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CN102568864A - Capacitor structure and manufacturing method thereof - Google Patents

Capacitor structure and manufacturing method thereof Download PDF

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CN102568864A
CN102568864A CN2010105957919A CN201010595791A CN102568864A CN 102568864 A CN102568864 A CN 102568864A CN 2010105957919 A CN2010105957919 A CN 2010105957919A CN 201010595791 A CN201010595791 A CN 201010595791A CN 102568864 A CN102568864 A CN 102568864A
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capacitor structure
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CN102568864B (en
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刘元文
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Rong Tantalum Technology Co ltd
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Abstract

本发明一种电容结构及其制造方法,所述电容结构包含:一个第一导体层、一介电层及一个第二导体层,该第一导体层具有一个第一金属材料与一个第二金属材料,该第一金属材料间形成有间隙,且该第二金属材料经由热熔填入所述间隙,如此,该第一导体层可通过其第一金属材料与一个第二金属材料相互间的热熔关达到可有效降低热处理温度,且该电容结构同时达到提高导电系数与增加整体强度的功效。

Figure 201010595791

The present invention provides a capacitor structure and a manufacturing method thereof. The capacitor structure comprises: a first conductor layer, a dielectric layer and a second conductor layer. The first conductor layer comprises a first metal material and a second metal material. A gap is formed between the first metal materials, and the second metal material is filled into the gap by heat melting. Thus, the first conductor layer can achieve the effect of effectively reducing the heat treatment temperature by heat melting the first metal material and the second metal material, and the capacitor structure can achieve the effect of improving the conductivity and increasing the overall strength at the same time.

Figure 201010595791

Description

电容结构及其制造方法Capacitor structure and manufacturing method thereof

技术领域 technical field

本发明涉及一种电容结构及其制造方法,尤指一种利用结合复合材料提高导电系数并降低热处理温度的电容结构及其制造方法。The invention relates to a capacitor structure and a manufacturing method thereof, in particular to a capacitor structure and a manufacturing method thereof which use combined composite materials to increase conductivity and reduce heat treatment temperature.

背景技术 Background technique

近年来,对于电子集成电路要求以更低电压的动作、高频率化、低杂讯化,针对固体电解电容器,对于ESR(等效串联电阻equivalent seriesresistance)的减低、ESL(等效串联电感equivalent series inductance)的减低的要求也增加中。适用于固体电解电容器的阳极材料的金属粉末,可例举如钽、铌、钛、钨、钼等。此等中,尤其使用钽的电容器,由于ESR低且电容(capacitance)大,故快速地普及作为移动电话(cell phone)或个人电脑(personal computer)等的零件。而最近,则诉求电容器的更高容量化与低ESR化。为了将电容器的电容增为更大,正开发比表面积(specific surfacearea)大的微细钽粉末作为其阳极材料。In recent years, electronic integrated circuits have been required to operate at lower voltage, higher frequency, and lower noise. For solid electrolytic capacitors, the reduction of ESR (equivalent series resistance), ESL (equivalent series inductance) Inductance) reduction requirements are also increasing. Metal powders suitable for anode materials of solid electrolytic capacitors include, for example, tantalum, niobium, titanium, tungsten, and molybdenum. Among them, capacitors using tantalum are rapidly spreading as parts of cell phones, personal computers, and the like due to their low ESR and high capacitance. Recently, higher capacity and lower ESR of capacitors have been demanded. In order to increase the capacitance of capacitors to a greater extent, fine tantalum powder with a large specific surface area is being developed as its anode material.

