CN102703857B - Shade strip - Google Patents
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- CN102703857B CN102703857B CN201210204475.3A CN201210204475A CN102703857B CN 102703857 B CN102703857 B CN 102703857B CN 201210204475 A CN201210204475 A CN 201210204475A CN 102703857 B CN102703857 B CN 102703857B
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- 239000002184 metal Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 15
- 230000007423 decrease Effects 0.000 claims description 6
- 238000000059 patterning Methods 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims 2
- 238000000576 coating method Methods 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 9
- 230000037303 wrinkles Effects 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000000873 masking effect Effects 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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Abstract
一种遮罩条,用以固定于一框架上而构成一遮罩,具有两个拉伸区与一图案区,其中遮罩条被固定于框架后,图案区位于框架内,拉伸区位于框架外,且各拉伸区远离图案区的一侧具有一V型切口。
A mask strip is used to be fixed on a frame to form a mask, having two stretching areas and a pattern area. After the mask strip is fixed to the frame, the pattern area is located inside the frame, the stretching area is located outside the frame, and each stretching area has a V-shaped cutout on one side away from the pattern area.
Description
【技术领域】 【Technical field】
本发明是有关于一种遮罩条与一种遮罩的制造方法。The invention relates to a mask strip and a method for manufacturing the mask.
【背景技术】 【Background technique】
在现行图案化制程中,常通过多条遮罩条所组成的遮罩搭配镀膜制程来形成图案化膜层。遮罩是金属薄板通过蚀刻的方式制作出多条细长的金属线,其中多条金属线之间的空隙可作为镀膜制程时的开口区。In the current patterning process, the patterned film layer is usually formed through a mask composed of a plurality of mask strips and a coating process. The mask is a thin metal plate that is etched to produce multiple thin and long metal lines, and the gaps between the multiple metal lines can be used as opening areas during the coating process.
由于金属线相当细长,易扭曲变形,因此在遮罩条的两侧设置有拉伸区。在将遮罩条固定至框架上以构成遮罩时,于拉伸区处施以预张力,使金属线横向绷紧。藉此,让金属线维持直线而使开口区维持正确的形状与位置,并得以对抗镀膜时温度所造成的膨胀量,还有抵抗遮罩与欲镀膜的基板的重量所造成的弯曲变形。Since the metal wire is quite slender and easily twisted and deformed, stretching areas are provided on both sides of the masking strip. When the mask strip is fixed to the frame to form the mask, a pretension is applied at the stretching area, so that the metal wire is stretched laterally. In this way, the metal line is kept straight to maintain the correct shape and position of the opening area, and it can resist the expansion caused by the temperature during coating, and also resist the bending deformation caused by the weight of the mask and the substrate to be coated.
然而,在施予预张力时,现行设计的拉伸区靠近施力点的位置在力量转换以及受力形变方面的自由度不够高。因此靠近拉伸区的开口区易呈现波浪状的皱褶形变,使遮罩条无法服贴于欲镀膜的基板上,造成开口区的位置偏移、镀膜厚度不均以及欲镀膜位置走位等问题发生。另一方面,为避免增加预张力会造成皱褶形变的状况加剧,或是造成皱褶形变的影响范围向内扩张,需限制预张力的大小。然,此举常造成预张力不足的情况发生。在预张力不足的情况下,由于遮罩条不够稳固,无法抵挡欲镀膜的基板的重量以及镀膜时所累积的膜层的重量所造成的弯曲变形,且在清洗时易松脱变形,因此常造成遮罩的使用率以及寿命大幅地降低。However, when pretension is applied, the degree of freedom in force conversion and deformation under force is not high enough in the current design of the tension zone near the force application point. Therefore, the opening area close to the stretching area is prone to wavy wrinkle deformation, which makes the mask strip unable to conform to the substrate to be coated, resulting in positional deviation of the opening area, uneven coating thickness, and displacement of the desired coating position, etc. problem occurs. On the other hand, in order to avoid the aggravation of the wrinkle deformation caused by increasing the pretension, or the inward expansion of the influence range of the wrinkle deformation, it is necessary to limit the size of the pretension. However, this often results in insufficient pretension. In the case of insufficient pretension, because the mask strip is not stable enough, it cannot withstand the bending deformation caused by the weight of the substrate to be coated and the weight of the film layer accumulated during coating, and it is easy to loosen and deform during cleaning, so it is often As a result, the usage rate and life of the mask are greatly reduced.
