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CN1038036A - 用余辉等离子体清洗表面的方法 - Google Patents

用余辉等离子体清洗表面的方法 Download PDF

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Publication number
CN1038036A
CN1038036A CN89103142A CN89103142A CN1038036A CN 1038036 A CN1038036 A CN 1038036A CN 89103142 A CN89103142 A CN 89103142A CN 89103142 A CN89103142 A CN 89103142A CN 1038036 A CN1038036 A CN 1038036A
Authority
CN
China
Prior art keywords
article
plasma
gas
nitrogen
mixture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN89103142A
Other languages
English (en)
Chinese (zh)
Inventor
地萨斯·欧得莱
穆泰尔·伯革特
苏瑞明斯基·丹尼尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Prestations De Services Sps Ste
Original Assignee
Prestations De Services Sps Ste
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Prestations De Services Sps Ste filed Critical Prestations De Services Sps Ste
Publication of CN1038036A publication Critical patent/CN1038036A/zh
Granted legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Detergent Compositions (AREA)
CN89103142A 1988-05-10 1989-05-10 用余辉等离子体清洗表面的方法 Granted CN1038036A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8806607A FR2631258B1 (fr) 1988-05-10 1988-05-10 Procede de nettoyage en surface par plasma differe
FR8806607 1988-05-10

Publications (1)

Publication Number Publication Date
CN1038036A true CN1038036A (zh) 1989-12-20

Family

ID=9366376

Family Applications (1)

Application Number Title Priority Date Filing Date
CN89103142A Granted CN1038036A (zh) 1988-05-10 1989-05-10 用余辉等离子体清洗表面的方法

Country Status (7)

Country Link
EP (1) EP0343038A1 (no)
JP (1) JPH0252084A (no)
CN (1) CN1038036A (no)
DK (1) DK226989A (no)
FR (1) FR2631258B1 (no)
NO (1) NO173921C (no)
ZA (1) ZA893473B (no)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100378245C (zh) * 2003-07-16 2008-04-02 松下电器产业株式会社 溅射成膜装置
CN101837357A (zh) * 2010-05-04 2010-09-22 宁波大学 一种等离子体清洗装置
CN102612731A (zh) * 2009-11-11 2012-07-25 艾克塞利斯科技公司 用于从离子源部件清除残余物的方法和设备
CN104353643A (zh) * 2014-12-02 2015-02-18 上海华虹宏力半导体制造有限公司 一种减小超声波清洗器的维护系统及维护方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06285868A (ja) * 1993-03-30 1994-10-11 Bridgestone Corp 加硫金型の清浄方法
US5938854A (en) * 1993-05-28 1999-08-17 The University Of Tennessee Research Corporation Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
FR2733437B1 (fr) * 1995-04-27 1997-09-12 Aubert Bruno Procede de separation d'elements chimiques par formation de composes volatils avec un gaz excite dans un plasma froid et dispositif de mise en oeuvre
FR2750348B1 (fr) * 1996-06-28 1998-08-21 Conte Procede pour augmenter l'anti-mouillabilite d'un corps, corps ainsi traite et ses applications
US6125859A (en) * 1997-03-05 2000-10-03 Applied Materials, Inc. Method for improved cleaning of substrate processing systems
US6274058B1 (en) 1997-07-11 2001-08-14 Applied Materials, Inc. Remote plasma cleaning method for processing chambers
SG72905A1 (en) 1997-12-18 2000-05-23 Central Glass Co Ltd Gas for removing deposit and removal method using same
WO2000078123A1 (en) * 1999-06-24 2000-12-28 Wisconsin Alumni Research Foundation Cold-plasma treatment of seeds to remove surface materials
JP2012152855A (ja) * 2011-01-26 2012-08-16 Osg Corp ダイヤモンド被膜または硬質炭素被膜の脱膜方法
CN104148334A (zh) * 2014-07-02 2014-11-19 太仓华德石太工业设备有限公司 一种针对工业局部清洁的碳氢化合物/等离子体的清洁方法
DE102020131832A1 (de) 2020-12-01 2022-06-02 Universität Kassel, Körperschaft des öffentlichen Rechts Verfahren zur Herstellung von Gussformen oder Gusskernen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2647088B2 (de) * 1976-10-19 1979-04-05 Kernforschungsanlage Juelich Gmbh, 5170 Juelich Verfahren und Vorrichtung zum Reinigen von Oberflächen
US4555303A (en) * 1984-10-02 1985-11-26 Motorola, Inc. Oxidation of material in high pressure oxygen plasma
DE3682063D1 (de) * 1985-10-29 1991-11-21 Hughes Aircraft Co Verfahren und vorrichtung fuer bestrahlung mit atomischem strahl.

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100378245C (zh) * 2003-07-16 2008-04-02 松下电器产业株式会社 溅射成膜装置
CN102612731A (zh) * 2009-11-11 2012-07-25 艾克塞利斯科技公司 用于从离子源部件清除残余物的方法和设备
CN102612731B (zh) * 2009-11-11 2016-03-16 艾克塞利斯科技公司 用于从离子源部件清除残余物的方法和设备
CN101837357A (zh) * 2010-05-04 2010-09-22 宁波大学 一种等离子体清洗装置
CN101837357B (zh) * 2010-05-04 2011-10-05 宁波大学 一种等离子体清洗装置
CN104353643A (zh) * 2014-12-02 2015-02-18 上海华虹宏力半导体制造有限公司 一种减小超声波清洗器的维护系统及维护方法
CN104353643B (zh) * 2014-12-02 2017-07-25 上海华虹宏力半导体制造有限公司 一种减小超声波清洗器的维护系统及维护方法

Also Published As

Publication number Publication date
DK226989A (da) 1989-11-11
FR2631258B1 (fr) 1991-04-05
FR2631258A1 (fr) 1989-11-17
NO891827D0 (no) 1989-05-03
NO891827L (no) 1989-11-13
JPH0252084A (ja) 1990-02-21
EP0343038A1 (fr) 1989-11-23
NO173921B (no) 1993-11-15
NO173921C (no) 1994-02-23
ZA893473B (en) 1990-01-31
DK226989D0 (da) 1989-05-09

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