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CN102237079A - Unit with sound insulation and shock isolation structure, array structure and manufacturing method of unit and array structure - Google Patents

Unit with sound insulation and shock isolation structure, array structure and manufacturing method of unit and array structure Download PDF

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Publication number
CN102237079A
CN102237079A CN2010101740310A CN201010174031A CN102237079A CN 102237079 A CN102237079 A CN 102237079A CN 2010101740310 A CN2010101740310 A CN 2010101740310A CN 201010174031 A CN201010174031 A CN 201010174031A CN 102237079 A CN102237079 A CN 102237079A
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unit
film
sound insulation
isolation structure
insulation isolation
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周荣宗
卢廷钜
邱佑宗
温宏远
郭惠隆
陈品诚
刘怡君
刘文亮
林圣文
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Industrial Technology Research Institute ITRI
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Industrial Technology Research Institute ITRI
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Abstract

The invention discloses a unit with a sound insulation and shock isolation structure, an array structure comprising the unit and a manufacturing method of the array structure. This unit with sound insulation shock insulation structure contains: a hollow outer frame, the hollow outer frame having an inner space; a film, which is configured in the inner space and is vertical to the inner wall of the hollow outer frame; and a first mass body disposed on an upper surface of the film, wherein a cross-sectional area of the inner space is larger than an area of the upper surface of the film.

Description

具有隔音隔震结构的单元、阵列结构及其二者的制造方法Cell with sound- and vibration-insulating structure, array structure, and manufacturing method for both

技术领域 technical field

本发明涉及一种具有隔音隔震结构的单元,特别是涉及一种具有负质量式隔音隔震结构的单元。  The invention relates to a unit with a sound-proof and shock-proof structure, in particular to a unit with a negative-mass sound-proof and shock-proof structure. the

背景技术 Background technique

具有阻隔噪音或是阻隔震动功能的消能结构,其用途十分的广泛。传统的隔音/隔震消能技术,是利用材料的本质,也就是利用材料受力产生变形所产生的阻尼来进行消能。  The energy dissipation structure with the function of blocking noise or vibration is widely used. The traditional sound insulation/seismic isolation and energy dissipation technology uses the nature of the material, that is, uses the damping generated by the deformation of the material to dissipate energy. the

传统阻尼式的消能系统,如美国专利6012543、6082489、5854453、5543198,大多是利用压缩空气或结构形变来达到消能的效果,但此种阻尼系统有许多天生无法克服的缺点,包括能量不可回收、频率频宽不可选择、需较大的缓冲空间,以及不具透明性等。  Traditional damping energy dissipation systems, such as U.S. patents 6012543, 6082489, 5854453, and 5543198, mostly use compressed air or structural deformation to achieve energy dissipation effects, but this type of damping system has many inherently insurmountable shortcomings, including energy insufficiency Recycling, frequency and bandwidth cannot be selected, large buffer space is required, and there is no transparency. the

因此,发展出新颖的隔音/隔震结构,来取代传统阻尼式消能系统,是目前亟需研究的重点。  Therefore, the development of a novel sound-insulation/seismic-isolation structure to replace the traditional damping energy dissipation system is an urgent research focus. the

发明内容 Contents of the invention

基于上述,本发明提供一种具有隔音隔震结构的单元,在设计的频率与频宽下,可完全阻挡声波或震波的传递。通过对该具有隔音隔震结构的单元的各部件的材料、质量、与弹性模数来进行调整、选取,达到有效阻隔噪音、震动的目的。  Based on the above, the present invention provides a unit with a sound-proof and shock-proof structure, which can completely block the transmission of sound waves or shock waves under the designed frequency and bandwidth. The purpose of effectively blocking noise and vibration is achieved by adjusting and selecting the material, quality, and elastic modulus of each component of the unit with the sound-proof and shock-proof structure. the

根据本发明一实施例,该具有隔音隔震结构的单元,包含:一中空外框,该中空外框具有一内部空间;一薄膜,配置于该内部空间内,并与该中空外框的内壁垂直;以及,一第一质量体配置于该薄膜的一上表面上,其中,该内部空间的截面积大于该薄膜的该上表面的面积。  According to an embodiment of the present invention, the unit with a sound and shock insulation structure includes: a hollow outer frame, the hollow outer frame has an inner space; a film is arranged in the inner space, and is connected to the inner wall of the hollow outer frame vertically; and, a first mass body is disposed on an upper surface of the film, wherein the cross-sectional area of the inner space is larger than that of the upper surface of the film. the

根据本发明另一实施例,本发明也提供一种阵列结构,包含:一承载基板;以及多个具有隔音隔震结构的单元,嵌入并贯穿该承载基板,其中每一 具有隔音隔震结构的单元,包含:一中空外框,该中空外框具有一内部空间;一薄膜,配置于该内部空间内,并与该中空外框的内壁垂直;以及,一第一质量体配置于该薄膜的一上表面上,其中任两相邻的具有隔音隔震结构的单元的中空外框相隔一特定距离。  According to another embodiment of the present invention, the present invention also provides an array structure, including: a load-bearing substrate; and a plurality of units with a sound-proof and shock-isolation structure embedded in and through the load-bearing substrate, each of which has a sound-proof and shock-isolation structure The unit includes: a hollow outer frame, the hollow outer frame has an inner space; a film is arranged in the inner space and is perpendicular to the inner wall of the hollow outer frame; and a first mass body is arranged on the thin film On an upper surface, the hollow outer frames of any two adjacent units with a sound-proof and shock-proof structure are separated by a specific distance. the

