CN102453812A - Rolled copper foil and method for manufacturing rolled copper foil - Google Patents
Rolled copper foil and method for manufacturing rolled copper foil Download PDFInfo
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 225
- 239000011889 copper foil Substances 0.000 title claims abstract description 69
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 32
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- 239000010410 layer Substances 0.000 description 6
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 6
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Abstract
本发明提供一种具备高导电性且即使为软质铜材也具有高弯曲寿命的轧制铜箔以及轧制铜箔的制造方法。本发明的轧制铜箔在含有不可避免的杂质的纯铜中含有超过2质量ppm的量的氧、和选自由Mg、Zr、Nb、Ca、V、Ni、Mn、Ti和Cr所组成的组中的添加元素。The present invention provides a rolled copper foil having high electrical conductivity and a high bending life even if it is a soft copper material, and a method for producing the rolled copper foil. The rolled copper foil of the present invention contains oxygen in an amount exceeding 2 mass ppm in pure copper containing unavoidable impurities, and a metal selected from the group consisting of Mg, Zr, Nb, Ca, V, Ni, Mn, Ti, and Cr. The added element in the group.
Description
技术领域 technical field
本发明涉及轧制铜箔及轧制铜箔的制造方法。The present invention relates to a rolled copper foil and a method for producing the rolled copper foil.
背景技术 Background technique
在近年的科学技术中,电被用于作为动力源的电力、电信号等所有部分,为了传送它们而使用电缆、引线等导线。因此,作为用于该导线的原材料,使用铜、银等电导率高的金属,特别是考虑到成本方面等,极大多数使用铜线。In recent science and technology, electricity is used for all parts such as electric power as a power source and electric signals, and wires such as cables and leads are used to transmit them. Therefore, metals with high electrical conductivity, such as copper and silver, are used as raw materials for the wires, and copper wires are mostly used in consideration of cost.
所有铜中,根据其分子的排列等进行大致分类,可以分成硬质铜和软质铜。因此根据利用目的来使用具有所希望的性质的种类的铜。All copper is roughly classified according to its molecular arrangement, etc., and can be divided into hard copper and soft copper. Therefore, copper having desired properties is used according to the purpose of use.
就电子部件用引线而言,多数使用硬质铜线,例如用于医疗设备、产业用机器人、笔记本型个人电脑等电子设备等的电缆由于在反复负载由苛刻的弯曲、扭转、拉伸等组合而成的外力的环境下使用,因此硬直的硬质铜线是不恰当的,可以使用软质铜线。As far as lead wires for electronic components are concerned, hard copper wires are mostly used. For example, cables used for electronic equipment such as medical equipment, industrial robots, and notebook personal computers are subject to severe bending, torsion, and stretching under repeated loads It is used in an environment of external force, so hard and straight hard copper wires are not appropriate, and soft copper wires can be used.
就用于这样的用途的铜线而言,要求导电性良好(高电导率)且弯曲特性良好这样的相反特性,但是迄今为止,还在进行维持高导电性和耐弯曲性的铜材料的开发。Copper wires used in such applications are required to have the opposite characteristics of good electrical conductivity (high electrical conductivity) and good bending properties, but so far, development of copper materials that maintain high electrical conductivity and bending resistance has been progressing .
例如,关于拉伸强度、伸长率和电导率良好的耐弯曲电缆用导体,已知将铜合金形成线材的耐弯曲电缆用导体,所述铜合金在纯度99.99wt%以上的无氧铜中以0.05~0.70质量%的浓度范围含有纯度99.99wt%以上的铟、以0.0001~0.003质量%的浓度范围含有纯度99.9wt%以上的P(例如,参照专利文献1。)。For example, as a conductor for a bend-resistant cable having good tensile strength, elongation, and electrical conductivity, a conductor for a bend-resistant cable in which a copper alloy is formed into a wire rod is known. Indium with a purity of 99.99 wt % or higher is contained in a concentration range of 0.05 to 0.70 mass %, and P with a purity of 99.9 wt % or higher is contained in a concentration range of 0.0001 to 0.003 mass % (see
另外,已知铟为0.1~1.0wt%、硼为0.02~0.1wt%、残余部分为铜的耐弯曲性铜合金线(例如,参照专利文献2。)。In addition, there is known a bend-resistant copper alloy wire in which indium is 0.1 to 1.0 wt %, boron is 0.02 to 0.1 wt %, and the remainder is copper (for example, refer to Patent Document 2).
另外,就用于半导体的安装、电子设备的安装的FPC(柔性印刷电路板,Flexible Print Circuit board)、COF(覆晶薄膜,Chip On film)、TAB(卷带自动结合,Tape Automated Bonding)等而言,在膜状绝缘体的一面或两面配置有配线用的铜箔。就这些铜箔而言,可以使用可携带性、以及例如FPC等情况的工作部的配线所需要的耐弯曲性优异的轧制箔。轧制箔通过利用轧辊进行的塑性加工来薄薄地展开,从而制造,就其原材料而言,一直以来使用韧铜(TPC)、无氧铜(OFC)。In addition, FPC (Flexible Printed Circuit board, Flexible Print Circuit board), COF (Chip On film), TAB (Tape Automated Bonding), etc., are used for the installation of semiconductors and electronic equipment. In other words, copper foil for wiring is arranged on one or both surfaces of the film-like insulator. As these copper foils, rolled foils excellent in portability and bending resistance required for wiring of operating parts in the case of FPC, for example, can be used. Rolled foil is thinly stretched and manufactured by plastic working with rolls, and tough copper (TPC) and oxygen-free copper (OFC) have been used conventionally as raw materials.
现有技术文献prior art literature
专利文献patent documents
专利文献1:日本特开2002-363668号公报Patent Document 1: Japanese Patent Laid-Open No. 2002-363668
专利文献2:日本特开平9-256084号公报Patent Document 2: Japanese Patent Application Laid-Open No. 9-256084
发明内容 Contents of the invention
发明要解决的课题The problem to be solved by the invention
然而,专利文献1涉及的发明始终是有关硬质铜线的发明,并未进行有关耐弯曲性的具体的评价,并未进行关于耐弯曲性更加优异的软质铜线的研究。另外,由于添加元素的量多,因此导电性降低。关于软质铜线,可以说尚未进行充分研究。另外,专利文献2涉及的发明虽然是有关软质铜线的发明,但与专利文献1涉及的发明同样地,由于添加元素的添加量多,因此导电性降低。However, the invention described in
另一方面,可以考虑通过选择无氧铜(OFC)等高导电性铜材作为成为原料的铜材料来确保高导电性。On the other hand, it is conceivable to ensure high conductivity by selecting a high-conductivity copper material such as oxygen-free copper (OFC) as a copper material used as a raw material.
但是,在以该无氧铜(OFC)作为原料、为了维持导电性而不添加其它元素地使用的情况下,通过提高铜线坯的加工度、进行拉丝来使无氧铜线内部的结晶组织变细,从而提高耐弯曲性的想法也可能有效,但这种情况下,存在由于拉丝加工引起的加工固化,因此适于作为硬质线材的用途但不能适用于软质线材这样的问题。However, in the case of using this oxygen-free copper (OFC) as a raw material without adding other elements in order to maintain electrical conductivity, the crystal structure inside the oxygen-free copper wire can be made Thinning and improving bending resistance may also be effective, but in this case, there is a problem that it is suitable for use as hard wires but not soft wires due to work hardening due to wire drawing.
例如对FPC使用韧铜(TPC)的情况下,与聚酰亚胺树脂膜贴合并进行固化(150~160℃的热处理)时,通过使铜箔软化进行再结晶,通过形成集合组织来提高弯曲特性。但是,在原材料中使用无氧铜(OFC)时,在固化温度下再结晶不充分,无法提高弯曲特性。另一方面,韧铜与OFC、高纯度铜(99.9999%)相比,除了电导率差以外,加工性也差,至加工成规定的厚度需要更多的轧制次数。For example, when tough copper (TPC) is used for FPC, when it is bonded to a polyimide resin film and cured (heat treatment at 150 to 160°C), the copper foil is softened and recrystallized, and the bend is improved by forming a structure. characteristic. However, when oxygen-free copper (OFC) is used as the raw material, recrystallization is insufficient at the solidification temperature, and bending properties cannot be improved. On the other hand, compared with OFC and high-purity copper (99.9999%), ductile copper has poor workability in addition to poor electrical conductivity, and requires more rolling times to be processed to a predetermined thickness.
因此,本发明的目的在于提供一种具备高导电性且即使为软质铜材也具有高弯曲寿命的轧制铜箔以及轧制铜箔的制造方法。Therefore, an object of the present invention is to provide a rolled copper foil having high electrical conductivity and a high bending life even if it is a soft copper material, and a method for producing the rolled copper foil.
解决课题的方法Solution to the problem
为了解决上述课题,本发明提供一种轧制铜箔,在含有不可避免的杂质的纯铜中含有超过2质量ppm的量的氧、和选自由Mg、Zr、Nb、Ca、V、Ni、Mn、Ti和Cr所组成的组中的添加元素。In order to solve the above-mentioned problems, the present invention provides a rolled copper foil containing oxygen in an amount exceeding 2 mass ppm in pure copper containing unavoidable impurities, and oxygen selected from Mg, Zr, Nb, Ca, V, Ni, An additional element in the group consisting of Mn, Ti, and Cr.
另外,就上述轧制铜箔而言,所述添加元素为Ti,并且所述轧制铜箔优选由含有2质量ppm以上12质量ppm以下的硫、超过2质量ppm且为30质量ppm以下的氧、和4质量ppm以上55质量ppm以下的钛的软质低浓度铜合金材料构成。In addition, in the above-mentioned rolled copper foil, the added element is Ti, and the rolled copper foil is preferably made of sulfur containing 2 mass ppm to 12 mass ppm, exceeding 2 mass ppm to 30 mass ppm Oxygen and a soft low-concentration copper alloy material of not less than 4 mass ppm and not more than 55 mass ppm of titanium.
另外,就上述轧制铜箔而言,半软化温度在厚度0.8mm的尺寸时可以为148℃以下。In addition, the above-mentioned rolled copper foil may have a semi-softening temperature of 148° C. or less in the case of a thickness of 0.8 mm.
另外,就上述轧制铜箔而言,加工前的结晶组织可以具有从其表面向内部直至50μm的深度的平均晶粒尺寸为20μm以下的表层。In addition, in the above-mentioned rolled copper foil, the crystal structure before processing may have a surface layer having an average crystal grain size of 20 μm or less inward from the surface to a depth of 50 μm.
