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CN103165810A - Carbon-coated V-VI compound semiconductor nanosheet and preparation method thereof - Google Patents

Carbon-coated V-VI compound semiconductor nanosheet and preparation method thereof Download PDF

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CN103165810A
CN103165810A CN2013100949708A CN201310094970A CN103165810A CN 103165810 A CN103165810 A CN 103165810A CN 2013100949708 A CN2013100949708 A CN 2013100949708A CN 201310094970 A CN201310094970 A CN 201310094970A CN 103165810 A CN103165810 A CN 103165810A
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周楠
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Northeast Agricultural University
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Abstract

The invention discloses a carbon-coated class V-VI compound semiconductor nano sheet and a preparation method thereof, and relates to a topological insulator and a thermoelectric material and a preparation method thereof. The method solves the problems that the conventional preparation method for the class V-VI compound topological insulator is complex and cannot be used for preparing bulk materials, the surface of the topological insulator is instable, unsymmetrical and high in roughness and the electric conductivity and the Seebeck coefficient of the topological insulator serving as the thermoelectric material cannot be simultaneously improved. The carbon-coated class V-VI compound semiconductor nano sheet consists of a nano sheet matrix and a carbon layer coated on the surface of the nano sheet matrix. The amorphous carbon-coated class V-VI compound semiconductor nano sheet is prepared through a one-step hydrothermal method; and a grapheme-coated class V-VI compound semiconductor nano sheet is prepared through a two-step hydrothermal method. The surface of the prepared nano sheet is stable, symmetrical and low in roughness, and the electric conductivity and the Seebeck coefficient of the nano sheet can be simultaneously improved. The invention is applied in the field of preparation of topological insulators and thermoelectric materials.

Description

碳包覆Ⅴ-Ⅵ族化合物半导体纳米片及其制备方法Carbon-coated V-VI compound semiconductor nanosheet and preparation method thereof

技术领域 technical field

本发明涉及拓扑绝缘体和热电材料及其制备方法。  The invention relates to a topological insulator, a thermoelectric material and a preparation method thereof. the

背景技术 Background technique

拓扑绝缘体是一种具有特殊量子特性的新型材料。其特殊的二维结构及强自旋轨道耦合效应,使其具有非凡的电子结构。其体相电子结构是有能隙的绝缘体,而其表面则是无能隙的金属态。即打破通常意义上“金属”和“绝缘体”的概念,它内部绝缘,界面却具有自旋相关的金属性导电通道。这意味着拓扑绝缘体可以将自旋方向不同的电子分开,从而形成自旋流。很早人们就已发现电子具有电荷和自旋两种运动,但在传统电路或半导体电子器件中,自旋向上的电子和自旋向下的电子向同一方向运动,以至于自旋流被抵消,仅仅电荷流(即电流)存在。这导致近百年来电子器件的应用,仅仅利用了电子的电荷,而它的自旋一直被忽略。而在拓扑绝缘体的表面,由于自旋轨道耦合作用,电子运动的规律性,就如同高速公路上运动的汽车一样,正向与反向行驶的汽车分别走不同的道路,互不干扰。处于这样有序运动状态的电子不会相互碰撞,因此能耗很低。  Topological insulators are a new class of materials with special quantum properties. Its special two-dimensional structure and strong spin-orbit coupling effect make it have an extraordinary electronic structure. Its bulk electronic structure is an insulator with an energy gap, while its surface is a metallic state without an energy gap. That is to break the concept of "metal" and "insulator" in the usual sense. It is internally insulated, but the interface has a spin-related metallic conductive channel. This means that topological insulators can separate electrons with different spin orientations, creating spin currents. It has long been discovered that electrons have both charge and spin motions, but in traditional circuits or semiconductor electronic devices, spin-up electrons and spin-down electrons move in the same direction, so that the spin current is canceled , only the charge flow (i.e. current) exists. This has led to the application of electronic devices for nearly a hundred years, only using the charge of the electron, while its spin has been ignored. On the surface of topological insulators, due to the effect of spin-orbit coupling, the regularity of electron motion is just like that of a car moving on a highway. Cars traveling forward and reverse travel on different roads without interfering with each other. Electrons in such an orderly motion state will not collide with each other, so the energy consumption is very low. the

随着微电子技术的迅猛发展,半导体芯片的集成度愈来愈高。这产生两方面的负面效应。一方面是芯片的功耗及其相关的散热问题;另一方面是由于器件尺度减小而带来的量子效应问题。由于改变电子自旋状态所消耗的能量远低于改变电荷状态所消耗的能量,如果我们利用半导体中载流子的自旋自由度来实现已有的半导体器件的功能的话,功耗的问题将迎刃而解。由于拓扑绝缘体所具有的这些表面磁性的电控制特性,让人们对制造未来新型的计算机芯片等元器件充满了期待,并希望由此能引发未来电子技术的新一轮革命。  With the rapid development of microelectronics technology, the integration of semiconductor chips is getting higher and higher. This has two negative effects. On the one hand, it is the power consumption of the chip and its related heat dissipation; on the other hand, it is the quantum effect caused by the reduction of the device scale. Because the energy consumed to change the electron spin state is much lower than the energy consumed to change the charge state, if we use the spin degree of freedom of the carrier in the semiconductor to realize the function of the existing semiconductor device, the problem of power consumption will be reduced. Easy to solve. Due to the electrical control properties of these surface magnetisms possessed by topological insulators, people are full of expectations for the manufacture of new types of computer chips and other components in the future, and hope that this will trigger a new round of revolution in future electronic technology. the