【发明内容】 【Content of invention】
本发明提供一种遮罩条,其可提供良好的镀膜品质且具有良好的使用率以及寿命。The invention provides a mask strip, which can provide good coating quality and has good service rate and lifespan.
本发明提供一种遮罩条,用以被固定于一框架上而构成一遮罩,具有两个拉伸区与一图案区,其中遮罩条被固定于框架后,图案区位于框架内,拉伸区位于框架外,且各拉伸区远离图案区的一侧具有一V型切口。The present invention provides a mask strip, which is used to be fixed on a frame to form a mask, and has two stretching areas and a pattern area, wherein the mask strip is fixed behind the frame, and the pattern area is located in the frame. The stretching areas are located outside the frame, and each stretching area has a V-shaped cut on the side away from the pattern area.
在本发明的一实施例中,前述的各拉伸区在V型切口的端点与图案区之间具有多个挖空区。In an embodiment of the present invention, each stretching zone has a plurality of hollowed out zones between the end point of the V-shaped incision and the pattern zone.
在本发明的一实施例中,前述的各挖空区呈长条状,且挖空区彼此平行排列。In an embodiment of the present invention, each of the aforementioned hollowed out areas is in the shape of a strip, and the hollowed out areas are arranged in parallel with each other.
在本发明的一实施例中,前述的各挖空区呈三角形。In an embodiment of the present invention, each hollowed-out area mentioned above is in the shape of a triangle.
在本发明的一实施例中,前述的挖空区沿着平行于图案区与拉伸区的边界的方向排成多列。In an embodiment of the present invention, the aforementioned hollow areas are arranged in multiple rows along a direction parallel to the boundary between the pattern area and the stretch area.
在本发明的一实施例中,前述的挖空区中位于同一列者的大小相同。In an embodiment of the present invention, the sizes of the aforementioned hollowed out areas located in the same column are the same.
在本发明的一实施例中,前述的挖空区的大小随着与图案区的距离缩短而递减。In an embodiment of the present invention, the size of the aforementioned hollowed out area decreases gradually as the distance from the pattern area decreases.
在本发明的一实施例中,前述的各挖空区的一角指向图案区。In an embodiment of the present invention, a corner of each of the aforementioned hollow areas points to the pattern area.
本发明另提供一种遮罩条,用以被固定于一框架上而构成一遮罩,具有两个拉伸区与一图案区,其中遮罩条被固定于框架后,图案区位于框架内,拉伸区位于框架外,各拉伸区具有多个挖空区。The present invention also provides a mask strip, which is used to be fixed on a frame to form a mask, and has two stretching areas and a pattern area, wherein the mask strip is fixed behind the frame, and the pattern area is located in the frame , the stretch zones are located outside the frame, and each stretch zone has multiple hollowed out regions.
在本发明的一实施例中,前述的各拉伸区远离图案区的一侧具有一切口。In an embodiment of the present invention, each stretching zone mentioned above has a cutout on a side away from the pattern zone.
在本发明的一实施例中,前述的各挖空区呈长条状,且挖空区彼此平行排列。In an embodiment of the present invention, each of the aforementioned hollowed out areas is in the shape of a strip, and the hollowed out areas are arranged in parallel with each other.
在本发明的一实施例中,前述的各挖空区呈三角形。In an embodiment of the present invention, each hollowed-out area mentioned above is in the shape of a triangle.
在本发明的一实施例中,前述的挖空区沿着平行于图案区与拉伸区的边界的方向排成多列。In an embodiment of the present invention, the aforementioned hollow areas are arranged in multiple rows along a direction parallel to the boundary between the pattern area and the stretch area.
在本发明的一实施例中,前述的挖空区中位于同一列者的大小相同。In an embodiment of the present invention, the sizes of the aforementioned hollowed out areas located in the same column are the same.
