CN101754562B - Atmosphere plasma generating device with arc control function - Google Patents
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Abstract
本发明一种具电弧控制功能的大气等离子体产生装置,包括一外壳、一内电极、一气流控制机构与至少一电弧导引电极。外壳具有相对的一电极设置端与一等离子体出口端。内电极设置在外壳内,并位在电极设置端,其中,内电极连接至一电源供应器。气流控制机构设置在电极设置端,用以在内电极的周边产生一涡漩气流,通过此使内电极产生的电弧集中在外壳内的中央位置,并导引电弧至等离子体出口端。电弧导引电极设置在等离子体出口端,并连接至电源供应器,其中,电弧导引电极具有一尖端是位凸出等离子体出口端的内表面,用以吸引电弧,通过此控制电弧的位置。
The present invention discloses an atmospheric plasma generating device with arc control function, comprising an outer shell, an inner electrode, an airflow control mechanism and at least one arc guide electrode. The outer shell has an electrode setting end and a plasma outlet end opposite to each other. The inner electrode is arranged in the outer shell and located at the electrode setting end, wherein the inner electrode is connected to a power supply. The airflow control mechanism is arranged at the electrode setting end, and is used to generate a vortex airflow around the inner electrode, thereby concentrating the arc generated by the inner electrode at a central position in the outer shell, and guiding the arc to the plasma outlet end. The arc guide electrode is arranged at the plasma outlet end and connected to the power supply, wherein the arc guide electrode has a tip protruding from the inner surface of the plasma outlet end, and is used to attract the arc, thereby controlling the position of the arc.
Description
技术领域 technical field
本发明涉及一种大气等离子体产生装置,且特别是有关于一种具电弧控制功能的大气等离子体产生装置。 The invention relates to an atmospheric plasma generating device, and in particular to an atmospheric plasma generating device with arc control function. the
背景技术 Background technique
等离子体的特性在于其包括中性粒子、活化粒子、电子及离子等的反应,因而能够提供非常广泛的功能。尤其是具有能量的粒子,更是能够引发许多特殊的化学与物理的反应。也由于如此,目前,等离子体已广泛地应用在各种领域,例如在半导体制造方面,举凡不同材料薄膜的成长及电路的刻蚀皆普遍由等离子体技术达成。在半导封装方面,则可见使用等离子体来清洁及改变材料表面,以达到所需的功能及效果。此外,在环保、医疗与光机电等领域中亦可见等离子体的应用。 The characteristic of plasma is that it includes the reactions of neutral particles, activated particles, electrons and ions, etc., so it can provide a very wide range of functions. Particles with energy, in particular, can trigger many special chemical and physical reactions. Because of this, at present, plasma has been widely used in various fields. For example, in semiconductor manufacturing, the growth of films of different materials and the etching of circuits are generally achieved by plasma technology. In terms of semiconductor packaging, it can be seen that plasma is used to clean and change the surface of materials to achieve the required functions and effects. In addition, the application of plasma can also be seen in the fields of environmental protection, medical treatment and opto-mechanical electronics. the
