CN102101000A - Process and device for treating tail gas during producing trichlorosilane - Google Patents
Process and device for treating tail gas during producing trichlorosilane Download PDFInfo
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- CN102101000A CN102101000A CN2010105836952A CN201010583695A CN102101000A CN 102101000 A CN102101000 A CN 102101000A CN 2010105836952 A CN2010105836952 A CN 2010105836952A CN 201010583695 A CN201010583695 A CN 201010583695A CN 102101000 A CN102101000 A CN 102101000A
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Abstract
The invention relates to a process and device for treating tail gas during producing trichlorosilane. The process provided by the invention comprises: the tail gas generated from a trichlorosilane synthesizing workshop section and a trichlorosilane fractionating workshop section is compressed by a diaphragm compressor in a pressuring way, then condensed by a rear water condenser, deeply condensed by a rear deep condenser, and finally absorbed by a circulating absorption tower to recover the chlorosilane; and the hydrogen chloride in the tail gas which is absorbed by the circulating absorption tower is absorbed by a secondary falling film absorption tower to be made into 30% hydrochloric acid, and the tail gas which is absorbed by the falling film absorption tower is directly discharged to the air after being checked out. The device provided by the invention consists of the diaphragm compressor, the rear water condenser, the rear deep condenser, the circulating absorption tower and the falling film absorption tower which are connected with the one another in series by pipelines, wherein the diaphragm compressor is provided with a tail gas inlet, and the falling film absorption tower is provided with an outlet and an emptying port. According to the invention, the 99.5% of chlorosilane and hydrogen chloride can be recovered; the great mass of the chlorosilane and hydrogen in the tail gas not only can be recovered, but also can be reused, so that the process and device provided by the invention are favorable for environmental conservation.
Description
Technical field
Patent of the present invention relates to the tail gas treatment process and the device thereof of a kind of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section.
Background technology
Contain 5.4% chlorosilane, 30% hydrogen chloride gas, 0.2% nitrogen and 64.2% hydrogen in the tail gas of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section, other gas comprises 0.2%.The direct emptying of this part tail gas will pollute environment, therefore is necessary to design a kind of tail gas treatment process and device thereof.
Summary of the invention
The objective of the invention is at above-mentioned present situation, aim to provide a kind of most of chlorosilane and hydrogen chloride that can reclaim in the tail gas, the treatment process and the device thereof of tail gas during the trichlorosilane that utilizes is again produced.
The implementation of the object of the invention is, the treatment process of tail gas during trichlorosilane is produced, and concrete steps are as follows:
1) tail gas of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section is handled through diaphragm type compressor pressurization compression, moulding pressure: 0.5～0.8Mpa,
2) water-cooled condenser condensation behind machine, deep cooling condenser deep cooling coagulates behind the machine, condensation temperature :-30 ℃～-25 ℃,
3) the circulation absorption tower of flowing through, the by-product silicon tetrachloride during trichlorosilane is produced is as the absorbent on circulation absorption tower, and trichlorosilane is condensed, and reclaims trichlorosilane, condensation temperature :-25 ℃～-20 ℃, pressure: 0.5～0.55Mpa,
4) tail gas after the circulation absorption tower absorbs is through the hydrogen chloride in the two-stage film-falling absorption tower recovery tail gas, make concentration and be 30% hydrochloric acid, gas temperature in the direct emptying of tail gas after film-falling absorption tower absorbs, film-falling absorption tower :-15 ℃～0 ℃, pressure: 0.1～0.25Mpa.
The exhaust gas processing device of synthesizing trichlorosilane, form by deep cooling condenser, circulation absorption tower and film-falling absorption tower behind water-cooled condenser, the machine behind the diaphragm type compressor that is connected in series with pipeline, the machine, diaphragm type compressor has the tail gas charging aperture, and film-falling absorption tower has discharging opening and drain
There are upper end end socket, lower end end socket in the tower body upper and lower part of deep cooling condenser behind the machine, on the end socket of upper end gas feed, gas vent are arranged, establish condenser in the tower body, there are condensation-water drain, condensed water import in the condenser upper and lower part, under the end socket of lower end liquid outlet is arranged, be provided with dividing plate in the middle of upper end end socket and the tower body, it is arranged evenly that the cooling pipe in the condenser is pressed equilateral triangle
Connect the circulation tourie under the absorption tower on circulation absorption tower, circulation tourie one side has the circulating absorption solution outlet, the circulating absorption solution import, one side connects canned motor pump, canned motor pump links to each other with condenser by pipeline, condenser advances the absorption tower mouth of pipe with the condenser on absorption tower and links to each other, the connecting pipe termination has shower nozzle, air inlet is arranged at the bottom, absorption tower, in the ring intalox packing layer is arranged, between the ring intalox packing layer redistributor is arranged, the vapor riser at top, absorption tower, the liquid return tube of upper lateral part links to each other with demister, and silicone oil dipping mineral wool is arranged in the demister, gas vent is arranged at the top, and a plurality of holes that distribute are again arranged on the distribution grid of redistributor.