另外,为了解决上述课题,本发明提供一种轧制铜箔的制造方法,具备下述工序:利用SCR连续铸造轧制,在1100℃以上1320℃以下的铸造温度下将在含有不可避免的杂质的纯铜中含有超过2质量ppm的量的氧、和选自由Mg、Zr、Nb、Ca、V、Ni、Mn、Ti和Cr所组成的组中的添加元素的低浓度铜合金材料制成熔液,并由所述熔液制作铜材的工序;对所述铜材实施热轧加工从而制作铸造材料的工序;和对所述铸造材料实施冷轧加工从而制作轧制铜箔的工序。In addition, in order to solve the above-mentioned problems, the present invention provides a method of manufacturing rolled copper foil, which includes the following steps: using SCR continuous casting and rolling, at a casting temperature of 1100°C to 1320°C, the copper foil containing unavoidable impurities Made of a low-concentration copper alloy material containing oxygen in an amount exceeding 2 mass ppm in pure copper, and an additive element selected from the group consisting of Mg, Zr, Nb, Ca, V, Ni, Mn, Ti, and Cr a process of producing a copper material from the molten solution; a process of subjecting the copper material to hot rolling to produce a cast material; and a process of performing cold rolling on the cast material to produce a rolled copper foil.
另外,就上述轧制铜箔的制造方法而言,所述添加元素为Ti,所述低浓度铜合金材料可以含有2质量ppm以上12质量ppm以下的硫、超过2质量ppm且为30质量ppm以下的氧、和4质量ppm以上55质量ppm以下的钛。In addition, in the manufacturing method of the above-mentioned rolled copper foil, the added element is Ti, and the low-concentration copper alloy material may contain 2 mass ppm to 12 mass ppm of sulfur, exceeding 2 mass ppm to 30 mass ppm Oxygen of less than 4 mass ppm and titanium of 55 mass ppm or less.
另外,就上述轧制铜箔的制造方法而言,所述热轧加工可以通过将最初的轧辊处的温度控制在880℃以下、将最终的轧辊处的温度控制在550℃以上来实施。In addition, in the manufacturing method of the above-mentioned rolled copper foil, the hot rolling process can be implemented by controlling the temperature of the first roll to 880° C. or lower, and controlling the temperature of the final roll to 550° C. or higher.
发明效果Invention effect
本发明所涉及的轧制铜箔和轧制铜箔的制造方法能够提供具备高导电性且即使为软质铜材也具有高弯曲寿命的轧制铜箔以及轧制铜箔的制造方法。The rolled copper foil and the manufacturing method of the rolled copper foil which concern on this invention can provide the rolled copper foil and the manufacturing method of the rolled copper foil which have high electroconductivity and a high bending life even if it is a soft copper material.
附图说明 Description of drawings
图1为TiS粒子的SEM图像。Figure 1 is the SEM image of TiS particles.
图2为表示图1的分析结果的图。FIG. 2 is a graph showing the analysis results of FIG. 1 .
图3为TiO2粒子的SEM图像。Figure 3 is the SEM image of TiO2 particles.
图4为表示图3的分析结果的图。FIG. 4 is a graph showing the analysis results of FIG. 3 .
图5为Ti-O-S粒子的SEM图像。Fig. 5 is a SEM image of Ti-O-S particles.
图6为表示图5的分析结果的图。FIG. 6 is a graph showing the analysis results of FIG. 5 .
图7为表示弯曲疲劳试验的概略的图。Fig. 7 is a diagram showing the outline of a bending fatigue test.
图8为表示测定在400℃下实施了1小时的退火处理后的、使用无氧铜的比较例13的盘条和使用在低氧铜中添加了Ti的软质低浓度铜合金线而制作的实施例7的盘条的弯曲寿命得到的结果的图。Fig. 8 shows the measurement of the wire rod of Comparative Example 13 using oxygen-free copper and the soft low-concentration copper alloy wire in which Ti was added to low-oxygen copper after annealing at 400°C for 1 hour. A graph of the results obtained for the bending life of the wire rod of Example 7.
图9为表示测定在600℃下实施了1小时的退火处理后的、使用无氧铜的比较例14的盘条和使用在低氧铜中添加了Ti的软质低浓度铜合金线而制作的实施例8的盘条的弯曲寿命得到的结果的图。Fig. 9 shows the measurement of the wire rod of Comparative Example 14 using oxygen-free copper and the soft low-concentration copper alloy wire in which Ti was added to low-oxygen copper after annealing at 600°C for 1 hour. A graph of the results obtained for the bending life of the wire rod of Example 8.
图10为表示实施例8的试样的宽度方向的断面组织的图。10 is a view showing a cross-sectional structure in the width direction of a sample of Example 8. FIG.
图11为表示比较例14的试样的宽度方向的断面组织的图。FIG. 11 is a view showing a cross-sectional structure in the width direction of a sample of Comparative Example 14. FIG.
图12为表层的平均晶粒尺寸的测定方法的概略图。Fig. 12 is a schematic diagram of a method of measuring the average crystal grain size of the surface layer.
图13为评价弯曲特性的试验机的构成的概略图。Fig. 13 is a schematic diagram showing the configuration of a testing machine for evaluating bending characteristics.
图14为表示退火温度与伸长率的关系的图。Fig. 14 is a graph showing the relationship between annealing temperature and elongation.
符号说明Symbol Description
1 导体1 conductor
2a、2b 导体固定部2a, 2b conductor fixing part
3 振动附加部3 Vibration attachment
4 振动发生装置4 Vibration generating device
5 支持部5 Support Department
10 环10 rings
12 夹具12 Fixtures
14 弯曲头14 bend head
16 锤16 hammers
20 试样20 samples
30 树脂基板30 resin substrate
30a 凹凸形状30a concave-convex shape
40 导体40 conductors
50 树脂层。50 resin layers.
具体实施方式 Detailed ways
本实施方式的轧制铜箔使用作为满足电导率98%IACS(国际标准软铜(International Anneld Copper Standard),以电阻率1.7241×10-8Ωm为100%时的电导率)以上、优选100%IACS以上、更加优选102%IACS以上的软质型铜材的软质低浓度铜合金材料来构成。The rolled copper foil of the present embodiment is used to satisfy an electrical conductivity of 98% IACS (International Anneld Copper Standard, the electrical conductivity when the resistivity is 1.7241×10 -8 Ωm as 100%) or more, preferably 100%. IACS or more, more preferably 102% IACS or more soft low-concentration copper alloy material of soft copper material.
另外,就本实施方式的轧制铜箔而言,使用SCR连续铸造设备,表面损伤少,制造范围宽,可以稳定生产。使用对该铸造材料的加工度90%时的半软化温度为148℃以下的材料来构成。In addition, the rolled copper foil according to the present embodiment uses SCR continuous casting equipment, has little surface damage, has a wide manufacturing range, and can be stably produced. The cast material is constructed using a material having a semi-softening temperature of 148° C. or lower at a working degree of 90%.
具体而言,本实施方式的轧制铜箔在含有不可避免的杂质的纯铜中含有超过2质量ppm的量的氧、和选自由Mg、Zr、Nb、Ca、V、Ni、Mn、Ti和Cr所组成的组中的添加元素而构成。选择选自由Ti、Mg、Zr、Nb、Ca、V、Ni、Mn和Cr所组成的组中的元素作为添加元素的理由是由于,这些元素是容易与其他元素结合的活性元素,由于容易与S结合,因此可以捕捉S,从而能够使铜母材(基体)高纯度化。添加元素可以含有1种以上。另外,还可以在合金中含有不会对合金的性质造成不良影响的其他的元素和杂质。另外,在以下说明的优选实施方式中,说明了氧含量超过2质量ppm且为30质量ppm以下是良好的,但根据添加元素的添加量和S的含量,在具备合金性质的范围内,可以含有超过2质量ppm且为400质量ppm以下。Specifically, the rolled copper foil of this embodiment contains oxygen in an amount exceeding 2 mass ppm in pure copper containing unavoidable impurities, and oxygen selected from Mg, Zr, Nb, Ca, V, Ni, Mn, Ti It is composed of an additional element in the group consisting of Cr and Cr. The reason for selecting elements selected from the group consisting of Ti, Mg, Zr, Nb, Ca, V, Ni, Mn, and Cr as the additive elements is that these elements are active elements that are easily combined with other elements, and because they are easily combined with Since S is bonded, S can be captured and the copper base material (substrate) can be highly purified. One or more kinds of additional elements may be contained. In addition, other elements and impurities that do not adversely affect the properties of the alloy may be contained in the alloy. In addition, in the preferred embodiment described below, it is explained that the oxygen content is more than 2 mass ppm and 30 mass ppm or less is good. It contains more than 2 mass ppm and is 400 mass ppm or less.
另外,轧制铜箔的添加元素可以是Ti,这种情况下,轧制铜箔由含有2质量ppm以上12质量ppm以下的硫、超过2质量ppm且为30质量ppm以下的氧、和4质量ppm以上55质量ppm以下的钛的软质低浓度铜合金材料构成。而且,轧制铜箔优选半软化温度在厚度0.8mm的尺寸下为137℃以下。由于含有超过2质量ppm且为30质量ppm以下的氧,因此该实施方式中,以所谓的低氧铜(LOC)作为对象。In addition, the additive element of the rolled copper foil may be Ti. In this case, the rolled copper foil is composed of sulfur containing 2 mass ppm to 12 mass ppm, oxygen exceeding 2 mass ppm to 30 mass ppm, and 4 It is composed of a soft low-concentration copper alloy material of titanium in mass ppm to 55 mass ppm. Furthermore, the rolled copper foil preferably has a half softening temperature of 137° C. or less in a dimension having a thickness of 0.8 mm. Since oxygen is contained in excess of 2 mass ppm to 30 mass ppm or less, so-called low-oxygen copper (LOC) is targeted in this embodiment.
另外,本实施方式的轧制铜箔经以下工序来制造。首先,利用SCR连续铸造轧制,在1100℃以上1320℃以下的铸造温度下将在含有不可避免的杂质的纯铜中含有2质量ppm以上的氧、和选自由Mg、Zr、Nb、Ca、V、Ni、Mn、Ti和Cr所组成的组中的添加元素的低浓度铜合金材料制成熔液。然后由熔液制作铜材。接着,对所得的铜材实施热轧加工从而制作铸造材料。然后,对铸造材料实施冷轧加工从而制造本实施方式的轧制铜箔。In addition, the rolled copper foil of this embodiment is manufactured through the following process. First, by using SCR continuous casting and rolling, at a casting temperature of 1100°C to 1320°C, pure copper containing unavoidable impurities contains 2 mass ppm or more of oxygen, and oxygen selected from Mg, Zr, Nb, Ca, A low-concentration copper alloy material with added elements in the group consisting of V, Ni, Mn, Ti, and Cr is made into a melt. Copper is then made from the melt. Next, the obtained copper material was subjected to hot rolling processing to produce a cast material. Then, the cast material is subjected to cold rolling processing to manufacture the rolled copper foil of this embodiment.