此外,根据本发明其他实施例,本发明也提供该具有隔音隔震结构的单元的制造方法,包含:提供一中空外框,该中空外框具有一内部空间;设置一薄膜在该内部空间内,并使该薄膜与该中空外框的内壁垂直;以及,设置一第一质量体配置于该薄膜的一上表面上,其中,该内部空间的截面积大于该薄膜的该上表面的面积。  In addition, according to other embodiments of the present invention, the present invention also provides a method for manufacturing the unit with a sound-insulating and shock-insulating structure, including: providing a hollow outer frame, the hollow outer frame having an inner space; arranging a film in the inner space , and make the film perpendicular to the inner wall of the hollow frame; and, a first mass body is arranged on an upper surface of the film, wherein the cross-sectional area of the inner space is larger than the area of the upper surface of the film. the

为让本发明的上述和其他目的、特征、和优点能更明显易懂,下文特举出较佳实施例,并配合所附附图,作详细说明如下:  In order to make the above-mentioned and other purposes, features, and advantages of the present invention more obvious and understandable, the preferred embodiments are specially cited below, and in conjunction with the accompanying drawings, they are described in detail as follows:

附图说明 Description of drawings

图1是显示本发明一较佳实施例所述的具有隔音隔震结构单元的示意图;  Fig. 1 is a schematic diagram showing a sound-proof and shock-proof structural unit described in a preferred embodiment of the present invention;

图2是图1所绘示的具有隔音隔震结构单元的上视图;  Fig. 2 is the upper view of the structural unit with sound and shock insulation shown in Fig. 1;

图3是图1所绘示的具有隔音隔震结构单元沿切线3-3’的剖面结构示意图;  Fig. 3 is a schematic cross-sectional structure diagram of the sound-proof and shock-proof structural unit shown in Fig. 1 along the tangent line 3-3';

图4-图6是显示本发明某些较佳实施例所述的具有隔音隔震结构单元的上视图;  Fig. 4-Fig. 6 is the top view that shows some preferred embodiments of the present invention have sound-proof and earthquake-proof structure unit;

图7-图8是显示本发明某些较佳实施例所述的具有隔音隔震结构单元的剖面结构示意图;  Fig. 7-Fig. 8 is the sectional structure schematic diagram showing the structural unit with sound insulation and earthquake isolation described in some preferred embodiments of the present invention;

图9a-图9b为一系列剖面结构示意图,用以显示本发明所述使用压印方式来形成具有隔音隔震结构单元的流程;  Figure 9a-Figure 9b is a series of cross-sectional schematic diagrams, used to show the flow of the present invention to form a structural unit with sound insulation and vibration isolation by means of embossing;

图10-图11是显示本发明一较佳实施例所述的包含有多个具有隔音隔震结构单元的阵列结构的示意图;  Figure 10-Figure 11 is a schematic diagram showing a preferred embodiment of the present invention comprising a plurality of array structures with sound-proof and shock-proof structural units;

图12是显示本发明实施例1所述的具有隔音隔震结构单元叠层其隔音/隔震的测量结果;  Fig. 12 shows the measurement results of the sound insulation/seismic insulation of the laminated structural unit with sound insulation and earthquake isolation described in Embodiment 1 of the present invention;

图13是显示本发明实施例2所述的具有隔音隔震结构单元叠层其隔音/隔震的测量结果;  Fig. 13 shows the measurement results of the sound insulation/seismic insulation of the stacked sound insulation/seismic isolation structure unit described in Embodiment 2 of the present invention;

图14为本发明实施例1所述的具有隔音隔震结构单元叠层的影像图。  Fig. 14 is an image diagram of the laminated structural unit with sound and shock insulation according to Embodiment 1 of the present invention. the

主要元件符号说明  Description of main component symbols

具有隔音隔震结构的单元~10;  Units with sound-proof and shock-proof structures ~ 10;

中空外框~12;  Hollow frame ~ 12;

内部空间~13;  interior space ~ 13;

薄膜~14;  Film ~ 14;

内壁~15;  Inner wall ~ 15;

第一质量体~16;  The first mass body ~ 16;

表面~17;  Surface ~ 17;

中空区域~18;  Hollow area ~ 18;

下表面~19;  lower surface ~ 19;

第二质量体~20;  The second mass body ~ 20;

外缘~21;  outer edge ~ 21;

模具~22;  Mold ~ 22;

基材24;  Substrate 24;

阵列结构~100;  array structure ~ 100;

内部空间~101;  interior space ~ 101;

承载基板~102;  Carrying substrate ~ 102;

具有隔音隔震结构的单元~104;  Unit ~104 with sound-proof and shock-proof structure;

