CN103409808B - 多晶硅片制绒添加剂及其使用方法 - Google Patents
多晶硅片制绒添加剂及其使用方法 Download PDFInfo
- Publication number
- CN103409808B CN103409808B CN201310394703.2A CN201310394703A CN103409808B CN 103409808 B CN103409808 B CN 103409808B CN 201310394703 A CN201310394703 A CN 201310394703A CN 103409808 B CN103409808 B CN 103409808B
- Authority
- CN
- China
- Prior art keywords
- texturing
- polycrystalline silicon
- additive
- texture
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
- H10F71/1221—The active layers comprising only Group IV materials comprising polycrystalline silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
-
- H10P50/00—
-
- H10P50/642—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Silicon Compounds (AREA)
- Weting (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
Abstract
Description
Claims (6)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310394703.2A CN103409808B (zh) | 2013-09-04 | 2013-09-04 | 多晶硅片制绒添加剂及其使用方法 |
| JP2016539393A JP2016531835A (ja) | 2013-09-04 | 2013-12-17 | 多結晶シリコンウェハのテクスチャリング添加剤及びその使用方法 |
| SG11201405972TA SG11201405972TA (en) | 2013-09-04 | 2013-12-17 | Additive for preparing suede on polycrystalline silicon chip and use method thereof |
| PCT/CN2013/089693 WO2015032154A1 (zh) | 2013-09-04 | 2013-12-17 | 多晶硅片制绒添加剂及其使用方法 |
| KR1020147030500A KR101687767B1 (ko) | 2013-09-04 | 2013-12-17 | 폴리 실리콘 웨이퍼 텍스처링 첨가제 및 그 사용 방법 |
| EP13893094.6A EP2891733B1 (en) | 2013-09-04 | 2013-12-17 | Polycrystalline silicon wafer texturizing additive and use thereof |
| US14/376,502 US9935233B2 (en) | 2013-09-04 | 2013-12-17 | Additive for preparing suede on polycrystalline silicon chip and use method thereof |
| LTEP13893094.6T LT2891733T (lt) | 2013-09-04 | 2013-12-17 | Polikristalinio silikono vaflinės tekstūros suteikimo priedai ir jų panaudojimas |
| ES13893094.6T ES2591133T3 (es) | 2013-09-04 | 2013-12-17 | Aditivo para preparar gamuza en chip de silicio policristalino y método de uso del mismo |
| MYPI2014702516A MY170621A (en) | 2013-09-04 | 2013-12-17 | Additive for preparing suede on polycrystalline silicon chip and use method thereof |
| TW102148008A TWI526522B (zh) | 2013-09-04 | 2013-12-24 | Polycrystalline silicon wafer velvet additive, velveteen and its velvet method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310394703.2A CN103409808B (zh) | 2013-09-04 | 2013-09-04 | 多晶硅片制绒添加剂及其使用方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103409808A CN103409808A (zh) | 2013-11-27 |
| CN103409808B true CN103409808B (zh) | 2015-10-21 |
Family
ID=49602845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310394703.2A Active CN103409808B (zh) | 2013-09-04 | 2013-09-04 | 多晶硅片制绒添加剂及其使用方法 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US9935233B2 (zh) |
| EP (1) | EP2891733B1 (zh) |
| JP (1) | JP2016531835A (zh) |
| KR (1) | KR101687767B1 (zh) |
| CN (1) | CN103409808B (zh) |
| ES (1) | ES2591133T3 (zh) |
| LT (1) | LT2891733T (zh) |
| MY (1) | MY170621A (zh) |
| SG (1) | SG11201405972TA (zh) |