另外,热轧加工优选通过将最初的轧辊处的温度控制在880℃以下、将最终的轧辊处的温度控制在550℃以上来实施。In addition, the hot rolling process is preferably carried out by controlling the temperature at the first roll to 880°C or lower and controlling the temperature at the final roll to 550°C or higher.
以下,对于本实施方式的轧制铜箔的实现,说明本发明人研究的内容。Hereinafter, the contents studied by the present inventors will be described for realization of the rolled copper foil of the present embodiment.
首先,纯度为6N(即,99.9999%)的高纯度铜在加工度90%时的半软化温度为130℃。因此,关于在可以稳定生产的130℃以上148℃以下的半软化温度下,能够稳定制造软质材料的电导率为98%IACS以上、优选100%IACS以上、更加优选102%IACS以上的软质铜的软质低浓度铜合金材料以及该软质低浓度铜合金材料的制造方法,本发明人进行了研究。First, high-purity copper with a purity of 6N (ie, 99.9999%) has a semi-softening temperature of 130° C. at a processing degree of 90%. Therefore, at a semi-softening temperature of 130°C to 148°C that can be stably produced, soft materials with an electrical conductivity of 98% IACS or higher, preferably 100% IACS or higher, more preferably 102% IACS or higher, can be stably produced. The inventors of the present invention conducted studies on a soft low-copper alloy material of copper and a method for producing the soft low-copper alloy material.
这里,准备氧浓度为1~2质量ppm的高纯度铜(4N),使用设置在实验室的小型连续铸造机(小型连铸机),将该Cu制成Cu的熔液。然后,在该熔液中添加几质量ppm的钛。接着,由添加了钛的熔液制造φ8mm的盘条。接着,将φ8mm的盘条加工成φ2.6mm(即,加工度为90%)。该φ2.6mm的盘条的半软化温度为160℃~168℃,低于该温度的半软化温度是不行的。另外,该φ2.6mm的盘条的电导率为101.7%IACS左右。也就是说,本发明人得到如下见解:即使降低盘条中所含的氧浓度、在熔液中添加钛,也无法降低盘条的半软化温度,并且电导率低于高纯度铜(6N)的电导率102.8%IACS。Here, high-purity copper (4N) having an oxygen concentration of 1 to 2 mass ppm was prepared, and this Cu was made into a Cu melt using a small continuous casting machine (small continuous casting machine) installed in a laboratory. Then, several mass ppm of titanium was added to the melt. Next, a φ8 mm wire rod was produced from the titanium-added melt. Next, the φ8mm wire rod was processed to φ2.6mm (that is, the processing degree was 90%). The semi-softening temperature of the φ2.6 mm wire rod is 160° C. to 168° C., and a half-softening temperature lower than this temperature is unacceptable. In addition, the electrical conductivity of this φ2.6 mm wire rod is about 101.7% IACS. That is to say, the present inventors obtained the following knowledge: Even if the oxygen concentration contained in the wire rod is reduced, and titanium is added to the melt, the semi-softening temperature of the wire rod cannot be lowered, and the electrical conductivity is lower than that of high-purity copper (6N) The electrical conductivity is 102.8% IACS.
无法降低半软化温度、电导率低于6N的高纯度铜的原因推测是由于,含有作为在熔液的制造中不可避免的杂质的几质量ppm以上的硫(S)。即推测,由于在熔液中所含的硫与钛之间未充分形成TiS等硫化物,因此盘条的半软化温度未降低。The reason why high-purity copper whose half-softening temperature cannot be lowered and whose electrical conductivity is lower than 6N is presumed to be that it contains sulfur (S) of several mass ppm or more as an unavoidable impurity in the manufacture of molten metal. That is, it is presumed that the semi-softening temperature of the wire rod did not decrease because sulfides such as TiS were not sufficiently formed between sulfur contained in the melt and titanium.
因此,为了实现软质低浓度铜合金材料的半软化温度的降低和软质低浓度铜合金材料的电导率的提高,本发明人研究了以下两个方案。而且,通过将以下两个方案并用于铜盘条的制造,从而得到构成本实施方式的轧制铜箔的软质低浓度铜合金材料。Therefore, in order to lower the semi-softening temperature of the soft low-concentration copper alloy material and improve the electrical conductivity of the soft low-concentration copper alloy material, the present inventors studied the following two proposals. And the soft low-concentration copper alloy material which comprises the rolled copper foil of this embodiment was obtained by using the following two aspects together for manufacture of a copper wire rod.
图1是TiS粒子的SEM图像,图2表示图1的分析结果。另外,图3是TiO2粒子的SEM图像,图4表示图3的分析结果。此外,图5是Ti-O-S粒子的SEM图像,图6表示图5的分析结果。另外,SEM图像中,拍摄了中央附近的各粒子。图1~6是通过SEM观察和EDX分析来评价具有示于表1的实施例1的由上第三段的氧浓度、硫浓度、Ti浓度的φ8mm的铜线(盘条)的横截面而得的图。观察条件设为加速电压15keV、发射电流10μA。FIG. 1 is a SEM image of TiS particles, and FIG. 2 shows the analysis results of FIG. 1 . In addition, FIG. 3 is a SEM image of TiO 2 particles, and FIG. 4 shows the analysis results of FIG. 3 . In addition, FIG. 5 is a SEM image of Ti-OS particles, and FIG. 6 shows the analysis results of FIG. 5 . In addition, in the SEM image, each particle near the center was photographed. Fig. 1~6 is by SEM observation and EDX analysis to evaluate the cross-section of the copper wire (wire rod) having the oxygen concentration, sulfur concentration, Ti concentration of the third section of the upper third section of the oxygen concentration, sulfur concentration, and Ti concentration of Example 1 shown in Table 1. Got the picture. Observation conditions were set at an accelerating voltage of 15 keV and an emission current of 10 μA.
首先,第1方案是以在氧浓度超过2质量ppm的量的Cu中添加钛(Ti)的状态来制作Cu的熔液。在该熔液中,可认为形成TiS、钛的氧化物(例如,TiO2)和Ti-O-S粒子。这是来自图1的SEM图像和图2的分析结果、图3的SEM图像和图4的分析结果的考察。另外,图2、图4和图6中,Pt和Pd是进行SEM观察时蒸镀在观察对象物上的金属元素。First, in the first aspect, a Cu melt is produced in a state in which titanium (Ti) is added to Cu having an oxygen concentration exceeding 2 mass ppm. In this melt, TiS, titanium oxide (for example, TiO 2 ), and Ti—OS particles are considered to be formed. This is a review from the SEM image of FIG. 1 and the analysis results of FIG. 2 , the SEM image of FIG. 3 and the analysis results of FIG. 4 . In addition, in FIG. 2 , FIG. 4 , and FIG. 6 , Pt and Pd are metal elements vapor-deposited on the observation object during SEM observation.
接着,第2方案是以通过在铜中导入位错而容易析出硫(S)为目的,将热轧工序时的温度设定在比通常的铜的制造条件的温度(即,950℃~600℃)更低的温度(880℃~550℃)。通过这样的温度设定,可以使S在位错上析出,或者以钛的氧化物(例如,TiO2)为核而使S析出。作为一例,如图5和图6所示,与熔融铜一起形成Ti-O-S粒子等。Next, in the second scheme, the temperature during the hot rolling process is set at a temperature higher than the usual copper production conditions (that is, 950° C. to 600° C.) for the purpose of easily precipitating sulfur (S) by introducing dislocations into copper. °C) lower temperature (880 °C ~ 550 °C). By setting such a temperature, S can be precipitated on dislocations, or S can be precipitated using titanium oxide (for example, TiO 2 ) as a nucleus. As an example, as shown in FIGS. 5 and 6 , Ti—OS particles and the like are formed together with molten copper.
通过以上的第1方案和第2方案,铜中所含的硫结晶并析出,因此在冷拉丝加工后可以得到具有所希望的半软化温度和所希望的电导率的铜盘条。According to the above first and second aspects, the sulfur contained in the copper is crystallized and precipitated, so that a copper wire rod having a desired semi-softening temperature and a desired electric conductivity can be obtained after cold wire drawing.
另外,构成本实施方式的轧制铜箔的软质低浓度铜合金材料使用SCR连续铸造轧制设备来制造。这里,作为使用SCR连续铸造轧制设备时的制造条件的限制,设置以下的3个条件。In addition, the soft low-concentration copper alloy material constituting the rolled copper foil of this embodiment is produced using SCR continuous casting and rolling equipment. Here, the following three conditions are set as restrictions on manufacturing conditions when using the SCR continuous casting and rolling facility.
(1)关于组成(1) Regarding composition
得到电导率为98%IACS以上的软质铜材的情况下,作为含有不可避免的杂质的纯铜(基础原材料),使用含有3~12质量ppm的硫、超过2质量ppm且为30质量ppm以下的氧、和4~55质量ppm的钛的软质低浓度铜合金材料,由该软质低浓度铜合金材料制造盘条(线坯)。In order to obtain a soft copper material with an electrical conductivity of 98% IACS or more, as pure copper (basic raw material) containing unavoidable impurities, use sulfur containing 3 to 12 mass ppm, more than 2 mass ppm and 30 mass ppm A soft low-concentration copper alloy material of the following oxygen and 4 to 55 mass ppm of titanium is used to manufacture a wire rod (wire stock) from the soft low-concentration copper alloy material.
这里,得到电导率为100%IACS以上的软质铜材的情况下,作为含有不可避免的杂质的纯铜(基础原材料),使用含有2~12质量ppm的硫、超过2质量ppm且为30质量ppm以下的氧、和4~37质量ppm的钛的软质低浓度铜合金材料。另外,得到电导率为102%IACS以上的软质铜材的情况下,作为含有不可避免的杂质的纯铜(基础原材料),使用含有3~12质量ppm的硫、超过2质量ppm且为30质量ppm以下的氧、和4~25质量ppm的钛的软质低浓度铜合金材料。Here, in the case of obtaining a soft copper material having an electrical conductivity of 100% IACS or more, as pure copper (basic raw material) containing unavoidable impurities, sulfur containing 2 to 12 mass ppm, exceeding 2 mass ppm and 30 A soft low-concentration copper alloy material consisting of oxygen at mass ppm or less and titanium at 4 to 37 mass ppm. In addition, in the case of obtaining a soft copper material with an electrical conductivity of 102% IACS or more, as pure copper (basic raw material) containing unavoidable impurities, sulfur containing 3 to 12 mass ppm, exceeding 2 mass ppm and 30 A soft low-concentration copper alloy material consisting of oxygen at mass ppm or less and titanium at 4 to 25 mass ppm.
