CN102565938A - Low-loss surface plasmon polariton optical waveguide based on double-layer metal - Google Patents
Low-loss surface plasmon polariton optical waveguide based on double-layer metal Download PDFInfo
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Abstract
The invention discloses a low-loss surface plasmon polariton optical waveguide based on double-layer metal. A cross section of a waveguide structure comprises a substrate layer (1), a metal layer (2) which is positioned on the substrate layer, a low-refractive-index medium layer (3) which is positioned on the metal layer (2), a high-refractive-index medium area (4) which is embedded into the low-refractive-index medium layer (3), a metal layer (5) which is positioned on the low-refractive-index medium layer (3), and a cladding layer (6), wherein the high-refractive-index medium area (4) is coupled with the two metal layers (2 and 5) which are adjacent to the high-refractive-index medium area (4), so that an optical field can be remarkably limited in the low-refractive-index medium layer (3) and the high-refractive-index medium area (4), and low transmission loss is realized. The optical waveguide is matched with the conventional process and can be applied to construction of various kinds of passive photon devices. Moreover, with the metal layer on the substrate layer in the waveguide, the waveguide can be connected with an external electrode possibly, so the waveguide can be applied to the fields of electro-optical modulation, thermo-optical modulation and the like.
Description
Technical field
The present invention relates to the optical waveguide technique field, be specifically related to a kind of low-loss surface plasmon optical waveguide based on double-level-metal.
Background technology
The surface plasmon optical waveguide technology has become one of hot research field of nanophotonics at present.Surface plasmons is the non-electromagnetic radiation pattern that metal surface free electron and incident photon intercouple and form, and it is a kind of mixed activation attitude of local in metal and dielectric surface propagation.This pattern is present near metal and the medium interface, and its field intensity is reaching maximum at the interface, and all is exponential decay along the direction perpendicular to the interface in the both sides, interface.Surface plasmons has stronger field limited characteristic, can field energy be constrained in the zone of bulk much smaller than its free space transmission wavelength, and its character can change with the metal surface structural change.Surface plasmon wave is led the restriction that can break through diffraction limit, light field is constrained in tens nanometers even the littler scope, and produce a significant enhancement effect.At present surface plasmon optical waveguide just with its unique mould field limitation capability and can transmit the photoelectricity signal simultaneously, special advantages such as adjustable demonstrates great potential in the nanophotonics field, and at aspects such as the super-resolution imaging of nano-photon chip, modulator, coupling mechanism and switch, nano laser, breakthrough diffraction limit and biology sensors important application prospects is arranged.
The conventional surface plasmon optical waveguide structure mainly is divided into medium/medium/metal type waveguide and medium/metal/metal mold waveguide.Wherein, medium/medium/metal type transmission loss of optical waveguide is lower, but relatively poor mould field limitation capability has restricted its application in the high integration light path; On the other hand, medium/metal/metal mold optical waveguide has very strong mould field limitation capability, but its loss is too big, causes it can't realize long transmission apart from light signal.
The present invention has then proposed a kind of low-loss medium/metal/metal mold surface plasmon optical waveguide structure.Adopt the single and uniform dielectric layer in traditional metal/medium/metal mold waveguide, the dielectric layer of being carried in the waveguide then is made up of the high and low refractive index dielectric material.The notion of hybrid waveguide has been used for reference in the design of whole wave guide, utilizes low refractive index dielectric to fill as cushion between high refractive index medium and the metal level.This waveguide has kept the strong mould field limitation capability of medium/metal/metallic type structure, and the hybrid waveguide design philosophy helps further reducing the wastage simultaneously.Institute's waveguiding structure of carrying and plane processing technology are complementary, and can be used as the base components that makes up integrated photonic device and photon chip.
Summary of the invention
The objective of the invention is further to reduce the loss of traditional metal/medium/metal mold waveguide, propose a kind of low-loss surface plasmon optical waveguide structure based on double-level-metal.