请参阅图1所示,是现有的固体电解电容器,其固体电解电容器10包括有一钽烧结体11,该钽烧结体11表面形成有一氧化钽层12,该氧化钽层12上依序披覆有一固体电解质13、一石墨层14及一银层15,而此固体电解电容器10的制造步骤为如下述:首先,在上述所得到的钽粉末中添加粘结剂,使合计为3~5质量%,充分地混合后,凭借压模成形调制长2.4mm、宽3.4mm、厚1.8mm的长方体的粒状物。压模时的荷重较佳为3~15MN(Mega Newton)/m2,压模体的体密度较佳为3200~4000kg/m3,较佳的粘结剂可例示如由樟脑、硬脂酸、聚乙烯醇、萘等选择的至少一种,将该粒状物依约以2900~3020℃加热使的烧结。另外,烧结温度可配合比表面积适当设定。如此,可得到多孔性的钽烧结体11。将所得的钽烧结体11进行化成处理,使氧化钽层12形成于钽烧结体11的表面,制成阳极。化成处理为例如在温度80℃、浓度0.6质量%的磷酸水溶液中,以140A/g的电流密度升压至10~20V并进行处理6小时。Please refer to Fig. 1, it is an existing solid electrolytic capacitor, its solid electrolytic capacitor 10 includes a tantalum sintered body 11, a tantalum oxide layer 12 is formed on the surface of the tantalum sintered body 11, and the tantalum oxide layer 12 is coated in sequence There is a solid electrolyte 13, a graphite layer 14, and a silver layer 15, and the manufacturing steps of this solid electrolytic capacitor 10 are as follows: First, add a binder to the tantalum powder obtained above, so that the total is 3 to 5 mass %, after fully mixing, prepare a cuboid granule with a length of 2.4 mm, a width of 3.4 mm, and a thickness of 1.8 mm by means of a compression mold. The load during compression molding is preferably 3-15MN (Mega Newton)/m 2 , the bulk density of the compression-molded body is preferably 3200-4000kg/m 3 , and the preferred binder can be, for example, camphor, stearic acid , polyvinyl alcohol, naphthalene, etc., and the granular material is sintered by heating at 2900-3020°C. In addition, the sintering temperature can be appropriately set according to the specific surface area. In this way, a porous tantalum sintered body 11 can be obtained. The obtained tantalum sintered body 11 is subjected to a chemical conversion treatment to form a tantalum oxide layer 12 on the surface of the tantalum sintered body 11 to form an anode. For the chemical conversion treatment, for example, the temperature is 80° C., and the concentration is 0.6% by mass of phosphoric acid aqueous solution, and the current density of 140 A/g is increased to 10 to 20 V for 6 hours.

其次,在该钽烧结体11的表面上,将聚吡咯(polypyrrole)与聚噻吩(polythiophen)等的固体电解质层13、石墨层14、银层15依此顺序形成。最后将外部端子18(阳极)连接至钽烧结体11,将外部端子19(阴极)凭借导电性接合剂16连接至银层15。最后,以树脂17被覆全体,凭借进行熟化(aging),可得到固体电解电容器10。Next, on the surface of the tantalum sintered body 11, a solid electrolyte layer 13 such as polypyrrole or polythiophene, a graphite layer 14, and a silver layer 15 are formed in this order. Finally, the external terminal 18 (anode) is connected to the tantalum sintered body 11 , and the external terminal 19 (cathode) is connected to the silver layer 15 via the conductive adhesive 16 . Finally, the solid electrolytic capacitor 10 is obtained by covering the entire body with the resin 17 and performing aging.

但该钽粒状物须以2900~3020℃的高温进行加热始能得到多孔性的钽烧结体11,进而造成其须以高温度的热处理仪器进行烧结,与须使用其高成本的热处理仪器且提高施工成本。However, the tantalum particles must be heated at a high temperature of 2900-3020°C to obtain a porous tantalum sintered body 11, which in turn requires high-temperature heat treatment equipment for sintering, and the need to use high-cost heat treatment equipment and increase Construction costs.

以上所述,现有技术具有下列缺点:As mentioned above, the prior art has the following disadvantages:

1.须使用高成本的热处理仪器;1. High-cost heat treatment equipment must be used;

2.须提高施工成本。2. The construction cost must be increased.

于是,有鉴于上述现有品所衍生的各项缺点,本案的发明人遂竭其心智,以从事该行业多年的经验,潜心研究加以创新改良,终于成功研发完成本件「电容结构及其制造方法」案,实为一具功效增进的发明。Therefore, in view of the shortcomings derived from the above-mentioned existing products, the inventor of this case exhausted his brains, used his years of experience in this industry, devoted himself to research, innovated and improved, and finally successfully developed and completed this "capacitor structure and its manufacturing method. "The case is actually an invention with enhanced efficacy.

发明内容 Contents of the invention

本发明的主要目的在提供一种利用结合复合材料以有效降低热处理温度的电容结构及其制造方法。The main purpose of the present invention is to provide a capacitor structure and a manufacturing method thereof which utilize composite materials to effectively reduce the heat treatment temperature.

本发明的主要目的在提供一种利用结合复合材料提高导电系数的电容结构及其制造方法。The main purpose of the present invention is to provide a capacitor structure and its manufacturing method which utilizes composite materials to improve conductivity.

为实现上述目的,本发明采用的技术方案是:In order to achieve the above object, the technical scheme adopted in the present invention is:

一种电容结构,其特征在于,包括:A capacitor structure, characterized in that it comprises:

一个第一导体层,具有第一金属材料与第二金属材料;a first conductor layer, having a first metal material and a second metal material;

一介电层,形成于该第一导体层上;及a dielectric layer formed on the first conductor layer; and

一个第二导体层,设于该介电层相对该第一导体层另一侧位置处。A second conductor layer is arranged on the other side of the dielectric layer opposite to the first conductor layer.