中空外框~106;  Hollow frame ~ 106;

薄膜~108;  Film ~ 108;

质量体~110;  Mass body ~ 110;

特定距离~D。  Specific distance ~ D. the

具体实施方式 Detailed ways

根据本发明一实施例,该具有隔音隔震结构的单元10,请参照图1,包含一中空外框12,其中该中空外框12具有一内部空间13;一薄膜14配置于该内部空间13内,其中该薄膜与该中空外框12的内壁15垂直;一第一质量体16(例如高质量、高密度的材料)配置于该薄膜14的一上表面17上。该内部空间13的水平截面形状可为圆形、多边形、或其结合,而该中空外框12的外缘21形状可为圆形、多边形、或其结合。其中,该中空外框12 与该第一质量体16通过该薄膜14相连(请参照图2,为图1的上示图),而此具有隔音隔震结构的单元10的功能就如同一个垂直方向的弹簧,可使第一质量体16在薄膜14上往复上下震荡(请参照图3,为图1沿切线3-3’的剖面图)。本发明对所述的中空外框12、薄膜14、及第一质量体16的材料并无限定,可例如为聚合物、金属、有机或无机化合物。在本发明一较佳实施例中,该薄膜所适用的材料其杨氏膜数较佳介于0.1Mpa至100Gpa之间,而该薄膜的厚度可介于10nm至10mm之间。  According to an embodiment of the present invention, the unit 10 with a sound-proof and shock-proof structure, please refer to FIG. 1 , includes a hollow outer frame 12, wherein the hollow outer frame 12 has an inner space 13; a film 14 is disposed in the inner space 13 Inside, the film is perpendicular to the inner wall 15 of the hollow outer frame 12; a first mass body 16 (such as a high-quality, high-density material) is disposed on an upper surface 17 of the film 14 . The horizontal cross-sectional shape of the inner space 13 can be circular, polygonal, or a combination thereof, and the shape of the outer edge 21 of the hollow frame 12 can be circular, polygonal, or a combination thereof. Wherein, the hollow outer frame 12 is connected with the first mass body 16 through the film 14 (please refer to FIG. 2 , which is the upper view of FIG. 1 ), and the function of the unit 10 with the sound and shock insulation structure is just like a vertical The spring in the direction can make the first mass body 16 reciprocate and vibrate up and down on the membrane 14 (please refer to FIG. 3 , which is a cross-sectional view of FIG. 1 along the tangent line 3-3'). The present invention is not limited to the materials of the hollow outer frame 12 , the film 14 , and the first mass body 16 , which may be, for example, polymers, metals, organic or inorganic compounds. In a preferred embodiment of the present invention, the Young's number of the suitable material for the film is preferably between 0.1Mpa and 100GPa, and the thickness of the film can be between 10nm and 10mm. the

本发明的技术特征之一,是可对该中空外框12及该第一质量体16的质量大小以及该薄膜14的弹性系数及几何形状(或尺寸)等进行调整,即可针对特定频率的声波或震波进行隔绝。本发明所述具有隔音隔震结构的单元10,其可隔绝的特定频率声波或震波的范围为ω0至ω0’,在该特定频率范围内(ω0至ω0’),该具有隔音隔震结构的单元10拥有负质量的特性。其中,ω0与ω0’的定义满足下式的描述:  One of the technical characteristics of the present invention is that the mass size of the hollow frame 12 and the first mass body 16 and the elastic coefficient and geometric shape (or size) of the film 14 can be adjusted, that is, for a specific frequency Sound or shock waves are isolated. The unit 10 with sound and shock insulation structure of the present invention can isolate specific frequency sound waves or shock waves from ω0 to ω0', within the specific frequency range (ω0 to ω0'), the unit with sound and shock insulation structure Unit 10 possesses negative mass properties. Among them, the definition of ω0 and ω0' satisfies the description of the following formula:

ωω 00 == kk // mm

ωω 00 ′′ == ωω 00 Mm ++ mm // Mm

M表示外框质量,m表示第一质量体的质量,k表示薄膜垂直方向等效的弹性系数,而k值则由薄膜的杨氏模数及几何参数决定。根据本发明一实施例,该中空外框的质量可介于0.1mg至1000kg、且该第一质量体的质量介于0.1mg至1000kg,而该薄膜垂直方向等效弹性系数介于0.01(N/mm)至1000(N/mm)之间。此外,本发明所述的具有隔音隔震结构的单元所隔绝的声波或震波频率可介于0.1Hz~100kHz。  M represents the mass of the outer frame, m represents the mass of the first mass body, k represents the equivalent elastic coefficient in the vertical direction of the film, and the value of k is determined by the Young's modulus and geometric parameters of the film. According to an embodiment of the present invention, the mass of the hollow outer frame may range from 0.1 mg to 1000 kg, the mass of the first mass body may range from 0.1 mg to 1000 kg, and the equivalent elastic coefficient of the film in the vertical direction is between 0.01 (N /mm) to 1000 (N/mm). In addition, the sound wave or shock wave frequency isolated by the unit with the sound and shock insulation structure of the present invention can be between 0.1 Hz and 100 kHz. the

