CN102565934A - Trough type mixed surface plasma optical waveguide - Google Patents
Trough type mixed surface plasma optical waveguide Download PDFInfo
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- CN102565934A CN102565934A CN2012100118697A CN201210011869A CN102565934A CN 102565934 A CN102565934 A CN 102565934A CN 2012100118697 A CN2012100118697 A CN 2012100118697A CN 201210011869 A CN201210011869 A CN 201210011869A CN 102565934 A CN102565934 A CN 102565934A
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Abstract
The invention discloses a trough type mixed surface plasma optical waveguide with a stronger mode field limit capacity. The cross section of the waveguide structure comprises a V-shaped metal basement (1), a low-refractive-index dielectric layer (2), a high-refractive-index dielectric area (3) and a cladding (4). As the V-shaped metal basement and the high-refractive-index dielectric area exist, most of optical fields can be limited in a nanoscale V-shaped low-refractive-index dielectric trough, and meanwhile the waveguide has lower transmission loss. The structure is easily processed and can be applied to the construction of optical waveguide devices and chips with a high integrated level.
Description
Technical field
The present invention relates to the optical waveguide technique field, be specifically related to a kind of grooved blending surface plasmon optical waveguide.
Background technology
As the emerging research field of nanophotonics, the surface plasmon optical waveguide technology has attracted more and more domestic and international experts and scholars' concern.Surface plasmons is a kind of mode of electromagnetic wave that the interaction by light and metal surface free electron causes.This pattern is present near metal and the medium interface, and its field intensity is reaching maximum at the interface, and all is exponential decay along the direction perpendicular to the interface in the both sides, interface.Surface plasmons has stronger field limited characteristic, can field energy be constrained in the zone of bulk much smaller than its free space transmission wavelength, and its character can change with the metal surface structural change.Surface plasmon wave is led the restriction that can break through diffraction limit, light field is constrained in tens nanometers even the littler scope, and produce a significant enhancement effect.At present surface plasmon optical waveguide is just with its unique mould field limitation capability, long transmission range; And can transmit the photoelectricity signal simultaneously, special advantages such as adjustable demonstrates great potential in the nanophotonics field, and at aspects such as the super-resolution imaging of nano-photon chip, modulator, coupling mechanism and switch, nano laser, breakthrough diffraction limit and biology sensors important application prospects is arranged.
The conventional surface plasmon optical waveguide mainly comprises medium/metal/metal mold and medium/medium/metal type two class formations.Wherein, medium/medium/metal type transmission loss of optical waveguide is lower, but relatively poor mould field limitation capability has restricted its application in the high integration light path; On the other hand, medium/metal/metal mold optical waveguide has very strong mould field limitation capability, but its loss is too big, causes it can't realize long transmission apart from light signal.To the contradiction between conventional surface plasmon optical waveguide mould field limitation capability and the loss; The Xiang research group of opening of University of California Berkeley has proposed a kind of mixed type surface plasmon optical waveguide; They discover near high refractive index medium layer of interpolation low refractive index dielectric/metal surface; Can light field be tied in the low refractive index dielectric slit between high refractive index medium layer and the metal interface and transmit, keep lower loss simultaneously.
Receive the inspiration of this hybrid wave guide structure, the present invention further improves its mould field limitation capability, proposes a kind of hybrid wave guide structure that adopts metallic channel as substrate.This mixed type waveguide can well be limited in the mould field in the slit between the high refractive index medium of being filled in metallic channel and the groove, thereby realizes the sub-wavelength restriction to the mould field, has lower loss simultaneously.This waveguide can be used for realizing all kinds of active and passive surface plasmon devices, has crucial meaning for making up extensive integrated optical circuit.
Summary of the invention
The objective of the invention is further to improve the mould field limitation capability of conventional hybrid type waveguide, propose a kind of grooved blending surface plasmon optical waveguide structure.
The invention provides a kind of grooved blending surface plasmon optical waveguide with strong mould field limitation capability, its xsect is followed successively by metallic substrates, low refractive index dielectric layer, high refractive index medium district and covering from top to bottom; Metallic substrates is " V " font at the outline in the zone that joins with the low refractive index dielectric layer, and the altitude range in metallic substrates " V " font zone be institute's transmitting optical signal wavelength 0.12-0.65 doubly; The outline in the zone that the outline in the zone that low refractive index dielectric layer and metallic substrates are joined and low refractive index dielectric layer and high refractive index medium district join all is " V " font; The thickness of low refractive index dielectric layer is even; Its thickness range be institute's transmitting optical signal wavelength 0.06-0.4 doubly; The interior drift angle of the outer drift angle of metallic substrates " V " font regional center and bottom, high refractive index medium district equates that its angular range is greater than 0 degree and less than 180 degree; The material refractive index in high refractive index medium district is higher than the material refractive index of low refractive index dielectric layer and covering; The material of low refractive index dielectric layer and covering can be same material or different materials, and the ratio of the maximal value of the material refractive index of low refractive index dielectric layer and covering and the material refractive index in high refractive index medium district is less than 0.75.