其中:更包括有一个第一外部端子与一个第二外部端子,该第一外部端子与第二外部端子分别穿设所述第一导体层与电性连接所述第二导体层。Wherein: it further includes a first external terminal and a second external terminal, the first external terminal and the second external terminal pass through the first conductor layer and are electrically connected to the second conductor layer respectively.

其中:所述第一金属材料间形成有间隙,该第二金属材料设置于间隙位置处。Wherein: a gap is formed between the first metal materials, and the second metal material is arranged at the position of the gap.

其中:所述第一金属材料是钽(Ta)、铌(Nb)、或钽(Ta)和铌(Nb)的混合物。Wherein: the first metal material is tantalum (Ta), niobium (Nb), or a mixture of tantalum (Ta) and niobium (Nb).

其中:所述第二金属材料是铝(Al)、铜(Cu)、或铝(Al)和铜(Cu)的混合物。Wherein: the second metal material is aluminum (Al), copper (Cu), or a mixture of aluminum (Al) and copper (Cu).

其中:所述介电层是Ta2O5、Nb2O3、或Ta2O5和Nb2O3的混合物。Wherein: the dielectric layer is Ta2O5, Nb2O3, or a mixture of Ta2O5 and Nb2O3 .

其中:所述介电层是Al2O3、CuO、或Al2O3和CuO的混合物。Wherein: the dielectric layer is Al2O3, CuO, or a mixture of Al2O3 and CuO.

其中:所述第二导体层是银(Ag)。Wherein: the second conductor layer is silver (Ag).

其中:所述第一、二外部端子是选自于铝(Al)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、钽(Ta)、铌(Nb)、铝合金(Al Alloy)和银合金(Ag Alloy)所组成的群组之一或该群组任意两种或两种以上物质的混合物。Wherein: the first and second external terminals are selected from aluminum (Al), silver (Ag), copper (Cu), nickel (Ni), tin (Sn), tantalum (Ta), niobium (Nb), aluminum One of the group consisting of alloy (Al Alloy) and silver alloy (Ag Alloy) or a mixture of any two or more substances in this group.

其中:更包括有一固体电解质层与一石墨层,该固体电解质层与石墨层依序设置于介电层上。Wherein: it further includes a solid electrolyte layer and a graphite layer, and the solid electrolyte layer and the graphite layer are sequentially arranged on the dielectric layer.

其中:更包括有一包覆层,所述包覆层是选自于树脂、乙丙橡胶和丁基橡胶所组成的群组之一或该群组任意两种或两种以上物质的混合物。Wherein: it further includes a covering layer, said covering layer is selected from one of the group consisting of resin, ethylene propylene rubber and butyl rubber or a mixture of any two or more substances in this group.

为实现上述目的,本发明采用的技术方案是:In order to achieve the above object, the technical scheme adopted in the present invention is:

一种电容结构的制造方法,其特征在于,包括下列步骤:A method for manufacturing a capacitor structure, characterized in that it comprises the following steps:

形成一个具有第一金属材料与第二金属材料的第一导体层;forming a first conductor layer having a first metal material and a second metal material;

在该第一导体层上形成一个介电层;及forming a dielectric layer on the first conductor layer; and

在相对该第一导体层另一侧位置处形成一个第二导体层。A second conductor layer is formed at a position opposite to the other side of the first conductor layer.

其中:更包括提供一个第一外部端子,使该第一导体层披覆于该第一外部端子的表面。Wherein: further comprising providing a first external terminal, so that the first conductor layer covers the surface of the first external terminal.

其中:更包括提供一个第二外部端子,使该第二导体层经由一导电性接合剂电性连接该第二外部端子。Wherein: further comprising providing a second external terminal, so that the second conductor layer is electrically connected to the second external terminal through a conductive adhesive.

其中:所述第二金属材料经由600℃-1000℃的热熔填入所述第一金属材料间的间隙并结合于所述第一金属材料。Wherein: the second metal material is filled into the gap between the first metal materials through thermal melting at 600°C-1000°C and bonded to the first metal material.

其中:所述第一金属材料是钽(Ta)、铌(Nb)、或钽(Ta)和铌(Nb)的混合物。Wherein: the first metal material is tantalum (Ta), niobium (Nb), or a mixture of tantalum (Ta) and niobium (Nb).

其中:所述第二金属材料是铝(Al)、铜(Cu)、或铝(Al)和铜(Cu)的混合物。Wherein: the second metal material is aluminum (Al), copper (Cu), or a mixture of aluminum (Al) and copper (Cu).