值得注意的是,为调整可隔绝的特定频率声波或震波的范围,请参照图4,本发明可通过让该薄膜14具有至少一中空区域18,以使该中空外框12的内部空间13的水平截面积A1大于该薄膜的上表面的面积A2(该薄膜的上表面的面积A2等于水平截面积A1减掉该中空区域18面积),改变薄膜的几何参数,进而改变薄膜垂直方向的等效的弹性系数k。当A2/A1的比值愈小,则薄膜垂直方向的等效的弹性系数k愈小。该薄膜的形状除了可为片状外, 也可为条状、或十字状,请参照图5及图6,且该中空区域18可为圆形、多边形、扇形、不规则形、或其结合。  It is worth noting that, in order to adjust the range of specific frequency sound waves or shock waves that can be isolated, please refer to FIG. 4, the present invention can make the inner space 13 of the hollow outer frame 12 The horizontal cross-sectional area A1 is greater than the area A2 of the upper surface of the film (the area A2 of the upper surface of the film is equal to the horizontal cross-sectional area A1 minus the area of the hollow area 18), changing the geometric parameters of the film, and then changing the vertical direction of the film. The equivalent elastic coefficient k of the direction. When the ratio of A 2 /A 1 is smaller, the equivalent elastic coefficient k in the vertical direction of the film is smaller. The shape of the film can be not only a sheet shape, but also a strip shape or a cross shape, please refer to Figure 5 and Figure 6, and the hollow area 18 can be circular, polygonal, fan-shaped, irregular, or a combination thereof .

在本发明另一实施例中,请参照图7,该具有隔音隔震结构的单元10可更包含一第二质量体20配置于该薄膜14的一下表面19上。此外,该具有隔音隔震结构的单元10的第一质量体16可贯穿该薄膜12,并与该第二质量体20直接接触,请参照图8。  In another embodiment of the present invention, please refer to FIG. 7 , the unit 10 with a sound-proof and shock-proof structure may further include a second mass body 20 disposed on the lower surface 19 of the film 14 . In addition, the first mass body 16 of the unit 10 with the sound and vibration isolation structure can penetrate the membrane 12 and be in direct contact with the second mass body 20 , please refer to FIG. 8 . the

本发明所述的具有隔音隔震结构的单元,其制造方法包含以下步骤。首先,提供一中空外框,该中空外框具有一内部空间。接者,设置一薄膜在该内部空间内,并使该薄膜与该中空外框的内壁垂直;以及,设置一第一质量体配置于该薄膜的一上表面上。值得注意的是,该内部空间的截面积A1可大于该薄膜的该上表面的面积A2,以使薄膜垂直方向等效的弹性系数降低,以适用于较低频的噪音或震动源。在本发明一较佳实施例中,该第一质量体、该薄膜、及该中空外框由滚压、光刻蚀刻、电铸、压印、机械加工、或激光加工所形成。此外,在本发明一较佳实施例中,该第一质量体、该薄膜、及该中空外框可经由同一道制作工艺所完成。举例来说,请参照图9a及图9b,可使用一模具22对一基材24进行压印,得到一体成型的具有隔音隔震结构的单元10。此外,该第一质量体的制作方式也可由喷墨、点胶、电镀、电铸、或自组装方式所形成。该具有隔音隔震结构的单元的制造方法,可更包含:设置一第二质量体在该薄膜的一下表面上,且该第一质量体可贯穿该薄膜,并与该第二质量体直接接触。  The manufacturing method of the unit with the sound-proof and shock-proof structure of the present invention includes the following steps. Firstly, a hollow outer frame is provided, and the hollow outer frame has an inner space. Next, a thin film is arranged in the internal space, and the thin film is perpendicular to the inner wall of the hollow frame; and a first mass body is arranged on an upper surface of the thin film. It should be noted that the cross-sectional area A 1 of the inner space may be larger than the area A 2 of the upper surface of the film, so that the equivalent elastic coefficient in the vertical direction of the film is reduced, which is suitable for lower frequency noise or vibration sources. In a preferred embodiment of the present invention, the first mass body, the thin film, and the hollow outer frame are formed by rolling, photolithography, electroforming, embossing, mechanical processing, or laser processing. In addition, in a preferred embodiment of the present invention, the first mass body, the thin film, and the hollow outer frame can be completed through the same manufacturing process. For example, please refer to FIG. 9 a and FIG. 9 b , a mold 22 can be used to emboss a base material 24 to obtain an integrally formed unit 10 with a sound-proof and shock-proof structure. In addition, the first mass body can also be formed by inkjet, glue dispensing, electroplating, electroforming, or self-assembly. The manufacturing method of the unit with the sound and vibration isolation structure may further include: setting a second mass body on the lower surface of the film, and the first mass body can penetrate the film and directly contact with the second mass body .