此外,拓扑绝缘体的表面态有着与众不同的特点,它完全是由材料的体电子态的拓扑结构所决定,是由对称性所决定的,与表面的具体结构无关。因此他的存在非常稳定,基本不受到杂质与无序的影响。由于非阿贝尔粒子的拓扑性质受对称性保护,不会由于微小扰动而使量子态退相干,从而导致计算错误,这使得拓扑绝缘体可以用于量子计算。  In addition, the surface states of topological insulators have distinctive characteristics, which are completely determined by the topology of the bulk electronic state of the material, determined by symmetry, and have nothing to do with the specific structure of the surface. Therefore, his existence is very stable, basically unaffected by impurities and disorder. Since the topological properties of non-Abelian particles are protected by symmetry from the decoherence of quantum states due to small perturbations, resulting in calculation errors, this makes topological insulators useful in quantum computing. the

拓扑绝缘体对研究凝聚态物质基本物理有着重要意义,例如在一个超导体附近的拓扑绝缘体可以产生满足非阿贝尔(非对易)统计的激子——马拉约那费米子。  Topological insulators are of great significance to the study of the fundamental physics of condensed matter. For example, topological insulators near a superconductor can produce excitons that satisfy non-Abelian (non-commutative) statistics—Malayona fermions. the

2009年,有科学家通过理论计算预言了V-VI族化合物半导体功能材料(Bi2Te3、Sb2Te3、Bi2Se3等)为一类新的强拓扑绝缘体材料系统。这类拓扑绝缘体材料有着独特的优点:首先,这类材料是纯的化学,非常稳定且容易合成;第二,这类材料表面态中只有一个狄拉 克点存在,是最简单的强拓扑绝缘体,这种简单性为理论模型的研究提供了很好的平台;第三,也是非常吸引人的一点,该材料的体能隙是非常大的,特别是Bi2Se3,大约是0.13eV,远远超出室温能量尺度,这也意味着有可能实现室温低能耗的自旋电子器件。与此同时相关的实验工作也取得重要进展,证实了理论预言的正确性。  In 2009, some scientists predicted through theoretical calculations that V-VI compound semiconductor functional materials (Bi 2 Te 3 , Sb 2 Te 3 , Bi 2 Se 3 , etc.) are a new type of strong topological insulator material system. This type of topological insulator material has unique advantages: first, this type of material is pure chemical, very stable and easy to synthesize; second, there is only one Dirac point in the surface state of this type of material, which is the simplest strong topological insulator, This simplicity provides a good platform for the study of theoretical models; thirdly, it is also very attractive that the bulk energy gap of this material is very large, especially for Bi 2 Se 3 , which is about 0.13eV, far from Beyond the room temperature energy scale, this also means that it is possible to realize spintronic devices with low energy consumption at room temperature. At the same time, relevant experimental work has also made important progress, confirming the correctness of the theoretical prediction.

虽然理论上关于拓扑绝缘体有种种令人激动的预言,但当前实验上仍有两个非常基础的问题迫切需要解决:首先是制备出高质量的拓扑绝缘体材料,特别是可实际应用的材料,其次是在输运实验中确认拓扑绝缘体表面态的本征性质。而材料的制备将成为一切性能与应用研究的基础。从2009年开始,针对拓扑绝缘体研究的需求,人们从单晶体材料和薄膜两方面着手进行材料制备的研究。存在以下主要问题:1、由于拓扑绝缘体产生效应的为材料的表面,因而现有的研究以制备单晶体材料和薄膜为主,制造工艺复杂,成本高,并且只能研究单晶或薄膜的某一个表面,因而无法制备块体材料,限制了材料的器件应用;2、表面不稳定:所制备的材料表面暴露在大气中会出现退化现象,虽说理论上拓扑绝缘体的表面态是强健的,只要有表面它就存在,但暴露大气却可能带来表面氧化、吸附水等而导致表面化学势的变化,从而引起表面掺杂效应而引入载流子,以及表面电子迁移率的降低,可造成的散射使得表面态的电子迁移率小于体电子;3、表面对称性问题:在使用拓扑绝缘体薄膜时由于衬底的影响造成偏心,改变结构的对称性会在薄膜垂直方向上诱导出一个不对称的能带弯曲,造成上、下表面费米能级在能带中的位置不同。4、表面粗糙度:表面的粗糙化也会造成表面态在空间中的弥散,以及表面电子迁移率的降低。这就要求薄膜表面必须是原子级别光滑,造成了对制备技术的高要求。  Although there are exciting predictions about topological insulators in theory, there are still two very basic problems that need to be solved urgently in current experiments: firstly, to prepare high-quality topological insulator materials, especially materials that can be used in practice; secondly, is an intrinsic property of the surface states of topological insulators confirmed in transport experiments. The preparation of materials will become the basis of all performance and application research. Since 2009, in response to the demand for research on topological insulators, people have started research on material preparation from both single crystal materials and thin films. There are the following main problems: 1. Since the topological insulator produces the effect on the surface of the material, the existing research is mainly on the preparation of single crystal materials and thin films, the manufacturing process is complicated, the cost is high, and only one single crystal or thin film can be studied. surface, so it is impossible to prepare bulk materials, which limits the device application of materials; 2. The surface is unstable: the surface of the prepared material will degrade when exposed to the atmosphere. Although the surface state of the topological insulator is theoretically robust, as long as there is It exists on the surface, but exposure to the atmosphere may cause surface oxidation, adsorption of water, etc., resulting in changes in the surface chemical potential, resulting in surface doping effects and the introduction of carriers, as well as the reduction of surface electron mobility, which can cause scattering The electron mobility of the surface state is smaller than that of the bulk electron; 3. Surface symmetry problem: when using a topological insulator thin film, due to the influence of the substrate, changing the symmetry of the structure will induce an asymmetric energy in the vertical direction of the thin film. The band is bent, resulting in different positions of the upper and lower surface Fermi levels in the energy band. 4. Surface roughness: The roughness of the surface will also cause the dispersion of surface states in space and the reduction of surface electron mobility. This requires that the surface of the film must be atomically smooth, resulting in high requirements for the preparation technology. the