其中:所述介电层是Ta2O5、Nb2O3、或Ta2O5和Nb2O3的混合物。Wherein: the dielectric layer is Ta2O5, Nb2O3, or a mixture of Ta2O5 and Nb2O3 .

其中:所述介电层是Al2O3、CuO、或Al2O3和CuO的混合物。Wherein: the dielectric layer is Al2O3, CuO, or a mixture of Al2O3 and CuO.

其中:所述第二导体层是银(Ag)。Wherein: the second conductor layer is silver (Ag).

其中:所述第一、二外部端子是选自于铝(Al)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、钽(Ta)、铌(Nb)、铝合金(Al Alloy)和银合金(Ag Alloy)所组成的群组之一或该群组任意两种或两种以上物质的混合物。Wherein: the first and second external terminals are selected from aluminum (Al), silver (Ag), copper (Cu), nickel (Ni), tin (Sn), tantalum (Ta), niobium (Nb), aluminum One of the group consisting of alloy (Al Alloy) and silver alloy (Ag Alloy) or a mixture of any two or more substances in this group.

其中:所述第二导体层是银(Ag)。Wherein: the second conductor layer is silver (Ag).

其中:更包括形成有一固体电解质层与一石墨层,该固体电解质层与石墨层依序成形于介电层上。Wherein: it further includes forming a solid electrolyte layer and a graphite layer, and the solid electrolyte layer and the graphite layer are sequentially formed on the dielectric layer.

其中:更包括形成有一包覆层,所述包覆层是选自于树脂、乙丙橡胶和丁基橡胶所组成的群组之一或该群组任意两种或两种以上物质的混合物。Wherein: further comprising forming a covering layer, said covering layer is selected from one of the group consisting of resin, ethylene propylene rubber and butyl rubber or a mixture of any two or more substances in this group.

与现有技术相比较,本发明具有的有益效果是:该第一导体层可通过其第一金属材料与一个第二金属材料相互间的热熔关系达到可有效降低热处理温度,并同时达到提高导电系数的功效。Compared with the prior art, the present invention has the beneficial effects that: the first conductor layer can effectively reduce the heat treatment temperature through the thermal melting relationship between its first metal material and a second metal material, and at the same time achieve an increase in temperature. The effect of conductivity.

附图说明 Description of drawings

图1是现有固体电解电容器的剖视示意图;Fig. 1 is the sectional schematic diagram of existing solid electrolytic capacitor;

图2是本发明电容结构的剖视示意图;Fig. 2 is a schematic cross-sectional view of a capacitor structure of the present invention;

图3是本发明电容结构的局部剖视示意图;Fig. 3 is a partial cross-sectional schematic diagram of a capacitor structure of the present invention;

图4是本发明电容结构制造方法的流程图。Fig. 4 is a flow chart of the manufacturing method of the capacitor structure of the present invention.

附图标记说明:电容结构20;第一导体层30;第一金属材料31;第二金属材料32;第一外部端子33;介电层40;固体电解质层41;石墨层42;第二导体层50;导电性接合剂51;第二外部端子52;包覆层60。Description of reference numerals: capacitor structure 20; first conductor layer 30; first metal material 31; second metal material 32; first external terminal 33; dielectric layer 40; solid electrolyte layer 41; graphite layer 42; second conductor layer 50 ; conductive adhesive 51 ; second external terminal 52 ; cladding layer 60 .

具体实施方式 Detailed ways

本发明的上述目的及其结构与功能上的特性,将依据所附图式的较佳实施例予以说明。The above-mentioned purpose of the present invention and its structural and functional characteristics will be described according to the preferred embodiments of the accompanying drawings.

请参阅图2所示,是本发明电容结构的剖视示意图,所述电容结构20包含:一个第一导体层30具有一个第一金属材料31与一个第二金属材料32,且该第一导体层30披覆于一个第一外部端子33的表面上,而该第一金属材料31间形成有间隙,与该第二金属材料32设置于间隙位置处并成形于该第一外部端子33表面,又该第一金属材料31上形成有一介电层40,并在该介电层40上依序设置有一固体电解质层41与一石墨层42,该石墨层42上又披覆有一个第二导体层50,该第二导体层50又电性连接有一个第二外部端子52,并经由一包覆层60包覆其第二导体层50与第二外部端子52的一端位置处;Please refer to FIG. 2 , which is a schematic cross-sectional view of the capacitance structure of the present invention. The capacitance structure 20 includes: a first conductor layer 30 having a first metal material 31 and a second metal material 32, and the first conductor The layer 30 is covered on the surface of a first external terminal 33, and a gap is formed between the first metal material 31, and the second metal material 32 is arranged at the gap position and formed on the surface of the first external terminal 33, In addition, a dielectric layer 40 is formed on the first metal material 31, and a solid electrolyte layer 41 and a graphite layer 42 are sequentially arranged on the dielectric layer 40, and a second conductor is covered on the graphite layer 42. Layer 50, the second conductor layer 50 is electrically connected to a second external terminal 52, and one end of the second conductor layer 50 and the second external terminal 52 is covered by a cladding layer 60;

