CN102603211B - Method for making marks on glass - Google Patents
Method for making marks on glass Download PDFInfo
- Publication number
- CN102603211B CN102603211B CN 201210065456 CN201210065456A CN102603211B CN 102603211 B CN102603211 B CN 102603211B CN 201210065456 CN201210065456 CN 201210065456 CN 201210065456 A CN201210065456 A CN 201210065456A CN 102603211 B CN102603211 B CN 102603211B
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- glass
- layer
- sheet glass
- etching
- medium layer
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- 239000011521 glass Substances 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 35
- 238000005530 etching Methods 0.000 claims abstract description 46
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052709 silver Inorganic materials 0.000 claims abstract description 14
- 239000004332 silver Substances 0.000 claims abstract description 14
- 239000005357 flat glass Substances 0.000 claims description 70
- 238000000608 laser ablation Methods 0.000 claims description 6
- 238000007669 thermal treatment Methods 0.000 claims description 5
- 239000005329 float glass Substances 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 3
- 239000012528 membrane Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 239000002253 acid Substances 0.000 abstract description 2
- 239000003513 alkali Substances 0.000 abstract 1
- 238000003912 environmental pollution Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 72
- 239000005344 low-emissivity glass Substances 0.000 description 16
- 238000007639 printing Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 229910020286 SiOxNy Inorganic materials 0.000 description 2
- 229910020776 SixNy Inorganic materials 0.000 description 2
- 229910003087 TiOx Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- HLLICFJUWSZHRJ-UHFFFAOYSA-N tioxidazole Chemical compound CCCOC1=CC=C2N=C(NC(=O)OC)SC2=C1 HLLICFJUWSZHRJ-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910007717 ZnSnO Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010329 laser etching Methods 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 238000005496 tempering Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
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- Surface Treatment Of Glass (AREA)
Abstract
The invention provides a method for making marks on glass, which relates to the field of mark making. The method adopts a first glass plate, a low-radiation film layer deposited on the first glass plate and a second glass plate, a mark is about to be made on the second glass plate, and the low-radiation film layer at least sequentially consists of a first medium layer, a silver layer and a second medium layer from the outside of the low-radiation film layer to the direction of the first glass plate. The method is characterized by further comprising steps: firstly, etching the first medium layer of the low-radiation layer on the first glass plate and leading the first medium layer to display a graph corresponding to the mark; secondly, matching the first glass plate with the second glass plate and leading the etched low-radiation film layer to be attached to the second glass plate; and thirdly, realizing heat treatment for the two matched glass plates at the temperature higher than 400 DEG C, and leading the specified mark to be displayed on the second glass plate. The method has the advantages that implementation is simple, environmental pollution is avoided, patterns of the produced mark are clear, acid and alkali resistance and friction resistance are good, the service life is long, and the method has an excellent commercial prospect.
Description
[technical field]
The present invention relates to identify the making field, particularly glass sign making field.
[background technology]
Traditional method in making sign on glass mainly contains following several:
(1) screen printing ink, this is at present in producer's target main method on glass, by screen printing process, printing ink is printed on formation pattern on glass, then at high temperature oven dry, sintering are made sign.Printing ink is by organic solvent, low-melting-point glass powder and media assemblage, and its organic solvent volatilizees when oven dry in a large number, and the more organic solvent of the cleaning of printing ink needs, and such as dimethylbenzene, this needs more loaded down with trivial details post-processed, easily contaminate environment.
(2) etching method, it is to utilize physical-chemical reaction between material and the glass, method in making sign on glass, be that the Chinese patent of CN1209421A discloses a kind of etching reagent of making for anti-theft mark of automobile glass such as publication number, also be applicable at the various identification patterns of other etchings on glass.But the identification pattern that this method is made is not have colouredly, and texture is very unintelligible.
(3) directly paste, it be directly the sign that makes is sticked on glass, but long-time the use, label can wear and tear or come off.
At present, market is the widespread use energy-saving glass, especially low emissivity glass.Low emissivity glass claims again Low-e glass, is that to plate the film that multiple layer metal or compound form at glass surface be product.Its coatings has the characteristic to visible light high transmission and the high reflection of centering far infrared rays, makes glassy product have excellent energy-efficient performance, therefore is widely used on building glass and the vehicle glass.
The Low-e plated film is made of stratified film, and take silver (Ag) layer as the major function layer, the Ag layer can be pure Ag film as required, also can add in right amount other elements, such as Cu.The Ag layer forms " sandwich structure " between medium layer and medium layer, medium layer not only can be the individual layer rete, can also be by a plurality of individual layers, such as metal level, oxide skin, nitride layer or their composite bed that constitutes.Low-radiation film layer typical structure as depicted in figs. 1 and 2.
