将导电玻璃浸入含导电聚合物的水溶液中进行前处理并烘干后作为所述阴极。Wherein, in step (1), the conductive glass is immersed in an aqueous solution containing a conductive polymer for pretreatment and dried to serve as the cathode.
本发明第三方面提供了一种第二方面所述方法制备得到的极薄电解铜箔。The third aspect of the present invention provides an ultra-thin electrolytic copper foil prepared by the method described in the second aspect.
本发明第四方面提供了一种第三方面所述极薄电解铜箔在芯片封装中的应用。A fourth aspect of the present invention provides an application of the ultra-thin electrolytic copper foil described in the third aspect in chip packaging.
通过上述技术方案,采用本发明提供的方法制得的极薄电解铜箔具有以下优势:Through the above technical solution, the ultra-thin electrolytic copper foil prepared by the method provided by the present invention has the following advantages:
(1)在制备时可与阴极自动剥离,且剥离下来的铜箔属于双光面铜箔,解决了实际生产中铜箔难以剥离导致的撕裂现象;(1) It can be automatically peeled off from the cathode during preparation, and the peeled copper foil is a double-sided copper foil, which solves the tearing phenomenon caused by the difficulty of peeling the copper foil in actual production;
(2)铜箔厚度极薄,抗氧化性高,力学性能好,可用于芯片封装,相较于同类芯片封装用电解铜箔,体积与重量占比可减少50-70%,满足当前芯片封装与5G通信领域对于铜箔轻量化的要求;(2) The copper foil is extremely thin, has high oxidation resistance, and good mechanical properties. It can be used for chip packaging. Compared with similar electrolytic copper foil for chip packaging, the volume and weight can be reduced by 50-70%, meeting the current requirements for lightweight copper foil in chip packaging and 5G communication fields;
(3)具有超低轮廓(表面粗糙度Rz为0.5-3.5μm)的特征,用于通信领域能够加快信号传输,改善信号传输的稳定性;(3) It has the characteristics of ultra-low profile (surface roughness Rz is 0.5-3.5μm), which can speed up signal transmission and improve the stability of signal transmission when used in the communication field;
(4)铜箔表面张力大(65-78mM/m),表现为亲水性,具有一定的粘结性,应用于锂电池中能够提高循环容量;应用于印刷电路板中具有一定的剥离强度,性能佳。(4) The surface tension of copper foil is large (65-78mM/m), which shows hydrophilicity and has certain adhesion. It can be used in lithium batteries to improve the cycle capacity; it has certain peel strength and good performance when used in printed circuit boards.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1是实施例1极薄铜箔的扫描电镜(SEM)图像(放大20000倍);FIG1 is a scanning electron microscope (SEM) image of the ultra-thin copper foil of Example 1 (magnified 20,000 times);
图2是实施例1极薄铜箔的截面的扫描电镜(SEM)图像(放大10000 倍);FIG2 is a scanning electron microscope (SEM) image of a cross section of the ultra-thin copper foil of Example 1 (magnified 10,000 times);
图3是实施例2极薄铜箔的截面的扫描电镜(SEM)图像(放大10000 倍)。3 is a scanning electron microscope (SEM) image of a cross section of the ultra-thin copper foil of Example 2 (magnified 10,000 times).
具体实施方式Detailed ways
在本文中所披露的范围的端点和任何值都不限于该精确的范围或值,这些范围或值应当理解为包含接近这些范围或值的值。对于数值范围来说,各个范围的端点值之间、各个范围的端点值和单独的点值之间,以及单独的点值之间可以彼此组合而得到一个或多个新的数值范围,这些数值范围应被视为在本文中具体公开。The endpoints and any values of the ranges disclosed in this article are not limited to the precise ranges or values, and these ranges or values should be understood to include values close to these ranges or values. For numerical ranges, the endpoint values of each range, the endpoint values of each range and the individual point values, and the individual point values can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed in this article.
本发明第一方面提供了一种极薄电解铜箔,其中,所述铜箔的厚度为 0.5-3μm,表面粗糙度Rz为0.5-3.5μm,光亮度60°为180-250GU,抗拉强度为320-430MPa,延伸率为1.5-3.2%,表面张力为65-78mM/m以上;在220℃下放置2h不变色。The first aspect of the present invention provides an ultra-thin electrolytic copper foil, wherein the copper foil has a thickness of 0.5-3 μm, a surface roughness R z of 0.5-3.5 μm, a brightness of 180-250 GU at 60°, a tensile strength of 320-430 MPa, an elongation of 1.5-3.2%, and a surface tension of 65-78 mM/m or more; and does not change color when placed at 220°C for 2 hours.
在本发明中,铜箔的厚度通过型号为美国FEI MLA650F的扫描电镜 (SEM)获得;铜箔的表面粗糙度采用型号为德国马尔PS-10粗糙仪测得;铜箔的抗拉强度和延伸率采用型号为日本岛津AG-IS/1KN拉伸试验机测得;光亮度采用深圳三恩时3nh光泽度仪测得;表面张力采用美国爱莎A.Shine 达因笔测得;抗氧化性通过在DZ-1BCIV真空干燥箱中加热测得。In the present invention, the thickness of the copper foil is obtained by a scanning electron microscope (SEM) of the model FEI MLA650F of the United States; the surface roughness of the copper foil is measured by a roughness meter of the model MARL PS-10 of Germany; the tensile strength and elongation of the copper foil are measured by a tensile testing machine of the model SHIMADZU of Japan AG-IS/1KN; the brightness is measured by a 3nh gloss meter of Shenzhen Sanenshi; the surface tension is measured by an A.Shine dyne pen of the United States; and the oxidation resistance is measured by heating in a DZ-1BCIV vacuum drying oven.