Adopt the present invention, the tail gas of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section is after diaphragm type compressor pressurization compression is handled, and successively by water-cooled condenser condensation behind the machine, deep cooling condenser deep cooling coagulates behind the machine, and the circulation absorption tower absorbs, and reclaims chlorosilane.Tail gas after the circulation absorption tower absorbs is made 30% hydrochloric acid through the hydrogen chloride in the two-stage film-falling absorption tower recovery tail gas.Tail gas after film-falling absorption tower absorbs is hydrogen substantially, wherein has only a spot of nitrogen, directly emptying.
Adopt the present invention, can reclaim 99.5% chlorosilane and hydrogen chloride.Adopt the present invention both to reclaim most of chlorosilane and the hydrogen chloride in the tail gas, utilize again and help environmental protection.
Description of drawings
Fig. 1 is an apparatus structure schematic diagram of the present invention,
Fig. 2 is a deep cooling condenser structure schematic diagram behind the machine,
Fig. 3 is the condenser structure cut-away view in the deep cooling condenser behind the machine,
Fig. 4 is a circulation absorption tower structural representation,
Fig. 5 is a circulation absorption tower housing structure schematic diagram.
The specific embodiment
Treatment process of the present invention is, the tail gas of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section is after diaphragm type compressor pressurization compression is handled, and diaphragm type compressor pressure is 0.5～0.8Mpa.By water-cooled condenser condensation behind the machine, deep cooling condenser deep cooling coagulates behind the machine successively, and the circulation absorption tower absorbs, and reclaims chlorosilane.Tail gas after the circulation absorption tower absorbs is made 30% hydrochloric acid through the hydrogen chloride in the two-stage film-falling absorption tower recovery tail gas.Tail gas after film-falling absorption tower absorbs is hydrogen substantially, wherein has only a spot of nitrogen, directly emptying.
The condensation temperature on circulation absorption tower is-25 ℃ ,-24 ℃ ,-23 ℃ ,-21 ℃ or-20 ℃.Pressure: 0.5～0.55Mpa.
In the film-falling absorption tower gas temperature be-15 ℃ ,-12 ℃ ,-8 ℃ ,-6 ℃ ,-3 ℃ or, 0 ℃.Pressure is 0.1～0.25Mpa.
The absorbent of ring intalox packing layer adopts the by-product silicon tetrachloride in the trichlorosilane production.
The invention will be further described below in conjunction with accompanying drawing,
Treating apparatus of the present invention is by forming with deep cooling condenser 4, circulation absorption tower 5 and film-falling absorption tower 7 behind water-cooled condenser 3, the machine behind the diaphragm type compressor 2 of pipeline serial connection, the machine.Diaphragm type compressor has tail gas charging aperture 1, and the deep cooling condenser has chlorosilane discharging opening 8 behind the machine, and there is chlorosilane discharging opening 9 on the circulation absorption tower, and film-falling absorption tower has hydrochloric acid discharging opening 10 and gas drain 6.
Wherein water-cooled condenser 3 and film-falling absorption tower 7 adopt equipment therefor in the present production line behind diaphragm type compressor 2, the machine.
The device of the applicant's development is adopted on deep cooling condenser 4 and circulation absorption tower 5 behind the machine.
With reference to Fig. 2, there are upper end end socket 14, lower end end socket 10 in the tower body top and the bottom of deep cooling condenser 4 behind the machine, on the end socket 14 of upper end gas feed 18, gas vent 15 are arranged, establish condenser 12 in the tower body, there are condensation-water drain 13, condensed water import 16 in the condenser top and the bottom, the lower end end socket has liquid outlet 9 10 times, is provided with dividing plate 17 in the middle of upper end end socket 14 and the tower body.
With reference to Fig. 3, it is arranged evenly that the cooling pipe 12 behind the machine in the deep cooling condenser 4 is pressed equilateral triangle.
With reference to Fig. 4,5, the 22 times companies in absorption tower in the circulation absorption tower 5 tourie 20 that circulates, circulation tourie 20 1 sides have circulating absorption solution outlet 9, circulating absorption solution import 26, one side connects canned motor pump 19, canned motor pump 19 links to each other with circulation absorptive condenser 21 by pipeline, circulation absorptive condenser 21 enters the mouth of pipe 33 places in absorption tower by pipeline at the circulation absorptive condenser and is connected with absorption tower 22, the connecting pipe top is connected to shower nozzle 24, absorption tower air inlet 27 is arranged at 22 bottoms, absorption tower, in ring intalox packing layer 23 is arranged, redistributor 32 is arranged between the ring intalox packing layer 23, the vapor riser mouth of pipe 35 at 22 tops, absorption tower, the liquid return tube mouth of pipe 34 of upper lateral part is respectively by vapor riser 25, liquid return tube 28 links to each other with demister 29, silicone oil dipping mineral wool 30 is arranged in the demister, and circulation absorption tower gas vent 31 is arranged at the top.A plurality of holes that distribute are again arranged on the distribution grid of redistributor.