根据本发明其他实施例,本发明也提供一种阵列结构100,请参照图10,可包含一承载基板102;以及多个具有隔音隔震结构的单元104,嵌入并贯穿该承载基板102,其中每一具有隔音隔震结构的单元104,包含:一中空外框106,该中空外框具有一内部空间101;一薄膜108,配置于该内部空间101内;以及一质量体110配置于该薄膜108上。值得注意的是,其中任两相邻的具有隔音隔震结构的单元104的中空外框106必须相隔一特定距离D,此距离D可依实际需求作调整以控制结构单元在承载基板上的密度,但以确保相邻的单元104不会通过其外框接触而互相影响,其中该特定距离介于100nm至100cm。该多个具有隔音隔震结构的单元104在该承载基板102上的排列方式可为有序排列或无规排列,且该阵列结构可为单层或多层,请参照图11。  According to other embodiments of the present invention, the present invention also provides an array structure 100, please refer to FIG. 10, which may include a carrier substrate 102; Each unit 104 with a sound and shock insulation structure includes: a hollow outer frame 106, the hollow outer frame has an inner space 101; a film 108 is arranged in the inner space 101; and a mass body 110 is arranged in the film 108 on. It is worth noting that the hollow outer frames 106 of any two adjacent units 104 with sound and vibration isolation structures must be separated by a specific distance D, and this distance D can be adjusted according to actual needs to control the density of the structural units on the carrier substrate , but to ensure that adjacent units 104 do not affect each other through their outer frame contact, wherein the specified distance is between 100 nm and 100 cm. The arrangement of the plurality of units 104 with sound and vibration isolation structures on the carrier substrate 102 can be ordered or random, and the array structure can be single-layer or multi-layer, please refer to FIG. 11 . the

以下通过下列实施例及比较实施例,来说明本发明所述的具有隔音隔震结构的单元,用以进一步阐明本发明的技术特征。  The following examples and comparative examples are used to illustrate the unit with the sound-proof and shock-proof structure of the present invention, so as to further clarify the technical features of the present invention. the

实施例1:低频共振结构设计  Example 1: Low-frequency resonance structure design

首先,取数个压克力管(管厚=2mm,管长=2.5cm,直径=5cm,重量=10.5g),作为中空外框,并取数个橡胶薄膜(膜厚为80μm,等效K值=50.6kg/m),并以铜(质量=3.7g)作为质量体,组装成如图14所示的具有隔音隔震结构的单元,其适合的噪音或震动源的频率经计算小于100Hz。接着,以压电振动源提供一低频震动,并以光纤式干涉仪搭配扫频的方式测量系统的频率响应。测量时一边增加刺激频率,一边测量在该频率的响应,并同时测量输入的振幅,并以此振幅来规格化(normalize),得到衰减的分贝值,结果如图12所示。  First, take several acrylic tubes (tube thickness = 2mm, tube length = 2.5cm, diameter = 5cm, weight = 10.5g) as a hollow outer frame, and take several rubber films (film thickness is 80μm, equivalent K value = 50.6kg/m), and copper (mass = 3.7g) is used as the mass body, and assembled into a unit with a sound-proof and shock-proof structure as shown in Figure 14. The frequency of the suitable noise or vibration source is calculated to be less than 100Hz. Then, a low-frequency vibration is provided by a piezoelectric vibration source, and the frequency response of the system is measured by a fiber-optic interferometer combined with a frequency sweep. While increasing the stimulus frequency during measurement, measure the response at this frequency, measure the input amplitude at the same time, and normalize the amplitude to obtain the decibel value of attenuation. The results are shown in Figure 12. the

由图12所示的测量结果可知,在59Hz后产生负质量效应,能量在薄膜上共振形成驻波,且相位与外框相反,致使系统振动迅速衰减,阻隔频宽(负分贝(dB)值区域)约30Hz(59Hz~88Hz),最大衰减可达近40分贝(dB)。  From the measurement results shown in Figure 12, it can be known that the negative mass effect occurs after 59Hz, and the energy resonates on the film to form a standing wave, and the phase is opposite to that of the outer frame, causing the vibration of the system to attenuate rapidly, and the blocking bandwidth (negative decibel (dB) value area) about 30Hz (59Hz ~ 88Hz), the maximum attenuation can reach nearly 40 decibels (dB). the

实施例2:多频域模拟  Example 2: Multi-frequency domain simulation

为了验证材料的阻隔效果,我们利用有限元素分析软体(ANSYS)对所设计的薄膜质量结构进行建模,其中所选用的基材为PET(杨氏模数约为3Gpa),首先在一基材上做出圆形且嵌入基材的外框,而PET薄膜结构则配置于该外框的内部区域。此外,在薄膜结构的中央填入高质量的材料以形成质量体(铜、密度8.92g/cm3)。此外,若将所得的具有隔音隔震结构的单元叠合起来时,可在两相邻的单元间加入比PET软1000倍以上的材料,在此我们选用杨氏模数约等于800kPa的PDMS。加入此软性中介层的目的主要是要防止应力波经由外框结构传递。  In order to verify the barrier effect of the material, we use the finite element analysis software (ANSYS) to model the designed film quality structure, in which the substrate selected is PET (Young's modulus is about 3Gpa). A circular outer frame embedded in the base material is made on the top, and the PET film structure is arranged in the inner area of the outer frame. In addition, a high-quality material was filled in the center of the film structure to form a mass (copper, density 8.92 g/cm 3 ). In addition, if the resulting units with sound and shock insulation structures are stacked, a material that is 1000 times softer than PET can be added between two adjacent units. Here we choose PDMS with a Young's modulus approximately equal to 800kPa. The purpose of adding this soft intermediary layer is mainly to prevent stress waves from being transmitted through the outer frame structure.