在本发明中,所述铜箔厚度极薄,抗氧化性高,力学性能好,可用于芯片封装,相较于同类芯片封装用电解铜箔,体积与重量占比可减少50-70%,满足当前芯片封装与5G通信领域对于铜箔轻量化的要求;且具有超低轮廓 (表面粗糙度Rz为0.5-3.5μm)的特征,用于通信领域能够加快信号传输,改善信号传输的稳定性;表面张力大(65-78mM/m),表现为亲水性,具有一定的粘结性,应用于锂电池中能够提高循环容量;应用于印刷电路板中具有一定的剥离强度,性能佳。In the present invention, the copper foil is extremely thin, has high oxidation resistance, and good mechanical properties, and can be used for chip packaging. Compared with similar electrolytic copper foils for chip packaging, the volume and weight ratio can be reduced by 50-70%, meeting the current chip packaging and 5G communication fields. The requirements for lightweight copper foil; and it has an ultra-low profile (surface roughness Rz is 0.5-3.5μm), and can be used in the communication field to accelerate signal transmission and improve signal transmission stability; the surface tension is large (65-78mM/m), showing hydrophilicity, and has certain adhesion, and can be used in lithium batteries to increase the cycle capacity; it has certain peel strength and good performance when used in printed circuit boards.
本发明第二方面提供了一种极薄电解铜箔的制备方法,其中,所述方法包括:A second aspect of the present invention provides a method for preparing an ultra-thin electrolytic copper foil, wherein the method comprises:
(1)将阴极和阳极置于含铜电解液中,通电进行电解处理,得到生箔;(1) placing a cathode and an anode in a copper-containing electrolyte, applying electricity for electrolysis, and obtaining a raw foil;
(2)将所述生箔置于含防氧化剂的水溶液中浸泡后水洗、烘干后,进行表面离子化处理;(2) soaking the raw foil in an aqueous solution containing an antioxidant, washing it with water, drying it, and then performing a surface ionization treatment;
其中,在步骤(1)中,将导电玻璃浸入含导电聚合物的水溶液中进行前处理并烘干后作为所述阴极。Wherein, in step (1), the conductive glass is immersed in an aqueous solution containing a conductive polymer for pretreatment and dried to serve as the cathode.
本发明中,所述导电玻璃是在钠钙基或硅硼基基片玻璃的基础上,利用磁控溅射的方法镀上一层氧化铟锡(ITO)膜加工制成。In the present invention, the conductive glass is produced by coating a layer of indium tin oxide (ITO) film on a soda-lime-based or silicon-boron-based substrate glass by magnetron sputtering.
在本发明中,限定导电玻璃为阴极,并将其置于导电聚合物水溶液中进行前处理,通过上述技术手段的协同作用,可以取得铜箔自剥离的技术效果,同时能够将所述铜箔的表面粗糙度Rz控制在0.5-3.5μm。In the present invention, conductive glass is defined as the cathode and is placed in a conductive polymer aqueous solution for pretreatment. Through the synergistic effect of the above technical means, the technical effect of copper foil self-peeling can be achieved, and the surface roughness Rz of the copper foil can be controlled within 0.5-3.5μm.
在本发明中,所述阳极材料可以选择本领域的常规阳极电极材料;优选地,所述阳极材料可以选自纯铜板、涂钽钛板、涂钽铱钛板或钌-铱-钛三元涂层钛板。In the present invention, the anode material can be selected from conventional anode electrode materials in the art; preferably, the anode material can be selected from pure copper plate, tantalum-titanium coated plate, tantalum-iridium-titanium coated plate or ruthenium-iridium-titanium ternary coated titanium plate.
在本发明的一种优选实施方式中,所述前处理的时间为5-10s。In a preferred embodiment of the present invention, the pre-treatment time is 5-10s.
在本发明的一种优选实施方式中,所述导电聚合物选自聚吡咯、聚苯胺、聚酞菁中的至少一种。In a preferred embodiment of the present invention, the conductive polymer is selected from at least one of polypyrrole, polyaniline and polyphthalocyanine.
在本发明的一种优选实施方式中,所述导电聚合物的水溶液的体积浓度为2-4.5%。In a preferred embodiment of the present invention, the volume concentration of the aqueous solution of the conductive polymer is 2-4.5%.
在本发明的一种优选实施方式中,所述含铜电解液的配制方法包括:将络合剂和辅助络合剂加入碱液中,得到溶液A;将含铜化合物、含锌化合物、含助剂金属化合物、光亮剂加入水中,得到溶液B,再将所述溶液A和溶液 B混合,得到所述含铜电解液。In a preferred embodiment of the present invention, the preparation method of the copper-containing electrolyte comprises: adding a complexing agent and an auxiliary complexing agent to an alkaline solution to obtain a solution A; adding a copper-containing compound, a zinc-containing compound, an auxiliary metal compound, and a brightener to water to obtain a solution B, and then mixing the solution A and the solution B to obtain the copper-containing electrolyte.
在本发明中,通过添加光亮剂,使得制得的铜箔的光亮度60°能够达到 180-250GU。In the present invention, by adding a brightener, the brightness of the copper foil prepared can reach 180-250GU at 60°.
在本发明的一种优选实施方式中,所述碱液为碱的水溶液,所述碱为氢氧化钠和/或氢氧化钾。In a preferred embodiment of the present invention, the alkali solution is an aqueous solution of alkali, and the alkali is sodium hydroxide and/or potassium hydroxide.
在本发明的一种优选实施方式中,所述络合剂选自酒石酸钾钠、酒石酸钾、酒石酸钠、焦磷酸钾、焦磷酸钠、甘氨酸、组氨酸、脯氨酸、半胱氨酸、亚硫酸钠、亚硫酸钾、亚硫酸氢钠、亚硫酸氢钾中的至少一种。In a preferred embodiment of the present invention, the complexing agent is selected from at least one of potassium sodium tartrate, potassium tartrate, sodium tartrate, potassium pyrophosphate, sodium pyrophosphate, glycine, histidine, proline, cysteine, sodium sulfite, potassium sulfite, sodium bisulfite, and potassium bisulfite.