The tail gas of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section is after diaphragm type compressor pressurization compression is handled, and successively by water-cooled condenser condensation behind the machine, deep cooling condenser deep cooling coagulates behind the machine, and the circulation absorption tower absorbs, and reclaims chlorosilane.Tail gas after the circulation absorption tower absorbs is made 30% hydrochloric acid through the hydrogen chloride in the two-stage film-falling absorption tower recovery tail gas.Tail gas after film-falling absorption tower absorbs is hydrogen substantially, wherein has only a spot of nitrogen, directly emptying.
According to the actual production operation, adopt the present invention can reclaim 99.5% chlorosilane and hydrogen chloride.
Adopt the present invention, reclaimed most of chlorosilane and the hydrogen chloride in the tail gas on the one hand, utilize again; Tail gas after handling on the other hand reaches environmental requirement, and directly emptying has reduced the environmental protection pressure of enterprise, helps environmental protection.
Claims (3)
1. the treatment process of tail gas during trichlorosilane is produced is characterized in that concrete steps are as follows:
1) tail gas of trichlorosilane synthesizing section and trichlorosilane fractionation workshop section is handled through diaphragm type compressor pressurization compression, moulding pressure: 0.5～0.8Mpa,
2) water-cooled condenser condensation behind machine, deep cooling condenser deep cooling coagulates behind the machine, condensation temperature :-30 ℃～-25 ℃,
3) the circulation absorption tower of flowing through, the by-product silicon tetrachloride during the absorbent on circulation absorption tower-trichlorosilane is produced absorbs the trichlorosilane quilt, reclaims trichlorosilane, condensation temperature :-25 ℃～-20 ℃, pressure: 0.5～0.55Mpa,
4) tail gas after the circulation absorption tower absorbs is through the hydrogen chloride in the two-stage film-falling absorption tower recovery tail gas, make concentration and be 30% hydrochloric acid, gas temperature in the direct emptying of tail gas after film-falling absorption tower absorbs, film-falling absorption tower :-15 ℃～0 ℃, pressure: 0.1～0.25Mpa.
2. the treatment process of tail gas during trichlorosilane according to claim 1 is produced, the absorbent that it is characterized in that the ring intalox packing layer adopt the by-product silicon tetrachloride of trichlorosilane in producing.
3. adopt the device of tail gas treatment process in the described trichlorosilane production of claim 1, it is characterized in that forming by deep cooling condenser, circulation absorption tower and film-falling absorption tower behind water-cooled condenser, the machine behind the diaphragm type compressor that is connected in series with pipeline, the machine, diaphragm type compressor has the tail gas charging aperture, film-falling absorption tower has discharging opening and drain
There are upper end end socket, lower end end socket in the tower body upper and lower part of deep cooling condenser behind the machine, on the end socket of upper end gas feed, gas vent are arranged, establish condenser in the tower body, there are condensation-water drain, condensed water import in the condenser upper and lower part, under the end socket of lower end liquid outlet is arranged, be provided with dividing plate in the middle of upper end end socket and the tower body, it is arranged evenly that the cooling pipe in the condenser is pressed equilateral triangle
Connect the circulation tourie under the absorption tower on circulation absorption tower, circulation tourie one side has the circulating absorption solution outlet, the circulating absorption solution import, one side connects canned motor pump, canned motor pump links to each other with condenser by pipeline, condenser advances the absorption tower mouth of pipe with the condenser on absorption tower and links to each other, the connecting pipe termination has shower nozzle, air inlet is arranged at the bottom, absorption tower, in the ring intalox packing layer is arranged, between the ring intalox packing layer redistributor is arranged, the vapor riser at top, absorption tower, the liquid return tube of upper lateral part links to each other with demister, and silicone oil dipping mineral wool is arranged in the demister, gas vent is arranged at the top, and a plurality of holes that distribute are again arranged on the distribution grid of redistributor.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2010105836952A CN102101000A (en) | 2010-12-08 | 2010-12-08 | Process and device for treating tail gas during producing trichlorosilane |
