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CN114911136A - Mask plate pre-alignment system and method and screen-stretching equipment - Google Patents

Mask plate pre-alignment system and method and screen-stretching equipment Download PDF

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Publication number
CN114911136A
CN114911136A CN202110181904.9A CN202110181904A CN114911136A CN 114911136 A CN114911136 A CN 114911136A CN 202110181904 A CN202110181904 A CN 202110181904A CN 114911136 A CN114911136 A CN 114911136A
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China
Prior art keywords
offset
reticle
module
alignment
adsorption
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Pending
Application number
CN202110181904.9A
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Chinese (zh)
Inventor
吴福龙
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Shanghai Xinshang Microelectronics Technology Co ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to CN202110181904.9A priority Critical patent/CN114911136A/en
Publication of CN114911136A publication Critical patent/CN114911136A/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • H10P72/50—

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

The embodiment of the invention discloses a mask plate pre-alignment system and a method and a mesh opening device, wherein the mask plate pre-alignment system comprises a pre-alignment module, a transmission module and an offset detection module; the offset detection module is used for detecting the offset of the mask plate after the mask plate is flattened by the pre-alignment module; the pre-alignment module is used for adjusting the position of the mask plate according to the rotation offset so as to compensate the rotation offset; the transmission module is also used for adjusting the position of the mask plate according to the distance offset so as to compensate the distance offset. According to the technical scheme of the invention, the offset detection module detects the offset of the mask after the mask is flattened, so that the influence of the mask wrinkles and other conditions on the detection of the offset of the mask can be avoided, and the accuracy of the detection of the offset of the mask is ensured. The mask plate pre-alignment system can not only realize the compensation of the rotary offset, but also realize the compensation of the distance offset in the set direction, thereby improving the pre-alignment precision of the mask plate.

Description

Mask plate pre-alignment system and method and screen-stretching equipment
Technical Field
The embodiment of the invention relates to the technical field of semiconductor process equipment, in particular to a mask plate pre-alignment system and method and a screen device.
Background
One important system in a semiconductor processing tool is a reticle pre-alignment system.
In the mask plate pre-alignment system, a transmission mechanical handle conveys a metal film to a clamping jaw joint position of a net stretching device, and the clamping jaw conveys the metal film to a workpiece table. Before the clamping jaw carries the metal film, the metal film needs to be compensated by the pre-alignment device, and the alignment precision of the pre-alignment system can be ensured.
Typically, the reticle is transferred to a stage of a reticle tool after pre-alignment of the reticle by a reticle pre-alignment system. However, most of the existing pre-alignment systems are difficult to ensure the pre-alignment accuracy of the mask, resulting in poor mesh-expanding accuracy.
Disclosure of Invention
The invention provides a mask plate pre-alignment system and method and a net stretching device, which are used for improving the pre-alignment precision of a pre-alignment system and further improving the net stretching precision.
In a first aspect, an embodiment of the present invention provides a reticle pre-alignment system, including: the device comprises a pre-alignment module, a transmission module and an offset detection module; the offset detection module is respectively connected with the pre-alignment module and the transmission module; the transmission module is used for transmitting the mask plate from the prealignment module to the workbench;
the offset detection module is used for detecting the offset of the mask after the mask is flattened by the pre-alignment module, wherein the offset at least comprises the rotation offset of the mask relative to a reference plane and the distance offset in a set direction, and sending the rotation offset to the pre-alignment module and the distance offset to the transmission module;
the pre-alignment module is used for adjusting the position of the mask plate according to the rotation offset so as to compensate the rotation offset;
the transmission module is also used for adjusting the position of the mask plate according to the distance offset so as to compensate the distance offset.
Optionally, the pre-alignment module includes a support plate, a setting surface of the support plate is divided into a central placement area and an edge adsorption area, and the edge adsorption area is at least located on two opposite sides of the central placement area;
the edge adsorption area comprises an adsorption structure, and the adsorption structure is used for adsorbing the mask plate so that the mask plate is flattened on the set surface.
Optionally, the adsorption structure includes an adsorption joint and an adsorption body including a plurality of first adsorption holes, and the adsorption body is disposed on the set surface of the support plate;
the air passage is arranged in the support plate, and the adsorption joint is communicated with the first adsorption hole through the air passage in the support plate.
Optionally, the aperture of the first adsorption hole is 2-20 microns, and the first adsorption hole is uniformly distributed in the edge adsorption area.
Optionally, in the edge adsorption region, the support plate is provided with a plurality of second adsorption holes, the adsorption structure includes second adsorption holes and adsorption joints, and the adsorption joints are communicated with the second adsorption holes;
optionally, the diameter of the second adsorption hole is larger than 15 micrometers;
optionally, the second adsorption holes are uniformly arranged.
Optionally, the pre-alignment module further includes a first control unit and a driving unit, the first control unit is electrically connected to the offset detection module and the driving unit respectively, and the driving unit is connected to the support plate;
the first control unit is used for sending a first control signal to the driving unit according to the rotation offset so that the driving unit drives the supporting plate to rotate to adjust the position of the mask.
Optionally, the transfer module includes a second control unit and a grabbing unit, the second control unit is electrically connected to the offset detection module and the grabbing unit, and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit adjusts the position of the mask plate in a set direction after grabbing the mask plate.
Optionally, the setting direction is a direction perpendicular to a direction in which the pre-alignment module points to the worktable.