通常,在纯铜的工业制造中,由于在制造电解铜时在铜中引入硫,因此难以使硫在3质量ppm以下。通用电解铜的硫浓度的上限是12质量ppm。Generally, in the industrial production of pure copper, since sulfur is introduced into copper during the production of electrolytic copper, it is difficult to keep sulfur at 3 mass ppm or less. The upper limit of the sulfur concentration of general-purpose electrolytic copper is 12 mass ppm.
氧浓度低时,构成轧制铜箔的软质低浓度铜合金材料的半软化温度难以降低,因此氧浓度控制为超过2质量ppm的量。另外,氧浓度高时,在热轧工序中容易在构成轧制铜箔的软质低浓度铜合金材料的表面上产生损伤,因此控制为30质量ppm以下。When the oxygen concentration is low, it is difficult to lower the semi-softening temperature of the soft low-concentration copper alloy material constituting the rolled copper foil, so the oxygen concentration is controlled to exceed 2 mass ppm. In addition, when the oxygen concentration is high, damage is likely to occur on the surface of the soft low-concentration copper alloy material constituting the rolled copper foil in the hot rolling process, so it is controlled to be 30 mass ppm or less.
(2)关于分散的物质(2) Regarding dispersed substances
优选分散在构成轧制铜箔的软质低浓度铜合金材料内的分散粒子的尺寸小,而且优选分散粒子大量分散在构成轧制铜箔的软质低浓度铜合金材料内。其理由是由于:分散粒子具有作为硫的析出位点的功能,作为析出位点要求尺寸小、数量多。The size of the dispersed particles dispersed in the soft low-concentration copper alloy material constituting the rolled copper foil is preferably small, and it is preferable that a large number of dispersed particles are dispersed in the soft low-concentration copper alloy material constituting the rolled copper foil. The reason for this is that the dispersed particles function as precipitation sites of sulfur, and the precipitation sites are required to be small in size and large in number.
构成轧制铜箔的软质低浓度铜合金材料中所含的硫和钛作为TiO、TiO2、TiS或具有Ti-O-S键的化合物、或者TiO、TiO2、TiS或具有Ti-O-S键的化合物的凝集物而含有,残余部分的Ti和S作为固溶体而含有。作为构成轧制铜箔的软质低浓度铜合金材料,使用TiO具有200nm以下的尺寸、TiO2具有1000nm以下的尺寸、TiS具有200nm以下的尺寸、Ti-O-S的形态的化合物具有300nm以下的尺寸、且它们分布在晶粒内的软质低浓度铜合金材料。Sulfur and titanium contained in soft low-concentration copper alloy materials constituting rolled copper foil as TiO, TiO 2 , TiS or compounds with Ti-OS bonds, or TiO, TiO 2 , TiS or compounds with Ti-OS bonds Condensates of compounds are contained, and the remainder of Ti and S are contained as solid solutions. As the soft low-concentration copper alloy material constituting the rolled copper foil, TiO has a size of 200nm or less, TiO 2 has a size of 1000nm or less, TiS has a size of 200nm or less, and a compound in the form of Ti-OS has a size of 300nm or less. , and they are distributed in the soft low-concentration copper alloy material in the grain.
另外,根据铸造时的熔融铜的保持时间和冷却条件,晶粒内形成的粒子尺寸会变化,因此铸造条件也适当地设定。In addition, since the size of the particles formed in the crystal grains changes depending on the retention time and cooling conditions of the molten copper during casting, the casting conditions are also appropriately set.
(3)关于铸造条件(3) Regarding casting conditions
利用SCR连续铸造轧制,以铸条的加工度为90%(30mm)~99.8%(5mm)制作盘条。作为一例,采用以加工度99.3%制造φ8mm的盘条的条件。以下,对铸造条件(a)~(b)进行说明。SCR continuous casting and rolling is used to make wire rods with a processing degree of 90% (30mm) to 99.8% (5mm). As an example, the conditions for manufacturing a wire rod of φ8 mm at a working degree of 99.3% are employed. Hereinafter, the casting conditions (a) to (b) will be described.
[铸造条件(a)][Casting condition (a)]
熔化炉内的熔融铜温度控制在1100℃以上1320℃以下。熔融铜的温度高时,有气孔增多、产生损伤、同时粒子尺寸变大的倾向,因此控制在1320℃以下。另外,就控制在1100℃以上的理由而言,虽然铜容易凝固、制造不稳定是理由,但是熔融铜温度优选尽可能低的温度。The molten copper temperature in the melting furnace is controlled above 1100°C and below 1320°C. When the temperature of molten copper is high, pores tend to increase, damage occurs, and the particle size tends to increase, so it is controlled at 1320°C or lower. In addition, the reason for controlling at 1100° C. or higher is that copper is easy to solidify and production is unstable, but the molten copper temperature is preferably as low as possible.
[铸造条件(b)][Casting condition (b)]
就热轧加工的温度而言,将最初的轧辊的温度控制在880℃以下,并且将最终的轧辊的温度控制在550℃以上。As for the temperature of the hot rolling process, the temperature of the initial roll is controlled below 880°C, and the temperature of the final roll is controlled above 550°C.
与通常的纯铜的制造条件不同,为了进一步减小作为熔融铜中的硫的结晶和热轧中的硫的析出的驱动力的固溶限,优选将熔融铜温度和热轧加工的温度设定在[铸造条件(a)]和[铸造条件(b)]中说明的条件。Unlike normal pure copper production conditions, in order to further reduce the solid solution limit, which is the driving force for the crystallization of sulfur in molten copper and the precipitation of sulfur in hot rolling, it is preferable to set the temperature of molten copper and the temperature of hot rolling to Set the conditions described in [Casting Conditions (a)] and [Casting Conditions (b)].
另外,就通常的热轧加工的温度而言,最初的轧辊中为950℃以下,最终的轧辊中为600℃以上,但是为了进一步减小固溶限,在本实施方式中,最初的轧辊中设定为880℃以下,最终的轧辊中设定为550℃以上。In addition, the temperature of the usual hot rolling process is 950° C. or lower in the first roll, and 600° C. or higher in the final roll. However, in order to further reduce the solid solution limit, in this embodiment, the first roll Set to 880°C or lower, and set to 550°C or higher in the final roll.
另外,将最终的轧辊的温度设定在550℃的理由是由于:在低于550℃的温度下获得的盘条的损伤增多,无法将构成所制造的轧制铜箔的软质低浓度铜合金材料用作制品。就热轧加工的温度而言,最初的轧辊中控制在880℃以下的温度,最终的轧辊中控制在550℃以上的温度,并且优选为尽可能低的温度。通过进行这样的温度设定,可以使构成轧制铜箔的软质低浓度铜合金材料的半软化温度(加工成φ8~φ2.6mm后的半软化温度)接近6N的Cu的半软化温度(即130℃)。In addition, the reason why the temperature of the final roll is set at 550°C is that the damage of the wire rod obtained at a temperature lower than 550°C increases, and the soft low-concentration copper constituting the rolled copper foil produced cannot be removed. Alloy materials are used as products. Regarding the temperature of the hot rolling process, the temperature of the initial roll is controlled at 880° C. or lower, and the temperature of the final roll is controlled at 550° C. or higher, and the temperature is preferably as low as possible. By setting such a temperature, the semi-softening temperature of the soft low-concentration copper alloy material constituting the rolled copper foil (the semi-softening temperature after processing to φ8-φ2.6mm) can be close to the semi-softening temperature of 6N Cu ( ie 130°C).
无氧铜的电导率为101.7%IACS左右,6N的Cu的电导率为102.8%IACS。在本实施方式中,例如直径φ8mm尺寸的盘条的电导率为98%IACS以上,优选为100%IACS以上,更加优选为102%IACS以上。另外,在本实施方式中,制造冷拉丝加工后的线材(例如,φ2.6mm)的盘条的半软化温度为130℃以上且为148℃以下的软质低浓度铜合金,并将该软质低浓度铜合金用于轧制铜箔的制造。The electrical conductivity of oxygen-free copper is about 101.7% IACS, and the electrical conductivity of 6N Cu is 102.8% IACS. In the present embodiment, for example, the electrical conductivity of the wire rod having a diameter of φ8 mm is 98% IACS or higher, preferably 100% IACS or higher, more preferably 102% IACS or higher. In addition, in the present embodiment, a soft low-concentration copper alloy having a semi-softening temperature of the wire rod (for example, φ2.6mm) after cold drawing is produced from 130° C. to 148° C. High-quality low-concentration copper alloys are used in the manufacture of rolled copper foil.
为了在工业上使用,作为由电解铜制造的可工业利用的纯度的软质铜线的电导率,要求98%IACS以上的电导率。另外,从工业价值判断,半软化温度为148℃以下。由于6N的Cu的半软化温度为127℃~130℃,因此从所得的数据将半软化温度的上限值设定在130℃。这略微不同是由于存在6N的Cu中所不含的不可避免的杂质。For industrial use, an electrical conductivity of 98% IACS or higher is required as an electrical conductivity of an industrially usable pure soft copper wire made of electrolytic copper. In addition, judging from the industrial value, the half-softening temperature is 148° C. or lower. Since the half-softening temperature of 6N Cu is 127°C to 130°C, the upper limit of the half-softening temperature is set to 130°C from the obtained data. This slight difference is due to the presence of unavoidable impurities not contained in 6N Cu.
基础材料的铜优选在竖炉中熔化后,以还原状态流过槽。即,优选在还原气体(例如CO)氛围屏障等还原系统下,一边控制低浓度铜合金的硫浓度、钛浓度和氧浓度一边进行铸造,并且对材料实施轧制加工,从而稳定地制造盘条。另外,铜氧化物混入和/或粒子尺寸大于规定尺寸会使所制造的轧制铜箔的品质降低。The copper of the base material is preferably melted in the shaft furnace and flows through the trough in a reduced state. That is, it is preferable to cast the low-concentration copper alloy while controlling the sulfur concentration, titanium concentration, and oxygen concentration in a reducing system such as a reducing gas (such as CO) atmosphere barrier, and to perform rolling processing on the material to stably manufacture the wire rod . In addition, the incorporation of copper oxides and/or particle size larger than a predetermined size will lower the quality of the produced rolled copper foil.
这里,在构成轧制铜箔的软质低浓度铜合金材料中添加钛作为添加物的理由如下所述。即,由于(a)钛在熔融铜中容易与硫结合从而形成化合物;(b)与Zr等其他金属相比,容易加工且易于处理;(c)与Nb等相比便宜;(d)容易以氧化物为核而析出。Here, the reason why titanium is added as an additive to the soft low-concentration copper alloy material constituting the rolled copper foil is as follows. That is, because (a) titanium is easily combined with sulfur in molten copper to form a compound; (b) compared with other metals such as Zr, it is easy to process and handle; (c) it is cheaper than Nb, etc.; (d) it is easy to Precipitate with oxide as the nucleus.