温差热效应发电作为一种新型节能环保技术,是利用热电材料将温差资源直接转化成电能的一种能量转化方法。与目前使用的传统方式相比,它不需要工作介质,直接、静态的运行。因此,其设备无活动部件,保证了其具有环保无噪音和高度的可靠性。因此,许多低温和高温下工作的设备(如锅炉、汽车发动机、液化天然气储运罐)都可以成为其温差的提供者。提高热电转换装置效率的关键在于制备高性能的热电材料。热电理论的研究表明,热电材料的品质因子与电导率和Seebeck系数成正比,与热导率成反比。但是这三个物理量具有内在的关联性,不能通过单独改变其中的一项来提高材料的转换效率,这是限制热电材料应用的主要瓶颈。因而目前研究中,提高材料热电性能的主要手段是降低材料的热导率。但这种方式几乎已经达到了可能的极限。要想使热电材料达到实际应用的标准必须寻找一种同时提高电导率和Seebeck系数的途径。  As a new energy-saving and environmental protection technology, thermoelectric effect power generation is an energy conversion method that uses thermoelectric materials to directly convert temperature difference resources into electrical energy. Compared with the traditional method currently used, it does not need a working medium and operates directly and statically. Therefore, its equipment has no moving parts, which ensures that it is environmentally friendly, noiseless and highly reliable. Therefore, many equipment working at low and high temperatures (such as boilers, automobile engines, and liquefied natural gas storage and transportation tanks) can become their temperature difference providers. The key to improving the efficiency of thermoelectric conversion devices lies in the preparation of high-performance thermoelectric materials. The study of thermoelectric theory shows that the quality factor of thermoelectric materials is directly proportional to electrical conductivity and Seebeck coefficient, and inversely proportional to thermal conductivity. However, these three physical quantities are inherently related, and the conversion efficiency of the material cannot be improved by changing one of them alone, which is the main bottleneck restricting the application of thermoelectric materials. Therefore, in the current research, the main means to improve the thermoelectric performance of materials is to reduce the thermal conductivity of materials. But this approach has almost reached the limit of what is possible. In order to make thermoelectric materials reach the standard of practical application, we must find a way to improve the electrical conductivity and Seebeck coefficient at the same time. the

发明内容 Contents of the invention

本发明是要解决现有Ⅴ-Ⅵ族化合物拓扑绝缘体的制备方法复杂,无法制备块体材料,表面不稳定,表面不对称性,表面粗糙度高,以及作为热电材料电导率和Seebeck系数不能同时提高的问题,从而提供了碳包覆Ⅴ-Ⅵ族化合物半导体纳米片及其制备方法。  The present invention is to solve the complex preparation method of the existing V-VI compound topological insulator, the inability to prepare bulk materials, the surface instability, surface asymmetry, high surface roughness, and the inability to simultaneously conduct conductivity and Seebeck coefficient as thermoelectric materials. To improve the problem, a carbon-coated V-VI compound semiconductor nanosheet and a preparation method thereof are provided. the

本发明的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片由纳米片状基体和包覆在其表面的碳层组成;其中,所述的纳米片状基体的材料为Bi2Te3、Sb2Te3、Bi2Se3、Sb2Se3,包括掺杂Fe、Cr、Co或Ni磁性元素(如,Bi2-xFexTe3),其厚度小于100nm,直径在微米级别;所述的碳层的材料为无定型碳或石墨烯微片,厚度为1~12nm,并可在其外表面负载Ag、Fe、Cr、Co、Ni或Cu纳米粒子。  The carbon-coated V-VI compound semiconductor nanosheet of the present invention is composed of a nanosheet-shaped substrate and a carbon layer coated on its surface; wherein, the materials of the nanosheet-shaped substrate are Bi 2 Te 3 , Sb 2 Te 3. Bi 2 Se 3 , Sb 2 Se 3 , including magnetic elements doped with Fe, Cr, Co or Ni (eg, Bi 2-x Fex Te 3 ), the thickness of which is less than 100nm, and the diameter is at the micron level; the said The carbon layer is made of amorphous carbon or graphene microsheets with a thickness of 1-12nm, and Ag, Fe, Cr, Co, Ni or Cu nanoparticles can be loaded on the outer surface.

本发明的第一种碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的制备方法是按以下步骤进行:  The preparation method of the first carbon-coated V-VI group compound semiconductor nanosheet of the present invention is carried out according to the following steps:

一、称取0.02~0.1g的K(SbO)C4H4O6·0.5H2O,0.02~0.1g的Na2TeO3粉,1~5g的NaOH和3~10g的葡萄糖;  1. Weigh 0.02-0.1g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02-0.1g of Na 2 TeO 3 powder, 1-5g of NaOH and 3-10g of glucose;

二、向步骤一称取的原料中分别加入5~10mL的去离子水,搅拌溶解后混合,并加去离子水稀释至20~40mL,再加入2~4mL的N2H4·H2O,转移至50mL规格的反应釜中,在180~200℃烘箱中反应5~8h,得到混合液;  2. Add 5-10mL of deionized water to the raw materials weighed in step 1, stir to dissolve and mix, add deionized water to dilute to 20-40mL, then add 2-4mL of N 2 H 4 ·H 2 O , transferred to a 50mL reactor, and reacted in an oven at 180-200°C for 5-8 hours to obtain a mixed solution;

三、将反应后的混合液用去离子水洗涤至pH值为7,然后使用无水乙醇洗涤,最后在温度为20~40℃真空烘干,得到无定型碳包覆Ⅴ-Ⅵ族化合物半导体纳米片。  3. Wash the reacted mixed solution with deionized water until the pH value is 7, then wash it with absolute ethanol, and finally dry it in vacuum at a temperature of 20-40°C to obtain an amorphous carbon-coated V-VI compound semiconductor Nanosheets. the