在本发明的一实施例中,前述的挖空区的大小随着与图案区的距离缩短而递减。In an embodiment of the present invention, the size of the aforementioned hollowed out area decreases gradually as the distance from the pattern area decreases.
在本发明的一实施例中,前述的挖空区的一角指向图案区。In an embodiment of the present invention, a corner of the aforementioned hollow area points to the pattern area.
基于上述,本提案的遮罩条可通过在拉伸区提供一V型切口及/或多个挖空区,均匀地分散预张力,使拉伸区靠近施力点的位置在力量转换以及受力形变的自由度得以提升。因此,靠近拉伸区的开口区可保持良好的平整度而得以服贴于欲镀膜的基板上,进而提升制程良率。Based on the above, the mask strip of this proposal can evenly disperse the pretension by providing a V-shaped incision and/or multiple hollowed out areas in the stretching area, so that the stretching area close to the force application point can be in the position of force conversion and force receiving. The degree of freedom of deformation is increased. Therefore, the opening area close to the stretching area can maintain good flatness and be conformed to the substrate to be coated, thereby improving the process yield.
为让本发明的上述特征和优点能更明显易懂,下文特举实施例,并配合所附图式作详细说明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail together with the accompanying drawings.
【附图说明】 【Description of drawings】
图1为本发明一实施例的遮罩条的上视示意图。FIG. 1 is a schematic top view of a mask strip according to an embodiment of the present invention.
图2为图1中的拉伸区的上视示意图。Fig. 2 is a schematic top view of the stretching zone in Fig. 1 .
图3为本发明另一实施例的遮罩条的上视示意图。FIG. 3 is a schematic top view of a mask strip according to another embodiment of the present invention.
【主要元件符号说明】[Description of main component symbols]
100:遮罩100: mask
110、210:遮罩条110, 210: Mask strip
112:金属线112: metal wire
114:开口区114: Opening area
120:框架120: frame
A1:拉伸区A1: Stretch zone
A2:图案区A2: pattern area
A3、A4:挖空区A3, A4: Knockout area
F:预张力F: Pretension
V:V型切口V: V-shaped cut
X:端点X: endpoint
U:切口U: incision
【具体实施方式】 【detailed description】
图1为本发明一实施例的遮罩条的上视示意图。图2为图1中的拉伸区的上视示意图。FIG. 1 is a schematic top view of a mask strip according to an embodiment of the present invention. Fig. 2 is a schematic top view of the stretching zone in Fig. 1 .
请同时参照图1与图2,本实施例的遮罩条110,用以被固定于一框架120上而构成一遮罩100。在本实施例中,遮罩条110例如是通过焊接、锁固或其他方式被固定于框架120上。另外,遮罩100所包括的遮罩条110数量可大于1。换言之,通常一个遮罩100是由被固定在一个框架120上的多个遮罩条110所构成,以便于进行大面积的蒸镀或其他制程。Please refer to FIG. 1 and FIG. 2 at the same time, the mask bar 110 of this embodiment is used to be fixed on a frame 120 to form a mask 100 . In this embodiment, the mask strip 110 is fixed on the frame 120 by welding, locking or other methods, for example. In addition, the number of mask strips 110 included in the mask 100 may be greater than one. In other words, usually a mask 100 is composed of a plurality of mask strips 110 fixed on a frame 120 to facilitate large-area evaporation or other processes.