In a second aspect, an embodiment of the present invention further provides a reticle pre-alignment method, including:
after the mask is flattened by the pre-alignment module, the offset detection module detects the offset of the mask, wherein the offset at least comprises the rotation offset of the mask relative to a reference plane and the distance offset in the set direction of the reference plane, and sends the rotation offset to the pre-alignment module and the distance offset to the transmission module;
the pre-alignment module adjusts the position of the mask plate according to the rotation offset so as to compensate the rotation offset;
and the transmission module adjusts the position of the mask plate according to the distance offset so as to compensate the distance offset.
Optionally, after the mask is flattened by the pre-alignment module, before the offset detection module detects the offset of the mask, the method further includes:
the transmission module clamps the mask plate and places the mask plate on the set surface of the support plate of the pre-alignment module after tensioning;
the adsorption structure adsorbs the mask plate to flatten the mask plate on the set surface;
the transfer module releases the reticle.
Optionally, before the adjusting, by the transfer module, the position of the reticle according to the distance offset to compensate for the distance offset, the method further includes:
clamping the mask plate by the transmission module;
the adsorption structure stops adsorbing the mask.
Optionally, the pre-alignment module further includes a first control unit and a driving unit; the pre-alignment module adjusts the position of the mask plate according to the rotation offset so as to compensate the rotation offset, and the pre-alignment module comprises:
the first control unit sends a first control signal to the driving unit according to the rotation offset, so that the driving unit drives the supporting plate to rotate to adjust the position of the mask.
Optionally, the transfer module includes a second control unit and a grasping unit; the position of the mask plate is adjusted by the transmission module according to the distance offset so as to compensate the distance offset, and the method comprises the following steps:
and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit can adjust the position of the mask plate in a set direction after grabbing the mask plate.
Optionally, after the position of the reticle is adjusted by the transfer module according to the distance offset to compensate the distance offset, the method further includes:
the transmission module places the mask on the set surface of the support plate, the adsorption structure adsorbs the mask, and the transmission module releases the mask;
the offset detection module detects whether the rotation offset and the distance offset meet set requirements, and when the rotation offset does not meet the set requirements, the offset detection module returns to the execution pre-alignment module to adjust the position of the mask plate according to the rotation offset so as to compensate the rotation offset and perform the subsequent steps; and when the distance offset does not meet the set requirement, returning to the execution of the position of the mask plate adjusted by the transmission module according to the distance offset so as to compensate the distance offset and carry out the subsequent steps.
In a third aspect, an embodiment of the present invention further provides a reticle equipment, including the reticle pre-alignment system provided in the first aspect.
The embodiment of the invention provides a mask plate pre-alignment system, a mask plate pre-alignment method and a mesh opening device, wherein the mask plate pre-alignment system comprises a pre-alignment module, a transmission module and an offset detection module; the offset detection module is used for detecting the offset of the mask after the mask is flattened by the pre-alignment module, wherein the offset at least comprises the rotation offset of the mask relative to a reference plane and the distance offset in a set direction; the pre-alignment module is used for adjusting the position of the mask plate according to the rotation offset so as to compensate the rotation offset; the transmission module is also used for adjusting the position of the mask plate according to the distance offset so as to compensate the distance offset. In this embodiment, the offset detection module detects the offset of the mask after the mask is flattened, so that the influence of the mask wrinkles and other conditions on the offset detection of the mask can be avoided, and the accuracy of the offset detection of the mask is ensured. Moreover, the mask plate pre-alignment system can not only realize the compensation of the rotation offset, but also realize the compensation of the distance offset in the set direction, thereby improving the pre-alignment precision of the mask plate and further improving the mesh-stretching precision.
Drawings
FIG. 1 is a schematic diagram of a reticle pre-alignment system according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a pre-alignment module according to an embodiment of the present invention;
FIG. 3 is a bottom view of FIG. 2;
FIG. 4 is an enlarged view of a portion of FIG. 2;
FIG. 5 is a flow chart of a method for pre-aligning a reticle according to an embodiment of the present invention;
FIG. 6 is a flow chart of another reticle pre-alignment method provided by an embodiment of the invention.
Detailed Description
The embodiment of the invention provides a mask plate pre-alignment system, which can be used for compensating the offset of a mask plate before the mask plate is transmitted to a mesh-stretching device so as to improve the mesh-stretching precision. Correspondingly, the invention also provides a method for pre-aligning the mask plate by adopting the mask plate pre-alignment system. The present invention will be described in further detail with reference to the drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Fig. 1 is a schematic structural diagram of a reticle pre-alignment system according to an embodiment of the present invention, and referring to fig. 1, the reticle pre-alignment system includes: a pre-alignment module 110, a transfer module 120, an offset detection module 130; the offset detection module 130 is connected to the pre-alignment module 110 and the transmission module 120 respectively; the transfer module 120 is used to transfer the reticle 200 from the prealignment module 110 to the stage 140; the offset detection module 130 is used for detecting the offset of the mask plate 200 after the mask plate 200 is flattened by the pre-alignment module 110, wherein the offset at least comprises the rotation offset of the mask plate 200 relative to a reference plane and the distance offset in a set direction, and sending the rotation offset to the pre-alignment module 110 and the distance offset to the transmission module 120; the pre-alignment module 110 is used for adjusting the position of the mask plate according to the rotation offset so as to compensate the rotation offset; the transport module 120 is also configured to adjust the position of the reticle based on the distance offset to compensate for the distance offset.