其中所述第一金属材料31选自于钽(Ta)、铌(Nb)的金属群组之一,或者所述第一金属材料31是钽(Ta)和铌(Nb)的混合物,而该第二金属材料32选自于铝(Al)、铜(Cu)的金属群组之一,或者该第二金属材料32是铝(Al)和铜(Cu)的混合物,因此该第一金属材料31披覆于该第一外部端子33表面时形成有所述间隙,而该第二金属材料32则设置于间隙位置处,且该第一金属材料31与第二金属材料32表面同时形成有所述介电层40,而其介电层40选自于Ta2O5、Nb2O3所组成的群组之一或选自于Al2O3、CuO所组成的群组之一,或者该介电层40是Ta2O5和Nb2O3的混合物或Al2O3和CuO的混合物,且该介电层40上依序设置有所述固体电解质层41与石墨层42,并依序成形有所述第二导体层50,而其第二导体层50选自银(Ag),该第二导体层50经由导电性接合剂51电性连接所述该第二外部端子52,且该第一外部端子33与该第二外部端子52选自于铝(Al)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、钽(Ta)、铌(Nb)、铝合金(Al Alloy)、银合金(Ag Alloy)所组成的群组之一或该群组任意两种或两种以上物质的混合物,又其包覆层60选自树脂、乙丙橡胶、丁基橡胶所组成的群组之一或该群组任意两种或两种以上物质的混合物,并包覆其第二导体层50与第二外部端子52的一端位置处。Wherein the first metal material 31 is selected from one of the metal groups of tantalum (Ta) and niobium (Nb), or the first metal material 31 is a mixture of tantalum (Ta) and niobium (Nb), and the The second metal material 32 is selected from one of the metal groups of aluminum (Al) and copper (Cu), or the second metal material 32 is a mixture of aluminum (Al) and copper (Cu), so the first metal material 31 covers the surface of the first external terminal 33 to form the gap, and the second metal material 32 is arranged at the position of the gap, and the surface of the first metal material 31 and the second metal material 32 are formed simultaneously. The dielectric layer 40, and the dielectric layer 40 is selected from one of the group consisting of Ta 2 O 5 and Nb 2 O 3 or selected from one of the group consisting of Al 2 O 3 and CuO, or The dielectric layer 40 is a mixture of Ta2O5 and Nb2O3 or a mixture of Al2O3 and CuO , and the solid electrolyte layer 41 and the graphite layer 42 are sequentially arranged on the dielectric layer 40, and The second conductor layer 50 is sequentially formed, and the second conductor layer 50 is selected from silver (Ag), the second conductor layer 50 is electrically connected to the second external terminal 52 via a conductive adhesive 51, And the first external terminal 33 and the second external terminal 52 are selected from aluminum (Al), silver (Ag), copper (Cu), nickel (Ni), tin (Sn), tantalum (Ta), niobium (Nb ), aluminum alloy (Al Alloy), silver alloy (Ag Alloy), or a mixture of any two or more substances in this group, and its coating layer 60 is selected from resin, ethylene-propylene rubber , one of the group consisting of butyl rubber or a mixture of any two or more substances in this group, and wrap the second conductor layer 50 and one end of the second external terminal 52 .

请同时配合参阅图2、图3、图4所示,是本发明电容结构的剖视示意图、局部剖视示意图及方法流程图,包含下列步骤:Please cooperate and refer to Fig. 2, Fig. 3, shown in Fig. 4 at the same time, it is the sectional schematic diagram, partial sectional schematic diagram and method flow chart of capacitor structure of the present invention, comprises the following steps:

Sp1:提供一个第一外部端子,并在该第一外部端子表面上形成一具有第一金属材料与第二金属材料的第一导体层;Sp1: providing a first external terminal, and forming a first conductor layer having a first metal material and a second metal material on the surface of the first external terminal;

Sp2:经由热熔将该第二金属材料填入所述第一金属材料间的间隙并结合于所述第一金属材料;Sp2: filling the second metal material into the gap between the first metal materials and bonding to the first metal material through hot melting;

Sp3:在该第一导体层上形成一介电层;Sp3: forming a dielectric layer on the first conductor layer;

Sp4:在该介电层上依序形成一固体电解质层与一石墨层;Sp4: sequentially forming a solid electrolyte layer and a graphite layer on the dielectric layer;

Sp5:在该石墨层上披覆有一个第二导体层;Sp5: a second conductor layer is coated on the graphite layer;

Sp6:提供一个第二外部端子,并将该第二外部端子经由一导电性接合剂电性连接于第二导体层;Sp6: providing a second external terminal, and electrically connecting the second external terminal to the second conductor layer via a conductive adhesive;

Sp7:在该第二导体层与第一、二外部端子的一端位置处形成一包覆层。Sp7: forming a cladding layer at the position of the second conductor layer and one end of the first and second external terminals.

