CN102929100B - 一种可对准卷对卷uv成型的装置及方法 - Google Patents
一种可对准卷对卷uv成型的装置及方法 Download PDFInfo
- Publication number
- CN102929100B CN102929100B CN201210476395.3A CN201210476395A CN102929100B CN 102929100 B CN102929100 B CN 102929100B CN 201210476395 A CN201210476395 A CN 201210476395A CN 102929100 B CN102929100 B CN 102929100B
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- China
- Prior art keywords
- flexible substrate
- transparent flexible
- alignment
- mold
- roll
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 20
- 230000007246 mechanism Effects 0.000 claims abstract description 51
- 238000000576 coating method Methods 0.000 claims abstract description 15
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- 239000000523 sample Substances 0.000 claims abstract description 12
- 238000004804 winding Methods 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 34
- 238000004049 embossing Methods 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 16
- 229920005989 resin Polymers 0.000 claims description 16
- 238000003825 pressing Methods 0.000 claims description 12
- 238000007765 extrusion coating Methods 0.000 claims description 4
- 238000005096 rolling process Methods 0.000 claims description 4
- 230000001681 protective effect Effects 0.000 claims description 3
- 238000007776 silk screen coating Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000005516 engineering process Methods 0.000 description 8
- 238000001723 curing Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 239000003292 glue Substances 0.000 description 3
- 238000003475 lamination Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000002164 ion-beam lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000000233 ultraviolet lithography Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C70/00—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts
- B29C70/68—Shaping composites, i.e. plastics material comprising reinforcements, fillers or preformed parts, e.g. inserts by incorporating or moulding on preformed parts, e.g. inserts or layers, e.g. foam blocks
- B29C70/78—Moulding material on one side only of the preformed part
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/04—After-treatment of articles without altering their shape; Apparatus therefor by wave energy or particle radiation, e.g. for curing or vulcanising preformed articles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Toxicology (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (6)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210476395.3A CN102929100B (zh) | 2012-11-22 | 2012-11-22 | 一种可对准卷对卷uv成型的装置及方法 |
| JP2014547702A JP5867764B2 (ja) | 2012-11-22 | 2012-12-20 | Uv形成装置およびロールツーロール位置合わせのための方法 |
| KR1020137029922A KR101577700B1 (ko) | 2012-11-22 | 2012-12-20 | 정렬을 롤투롤하기 위한 uv 성형 장치 및 방법 |
| PCT/CN2012/087081 WO2014079122A1 (zh) | 2012-11-22 | 2012-12-20 | 一种可对准卷对卷uv成型的装置及方法 |
| US14/000,202 US9096024B2 (en) | 2012-11-22 | 2012-12-20 | UV curable resin embossing apparatus and method for roll to roll alignment |
| TW102136664A TWI486296B (zh) | 2012-11-22 | 2013-10-11 | 可對準卷對卷uv成型之裝置及方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210476395.3A CN102929100B (zh) | 2012-11-22 | 2012-11-22 | 一种可对准卷对卷uv成型的装置及方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102929100A CN102929100A (zh) | 2013-02-13 |
| CN102929100B true CN102929100B (zh) | 2014-11-19 |
Family
ID=47643933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210476395.3A Expired - Fee Related CN102929100B (zh) | 2012-11-22 | 2012-11-22 | 一种可对准卷对卷uv成型的装置及方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9096024B2 (zh) |
| JP (1) | JP5867764B2 (zh) |
| KR (1) | KR101577700B1 (zh) |
| CN (1) | CN102929100B (zh) |