在本发明的一种优选实施方式中,所述辅助络合剂选自柠檬酸钠、柠檬酸钾和柠檬酸二钠中的至少一种。In a preferred embodiment of the present invention, the auxiliary complexing agent is selected from at least one of sodium citrate, potassium citrate and disodium citrate.
在本发明的一种优选实施方式中,所述含铜化合物选自铜的硫酸盐、氯化盐和硝酸盐中的至少一种。In a preferred embodiment of the present invention, the copper-containing compound is selected from at least one of copper sulfate, copper chloride and copper nitrate.
在本发明的一种优选实施方式中,所述含锌化合物选自锌的硫酸盐、氯化盐和硝酸盐中的至少一种。In a preferred embodiment of the present invention, the zinc-containing compound is selected from at least one of zinc sulfate, zinc chloride and zinc nitrate.
在本发明的一种优选实施方式中,所述含助剂金属化合物中的助剂金属选自Bi、Sn、Sb、Cd中的至少一种,所述含助剂金属化合物选自所述助剂金属的硫酸盐、氯化盐和硝酸盐中的至少一种。In a preferred embodiment of the present invention, the auxiliary metal in the auxiliary metal compound is selected from at least one of Bi, Sn, Sb, and Cd, and the auxiliary metal compound is selected from at least one of sulfates, chlorides, and nitrates of the auxiliary metal.
在本发明的一种优选实施方式中,所述光亮剂选自2-巯基苯并咪唑、聚乙烯亚胺、硫脲、2-巯基丙酸、硫代吗啉-3-羧酸盐酸盐中的至少一种。In a preferred embodiment of the present invention, the brightener is selected from at least one of 2-mercaptobenzimidazole, polyethyleneimine, thiourea, 2-mercaptopropionic acid, and thiomorpholine-3-carboxylic acid hydrochloride.
在本发明的一种优选实施方式中,所述碱液、络合剂、辅助络合剂、含铜化合物、含锌化合物、含助剂金属化合物和光亮剂的用量使得在所述含铜电解液中,所述碱的浓度为20-60g/L,优选为30-55g/L;In a preferred embodiment of the present invention, the amount of the alkali solution, the complexing agent, the auxiliary complexing agent, the copper-containing compound, the zinc-containing compound, the auxiliary metal compound and the brightener is such that in the copper-containing electrolyte, the concentration of the alkali is 20-60 g/L, preferably 30-55 g/L;
所述络合剂的浓度为70-150g/L,优选为80-100g/L;The concentration of the complexing agent is 70-150 g/L, preferably 80-100 g/L;
所述辅助络合剂的浓度为5-50g/L,优选为10-40g/L;The concentration of the auxiliary complexing agent is 5-50 g/L, preferably 10-40 g/L;
以铜元素计,所述含铜化合物的浓度为10-60g/L,优选为30-50g/L;Calculated in terms of copper element, the concentration of the copper-containing compound is 10-60 g/L, preferably 30-50 g/L;
以锌元素计,所述含锌化合物的浓度为10-25g/L,优选为11-15g/L;Calculated in terms of zinc element, the concentration of the zinc-containing compound is 10-25 g/L, preferably 11-15 g/L;
以所述助剂金属计,所述含助剂金属化合物的浓度为0.01-1g/L,优选为0.01-0.5g/L;The concentration of the additive metal compound is 0.01-1 g/L, preferably 0.01-0.5 g/L, based on the additive metal;
所述光亮剂的浓度为0.001-0.1g/L,优选为0.001-0.05g/L。The concentration of the brightener is 0.001-0.1 g/L, preferably 0.001-0.05 g/L.
在本发明的一种优选实施方式中,所述电解处理采用稳压直流电源。In a preferred embodiment of the present invention, the electrolysis treatment uses a stabilized DC power supply.
在本发明的一种优选实施方式中,所述电解处理的电流密度为 0.5A/dm2-3.5A/dm2,优选为0.5A/dm2-2A/dm2。In a preferred embodiment of the present invention, the current density of the electrolytic treatment is 0.5 A/dm 2 -3.5 A/dm 2 , preferably 0.5 A/dm 2 -2 A/dm 2 .
在本发明的一种优选实施方式中,所述电解处理的时间为400s-800s,优选为500s-700s。In a preferred embodiment of the present invention, the electrolytic treatment time is 400s-800s, preferably 500s-700s.
在本发明的一种优选实施方式中,所述电解处理的温度为40-60℃,优选为40-55℃。In a preferred embodiment of the present invention, the temperature of the electrolytic treatment is 40-60°C, preferably 40-55°C.
在本发明的一种优选实施方式中,所述含铜电解液的循环速率为 1-10L/min,优选为2-8L/min。In a preferred embodiment of the present invention, the circulation rate of the copper-containing electrolyte is 1-10 L/min, preferably 2-8 L/min.
在本发明中,通过限定电解工艺参数,同时配合导电玻璃作为阴极材料,使得电沉积所得铜箔晶粒细小,表面致密,进而使制得的铜箔具有较好的力学性能,抗拉强度达到320-430MPa,延伸率达到1.5-3.2%。In the present invention, by limiting the electrolysis process parameters and using conductive glass as the cathode material, the copper foil obtained by electrodeposition has fine grains and a dense surface, thereby making the obtained copper foil have better mechanical properties, with a tensile strength of 320-430 MPa and an elongation of 1.5-3.2%.
在本发明的一种优选实施方式中,所述防氧化剂选自铬酐、葡萄糖、葡萄糖酸、半乳糖、岩藻糖、钼酸钠、钼酸钾、钼酸锌、钼酸铋、硫酸镍、硫酸锌、硫酸铬中的两种及以上。In a preferred embodiment of the present invention, the antioxidant is selected from two or more of chromic anhydride, glucose, gluconic acid, galactose, fucose, sodium molybdate, potassium molybdate, zinc molybdate, bismuth molybdate, nickel sulfate, zinc sulfate, and chromium sulfate.