等离子体源的种类与等离子体产生的形式相关,其包括电感式等离子体源、微波表面波等离子体源、大气等离子体源、等离子体浸没离子布植及等离子体火炬等。大气等离子体源中,由于喷射式大气等离子体的能量集中,可以用于高速处理工件表面以改善表面的亲水特性。然而,当应用在金属材料或是导电材料制作的工件表面时,等离子体所引起的电弧却非常容易会溢散到工件的表面,并损伤工件表面,导致工件不良品的产生,影响到制备工艺良率。 The type of plasma source is related to the form of plasma generation, including inductive plasma source, microwave surface wave plasma source, atmospheric plasma source, plasma immersion ion implantation and plasma torch, etc. In the atmospheric plasma source, due to the energy concentration of the jet atmospheric plasma, it can be used to treat the surface of the workpiece at high speed to improve the hydrophilic properties of the surface. However, when it is applied to the surface of workpieces made of metal materials or conductive materials, the arc caused by the plasma is very easy to overflow to the surface of the workpiece and damage the surface of the workpiece, resulting in the generation of defective workpieces and affecting the manufacturing process. yield. the
发明内容 Contents of the invention
本发明有关于一种具电弧控制功能的大气等离子体产生装置,是透过电弧导引电极与气流场的设计,将电弧位置控制在装置内,通过此避免电弧损伤所要处理的工件表面,进而提升制备工艺的优良率。 The present invention relates to an atmospheric plasma generating device with arc control function. Through the design of the arc guiding electrode and the airflow field, the position of the arc is controlled in the device, thereby avoiding the arc from damaging the surface of the workpiece to be processed, and further Improve the excellent rate of the preparation process. the
根据本发明,提出一种具电弧控制功能的大气等离子体产生装置,此装置包括一外壳、一内电极、一气流控制机构与至少一电弧导引电极。外 壳具有相对的一电极设置端与一等离子体出口端。内电极设置在外壳内,并位在电极设置端,其中,内电极连接至一电源供应器。气流控制机构设置在电极设置端,用以在内电极的周边产生一涡漩气流,通过此使内电极产生的电弧集中在外壳内的中央位置,并导引电弧至等离子体出口端。电弧导引电极设置在等离子体出口端,并连接至电源供应器,其中,电弧导引电极具有一尖端是凸出在等离子体出口端的内表面,用以吸引电弧,通过此控制电弧的位置。 According to the present invention, an atmospheric plasma generating device with arc control function is proposed. The device includes a casing, an inner electrode, an airflow control mechanism and at least one arc guiding electrode. The casing has an electrode setting end and a plasma outlet end opposite to each other. The inner electrode is arranged in the casing and is located at the electrode setting end, wherein the inner electrode is connected to a power supply. The air flow control mechanism is arranged at the electrode setting end to generate a vortex air flow around the inner electrode, through which the arc generated by the inner electrode is concentrated in the center of the shell, and the arc is guided to the plasma outlet end. The arc guiding electrode is arranged at the plasma outlet and connected to the power supply, wherein the arc guiding electrode has a tip protruding from the inner surface of the plasma outlet to attract the arc and thereby control the position of the arc. the
为让本发明的上述内容能更明显易懂,下文特举较佳实施例,并配合所附图式,作详细说明如下: In order to make the above-mentioned content of the present invention more obvious and understandable, the preferred embodiments are cited below, and in conjunction with the accompanying drawings, the detailed description is as follows:
附图说明 Description of drawings
图1A是依照本发明较佳实施例的一种具电弧控制功能的大气等离子体产生装置的示意图; Fig. 1A is a schematic diagram of an atmospheric plasma generating device with arc control function according to a preferred embodiment of the present invention;
图1B是图1A大气等离子体产生装置于等离子体出口侧的示意图; Figure 1B is a schematic diagram of the atmospheric plasma generating device in Figure 1A on the plasma outlet side;
图2是电弧导引电极的尖端为一球面的示意图; Fig. 2 is a schematic diagram in which the tip of the arc guiding electrode is a spherical surface;