本发明的第二种碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的制备方法是按以下步骤进行:  The preparation method of the second carbon-coated V-VI group compound semiconductor nanosheet of the present invention is carried out according to the following steps:

一、称取0.02~0.05g的K(SbO)C4H4O6·0.5H2O,0.02~0.05g的Na2TeO3粉和0.5~1.0g的NaOH;  1. Weigh 0.02-0.05g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02-0.05g of Na 2 TeO 3 powder and 0.5-1.0g of NaOH;

二、向步骤一称取的原料中加入20~40mL的去离子水,搅拌溶解后加入2~4mL的N2H4·H2O,转移至50mL规格的反应釜中,填充度为60%~80%,在180~200℃烘箱中反应5~8h,得到混合液;  2. Add 20-40mL of deionized water to the raw material weighed in step 1, stir and dissolve, add 2-4mL of N 2 H 4 ·H 2 O, transfer to a 50mL reactor with a filling degree of 60% ~80%, react in an oven at 180~200°C for 5~8 hours to obtain a mixed solution;

三、将反应后的混合液用去离子水洗涤至pH值为7,然后使用无水乙醇洗涤,最后在温度为20~40℃真空烘干,得到Sb2Te3纳米片;  3. Wash the reacted mixed solution with deionized water until the pH value is 7, then wash it with absolute ethanol, and finally dry it in vacuum at a temperature of 20-40° C. to obtain Sb 2 Te 3 nanosheets;

四、称取0.002~0.003g的氧化石墨烯粉,加入无水乙醇超声分散15~30min后,加入0.02~0.05g的步骤一得到的Sb2Te3纳米片,搅拌后加入3~6mL的联胺,90~120℃反应1~3h,得到悬浊液;  4. Weigh 0.002-0.003g of graphene oxide powder, add absolute ethanol and ultrasonically disperse for 15-30min, then add 0.02-0.05g of Sb 2 Te 3 nanosheets obtained in step 1, stir and add 3-6mL of Amine, react at 90-120°C for 1-3 hours to obtain a suspension;

五、将步骤四得到的悬浊液离心分离,在温度为20~40℃真空中烘干,得到石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片。  5. Centrifuge the suspension obtained in step 4, and dry it in a vacuum at a temperature of 20-40° C. to obtain graphene-coated V-VI compound semiconductor nanosheets. the

本发明包括以下有益效果:  The present invention includes the following beneficial effects:

1、本发明使用简单的方法制备了碳包覆Ⅴ-Ⅵ族化合物半导体纳米片,由于有力的保护了界面,从而使制备块体材料变的可能;  1. The present invention uses a simple method to prepare carbon-coated V-VI compound semiconductor nanosheets, which makes it possible to prepare bulk materials due to the powerful protection of the interface;

2、本发明制备的石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片具有良好的稳定性,防止了表面退化现象;  2. The graphene-coated V-VI compound semiconductor nanosheets prepared by the present invention have good stability and prevent surface degradation;

3、本发明制备的石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片解决了材料表面对称性问题,由于纳米片的上下两个表面同时被相同厚度的碳材料包覆,避免了衬底的影响造成的偏心作用的不利影响;  3. The graphene-coated V-VI compound semiconductor nanosheet prepared by the present invention solves the problem of surface symmetry of the material. Since the upper and lower surfaces of the nanosheet are coated with carbon materials of the same thickness at the same time, the influence of the substrate is avoided. adverse effects caused by eccentricity;

4、本发明制备的石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片降低了材料的表面粗糙度,避免其对材料性能的不利影响;  4. The graphene-coated V-VI compound semiconductor nanosheet prepared by the present invention reduces the surface roughness of the material and avoids its adverse effects on the material performance;

5、本发明以复合材料的不同部分分别承担提供电导率和Seebeck系数的任务,从而打破决定材料热电性能的三个物理量之间的内在的关联性,使材料的电导率和Seebeck系数同时提高。  5. The present invention uses different parts of the composite material to undertake the task of providing the electrical conductivity and the Seebeck coefficient, thereby breaking the inherent correlation between the three physical quantities that determine the thermoelectric properties of the material, and simultaneously increasing the electrical conductivity and the Seebeck coefficient of the material. the

附图说明 Description of drawings

图1为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的结构示意图;  Fig. 1 is the structural representation of the carbon-coated V-VI compound semiconductor nanosheet prepared in Experiment 1;

图2为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的FESEM照片;  Fig. 2 is the FESEM photo of the carbon-coated V-VI group compound semiconductor nanosheets prepared in test one;

图3为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的TEM图;  Fig. 3 is the TEM image of the carbon-coated V-VI group compound semiconductor nanosheet prepared in test one;

图4为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的电导率和未包覆Sb2Te3纳米片的电导率随温度变化曲线图;其中,1为Sb2Te3纳米片随温度变化曲线图,2为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的电导率随温度变化曲线图;  Figure 4 is a graph showing the electrical conductivity of carbon-coated V-VI compound semiconductor nanosheets prepared in Experiment 1 and the electrical conductivity of uncoated Sb 2 Te 3 nanosheets as a function of temperature; where 1 is Sb 2 Te 3 nanosheets Variation curve with temperature, 2 is the conductivity curve with temperature variation of the carbon-coated V-VI compound semiconductor nanosheets prepared in Experiment 1;

图5为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的Seebeck系数和未包覆Sb2Te3纳米片的Seebeck系数随温度变化曲线图;其中,1为Sb2Te3纳米片的Seebeck系数随温度变化曲线图,2为试验一制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的Seebeck系数随温度变化曲线图。  Figure 5 is a graph showing the Seebeck coefficient of carbon-coated V-VI compound semiconductor nanosheets prepared in Experiment 1 and the Seebeck coefficient of uncoated Sb 2 Te 3 nanosheets as a function of temperature; where 1 is Sb 2 Te 3 nanosheets 2 is a graph of the Seebeck coefficient varying with temperature, and 2 is a graph of the Seebeck coefficient varying with temperature of the carbon-coated V-VI compound semiconductor nanosheets prepared in Experiment 1.