Chamfering is all arranged at the center in metallic substrates in the said structure " V " font zone and the bottom in high refractive index medium district; And the chamfering of metallic substrates " V " font regional center is greater than the chamfering of bottom, high refractive index medium district, and the difference of two chamfering radius-of-curvature equals the thickness of low refractive index dielectric layer.
The compound substance that the material of metallic substrates constitutes for any or alloy separately in the gold, silver, aluminium, copper, titanium, nickel, chromium, palladium that can produce surface plasmons or above-mentioned metal in the said structure.
Grooved blending surface plasmon optical waveguide of the present invention has the following advantages:
The grooved blending surface plasmon optical waveguide that the present invention designed can be limited in light field in the nano level low refractive index dielectric groove preferably, has lower loss simultaneously.
Compare with other similar mixed type surface plasmon optical waveguide structures, this two-dimensional structure is easier to processing, is prone to be applied in the chip of light waveguide of high integration.
Description of drawings
Fig. 1 is the structural representation of grooved blending surface plasmon optical waveguide.Zone 1 is a metallic substrates, and the height in " V " font zone is h, and the outer drift angle of " V " font regional center is θ, and the chamfer radius of " V " font regional center is d+r; Zone 2 is the low refractive index dielectric layer, and its thickness is d; Zone 3 is the high refractive index medium district, and the interior drift angle of its bottom is θ, and the chamfer radius of bottom is r; Zone 4 is a covering.
Fig. 2 is the structural drawing of the said grooved blending surface of instance plasmon optical waveguide.201 is metallic substrates, and the height in " V " font zone is h, and the outer drift angle of " V " font regional center is θ, and the chamfer radius of " V " font regional center is d+r, n
mBe its refractive index; 202 is the low refractive index dielectric layer, and its thickness is d, n
lBe its refractive index; 203 is the high refractive index medium district, and the interior drift angle of its bottom is θ, and the chamfer radius of bottom is r, n
hBe its refractive index; Zone 4 is a covering, n
cBe its refractive index.
Fig. 3 is the distribution curve of the electric field intensity of the wavelength of transmitting optical signal surface plasmon mode formula light field of being supported of the said grooved blending surface of instance plasmon optical waveguide when being 1.55 μ m along X-direction.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the said grooved blending surface of the instance plasmon optical waveguide effective refractive index of the surface plasmon mode formula of transmission with the change curve of height h.
Fig. 5 be the wavelength of transmitting optical signal when being 1.55 μ m in the said grooved blending surface of the instance plasmon optical waveguide transmission range of the surface plasmon mode formula of transmission with the change curve of height h
Fig. 6 be the wavelength of transmitting optical signal when being 1.55 μ m in the said grooved blending surface of the instance plasmon optical waveguide the effective mode field area of normalization of the surface plasmon mode formula of transmission with the change curve of height h.
Embodiment
The mode characteristic of surface plasma-wave is the important indicator that characterizes surface plasmon optical waveguide.Wherein the mode characteristic parameter mainly includes and imitates refractive index real part, transmission range and the effective mode field area of normalization.
Transmission range L is defined as the distance when electric field intensity decays to initial value l/e on arbitrary interface, and its expression formula is:
L＝λ/[4πIm(n
eff)] (1)
Im (n wherein
Eff) be the imaginary part of pattern effective refractive index, λ is the wavelength of transmitting optical signal.