图3是电弧导引电极透过外壳连接至电源供应器的示意图; Figure 3 is a schematic diagram of the arc guiding electrode connected to the power supply through the casing;
图4是大气等离子体产生装置加设一开口减缩元件的示意图; Fig. 4 is a schematic diagram of adding an opening reduction element to the atmospheric plasma generating device;
图5是电弧导引电极为一中空电极的示意图。 Fig. 5 is a schematic diagram showing that the arc guiding electrode is a hollow electrode. the
【主要元件符号说明】 【Description of main component symbols】
100:大气等离子体产生装置 100: Atmospheric plasma generation device
110:外壳 110: shell
112:电极设置端 112: electrode setting terminal
114:等离子体出口端 114: Plasma outlet port
120:内电极 120: Internal electrode
132:等离子体出口 132: Plasma Exit
140:气流控制机构 140: Airflow control mechanism
142:气体导引元件 142: Gas guide element
144:斜向贯穿孔 144: oblique through hole
150、150’、150”:电弧导引电极 150, 150’, 150”: Arc Steering Electrodes
152、152’:尖端 152, 152': tip
152”:贯穿通道 152": through channel
160:导线 160: wire
170:隔离元件 170: isolation element
180、180’:开口减缩元件 180, 180': opening reduction element
182、182’:开口 182, 182': opening
200:电源供应器 200: power supply
300:涡旋气流 300: Vortex airflow
400:电弧 400: Arc
500:等离子体气体 500: Plasma Gas
A1、A2:延伸方向 A1, A2: Extension direction
具体实施方式 Detailed ways
请参照图1A、图1B,图1A是依照本发明较佳实施例的一种具电弧控制功能的大气等离子体产生装置的示意图,图1B是图1A大气等离子体产生装置于等离子体出口侧的示意图。如图1A所示,大气等离子体产生装置100包括一外壳110、一内电极120与一气流控制机构140等元件,以下逐一说明各元件的配置与作用。
Please refer to FIG. 1A and FIG. 1B. FIG. 1A is a schematic diagram of an atmospheric plasma generating device with arc control function according to a preferred embodiment of the present invention, and FIG. 1B is a view of the atmospheric plasma generating device in FIG. 1A on the plasma outlet side. schematic diagram. As shown in FIG. 1A , the atmospheric
外壳110例如为一中空壳体,其具有相对的一电极设置端112与一等离子体出口端114。外壳110的材质可为金属或非金属材料。
The
内电极120设置在外壳110内,并位在电极设置端112,其中,内电极120连接至一电源供应器200。内电极120例如是一金属电极,大多使用铜,或是不锈钢、钨的类耐高温金属或合金。电源供应器200提供的电压会使内电极120邻侧的气体产生解离的作用,而形成由自由电子、带正电的离子与未电离的原子等所构成的等离子体气体。也由于存在带负电的自由电子和带正电的离子,因此等离子体气体有很高的电导率,而产生电弧400的作用。
The
等离子体出口端114,其具有一等离子体出口132。等离子体出口132的形状并不限定,其大小可依照需求,例如是等离子体气体的出口流速去设定。
The
气流控制机构140设置在电极设置端112,用以在内电极120的周边产生涡漩气流300,通过此使内电极120产生的电弧400朝外壳110内的中央位置集中,并导引电弧400至等离子体出口端114。由于当电弧400被控制在外壳110的腔体中时,流道可以加大以降低等离子体气体流速,因此可初步降低电弧400溢散的机率。
The air
如图1A所示,气流控制机构140例如包括一气体导引元件142与一气体供应器(未绘示)。气体导引元件142具有多个斜向贯穿孔144位在内电极120的周边,并连通至外壳110内。这些斜向贯穿孔144是可相互平行,此外,斜向贯穿孔144的延伸方向Al较佳地与内电极120的延伸方向A2呈现歪斜的关系。
As shown in FIG. 1A , the
气体供应器(未绘示)所供应的气体会通过斜向贯穿孔142并进入外壳110中。且当气体从斜向贯穿孔144灌入外壳110内时,由于斜向贯穿孔144的配置方式,灌入的气体会绕着内电极120旋转,因而会在内电极120的外围产生涡旋气流300,接着,电弧400便会受到涡旋气流300的导引移动。如此一来,便可将电弧400控制在外壳110内的中央位置。
The gas supplied by the gas supplier (not shown) passes through the oblique through
喷射式大气等离子体由于能量集中,可以用于高速处理素材表面,改善素材表面的亲水特性,但是应用在金属材料或导体材料表面时,等离子体所引起的电弧会溢散到金属表面,引起金属表面的损伤。在此,主要是利用电弧导引电极的配置及设计,将电弧400产生的位置导引到外壳110的腔体内侧,使得等离子体出口不会有溢散的电弧。
Jet atmospheric plasma can be used to treat the material surface at high speed and improve the hydrophilicity of the material surface due to its energy concentration. However, when it is applied to the surface of metal materials or conductor materials, the arc caused by the plasma will overflow to the metal surface, causing Damage to metal surfaces. Here, the position where the