Referring to fig. 1, optionally, the reticle pre-alignment system further comprises a reticle library 150 and a transfer robot 160. The reticle library 150 may be used to store reticles. The reticle library 150 may include a plurality of reticle placement stations, which may be, for example, pallets, on which reticles may be placed. A transfer robot 160 may be used to remove reticles from the reticle library 150 and transfer them to the pre-alignment module 110. Optionally, a transfer robot 160 is located between the pre-alignment module 110 and the plate library 150.
The position of the mask inevitably deviates during the transmission process. In this embodiment, the mask pre-alignment system further includes an offset detection module 130, a pre-alignment module 110, and a transmission module 120, after the mask is flattened on the surface of the pre-alignment module 110, the offset detection module 130 detects the offset of the mask, where the offset of the mask at least includes a rotation offset and a distance offset in a set direction. In this embodiment, the offset detection module 130 detects the offset of the mask after the mask is flattened, so that the influence of the mask wrinkles and other conditions on the detection of the offset of the mask can be avoided, and the accuracy of the detection of the offset of the mask is ensured. The offset detection module 130 may be an optical detection device, or other devices capable of detecting an offset including at least a rotational offset of the reticle with respect to the reference plane and a distance offset in a set direction.
The offset detection module 130 sends the detected rotation offset to the pre-alignment module 110, and after receiving the rotation offset, the pre-alignment module 110 adjusts the position of the reticle according to the rotation offset, specifically, rotates the reticle in a direction opposite to the rotation offset, for example, the rotation offset is 15 degrees clockwise rotated relative to the reference plane, and when adjusting the position of the reticle according to the rotation offset, the reticle may be adjusted to rotate counterclockwise, for example, may rotate counterclockwise by 15 degrees, so as to compensate the rotation offset. The offset detection module 130 further sends the detected distance offset to the transfer module 120, and after the pre-alignment module 110 compensates the rotation offset, the transfer module 120 adjusts the position of the reticle according to the distance offset in the set direction to compensate the distance offset in the set direction. For example, when the distance offset of the reticle in the set direction is 0.3 mm, the reticle may be adjusted to move 0.3 mm in the direction opposite to the set direction, so as to compensate the distance offset in the set direction. The mask pre-alignment system of the embodiment can realize the compensation of the rotation offset and the distance offset of the mask. After compensating the offset of the mask, the transmission module 120 may transmit the mask to the worktable 140, and the worktable 140 may belong to a mesh-opening device, thereby also being beneficial to improving the mesh-opening precision.
The mask plate prealignment system provided by the embodiment comprises a prealignment module, a transmission module and an offset detection module; the offset detection module is used for detecting the offset of the mask after the mask is flattened by the pre-alignment module, wherein the offset at least comprises the rotation offset of the mask relative to a reference plane and the distance offset in a set direction; the pre-alignment module is used for adjusting the position of the mask plate according to the rotation offset so as to compensate the rotation offset; the transmission module is also used for adjusting the position of the mask plate according to the distance offset so as to compensate the distance offset. In the embodiment, the offset detection module detects the offset of the mask plate after the mask plate is flattened, so that the influence of the mask plate on the offset detection due to the condition of wrinkle and the like of the mask plate can be avoided, and the accuracy of the offset detection of the mask plate is ensured. Moreover, the mask plate pre-alignment system can not only realize the compensation of the rotary offset, but also realize the compensation of the distance offset in the set direction, thereby improving the pre-alignment precision of the mask plate and further improving the mesh tensioning precision.
With reference to fig. 1, based on the above technical solution, optionally, the direction x is set to be a direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140.
Wherein the stage 140 is located on a side of the pre-alignment module 110 remote from the plate magazine. Specifically, in the conventional pre-alignment system, the transfer module 120 only moves in the direction in which the pre-alignment module 110 points to the worktable 140 or the direction y in which the worktable 140 points to the pre-alignment module 110, so as to realize the transfer of the reticle between the pre-alignment module 110 and the worktable 140, and accordingly, when the reticle is deviated in the direction in which the pre-alignment module 110 points to the worktable 140 or the direction in which the worktable 140 points to the pre-alignment module 110, the reticle can be compensated by the transfer module 120; but neglects the offset in the direction perpendicular to the direction in which the pre-alignment module 110 points to the stage 140. In this embodiment, the setting direction x is set to be a direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140, and the transmission module 120 can move in the direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140, so that when the mask is offset from the direction perpendicular to the direction in which the pre-alignment module 110 points to the worktable 140, the mask can be adjusted in time by the transmission module 120, thereby improving the precision of pre-alignment.
Fig. 2 is a schematic structural diagram of a pre-alignment module according to an embodiment of the present invention, referring to fig. 2, optionally, the pre-alignment module 110 includes a support plate 111, a setting surface of the support plate 111 is divided into a center-placement region 1111 and edge-suction regions 1112, and the edge-suction regions 1112 are at least located at two opposite sides of the center-placement region 1111;
the edge suction region 1112 includes a suction structure for sucking the reticle to flatten the reticle on a set surface.