由上,可以得到生产率高,电导率、半软化温度、表面品质优异的实用的软质低浓度铜合金材料作为构成本实施方式的轧制铜箔的软质低浓度铜合金材料的原料。另外,也可以在软质低浓度铜合金材料的表面上形成镀层。镀层可以使用例如以锡、镍、银为主成分的材料或者无Pb镀。From the above, a practical soft low-concentration copper alloy material with high productivity and excellent electrical conductivity, semi-softening temperature, and surface quality can be obtained as a raw material for the soft low-concentration copper alloy material constituting the rolled copper foil of this embodiment. In addition, a plated layer may also be formed on the surface of the soft low-concentration copper alloy material. For the plating layer, for example, a material mainly composed of tin, nickel, or silver, or Pb-free plating can be used.
另外,在本实施方式中,利用SCR连续铸造轧制法来制作盘条,并且利用热轧来制作软质材料,但也可以采用双辊式连续铸造轧制法或普罗佩兹式连续铸造轧制法。In addition, in this embodiment, the wire rod is produced by the SCR continuous casting and rolling method, and the soft material is produced by hot rolling, but the twin-roll continuous casting and rolling method or the Propez continuous casting and rolling method may also be used. method.
(实施方式的效果)(Effect of embodiment)
本实施方式中的轧制铜箔通过添加的Ti捕捉作为杂质的S,铜母相(基体)高纯度化而变软。也就是说,可以在更少轧制次数或更低轧制荷重下进行加工,直至加工成规定厚度,加工性优异。另外,可以通过固化时的热处理(150~160℃)来使铜箔软化和再结晶,由此可以提高弯曲特性。In the rolled copper foil in this embodiment, added Ti captures S as an impurity, and the copper matrix (matrix) is purified and softened. That is, it can be processed to a predetermined thickness with fewer rolling times or a lower rolling load, and the workability is excellent. In addition, the copper foil can be softened and recrystallized by heat treatment (150 to 160° C.) at the time of curing, thereby improving bending characteristics.
另外,本实施方式中的轧制铜箔具备高导电性且具有高弯曲寿命。也就是说,轧制铜箔兼具这些优异的特性(加工性、低温下的软化、高弯曲特性、高电导率),由此可以也达成轧制铜箔制造中、制品组装时的操作效率、成本削减。另外,由于无需铜的高纯度化(99.9999%以上)处理而利用便宜的连续铸造轧制法即可得到,因此可以实现原材料本身的低成本化。这些用途并不限于前述的FPC、COF、TAB等,可以广泛应用于在锂离子电池、锂聚合物电池等的电极中使用的铜箔等。Moreover, the rolled copper foil in this embodiment has high electroconductivity and has a high bending life. In other words, the rolled copper foil combines these excellent properties (workability, softening at low temperature, high bending properties, high electrical conductivity), thereby achieving operational efficiency in the manufacture of rolled copper foil and in product assembly , Cost reduction. In addition, since it can be obtained by an inexpensive continuous casting and rolling method without the need for high-purity (99.9999%) copper, it is possible to reduce the cost of the raw material itself. These uses are not limited to the above-mentioned FPC, COF, TAB, etc., but can be widely applied to copper foils and the like used for electrodes of lithium ion batteries, lithium polymer batteries, and the like.
实施例Example
表1表示实验条件和结果。Table 1 shows the experimental conditions and results.
表1Table 1
首先,作为实验材料,制作具有表1所示的氧浓度、硫浓度、钛浓度的φ8mm的铜线(盘条,加工度99.3%)。φ8mm的铜线是利用SCR连续铸造轧制来实施热轧加工而得的。就Ti而言,在还原气体氛围中使通过竖炉熔化的铜熔液流过槽,将流过槽后的铜熔液导入相同的还原气体氛围的铸造罐中,在该铸造罐中,添加Ti后,将其通过喷嘴,利用在铸圈和环形带之间形成的铸模来制作铸条。热轧加工该铸条而制作φ8mm的铜线。接着,对各实验材料实施冷拉丝加工。由此制作φ2.6mm尺寸的铜线。然后,测定φ2.6mm尺寸的铜线的半软化温度和电导率,并且评价φ8mm的铜线中的分散粒子尺寸。First, as test materials, φ8mm copper wires (wire rods, processing degree 99.3%) having the oxygen concentrations, sulfur concentrations, and titanium concentrations shown in Table 1 were produced. The φ8mm copper wire was hot-rolled by SCR continuous casting and rolling. As for Ti, molten copper melted in a shaft furnace is passed through a tank in a reducing gas atmosphere, and the molten copper that has flowed through the tank is introduced into a casting tank with the same reducing gas atmosphere, and in the casting tank, added After Ti, it is passed through the nozzle, using the mold formed between the casting ring and the annular belt to make the cast strip. This cast bar was hot-rolled to produce a φ8 mm copper wire. Next, cold wire drawing was performed on each test material. Thus, a copper wire having a size of φ2.6 mm was produced. Then, the half-softening temperature and electrical conductivity of the φ2.6 mm-sized copper wire were measured, and the dispersed particle size in the φ8 mm copper wire was evaluated.
氧浓度通过氧分析器(Leco(注册商标)氧分析器)来测定。硫、钛的各浓度通过ICP发光分光分析来分析。The oxygen concentration was measured with an oxygen analyzer (Leco (registered trademark) oxygen analyzer). Each concentration of sulfur and titanium was analyzed by ICP emission spectroscopic analysis.
φ2.6mm尺寸的半软化温度的测定是在400℃以下在各温度保持1小时后,在水中骤冷,实施拉伸试验,由其结果求出。使用室温下的拉伸试验的结果和在400℃下进行了1小时的油浴热处理的软质铜线的拉伸试验的结果来求出,将与表示由这两个拉伸试验的拉伸强度相加后除以2而得到的值的强度对应的温度定义为半软化温度而求出。The half-softening temperature of the diameter of φ2.6mm is measured by holding at each temperature below 400°C for 1 hour, quenching in water, performing a tensile test, and obtaining it from the result. It is obtained using the results of the tensile test at room temperature and the result of the tensile test of soft copper wire subjected to an oil bath heat treatment at 400°C for 1 hour, and the tensile test obtained by these two tensile tests The temperature corresponding to the value obtained by dividing the strength by 2 after adding the strength was defined as the half-softening temperature and obtained.
如实施方式中所述,优选分散于软质低浓度铜合金线内的分散粒子的尺寸小,且优选分散粒子大量分散于软质低浓度铜合金线内。因此,将直径500nm以下的分散粒子为90%以上的情况作为合格。这里,“尺寸”是指化合物的尺寸,是指化合物的形状的长径和短径中的长径的尺寸。另外,“粒子”表示前述TiO、TiO2、Ti-O-S。另外,“90%”表示该粒子数目相对于全体的粒子数目的比例。As described in the embodiment, it is preferable that the size of the dispersed particles dispersed in the soft low-concentration copper alloy wire is small, and it is preferable that a large number of dispersed particles be dispersed in the soft low-concentration copper alloy wire. Therefore, the case where 90% or more of the dispersed particles with a diameter of 500 nm or less was considered acceptable. Here, the "size" refers to the size of the compound, and refers to the size of the major axis among the major axis and the minor axis of the shape of the compound. In addition, "particle" means the aforementioned TiO, TiO 2 , and Ti-OS. In addition, "90%" represents the ratio of the particle number to the whole particle number.
表1中,比较例1是在实验室中、在Ar氛围中试制直径φ8mm的铜线的结果,在铜熔液中添加了0~18质量ppm的Ti。未添加Ti的铜线的半软化温度为215℃,与之相对,添加了13质量ppm的Ti的铜线的半软化温度降低至160℃(在实验中是最小温度。)。如表1所示,随着Ti浓度增加至15质量ppm、18质量ppm,半软化温度也上升,无法实现作为所要求的半软化温度的148℃以下。另外,虽然工业上要求的电导率为98%IACS以上,但是综合评价不合格(以下,用“×”表示不合格)。In Table 1, Comparative Example 1 is the result of trial production of a copper wire with a diameter of φ8 mm in an Ar atmosphere in a laboratory, and 0 to 18 mass ppm of Ti was added to the copper melt. The semi-softening temperature of the copper wire to which Ti was not added was 215° C., but that of the copper wire to which 13 mass ppm of Ti was added decreased to 160° C. (minimum temperature in the experiment). As shown in Table 1, as the Ti concentration increased to 15 mass ppm and 18 mass ppm, the half-softening temperature also increased, and the required half-softening temperature of 148° C. or lower could not be achieved. In addition, although the industrially required electrical conductivity was 98% IACS or higher, the overall evaluation was unacceptable (hereinafter, unacceptable is indicated by "x").
因此,作为比较例2,使用SCR连续铸造轧制法,试制将氧浓度调整至7~8质量ppm的φ8mm铜线(盘条)。Therefore, as Comparative Example 2, a φ8 mm copper wire (wire rod) in which the oxygen concentration was adjusted to 7 to 8 mass ppm was trial-manufactured using the SCR continuous casting and rolling method.
在比较例2中,虽然在利用SCR连续铸造轧制法试制的铜线中,是Ti浓度最小(即,0质量ppm、2质量ppm)的铜线,电导率为102%IACS以上,但由于半软化温度为164℃、157℃,并非所要求的148℃以下,因此综合评价为“×”。In Comparative Example 2, among the copper wires trial-produced by the SCR continuous casting and rolling method, the copper wire with the smallest Ti concentration (that is, 0 mass ppm, 2 mass ppm) had an electrical conductivity of 102% IACS or more, but because The half-softening temperature was 164°C and 157°C, but not below the required 148°C, so the comprehensive evaluation was "×".
在实施例1中,试制氧浓度和硫浓度大致相同(即,氧浓度:7~8质量ppm,硫浓度:5质量ppm)、并且Ti浓度在4~55质量ppm的范围内的不同的铜线。In Example 1, the oxygen concentration and the sulfur concentration were substantially the same (that is, the oxygen concentration: 7 to 8 mass ppm, the sulfur concentration: 5 mass ppm), and the Ti concentration was in the range of 4 to 55 mass ppm. Wire.
Ti浓度为4~55质量ppm的范围,半软化温度为148℃以下,电导率也为98%IACS以上102%IACS以上,分散粒子尺寸为500nm以下的粒子是90%以上,是良好的。另外,盘条的表面也洁净,满足所有的制品性能,因此综合评价为合格(以下,用“○”表示合格)。The Ti concentration is in the range of 4 to 55 mass ppm, the half-softening temperature is 148° C. or less, the electrical conductivity is also 98% IACS or more and 102% IACS or more, and the particles with a dispersed particle size of 500 nm or less are 90% or more, which is good. In addition, the surface of the wire rod was also clean and satisfied all the product properties, so the comprehensive evaluation was passed (hereinafter, “◯” indicates pass).