具体实施方式 Detailed ways

具体实施方式一:本实施方式的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片由纳米片状基体和包覆在其表面的碳层组成;其中,所述的纳米片状基体的材料为Bi2Te3、Sb2Te3、Bi2Se3、Sb2Se3,包括掺杂Fe、Cr、Co或Ni磁性元素,其厚度小于100nm,直径在微米级别;所述的碳层的材料为无定型碳或石墨烯微片,厚度为1~12nm,并可在其外表面负载Ag、Fe、Cr、Co、Ni或Cu纳米粒子。  Specific embodiment 1: The carbon-coated V-VI compound semiconductor nanosheet of this embodiment is composed of a nanosheet-shaped substrate and a carbon layer coated on its surface; wherein, the material of the nanosheet-shaped substrate is Bi2 Te 3 , Sb 2 Te 3 , Bi 2 Se 3 , Sb 2 Se 3 , including magnetic elements doped with Fe, Cr, Co or Ni, the thickness is less than 100nm, and the diameter is at the micron level; the material of the carbon layer is no Shaped carbon or graphene microsheets, with a thickness of 1-12nm, and Ag, Fe, Cr, Co, Ni or Cu nanoparticles can be loaded on the outer surface.

具体实施方式二:本实施方式的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片制备方法是按以下 步骤进行:  Specific implementation mode two: the preparation method of the carbon-coated V-VI group compound semiconductor nanosheet of the present embodiment is carried out according to the following steps:

一、称取0.02~0.1g的K(SbO)C4H4O6·0.5H2O,0.02~0.1g的Na2TeO3粉,1~5g的NaOH和3~10g的葡萄糖;  1. Weigh 0.02-0.1g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02-0.1g of Na 2 TeO 3 powder, 1-5g of NaOH and 3-10g of glucose;

二、向步骤一称取的原料中分别加入5~10mL的去离子水,搅拌溶解后混合,并加去离子水稀释至20~40mL,再加入2~4mL的N2H4·H2O,转移至50mL规格的反应釜中,在180~200℃烘箱中反应5~8h,得到混合液;  2. Add 5-10mL of deionized water to the raw materials weighed in step 1, stir to dissolve and mix, add deionized water to dilute to 20-40mL, then add 2-4mL of N 2 H 4 ·H 2 O , transferred to a 50mL reactor, and reacted in an oven at 180-200°C for 5-8 hours to obtain a mixed solution;

三、将反应后的混合液用去离子水洗涤至pH值为7,然后使用无水乙醇洗涤,最后在温度为20~40℃真空烘干,得到无定型碳包覆Ⅴ-Ⅵ族化合物半导体纳米片。  3. Wash the reacted mixed solution with deionized water until the pH value is 7, then wash it with absolute ethanol, and finally dry it in vacuum at a temperature of 20-40°C to obtain an amorphous carbon-coated V-VI compound semiconductor Nanosheets. the

本实施方式包括以下有益效果:  This embodiment includes the following beneficial effects:

1、本实施方式使用简单的方法制备了碳包覆Ⅴ-Ⅵ族化合物半导体纳米片,由于有力的保护了界面,从而使制备块体材料变的可能;  1. This embodiment uses a simple method to prepare carbon-coated V-VI compound semiconductor nanosheets, which makes it possible to prepare bulk materials due to the strong protection of the interface;

2、本实施方式制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片具有良好的稳定性,防止了表面退化现象;  2. The carbon-coated V-VI compound semiconductor nanosheets prepared in this embodiment have good stability and prevent surface degradation;

3、本实施方式制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片解决了材料表面对称性问题,由于纳米片的上下两个表面同时被相同厚度的碳材料包覆,避免了衬底的影响造成的偏心作用的不利影响;  3. The carbon-coated V-VI compound semiconductor nanosheets prepared in this embodiment solve the problem of material surface symmetry. Since the upper and lower surfaces of the nanosheets are coated with carbon materials of the same thickness at the same time, the influence of the substrate is avoided. adverse effects caused by eccentricity;

4、本实施方式制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片降低了材料的表面粗糙度,避免其对材料性能的不利影响;  4. The carbon-coated V-VI compound semiconductor nanosheets prepared in this embodiment reduce the surface roughness of the material and avoid its adverse effects on the material performance;

5、本发明以复合材料的不同部分分别承担提供电导率和Seebeck系数的任务,从而打破决定材料热电性能的三个物理量之间的内在的关联性,使材料的电导率和Seebeck系数同时提高。  5. The present invention uses different parts of the composite material to undertake the task of providing the electrical conductivity and the Seebeck coefficient, thereby breaking the inherent correlation between the three physical quantities that determine the thermoelectric properties of the material, and simultaneously increasing the electrical conductivity and the Seebeck coefficient of the material. the

具体实施方式三:本实施方式与具体实施方式二不同的是:步骤一中称取0.02g的K(SbO)C4H4O6·0.5H2O,0.02g的Na2TeO3粉,1g的NaOH和3g的葡萄糖。其它与具体实施方式二相同。  Specific embodiment 3: The difference between this embodiment and specific embodiment 2 is that in step 1, 0.02g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O and 0.02g of Na 2 TeO 3 powder are weighed, 1 g of NaOH and 3 g of glucose. Others are the same as in the second embodiment.

具体实施方式四:本实施方式与具体实施方式二或三不同的是:步骤二中加入2mL的N2H4·H2O。其它与具体实施方式二或三相同。  Embodiment 4: The difference between this embodiment and Embodiment 2 or 3 is that 2 mL of N 2 H 4 ·H 2 O is added in Step 2. Others are the same as the second or third specific embodiment.