Effectively the calculation expression of mode field area is following:
A
eff＝(∫∫W(r)dxdy)
2/∫∫W(r)
2dxdy (2)
Wherein, A
EffBe effective mode field area, W (r) is the energy flux density of surface plasma-wave, and its definition is:
W(r)＝0.5Re{d[ωε(r)]/dω}|E(r)|
2+0.5μ
0|H(r)|
2 (3)
Wherein, Re representes to get real part, and E (r) is the electric field of surface plasma-wave, and H (r) is the magnetic field of surface plasma-wave, and ε (r) is a conductivity, μ
0Be permeability of vacuum.The effective mode field area that the effective mode field area of normalization calculates for (2) formula and the ratio of the little hole area of diffraction limit.The area of diffraction limit aperture defines as follows:
A
0＝λ
2/4 (4)
Wherein, A
0Be the little hole area of diffraction limit, λ is the wavelength of transmitting optical signal.Therefore, the effective mode field area A of normalization is:
A＝A
eff/A
0 (5)
The size of the effective mode field area of normalization characterizes the mould field limitation capability of pattern, and this value is less than the dimension constraint of 1 the corresponding sub-wavelength of situation.
Instance:
Fig. 2 is the structural drawing of the said grooved blending surface of instance plasmon optical waveguide.201 is metallic substrates, and the height in " V " font zone is h, and the outer drift angle of " V " font regional center is θ, and the chamfer radius of " V " font regional center is d+r, n
mBe its refractive index; 202 is the low refractive index dielectric layer, and its thickness is d, n
lBe its refractive index; 203 is the high refractive index medium district, and the interior drift angle of its bottom is θ, and the chamfer radius of bottom is r, n
hBe its refractive index; Zone 4 is a covering, n
cBe its refractive index.
In this example, the wavelength of the light signal of transmission is chosen to be 1.55 μ m, and 201 material is a silver, and the refractive index at 1.55 mum wavelength places is 0.1453+i*11.3587; 203 material is made as silicon dioxide, and its refractive index is 1.5; 203 material is made as silicon, and its refractive index is 3.5; 204 material is made as silicon dioxide, and its refractive index is 1.5.
In this example, the interior vertex angle theta of the outer drift angle of " V " font regional center of 201 and 203 bottoms=25 degree; The span of the height h in " V " font zone of 201 is 190nm-1000nm; Thickness d=20nm of 202; Chamfer radius r=10nm, d+r=30nm.
Use full vector Finite Element Method that the above-mentioned waveguiding structure in the present embodiment is carried out emulation, calculate the mould field distribution and the mode characteristic of 1.55 mum wavelength place surface plasmon mode formulas.
Fig. 3 is the distribution curve of the electric field intensity of the wavelength of transmitting optical signal surface plasmon mode formula light field of being supported of the said grooved blending surface of instance plasmon optical waveguide when being 1.55 μ m along X-direction, and wherein h is 500nm.Visible by Fig. 3, the electric field intensity curve of said grooved blending surface plasmon optical waveguide light field has tangible enhancement effect in the low refractive index dielectric zone.
Fig. 4 be the wavelength of transmitting optical signal when being 1.55 μ m in the said grooved blending surface of the instance plasmon optical waveguide effective refractive index of the surface plasmon mode formula of transmission with the change curve of height h.Visible by Fig. 4, the effective refractive index of the surface plasmon mode formula of said grooved mixed light wave guide increases with height h.
Fig. 5 be the wavelength of transmitting optical signal when being 1.55 μ m in the said grooved blending surface of the instance plasmon optical waveguide transmission range of the surface plasmon mode formula of transmission with the change curve of height h.Visible by Fig. 5, the transmission range of the surface plasmon mode formula of said grooved mixed light wave guide is in tens of micron dimensions, and reduces earlier afterwards to increase with the increase of height h.
Fig. 6 be the wavelength of transmitting optical signal when being 1.55 μ m in the said grooved blending surface of the instance plasmon optical waveguide the effective mode field area of normalization of the surface plasmon mode formula of transmission with the change curve of height h.Visible by Fig. 6, the mode field area of the surface plasmon mode formula of said grooved mixed light wave guide reduces earlier afterwards to increase with the increase of height h.Can know that by figure the effective mode field area of normalization is still very little simultaneously, and, explain that said grooved mixed light wave guide has the mould field limitation capability of sub-wavelength much smaller than 1.
What should explain at last is, more than embodiment in each accompanying drawing only in order to surface plasmon optical waveguide structure of the present invention to be described, but unrestricted.Although the present invention is specified with reference to embodiment; Those of ordinary skill in the art is to be understood that; Technical scheme of the present invention is made amendment or is equal to replacement, do not break away from the spirit and the scope of technical scheme of the present invention, it all should be encompassed in the middle of the claim scope of the present invention.