遮罩条110具有两个拉伸区A1与一图案区A2。在遮罩条110被固定于框架120后,图案区A2位于框架120内,拉伸区A1位于框架120外。而在遮罩条110被固定于框架120后,即可将拉伸区A1移除,以利蒸镀或其他制程的进行。在本实施例中,遮罩条110的制作方法例如是将金属薄板通过蚀刻的方式在图案区A2制作出多个重复的图案,其中各图案包括多条细长的金属线112,而各金属线112之间的空隙114在图案化制程中,可作为镀膜制程时的开口区。举例而言,各金属线112之间的空隙114可作为有机发光二极管(OrganicLightEmittingDiode,OLED)蒸镀制程时欲形成图案化膜层的开口区,例如用于形成OLED中各个画素区的有机发光材料层。于蒸镀制程中,将遮罩100放置在蒸镀材料源与目标基板之间,并使各空隙114对应各画素区。在蒸镀完成后,蒸镀材料源的材料只会沉积在各画素区中而不会超出范围。因此,通过调变空隙114的尺寸、形状以及位置可控制蒸镀制程时欲沉积材料的区域的尺寸、形状以及位置。当然,遮罩条110以及遮罩100的用途不限于此,而空隙114也不限定于对应画素区。The mask strip 110 has two stretch areas A1 and a pattern area A2. After the mask strip 110 is fixed on the frame 120 , the pattern area A2 is located inside the frame 120 , and the stretch area A1 is located outside the frame 120 . After the mask strip 110 is fixed on the frame 120 , the stretching area A1 can be removed to facilitate evaporation or other processes. In this embodiment, the manufacturing method of the mask strip 110 is, for example, to make a plurality of repeated patterns in the pattern area A2 by etching a thin metal plate, wherein each pattern includes a plurality of elongated metal lines 112, and each metal The gap 114 between the lines 112 can be used as an opening area during the coating process during the patterning process. For example, the gap 114 between each metal line 112 can be used as an opening area to form a patterned film layer during an organic light emitting diode (Organic Light Emitting Diode, OLED) evaporation process, such as an organic light emitting material used to form each pixel area in an OLED. layer. In the evaporation process, the mask 100 is placed between the evaporation material source and the target substrate, and each gap 114 corresponds to each pixel area. After the vapor deposition is completed, the material of the vapor deposition material source will only be deposited in each pixel area without exceeding the range. Therefore, by adjusting the size, shape and position of the gap 114 , the size, shape and position of the region where material is to be deposited during the evaporation process can be controlled. Of course, the use of the mask bar 110 and the mask 100 is not limited thereto, and the gap 114 is not limited to the corresponding pixel area.
在实务上,由于各金属线112相当细长,易扭曲变形,因此通过在拉伸区A1处施以预张力F,使金属线横向绷紧,并固定于框架120上,可避免于镀膜制程时欲镀膜位置走位,并提供足以承载镀膜时温度所造成的膨胀量以及遮罩与欲镀膜的基板的重量所造成的弯曲变形。In practice, since the metal wires 112 are quite slender and easily twisted and deformed, by applying a pre-tension F at the stretching area A1, the metal wires are stretched laterally and fixed on the frame 120, which can avoid problems in the coating process. When the coating position is shifted, it is sufficient to bear the expansion caused by the temperature during coating and the bending deformation caused by the weight of the mask and the substrate to be coated.
本实施例的遮罩条110在各拉伸区A1远离图案区A2的一侧具有一V型切V,缩小预张力F的施力点的面积,进而使施力较为集中。此外,通过增加V型切口V的深度,提高V型切口V周遭受力形变的自由度,本实施例的遮罩条110可更均匀地分散预张力。具体而言,将集中于施力点的应力分散至一整面拉伸区A1。因此,本实施例的遮罩条110可降低因应力集中所造成的波浪状的皱褶形变。The mask strip 110 of this embodiment has a V-shaped cut V on the side of each stretching area A1 away from the pattern area A2, which reduces the area of the application point of the pretension F, thereby making the application force more concentrated. In addition, by increasing the depth of the V-shaped notch V and increasing the degree of freedom of force and deformation around the V-shaped notch V, the mask strip 110 in this embodiment can more evenly disperse the pretension. Specifically, the stress concentrated at the force application point is distributed to the entire surface stretching area A1. Therefore, the mask strip 110 of this embodiment can reduce the wave-like wrinkle deformation caused by stress concentration.
另外,本实施例的遮罩条110更可选择性地在V型切口V的端点X与图案区A2之间提供多个挖空区A3。在本实施例中,各挖空区A3呈彼此平行排列的长条状,且挖空区A3例如是沿着平行于图案区A2与拉伸区A1的边界的方向排成一列。In addition, the mask strip 110 of this embodiment can optionally provide a plurality of hollowed out areas A3 between the end point X of the V-shaped cutout V and the pattern area A2. In this embodiment, the hollowed out areas A3 are long strips arranged parallel to each other, and the hollowed out areas A3 are arranged in a row along a direction parallel to the boundary between the pattern area A2 and the stretched area A1 .