在本发明的一种优选实施方式中,所述防氧化剂的浓度为0.5-5g/L,优选为0.6-4g/L。In a preferred embodiment of the present invention, the concentration of the antioxidant is 0.5-5 g/L, preferably 0.6-4 g/L.
根据本发明,所述生箔的表面离子化处理可以在电晕机中进行;优选地,所述表面离子化处理的过程包括:将所述生箔置于阳极和阴极之间并施加高压电源;更优选地,所述表面离子化处理中的阳极和阴极选自耐高温、耐臭氧、高绝缘的硅橡辊或陶瓷辊。According to the present invention, the surface ionization treatment of the raw foil can be carried out in a corona machine; preferably, the process of the surface ionization treatment includes: placing the raw foil between an anode and a cathode and applying a high voltage power supply; more preferably, the anode and cathode in the surface ionization treatment are selected from high temperature resistant, ozone resistant, high insulation silicone rubber rollers or ceramic rollers.
根据本发明,在所述表面离子化处理过程中,生箔表面的防氧化剂分子氧化,与空气电离后产生的自由基发生氧化反应,形成一层物理屏障,进一步达到表面防氧化的目的。According to the present invention, during the surface ionization treatment process, the antioxidant molecules on the surface of the raw foil are oxidized and react with the free radicals generated by air ionization to form a physical barrier, thereby further achieving the purpose of surface oxidation protection.
在本发明中,所述表面离子化处理主要依靠电子、离子、激发态原子和自由基等活性离子的激活作用,使铜箔表面的防氧化剂反应形成稳定的简单小分子,能够有效阻挡氧接触铜箔,达到防氧化效果,同时还能提升铜箔的表面张力。In the present invention, the surface ionization treatment mainly relies on the activation of active ions such as electrons, ions, excited atoms and free radicals, so that the antioxidant on the surface of the copper foil reacts to form stable simple small molecules, which can effectively block oxygen from contacting the copper foil, achieve anti-oxidation effect, and at the same time increase the surface tension of the copper foil.
在本发明的一种优选实施方式中,所述表面离子化处理的电压为 1000-5000V,功率为2-10kW。In a preferred embodiment of the present invention, the voltage of the surface ionization treatment is 1000-5000V and the power is 2-10kW.
本发明第三方面提供了一种第二方面所述方法制备得到的极薄电解铜箔。The third aspect of the present invention provides an ultra-thin electrolytic copper foil prepared by the method described in the second aspect.
所述极薄电解铜箔的结构、性能如前所述,不再赘述。The structure and performance of the ultra-thin electrolytic copper foil are as described above and will not be described in detail.
本发明第四方面提供了一种第三方面所述极薄电解铜箔在芯片封装中的应用。A fourth aspect of the present invention provides an application of the ultra-thin electrolytic copper foil described in the third aspect in chip packaging.
以下将通过实施例对本发明进行详细描述。The present invention will be described in detail below through examples.
以下实施例和对比例中,铜箔的厚度通过型号为美国FEI MLA650F的扫描电镜(SEM)获得;In the following examples and comparative examples, the thickness of the copper foil was obtained by a scanning electron microscope (SEM) of the American FEI MLA650F model;
铜箔的表面粗糙度采用型号为德国马尔PS-10粗糙仪测得;The surface roughness of the copper foil was measured using a German Mahr PS-10 roughness meter.
铜箔的抗拉强度和延伸率采用型号为日本岛津AG-IS/1KN拉伸试验机测得;The tensile strength and elongation of copper foil were measured using a Japanese Shimadzu AG-IS/1KN tensile testing machine;
光亮度采用深圳三恩时3nh光泽度仪测得;The brightness is measured using Shenzhen Sannh 3nh gloss meter;
表面张力采用美国爱莎A.Shine达因笔测得;The surface tension was measured using an American Aisha A. Shine dyne pen;
抗氧化性采用DZ-1BCIV真空干燥箱测得,在DZ-1BCIV真空干燥箱中,将铜箔于150℃或220℃的温度下加热,铜箔在越高的温度下保持不变色的时间越长,则其抗氧化性越高。The oxidation resistance is measured using a DZ-1BCIV vacuum drying oven. In the DZ-1BCIV vacuum drying oven, the copper foil is heated at 150°C or 220°C. The higher the temperature, the longer the copper foil remains unchanged, and the higher its oxidation resistance.
实施例1Example 1
将络合剂酒石酸钾钠、辅助络合剂柠檬酸钠加入到氢氧化钠溶液中(氢氧化钠浓度为50g/L),得到溶液A;将五水硫酸铜、七水硫酸锌、Bi2(SO4)3、2-巯基苯并咪唑加入到去离子水中,得到溶液B;将上述所得溶液A与溶液 B混合后,加入去离子水定容至所需体积得到含铜电解液;The complexing agent potassium sodium tartrate and the auxiliary complexing agent sodium citrate are added to a sodium hydroxide solution (the sodium hydroxide concentration is 50 g/L) to obtain a solution A; copper sulfate pentahydrate, zinc sulfate heptahydrate, Bi 2 (SO 4 ) 3 , and 2-mercaptobenzimidazole are added to deionized water to obtain a solution B; the above-obtained solution A is mixed with the solution B, and deionized water is added to make up to the required volume to obtain a copper-containing electrolyte;
其中,在所述含铜电解液中,氢氧化钠的浓度为50g/L,酒石酸钾钠的浓度为100g/L,柠檬酸钠的浓度为20g/L,Cu2+的浓度为40g/L,Zn2+的浓度为11.5g/L,Bi3+的浓度为0.2g/L,2-巯基苯并咪唑浓度为0.002g/L;Wherein, in the copper-containing electrolyte, the concentration of sodium hydroxide is 50 g/L, the concentration of potassium sodium tartrate is 100 g/L, the concentration of sodium citrate is 20 g/L, the concentration of Cu 2+ is 40 g/L, the concentration of Zn 2+ is 11.5 g/L, the concentration of Bi 3+ is 0.2 g/L, and the concentration of 2-mercaptobenzimidazole is 0.002 g/L;
将导电玻璃在体积浓度为2%的聚吡咯水溶液中进行前处理(前处理时间为8s)后作为阴极,以涂铱钛板为阳极,采用稳压直流电源,对所述含铜电解液在搅拌状态下进行电解处理,得到生箔;其中,所述电解处理的条件为:电流密度为0.9A/dm2,沉积时间为600s,温度为45℃,电解液循环速率为6L/min;Conductive glass is pretreated in a polypyrrole aqueous solution with a volume concentration of 2% (pretreatment time is 8s) and used as a cathode. An iridium-coated titanium plate is used as an anode. A stabilized DC power supply is used to electrolyze the copper-containing electrolyte under stirring to obtain a raw foil. The electrolysis treatment conditions are: current density of 0.9A/ dm2 , deposition time of 600s, temperature of 45°C, and electrolyte circulation rate of 6L/min.