Low emissivity glass can be divided into online low emissivity glass and off-line low emissivity glass by production technique, and this paper indication low emissivity glass is the off-line low emissivity glass.Because the off-line low emissivity glass belongs to soft coating glass, wear resistance and firmness are less than online low emissivity glass.And low, the reflective height of its major function layer silver layer printing opacity, and be easy to be corroded or mechanical wear, so need the co-ordination medium layer, play effects such as strengthening connecting, protect silver layer, raising transmittance and adjustment color.The different media layer choose and collocation can cause the different performance of low emissivity glass, this paper indication low emissivity glass is the Low-e glass that can stand high-temperature heat treatment more than 400 ℃, but tempering Low-e and can dry by the fire curved Low-e especially.Be the Chinese patent of CN101585667A such as publication number, it discloses a kind of curved low emissivity glass that dries by the fire, and the film layer structure of this bendable low-emission coated glass outwards is followed successively by from glass substrate: glass substrate/SiOxNy/ZnSnOx/TiOy/Ag/TiOx/ZnSnOy/SixNy.Here this paper is considered as the first medium layer with TiOx/ZnSnOy/SixNy, and SiOxNy/ZnSnOx/TiOy is considered as the second medium layer, and silver layer is between first medium layer and second medium layer.
[summary of the invention]
The object of the invention is to solve the above-mentioned problem that exists in the traditional method of making sign on glass, a kind of novel method of utilizing low emissivity glass to make sign is provided.
To achieve these goals, the technical solution used in the present invention is: a kind of method in making sign on glass, comprise the first sheet glass, be deposited on the low-radiation film layer of the first sheet glass and the second sheet glass of sign to be produced, described low-radiation film layer comprises first medium layer, silver layer and second medium layer, described first medium layer, silver layer and second medium layer from outside set gradually to the first sheet glass direction, it is characterized in that: further comprising the steps of:
1) the first medium layer of low-radiation film layer on the first sheet glass carried out etching, the etching direction be from outside to the first sheet glass direction, etch thicknesses is the 10-90% of first medium layer thickness, make the first medium layer show the sign corresponding figure;
2) with the pairing of the first sheet glass and the second sheet glass, make low-radiation film layer and the applying of the second sheet glass after the etching, spacing is less than 0.2mm;
3) two sheet glass after will matching make on present the second sheet glass of identifying of appointment in thermal treatment more than 400 ℃.
The invention has the advantages that: implement simple, environmentally safe, the identification pattern of production is clear, and resistance to acids and bases, rub resistance are good, long service life has good commercial promise.
[description of drawings]
Fig. 1 is the silver-colored Low-e film of the list of low emissivity glass exemplary block diagram;
Fig. 2 is the two silver-colored Low-e film exemplary block diagram of low emissivity glass;
Fig. 3 is Low-e film layer structure synoptic diagram on the first sheet glass after the etching;
Fig. 4 is the first sheet glass after the present invention matches and the structural representation of functional film layer and the second sheet glass;
Fig. 5 is process flow sheet of the present invention.
[embodiment]
A kind of method in making sign on glass, comprise the first sheet glass 1, be deposited on the low-radiation film layer 2 of the first sheet glass 1 and the second sheet glass 3 of sign to be produced, described low-radiation film layer 2 comprises first medium layer 21, silver layer 22 and second medium layer 23, described first medium layer 21, silver layer 22 and second medium layer 23 from outside set gradually to the first sheet glass 1 direction, it is characterized in that: further comprising the steps of:
1) the first medium layer 21 of low-radiation film layer 2 on the first sheet glass 1 carried out etching, the etching direction be from outside to the first sheet glass direction, etch thicknesses is the 10-90% of first medium layer 21 thickness, make first medium layer 21 show the sign corresponding figure;
2) with the first sheet glass 1 and the pairing of the second sheet glass 3, make low- radiation film layer 2 and 3 applyings of the second sheet glass after the etching, spacing is less than 0.2mm;
3) two sheet glass after will matching make on present the second sheet glass 3 of identifying of appointment in thermal treatment more than 400 ℃.