Claims (3)
1. the invention provides a kind of grooved blending surface plasmon optical waveguide with strong mould field limitation capability, its xsect is followed successively by metallic substrates, low refractive index dielectric layer, high refractive index medium district and covering from top to bottom; Metallic substrates is " V " font at the outline in the zone that joins with the low refractive index dielectric layer, and the altitude range in metallic substrates " V " font zone be institute's transmitting optical signal wavelength 0.12-0.65 doubly; The outline in the zone that the outline in the zone that low refractive index dielectric layer and metallic substrates are joined and low refractive index dielectric layer and high refractive index medium district join all is " V " font; The thickness of low refractive index dielectric layer is even; Its thickness range be institute's transmitting optical signal wavelength 0.06-0.4 doubly; The interior drift angle of the outer drift angle of metallic substrates " V " font regional center and bottom, high refractive index medium district equates that its angular range is greater than 0 degree and less than 180 degree; The material refractive index in high refractive index medium district is higher than the material refractive index of low refractive index dielectric layer and covering; The material of low refractive index dielectric layer and covering can be same material or different materials, and the ratio of the maximal value of the material refractive index of low refractive index dielectric layer and covering and the material refractive index in high refractive index medium district is less than 0.75.
2. optical waveguide structure according to claim 1; It is characterized in that; Chamfering is all arranged at the center in metallic substrates in the said structure " V " font zone and the bottom in high refractive index medium district; And the chamfering of metallic substrates " V " font regional center is greater than the chamfering of bottom, high refractive index medium district, and the difference of two chamfering radius-of-curvature equals the thickness of low refractive index dielectric layer.
3. optical waveguide structure according to claim 1; It is characterized in that the compound substance that the material of metallic substrates constitutes for any or alloy separately in the gold, silver, aluminium, copper, titanium, nickel, chromium, palladium that can produce surface plasmons or above-mentioned metal in the said structure.
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| CN 201210011869 CN102565934B (en) | 2012-01-16 | 2012-01-16 | Trough type mixed surface plasma optical waveguide |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102842744A (en) * | 2012-09-21 | 2012-12-26 | 东南大学 | Adjustable and controllable rainbow local area network controller |
| CN105467517A (en) * | 2015-12-24 | 2016-04-06 | 江苏双仪光学器材有限公司 | Surface plasma waveguide based on sub-wavelength metal V groove superpower light fettering |
| CN112461795A (en) * | 2020-12-08 | 2021-03-09 | 桂林电子科技大学 | Plastic optical fiber SPR array sensor and preparation method thereof |
| CN113009620A (en) * | 2019-12-18 | 2021-06-22 | 北京交通大学 | Hybrid plasma waveguide based on graphene |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1398356A (en) * | 2000-02-08 | 2003-02-19 | 康宁股份有限公司 | Planar waveguides with high refractive index |
| US20030133682A1 (en) * | 2002-01-14 | 2003-07-17 | Henryk Temkin | Optical waveguide structures and methods of fabrication |
| CN102169205A (en) * | 2010-07-28 | 2011-08-31 | 北京航空航天大学 | Low-loss medium loaded surface plasmon excimer optical waveguide |
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2012
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Patent Citations (3)
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|---|---|---|---|---|
| CN1398356A (en) * | 2000-02-08 | 2003-02-19 | 康宁股份有限公司 | Planar waveguides with high refractive index |
| US20030133682A1 (en) * | 2002-01-14 | 2003-07-17 | Henryk Temkin | Optical waveguide structures and methods of fabrication |
| CN102169205A (en) * | 2010-07-28 | 2011-08-31 | 北京航空航天大学 | Low-loss medium loaded surface plasmon excimer optical waveguide |
Non-Patent Citations (1)
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| 周林，朱永元: "金属异质波导阵列中的表面等离激元传播特性", 《光学学报》 * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102842744A (en) * | 2012-09-21 | 2012-12-26 | 东南大学 | Adjustable and controllable rainbow local area network controller |
| CN105467517A (en) * | 2015-12-24 | 2016-04-06 | 江苏双仪光学器材有限公司 | Surface plasma waveguide based on sub-wavelength metal V groove superpower light fettering |
| CN105467517B (en) * | 2015-12-24 | 2020-11-27 | 徐州天骋智能科技有限公司 | Surface plasma waveguide based on ultra-strong light constraint of sub-wavelength metal V groove |
| CN113009620A (en) * | 2019-12-18 | 2021-06-22 | 北京交通大学 | Hybrid plasma waveguide based on graphene |
| CN112461795A (en) * | 2020-12-08 | 2021-03-09 | 桂林电子科技大学 | Plastic optical fiber SPR array sensor and preparation method thereof |
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| CN102565934B (en) | 2013-06-19 |
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