将所述生箔置于含有铬酐和葡萄糖的水溶液(铬酐浓度为0.8g/L,葡萄糖浓度为3g/L)中浸泡30s后,水洗并在80℃下空气鼓风烘干,再将其置于阳极和阴极之间并施加高压电源,进行表面离子化处理,得到极薄电解铜箔;其中,所述表面离子化处理的条件为:功率为2kW,瞬时电压为1270V,所述表面离子化处理的阳极和阴极材料均为硅橡辊。The raw foil is immersed in an aqueous solution containing chromic anhydride and glucose (chromic anhydride concentration is 0.8 g/L, glucose concentration is 3 g/L) for 30 seconds, then washed with water and air-dried at 80°C, and then placed between an anode and a cathode and a high voltage power supply is applied to perform surface ionization treatment to obtain an ultra-thin electrolytic copper foil; wherein the conditions for the surface ionization treatment are: a power of 2 kW, an instantaneous voltage of 1270 V, and the anode and cathode materials for the surface ionization treatment are both silicone rubber rollers.
本实施例制得的极薄电解铜箔的扫描电镜(SEM)图像(放大20000倍) 如图1所示,极薄电解铜箔的截面的扫描电镜(SEM)图像(放大10000倍) 如图2所示,通过图1可以看出本实施例制得的极薄铜箔表面完整、致密,无裂痕,通过图2可以看出铜箔的厚度为1.241-1.376μm,满足极薄铜箔的要求。The scanning electron microscope (SEM) image of the ultra-thin electrolytic copper foil prepared in this embodiment (magnified 20,000 times) is shown in Figure 1, and the scanning electron microscope (SEM) image of the cross-section of the ultra-thin electrolytic copper foil (magnified 10,000 times) is shown in Figure 2. It can be seen from Figure 1 that the surface of the ultra-thin copper foil prepared in this embodiment is complete, dense, and has no cracks. It can be seen from Figure 2 that the thickness of the copper foil is 1.241-1.376μm, which meets the requirements of ultra-thin copper foil.
实施例2Example 2
将络合剂甘氨酸、辅助络合剂柠檬酸钠加入到氢氧化钠溶液中(氢氧化钠浓度为50g/L),得到溶液A;将五水硫酸铜、七水硫酸锌、Sb2(SO4)3、聚乙烯亚胺加入到去离子水中,得到溶液B;将上述所得溶液A与溶液B 混合后,加入去离子水定容至所需体积得到含铜电解液;Adding complexing agent glycine and auxiliary complexing agent sodium citrate into sodium hydroxide solution (sodium hydroxide concentration is 50 g/L) to obtain solution A; adding copper sulfate pentahydrate, zinc sulfate heptahydrate, Sb 2 (SO 4 ) 3 , and polyethyleneimine into deionized water to obtain solution B; mixing the above-obtained solution A with solution B, adding deionized water to make up to the required volume to obtain a copper-containing electrolyte;
其中,在所述含铜电解液中,氢氧化钠的浓度为40g/L,甘氨酸的浓度为100g/L,柠檬酸钠的浓度为20g/L,Cu2+的浓度为50g/L,Zn2+的浓度为13g/L,助剂Sb3+的浓度为0.3g/L,聚乙烯亚胺浓度为0.002g/L;Wherein, in the copper-containing electrolyte, the concentration of sodium hydroxide is 40 g/L, the concentration of glycine is 100 g/L, the concentration of sodium citrate is 20 g/L, the concentration of Cu 2+ is 50 g/L, the concentration of Zn 2+ is 13 g/L, the concentration of the auxiliary agent Sb 3+ is 0.3 g/L, and the concentration of polyethyleneimine is 0.002 g/L;
将导电玻璃在体积浓度为2.5%的聚苯胺水溶液中进行前处理(前处理时间为8s)后作为阴极,以涂铱钛板为阳极,采用稳压直流电源,对所述含铜电解液在搅拌状态下进行电解处理,得到生箔;其中,所述电解处理的条件为:电流密度为1A/dm2,沉积时间为700s,温度为50℃,电解液循环速率为8L/min;Conductive glass is pretreated in a polyaniline aqueous solution with a volume concentration of 2.5% (pretreatment time is 8s) and used as a cathode. An iridium-coated titanium plate is used as an anode. A stabilized DC power supply is used to electrolyze the copper-containing electrolyte under stirring to obtain a raw foil. The electrolysis treatment conditions are: current density of 1A/ dm2 , deposition time of 700s, temperature of 50°C, and electrolyte circulation rate of 8L/min.
将所述生箔置于含有铬酐和半乳糖的水溶液(铬酐浓度为0.9g/L,半乳糖浓度为3g/L)中浸泡30s后,水洗并在80℃下空气鼓风烘干,再将其置于阳极和阴极之间并施加高压电源,进行表面离子化处理,得到极薄电解铜箔;其中,所述表面离子化处理的条件为:功率为3kW,瞬时电压为1860V,所述表面离子化处理的阳极和阴极材料均为硅橡辊。The raw foil is immersed in an aqueous solution containing chromic anhydride and galactose (chromic anhydride concentration is 0.9 g/L, galactose concentration is 3 g/L) for 30 seconds, then washed with water and air-dried at 80°C, and then placed between an anode and a cathode and a high voltage power supply is applied to perform surface ionization treatment to obtain an ultra-thin electrolytic copper foil; wherein the conditions for the surface ionization treatment are: a power of 3 kW, an instantaneous voltage of 1860 V, and the anode and cathode materials for the surface ionization treatment are both silicone rubber rollers.