Wherein, described first medium layer 21 thickness are at least 20nm, and etch thicknesses is at least 2nm;
Described first medium layer 21 and/or second medium layer 23 can be unitary film, also can be for by metallic membrane, oxide film, nitride film or their composite film that constitutes;
Lithographic method can adopt laser ablation or printable etching media etching, laser ablation can adopt ruddiness (wavelength is 1064nm), green glow (wavelength is 532nm) or UV-light (wavelength is 0-380nm) to carry out etching, and printable etching media can be etching paste, etching paste and etching ink;
Described sheet glass is float glass.
But the low-radiation film layer of indication of the present invention is high temperature heat-resistant to be processed, and general medium layer is all dense or Ag layer protective layer arranged, and makes it under the condition of high temperature, can protect the Ag layer, avoids or reduces the oxidation of Ag layer.If but the employing engraving method is etched away the medium layer of Ag layer top, and do not etch away the Ag layer, the Ag layer at rete etching position is under the condition of high temperature so, just easily be diffused into and join sheet glass surface or inner, complicated physical-chemical reaction occurs at glass surface and inside glass, thereby make the corresponding position flavescence of the second sheet glass, form yellow sign.
Below in conjunction with accompanying drawing content of the present invention is described further:
At first float glass sheet is cut according to desired size, makes the first sheet glass 1 and second sheet glass 3 of pairing, adopt following steps to make behind the cleaning-drying:
1) adopt magnetically controlled sputter method to deposit successively the Low-e rete 2 described in the Chinese patent CN101585667A example 1 on the first sheet glass 1, the first medium layer 21 of silver layer more than 22 is TiO
1.
3/ ZnSnO
2.
3/ Si
3N
4, total thickness is 49.5nm;
2) adopt laser etching method in Low-e film 2 etchings, the etching direction be from outside to the first sheet glass direction, etching depth 20nm makes the etching pattern that presents " FY " printed words on the first medium layer 21.Low-e rete 2 structures as shown in Figure 3 on the first sheet glass 1 after the etching.Wherein, laser ablation can adopt ruddiness (1064nm), green glow (532nm) or ultraviolet (0-380nm) to carry out etching;
3) with the first sheet glass 1 and 3 pairings of the second sheet glass, finger the first sheet glass 1 add the second sheet glass 3(that another sheet cleans up, uncoated be also referred to as join sheet), face and second sheet glass 3 of the first sheet glass 1 are affixed, the first sheet glass 1 after the pairing and the structure of low-radiation film layer 2 and the second sheet glass 3 middle add an amount of insulating powder as shown in Figure 4;
The technical process of preparation identification method as shown in Figure 5 in the present embodiment.The sign of this embodiment 1 is to be applied to the automotive front baffle low radiation coated glass, effectively in conjunction with automotive front baffle low emissivity glass preparation technology, only has more laser ablation identification pattern step, and is simple and convenient, and it is clear lasting to identify.
At first float glass sheet is cut according to desired size, makes the first sheet glass 1 and second sheet glass 3 of pairing, adopt following steps to make behind the cleaning-drying:
1) adopt magnetically controlled sputter method on the first sheet glass 1, to deposit successively the two silver low radiation retes 2 described in the Chinese patent CN1300327A example 8, first medium layer 21 on the first sheet glass 1 silver layer 22 farthest is titanium/zinc oxide/52-48 zinc/titanium, and total thickness is about 24nm;
2) adopt the etching paste lithographic method in low-radiation film layer 2 etching, the etching direction be from outside to the first sheet glass direction, etching depth 20nm, make the etching pattern that presents " FY " image pattern on the first medium layer 21, wherein, can to adopt publication number be that the described etching paste of Chinese patent of CN101600779A carries out the silk screen printing etching to etching paste;
3) with the first sheet glass 1 and 3 pairings of the second sheet glass, finger the first sheet glass 1 add the second sheet glass 3(that another sheet cleans up, uncoated be also referred to as join sheet), face and second sheet glass 3 of the first sheet glass 1 are affixed, an amount of insulating powder of middle adding;
The difference of this embodiment and embodiment 1 is that the low-radiation film layer is two silver-colored Low-e retes, and film layer structure is different, and the etching mode changes into etching paste carries out etching, reduces like this cost, also can obtain same effect.
Above content is that a kind of method in making sign on glass of the present invention is specifically described, but the present invention is not subjected to the limitation of embodiment content described above, so any improvement, equivalent modifications and replacement etc. that all foundations technical essential of the present invention is carried out all belong to scope of the present invention.