Referring to fig. 2, fig. 2 exemplarily shows a case where the edge suction regions 1112 are located at opposite sides of the center placement region 1111. Specifically, the set surface of the support plate 111 is a surface of the support plate 111 on which the reticle is placed. The edge adsorption area 1112 is disposed in the adsorption structure, which may be used for adsorbing the mask, optionally, before the offset detection module 130 detects the offset (including the rotational offset Rz and the distance offset) of the mask, the mask is adsorbed by the adsorption structure, so that after the mask is placed on the set surface of the support plate 111, the edge of the mask is adsorbed by the adsorption structure of the edge adsorption area 1112, and then the edge of the mask is stressed and flattened, thereby preventing the mask from being wrinkled, and further ensuring the accuracy of the offset detection module 130 detecting the offset of the mask.
It should be noted that in alternative embodiments of the present invention, the edge suction region 1112 may also surround the central placement region 1111, so that after the reticle is placed on the set surface of the support plate 111, each edge of the reticle may be more flattened by the suction force of the suction structure.
Fig. 3 is a bottom view of fig. 2, referring to fig. 2 and 3, alternatively, the adsorption structure includes an adsorption joint 114 and an adsorption body 113 including a plurality of first adsorption holes, the adsorption body 113 being disposed on the setting surface of the support plate 111;
the supporting plate 111 includes therein an air passage, and the adsorption joint 114 communicates with the first adsorption hole through the air passage in the supporting plate 111.
Alternatively, the adsorption body 113 may be a ceramic sheet, and the ceramic sheet may be adhered to the set surface of the support plate 111. An air passage is arranged in the supporting plate 111, the adsorption joint 114 is communicated with a first adsorption hole of the adsorption body 113 through the air passage, and then the adsorption joint 114 is used for extracting air to realize the adsorption of the adsorption structure on the mask.
On the basis of the above technical solution, optionally, the aperture of the first adsorption holes is 2 to 20 micrometers, and the first adsorption holes are uniformly distributed in the edge adsorption region 1112.
Specifically, the first adsorption holes have small apertures and are dense step by step, and the thickness of the support plate 111 is thick, so that the process of directly forming the first adsorption holes on the support plate 111 is not easy to implement. In this embodiment, the adsorption body 113 including the plurality of first adsorption holes is a structure externally added to the support plate 111, and the holes are directly formed on the support plate 111, which is relatively easier to implement in terms of process. Moreover, the first adsorption holes are uniformly distributed in the edge adsorption area 1112, so that the edge of the mask plate is uniformly stressed, and the mask plate can be stretched to be more flat under the adsorption of the adsorption structure. Alternatively, the suction fitting 114 is provided on the surface opposite to the setting surface.
In other optional embodiments of the present invention, in the edge adsorption region, the support plate is provided with a plurality of second adsorption holes, the adsorption structure includes second adsorption holes and adsorption joints, and the adsorption joints are communicated with the second adsorption holes; optionally, the diameter of the second adsorption hole is larger than 15 microns.
Specifically, can directly set up the via hole in the backup pad and adsorb the hole as the second, compare in plus with the adsorption body of backup pad, when directly setting up the second in the backup pad and adsorbing the hole, the diameter in second adsorption hole need be greater than the diameter in the first adsorption hole in above-mentioned embodiment, and then makes comparatively easy realization in the technology. The pre-alignment module structure of the embodiment does not need an adsorption body externally connected with an adsorption structure, and is favorable for saving cost.
Optionally, the second adsorption holes are uniformly distributed, so that the edge of the mask plate is uniformly stressed, and the mask plate can be stretched to be smoother under the adsorption of the adsorption structure. Optionally, the edge adsorption region includes at least one row of second adsorption holes, where the row direction of the second adsorption holes may be parallel to the extension direction of the long side in the rectangle formed by the edge adsorption region.
On the basis of the foregoing embodiments, optionally, the pre-alignment module further includes a first control unit and a driving unit, the first control unit is electrically connected to the offset detection module and the driving unit, respectively, and the driving unit is connected to the support plate;
the first control unit is used for sending a first control signal to the driving unit according to the rotation offset so that the driving unit drives the supporting plate to rotate to adjust the position of the mask.
Specifically, the driving unit can be used for driving the supporting plate to rotate, and the mask is placed on the supporting plate, so that the mask can be driven to rotate through the rotation of the supporting plate, and the compensation of the rotation offset of the mask is further realized. The first control unit can generate a first control signal corresponding to the compensation amount of the rotation offset after receiving the rotation offset detected by the offset detection module, and the driving unit drives the supporting plate to rotate according to the first control signal to drive the mask to rotate so as to compensate the rotation offset of the mask. Optionally, the first control unit may include a single chip microcomputer.
On the basis of the foregoing embodiments, optionally, the transfer module includes a second control unit and a grabbing unit, the second control unit is electrically connected to the offset detection module and the grabbing unit, respectively, and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit adjusts the position of the mask in the set direction after grabbing the mask.
Optionally, the gripping unit is a gripping jaw. Specifically, the grabbing unit can be used for clamping the mask and adjusting the position of the mask in the set direction. The second control unit can generate a second control signal corresponding to the compensation amount of the distance offset after receiving the distance offset detected by the offset detection module, and the driving unit clamps the mask plate to move in the set direction according to the second control signal so as to compensate the rotation offset of the mask plate. Optionally, the second control unit may include a single chip microcomputer.