| TW (1) | TWI526522B (zh) |
| WO (1) | WO2015032154A1 (zh) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103409808B (zh) * | 2013-09-04 | 2015-10-21 | 常州时创能源科技有限公司 | 多晶硅片制绒添加剂及其使用方法 |
| CN103668467B (zh) * | 2013-12-20 | 2016-08-31 | 常州时创能源科技有限公司 | 一种多晶硅片制绒添加剂及其应用 |
| CN103696021A (zh) * | 2013-12-23 | 2014-04-02 | 泰通(泰州)工业有限公司 | 一种和多晶制绒添加剂匹配的制绒后表面处理工艺 |
| CN104241449A (zh) * | 2014-09-18 | 2014-12-24 | 百力达太阳能股份有限公司 | 一种多晶硅太阳能电池制造工艺 |
| CN104294369A (zh) * | 2014-11-13 | 2015-01-21 | 苏州润阳光伏科技有限公司 | 一种用于多晶硅片酸制绒的添加剂及使用方法 |
| CN104328504A (zh) * | 2014-11-13 | 2015-02-04 | 苏州润阳光伏科技有限公司 | 一种多晶制绒辅助剂及应用方法 |
| CN104651949B (zh) * | 2015-02-11 | 2017-09-29 | 常州君合科技股份有限公司 | 一种多晶硅片制绒添加剂 |
| CN105040108B (zh) * | 2015-08-21 | 2017-11-17 | 浙江启鑫新能源科技股份有限公司 | 多晶硅太阳能电池的制绒方法 |
| CN105304734A (zh) * | 2015-11-03 | 2016-02-03 | 苏州旭环光伏科技有限公司 | 一种多晶硅片制绒辅助剂及其应用方法 |
| CN108630786A (zh) * | 2016-06-27 | 2018-10-09 | 苏州阿特斯阳光电力科技有限公司 | 一种晶体硅太阳能电池绒面结构的制备方法 |
| CN106119976B (zh) * | 2016-08-19 | 2018-08-14 | 常州时创能源科技有限公司 | 多晶黑硅制绒用扩孔酸液的添加剂及其应用 |
| CN107177890A (zh) * | 2017-06-12 | 2017-09-19 | 通威太阳能(合肥)有限公司 | 一种金刚线切割多晶硅片的制绒方法以及电池片制备工艺 |
| CN107245761B (zh) * | 2017-08-10 | 2020-01-14 | 常州时创能源科技有限公司 | 金刚线多晶硅片制绒辅助剂及其应用 |
| CN109427930B (zh) * | 2017-09-04 | 2022-02-25 | 苏州易益新能源科技有限公司 | 一种在晶体硅片表面选择性制备绒面的方法 |
| TWI636156B (zh) * | 2017-09-08 | 2018-09-21 | 常州時創能源科技有限公司 | 金剛線多晶矽片制絨輔助劑、制絨液及制絨方法 |
| CN108004597A (zh) * | 2017-11-09 | 2018-05-08 | 润峰电力有限公司 | 一种多晶硅制绒添加剂及其制绒方法 |
| CN108250363B (zh) * | 2018-01-19 | 2020-04-10 | 温岭汉德高分子科技有限公司 | 一种单晶硅制绒添加剂 |
| JP6584571B1 (ja) * | 2018-04-06 | 2019-10-02 | 常州時創能源科技有限公司Changzhou Shichuang Energy Technology Limited Corporation | 多結晶ブラックシリコンのテクスチャリングプロセス |
| CN109537058B (zh) * | 2018-09-30 | 2021-01-05 | 江苏顺风新能源科技有限公司 | 湿法黑硅制备工艺 |
| CN109680337A (zh) * | 2018-12-25 | 2019-04-26 | 浙江晶科能源有限公司 | 一种金刚线切割多晶硅的制绒方法 |
| CN110137079B (zh) * | 2019-05-22 | 2021-08-13 | 苏州晶瑞化学股份有限公司 | 金刚线切割多晶硅片制绒调控剂及含该调控剂的制绒剂 |
| CN113540268A (zh) * | 2021-08-17 | 2021-10-22 | 通威太阳能(金堂)有限公司 | 一种太阳电池、绒面结构及其制备方法 |
| CN113817472B (zh) * | 2021-11-23 | 2022-02-11 | 绍兴拓邦电子科技有限公司 | 一种太阳能电池硅片的制绒工艺 |
| CN114420774A (zh) * | 2021-11-29 | 2022-04-29 | 江苏科来材料科技有限公司 | 一种晶硅电池的制绒工艺 |
| CN115627540B (zh) * | 2022-10-31 | 2025-08-22 | 晋能光伏技术有限责任公司 | 单晶perc电池的制绒液及其制绒方法 |
| CN116004233A (zh) * | 2022-12-12 | 2023-04-25 | 嘉兴市小辰光伏科技有限公司 | 一种提升硅片绒面均整度的刻蚀添加剂及使用方法 |
| CN116240022A (zh) * | 2022-12-13 | 2023-06-09 | 嘉兴市小辰光伏科技有限公司 | 一种改善单晶硅topcon电池硅片花篮印的碱抛添加剂及其应用方法 |
| CN116253524B (zh) * | 2023-01-17 | 2025-08-29 | 常州时创能源股份有限公司 | 一种光伏玻璃刻蚀用添加剂及其应用 |
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| CN102330154A (zh) * | 2011-07-27 | 2012-01-25 | 常州时创能源科技有限公司 | 一种用于多晶硅片制绒的酸性制绒液及其使用方法 |
| CN102330091A (zh) * | 2011-07-27 | 2012-01-25 | 常州时创能源科技有限公司 | 一种多晶硅片酸性制绒液的添加剂及使用方法 |
| CN102516878A (zh) * | 2011-12-12 | 2012-06-27 | 上海新安纳电子科技有限公司 | 一种改善相变材料抛光后表面质量的抛光液 |
| CN102586888A (zh) * | 2012-03-15 | 2012-07-18 | 苏州先拓光伏科技有限公司 | 一种无醇单晶硅制绒添加剂 |
| CN103132079A (zh) * | 2013-02-07 | 2013-06-05 | 睿纳能源科技(上海)有限公司 | 一种用于金刚线切割多晶硅片酸制绒的添加剂及使用方法 |