本实施例制得的极薄电解铜箔的截面的扫描电镜(SEM)图像(放大 10000倍)如图3所示,通过图3可以看出铜箔的厚度为1.268-1.430μm,满足极薄铜箔的要求。A scanning electron microscope (SEM) image (magnified 10,000 times) of the cross section of the ultra-thin electrolytic copper foil prepared in this embodiment is shown in FIG3 . It can be seen from FIG3 that the thickness of the copper foil is 1.268-1.430 μm, which meets the requirements of ultra-thin copper foil.
实施例3Example 3
将络合剂亚硫酸钠、辅助络合剂柠檬酸钠加入到氢氧化钠溶液中(氢氧化钠浓度为50g/L),得到溶液A;将五水硫酸铜、七水硫酸锌、SnSO4、硫脲加入到去离子水中,得到溶液B;将上述所得溶液A与溶液B混合后,加入去离子水定容至所需体积得到含铜电解液;Adding a complexing agent, sodium sulfite, and an auxiliary complexing agent, sodium citrate, into a sodium hydroxide solution (sodium hydroxide concentration is 50 g/L) to obtain a solution A; adding copper sulfate pentahydrate, zinc sulfate heptahydrate, SnSO 4 , and thiourea into deionized water to obtain a solution B; mixing the above-obtained solution A with the solution B, and adding deionized water to the required volume to obtain a copper-containing electrolyte;
其中,在所述含铜电解液中,氢氧化钠的浓度为30g/L,亚硫酸钠的浓度为80g/L,柠檬酸钠的浓度为20g/L,Cu2+的浓度为60g/L,Zn2+的浓度为 13g/L,Sn2+的浓度为0.4g/L,硫脲的浓度为0.002g/L;Wherein, in the copper-containing electrolyte, the concentration of sodium hydroxide is 30 g/L, the concentration of sodium sulfite is 80 g/L, the concentration of sodium citrate is 20 g/L, the concentration of Cu 2+ is 60 g/L, the concentration of Zn 2+ is 13 g/L, the concentration of Sn 2+ is 0.4 g/L, and the concentration of thiourea is 0.002 g/L;
将导电玻璃在体积浓度为3%的聚酞菁水溶液中进行前处理(前处理时间为10s)后作为阴极,以涂铱钛板为阳极,采用稳压直流电源,对所述含铜电解液在搅拌状态下进行电解处理,得到生箔;其中,所述电解处理的条件为:电流密度为1.5A/dm2,沉积时间为750s,温度为55℃,电解液循环速率为9L/min;Conductive glass is pretreated in a polyphthalocyanine aqueous solution with a volume concentration of 3% (pretreatment time is 10s) and used as a cathode. An iridium-coated titanium plate is used as an anode. A stabilized DC power supply is used to electrolyze the copper-containing electrolyte under stirring to obtain a raw foil. The electrolysis treatment conditions are: current density of 1.5A/ dm2 , deposition time of 750s, temperature of 55°C, and electrolyte circulation rate of 9L/min.
将所述生箔置于含有钼酸钾和硫酸镍的水溶液(钼酸钾浓度为1.5g/L,硫酸镍浓度为3.5g/L)中浸泡30s后,水洗并在80℃下空气鼓风烘干,再将其置于阳极和阴极之间并施加高压电源,进行表面离子化处理,得到极薄电解铜箔;其中,所述表面离子化处理的条件为:功率为5kW,瞬时电压为 3520V,所述表面离子化处理的阳极和阴极材料均为硅橡辊。The raw foil is immersed in an aqueous solution containing potassium molybdate and nickel sulfate (potassium molybdate concentration is 1.5 g/L, nickel sulfate concentration is 3.5 g/L) for 30 seconds, then washed with water and air-dried at 80°C, and then placed between an anode and a cathode and a high voltage power supply is applied to perform surface ionization treatment to obtain an ultra-thin electrolytic copper foil; wherein the conditions for the surface ionization treatment are: a power of 5 kW, an instantaneous voltage of 3520 V, and the anode and cathode materials for the surface ionization treatment are both silicone rubber rollers.
实施例4Example 4
将络合剂半胱氨酸、辅助络合剂柠檬酸钠加入到氢氧化钠溶液中(氢氧化钠浓度为50g/L),得到溶液A;将五水硫酸铜、七水硫酸锌、CdSO4、硫代吗啉-3-羧酸盐酸盐加入到去离子水中,得到溶液B;将上述所得溶液A 与溶液B混合后,加入去离子水定容至所需体积得到含铜电解液;The complexing agent cysteine and the auxiliary complexing agent sodium citrate are added to a sodium hydroxide solution (the sodium hydroxide concentration is 50 g/L) to obtain a solution A; copper sulfate pentahydrate, zinc sulfate heptahydrate, CdSO 4 , and thiomorpholine-3-carboxylic acid hydrochloride are added to deionized water to obtain a solution B; the above-obtained solution A is mixed with the solution B, and deionized water is added to make up to the required volume to obtain a copper-containing electrolyte;
其中,在所述含铜电解液中,氢氧化钠的浓度为20g/L,半胱氨酸的浓度为100g/L,柠檬酸钠的浓度为20g/L,Cu2+的浓度为40g/L,Zn2+的浓度为 15g/L,Cd2+的浓度为0.5g/L,硫代吗啉-3-羧酸盐酸盐浓度为0.004g/L;Wherein, in the copper-containing electrolyte, the concentration of sodium hydroxide is 20 g/L, the concentration of cysteine is 100 g/L, the concentration of sodium citrate is 20 g/L, the concentration of Cu 2+ is 40 g/L, the concentration of Zn 2+ is 15 g/L, the concentration of Cd 2+ is 0.5 g/L, and the concentration of thiomorpholine-3-carboxylic acid hydrochloride is 0.004 g/L;
将导电玻璃在体积浓度为2%的聚吡咯水溶液中进行前处理(前处理时间为10s)后作为阴极,以涂铱钛板为阳极,采用稳压直流电源,对所述含铜电解液在搅拌状态下进行电解处理,得到生箔;其中,所述电解处理的条件为:电流密度为2A/dm2,沉积时间为800s,温度为55℃,电解液循环速率为10L/min;Conductive glass is pretreated in a polypyrrole aqueous solution with a volume concentration of 2% (pretreatment time is 10s) and used as a cathode. An iridium-coated titanium plate is used as an anode. A stabilized DC power supply is used to electrolyze the copper-containing electrolyte under stirring to obtain a raw foil. The electrolysis treatment conditions are: current density of 2A/ dm2 , deposition time of 800s, temperature of 55°C, and electrolyte circulation rate of 10L/min.