较佳地,在大气等离子体产生装置100中可装设至少一电弧导引电极,且电弧导引电极较佳是沿着等离子体出口端114的径向插置在等离子体出口端114中,而内电极120与电弧导引电极是分别连接至电源供应器200的正极与负极(或接地端)。
Preferably, at least one arc guiding electrode can be installed in the atmospheric
本实施例是以四个电弧导引电极150为例做说明,然本发明并不限定于此,大气等离子体产生装置100的等离子体出口端114中亦可仅装设单个电弧导引电极150或是其它数目的电弧导引电极150。另外,电弧导引电极150可为实心或是中空管,在此先以实心的电弧导引电极150(见图1A)做说明。
In this embodiment, four
电弧导引电极150是等间隔地插置在等离子体出口端114中,如图1B 所示。电弧导引电极150连接至电源供应器200或是一接地端,其中,各电弧导引电极150具有一尖端152是凸出等离子体出口端114的内表面。由于尖端152的设计会使电荷集中,因而可产生尖端放电的效果,通过此可吸引电弧400,因而得以控制电弧400在等离子体出口端114中的位置,更进一步地避免电弧溢散的问题。
The
图1B的尖端152为尖点的型式,然本发明并不限定于此。如图2所示,电弧导引电极150’的尖端152’也可为一球面的型式,其同样具有吸引电弧的特点。
The
由于外壳110的材质可为金属或非金属,当外壳110的材质为非金属时,如图1A所示,电弧导引电极150是可透过导线160连接至电源供应器200。
Since the material of the
接着请参照图3,其是电弧导引电极透过外壳连接至电源供应器的示意图。如图3所示,当外壳110的材质为金属时,电弧导引电极150实际上可直接透过外壳110连接至电源供应器200。此时,为避免外壳110与内电极120产生电性接触,较佳可设置隔离元件170在内电极120与外壳110之间,以隔绝内电极120与外壳110。
Next, please refer to FIG. 3 , which is a schematic diagram of the arc guiding electrode connected to the power supply through the shell. As shown in FIG. 3 , when the material of the
隔离元件170的材质可为一介电材料,其例如是石英、陶瓷或高分子材料等。另外,在气体导引元件142与内电极120之间亦可设置隔离元件170,以适当保持各元件之间的电性绝缘。
The material of the
请参照图4,其是大气等离子体产生装置加设一开口减缩元件的示意图。如图4所示,开口减缩元件180设置在等离子体出口132处,其中,开口减缩元件180的开口182小于等离子体出口132。开口减缩元件180除了可减少等离子体气体的出口幅宽,还可阻挡不必要的电弧溢散,进而辅助控制电弧的位置。较佳地,开口减缩元件180的材质为绝缘材料。
Please refer to FIG. 4 , which is a schematic diagram of adding an aperture reduction element to the atmospheric plasma generating device. As shown in FIG. 4 , the
请参照图5,其是电弧导引电极为一中空电极的示意图。如图5所示,电弧导引电极150”具有一贯穿信道152”,而贯穿信道152”是连通至等离子体出口端114内,使等离子体出口端114内的空间也可透过电弧导引电极150”连通至外部大气。开口减缩元件180’的开口182’使等离子体出口132缩得更小,因此造成等离子体出口132的气体压力升高,且会使等离子体气体的出口流速增加许多。太高速的等离子体气体具有较强的冲 击力,也容易带出溢散的电弧,因此容易对所要处理的工件表面造成破坏。
Please refer to FIG. 5 , which is a schematic diagram of the arc guiding electrode as a hollow electrode. As shown in FIG. 5, the
举例来说,当要以大气等离子体产生装置100去进行工件表面的镀膜处理时,气体压力会因为等离子体出口132其口径的减缩而上升,造成气体粒子碰撞的机率增加,因此不利于控制成膜的质量。由于等离子体出口端114内的空间可透过电弧导引电极150”的贯穿通道152”连通至外部大气,在等离子体气体产生时,部分气体可从贯穿通道152”排至外部空间,因此可以有效降低出口流速,进而减小等离子体气体的冲击,以保护所要处理的工件。
For example, when the atmospheric
本发明上述实施例所揭露的具电弧控制功能的大气等离子体产生装置,是在邻近等离子体出口的位置设置电弧导引电极用以吸引电弧,以将电弧产生的位置导引到外壳的腔体内侧,使等离子体出口不会有溢散的电弧,因此可避免电弧接触到所要处理的工件表面。此外,外壳内会设计出适当的气流场,通过气流的导引去限制电弧的方向,使等离子体产生的位置更接近等离子体出口端。再,当等离子体出口的大小被减缩时,可采用空心的电弧导引电极去辅助气体排出,使等离子体出口的流速降低,进而可减少等离子体气体对所要处理工件表面造成破坏。本发明上述实施例所揭露的具电弧控制功能的大气等离子体产生装置是实质上可提升工件制作的制备工艺良率,且在大气等离子体领域中的应用更为宽广。 In the atmospheric plasma generating device with arc control function disclosed in the above embodiments of the present invention, an arc guiding electrode is arranged at a position adjacent to the plasma outlet to attract the arc, so as to guide the position where the arc is generated to the cavity of the casing The inner side, so that the plasma outlet does not have a spilled arc, thus avoiding the arc from touching the surface of the workpiece to be treated. In addition, an appropriate airflow field will be designed in the casing to limit the direction of the arc