CN102079950A - 单分散稀土抛光粉制备方法 - Google Patents
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Abstract
本发明提供了一种单分散稀土抛光粉及其制备工艺。该工艺通过草酸铵、尿素中的一种或几种的混合物为沉淀剂,在含铈稀土溶液与沉淀剂溶液的反应中,利用高分子表面活性剂的分子模板作用和其与沉淀剂的协同作用,形成几何形状趋于一致的前驱物沉淀颗粒;在沉淀后的浆液中加入碳酸氢铵和氢氟酸调节母液中的酸度和离子强度,从而增大浆液中固体颗粒的表面电性,升温陈化后,过滤,滤饼干燥、灼烧、球磨过筛、气流磨破碎分选,离心分级后可以得到分散性好、球化度高、超细的稀土抛光粉。得到的抛光粉呈分散好的球形,D50粒径为0.50~3.0μm;且满足:D10≥0.8D50,D90≤3D50,D100≤5D50。该抛光粉的悬浮性能好,分散性强,应用到玻璃抛光中,对光学玻璃抛光、晶体抛光面划痕少,抛光切削力大,平整度高。
Description
技术领域
本发明涉及单分散稀土抛光粉制备方法
背景技术
稀土氧化物可以作为玻璃的高效优质抛光材料,其抛光效率高、适用范围广、使用寿命长等优异性,泛应用于光学元件、眼镜、LCD、工业仪表等领域精密玻璃抛光和超大规模集成电路二氧化硅介质层的化学机械抛光。稀土抛光粉是一种混合轻稀土氧化物,主要成分是CeO2,La2O3,Pr6O11,Nd2O3等。我国生产的稀土抛光粉以低档次抛光粉较多,生产规模小,产品均一性差。在要求较高的器件抛光上仍需要依赖进口高档抛光粉,抛光粉的抛光性能与形貌和粒径密切相关,在高精密抛光中,粉体的粒度、形貌及其分布均匀性起了主要的作用,颗粒越细,越近球形,分布越均匀,则抛光效果越好。本发明利用高分子表面活性剂作为分子模板来控制稀土抛光粉粉几何形状。
发明内容
本发明提供一种以二氧化铈为主体的单分散稀土抛光粉的制备方法,采用该方法能够获得形貌一致的抛光粉,从而有利于满足不同材料的精密抛光要求。本发明总的技术构思为,在含铈、镧、镨、钕稀土溶液与尿素、碳酸铵、草酸沉淀剂溶液的反应中,利用高分子表面活性剂(脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚)的分子模板作用和其与沉淀剂的协同作用,形成几何形状趋于一致的前驱物沉淀颗粒;然后经经湿法球磨,气流磨破碎分选,离心分级,干燥后得到硬度适中,形貌可控的稀土抛光粉。
本发明的技术方案如下:
1、将硝酸铈、硝酸镧、硝酸镨、硝酸钕和表面活性剂(脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚)溶于去离子水中,铈的浓度范围为0.1~0.3mol/l,镧的浓度范围为0.05~0.10mol/l,镨的浓度范围为0.05~0.10mol/l,钕的浓度范围为0.05~0.10mol/l,表面活性剂为脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚的混合物,溶液中表面活性剂的含量为0.005~0.02%;
2、将沉淀剂溶于去离子水中,沉淀剂为尿素、碳酸铵、草酸,尿素的混合物,其中尿素浓度为0.1mol/l~2.0mol/l,碳酸铵浓度为0.1mol/l~1.0mol/l,草酸浓度为0.1mol/l~1.0mol/l;
3、将(1)和(2)混合溶液加热到85℃,通过搅拌以喷雾方式在稀土溶液中加入沉淀剂溶液,加入完成后,继续搅拌30~60min,体系温度控制在85℃~95℃的温度下保温8h;
4、在混合溶液加入一定量碳酸铵(0.1~0.5%)和氢氟酸(0.05~0.5%)调节沉淀母液的酸度和离子强度,然后在室温下陈化12h,
5、固体沉淀经过滤,洗涤后,在120~200℃进行条件下干燥,得到抛光粉的前驱体,再在1000~1200℃条件下煅烧2h得到稀土抛光粉,
6稀土抛光粉经过湿法球磨,气流磨破碎分选,离心分级,干燥后得到单分布稀土抛光粉。
具体实施
实施例1:
1、将硝酸铈、硝酸镧、硝酸镨、硝酸钕和表面活性剂(脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚)溶于去离子水中,铈的浓度范围为0.15mol/l,镧的浓度范围为0.05mol/l,镨的浓度范围为0.08mol/l,钕的浓度范围为0.05mol/l,表面活性剂为脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚的混合物,溶液中表面活性剂的含量为0.02%;
2、将沉淀剂溶于去离子水中,沉淀剂为尿素、碳酸铵、草酸,尿素的混合物,尿素浓度为0.2mol/l,碳酸铵浓度为0.1mol/l,草酸浓度为0.1mol/l;
3、将(1)和(2)混合溶液加热到85℃,通过搅拌以喷雾方式在稀土溶液中加入沉淀剂溶液,加入完成后,继续搅拌30min,体系温度控制在85℃~90℃的温度下保温8h;
4、在混合溶液加入一定量碳酸铵(0.1%)和氢氟酸(0.05%)调节沉淀母液的酸度和离子强度,然后在室温下陈化12h,
5、过滤,固体沉淀经洗涤后,在120℃进行条件下干燥,得到抛光粉的前驱体,再在1200℃条件下煅烧2h得到氧化铈抛光粉,
6、氧化铈抛光粉经过湿法球磨,气流磨破碎分选,离心分级,干燥后得到单分散稀土抛光粉,抛光粉的D50粒径为1.8μm;且满足:D10≥1.0D50,D90≤3D50,D100≤4.8D50。。
实施例2:
1、将硝酸铈、硝酸镧、硝酸镨、硝酸钕和表面活性剂(脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚)溶于去离子水中,铈的浓度范围为0.3mol/l,镧的浓度范围为0.08mol/l,镨的浓度范围为0.05mol/l,钕的浓度范围为0.05mol/l,表面活性剂为脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚的混合物,溶液中表面活性剂的含量为0.01%;