Fig. 4 is a partially enlarged view of fig. 2. Referring to fig. 2 to 4, optionally, the pre-alignment module further includes a support frame 115, a first partition board 04, a second partition board 05, a motor mover 06, a mover mounting frame 07, a motor stator 08, a stator mounting frame 09, a sensor support 10, a limit sensor 11, a sensor baffle 12, a first mounting plate 13, a universal ball 14, a friction plate 15, a second mounting plate 16, a rotary bearing 17, an oil filling nozzle 18, a grating ruler mounting plate 19, a mechanical limit mounting plate 20, a mechanical limit buffer 21, a mechanical limit baffle 22, a reading head mounting frame 23, a reading head 24, a grating ruler 25, and a balance weight 26.
Specifically, the support frame 115 serves as a main body support of the pre-alignment module, the slew bearing 17 is mounted on the support frame 115, an outer ring of the slew bearing 17 is fixed to the support frame 115, and an inner ring of the slew bearing 17 can rotate around a rotation center. The second mounting plate 16 is connected with the inner ring of the rotary bearing 17, the support plate 111 is connected with the second mounting plate 16, the support plate 111 is used for bearing the mask, the edge adsorption area 1112 plays a role in fixing the position of the mask, and the mask rotates along with the support plate 111. The stator mounting frame 09 is installed on the supporting frame 115, the motor stator 08 and the sensor support 10 are installed on the stator mounting frame 09, the second partition plate 05 is installed on the motor stator 08, the limit sensors 11 are installed on the sensor support 10, the motor stator 08 is fixed relative to the supporting frame 115 and provides thrust for the motor rotor 06, the two limit sensors 11 realize electric limit switches of positive and negative positions of linear motion of the motor rotor, and the second partition plate 05 plays a magnetic isolation role in the motor stator 08. The first partition board 04 and the rotor mounting frame 07 are fixed on the supporting plate 111, the motor rotor 06 and the sensor separation blade 12 are fixed on the rotor mounting frame 07, and the first partition board 04, the motor rotor 06, the rotor mounting frame 07 and the sensor separation blade 12 rotate together with the supporting plate 111; the motor rotor 06 is driven to move by the magnetic field force of the motor stator 08, the motor rotor 06 and the motor stator 08 are not in contact with each other, the two can move in the direction X, Y arbitrarily, and finally the motor rotor 06 drives the support plate 111 to rotate around the center of the rotary bearing 17.
The grating scale 25 is adhered to the grating scale mounting plate 19, and the grating scale mounting plate 19 is fixed on the support plate 111 and rotates together with the support plate 111; the reading head 24 is mounted on a reading head mounting bracket 23, the reading head mounting bracket 23 is fixed on the first mounting plate 13, the first mounting plate 13 is fixed on the support frame 115, so that the reading head 24 is fixed; when the 19-grating ruler moves relative to the reading head 24, the reading head 24 can measure the movement displacement of the 19-grating ruler and feed back the movement displacement to a first control unit (not shown in the figure), and the first control unit calculates the rotation displacement of the support plate 111 with the mask plate.
The mechanical limit buffer 21 is mounted on the mechanical mounting plate 20, the mechanical mounting plate 20 is fixed on the supporting frame 115, the mechanical limit baffle 22 is fixed on the supporting plate 111 and rotates with the supporting plate 111, and the rotation of the supporting plate 111 is limited within a certain range by the mechanical limit buffer 21 and the mechanical limit baffle 22.
The universal ball 14 is arranged on the first mounting plate 13, the friction plate 15 is fixed on the support plate 111, and the universal ball 14 plays a role in assisting in supporting the support plate 111; the weight 26 is mounted on the support plate 111 such that the center of mass on the support plate 111 is balanced to the center of rotation; the oil nipple 18 is mounted on the support frame 115 and can be used to grease the slew bearing 17.
The suction connector 114 is connected to the air path of the edge suction area 1112 to provide vacuum suction to the edge suction area 1112, so that the edge suction area 1112 can fix the reticle on the support plate 111.
Wherein, the driving unit in the above embodiment may include a motor mover 06 and a motor stator 08.
The embodiment of the invention also provides a mesh-opening device which comprises the mask plate pre-alignment system provided by any embodiment of the invention.
The embodiment of the invention also provides a mask plate pre-alignment method, which can be applied to the mask plate pre-alignment system in any embodiment. Fig. 5 is a flowchart of a reticle pre-alignment method according to an embodiment of the present invention, and referring to fig. 5, the reticle pre-alignment method includes:
step 210, after the mask is flattened by the pre-alignment module, detecting the offset of the mask by an offset detection module, wherein the offset at least comprises the rotation offset of the mask relative to a reference plane and the distance offset in the set direction of the reference plane, and sending the rotation offset to the pre-alignment module and the distance offset to a transmission module;
step 220, the pre-alignment module adjusts the position of the mask plate according to the rotation offset so as to compensate the rotation offset;
and 230, adjusting the position of the mask plate by the transmission module according to the distance offset so as to compensate the distance offset.