其中该第一外部端子33表面披覆有所述第一导体层30,其中所述第一金属材料31选自于钽(Ta)、铌(Nb)的金属群组之一,或者所述第一金属材料31是钽(Ta)和铌(Nb)的混合物,而该第二金属材料32选自于铝(Al)、铜(Cu)的金属群组之一,或者该第二金属材料32是铝(Al)和铜(Cu)的混合物,并以600℃-1000℃的高温加热,使该第二金属材料32热熔填入所述第一金属材料31间的间隙并结合于所述第一金属材料31,且该第一金属材料31与第二金属材料32表面同时形成有所述介电层40,而其介电层40选自于Ta2O5、Nb2O3所组成的群组之一或选自于Al2O3、CuO所组成的群组之一,或者该介电层40是Ta2O5和Nb2O3的混合物或Al2O3和CuO的混合物,并在该介电层40上依序成形有所述固体电解质层41与石墨层42,再在该石墨层42上成形有所述第二导体层50,而该第二导体层50选自银(Ag),并将该第二导体层50经由导电性接合剂51电性连接所述该第二外部端子52,且该第一外部端子33与该第二外部端子52选自于铝(Al)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、钽(Ta)、铌(Nb)、铝合金(Al Alloy)、银合金(Ag Alloy)所组成的群组之一或该群组任意两种或两种以上物质的混合物,并于其第二导体层50与第二外部端子52的一端位置处包覆所述包覆层60,其包覆层60选自树脂、乙丙橡胶、丁基橡胶所组成的群组之一或该群组任意两种或两种以上物质的混合物,如此,该第一导体层30可通过其第一金属材料31与一个第二金属材料32相互间的热熔关系,使其第二金属材料可填入所述第一金属材料31间的间隙,以有效降低热处理温度,并令该电容结构20达到提高导电系数的功效。The surface of the first external terminal 33 is covered with the first conductor layer 30, wherein the first metal material 31 is selected from one of the metal groups of tantalum (Ta) and niobium (Nb), or the first A metal material 31 is a mixture of tantalum (Ta) and niobium (Nb), and the second metal material 32 is selected from one of the metal groups of aluminum (Al) and copper (Cu), or the second metal material 32 It is a mixture of aluminum (Al) and copper (Cu), and is heated at a high temperature of 600°C-1000°C, so that the second metal material 32 is melted into the gap between the first metal materials 31 and bonded to the The first metal material 31, and the dielectric layer 40 is formed on the surface of the first metal material 31 and the second metal material 32 at the same time, and the dielectric layer 40 is selected from the composition of Ta 2 O 5 and Nb 2 O 3 One of the group or selected from one of the group consisting of Al 2 O 3 and CuO, or the dielectric layer 40 is a mixture of Ta 2 O 5 and Nb 2 O 3 or a mixture of Al 2 O 3 and CuO , and the solid electrolyte layer 41 and the graphite layer 42 are sequentially formed on the dielectric layer 40, and then the second conductor layer 50 is formed on the graphite layer 42, and the second conductor layer 50 is selected from Silver (Ag), and the second conductor layer 50 is electrically connected to the second external terminal 52 via a conductive adhesive 51, and the first external terminal 33 and the second external terminal 52 are selected from aluminum ( Al), silver (Ag), copper (Cu), nickel (Ni), tin (Sn), tantalum (Ta), niobium (Nb), aluminum alloy (Al Alloy), silver alloy (Ag Alloy) One of the group or a mixture of any two or more substances in the group, and the cladding layer 60 is coated at one end of the second conductor layer 50 and the second external terminal 52, and the cladding layer 60 One of the group consisting of resin, ethylene propylene rubber, and butyl rubber, or a mixture of any two or more substances in this group, so that the first conductor layer 30 can be connected with the first metal material 31 The thermal fusion relationship between a second metal material 32 enables the second metal material to fill the gap between the first metal materials 31 to effectively reduce the heat treatment temperature and make the capacitor structure 20 achieve the effect of increasing the conductivity effect.