这里,满足电导率100%IACS以上的铜线是Ti浓度为4~37质量ppm的情况,满足102%IACS以上的铜线是Ti浓度为4~25质量ppm的情况。Ti浓度为13质量ppm时,电导率显示出作为最大值的102.4%IACS,在该浓度的周边,电导率是略低的值。这是由于,在Ti浓度为13质量ppm时,通过以化合物的形式捕捉铜中的硫成分,从而显示出接近于高纯度铜(6N)的电导率。Here, the copper wire satisfying the electrical conductivity of 100% IACS or higher has a Ti concentration of 4 to 37 mass ppm, and the copper wire satisfying 102% IACS or higher has a Ti concentration of 4 to 25 mass ppm. When the Ti concentration was 13 mass ppm, the electrical conductivity showed a maximum value of 102.4% IACS, and the electrical conductivity was a slightly lower value around this concentration. This is because, when the Ti concentration is 13 mass ppm, the sulfur component in copper is captured as a compound, thereby exhibiting electrical conductivity close to that of high-purity copper (6N).
因此,通过提高氧浓度、添加Ti,可以满足半软化温度和电导率二者。Therefore, by increasing the oxygen concentration and adding Ti, both the half-softening temperature and the electrical conductivity can be satisfied.
在比较例3中,试制了使Ti浓度为60质量ppm的铜线。比较例3的铜线虽然电导率满足要求,但半软化温度为148℃以上,不满足制品性能。而且,盘条的表面的损伤也多,难以用作制品。因此,显示出优选Ti的添加量不足60质量ppm。In Comparative Example 3, a copper wire having a Ti concentration of 60 mass ppm was trial-produced. Although the electrical conductivity of the copper wire of Comparative Example 3 meets the requirements, the semi-softening temperature is above 148° C., which does not meet the product performance. In addition, the surface of the wire rod has many damages, making it difficult to use it as a product. Therefore, it was shown that the addition amount of Ti is preferably less than 60 mass ppm.
就实施例2的铜线而言,将硫浓度设定在5质量ppm并且将Ti浓度控制在13~10质量ppm的范围内,通过改变氧浓度来研究氧浓度的影响。Regarding the copper wire of Example 2, the sulfur concentration was set at 5 mass ppm and the Ti concentration was controlled within the range of 13 to 10 mass ppm, and the influence of the oxygen concentration was studied by changing the oxygen concentration.
关于氧浓度,分别制作超过2质量ppm且至30质量ppm以下的浓度差异大的铜线。但是,氧浓度不足2质量ppm的铜线由于生产困难而无法稳定制造,因此综合评价为“△”(“△”是“○”和“×”的中间评价。)。另外,即使使氧浓度为30质量ppm,半软化温度和电导率二者也均满足要求。Regarding the oxygen concentration, copper wires having a large concentration difference from more than 2 mass ppm to 30 mass ppm or less were produced. However, copper wires with an oxygen concentration of less than 2 mass ppm were difficult to produce stably, so the overall evaluation was "△" ("△" is an intermediate evaluation between "◯" and "×"). In addition, even if the oxygen concentration was set to 30 mass ppm, both the half-softening temperature and the electrical conductivity were satisfactory.
在比较例4中,氧浓度为40质量ppm的情况下,盘条的表面的损伤多,是无法用作制品的状态。In Comparative Example 4, when the oxygen concentration was 40 mass ppm, the surface of the wire rod had many damages, and it was in a state where it could not be used as a product.
因此,通过使氧浓度为超过2且为30质量ppm以下的范围内,显示出可以满足半软化温度、电导率102%IACS以上、分散粒子尺寸的任一特性,而且盘条的表面也洁净,可以满足制品性能。Therefore, by making the oxygen concentration more than 2 and being in the range of 30 mass ppm or less, it can be shown that the semi-softening temperature, the electrical conductivity of 102% IACS or more, and the dispersed particle size can be satisfied, and the surface of the wire rod is also clean. Can meet product performance.
实施例3是将氧浓度和Ti浓度设定在相互接近的浓度、并且使硫浓度在2~12质量ppm的范围内变化的铜线。实施例3中,关于硫浓度小于2质量ppm的铜线,在原料的制约上无法实现。但是,通过分别控制Ti浓度和硫浓度,半软化温度和电导率二者均可以满足要求。Example 3 is a copper wire in which the oxygen concentration and the Ti concentration are set to be close to each other, and the sulfur concentration is varied within the range of 2 to 12 mass ppm. In Example 3, regarding the copper wire with a sulfur concentration of less than 2 mass ppm, it was not possible due to constraints on raw materials. However, by separately controlling the Ti concentration and the sulfur concentration, both the half-softening temperature and the electrical conductivity can be satisfied.
比较例5中,硫浓度为18质量ppm、Ti浓度为13质量ppm的情况下,半软化温度高达162℃,不满足所要求的特性。另外,特别是盘条的表面品质差,难以制品化。In Comparative Example 5, when the sulfur concentration was 18 mass ppm and the Ti concentration was 13 mass ppm, the half-softening temperature was as high as 162° C., which did not satisfy the required characteristics. In addition, in particular, the surface quality of the wire rod is poor, and it is difficult to commercialize it.
由上,硫浓度为2~12质量ppm的范围的情况下,显示出可以满足半软化温度、电导率102%IACS以上、分散粒子尺寸的任一特性,而且盘条的表面也洁净,可以满足制品性能。From the above, when the sulfur concentration is in the range of 2 to 12 mass ppm, any of the characteristics of the half-softening temperature, the electrical conductivity of 102% IACS or more, and the size of the dispersed particles can be satisfied, and the surface of the wire rod is also clean, which can satisfy Product performance.
比较例6是使用了6N的Cu的铜线。就比较例6的铜线而言,半软化温度为127℃~130℃,电导率为102.8%IACS,完全未发现分散粒子尺寸也为500以下的粒子。Comparative example 6 is a copper wire using 6N Cu. In the copper wire of Comparative Example 6, the semi-softening temperature was 127° C. to 130° C., the electrical conductivity was 102.8% IACS, and particles having a dispersed particle size of 500 or less were not found at all.
表2表示作为制造条件的熔融铜的温度和轧制温度。Table 2 shows the temperature of molten copper and the rolling temperature as production conditions.
表2Table 2
在比较例7中,在熔融铜温度为1330℃~1350℃且轧制温度为950~600℃下制作φ8mm的盘条。比较例7的盘条虽然半软化温度和电导率满足要求,但关于分散粒子尺寸,存在1000nm左右的粒子,500nm以上的粒子也存在超过10%。因此,判定实施例7的盘条不合适。In Comparative Example 7, a wire rod having a diameter of 8 mm was produced at a molten copper temperature of 1330°C to 1350°C and a rolling temperature of 950°C to 600°C. In the wire rod of Comparative Example 7, although the semi-softening temperature and electrical conductivity meet the requirements, there are particles with a size of about 1000 nm in the dispersed particle size, and more than 10% of particles with a size of 500 nm or more are present. Therefore, it was judged that the wire rod of Example 7 was not suitable.
实施例4中,将熔融铜温度控制在1200℃~1320℃的温度范围并且将轧制温度控制在880℃~550℃的温度范围来制作φ8mm的盘条。就实施例4的盘条而言,盘条表面的品质、分散粒子尺寸良好,综合评价为“○”。In Example 4, the molten copper temperature was controlled in the temperature range of 1200° C. to 1320° C. and the rolling temperature was controlled in the temperature range of 880° C. to 550° C. to produce a φ8 mm wire rod. In the wire rod of Example 4, the quality of the wire rod surface and the size of the dispersed particles were good, and the overall evaluation was "◯".
比较例8中,将熔融铜温度控制在1100℃,并且将轧制温度控制在880℃~550℃的温度范围内,从而制作φ8mm的盘条。就比较例8的盘条而言,由于熔融铜温度低,因此盘条的表面的损伤多,不适合作为制品。这是由于,熔融铜温度低,因此轧制时容易产生损伤。In Comparative Example 8, the molten copper temperature was controlled at 1100° C., and the rolling temperature was controlled within a temperature range of 880° C. to 550° C. to produce a φ8 mm wire rod. In the wire rod of Comparative Example 8, since the molten copper temperature was low, there were many damages on the surface of the wire rod, and it was not suitable as a product. This is because the temperature of molten copper is low, so damage is likely to occur during rolling.
比较例9中,将熔融铜温度控制在1300℃,并且将轧制温度控制在950℃~600℃的温度范围内,从而制作φ8mm的盘条。就比较例9的盘条而言,由于热轧工序中的温度高,因此盘条的表面品质良好,但是分散粒子尺寸中包含大尺寸,综合评价为“×”。In Comparative Example 9, the molten copper temperature was controlled at 1300° C., and the rolling temperature was controlled within a temperature range of 950° C. to 600° C. to produce a φ8 mm wire rod. In the wire rod of Comparative Example 9, since the temperature in the hot rolling process was high, the surface quality of the wire rod was good, but the dispersed particle size included large ones, and the overall evaluation was "x".
比较例10中,将熔融铜温度控制在1350℃,并且将轧制温度控制在880℃~550℃的温度范围内,从而制作φ8mm的盘条。就比较例10的盘条而言,由于熔融铜温度高,因此分散粒子尺寸中包含大尺寸,综合评价为“×”。In Comparative Example 10, the molten copper temperature was controlled at 1350° C., and the rolling temperature was controlled within a temperature range of 880° C. to 550° C. to produce a φ8 mm wire rod. In the wire rod of Comparative Example 10, since the molten copper temperature was high, the dispersed particle size included large ones, and the overall evaluation was "x".
(软质低浓度铜合金线的软质特性)(Soft characteristics of soft low-concentration copper alloy wire)
表3表示关于使用了无氧铜线的比较例11的盘条和由在低氧铜中含有13质量ppm的Ti的软质低浓度铜合金线制作的实施例5的盘条,测定在不同的退火温度下实施1小时的退火后的维氏硬度(Hv)的结果。Table 3 shows the wire rod of Comparative Example 11 using an oxygen-free copper wire and the wire rod of Example 5 produced from a soft low-concentration copper alloy wire containing 13 mass ppm of Ti in low-oxygen copper. The results of Vickers hardness (Hv) after annealing for 1 hour at the annealing temperature.