| CN103151423A (zh) * | 2013-02-28 | 2013-06-12 | 常州捷佳创精密机械有限公司 | 一种多晶硅片制绒清洗工艺方法 |
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| JPS51123739A (en) * | 1975-04-22 | 1976-10-28 | Mitsubishi Electric Corp | Silicon etching process |
| US4171242A (en) * | 1976-12-17 | 1979-10-16 | International Business Machines Corporation | Neutral pH silicon etchant for etching silicon in the presence of phosphosilicate glass |
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| JP4159334B2 (ja) * | 2002-09-30 | 2008-10-01 | 新日本製鐵株式会社 | チタンおよびチタン合金建材用の変色除去洗浄剤、および変色除去洗浄方法 |
| JP2006130905A (ja) * | 2004-10-08 | 2006-05-25 | Fuji Photo Film Co Ltd | 平版印刷方法 |
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| CN103205815A (zh) * | 2013-05-03 | 2013-07-17 | 上海交通大学 | 太阳能单晶硅片制绒液及其应用方法 |
| CN103258918A (zh) * | 2013-05-31 | 2013-08-21 | 英利集团有限公司 | 硅片的制绒方法、太阳能电池片及其制作方法 |
| CN103409808B (zh) * | 2013-09-04 | 2015-10-21 | 常州时创能源科技有限公司 | 多晶硅片制绒添加剂及其使用方法 |
-
2013
- 2013-09-04 CN CN201310394703.2A patent/CN103409808B/zh active Active
- 2013-12-17 LT LTEP13893094.6T patent/LT2891733T/lt unknown
- 2013-12-17 ES ES13893094.6T patent/ES2591133T3/es active Active
- 2013-12-17 KR KR1020147030500A patent/KR101687767B1/ko not_active Expired - Fee Related
- 2013-12-17 JP JP2016539393A patent/JP2016531835A/ja active Pending
- 2013-12-17 US US14/376,502 patent/US9935233B2/en not_active Expired - Fee Related
- 2013-12-17 MY MYPI2014702516A patent/MY170621A/en unknown
- 2013-12-17 EP EP13893094.6A patent/EP2891733B1/en not_active Not-in-force
- 2013-12-17 WO PCT/CN2013/089693 patent/WO2015032154A1/zh not_active Ceased
- 2013-12-17 SG SG11201405972TA patent/SG11201405972TA/en unknown
- 2013-12-24 TW TW102148008A patent/TWI526522B/zh not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102330154A (zh) * | 2011-07-27 | 2012-01-25 | 常州时创能源科技有限公司 | 一种用于多晶硅片制绒的酸性制绒液及其使用方法 |
| CN102330091A (zh) * | 2011-07-27 | 2012-01-25 | 常州时创能源科技有限公司 | 一种多晶硅片酸性制绒液的添加剂及使用方法 |
| CN102516878A (zh) * | 2011-12-12 | 2012-06-27 | 上海新安纳电子科技有限公司 | 一种改善相变材料抛光后表面质量的抛光液 |
| CN102586888A (zh) * | 2012-03-15 | 2012-07-18 | 苏州先拓光伏科技有限公司 | 一种无醇单晶硅制绒添加剂 |
| CN103132079A (zh) * | 2013-02-07 | 2013-06-05 | 睿纳能源科技(上海)有限公司 | 一种用于金刚线切割多晶硅片酸制绒的添加剂及使用方法 |
| CN103151423A (zh) * | 2013-02-28 | 2013-06-12 | 常州捷佳创精密机械有限公司 | 一种多晶硅片制绒清洗工艺方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| LT2891733T (lt) | 2016-10-10 |
| MY170621A (en) | 2019-08-21 |
| ES2591133T3 (es) | 2016-11-25 |
| JP2016531835A (ja) | 2016-10-13 |
| US20160247957A1 (en) | 2016-08-25 |
| WO2015032154A1 (zh) | 2015-03-12 |
| TW201416418A (zh) | 2014-05-01 |
| CN103409808A (zh) | 2013-11-27 |
| EP2891733B1 (en) | 2016-07-13 |
| SG11201405972TA (en) | 2015-04-29 |
| EP2891733A1 (en) | 2015-07-08 |
| KR101687767B1 (ko) | 2016-12-19 |
| KR20150039128A (ko) | 2015-04-09 |
| US9935233B2 (en) | 2018-04-03 |
| EP2891733A4 (en) | 2015-09-09 |
| TWI526522B (zh) | 2016-03-21 |
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