以上说明对本发明而言只是说明性的,而非限制性的,本领域普通技术人员理解,在不脱离权利要求所限定的精神和范围的情况下,可作出许多修改、变化或等效,但都将落入本发明的保护范围之内。The above description is only illustrative of the present invention, rather than restrictive. Those of ordinary skill in the art understand that many modifications, changes or equivalents can be made without departing from the spirit and scope defined in the claims, but All will fall within the protection scope of the present invention.

Claims (24)

1.一种电容结构,其特征在于,包括:1. A capacitor structure, characterized in that, comprising: 一个第一导体层,具有第一金属材料与第二金属材料;a first conductor layer, having a first metal material and a second metal material; 一介电层,形成于该第一导体层上;及a dielectric layer formed on the first conductor layer; and 一个第二导体层,设于该介电层相对该第一导体层另一侧位置处。A second conductor layer is arranged on the other side of the dielectric layer opposite to the first conductor layer. 2.根据权利要求1所述的电容结构,其特征在于:更包括有一个第一外部端子与一个第二外部端子,该第一外部端子与第二外部端子分别穿设所述第一导体层与电性连接所述第二导体层。2. The capacitive structure according to claim 1, further comprising a first external terminal and a second external terminal, the first external terminal and the second external terminal pass through the first conductor layer respectively electrically connected to the second conductor layer. 3.根据权利要求1所述的电容结构,其特征在于:所述第一金属材料间形成有间隙,该第二金属材料设置于间隙位置处。3 . The capacitor structure according to claim 1 , wherein a gap is formed between the first metal materials, and the second metal material is disposed at a position of the gap. 4 . 4.根据权利要求1所述的电容结构,其特征在于:所述第一金属材料是钽(Ta)、铌(Nb)、或钽(Ta)和铌(Nb)的混合物。4. The capacitor structure according to claim 1, wherein the first metal material is tantalum (Ta), niobium (Nb), or a mixture of tantalum (Ta) and niobium (Nb). 5.根据权利要求1所述的电容结构,其特征在于:所述第二金属材料是铝(Al)、铜(Cu)、或铝(Al)和铜(Cu)的混合物。5. The capacitor structure according to claim 1, wherein the second metal material is aluminum (Al), copper (Cu), or a mixture of aluminum (Al) and copper (Cu). 6.根据权利要求1所述的电容结构,其特征在于:所述介电层是Ta2O5、Nb2O3、或Ta2O5和Nb2O3的混合物。6. The capacitor structure according to claim 1, wherein the dielectric layer is Ta2O5, Nb2O3, or a mixture of Ta2O5 and Nb2O3 . 7.根据权利要求1所述的电容结构,其特征在于:所述介电层是Al2O3、CuO、或Al2O3和CuO的混合物。7. The capacitor structure according to claim 1, wherein the dielectric layer is Al2O3, CuO, or a mixture of Al2O3 and CuO. 8.根据权利要求1所述的电容结构,其特征在于:所述第二导体层是银(Ag)。8. The capacitor structure according to claim 1, wherein the second conductor layer is silver (Ag). 9.根据权利要求2所述的电容结构,其特征在于:所述第一、二外部端子是选自于铝(Al)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、钽(Ta)、铌(Nb)、铝合金(Al Alloy)和银合金(Ag Alloy)所组成的群组之一或该群组任意两种或两种以上物质的混合物。9. The capacitor structure according to claim 2, characterized in that: said first and second external terminals are selected from aluminum (Al), silver (Ag), copper (Cu), nickel (Ni), tin ( One of the group consisting of Sn), tantalum (Ta), niobium (Nb), aluminum alloy (Al Alloy) and silver alloy (Ag Alloy) or a mixture of any two or more substances in this group. 10.根据权利要求1所述的电容结构,其特征在于:更包括有一固体电解质层与一石墨层,该固体电解质层与石墨层依序设置于介电层上。10 . The capacitor structure according to claim 1 , further comprising a solid electrolyte layer and a graphite layer, and the solid electrolyte layer and the graphite layer are sequentially disposed on the dielectric layer. 11 . 11.根据权利要求10所述的电容结构,其特征在于:更包括有一包覆层,所述包覆层是选自于树脂、乙丙橡胶和丁基橡胶所组成的群组之一或该群组任意两种或两种以上物质的混合物。11. The capacitor structure according to claim 10, characterized in that: further comprising a coating layer, the coating layer is selected from one of the group consisting of resin, ethylene propylene rubber and butyl rubber or the Group A mixture of any two or more substances. 12.一种电容结构的制造方法,其特征在于,包括下列步骤:12. A method for manufacturing a capacitor structure, comprising the following steps: 形成一个具有第一金属材料与第二金属材料的第一导体层;forming a first conductor layer having a first metal material and a second metal material; 在该第一导体层上形成一个介电层;及forming a dielectric layer on the first conductor layer; and 在相对该第一导体层另一侧位置处形成一个第二导体层。