具体实施方式五:本实施方式与具体实施方式二至四之一不同的是:步骤二中在180℃烘箱中反应5h。其它与具体实施方式二至四之一相同。  Embodiment 5: This embodiment is different from Embodiment 2 to Embodiment 4 in that: in step 2, the reaction is carried out in an oven at 180° C. for 5 hours. Others are the same as one of the second to fourth specific embodiments. the

具体实施方式六:本实施方式的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的制备方法是按以下步骤进行:  Specific embodiment six: The preparation method of the carbon-coated V-VI compound semiconductor nanosheet of this embodiment is carried out in the following steps:

一、称取0.02~0.05g的K(SbO)C4H4O6·0.5H2O,0.02~0.05g的Na2TeO3粉和0.5~1.0g的NaOH;  1. Weigh 0.02-0.05g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02-0.05g of Na 2 TeO 3 powder and 0.5-1.0g of NaOH;

二、向步骤一称取的原料中加入20~40mL的去离子水,搅拌溶解后加入2~4mL的N2H4·H2O,转移至50mL规格的反应釜中,填充度为60%~80%,在180~200℃烘箱中反应5~8h,得到混合液;  2. Add 20-40mL of deionized water to the raw material weighed in step 1, stir and dissolve, add 2-4mL of N 2 H 4 ·H 2 O, transfer to a 50mL reactor with a filling degree of 60% ~80%, react in an oven at 180~200°C for 5~8 hours to obtain a mixed solution;

三、将反应后的混合液用去离子水洗涤至pH值为7,然后使用无水乙醇洗涤,最后在温度为20~40℃真空烘干,得到Sb2Te3纳米片;  3. Wash the reacted mixed solution with deionized water until the pH value is 7, then wash it with absolute ethanol, and finally dry it in vacuum at a temperature of 20-40° C. to obtain Sb 2 Te 3 nanosheets;

四、称取0.002~0.003g的氧化石墨烯粉,加入无水乙醇超声分散15~30min后,加入0.02~0.05g的步骤一得到的Sb2Te3纳米片,搅拌后加入3~6mL的联胺,90~120℃反应1~3h,得到悬浊液;  4. Weigh 0.002-0.003g of graphene oxide powder, add absolute ethanol and ultrasonically disperse for 15-30min, then add 0.02-0.05g of Sb 2 Te 3 nanosheets obtained in step 1, stir and add 3-6mL of Amine, react at 90-120°C for 1-3 hours to obtain a suspension;

五、将步骤四得到的悬浊液离心分离,在温度为20~40℃真空中烘干,得到石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片。  5. Centrifuge the suspension obtained in step 4, and dry it in a vacuum at a temperature of 20-40° C. to obtain graphene-coated V-VI compound semiconductor nanosheets. the

具体实施方式七:本实施方式与具体实施方式六不同的是:步骤一中称取0.02g的K(SbO)C4H4O6·0.5H2O,0.02g的Na2TeO3粉和1.0g的NaOH。其它与具体实施方式六相同。  Embodiment 7: The difference between this embodiment and Embodiment 6 is that in step 1, 0.02g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02g of Na 2 TeO 3 powder and 1.0 g of NaOH. Others are the same as in the sixth embodiment.

具体实施方式八:本实施方式与具体实施方式六或七不同的是:步骤四中称取0.002g的氧化石墨烯粉。其它与具体实施方式六或七相同。  Embodiment 8: This embodiment is different from Embodiment 6 or 7 in that: 0.002g of graphene oxide powder is weighed in Step 4. Others are the same as in Embodiment 6 or 7. the

具体实施方式九:本实施方式与具体实施方式六至八之一不同的是:步骤四中加入无水乙醇超声分散15min。其它与具体实施方式六至八之一相同。  Embodiment 9: This embodiment is different from Embodiment 6 to Embodiment 8 in that: in step 4, absolute ethanol is added for ultrasonic dispersion for 15 minutes. Others are the same as one of the sixth to eighth specific embodiments. the

具体实施方式十:本实施方式与具体实施方式六至九之一不同的是:步骤四中搅拌后加入3mL的联胺,95℃反应2h。其它与具体实施方式六至九之一相同。  Embodiment 10: This embodiment is different from Embodiment 6 to Embodiment 9 in that: in step 4, 3 mL of hydrazine is added after stirring, and reacted at 95° C. for 2 h. Others are the same as one of the sixth to ninth specific embodiments. the

通过以下试验验证本发明的有益效果:  Verify beneficial effect of the present invention by following test:

试验一:本试验的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片制备方法是按以下步骤实现的:  Experiment 1: The preparation method of carbon-coated V-VI compound semiconductor nanosheets in this experiment is realized according to the following steps:

一、称取0.02g的K(SbO)C4H4O6·0.5H2O,0.02g的Na2TeO3粉,1g的NaOH和3g的葡萄糖;  1. Weigh 0.02g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02g of Na 2 TeO 3 powder, 1g of NaOH and 3g of glucose;

二、向步骤一称取的原料中分别加入5mL的去离子水,搅拌溶解后混合,并加去离子水稀释至30mL,再加入2mL的N2H4·H2O,转移至50mL规格的反应釜中,在180℃烘箱中反应5h,得到混合液;  2. Add 5mL of deionized water to the raw materials weighed in step 1, stir to dissolve and mix, add deionized water to dilute to 30mL, then add 2mL of N 2 H 4 ·H 2 O, transfer to 50mL In the reaction kettle, react in an oven at 180°C for 5 hours to obtain a mixed solution;