在几何参数的设计上需考量所需针对的阻隔频率,本实施例分别针对19.23Hz、655Hz、10866Hz等三种频率以及其附近频率的隔音特性做分析,所设计的隔音隔震结构的单元尺寸定义及数值请参照表1:  In the design of geometric parameters, the required blocking frequency needs to be considered. This example analyzes the sound insulation characteristics of the three frequencies of 19.23Hz, 655Hz, and 10866Hz and the frequencies near them. The unit size of the designed sound and vibration isolation structure Please refer to Table 1 for definitions and values:

  隔音隔震  结构单元 Sound insulation and vibration isolation Structural unit   1 1   2 2  3 3   针对频率: For frequency:   10866Hz 10866Hz   655Hz 655Hz  19.23Hz 19.23Hz   单元尺寸 unit size   1.6mm×1.6mm  ×0.96mm(厚度) 1.6mm×1.6mm ×0.96mm (thickness)   25mm×25mm×  15mm(厚度) 25mm×25mm× 15mm (thickness)  450mm×450mm ×270mm(厚度) 450mm×450mm×270mm(thickness)   薄膜外径 Film outer diameter   1.44mm 1.44mm   22.5mm 22.5mm  405mm 405mm   薄膜厚度 membrane thickness   20um 20um   300um 300um  3.5mm 3.5mm   中心质量直径 Central mass diameter   1.12mm 1.12mm   17.5mm 17.5mm  315mm 315mm   中心质量厚度 center mass thickness   0.64mm 0.64mm   15mm 15mm  180mm 180mm

表1  Table 1

接着,将五个同种隔音隔震结构单元进行相叠来进行测试,并将振波输入于第一个单元。上述三种隔音隔震结构单元的测式结果如图13所示,分析如下:  Next, five units of the same type of sound-insulation and shock-isolation structures are stacked for testing, and vibration waves are input to the first unit. Figure 13 shows the measurement results of the above-mentioned three kinds of sound- and seismic-isolation structural units, and the analysis is as follows:

隔音隔震结构单元1(6kHz~30kHz):此区间最佳的阻隔效率约在15000Hz的地方,阻隔能力约可至37dB。  Sound-proof and shock-proof structural unit 1 (6kHz~30kHz): The best barrier efficiency in this range is about 15000Hz, and the barrier capacity can reach about 37dB. the

隔音隔震结构单元2(350Hz~2500Hz):此区间最佳的阻隔效率约在1250Hz的地方,阻隔能力约可至36dB。  Sound-proof and shock-proof structural unit 2 (350Hz-2500Hz): The best barrier efficiency in this range is about 1250Hz, and the barrier capacity can reach about 36dB. the

隔音隔震结构单元3(15Hz~100Hz):此区间最佳的阻隔效率约在60Hz的地方,阻隔能力约可至25dB。  Sound-proof and shock-proof structural unit 3 (15Hz~100Hz): The best barrier efficiency in this range is about 60Hz, and the barrier capacity can reach about 25dB. the

综合上述,本发明提供一种具有隔音隔震结构的单元及包含其的阵列结构,属于负质量消能系统的应用,通过改变中空外框及该质量体的质量大小以及薄膜的垂直方向等效弹性系数(杨氏模数和几何参数),即可针对特定频率的声波或震波进行隔绝。本发明所述的具有隔音隔震结构的单元可进一步使用一体成型的制造方式来形成,例如压印方式。  Based on the above, the present invention provides a unit with a sound-proof and shock-proof structure and an array structure containing it, which belongs to the application of a negative mass energy dissipation system. By changing the mass of the hollow frame and the mass body and the vertical direction of the film, The coefficient of elasticity (Young's modulus and geometric parameters) can be used to isolate sound waves or shock waves of a specific frequency. The unit with the sound-proof and shock-proof structure described in the present invention can be further formed by integral molding, such as embossing. the

该具有隔音隔震结构的单元及包含其的阵列结构,由于薄膜中央可配置有高质量的材料,薄膜结构取代垂直方向的弹簧使中央质量体在薄膜上能够往覆震荡。此种周期性的多层结构经设计可使特定频率范围内的弹性波无法传递或仅能以固定方向传递。本发明所述的具有隔音隔震结构的单元可进一步结合压电材料,可将能量回收。此外,与传统阻尼消能方式相比,本发明所述的具有隔音隔震结构单元的优点如表2所示:  The unit with the sound-proof and vibration-isolation structure and the array structure including it, because the center of the film can be equipped with high-quality materials, the film structure replaces the spring in the vertical direction so that the central mass body can vibrate back and forth on the film. This periodic multilayer structure is designed so that elastic waves in a certain frequency range cannot be transmitted or can only be transmitted in a fixed direction. The unit with the sound-proof and shock-proof structure of the present invention can be further combined with piezoelectric materials to recover energy. In addition, compared with the traditional damping energy dissipation method, the advantages of the sound-insulation and shock-isolation structural unit described in the present invention are shown in Table 2:

 the   机制 mechanism   能量回收性 energy recovery   频率/频宽 Frequency/Bandwidth   厚度 thickness   可靠度 Reliability   阻尼系统  (Damping) Damping system (Damping)   消能 energy dissipation   变成热能或  永久形变 into heat or permanently deformed   不可选择 Not optional   需要较大的  缓冲厚度 A larger buffer thickness is required   对于隔振系  统常造成永  久性的破坏 Often cause permanent damage to vibration isolation systems   负质量系  统(Neg.  Mass) Negative mass system (Neg. Mass)   隔绝  能量 isolate energy   变成动能可  再利用 Turn into kinetic energy and can be reused   可选择 optional   可做成薄板  或薄膜 Can be made into sheet or film   隔音隔振系  统皆在弹性  限内 All sound and vibration isolation systems are within the elastic limit

表2  Table 2

虽然已结合以上较佳实施例揭露了本发明,然而其并非用以限定本发明,任何熟悉此技术者,在不脱离本发明的精神和范围内,可作些许的更动与润饰,因此本发明的保护范围应以附上的权利要求所界定的为准。  Although the present invention has been disclosed in conjunction with the above preferred embodiments, it is not intended to limit the present invention. Anyone skilled in the art can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, this The scope of protection of the invention should be defined by the appended claims. the

Claims (27)

1. unit with sound insulation isolation structure comprises:
Hollow outer frame, this hollow outer frame has an inner space;
Film is disposed in this inner space, and vertical with the inwall of this hollow outer frame; And
First mass is disposed on the upper surface of this film,
Wherein, the sectional area of this inner space is greater than the area of this upper surface of this film.
2. the unit with sound insulation isolation structure as claimed in claim 1, wherein the thickness of this film is between between the 10nm to 10mm.
3. the unit with sound insulation isolation structure as claimed in claim 1, wherein the Young film number of this film is between between the 0.1Mpa to 100Gpa.
4. the unit with sound insulation isolation structure as claimed in claim 1, wherein this film is shaped as strip, crosswise or sheet.
5. the unit with sound insulation isolation structure as claimed in claim 1, wherein this film has at least one hollow region.
6. the unit with sound insulation isolation structure as claimed in claim 5, wherein this hollow region is circle, polygon, fan-shaped, irregular shape or its combination.
7. the unit with sound insulation isolation structure as claimed in claim 1, wherein the horizontal cross sectional geometry of this inner space is circle, polygon or its combination.
8. the unit with sound insulation isolation structure as claimed in claim 1, wherein the outer rim of this hollow outer frame is shaped as circle, polygon or its combination.
9. the unit with sound insulation isolation structure as claimed in claim 1, wherein the quality of this hollow outer frame is between 0.1mg to 1000kg.
10. the unit with sound insulation isolation structure as claimed in claim 1, wherein the quality of this first mass is between 0.1mg to 1000kg.
11. the unit with sound insulation isolation structure as claimed in claim 1, wherein this film vertical direction equivalent elastic coefficient between 0.01 (N/mm) between 1000 (N/mm).
12. the unit with sound insulation isolation structure as claimed in claim 1, wherein sound wave that this unit completely cut off or seismic wave frequency are between 0.1Hz~100kHz.
13. the unit with sound insulation isolation structure as claimed in claim 1 also comprises:
Second mass is disposed on a lower surface of this film.
14. the unit with sound insulation isolation structure as claimed in claim 1 also comprises:
Second mass is disposed on a lower surface of this film.
15. the unit with sound insulation isolation structure as claimed in claim 14, wherein this first mass runs through this film, and directly contacts with this second mass.
16. the unit with sound insulation isolation structure as claimed in claim 1, wherein this first mass, this film, and this hollow outer frame be formed in one.
17. an array structure comprises:
Bearing substrate; And
A plurality of unit with sound insulation isolation structure embed and run through this bearing substrate, and wherein each has the unit of sound insulation isolation structure, comprises:
Hollow outer frame, this hollow outer frame has an inner space;
Film is disposed in this inner space, and vertical with the inwall of this hollow outer frame; And
First mass is disposed on the upper surface of this film,
The hollow outer frame of the wherein wantonly two adjacent unit specific range of being separated by with sound insulation isolation structure.
18. array structure as claimed in claim 17, wherein this specific range is between between the 100nm to 100cm.
19. array structure as claimed in claim 17, wherein these a plurality of unit arrangement modes on this bearing substrate with sound insulation isolation structure are arranged or random arrangement for orderly.
20. array structure as claimed in claim 17, wherein this array structure is a single or multiple lift.
21. the manufacture method with unit of sound insulation isolation structure comprises:
One hollow outer frame is provided, and this hollow outer frame has an inner space;
One film is set in this inner space, and makes this film vertical with the inwall of this hollow outer frame; And
Be provided with on the upper surface that one first mass is disposed at this film,
Wherein, the sectional area of this inner space is greater than the area of this upper surface of this film.
22. the manufacture method with unit of sound insulation isolation structure as claimed in claim 21, wherein this first mass, this film, and this hollow outer frame use and finish with manufacture craft.
23. the manufacture method with unit of sound insulation isolation structure as claimed in claim 21, wherein this first mass, this film, and this hollow outer frame formed by roll extrusion, photoetching etching, electroforming, machining or Laser Processing.
24. the manufacture method with unit of sound insulation isolation structure as claimed in claim 21, wherein this first mass, this film, and this hollow outer frame formed by impression.
25. the manufacture method with unit of sound insulation isolation structure as claimed in claim 21, wherein the production method of this first mass is formed by ink-jet, some glue, plating, electroforming or self assembly mode.
26. the manufacture method with unit of sound insulation isolation structure as claimed in claim 21 also comprises:
One second mass is set on a lower surface of this film.
27. the manufacture method with unit of sound insulation isolation structure as claimed in claim 21, wherein this first mass runs through this film, and directly contacts with this second mass.
CN2010101740310A 2010-05-06 2010-05-06 Unit with sound insulation and shock isolation structure, array structure and manufacturing method of unit and array structure Pending CN102237079A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103975385A (en) * 2011-10-06 2014-08-06 Hrl实验室有限责任公司 High bandwidth anti-resonance film
WO2014148912A1 (en) * 2013-03-18 2014-09-25 Østfold University College A sound barrier material
WO2015039622A1 (en) * 2013-09-19 2015-03-26 The Hong Kong University Of Science And Technology Active control of membrane-type acoustic metamaterial
CN105118496A (en) * 2015-09-11 2015-12-02 黄礼范 Acoustic meta-material basic structure unit, composite structure thereof, and assembly method
CN107251136A (en) * 2015-02-27 2017-10-13 富士胶片株式会社 The manufacture method of noise reduction structure and noise reduction structure
CN108986782A (en) * 2017-05-31 2018-12-11 青岛海尔智能技术研发有限公司 A kind of denoising device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2541159A (en) * 1946-01-22 1951-02-13 Paul H Geiger Sound deadener for vibratory bodies
US5241512A (en) * 1991-04-25 1993-08-31 Hutchinson 2 Acoustic protection material and apparatus including such material
JPH09226035A (en) * 1996-02-27 1997-09-02 Agency Of Ind Science & Technol Sound insulating board and its manufacture
US20030062217A1 (en) * 2001-09-28 2003-04-03 Ping Sheng Acoustic attenuation materials
CN1664920A (en) * 2004-03-05 2005-09-07 桑德科技有限公司 Sound attenuating structure
CN101351328A (en) * 2005-12-29 2009-01-21 3M创新有限公司 Porous membrane