2、将沉淀剂溶于去离子水中,沉淀剂为尿素、碳酸铵、草酸,尿素的混合物,尿素浓度为1.0mol/l,碳酸铵浓度为0.2mol/l,草酸浓度为0.1mol/l;
3、将(1)和(2)混合溶液加热到85℃,通过搅拌以喷雾方式在稀土溶液中加入沉淀剂溶液,加入完成后,继续搅拌30min,体系温度控制在90℃的温度下保温8h;
4、在混合溶液加入一定量碳酸铵(0.1%)和氢氟酸(0.1%)调节沉淀母液的酸度和离子强度,然后在室温下陈化12h,
5、固体沉淀过滤,经洗涤后,在160℃进行条件下干燥,得到抛光粉的前驱体,再在1000℃条件下煅烧2h得到氧化铈抛光粉,
6、稀土抛光粉经过湿法球磨,气流磨破碎分选,离心分级,干燥后得到单分散稀土抛光粉,抛光粉的D50粒径为2.6μm;且满足:D10≥1.2D50,D90≤2.8D50,D100≤4.1D50。
Claims (5)
1.所述单分散稀土抛光粉的制备工艺,其特征在于:将稀土盐和表面活性剂溶于水中,铈的浓度范围为0.1~0.3mol/l,镧的浓度范围为0.05~0.10mol/l,镨的浓度范围为0.05~0.10mol/l,钕的浓度范围为0.05~0.10mol/l,表面活性剂为脂肪醇聚氧乙烯醚硫酸铵、月桂醇醚硫酸铵和聚乙二醇辛基苯基醚的混合物,表面活性剂的含量为0.005~0.02%。
2.所述单分散稀土抛光粉的制备工艺,其特征在于:沉淀剂为尿素、碳酸铵、草酸。其中尿素浓度为0.1mol/l~2.0mol/l,碳酸铵浓度为0.1mol/l~1.0mol/l,草酸浓度为0.1mol/l~1.0mol/l。
3.所述单分散稀土抛光粉的制备工艺,其特征在于:混合溶液在85℃~95℃的温度下保温8h,在混合溶液加入一定量铵盐(0.1~0.5%)和氢氟酸(0.05~0.5%)调节沉淀母液的酸度和离子强度,然后在室温下陈化12h。
4.所述单分散稀土抛光粉的制备工艺,其特征在于:固体沉淀经过滤,洗涤后,在120℃进行条件下干燥,得到抛光粉的前驱体,再在1200℃条件下煅烧2h得到氧化铈抛光粉。
5.所述单分散稀土抛光粉的制备工艺,其特征在于:稀土抛光粉经过湿法球磨,气流磨破碎分选,离心分级,干燥后得到稀土抛光粉。
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102424728A (zh) * | 2011-10-17 | 2012-04-25 | 南京航空航天大学 | 高分散微细氧化镧浆料的制备方法 |
| CN102850938A (zh) * | 2011-12-19 | 2013-01-02 | 南昌大学 | 一种球型复合稀土抛光粉的制备方法 |
| CN103805067A (zh) * | 2012-11-07 | 2014-05-21 | 有研稀土新材料股份有限公司 | 一种铈基抛光粉的制备工艺 |
| CN107254259A (zh) * | 2017-06-08 | 2017-10-17 | 包头海亮科技有限责任公司 | 新型稀土抛光粉及其制备方法 |
| CN111094502A (zh) * | 2017-10-31 | 2020-05-01 | Hoya株式会社 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
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2009
- 2009-11-27 CN CN2009101942023A patent/CN102079950A/zh active Pending
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102424728A (zh) * | 2011-10-17 | 2012-04-25 | 南京航空航天大学 | 高分散微细氧化镧浆料的制备方法 |
| CN102850938A (zh) * | 2011-12-19 | 2013-01-02 | 南昌大学 | 一种球型复合稀土抛光粉的制备方法 |
| CN103805067A (zh) * | 2012-11-07 | 2014-05-21 | 有研稀土新材料股份有限公司 | 一种铈基抛光粉的制备工艺 |
| CN103805067B (zh) * | 2012-11-07 | 2015-11-25 | 有研稀土新材料股份有限公司 | 一种铈基抛光粉的制备工艺 |
| CN107254259A (zh) * | 2017-06-08 | 2017-10-17 | 包头海亮科技有限责任公司 | 新型稀土抛光粉及其制备方法 |
| CN111094502A (zh) * | 2017-10-31 | 2020-05-01 | Hoya株式会社 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
| CN111094502B (zh) * | 2017-10-31 | 2021-11-16 | Hoya株式会社 | 研磨液、玻璃基板的制造方法以及磁盘的制造方法 |
| US11214713B2 (en) | 2017-10-31 | 2022-01-04 | Hoya Corporation | Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk |
| US11680187B2 (en) | 2017-10-31 | 2023-06-20 | Hoya Corporation | Polishing liquid, method for manufacturing glass substrate, and method for manufacturing magnetic disk |
| US12252633B2 (en) | 2017-10-31 | 2025-03-18 | Hoya Corporation | Polishing liquid and method for manufacturing glass substrate |
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