三、将反应后的混合液用去离子水洗涤至pH值为7,然后使用无水乙醇洗涤,最后在温度为40℃真空烘干,得到无定型碳包覆Ⅴ-Ⅵ族化合物半导体纳米片。  3. Wash the reacted mixed solution with deionized water until the pH value is 7, then wash with absolute ethanol, and finally dry it in vacuum at a temperature of 40°C to obtain amorphous carbon-coated V-VI compound semiconductor nanosheets . the

本试验使用简单的方法制备了碳包覆Ⅴ-Ⅵ族化合物半导体纳米片,由于有力的保护了 界面,从而使制备块体材料变的可能。  In this experiment, a simple method was used to prepare carbon-coated V-VI compound semiconductor nanosheets. Due to the strong protection of the interface, it is possible to prepare bulk materials. the

本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的结构示意图如图1所示,从图1可以看出,碳层将纳米片状机体包覆在内。  The schematic diagram of the structure of the carbon-coated V-VI compound semiconductor nanosheets prepared in this experiment is shown in Figure 1. It can be seen from Figure 1 that the carbon layer wraps the nanosheet-like body inside. the

本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的FESEM照片如图2所示,从图2可以看出,FESEM图中有卷曲的膜状物质;  The FESEM photo of the carbon-coated V-VI compound semiconductor nanosheets prepared in this test is shown in Figure 2. It can be seen from Figure 2 that there is a curly film-like substance in the FESEM image;

本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的TEM图如图3所示,从图3可以看出,振碎了的片边缘支持着膜状物;  The TEM image of the carbon-coated V-VI compound semiconductor nanosheets prepared in this experiment is shown in Figure 3. It can be seen from Figure 3 that the edge of the broken sheet supports the membrane;

由图2和图3可以得出,无定型C薄膜是完全包覆的。  It can be concluded from Figure 2 and Figure 3 that the amorphous C film is completely covered. the

本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的电导率和Sb2Te3纳米片的电导率随温度变化曲线图如图4所示,其中,1为Sb2Te3纳米片随温度变化曲线图,2为本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的电导率随温度变化曲线图,从图4可以看出,本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的相对于Sb2Te3纳米片的电导率有数量级的提高;  The electrical conductivity of the carbon-coated V-VI compound semiconductor nanosheets prepared in this experiment and the electrical conductivity of the Sb 2 Te 3 nanosheets as a function of temperature are shown in Figure 4, where 1 is the Sb 2 Te 3 nanosheets The temperature change curve, 2 is the conductivity curve of the carbon-coated V-VI group compound semiconductor nanosheets prepared in this test as a function of temperature. As can be seen from Figure 4, the carbon-coated V-VI group compound prepared in this test The conductivity of semiconductor nanosheets is orders of magnitude higher than that of Sb 2 Te 3 nanosheets;

本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的Seebeck系数和Sb2Te3纳米片的Seebeck系数随温度变化曲线图如图5所示,其中,1为Sb2Te3纳米片的Seebeck系数随温度变化曲线图,2为本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的Seebeck系数随温度变化曲线图,从图5可以看出,本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片相对于Sb2Te3纳米片的Seebeck系数有明显提高;  The Seebeck coefficient of the carbon-coated V-VI compound semiconductor nanosheets prepared in this experiment and the Seebeck coefficient of the Sb 2 Te 3 nanosheets as a function of temperature are shown in Figure 5, where 1 is the Sb 2 Te 3 nanosheets Seebeck coefficient curves with temperature, 2 is the Seebeck coefficient curves with temperature for the carbon-coated V-VI compound semiconductor nanosheets prepared in this test, as can be seen from Figure 5, the carbon-coated V-VI compound semiconductor nanosheets prepared in this test Compared with Sb 2 Te 3 nanosheets, the Seebeck coefficient of group VI compound semiconductor nanosheets is significantly improved;

由图4和图5可以得出,本试验制备的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片的电导率和Seebeck系数同时提高。  It can be concluded from Figure 4 and Figure 5 that the electrical conductivity and Seebeck coefficient of the carbon-coated V-VI compound semiconductor nanosheets prepared in this experiment increase simultaneously. the

试验二:本试验的碳包覆Ⅴ-Ⅵ族化合物半导体纳米片制备方法是按以下步骤实现的:  Experiment 2: The preparation method of carbon-coated V-VI compound semiconductor nanosheets in this experiment is realized according to the following steps:

一、称取0.02g的K(SbO)C4H4O6·0.5H2O,0.02g的Na2TeO3粉和1.0g的NaOH;  1. Weigh 0.02g of K(SbO)C 4 H 4 O 6 ·0.5H 2 O, 0.02g of Na 2 TeO 3 powder and 1.0g of NaOH;

二、向步骤一称取的原料中加入30mL的去离子水,搅拌溶解后加入2mL的N2H4·H2O,转移至50mL规格的反应釜中,填充度为80%,在180℃烘箱中反应5h,得到混合液;  2. Add 30mL of deionized water to the raw material weighed in step 1, stir and dissolve, add 2mL of N 2 H 4 ·H 2 O, transfer to a 50mL reactor with a filling degree of 80%, and store at 180°C React in oven for 5h to obtain mixed solution;

三、将反应后的混合液用去离子水洗涤至pH值为7,然后使用无水乙醇洗涤,最后在温度为40℃真空烘干,得到Sb2Te3纳米片;  3. Wash the reacted mixed solution with deionized water until the pH value is 7, then wash it with absolute ethanol, and finally dry it in vacuum at a temperature of 40° C. to obtain Sb 2 Te 3 nanosheets;

四、称取0.002g的氧化石墨烯粉,加入无水乙醇超声分散15min后,加入0.02g的步骤一得到的Sb2Te3纳米片,搅拌后加入3mL的联胺,95℃反应2h,得到悬浊液;  4. Weigh 0.002g of graphene oxide powder, add absolute ethanol and ultrasonically disperse for 15min, add 0.02g of Sb 2 Te 3 nanosheets obtained in step 1, add 3mL of hydrazine after stirring, and react at 95°C for 2h to obtain suspension;