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| CN2010105836952A CN102101000A (en) | 2010-12-08 | 2010-12-08 | Process and device for treating tail gas during producing trichlorosilane |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102494516A (en) * | 2011-12-06 | 2012-06-13 | 青岛科技大学 | Process and device for recycling organic waste gas by refrigeration mode |
| CN104083981A (en) * | 2014-07-02 | 2014-10-08 | 天津大学 | Direct-contact-type deep cooling device for recycling volatile organic compound waste gas and recycling method |
| CN104289087A (en) * | 2014-04-22 | 2015-01-21 | 江苏大明科技有限公司 | Recovery system for tail gas generated by triethyl phosphate production |
| CN104555925A (en) * | 2014-11-05 | 2015-04-29 | 华文蔚 | Method for recycling tail gas in trichlorosilane production process |
| CN107789966A (en) * | 2017-11-21 | 2018-03-13 | 南京钟腾化工有限公司 | The recovery system and method for tail gas in a kind of chlorination toluene production |
| CN111013309A (en) * | 2019-12-17 | 2020-04-17 | 南通市天时化工有限公司 | Method for purifying tail gas and recovering materials in pivaloyl chloride production process |
| US11612869B2 (en) | 2017-11-20 | 2023-03-28 | Tokuyama Corporation | Production method for trichlorosilane, and pipe |
| CN116395700A (en) * | 2023-04-17 | 2023-07-07 | 江苏中能硅业科技发展有限公司 | System and method for recycling silane in silane-containing tail gas |
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| CN101254387A (en) * | 2007-12-04 | 2008-09-03 | 魏玺群 | Voltage transformation adsorption method for separating mixture gas containing hydrogen and chloro-silicane and/or hydrogenchloride mixture gas |
| CN101444681A (en) * | 2008-12-15 | 2009-06-03 | 浙江富士特硅材料有限公司 | Method for recovering tail gas from trichlorosilane production and special equipment thereof |
| CN101569817A (en) * | 2008-05-30 | 2009-11-04 | 中蓝晨光化工研究院有限公司 | Tail gas recycling method in trichlorosilane production |
| CN201899898U (en) * | 2010-12-08 | 2011-07-20 | 湖北江钻天祥化工有限公司 | Exhaust gas treatment device for synthesis of trichlorosilane |
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- 2010-12-08 CN CN2010105836952A patent/CN102101000A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101254387A (en) * | 2007-12-04 | 2008-09-03 | 魏玺群 | Voltage transformation adsorption method for separating mixture gas containing hydrogen and chloro-silicane and/or hydrogenchloride mixture gas |
| CN101569817A (en) * | 2008-05-30 | 2009-11-04 | 中蓝晨光化工研究院有限公司 | Tail gas recycling method in trichlorosilane production |
| CN101444681A (en) * | 2008-12-15 | 2009-06-03 | 浙江富士特硅材料有限公司 | Method for recovering tail gas from trichlorosilane production and special equipment thereof |
| CN201899898U (en) * | 2010-12-08 | 2011-07-20 | 湖北江钻天祥化工有限公司 | Exhaust gas treatment device for synthesis of trichlorosilane |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102494516A (en) * | 2011-12-06 | 2012-06-13 | 青岛科技大学 | Process and device for recycling organic waste gas by refrigeration mode |
| CN104289087A (en) * | 2014-04-22 | 2015-01-21 | 江苏大明科技有限公司 | Recovery system for tail gas generated by triethyl phosphate production |
| CN104083981A (en) * | 2014-07-02 | 2014-10-08 | 天津大学 | Direct-contact-type deep cooling device for recycling volatile organic compound waste gas and recycling method |
| CN104083981B (en) * | 2014-07-02 | 2016-04-20 | 天津大学 | The straight touch degree of depth cooling device that volatile organic compound from waste gas reclaims and recovery method |
| CN104555925A (en) * | 2014-11-05 | 2015-04-29 | 华文蔚 | Method for recycling tail gas in trichlorosilane production process |
| US11612869B2 (en) | 2017-11-20 | 2023-03-28 | Tokuyama Corporation | Production method for trichlorosilane, and pipe |
| CN107789966A (en) * | 2017-11-21 | 2018-03-13 | 南京钟腾化工有限公司 | The recovery system and method for tail gas in a kind of chlorination toluene production |
| CN111013309A (en) * | 2019-12-17 | 2020-04-17 | 南通市天时化工有限公司 | Method for purifying tail gas and recovering materials in pivaloyl chloride production process |
| CN111013309B (en) * | 2019-12-17 | 2022-01-14 | 南通市天时化工有限公司 | Method for purifying tail gas and recovering materials in pivaloyl chloride production process |
| CN116395700A (en) * | 2023-04-17 | 2023-07-07 | 江苏中能硅业科技发展有限公司 | System and method for recycling silane in silane-containing tail gas |
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Application publication date: 20110622 |