A second conductor layer is formed at a position opposite to the other side of the first conductor layer. 13.根据权利要求12所述的电容结构的制造方法,其特征在于:更包括提供一个第一外部端子,使该第一导体层披覆于该第一外部端子的表面。13. The manufacturing method of the capacitor structure according to claim 12, further comprising: providing a first external terminal, so that the first conductive layer covers the surface of the first external terminal. 14.根据权利要求12所述的电容结构的制造方法,其特征在于:更包括提供一个第二外部端子,使该第二导体层经由一导电性接合剂电性连接该第二外部端子。14. The manufacturing method of the capacitor structure according to claim 12, further comprising providing a second external terminal, so that the second conductor layer is electrically connected to the second external terminal through a conductive adhesive. 15.根据权利要求12所述的电容结构的制造方法,其特征在于:所述第二金属材料经由600℃-1000℃的热熔填入所述第一金属材料间的间隙并结合于所述第一金属材料。15. The manufacturing method of the capacitor structure according to claim 12, characterized in that: the second metal material is filled into the gap between the first metal materials through thermal fusion at 600°C-1000°C and combined with the first metal material. 16.根据权利要求12所述的电容结构的制造方法,其特征在于:所述第一金属材料是钽(Ta)、铌(Nb)、或钽(Ta)和铌(Nb)的混合物。16. The method for manufacturing a capacitor structure according to claim 12, wherein the first metal material is tantalum (Ta), niobium (Nb), or a mixture of tantalum (Ta) and niobium (Nb). 17.根据权利要求12所述的电容结构的制造方法,其特征在于:所述第二金属材料是铝(Al)、铜(Cu)、或铝(Al)和铜(Cu)的混合物。17. The method for manufacturing a capacitor structure according to claim 12, wherein the second metal material is aluminum (Al), copper (Cu), or a mixture of aluminum (Al) and copper (Cu). 18.根据权利要求12所述的电容结构的制造方法,其特征在于:所述介电层是Ta2O5、Nb2O3、或Ta2O5和Nb2O3的混合物。18. The method for manufacturing a capacitor structure according to claim 12, wherein the dielectric layer is Ta2O5, Nb2O3, or a mixture of Ta2O5 and Nb2O3 . 19.根据权利要求12所述的电容结构的制造方法,其特征在于:所述介电层是Al2O3、CuO、或Al2O3和CuO的混合物。19. The method for manufacturing a capacitor structure according to claim 12, wherein the dielectric layer is Al2O3, CuO, or a mixture of Al2O3 and CuO . 20.根据权利要求12所述的电容结构的制造方法,其特征在于:所述第二导体层是银(Ag)。20. The method for manufacturing a capacitor structure according to claim 12, wherein the second conductor layer is silver (Ag). 21.根据权利要求13或14所述的电容结构的制造方法,其特征在于:所述第一、二外部端子是选自于铝(Al)、银(Ag)、铜(Cu)、镍(Ni)、锡(Sn)、钽(Ta)、铌(Nb)、铝合金(Al Alloy)和银合金(Ag Alloy)所组成的群组之一或该群组任意两种或两种以上物质的混合物。21. The manufacturing method of a capacitor structure according to claim 13 or 14, characterized in that: said first and second external terminals are selected from aluminum (Al), silver (Ag), copper (Cu), nickel ( One of the group consisting of Ni), tin (Sn), tantalum (Ta), niobium (Nb), aluminum alloy (Al Alloy) and silver alloy (Ag Alloy) or any two or more substances in this group mixture. 22.根据权利要求12所述的电容结构的制造方法,其特征在于:所述第二导体层是银(Ag)。22. The method for manufacturing a capacitor structure according to claim 12, wherein the second conductor layer is silver (Ag). 23.根据权利要求12所述的电容结构的制造方法,其特征在于:更包括形成有一固体电解质层与一石墨层,该固体电解质层与石墨层依序成形于介电层上。23. The method for manufacturing a capacitor structure according to claim 12, further comprising forming a solid electrolyte layer and a graphite layer, the solid electrolyte layer and the graphite layer being sequentially formed on the dielectric layer. 24.根据权利要求12所述的电容结构的制造方法,其特征在于:更包括形成有一包覆层,所述包覆层是选自于树脂、乙丙橡胶和丁基橡胶所组成的群组之一或该群组任意两种或两种以上物质的混合物。24. The method for manufacturing a capacitor structure according to claim 12, further comprising forming a coating layer, the coating layer is selected from the group consisting of resin, ethylene-propylene rubber and butyl rubber One or a mixture of any two or more substances of this group.
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