In the mask pre-alignment method provided by the embodiment, after the mask is flattened in the pre-alignment module, the offset detection module detects the offset of the mask, and sends the rotation offset to the pre-alignment module and the distance offset to the transmission module; the pre-alignment module adjusts the position of the mask plate according to the rotation offset so as to compensate the rotation offset; and the transmission module adjusts the position of the mask plate according to the distance offset so as to compensate the distance offset. In the embodiment, the detection module detects the offset of the mask after the mask is flattened, so that the influence of the mask wrinkles and other conditions on the detection of the offset of the mask can be avoided, and the accuracy of the detection of the offset of the mask is ensured. Moreover, the mask plate pre-alignment system can not only realize the compensation of the rotary offset, but also realize the compensation of the distance offset in the set direction, thereby improving the pre-alignment precision of the mask plate and further improving the mesh tensioning precision.
Fig. 6 is a flowchart of another reticle pre-alignment method provided in an embodiment of the present invention, and referring to fig. 6, optionally, the reticle pre-alignment method includes:
and step 310, the transmission manipulator places the mask plate on the set surface of the supporting plate.
Specifically, the transmission manipulator is used for taking away the mask plate from the mask library and placing the mask plate on the supporting plate. The transmission manipulator is used for transmitting the mask plate between the mask plate library and the pre-alignment module.
And 320, placing the transmission module clamp mask on a set surface of a support plate of the pre-alignment module after tensioning.
The transfer module is used for transferring the reticle between the prealignment module and the stage. Because of the transmission manipulator places mask plate in the backup pad after, the fold may appear in the mask plate, places again in the mask plate after the transmission module presss from both sides the mask plate tensioning, and the fold condition alleviates or disappears when guaranteeing to place again.
And 330, adsorbing the mask plate by using an adsorption structure so that the mask plate is flattened on the set surface.
The adsorption structure vacuum adsorbs the mask plate, so that the mask plate can be flattened.
Step 340, the transfer module releases the reticle.
After the mask is flattened, the transmission module releases the mask, and the mask can be kept in a flattened state due to the adsorption effect of the adsorption structure, so that the detection accuracy can be improved when the offset detection module detects the offset of the mask in the subsequent step.
And 350, after the mask is flattened in the pre-alignment module, detecting the offset of the mask by an offset detection module, wherein the offset at least comprises the rotation offset of the mask relative to the reference plane and the distance offset in the set direction of the reference plane, and sending the rotation offset to the pre-alignment module and the distance offset to a transmission module.
And 360, adjusting the position of the mask plate by the pre-alignment module according to the rotation offset so as to compensate the rotation offset.
Optionally, the pre-alignment module further includes a first control unit and a driving unit; this step 360 includes:
the first control unit sends a first control signal to the driving unit according to the rotation offset, so that the driving unit drives the supporting plate to rotate to adjust the position of the mask.
And step 370, clamping the mask plate by the transmission module.
And 380, stopping the adsorption of the adsorption structure on the mask.
390, the transmission module adjusts the position of the mask plate according to the distance offset to compensate the distance offset.
Optionally, the transfer module includes a second control unit and a grasping unit; this step 390 includes:
and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit can adjust the position of the mask plate in a set direction after grabbing the mask plate.
Optionally, after the step 390, the method further includes:
step 410, placing the mask on a set surface of a support plate by a transmission module, adsorbing the mask by an adsorption structure, and releasing the mask by the transmission module;
step 420, detecting whether the rotation offset and the distance offset meet set requirements by an offset detection module;
when the rotation offset does not meet the set requirement, returning to execute the step 360 and the subsequent steps; and when the distance offset does not meet the set requirement, returning to execute the step 390 and the subsequent steps.
When the rotation offset and the distance offset meet the set requirement, the mask plates can be clamped by the conveying module, the adsorption structures release the mask plates, and the conveying module can convey the pre-aligned mask plates to the workbench, so that the net tensioning precision is improved.