五、将步骤四得到的悬浊液离心分离,在温度为40℃真空中烘干,得到石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片。  5. Centrifuge the suspension obtained in step 4, and dry it in a vacuum at a temperature of 40° C. to obtain graphene-coated V-VI compound semiconductor nanosheets. the

本试验制备的石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片具有良好的稳定性,防止了表面退化现象。  The graphene-coated V-VI compound semiconductor nanosheets prepared in this experiment have good stability and prevent surface degradation. the

本试验制备的石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片解决了材料表面对称性问题,由于纳米片的上下两个表面同时被相同厚度的碳材料包覆,避免了衬底的影响造成的偏心作用的不利影响。  The graphene-coated V-VI compound semiconductor nanosheets prepared in this experiment solved the problem of material surface symmetry. Since the upper and lower surfaces of the nanosheets were coated with carbon materials of the same thickness at the same time, the influence of the substrate was avoided. Adverse effects of eccentric action. the

本试验制备的石墨烯包覆Ⅴ-Ⅵ族化合物半导体纳米片降低了材料的表面粗糙度,避免其对材料性能的不利影响。  The graphene-coated V-VI compound semiconductor nanosheets prepared in this experiment can reduce the surface roughness of the material and avoid its adverse effects on the material properties. the

Claims (10)

1. carbon coats the group Ⅴ-Ⅵ compound semiconductor nanometer sheet, it is characterized in that carbon coating group Ⅴ-Ⅵ compound semiconductor nanometer sheet by the nano-sheet matrix and be coated on its surperficial carbon-coating forming; Wherein, the material of described nano-sheet matrix is Bi 2Te 3, Sb 2Te 3, Bi 2Se 3, comprising doped F e, Cr, Co or Ni magnetic element, its thickness is less than 100nm, and diameter is in micron level; The material of described carbon-coating is agraphitic carbon or Graphene microplate, and thickness is 1~12nm, and can be at its outer surface loaded Ag, Fe, Cr, Co, Ni or Cu metal nanoparticle.
2. carbon coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that carbon coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method and carries out according to the following steps:
One, take K (SbO) C of 0.02~0.1g 4H 4O 60.5H 2O, the Na of 0.02~0.1g 2TeO 3Powder, the NaOH of 1~5g and the glucose of 3~10g;
Two, add respectively the deionized water of 5~10mL in the raw material that takes to step 1, mix after stirring and dissolving, and add deionized water and be diluted to 20~40mL, then add the N of 2~4mL 2H 4H 2O is transferred in the reactor of 50mL specification, reacts 5~8h in 180~200 ℃ of baking ovens, obtains mixed liquor;
Three, with reacted mixed liquor with deionized water wash to the pH value be 7, then use absolute ethanol washing, be 20~40 ℃ of vacuum dryings in temperature at last, obtain agraphitic carbon and coat the group Ⅴ-Ⅵ compound semiconductor nanometer sheet.
3. carbon according to claim 2 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that taking in step 1 K (SbO) C of 0.02g 4H 4O 60.5H 2O, the Na of 0.02g 2TeO 3Powder, the NaOH of 1g and the glucose of 3g.
4. carbon according to claim 2 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that adding in step 2 the N of 2mL 2H 4H 2O。
5. carbon according to claim 2 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that reacting 5h in step 2 in 180 ℃ of baking ovens.
6. carbon coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that the preparation method of carbon coating group Ⅴ-Ⅵ compound semiconductor nanometer sheet carries out according to the following steps:
One, take K (SbO) C of 0.02~0.05g 4H 4O 60.5H 2O, the Na of 0.02~0.05g 2TeO 3The NaOH of powder and 0.5~1.0g;
Two, the deionized water that adds 20~40mL in the raw material that takes to step 1 adds the N of 2~4mL after stirring and dissolving 2H 4H 2O is transferred in the reactor of 50mL specification, and compactedness is 60%~80%, reacts 5~8h in 180~200 ℃ of baking ovens, obtains mixed liquor;
Three, with reacted mixed liquor with deionized water wash to the pH value be 7, then use absolute ethanol washing, be 20~40 ℃ of vacuum dryings in temperature at last, obtain Sb 2Te 3Nanometer sheet;
Four, take the graphene oxide powder of 0.002~0.003g, after adding the ultrasonic dispersion 15~30min of absolute ethyl alcohol, the Sb that adds the step 1 of 0.02~0.05g to obtain 2Te 3Nanometer sheet adds the diamine of 3~6mL after stirring, 90~120 ℃ of reaction 1~3h obtain suspension-turbid liquid;
Five, the suspension-turbid liquid centrifugation that step 4 is obtained is to dry in 20~40 ℃ of vacuum in temperature, obtains graphene coated group Ⅴ-Ⅵ compound semiconductor nanometer sheet.
7. carbon according to claim 6 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that taking in step 1 K (SbO) C of 0.02g 4H 4O 60.5H 2O, the Na of 0.02g 2TeO 3The NaOH of powder and 1.0g.
8. carbon according to claim 6 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that taking in step 4 the graphene oxide powder of 0.002g.
9. carbon according to claim 6 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, it is characterized in that adding in step 4 the ultrasonic dispersion of absolute ethyl alcohol 15min.
10. carbon according to claim 6 coats group Ⅴ-Ⅵ compound semiconductor nanometer sheet preparation method, adds the diamine of 3mL after it is characterized in that stirring in step 4,95 ℃ of reaction 2h.
CN2013100949708A 2013-03-22 2013-03-22 Carbon-coated V-VI compound semiconductor nanosheet and preparation method thereof Pending CN103165810A (en)

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CN110459670A (en) * 2019-08-06 2019-11-15 武汉理工大学 Method for in-situ preparation of magnetic nanocomposite thermoelectric materials based on amorphous materials
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