表3table 3
(单位:Hv)(Unit: Hv)
实施例5的盘条具有与表1的实施例1中记载的合金组成相同的合金组成。另外,作为试样,使用2.6mm直径的试样。参照表3显示出,退火温度为400℃的情况和600℃的情况下,比较例11的盘条与实施例5的盘条的维氏硬度是同等水平。因此,实施例5的盘条具有充分的软质特性,并且与无氧铜线相比,也显示出特别在退火温度超过400℃的温度范围内发挥优异的软质特性。The wire rod of Example 5 had the same alloy composition as that described in Example 1 in Table 1. In addition, as a sample, a sample with a diameter of 2.6 mm was used. Referring to Table 3, the Vickers hardness of the wire rod of Comparative Example 11 and the wire rod of Example 5 are at the same level when the annealing temperature is 400°C and 600°C. Therefore, the wire rod of Example 5 has sufficient soft properties, and exhibits excellent soft properties especially in the temperature range where the annealing temperature exceeds 400° C., compared with the oxygen-free copper wire.
(关于软质低浓度铜合金线的屈服强度和弯曲寿命的研究)(Research on yield strength and bending life of soft low-concentration copper alloy wire)
表4表示关于使用了无氧铜线的比较例12的盘条和使用在低氧铜中含有13质量ppm的Ti的软质低浓度铜合金线而制作的实施例6的盘条,测定在不同的退火温度下实施1小时的退火后的0.2%屈服强度值的变化的结果。Table 4 shows the wire rod of Comparative Example 12 using an oxygen-free copper wire and the wire rod of Example 6 produced using a soft low-concentration copper alloy wire containing 13 mass ppm of Ti in low-oxygen copper. The results of the change of the 0.2% yield strength value after annealing for 1 hour at different annealing temperatures.
表4Table 4
(单位:MPa)(Unit: MPa)
参照表4显示,退火温度为400℃和600℃的情况下,比较例12的盘条和实施例6的盘条的0.2%屈服强度值是同等水平。Referring to Table 4, it can be seen that the 0.2% yield strength values of the wire rod of Comparative Example 12 and the wire rod of Example 6 are at the same level when the annealing temperature is 400°C and 600°C.
图7表示弯曲疲劳试验的概略,图8表示测定在400℃下实施1小时的退火处理后的、使用了无氧铜的比较例13的盘条和使用在低氧铜中添加了Ti的软质低浓度铜合金线而制作的实施例7的盘条的弯曲寿命的结果。Fig. 7 shows the outline of the bending fatigue test, and Fig. 8 shows the measurement of the wire rod of Comparative Example 13 using oxygen-free copper after annealing at 400°C for 1 hour and the wire rod of Comparative Example 13 using low-oxygen copper with Ti added. The results of the bending life of the wire rod of Example 7 fabricated from a low-concentration copper alloy wire.
作为试样,使用对0.26mm直径的线材在退火温度400℃下实施了1小时的退火而得的试样,比较例13的盘条具有与比较例11的盘条相同的成分组成,实施例7的盘条具有与实施例5的盘条相同的成分组成。As a sample, a sample obtained by annealing a wire rod with a diameter of 0.26 mm at an annealing temperature of 400° C. for 1 hour was used. The wire rod of Comparative Example 13 had the same composition as that of the wire rod of Comparative Example 11. Example The wire rod of 7 has the same composition as that of the wire rod of Example 5.
弯曲寿命的测定使用弯曲疲劳试验来实施。弯曲疲劳试验是对试样负载荷重、对试样表面进行拉伸和压缩的反复弯曲应变的试验。具体而言,首先,如图7(A)所示,在弯曲头14所具备的夹具12上固定试样20,并且在弯曲夹具(即环10)之间设置试样20。然后,通过锤16对试样20负载荷重。接着,如图7(B)所示,通过使环10进行90度旋转而使试样20弯曲。通过该操作,在与环10接触的试样20的表面上产生压缩应变,在产生压缩应变的表面的相反侧的表面上产生拉伸应变。The measurement of the bending life was carried out using a bending fatigue test. The bending fatigue test is a test of the repeated bending strain of the load on the sample and the tension and compression of the surface of the sample. Specifically, first, as shown in FIG. 7(A), the
之后,试样20再次回到图7(A)的状态(即,未对试样20施加弯曲的状态)。接着,如图7(C)所示,通过使环10向与图7(B)的情况相反的方向进行90度旋转而使试样20弯曲。通过该操作,在与环10接触的试样20的表面上产生压缩应变,在产生压缩应变的表面的相反侧的表面上产生拉伸应变。然后,试样20再次回到图7(A)的状态。该弯曲疲劳的1个循环(即,将从图7(A)的状态变成(B)的状态、从(B)的状态回到(A)的状态、从(A)的状态变成(C)的状态、从(C)的状态回到(A)的状态的循环作为1个循环。)所需要的时间是4秒。Thereafter, the
表面弯曲应变由“表面弯曲应变(%)=r/(R+r)×100(%)”算出。另外,“R”是线料弯曲半径(30mm),“r”是线料半径。The surface bending strain was calculated from "surface bending strain (%)=r/(R+r)×100(%)". In addition, "R" is a wire bending radius (30mm), and "r" is a wire radius.
如图8所示,与比较例13的盘条相比,实施例7的盘条显示出高的弯曲寿命特性。As shown in FIG. 8 , compared with the wire rod of Comparative Example 13, the wire rod of Example 7 exhibited high bending life characteristics.
图9表示测定在600℃下实施1小时的退火处理后的、使用了无氧铜的比较例14的盘条和使用在低氧铜中添加了Ti的软质低浓度铜合金线而制作的实施例8的盘条的弯曲寿命的结果。Fig. 9 shows the measurement of the wire rod of Comparative Example 14 using oxygen-free copper after annealing treatment at 600°C for 1 hour and the wire rod made by using a soft low-concentration copper alloy wire in which Ti was added to low-oxygen copper. The results of the bending life of the wire rod of Example 8.
作为试样,使用对0.26mm直径的线材在退火温度600℃下实施了1小时的退火而得的试样,比较例14的盘条具有与比较例11的盘条相同的成分组成,实施例8的盘条具有与实施例5的盘条相同的成分组成。另外,弯曲寿命的测定与图8所示的测定方法同样地实施。其结果,与比较例14的盘条相比,实施例8的盘条显示出高的弯曲寿命特性。As a sample, a sample obtained by annealing a wire rod with a diameter of 0.26 mm at an annealing temperature of 600° C. for 1 hour was used. The wire rod of Comparative Example 14 had the same composition as that of the wire rod of Comparative Example 11. The wire rod of 8 has the same composition as that of the wire rod of Example 5. In addition, the measurement of the bending life was carried out in the same manner as the measurement method shown in FIG. 8 . As a result, compared with the wire rod of Comparative Example 14, the wire rod of Example 8 exhibited higher bending life characteristics.
实施例7、实施例8、比较例13和比较例14的盘条的弯曲寿命测定的结果可以理解是由于:在任一退火条件下,实施例7和实施例8的盘条与比较例13和比较例14的盘条相比,0.2%屈服强度值均显示大的值。The results of the bending life measurement of the wire rods of embodiment 7,
(关于软质低浓度铜合金线的晶体结构的研究)(Research on the crystal structure of soft low-concentration copper alloy wire)
图10表示实施例8的试样的宽度方向的断面组织。图11表示比较例14的试样的宽度方向的断面组织,FIG. 10 shows the cross-sectional structure in the width direction of the sample of Example 8. FIG. Fig. 11 shows the cross-sectional structure in the width direction of the sample of Comparative Example 14,
参照图11得知,比较例14的晶体结构是整体上大小相等的晶粒从表面部至中央部均匀排列。另一方面,实施例8的晶体结构是整体上晶粒的大小不均,在试样的断面方向的表面附近薄薄地形成的层中的晶粒尺寸与内部的晶粒尺寸相比,极大地减小了。Referring to FIG. 11 , in the crystal structure of Comparative Example 14, crystal grains of equal size are uniformly arranged from the surface portion to the central portion as a whole. On the other hand, in the crystal structure of Example 8, the size of the crystal grains is uneven as a whole, and the crystal grain size in the layer formed thinly near the surface in the cross-sectional direction of the sample is greatly larger than the internal crystal grain size. reduced.
本发明人认为,比较例14中未形成的表层中所出现的微细晶粒层有助于实施例8的弯曲特性的提高。The inventors of the present invention believe that the appearance of the fine grain layer in the surface layer not formed in Comparative Example 14 contributes to the improvement of the bending characteristics of Example 8.
通常理解为,如果在退火温度600℃下进行1小时的退火处理,则会像比较例14那样通过再结晶而均匀形成变粗的晶粒。但是,本实施例中,即使在退火温度600℃下进行1小时的退火处理,在表层也残存微细晶粒层。因此,本实施例中,认为可得到虽然是软质铜材但弯曲特性优异的软质低浓度铜合金材料。It is generally understood that if the annealing treatment is performed at an annealing temperature of 600° C. for 1 hour, coarse grains are uniformly formed by recrystallization as in Comparative Example 14. However, in this example, even if the annealing treatment was performed at an annealing temperature of 600° C. for 1 hour, the fine crystal grain layer remained on the surface layer. Therefore, in the present example, it is considered that a soft low-concentration copper alloy material having excellent bending characteristics can be obtained although it is a soft copper material.
另外,基于图10和图11所示的晶体结构的断面照片,测定实施例8和比较例14的试样的表层中的平均晶粒尺寸。In addition, the average crystal grain size in the surface layer of the samples of Example 8 and Comparative Example 14 was measured based on the cross-sectional photographs of the crystal structures shown in FIGS. 10 and 11 .
图12表示表层中的平均晶粒尺寸的测定方法的概略。Fig. 12 shows an outline of a method of measuring the average crystal grain size in the surface layer.
如图12所示,沿着深度方向以10μm间隔在从0.26mm直径的宽度方向断面的表面直至50μm的深度的长度1mm的线上的范围内,测定晶粒尺寸。然后,由各测定值(实测值)求出平均值,将该平均值作为平均晶粒尺寸。As shown in FIG. 12 , the crystal grain size was measured on a line of
测定的结果,比较例14的表层的平均晶粒尺寸为50μm,与此相对,实施例8的表层中的平均晶粒尺寸为10μm,差异大。可认为,由于表层的平均粒径尺寸小,因此可抑制弯曲疲劳试验所引起的龟裂的发展,弯曲疲劳寿命延长(即,晶粒尺寸大时,龟裂沿着晶界发展。但是,由于晶粒尺寸小时龟裂的发展方向改变,因此可抑制发展。)。如上所述,这可认为是在比较例和实施例的弯曲特性方面产生了大差异的理由。As a result of the measurement, the average crystal grain size of the surface layer of Comparative Example 14 was 50 μm, whereas the average crystal grain size of the surface layer of Example 8 was 10 μm, showing a large difference. It can be considered that since the average grain size of the surface layer is small, the development of cracks caused by the bending fatigue test can be suppressed, and the bending fatigue life is prolonged (that is, when the grain size is large, cracks develop along the grain boundaries. However, due to When the grain size is small, the development direction of cracks changes, so the development can be suppressed.). As described above, this is considered to be the reason for the large difference in bending characteristics between the comparative example and the example.