值得一提的是,本实施例的遮罩条110通过提供多个挖空区A3,可让预张力更平均地传进图案区A2。因此,均匀传递的预张力可使图案区A2保持平整。另外,由于本实施例的遮罩条110具有良好的力量转换以及受力形变的自由度,因此可进一步承受更大的预张力F。本实施例的遮罩条110可提供较大的承载力,足以支撑欲镀膜的基板的重量以及镀膜时所累积的膜层的重量。另外,在清洗时也较不易松脱变形。因此,本实施例的遮罩条110所制成的遮罩具有良好的使用率以及寿命。It is worth mentioning that the mask strip 110 of this embodiment can allow the pretension to be more evenly transmitted into the pattern area A2 by providing a plurality of hollow areas A3. Therefore, the evenly transmitted pretension can keep the pattern area A2 flat. In addition, since the mask strip 110 of this embodiment has good force conversion and freedom of force deformation, it can further withstand a larger pretension F. The mask bar 110 of this embodiment can provide a large bearing capacity, which is sufficient to support the weight of the substrate to be coated and the weight of the accumulated film layers during coating. In addition, it is less likely to loosen and deform during cleaning. Therefore, the mask made of the mask strip 110 of this embodiment has a good usage rate and lifespan.
当然,本提案的遮罩条除了可为上述型态外,亦可有其他型态,以下将搭配图3另举一实施例作说明。图3为本发明另一实施例的遮罩条的上视示意图。Certainly, besides the above-mentioned types, the mask strips of the present proposal can also have other types, and another embodiment will be illustrated below with reference to FIG. 3 . FIG. 3 is a schematic top view of a mask strip according to another embodiment of the present invention.
请参照图3,本实施例的遮罩条210与遮罩条110具有相似的型态,但是二者差异处在于拉伸区A1的型态。本实施例的遮罩条210在拉伸区A2处具有多个挖空区A4。在本实施例中,各挖空区A4例如是呈三角形,而各挖空区的一角指向图案区A2。此外,挖空区A4沿着平行于图案区A2与拉伸区A1的边界的方向排成多列,且位于同一列者的大小相同,其中挖空区A4的大小随着与图案区的距离缩短而递减。与前一实施例相似,本实施例的遮罩条210所制成的遮罩具有良好的使用率以及寿命。Referring to FIG. 3 , the mask strip 210 of this embodiment has a similar shape to the mask strip 110 , but the difference lies in the shape of the stretching area A1 . The masking strip 210 of this embodiment has a plurality of hollowed out areas A4 at the stretching area A2. In this embodiment, each hollowed area A4 is, for example, in the shape of a triangle, and a corner of each hollowed area points to the pattern area A2. In addition, the hollowed areas A4 are arranged in multiple rows along the direction parallel to the boundary between the patterned area A2 and the stretched area A1, and those located in the same column have the same size, wherein the size of the hollowed areas A4 increases with the distance from the patterned area. shortened and decreased. Similar to the previous embodiment, the mask made of the mask strip 210 of this embodiment has a good usage rate and a good lifespan.
当然,本实施例的遮罩条210在各拉伸区A1远离图案区A2的一侧亦可选择性的配置有一切口U。通过增加切口U的深度,可提高切口U周遭受力形变的自由度。因此,本实施例的遮罩条210可更均匀地分散预张力,并进一步地降低因应力集中所造成的波浪状的皱褶形变。Of course, the masking strip 210 of this embodiment can also be optionally configured with a cutout U on the side of each stretching area A1 away from the pattern area A2. By increasing the depth of the notch U, the degree of freedom of force deformation around the notch U can be improved. Therefore, the mask strip 210 of this embodiment can more uniformly distribute the pretension, and further reduce the wave-like wrinkle deformation caused by stress concentration.