将所述生箔置于含有钼酸铋和硫酸铬的水溶液(钼酸铋浓度为0.9g/L,硫酸铬浓度为3g/L)中浸泡30s后,水洗并在80℃下空气鼓风烘干,再将其置于阳极和阴极之间并施加高压电源,进行表面离子化处理,得到极薄电解铜箔;其中,所述表面离子化处理的条件为:功率为7kW,瞬时电压为4070V,所述表面离子化处理的阳极和阴极材料均为硅橡辊。The raw foil is immersed in an aqueous solution containing bismuth molybdate and chromium sulfate (bismuth molybdate concentration is 0.9 g/L, chromium sulfate concentration is 3 g/L) for 30 seconds, then washed with water and air-dried at 80°C, and then placed between an anode and a cathode and a high voltage power supply is applied to perform surface ionization treatment to obtain an ultra-thin electrolytic copper foil; wherein the conditions for the surface ionization treatment are: a power of 7 kW, an instantaneous voltage of 4070 V, and the anode and cathode materials for the surface ionization treatment are both silicone rubber rollers.
实施例5Example 5
将络合剂焦磷酸钾、辅助络合剂柠檬酸钠加入到氢氧化钠溶液中(氢氧化钠浓度为50g/L),得到溶液A;将五水硫酸铜、七水硫酸锌、Bi2(SO4)3、 2-巯基丙酸加入到去离子水中,得到溶液B;将上述所得溶液A与溶液B混合后,加入去离子水定容至所需体积得到含铜电解液;A complexing agent, potassium pyrophosphate, and an auxiliary complexing agent, sodium citrate, are added to a sodium hydroxide solution (the concentration of sodium hydroxide is 50 g/L) to obtain a solution A; copper sulfate pentahydrate, zinc sulfate heptahydrate, Bi 2 (SO 4 ) 3 , and 2-mercaptopropionic acid are added to deionized water to obtain a solution B; the above-obtained solution A is mixed with the solution B, and deionized water is added to make the volume to a required volume to obtain a copper-containing electrolyte;
其中,在所述含铜电解液中,氢氧化钠的浓度为60g/L,焦磷酸钾的浓度为120g/L,柠檬酸钠的浓度为20g/L,Cu2+的浓度为45g/L,Zn2+的浓度为 12g/L,Bi3+的浓度为0.2g/L,2-巯基丙酸的浓度为0.05g/L;Wherein, in the copper-containing electrolyte, the concentration of sodium hydroxide is 60 g/L, the concentration of potassium pyrophosphate is 120 g/L, the concentration of sodium citrate is 20 g/L, the concentration of Cu 2+ is 45 g/L, the concentration of Zn 2+ is 12 g/L, the concentration of Bi 3+ is 0.2 g/L, and the concentration of 2-mercaptopropionic acid is 0.05 g/L;
将导电玻璃在体积浓度为2%的聚吡咯水溶液中进行前处理(前处理时间为5s)后作为阴极,以涂铱钛板为阳极,采用稳压直流电源,对所述含铜电解液在搅拌状态下进行电解处理,得到生箔;其中,所述电解处理的条件为:电流密度为2A/dm2,沉积时间为1000s,温度为60℃,电解液循环速率为15L/min;Conductive glass is pretreated in a polypyrrole aqueous solution with a volume concentration of 2% (pretreatment time is 5s) and used as a cathode. An iridium-coated titanium plate is used as an anode. A stabilized DC power supply is used to electrolyze the copper-containing electrolyte under stirring to obtain a raw foil. The electrolysis treatment conditions are: current density of 2A/ dm2 , deposition time of 1000s, temperature of 60°C, and electrolyte circulation rate of 15L/min.
将所述生箔置于含有硫酸锌和岩藻糖的水溶液(硫酸锌浓度为1g/L,岩藻糖浓度为3g/L)中浸泡30s后,水洗并在80℃下空气鼓风烘干,再将其置于阳极和阴极之间并施加高压电源,进行表面离子化处理,得到极薄电解铜箔;其中,所述表面离子化处理的条件为:功率为10kW,瞬时电压为4930V,所述表面离子化处理的阳极和阴极材料均为硅橡辊。The raw foil is immersed in an aqueous solution containing zinc sulfate and fucose (zinc sulfate concentration is 1 g/L, fucose concentration is 3 g/L) for 30 seconds, then washed with water and air-dried at 80°C, and then placed between an anode and a cathode and a high voltage power supply is applied to perform surface ionization treatment to obtain an ultra-thin electrolytic copper foil; wherein the conditions for the surface ionization treatment are: a power of 10 kW, an instantaneous voltage of 4930 V, and the anode and cathode materials for the surface ionization treatment are both silicone rubber rollers.
对比例1Comparative Example 1
按照实施例1的方法进行制备,不同的是,导电玻璃不进行前处理。The preparation is carried out according to the method of Example 1, except that the conductive glass is not pre-treated.