According to the mask pre-alignment method, the adsorption structure is arranged to adsorb the mask, so that the mask can be flattened on the set surface of the supporting plate, and the detection accuracy of the offset detection module on the offset is further ensured. Meanwhile, the transmission module can compensate the distance offset in the set direction of the mask, so that the pre-alignment precision is improved, and the improvement of the net tensioning precision is facilitated.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. Those skilled in the art will appreciate that the present invention is not limited to the particular embodiments described herein, and that various obvious changes, rearrangements and substitutions will now be apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims (15)

1.一种掩模版预对准系统，其特征在于，包括：预对准模块、传送模块、偏移量检测模块；所述偏移量检测模块分别与所述预对准模块和所述传送模块连接；所述传送模块用于将所述掩模版从所述预对准模块传输至工作台；1. A reticle pre-alignment system, comprising: a pre-alignment module, a transmission module, and an offset detection module; the offset detection module is respectively associated with the pre-alignment module and the transmission a module connection; the transfer module is used to transfer the reticle from the pre-alignment module to the stage; 所述偏移量检测模块用于所述掩模版在所述预对准模块展平后，检测所述掩模版的偏移量，所述偏移量至少包括所述掩模版相对于参考平面的旋转偏移量和在设定方向上的距离偏移量，并将所述旋转偏移量发送至所述预对准模块以及将所述距离偏移量发送至所述传送模块；The offset detection module is used to detect the offset of the reticle after the reticle is flattened by the pre-alignment module, and the offset at least includes the offset of the reticle relative to the reference plane. a rotation offset and a distance offset in a set direction, and sending the rotation offset to the pre-alignment module and the distance offset to the transfer module; 所述预对准模块用于根据所述旋转偏移量调整所述掩模版的位置，以对所述旋转偏移量进行补偿；The pre-alignment module is configured to adjust the position of the reticle according to the rotation offset to compensate for the rotation offset; 所述传送模块还用于根据所述距离偏移量调整所述掩模版的位置，以对所述距离偏移量进行补偿。The transmission module is further configured to adjust the position of the reticle according to the distance offset to compensate for the distance offset. 2.根据权利要求1所述的掩模版预对准系统，其特征在于，2. The reticle pre-alignment system according to claim 1, wherein 所述预对准模块包括支撑板，所述支撑板的设定表面划分为中心放置区和边缘吸附区，所述边缘吸附区至少位于所述中心放置区的相对两侧；The pre-alignment module includes a support plate, and the set surface of the support plate is divided into a center placement area and an edge adsorption area, and the edge adsorption areas are located at least on opposite sides of the center placement area; 所述边缘吸附区包括吸附结构，所述吸附结构用于对所述掩模版进行吸附以使所述掩模版在所述设定表面展平。The edge suction area includes a suction structure for suctioning the reticle to flatten the reticle on the set surface. 3.根据权利要求2所述的掩模版预对准系统，其特征在于，所述吸附结构包括吸附接头以及包括多个第一吸附孔的吸附本体，所述吸附本体设置于所述支撑板的设定表面；3 . The reticle pre-alignment system according to claim 2 , wherein the adsorption structure comprises an adsorption joint and an adsorption body including a plurality of first adsorption holes, and the adsorption body is disposed on the side of the support plate. 4 . set surface; 所述支撑板中包括气道，所述吸附接头通过所述支撑板中的气道与所述第一吸附孔连通。The support plate includes an air channel, and the adsorption joint communicates with the first adsorption hole through the air channel in the support plate. 4.根据权利要求3所述的掩模版预对准系统，其特征在于，所述第一吸附孔的孔径为2-20微米，所述第一吸附孔在所述边缘吸附区均匀分布。4 . The reticle pre-alignment system according to claim 3 , wherein the diameter of the first adsorption holes is 2-20 μm, and the first adsorption holes are uniformly distributed in the edge adsorption area. 5 . 5.根据权利要求2所述的掩模版预对准系统，其特征在于，在所述边缘吸附区，所述支撑板的开设有多个第二吸附孔，所述吸附结构包括所述第二吸附孔和吸附接头，所述吸附接头与所述第二吸附孔连通；5 . The reticle pre-alignment system according to claim 2 , wherein, in the edge adsorption area, a plurality of second adsorption holes are opened in the support plate, and the adsorption structure comprises the second adsorption holes. 6 . an adsorption hole and an adsorption joint, the adsorption joint communicates with the second adsorption hole; 优选的，所述第二吸附孔的直径大于15微米；Preferably, the diameter of the second adsorption hole is greater than 15 microns; 优选的，所述第二吸附孔均匀排布。Preferably, the second adsorption holes are evenly arranged. 6.根据权利要求2所述的掩模版预对准系统，其特征在于，所述预对准模块还包括第一控制单元和驱动单元，所述第一控制单元分别与所述偏移量检测模块和所述驱动单元电连接，所述驱动单元与所述支撑板连接；6 . The reticle pre-alignment system according to claim 2 , wherein the pre-alignment module further comprises a first control unit and a driving unit, and the first control unit is respectively connected with the offset detection. 7 . The module is electrically connected to the drive unit, and the drive unit is connected to the support plate; 所述第一控制单元用于根据所述旋转偏移量向所述驱动单元发送第一控制信号，以使所述驱动单元驱动所述支撑板转动以调整所述掩模版的位置。The first control unit is configured to send a first control signal to the drive unit according to the rotation offset, so that the drive unit drives the support plate to rotate to adjust the position of the reticle. 7.根据权利要求1所述的掩模版预对准系统，其特征在于，所述传送模块包括第二控制单元和抓取单元，所述第二控制单元分别与所述偏移量检测模块和所述抓取单元电连接，所述第二控制单元根据所述距离偏移量向所述抓取单元发送第二控制信号，以使所述抓取单元在抓取所述掩模版后在所述设定方向上调整所述掩模版的位置。7 . The reticle pre-alignment system according to claim 1 , wherein the conveying module comprises a second control unit and a grasping unit, the second control unit is respectively connected with the offset detection module and the retrieving unit. 8 . The grabbing unit is electrically connected, and the second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit is in the place after grabbing the reticle. Adjust the position of the reticle in the set direction. 