The invention provides a kind of low-loss surface plasmon optical waveguide based on double-level-metal, its xsect comprises basalis, be arranged in metal level on the basalis, be positioned at low refractive index dielectric layer on the metal level, be embedded in the low refractive index dielectric layer the high refractive index medium zone, be positioned at metal level and covering on the low refractive index dielectric layer; Wherein, The width that is positioned at metal level, the low refractive index dielectric layer on the basalis and is positioned at the metal level on the low refractive index dielectric layer equate and be the light signal that transmitted wavelength 0.09-0.5 doubly, the height that is positioned at the metal level on the basalis and the height that is positioned at the metal level on the low refractive index dielectric layer be the light signal that transmitted wavelength 0.006-0.13 doubly; The height of low refractive index dielectric layer be the light signal that transmitted wavelength 0.009-0.3 doubly; The width that is embedded in the high refractive index medium zone in the low refractive index dielectric layer be the light signal that transmitted wavelength 0.03-0.5 doubly; And be not more than the width of low refractive index dielectric layer; Highly be the light signal that transmitted wavelength 0.003-0.29 doubly; And less than the height of low refractive index dielectric layer, high refractive index medium zone does not contact with metal level and the metal level that is positioned on the low refractive index dielectric layer on being positioned at basalis; The metal level that is positioned on the basalis is identical or different material with the material that is positioned at the metal level on the low refractive index dielectric layer; The material refractive index that is embedded in the high refractive index medium zone in the low refractive index dielectric layer is higher than the material refractive index of low refractive index dielectric layer and covering; The material of low refractive index dielectric layer and covering is same material or different materials, and the ratio of the maximal value of the material refractive index of low refractive index dielectric layer and covering and the minimum value of the material refractive index that is embedded in the high refractive index medium zone in the low refractive index dielectric layer is less than 0.75; Be positioned at metal level, the low refractive index dielectric layer on the basalis in the said structure and be positioned at the metal level on the low refractive index dielectric layer the cross section be shaped as rectangle.
The compound substance that the material of the metal level in the said optical waveguide structure constitutes for any or alloy separately in the gold, silver, aluminium, copper, titanium, nickel, chromium that can produce surface plasmons or above-mentioned metal.
Be embedded in the said optical waveguide structure high refractive index medium zone in the low refractive index dielectric layer the cross section be shaped as rectangle, circle, ellipse or trapezoidal in any.
Surface plasmon optical waveguide of the present invention has the following advantages:
The surface plasmon optical waveguide that the present invention designed possesses lower loss than traditional metal/medium/metal mold waveguide, and has kept the mould field limitation capability of sub-wavelength.
The existence of the metal level on the basalis that is comprised in this waveguiding structure is provided convenience for introducing external electrode, thereby conduction becomes possibility when making light signal and electric signal, and the while introducing of electric signal can realize the regulation and control to guide properties.
This waveguide based on be multilayer planar structure, easy-to-use existing planar waveguide processing technology realizes, and can be further used for the design and the making of integrated photonic device.
Description of drawings
Fig. 1 is based on the structural representation of the low-loss surface plasmon optical waveguide of double-level-metal.Zone 1 is a basalis, and zone 2 is a metal level, and it highly is h
2Zone 3 is the low refractive index dielectric layer, and it highly is h
3Zone 4 is for being embedded in the high refractive index medium zone in the low refractive index dielectric layer, and its width is w
4, highly be h
4Zone 5 is for to be positioned at the metal level on the low refractive index dielectric layer, and it highly is h
5The width in zone 2,3,5 is w; The lower surface in zone 4 is h to the minor increment of regional 2 upper surfaces
42, the upper surface in zone 4 is h to the distance of regional 5 lower surfaces
45Zone 6 is a covering.
Fig. 2 is the structural representation of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 1.201 is basalis, n
sBe its refractive index; 202 is metal level, n
mBe its refractive index, h
mBe its height; 203 is the low refractive index dielectric layer, n
lBe its refractive index, h
lBe its height; 204 for being embedded in the high refractive index medium zone in the low refractive index dielectric layer, n
hBe its refractive index, w
hBe its width, h
hBe its height; 205 for being positioned at the metal level on the low refractive index dielectric layer, n
mBe its refractive index, h
mBe its height; 202,203 and 205 width is w; 204 lower surface is h to the minor increment of 202 upper surfaces
g, 204 upper surface is h to the distance of 205 lower surfaces
g206 is covering, n
cBe its refractive index.
Fig. 3 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 1 when being 1.55 μ m.
Fig. 4 is that the effective mode field area of effective refractive index, transmission range, normalization and the restriction factor of the surface plasmon mode formula transmitted in the instance 1 said low-loss surface plasmon optical waveguide based on double-level-metal when being 1.55 μ m of the wavelength of transmitting optical signal is with high refractive index medium peak width w
hChange curve.
Fig. 5 is the structural representation of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 2.501 is basalis, n
sBe its refractive index; 502 is metal level, n
mBe its refractive index, h
mBe its height; 503 is the low refractive index dielectric layer, n
lBe its refractive index, h
lBe its height; 504 for being embedded in the high refractive index medium zone in the low refractive index dielectric layer, n
hBe its refractive index, h
hBe its height; 505 for being positioned at the metal level on the low refractive index dielectric layer, n
mBe its refractive index, h
mBe its height; 502,503,504 and 505 width is w; 504 lower surface is h to the minor increment of 502 upper surfaces
g, 504 upper surface is h to the distance of 505 lower surfaces
g506 is covering, n
cBe its refractive index.