本对比例制得的极薄铜箔表面有明显瑕疵,同时极薄铜箔与阴极较难分离,极薄铜箔发生撕裂现象,自剥离效果差,无法提供给后端应用。The surface of the ultra-thin copper foil prepared in this comparative example has obvious defects. At the same time, the ultra-thin copper foil is difficult to separate from the cathode. The ultra-thin copper foil is torn and has a poor self-peeling effect, and cannot be provided for back-end applications.
对比例2Comparative Example 2
按照实施例1的方法进行制备,不同的是,阴极换为钛板,并对阴极进行前处理。The preparation was carried out according to the method of Example 1, except that the cathode was replaced with a titanium plate and the cathode was pre-treated.
本对比例制得的极薄铜箔与阴极无法剥离,无法进行后续处理。The ultra-thin copper foil and cathode prepared in this comparative example cannot be peeled off and cannot be subsequently processed.
对比例3Comparative Example 3
按照实施例1的方法进行制备,不同的是,阴极换为钛板,对阴极材料也不进行前处理。The preparation was carried out according to the method of Example 1, except that the cathode was replaced with a titanium plate and the cathode material was not pre-treated.
本对比例制得的极薄铜箔与阴极无法剥离,无法进行后续处理。The ultra-thin copper foil and cathode prepared in this comparative example cannot be peeled off and cannot be subsequently processed.
对比例4Comparative Example 4
按照实施例1的方法进行制备,不同的是,不进行表面离子化处理。The preparation was carried out according to the method of Example 1, except that the surface ionization treatment was not performed.
本对比例制得的极薄铜箔表面完整、致密,无裂痕,自剥离效果佳,在 150℃,10min时氧化严重,抗氧化能力较差。The surface of the ultra-thin copper foil prepared in this comparative example is complete, dense, and free of cracks, and has a good self-peeling effect. However, it is severely oxidized at 150°C for 10 minutes, and its anti-oxidation ability is relatively poor.
对比例5Comparative Example 5
按照实施例1的方法进行制备,不同的是,不将所得生箔置于含防氧化剂的水溶液中浸泡,而是直接将生箔进行表面离子化处理。The preparation is carried out according to the method of Example 1, except that the obtained raw foil is not immersed in the aqueous solution containing the antioxidant, but is directly subjected to surface ionization treatment.
本对比例制得的极薄铜箔表面完整、致密,无裂痕,自剥离效果佳,在150℃,20min时氧化严重,抗氧化能力较差。The surface of the ultra-thin copper foil prepared in this comparative example is complete, dense, and free of cracks, and has a good self-peeling effect. However, it is severely oxidized at 150° C. for 20 min, and has a poor antioxidant capacity.
对比例6Comparative Example 6
按照实施例1的方法进行制备,不同的是,得到生箔后不再进行后续处理。The preparation is carried out according to the method of Example 1, except that no subsequent treatment is performed after the raw foil is obtained.
本对比例制得的极薄铜箔表面完整、致密,无裂痕,自剥离效果佳,在常温时氧化严重,抗氧化能力差。The surface of the ultra-thin copper foil prepared in this comparative example is complete, dense, and free of cracks, and has a good self-peeling effect. However, it is severely oxidized at room temperature and has poor anti-oxidation ability.
对比例7Comparative Example 7
按照实施例1的方法进行制备,不同的是,电解处理的电流密度为 4A/dm2。The preparation was carried out according to the method of Example 1, except that the current density of the electrolysis treatment was 4 A/dm 2 .
根据本对比例所使用条件,无法制得极薄铜箔,原因是导电玻璃的电阻比钛板电阻大,电流效率小,当电流密度过大时,实际沉积出的铜的质量过少,无法形成铜箔。According to the conditions used in this comparative example, it is impossible to produce an extremely thin copper foil because the resistance of the conductive glass is greater than that of the titanium plate and the current efficiency is low. When the current density is too large, the mass of copper actually deposited is too small to form a copper foil.
以上各实施例和对比例的极薄电解铜箔各项参数列于表1,其中,对比例2-3制得的极薄铜箔与阴极无法剥离,无法进行后续处理,对比例7无法制得铜箔,因此,对比例2-3、7无法测得相关参数。The parameters of the ultra-thin electrolytic copper foils of the above embodiments and comparative examples are listed in Table 1. Among them, the ultra-thin copper foils prepared in comparative examples 2-3 cannot be peeled off from the cathode and cannot be subsequently processed. Comparative example 7 cannot produce copper foil. Therefore, the relevant parameters of comparative examples 2-3 and 7 cannot be measured.
表1Table 1
注:*-SEM测试的平均厚度Note: *- Average thickness measured by SEM
由上述实施例、对比例的实施结果和表1的数据,可以看出,采用本发明的技术方案制备铜箔过程中具有自剥离效果,解决了实际生产中铜箔难以剥离导致的撕裂问题,且制备得到的铜箔厚度极薄,表面张力大,抗氧化性高,力学性能好。From the implementation results of the above embodiments and comparative examples and the data in Table 1, it can be seen that the copper foil prepared by the technical solution of the present invention has a self-peeling effect, which solves the tearing problem caused by the difficulty in peeling the copper foil in actual production, and the prepared copper foil is extremely thin, has a large surface tension, high oxidation resistance and good mechanical properties.
以上详细描述了本发明的优选实施方式,但是,本发明并不限于此。在本发明的技术构思范围内,可以对本发明的技术方案进行多种简单变型,包括各个技术特征以任何其它的合适方式进行组合,这些简单变型和组合同样应当视为本发明所公开的内容,均属于本发明的保护范围。The preferred embodiments of the present invention are described in detail above, but the present invention is not limited thereto. Within the technical concept of the present invention, the technical solution of the present invention can be subjected to a variety of simple modifications, including the combination of various technical features in any other suitable manner, and these simple modifications and combinations should also be regarded as the contents disclosed by the present invention and belong to the protection scope of the present invention.
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