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2541159A (en) * 1946-01-22 1951-02-13 Paul H Geiger Sound deadener for vibratory bodies
US5241512A (en) * 1991-04-25 1993-08-31 Hutchinson 2 Acoustic protection material and apparatus including such material
JPH09226035A (en) * 1996-02-27 1997-09-02 Agency Of Ind Science & Technol Sound insulating board and its manufacture
US20030062217A1 (en) * 2001-09-28 2003-04-03 Ping Sheng Acoustic attenuation materials
CN1664920A (en) * 2004-03-05 2005-09-07 桑德科技有限公司 Sound attenuating structure
CN101351328A (en) * 2005-12-29 2009-01-21 3M创新有限公司 Porous membrane

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103975385A (en) * 2011-10-06 2014-08-06 Hrl实验室有限责任公司 High bandwidth anti-resonance film
CN103975385B (en) * 2011-10-06 2018-04-10 Hrl实验室有限责任公司 High bandwidth anti-resonance film
WO2014148912A1 (en) * 2013-03-18 2014-09-25 Østfold University College A sound barrier material
WO2015039622A1 (en) * 2013-09-19 2015-03-26 The Hong Kong University Of Science And Technology Active control of membrane-type acoustic metamaterial
CN105556591A (en) * 2013-09-19 2016-05-04 香港科技大学 Active control of thin-film acoustic metamaterials
US9659557B2 (en) 2013-09-19 2017-05-23 The Hong Kong University Of Science And Technology Active control of membrane-type acoustic metamaterial
CN105556591B (en) * 2013-09-19 2020-08-14 香港科技大学 Active control of thin-film acoustic metamaterials
CN107251136A (en) * 2015-02-27 2017-10-13 富士胶片株式会社 The manufacture method of noise reduction structure and noise reduction structure
CN107251136B (en) * 2015-02-27 2021-02-12 富士胶片株式会社 Sound-proof structure and manufacturing method thereof
CN105118496A (en) * 2015-09-11 2015-12-02 黄礼范 Acoustic meta-material basic structure unit, composite structure thereof, and assembly method
CN105118496B (en) * 2015-09-11 2019-09-13 黄礼范 Acoustic metamaterial basic structural unit and its composite construction and assembly method
CN108986782A (en) * 2017-05-31 2018-12-11 青岛海尔智能技术研发有限公司 A kind of denoising device

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Application publication date: 20111109