综上所述,本提案的遮罩条是在拉伸区提供V型切口及/或多个挖空区,均匀地分散预张力,使拉伸区靠近施力点的位置在力量转换以及受力形变的自由度等方面得以提升。藉此,改善习知技术于开口区因受力不均所产生的波浪状的皱褶形变,进而确保本实施例的遮罩条平整地服贴于欲镀膜的基板上,减缓开口区的位置偏移、镀膜厚度不均以及镀膜位置走位等问题的发生。另外,本提案的遮罩条在力量转换以及受力形变的自由度得以提升的情况下,可进一步提升预张力,改善习知技术欲避免皱褶形变所造成预张力不足的情况。因此,本提案的遮罩条可较为稳固地固定于框架上,并具有足够的承载力去承载欲镀膜的基板的重量以及镀膜时所累积的膜层的重量。是以,本提案的遮罩条所组成的遮罩具有良好的使用率以及寿命。To sum up, the mask strip of this proposal is to provide V-shaped cuts and/or multiple hollowed out areas in the stretching area to evenly disperse the pretension, so that the stretching area close to the point of force application can be used for force conversion and stress The degree of freedom of deformation and other aspects can be improved. In this way, the wavy wrinkle deformation caused by uneven force in the opening area in the conventional technology is improved, thereby ensuring that the mask strip of this embodiment is flat and obedient on the substrate to be coated, and the position of the opening area is slowed down. Problems such as offset, uneven coating thickness and displacement of coating position occur. In addition, the masking strip of this proposal can further increase the pretension under the condition that the degree of freedom of force conversion and force deformation is improved, and improve the situation of insufficient pretension caused by conventional technology to avoid wrinkle deformation. Therefore, the mask bar of the present proposal can be fixed on the frame relatively stably, and has enough bearing capacity to carry the weight of the substrate to be coated and the weight of the accumulated film layers during coating. Therefore, the mask formed by the mask strips of the present proposal has good utilization rate and service life.
虽然本发明已以实施方式揭露如上,然其并非用以限定本发明,任何所属技术领域中具有通常知识者,在不脱离本发明的精神和范围内,当可作些许的更动与润饰,故本发明的保护范围当视后附的申请专利范围所界定者为准。Although the present invention has been disclosed above in terms of implementation, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field may make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the scope of the appended patent application.
Claims (6)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101111410 | 2012-03-30 | ||
| TW101111410A TWI472631B (en) | 2012-03-30 | 2012-03-30 | Shadow mask strip |
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| Publication Number | Publication Date |
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| CN102703857A CN102703857A (en) | 2012-10-03 |
| CN102703857B true CN102703857B (en) | 2016-04-13 |
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| CN201210204475.3A Active CN102703857B (en) | 2012-03-30 | 2012-06-20 | Shade strip |
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|---|---|---|---|---|
| JP7121918B2 (en) * | 2016-12-14 | 2022-08-19 | 大日本印刷株式会社 | Evaporation mask device and method for manufacturing evaporation mask device |
| EP4148161B1 (en) | 2016-12-14 | 2025-05-14 | Dai Nippon Printing Co., Ltd. | Method of manufacturing vapor deposition mask device |
| JP7151745B2 (en) * | 2020-07-16 | 2022-10-12 | 凸版印刷株式会社 | Evaporation mask intermediate, evaporation mask, and evaporation mask manufacturing method |
| CN114716154B (en) * | 2022-04-15 | 2023-05-12 | 业成科技(成都)有限公司 | Shield assembly |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1625312A (en) * | 2003-12-02 | 2005-06-08 | 索尼株式会社 | Deposition mask and manufacturing method thereof |
| CN102201550A (en) * | 2010-03-17 | 2011-09-28 | 三星移动显示器株式会社 | Unit mask, mask assembly and method for manufacturing display device |
-
2012
- 2012-03-30 TW TW101111410A patent/TWI472631B/en active
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1625312A (en) * | 2003-12-02 | 2005-06-08 | 索尼株式会社 | Deposition mask and manufacturing method thereof |
| CN102201550A (en) * | 2010-03-17 | 2011-09-28 | 三星移动显示器株式会社 | Unit mask, mask assembly and method for manufacturing display device |
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| Publication number | Publication date |
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| CN102703857A (en) | 2012-10-03 |
| TWI472631B (en) | 2015-02-11 |
| TW201339330A (en) | 2013-10-01 |
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