| TW (1) | TWI486296B (zh) |
| WO (1) | WO2014079122A1 (zh) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6207997B2 (ja) * | 2013-01-30 | 2017-10-04 | 株式会社Screenホールディングス | パターン形成装置およびパターン形成方法 |
| KR20140109624A (ko) * | 2013-03-06 | 2014-09-16 | 삼성전자주식회사 | 대면적 임프린트 장치 및 방법 |
| CN104070681A (zh) * | 2013-03-26 | 2014-10-01 | 南昌欧菲光科技有限公司 | 连续压印成型方法及连续压印成型装置 |
| CN104070680A (zh) * | 2013-03-26 | 2014-10-01 | 南昌欧菲光科技有限公司 | 压印成型装置及其方法 |
| TW201616553A (zh) * | 2014-07-17 | 2016-05-01 | 綜研化學股份有限公司 | 分步重複式壓印裝置以及方法 |
| TWI636344B (zh) * | 2014-09-04 | 2018-09-21 | 日商尼康股份有限公司 | 處理系統及元件製造方法 |
| US10538017B2 (en) * | 2014-09-22 | 2020-01-21 | Koninklijke Philips N.V. | Transfer method and apparatus and computer program product |
| CN105549340B (zh) * | 2016-02-24 | 2017-10-24 | 上海大学 | 卷对卷柔性衬底光刻方法和装置 |
| CN106328470A (zh) * | 2016-08-31 | 2017-01-11 | 北京埃德万斯离子束技术研究所股份有限公司 | 一种在工件上制造微纳米级防伪图文商标的方法 |
| JP6837352B2 (ja) * | 2017-02-28 | 2021-03-03 | 芝浦機械株式会社 | 転写装置および転写方法 |
| CN110632826B (zh) * | 2019-08-30 | 2021-12-03 | 合肥芯碁微电子装备股份有限公司 | 一种无掩模激光直写光刻设备在生产片对卷时的对准方法 |
| CN110641143B (zh) * | 2019-09-27 | 2021-08-13 | 武汉工程大学 | 一种双面印刷生产线 |
| FI131751B1 (en) * | 2020-10-21 | 2025-11-07 | Teknologian Tutkimuskeskus Vtt Oy | Roll-to-roll imprinting |
| CN119200325B (zh) * | 2024-10-25 | 2025-12-05 | 华中科技大学 | 一种柔性薄膜压印装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080028958A1 (en) * | 2006-08-01 | 2008-02-07 | Samsung Electronics Co., Ltd. | Imprinting apparatus and method for forming residual film on a substrate |
| US20100052216A1 (en) * | 2008-08-29 | 2010-03-04 | Yong Hyup Kim | Nano imprint lithography using an elastic roller |
| CN102193310A (zh) * | 2011-05-17 | 2011-09-21 | 西安交通大学 | 一种机床测量用光栅两步固化辊压印成型方法 |
| CN102700123A (zh) * | 2012-06-21 | 2012-10-03 | 上海交通大学 | 聚合物薄膜类产品微细结构卷对卷热辊压成形装置 |
| CN203117636U (zh) * | 2012-11-22 | 2013-08-07 | 苏州蒙斯威光电科技有限公司 | 可对准卷对卷uv成型的装置 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0775909B2 (ja) * | 1990-09-28 | 1995-08-16 | 大日本印刷株式会社 | アライメント転写方法 |
| US6309580B1 (en) * | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
| WO2002067055A2 (en) * | 2000-10-12 | 2002-08-29 | Board Of Regents, The University Of Texas System | Template for room temperature, low pressure micro- and nano-imprint lithography |
| US7293973B2 (en) * | 2003-03-13 | 2007-11-13 | Lg.Philips Lcd Co., Ltd. | Apparatus and method of fabricating light guide panel |
| EP1460738A3 (en) * | 2003-03-21 | 2004-09-29 | Avalon Photonics AG | Wafer-scale replication-technique for opto-mechanical structures on opto-electronic devices |
| JP3974118B2 (ja) * | 2004-04-22 | 2007-09-12 | 株式会社名機製作所 | 光学製品の転写成形装置および転写成形方法 |
| EP1795497B1 (en) * | 2005-12-09 | 2012-03-14 | Obducat AB | Apparatus and method for transferring a pattern with intermediate stamp |
| US7291564B1 (en) * | 2006-04-28 | 2007-11-06 | Hewlett-Packard Development Company, L.P. | Method and structure for facilitating etching |
| KR20080062854A (ko) * | 2006-12-29 | 2008-07-03 | 엘지전자 주식회사 | 다층 스탬프와 그의 제조 방법, 다층 스탬프가 장착된나노 임프린트 시스템 및 다층 스탬프를 이용한 표시패널에 나노 임프린팅하는 방법 |
| WO2008091571A2 (en) | 2007-01-22 | 2008-07-31 | Nano Terra Inc. | High-throughput apparatus for patterning flexible substrates and method of using the same |
| KR101289337B1 (ko) * | 2007-08-29 | 2013-07-29 | 시게이트 테크놀로지 엘엘씨 | 양면 임프린트 리소그래피 장치 |
| JP5002422B2 (ja) * | 2007-11-14 | 2012-08-15 | 株式会社日立ハイテクノロジーズ | ナノプリント用樹脂スタンパ |
| JP5117318B2 (ja) * | 2008-08-07 | 2013-01-16 | 株式会社日立ハイテクノロジーズ | ナノインプリント用スタンパ及び該スタンパを使用する微細構造転写装置 |
| JP2010105314A (ja) | 2008-10-31 | 2010-05-13 | Toray Ind Inc | 間欠式フィルム成形方法および間欠式フィルム成形装置 |
| EP2366530B1 (en) * | 2008-12-17 | 2014-01-22 | Sharp Kabushiki Kaisha | Roller-type imprint device, and method for manufacturing imprint sheet |