Fig. 6 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 2 when being 1.55 μ m.
Fig. 7 is that the effective mode field area of effective refractive index, transmission range, normalization and the restriction factor of the surface plasmon mode formula transmitted in the instance 2 said low-loss surface plasmon optical waveguides based on double-level-metal when being 1.55 μ m of the wavelength of transmitting optical signal is with height h
hChange curve.
Embodiment
The mode characteristic of surface plasma-wave is the important indicator that characterizes surface plasmon optical waveguide.Wherein the mode characteristic parameter mainly includes and imitates refractive index real part, transmission range and the effective mode field area of normalization.
Transmission range L is defined as the distance when electric field intensity decays to initial value l/e on arbitrary interface, and its expression formula is:
L＝λ/[4π/Im(n
eff)] (1)
Im (n wherein
Eff) be the imaginary part of pattern effective refractive index, λ is the wavelength of transmitting optical signal.
Effectively the calculation expression of mode field area is following:
A
eff＝(∫∫|E(x，y)|
2dxdy)
2/∫∫|E(x，y)|
4dxdy (2)
Wherein, A
EffBe effective mode field area, (x y) is the electric field of surface plasma-wave to E.The effective mode field area that the effective mode field area of normalization calculates for (2) formula and the ratio of the little hole area of diffraction limit.The area of diffraction limit aperture defines as follows:
A
0＝λ
2/4 (3)
Wherein, A
0Be the little hole area of diffraction limit, λ is the wavelength of transmitting optical signal.Therefore, the effective mode field area A of normalization is:
A＝A
eff/A
0 (4)
The size of the effective mode field area of normalization characterizes the mould field limitation capability of pattern, and this value is less than the dimension constraint of 1 the corresponding sub-wavelength of situation.Restriction factor characterizes the field intensity limitation capability of surface plasmon optical waveguide, is defined herein as the ratio that contained power in the low refractive index dielectric layer accounts for the waveguide general power.
Instance 1: be embedded in high refractive index medium peak width in the low refractive index dielectric layer less than the width of low refractive index dielectric layer
Fig. 2 is the structural representation of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 1.201 is basalis, n
sBe its refractive index; 202 is metal level, n
mBe its refractive index, h
mBe its height; 203 is the low refractive index dielectric layer, n
lBe its refractive index, h
lBe its height; 204 for being embedded in the high refractive index medium zone in the low refractive index dielectric layer, n
hBe its refractive index, w
hBe its width, h
hBe its height; 205 for being positioned at the metal level on the low refractive index dielectric layer, n
mBe its refractive index, h
mBe its height; 202,203 and 205 width is w; 204 lower surface is h to the minor increment of 202 upper surfaces
g, 204 upper surface is h to the distance of 205 lower surfaces
g206 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 and 203 material is a silicon dioxide, and its refractive index is 1.5; 202 and 205 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 204 material is a silicon, and its refractive index is 3.5; 206 material is made as air, and its refractive index is 1.
In this example, 202,203 and 205 width w=200nm, 202 and 205 height h
m=100nm; 203 height h
l=220nm; 204 height h
h=200nm; Distance h
g=10nm; 204 width w
hSpan be 40-160nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of the accurate symmetrical surface plasmon pattern that 1.55 these waveguides of mum wavelength place are supported.
Fig. 3 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 1 when being 1.55 μ m.Visible by Fig. 3, the slit areas of this pattern between low refractive index dielectric layer especially high refractive index medium zone and metal level has tangible enhancement effect.
Fig. 4 is that the effective mode field area of effective refractive index, transmission range, normalization and the restriction factor of the surface plasmon mode formula transmitted in the instance 1 said low-loss surface plasmon optical waveguide based on double-level-metal when being 1.55 μ m of the wavelength of transmitting optical signal is with high refractive index medium peak width w
hChange curve.Visible by Fig. 4 (a)-(d), the effective refractive index of surface plasmon mode formula is with w
mIncrease and increase, and transmission range, mode field area and restriction factor are all with w
mIncrease and reduce.In gamut, the transmission range of pattern remains at tens of microns, and keeps the mode field area of dark sub-wavelength.The result of calculation of restriction factor shows have sizable luminous energy to be limited in the low refractive index dielectric layer simultaneously.