8.根据权利要求1所述的掩模版预对准系统，其特征在于，所述设定方向为与所述预对准模块指向所述工作台的方向垂直的方向。8 . The reticle pre-alignment system according to claim 1 , wherein the setting direction is a direction perpendicular to the direction in which the pre-alignment module points to the stage. 9 . 9.一种掩模版预对准方法，其特征在于，包括：9. A reticle pre-alignment method, characterized in that, comprising: 在所述掩模版在预对准模块展平后，偏移量检测模块检测所述掩模版的偏移量，所述偏移量至少包括所述掩模版相对于参考平面的旋转偏移量和在所述参考平面的设定方向上的距离偏移量，并将所述旋转偏移量发送至所述预对准模块以及将所述距离偏移量发送至传送模块；After the reticle is flattened by the pre-alignment module, the offset detection module detects the offset of the reticle, and the offset includes at least the rotational offset of the reticle relative to the reference plane and a distance offset in the set direction of the reference plane, and sending the rotation offset to the pre-alignment module and the distance offset to a transfer module; 预对准模块根据所述旋转偏移量调整所述掩模版的位置，以对所述旋转偏移量进行补偿；The pre-alignment module adjusts the position of the reticle according to the rotation offset to compensate for the rotation offset; 传送模块根据所述距离偏移量调整所述掩模版的位置，以对所述距离偏移量进行补偿。The transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset. 10.根据权利要求9所述的掩模版预对准方法，其特征在于，在所述掩模版在预对准模块展平后，偏移量检测模块检测所述掩模版的偏移量之前，还包括：10. The reticle pre-alignment method according to claim 9, wherein, after the reticle is flattened by the pre-alignment module, and before the offset detection module detects the offset of the reticle, Also includes: 所述传送模块夹取所述掩模版张紧后放置于所述预对准模块的支撑板的设定表面；The transfer module clamps the reticle and places it on the set surface of the support plate of the pre-alignment module; 吸附结构对所述掩模版进行吸附以使所述掩模版在所述设定表面展平；The adsorption structure adsorbs the reticle to flatten the reticle on the set surface; 所述传送模块释放所述掩模版。The transfer module releases the reticle. 11.根据权利要求9所述的掩模版预对准方法，其特征在于，在所述传送模块根据所述距离偏移量调整所述掩模版的位置，以对所述距离偏移量进行补偿之前，还包括：11 . The reticle pre-alignment method according to claim 9 , wherein the transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset. 12 . Before, also included: 所述传送模块夹取所述掩模版；the transfer module grips the reticle; 吸附结构停止对所述掩模版的吸附。The adsorption structure stops the adsorption of the reticle. 12.根据权利要求10所述的掩模版预对准方法，其特征在于，所述预对准模块还包括第一控制单元和驱动单元；所述预对准模块根据所述旋转偏移量调整所述掩模版的位置，以对所述旋转偏移量进行补偿，包括：12. The reticle pre-alignment method according to claim 10, wherein the pre-alignment module further comprises a first control unit and a driving unit; the pre-alignment module is adjusted according to the rotational offset the position of the reticle to compensate for the rotational offset, including: 所述第一控制单元根据所述旋转偏移量向所述驱动单元发送第一控制信号，以使所述驱动单元驱动所述支撑板转动以调整所述掩模版的位置。The first control unit sends a first control signal to the drive unit according to the rotation offset, so that the drive unit drives the support plate to rotate to adjust the position of the reticle. 13.根据权利要求9-11任一项所述的掩模版预对准方法，其特征在于，所述传送模块包括第二控制单元和抓取单元；所述传送模块根据所述距离偏移量调整所述掩模版的位置，以对所述距离偏移量进行补偿，包括：13. The reticle pre-alignment method according to any one of claims 9-11, wherein the transfer module comprises a second control unit and a grasping unit; the transfer module is offset according to the distance Adjusting the position of the reticle to compensate for the distance offset includes: 所述第二控制单元根据所述距离偏移量向所述抓取单元发送第二控制信号，以使所述抓取单元在抓取所述掩模版后在所述设定方向上调整所述掩模版的位置。The second control unit sends a second control signal to the grabbing unit according to the distance offset, so that the grabbing unit adjusts the set direction in the set direction after grabbing the reticle. The position of the reticle. 14.根据权利要求10所述的掩模版预对准方法，其特征在于，在所述传送模块根据所述距离偏移量调整所述掩模版的位置，以对所述距离偏移量进行补偿之后，还包括：14. The reticle pre-alignment method according to claim 10, wherein the transfer module adjusts the position of the reticle according to the distance offset to compensate for the distance offset After that, also include: 所述传送模块将所述掩模版放置于所述支撑板的设定表面，所述吸附结构对所述掩模版进行吸附，所述传送模块释放所述掩模版；The transfer module places the reticle on the set surface of the support plate, the adsorption structure adsorbs the reticle, and the transfer module releases the reticle; 所述偏移量检测模块检测所述旋转偏移量和所述距离偏移量是否满足设定要求，在所述旋转偏移量不满足设定要求时，返回执行所述预对准模块根据所述旋转偏移量调整所述掩模版的位置，以对所述旋转偏移量进行补偿及其后续步骤；在所述距离偏移量不满足设定要求时，返回执行传送模块根据所述距离偏移量调整所述掩模版的位置，以对所述距离偏移量进行补偿及其后续步骤。The offset detection module detects whether the rotation offset and the distance offset meet the set requirements, and when the rotation offset does not meet the set requirements, returns to execute the pre-alignment module according to the The rotation offset adjusts the position of the reticle to compensate for the rotation offset and its subsequent steps; when the distance offset does not meet the set requirements, return to the execution transfer module according to the A distance offset adjusts the position of the reticle to compensate for the distance offset and its subsequent steps. 15.一种张网设备，其特征在于，包括权利要求1-8任一项所述的掩模版预对准系统。15. A net stretching device, characterized in that it comprises the reticle pre-alignment system according to any one of claims 1-8.
CN202110181904.9A 2021-02-09 2021-02-09 Mask plate pre-alignment system and method and screen-stretching equipment Pending CN114911136A (en)

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CN111383979A (en) * 2018-12-27 2020-07-07 上海微电子装备（集团）股份有限公司 Pre-alignment device and method for warped sheet

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