另外,就2.6mm直径的实施例7和比较例13的表层中的平均晶粒尺寸而言,测定沿着深度方向距0.26mm直径的宽度方向断面的表面为50μm的深度处的长度10mm的范围内的晶粒尺寸。In addition, regarding the average crystal grain size in the surface layer of Example 7 and Comparative Example 13 with a diameter of 2.6 mm, the range of
测定的结果,比较例13的表层中的平均晶粒尺寸为100μm,与此相对,实施例7的表层中的平均晶粒尺寸为20μm。As a result of the measurement, the average crystal grain size in the surface layer of Comparative Example 13 was 100 μm, whereas the average crystal grain size in the surface layer of Example 7 was 20 μm.
为了起到本实施例的效果,作为表层的平均晶粒尺寸的上限值,优选20μm以下。另外,考虑到制造上的界限值,优选为5μm以上的平均粒径尺寸。In order to achieve the effect of this example, the upper limit of the average crystal grain size of the surface layer is preferably 20 μm or less. In addition, considering the limit value on manufacture, it is preferable that it is an average particle size of 5 micrometers or more.
表5表示利用SCR连续铸造轧制,改变熔融铜温度和轧制温度,作为制作宽200mm×8mm的板材时的制造条件的熔融铜的温度和轧制温度。Table 5 shows the temperature of molten copper and the rolling temperature as manufacturing conditions when producing a sheet material with a width of 200 mm×8 mm by changing the molten copper temperature and rolling temperature by SCR continuous casting and rolling.
表5table 5
半软化温度和电导率通过将从厚度8mm冷轧至0.8mm的材料作为试样来评价。The semi-softening temperature and electrical conductivity were evaluated by using a material cold-rolled from a thickness of 8 mm to 0.8 mm as a sample.
比较例15中,将熔融铜温度控制在1330~1350℃,将轧制温度控制在950~600℃,试制平板。比较例15的原材料虽然半软化温度和电导率满足,但关于分散粒子的尺寸,也有1000nm左右的粒子,500nm以上的粒子也超过了10%。因此,其综合评价为不适合(“×”)。In Comparative Example 15, the molten copper temperature was controlled at 1330 to 1350° C., and the rolling temperature was controlled at 950 to 600° C. to manufacture a flat plate. The raw material of Comparative Example 15 has a satisfactory half-softening temperature and electrical conductivity, but the size of the dispersed particles also has particles of about 1000 nm, and more than 10% of the particles are 500 nm or more. Therefore, its overall evaluation was unsuitable ("X").
实施例9中,将熔融铜温度控制在1200~1320℃,将轧制温度控制在880~550℃,试制平板。就实施例9的原材料而言,板材的表面品质、分散粒子尺寸均良好,综合评价为“○”。另外,在厚度0.8mm的原材料中,与实施例8同样地,存在从其表面向内侧直至50μm深度的平均晶粒尺寸为20μm以下的表层。In Example 9, the molten copper temperature was controlled at 1200-1320° C., the rolling temperature was controlled at 880-550° C., and a flat plate was produced as a trial. Regarding the raw material of Example 9, both the surface quality of the board and the size of the dispersed particles were good, and the overall evaluation was "◯". In addition, in the raw material with a thickness of 0.8 mm, as in Example 8, there was a surface layer with an average crystal grain size of 20 μm or less from the surface inward to a depth of 50 μm.
比较例16中,将熔融铜温度控制在1100℃,将轧制温度控制在880~550℃,试制平板。就比较例16的原材料而言,由于熔融铜温度低,因此板材的表面损伤多,不适合作为制品。这是由于,熔融铜温度低,因此轧制时容易产生损伤。In Comparative Example 16, the molten copper temperature was controlled at 1100° C., and the rolling temperature was controlled at 880 to 550° C. to produce a flat plate. The raw material of Comparative Example 16 was unsuitable as a product because the temperature of the molten copper was low, so the surface of the plate was damaged a lot. This is because the temperature of molten copper is low, so damage is likely to occur during rolling.
比较例17中,将熔融铜温度控制在1300℃,将轧制温度控制在950~600℃,试制平板。就比较例17的原材料而言,由于热轧温度高,因此板材的表面品质良好,但有分散粒子尺寸大的粒子,综合评价为“×”。In Comparative Example 17, the molten copper temperature was controlled at 1300° C., and the rolling temperature was controlled at 950 to 600° C. to produce a flat plate. Regarding the raw material of Comparative Example 17, since the hot rolling temperature was high, the surface quality of the sheet was good, but there were particles with large dispersed particle sizes, and the overall evaluation was "x".
比较例18中,将熔融铜温度控制在1350℃,将轧制温度控制在880~550℃,试制平板。就比较例18的原材料而言,由于熔融铜温度高,因此有分散粒子尺寸大的粒子,综合评价为“×”。In Comparative Example 18, the molten copper temperature was controlled at 1350° C., and the rolling temperature was controlled at 880 to 550° C. to produce a flat plate. In the raw material of Comparative Example 18, since the molten copper temperature was high, there were particles having a large dispersed particle size, and the overall evaluation was "x".
利用冷轧将表5所示的实施例9的厚度8mm的材料加工成厚度20μm的箔形状,制成实施例10的轧制铜箔。表6表示分别关于通过与实施例10同样的加工、热处理精加工成同尺寸的由高纯度铜(6N)构成的比较例19的铜箔、由韧铜(TPC)构成的比较例20的铜箔、由无氧铜(OFC)构成的比较例21的铜箔,比较评价铜箔的特性的结果。The 8 mm-thick material of Example 9 shown in Table 5 was processed into a foil shape with a thickness of 20 μm by cold rolling to obtain a rolled copper foil of Example 10. Table 6 shows the copper foil of Comparative Example 19 composed of high-purity copper (6N) and the copper foil of Comparative Example 20 composed of tough copper (TPC) that were finished to the same size by the same processing and heat treatment as in Example 10. Foil and the copper foil of Comparative Example 21 made of oxygen-free copper (OFC), and the results of comparing and evaluating the characteristics of the copper foil.
表6Table 6
加工性用按照厚度0.8mm进行一端600℃×1小时的热处理、由此冷轧加工至200μm的厚度时的轧制次数来评价,将4种材料中轧制次数少的前2种评价为“○”。弯曲特性使用图13所示的试验机来评价。另外,试验机具备对导体1施加振动的振动附加部3、固定导体的导体固定部2a和导体固定部2b、对振动附加部3施加振动的振动发生装置4、以及支持振动发生装置4的支持部5而构成。The workability was evaluated by the number of rolling times when the thickness was 0.8mm, heat treated at one end at 600°C for 1 hour, and then cold-rolled to a thickness of 200μm. Among the four materials, the first two with the fewest rolling times were evaluated as " ○". Bending characteristics were evaluated using a testing machine shown in FIG. 13 . In addition, the testing machine is equipped with a
试验条件设定为:试验片宽12mm、试验片长200mm、曲率半径r=3mm、振动冲程10mm。将直至断裂的弯曲次数为1×104次以上的情况设为“○”,将不足1×104次的情况设为“×”。The test conditions are set as follows: the width of the test piece is 12mm, the length of the test piece is 200mm, the radius of curvature r=3mm, and the vibration stroke is 10mm. The case where the number of times of bending until fracture was 1×10 4 or more was regarded as “◯”, and the case where it was less than 1×10 4 times was regarded as “×”.
图14表示评价相对于实施例10和比较例21的退火温度的伸长率的结果。FIG. 14 shows the results of evaluating the elongation with respect to the annealing temperature of Example 10 and Comparative Example 21. FIG.
如表6所示,实施例10的加工性与比较例21相比优异,这可以根据在从退火温度100℃至900℃的宽范围内表现出优异的伸长率特性来判断。另外,从表6的结果综合判断可知,实施例10的材料表现出最优异的特性。As shown in Table 6, the workability of Example 10 is superior to that of Comparative Example 21, which can be judged from exhibiting excellent elongation characteristics in a wide range from annealing
以上说明了本发明的实施方式和实施例,但上述记载的实施方式和实施例并不限定权利要求范围所涉及的发明。另外,应该注意,实施方式和实施例中说明的特征的全部组合对用于解决发明课题的手段并不一定是必须的。The embodiments and examples of the present invention have been described above, but the above-described embodiments and examples do not limit the invention according to the scope of the claims. In addition, it should be noted that all combinations of the features described in the embodiments and examples are not necessarily essential to means for solving the problems of the invention.
Claims (7)
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| CN106735032A (en) * | 2016-12-14 | 2017-05-31 | 江苏亨通精工金属材料有限公司 | Nitrogen guard method and its corresponding structure for SCR methods cast copper cash base |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5077005A (en) * | 1989-03-06 | 1991-12-31 | Nippon Mining Co., Ltd. | High-conductivity copper alloys with excellent workability and heat resistance |
| JP2006274384A (en) * | 2005-03-30 | 2006-10-12 | Hitachi Cable Ltd | Copper material manufacturing method and copper material |
| JP2008001933A (en) * | 2006-06-21 | 2008-01-10 | Hitachi Cable Ltd | Copper alloy material, copper alloy conductor, method for producing the same, trolley wire for cable and cable |
| JP2008041447A (en) * | 2006-08-07 | 2008-02-21 | Hitachi Cable Ltd | Cable conductor, method of manufacturing the same, and flex-resistant cable using the conductor |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5077005A (en) * | 1989-03-06 | 1991-12-31 | Nippon Mining Co., Ltd. | High-conductivity copper alloys with excellent workability and heat resistance |
| JP2006274384A (en) * | 2005-03-30 | 2006-10-12 | Hitachi Cable Ltd | Copper material manufacturing method and copper material |
| JP2008001933A (en) * | 2006-06-21 | 2008-01-10 | Hitachi Cable Ltd | Copper alloy material, copper alloy conductor, method for producing the same, trolley wire for cable and cable |
| JP2008041447A (en) * | 2006-08-07 | 2008-02-21 | Hitachi Cable Ltd | Cable conductor, method of manufacturing the same, and flex-resistant cable using the conductor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106735032A (en) * | 2016-12-14 | 2017-05-31 | 江苏亨通精工金属材料有限公司 | Nitrogen guard method and its corresponding structure for SCR methods cast copper cash base |
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