Instance 2: the high refractive index medium peak width that is embedded in the low refractive index dielectric layer equates with the width of low refractive index dielectric layer
Fig. 5 is the structural representation of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 2.501 is basalis, n
sBe its refractive index; 502 is metal level, n
mBe its refractive index, h
mBe its height; 503 is the low refractive index dielectric layer, n
lBe its refractive index, h
lBe its height; 504 for being embedded in the high refractive index medium zone in the low refractive index dielectric layer, n
hBe its refractive index, h
hBe its height; 505 for being positioned at the metal level on the low refractive index dielectric layer, n
mBe its refractive index, h
mBe its height; 502,503,504 and 505 width is w; 504 lower surface is h to the minor increment of 502 upper surfaces
g, 504 upper surface is h to the distance of 505 lower surfaces
g506 is covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 501 and 503 material is a silicon dioxide, and its refractive index is 1.5; 504 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 502 and 505 material is a silicon, and its refractive index is 3.5; 506 material is made as air, and its refractive index is 1.
In this example, 502,503,504 and 505 width w=200nm; 502 and 505 height h
m=100nm; Distance h
g=10nm; 504 height h
hSpan be 100-400nm; Correspondingly, 503 height h
lSpan be 120-420nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of the accurate symmetrical surface plasmon pattern that 1.55 these waveguides of mum wavelength place are supported.
Fig. 6 is the electric-field intensity distribution figure of the wavelength of transmitting optical signal surface plasmon mode formula light field of the said low-loss surface plasmon optical waveguide based on double-level-metal of instance 2 when being 1.55 μ m.Visible by Fig. 6, this pattern the high refractive index medium zone with and up and down low refractive index dielectric layer near tangible enhancement effect arranged.
Fig. 7 is that the effective mode field area of effective refractive index, transmission range, normalization and the restriction factor of the surface plasmon mode formula transmitted in the instance 2 said low-loss surface plasmon optical waveguides based on double-level-metal when being 1.55 μ m of the wavelength of transmitting optical signal is with height h
hChange curve.Visible by Fig. 7 (a)-(d), the effective refractive index of surface plasmon mode formula, transmission range and mode field area are all with height h
hIncrease and increase, restriction factor is then with height h
hIncrease and reduce.In gamut, the transmission range of pattern remains at tens of microns, and keeps the mould field limitation capability of dark sub-wavelength.Reducing of restriction factor is because along with height h
hIncrease can cause the mould field of more ratios to be limited in the high refractive index medium zone, and the energy proportion in the low refractive index dielectric layer can correspondingly reduce.
The simulation result of instance 1 and instance 2 shows that the width that is embedded in the high refractive index medium zone in the low refractive index dielectric layer in the waveguiding structure involved in the present invention can also can equate with it less than the width of low refractive index dielectric layer.
What should explain at last is, more than embodiment in each accompanying drawing only in order to surface plasmon optical waveguide structure of the present invention to be described, but unrestricted.Although the present invention is specified with reference to embodiment; Those of ordinary skill in the art is to be understood that; Technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and the scope of technical scheme of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106772817A (en) * | 2017-01-04 | 2017-05-31 | 桂林电子科技大学 | A kind of long-range surface plasmon excimer waveguide coupler |
| CN107655834A (en) * | 2017-09-19 | 2018-02-02 | 南京大学 | It is a kind of based on the polarization sensor and method for sensing from primitive resonating member such as surface |
| CN108957628A (en) * | 2018-09-20 | 2018-12-07 | 广西师范大学 | A kind of mixing plasma waveguide of the long-range coated by dielectric based on molybdenum disulfide |
| CN109445026A (en) * | 2018-12-28 | 2019-03-08 | 武汉邮电科学研究院有限公司 | Mode conversion and multiplexer based on plasma structure |
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| US11175451B2 (en) * | 2019-09-26 | 2021-11-16 | Intel Corporation | Mechanisms for refractive index tuning semiconductor photonic devices |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106772817A (en) * | 2017-01-04 | 2017-05-31 | 桂林电子科技大学 | A kind of long-range surface plasmon excimer waveguide coupler |
| CN106772817B (en) * | 2017-01-04 | 2023-03-07 | 桂林电子科技大学 | Long-range surface plasmon polariton waveguide coupler |
| CN107655834A (en) * | 2017-09-19 | 2018-02-02 | 南京大学 | It is a kind of based on the polarization sensor and method for sensing from primitive resonating member such as surface |
| CN108957628A (en) * | 2018-09-20 | 2018-12-07 | 广西师范大学 | A kind of mixing plasma waveguide of the long-range coated by dielectric based on molybdenum disulfide |
| CN109445026A (en) * | 2018-12-28 | 2019-03-08 | 武汉邮电科学研究院有限公司 | Mode conversion and multiplexer based on plasma structure |
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