through the guidance of the airflow, so that the plasma generation position is closer to the plasma outlet. Furthermore, when the size of the plasma outlet is reduced, a hollow arc guiding electrode can be used to assist gas discharge, so that the flow rate of the plasma outlet is reduced, thereby reducing the damage caused by the plasma gas to the surface of the workpiece to be treated. The atmospheric plasma generating device with arc control function disclosed in the above-mentioned embodiments of the present invention can substantially improve the yield rate of the workpiece manufacturing process, and has wider application in the field of atmospheric plasma. the
综上所述,虽然本发明已以较佳实施例揭露如上,然其并非用以限定本发明。本发明所属技术领域中具有通常知识者,在不脱离本发明的精神和范围内,当可作各种的更动与润饰。因此,本发明的保护范围当视后附的权利要求书的范围所界定的为准。 To sum up, although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Those skilled in the art of the present invention can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention should be defined by the appended claims.
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| CN102291923A (en) * | 2011-08-10 | 2011-12-21 | 苏州工业职业技术学院 | Plasma gun |
| CN103104575A (en) * | 2013-01-21 | 2013-05-15 | 南京航空航天大学 | Electric arc type discharging plasma vortex generator |
| CN105792496A (en) * | 2016-02-26 | 2016-07-20 | 苏州工业职业技术学院 | An Atmospheric Pressure Plasma Spray Gun |
| TWI674041B (en) * | 2017-12-21 | 2019-10-01 | 雷立強光電科技股份有限公司 | Apparatus for generating atmospheric environment plasma |
| CN113546920B (en) * | 2021-07-20 | 2023-04-07 | 浙江洁美电子科技股份有限公司 | Electric arc burning-off system and paper tape manufactured by using same |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5109150A (en) * | 1987-03-24 | 1992-04-28 | The United States Of America As Represented By The Secretary Of The Navy | Open-arc plasma wire spray method and apparatus |
| US6365867B1 (en) * | 2000-11-01 | 2002-04-02 | Sandia Corporation | Plasma arc torch with coaxial wire feed |
| CN200947700Y (en) * | 2006-04-10 | 2007-09-12 | 徐州燃烧控制研究院有限公司 | Plasma generator |
| CN200980199Y (en) * | 2006-12-08 | 2007-11-21 | 航天空气动力技术研究院 | An industrial plasma spray gun |
| CN101163370A (en) * | 2006-10-10 | 2008-04-16 | 馗鼎奈米科技股份有限公司 | Plasma guide mechanism and plasma discharge device using same |
-
2008
- 2008-12-01 CN CN200810178844XA patent/CN101754562B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5109150A (en) * | 1987-03-24 | 1992-04-28 | The United States Of America As Represented By The Secretary Of The Navy | Open-arc plasma wire spray method and apparatus |
| US6365867B1 (en) * | 2000-11-01 | 2002-04-02 | Sandia Corporation | Plasma arc torch with coaxial wire feed |
| CN200947700Y (en) * | 2006-04-10 | 2007-09-12 | 徐州燃烧控制研究院有限公司 | Plasma generator |
| CN101163370A (en) * | 2006-10-10 | 2008-04-16 | 馗鼎奈米科技股份有限公司 | Plasma guide mechanism and plasma discharge device using same |
| CN200980199Y (en) * | 2006-12-08 | 2007-11-21 | 航天空气动力技术研究院 | An industrial plasma spray gun |
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| CN101754562A (en) | 2010-06-23 |
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