| JP5293318B2 (ja) | 2009-03-23 | 2013-09-18 | 東レ株式会社 | 間欠式フィルム成形方法および間欠式フィルム成形装置 |
| JP5232077B2 (ja) * | 2009-06-02 | 2013-07-10 | 株式会社日立ハイテクノロジーズ | 微細構造転写装置 |
| US20120301569A1 (en) | 2010-01-19 | 2012-11-29 | Hitachi Industrial Equipement Systems Co., Ltd. | Pattern transferring apparatus and pattern transferring method |
| JPWO2011155582A1 (ja) * | 2010-06-11 | 2013-08-15 | 株式会社日立ハイテクノロジーズ | 微細構造転写用スタンパ及び微細構造転写装置 |
| CN101943859B (zh) * | 2010-07-13 | 2012-07-18 | 苏州苏大维格光电科技股份有限公司 | 一种卷对卷紫外纳米压印装置及方法 |
| CN103210474A (zh) * | 2010-11-22 | 2013-07-17 | 旭硝子株式会社 | 转印装置及树脂图案制造方法 |
| CN102602208B (zh) | 2012-02-28 | 2014-08-20 | 上海交通大学 | 一种全液压驱动辊型微细压印装置 |
-
2012
- 2012-11-22 CN CN201210476395.3A patent/CN102929100B/zh not_active Expired - Fee Related
- 2012-12-20 JP JP2014547702A patent/JP5867764B2/ja not_active Expired - Fee Related
- 2012-12-20 WO PCT/CN2012/087081 patent/WO2014079122A1/zh not_active Ceased
- 2012-12-20 KR KR1020137029922A patent/KR101577700B1/ko not_active Expired - Fee Related
- 2012-12-20 US US14/000,202 patent/US9096024B2/en not_active Expired - Fee Related
-
2013
- 2013-10-11 TW TW102136664A patent/TWI486296B/zh not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080028958A1 (en) * | 2006-08-01 | 2008-02-07 | Samsung Electronics Co., Ltd. | Imprinting apparatus and method for forming residual film on a substrate |
| US20100052216A1 (en) * | 2008-08-29 | 2010-03-04 | Yong Hyup Kim | Nano imprint lithography using an elastic roller |
| CN102193310A (zh) * | 2011-05-17 | 2011-09-21 | 西安交通大学 | 一种机床测量用光栅两步固化辊压印成型方法 |
| CN102700123A (zh) * | 2012-06-21 | 2012-10-03 | 上海交通大学 | 聚合物薄膜类产品微细结构卷对卷热辊压成形装置 |
| CN203117636U (zh) * | 2012-11-22 | 2013-08-07 | 苏州蒙斯威光电科技有限公司 | 可对准卷对卷uv成型的装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201420474A (zh) | 2014-06-01 |
| CN102929100A (zh) | 2013-02-13 |
| US9096024B2 (en) | 2015-08-04 |
| KR20140092240A (ko) | 2014-07-23 |
| WO2014079122A1 (zh) | 2014-05-30 |
| JP5867764B2 (ja) | 2016-02-24 |
| KR101577700B1 (ko) | 2015-12-15 |
| JP2015507355A (ja) | 2015-03-05 |
| US20140329028A1 (en) | 2014-11-06 |
| TWI486296B (zh) | 2015-06-01 |
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Address after: 330013 Jiangxi Province Economic and Technological Development Zone Nanchang Huangjiahu road building 1A Applicant after: Nanchang O-film Light Nano Technology Co., Ltd. Address before: Suzhou City, Jiangsu Province, Suzhou Industrial Park 215123 Xinghu Street No. 218 BioBAY room A4-313 Applicant before: Suzhou Mengsiwei Photoelectricity Technology Co., Ltd. |
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Free format text: CORRECT: APPLICANT; FROM: SUZHOU MENGSIWEI OPTOELECTRONIC TECHNOLOGY CO., LTD. TO: NANCHANG O-FILM LIGHT NANO TECHNOLOGY CO., LTD. |
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Effective date of registration: 20160712 Address after: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Patentee after: Nanchang Ofilm Display Tech Co.,Ltd. Address before: 330013 Jiangxi Province Economic and Technological Development Zone Nanchang Huangjiahu road building 1A Patentee before: Nanchang O-film Light Nano Technology Co., Ltd. |
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Effective date of registration: 20170713 Address after: 330000 Jiangxi city of Nanchang Province Economic and Technological Development Zone HUANGJIAHU Road Patentee after: Nanchang OFilm Tech. Co.,Ltd. Address before: North to the East, 330013 in Jiangxi province Nanchang city Nanchang economic and technological development zones clove road Longtan ditch Patentee before: Nanchang Ofilm Display Tech Co.,Ltd. |
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