Claims (5)
1. method in making on glass sign, comprise the first sheet glass, be deposited on the low-radiation film layer of the first sheet glass and the second sheet glass of sign to be produced, described low-radiation film layer comprises first medium layer, silver layer and second medium layer, described first medium layer, silver layer and second medium layer from outside set gradually to the first sheet glass direction, it is characterized in that: further comprising the steps of:
1) the first medium layer of low-radiation film layer on the first sheet glass carried out etching, the etching direction be from outside to the first sheet glass direction, etch thicknesses is the 10-90% of first medium layer thickness, make the first medium layer show the sign corresponding figure;
2) with the pairing of the first sheet glass and the second sheet glass, make low-radiation film layer and the applying of the second sheet glass after the etching, spacing is less than 0.2mm;
3) two sheet glass after will matching make on present the second sheet glass of identifying of appointment in thermal treatment more than 400 ℃.
2. the method in making on glass sign according to claim 1, it is characterized in that: described first medium layer thickness is at least 20nm.
3. the method in making on glass sign according to claim 1, it is characterized in that: described first medium layer and/or second medium layer can be unitary film, also can be the composite film that is comprised of metallic membrane and oxide membranous layer.
4. the method in making on glass sign according to claim 1, it is characterized in that: lithographic method can adopt laser ablation or printable etching media etching, it is that the UV-light that the ruddiness of 1064nm, green glow that wavelength is 532nm or wavelength are 0-380nm is carried out etching that laser ablation can adopt wavelength, and printable etching media can be etching paste, etching paste and etching ink.
5. the method in making on glass sign according to claim 1, it is characterized in that: described sheet glass is float glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210065456 CN102603211B (en) | 2012-01-12 | 2012-01-12 | Method for making marks on glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201210065456 CN102603211B (en) | 2012-01-12 | 2012-01-12 | Method for making marks on glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102603211A CN102603211A (en) | 2012-07-25 |
| CN102603211B true CN102603211B (en) | 2013-10-30 |
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ID=46521071
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201210065456 Active CN102603211B (en) | 2012-01-12 | 2012-01-12 | Method for making marks on glass |
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| Country | Link |
|---|---|
| CN (1) | CN102603211B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1836061A (en) * | 2003-08-19 | 2006-09-20 | 三菱化学株式会社 | Etching solution for titanium-containing layer and etching method for peptide-containing layer |
| CN101168476A (en) * | 2007-10-12 | 2008-04-30 | 福耀玻璃工业集团股份有限公司 | Low radiation coated glass capable of being bended by baking |
| CN101600779A (en) * | 2006-10-30 | 2009-12-09 | 默克专利股份有限公司 | Printable medium for etching transparent and conductive oxide layers |
| CN201936899U (en) * | 2010-11-30 | 2011-08-17 | 阿特斯(中国)投资有限公司 | Double-glass-layer photovoltaic module |
| CN202053685U (en) * | 2011-04-18 | 2011-11-30 | 北京工业大学 | Laser fusing etching marking apparatus based on transparent materials |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6514621B1 (en) * | 1997-12-24 | 2003-02-04 | Ppg Industries Ohio, Inc. | Patterned coated articles and methods for producing the same |
| US7736750B2 (en) * | 2006-12-14 | 2010-06-15 | Ppg Industries Ohio, Inc. | Coated non-metallic sheet having a brushed metal appearance, and coatings for and method of making same |
-
2012
- 2012-01-12 CN CN 201210065456 patent/CN102603211B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1836061A (en) * | 2003-08-19 | 2006-09-20 | 三菱化学株式会社 | Etching solution for titanium-containing layer and etching method for peptide-containing layer |
| CN101600779A (en) * | 2006-10-30 | 2009-12-09 | 默克专利股份有限公司 | Printable medium for etching transparent and conductive oxide layers |
| CN101168476A (en) * | 2007-10-12 | 2008-04-30 | 福耀玻璃工业集团股份有限公司 | Low radiation coated glass capable of being bended by baking |
| CN201936899U (en) * | 2010-11-30 | 2011-08-17 | 阿特斯(中国)投资有限公司 | Double-glass-layer photovoltaic module |
| CN202053685U (en) * | 2011-04-18 | 2011-11-30 | 北京工业大学 | Laser fusing etching marking apparatus based on transparent materials |
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| Publication number | Publication date |
|---|---|
| CN102603211A (en) | 2012-07-25 |
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|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Application publication date: 20120725 Assignee: ZHENGZHOU FUYAO GLASS CO., LTD. Assignor: Fuyao Glass Industry Group Co., Ltd. Contract record no.: 2014350000004 Denomination of invention: Method for making marks on glass Granted publication date: 20131030 License type: Exclusive License Record date: 20140120 |
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