CN101274989B - Semi-conductor polyimide film - Google Patents
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Abstract
本发明提供了一种半导体聚酰亚胺薄膜,具有在25℃和60%RH表面电阻率的常用对数为9至15logΩ/平方;体积电阻率的常用对数为8至15logΩ·cm;按照JIS K7118进行疲劳试验重复次数为107时,疲劳应力为160MPa或更大;和按照JIS P8115进行MIT测试的耐弯曲次数为2,000次或更大,以及使用该半导体聚酰亚胺薄膜的中间传输带和输送带。The invention provides a semiconductor polyimide film, which has a common logarithm of 9 to 15 logΩ/square at 25° C. and 60% RH surface resistivity; a common logarithm of volume resistivity of 8 to 15 logΩ·cm; according to Fatigue stress of 160 MPa or more when the number of repetitions of the fatigue test according to JIS K7118 is 107; and the number of bending resistance of the MIT test according to JIS P8115 is 2,000 times or more, and an intermediate transfer belt using the semiconductor polyimide film and conveyor belts.
Description
技术领域 technical field
本发明涉及一种耐用性优异的半导体聚酰亚胺薄膜,特别是可用于以电子照相方法形成和记录图像的装置中的中间传输带和输送带。The present invention relates to a semiconductive polyimide film excellent in durability, particularly usable for intermediate transfer belts and conveyor belts in devices for forming and recording images by electrophotography.
发明背景Background of the invention
由于近来图像质量、速度和紧凑性的改进,用电子照相方法的形成和记录图像的装置例如复印机、激光印刷机、图像印刷机、传真机和多功能打印机(MFP)中的中间传输带、输送带等与传统条件相比,使用条件更加苛刻。特别是,由于装置的小型化,用于中间传输带和输送带的辊滚筒更小,因而施加在辊弯曲部分的压力增加,并且由于速度高,施加至带的张力增加,因而导致带伸长和断裂的因素增加,从而增加了对耐用性优异的无缝带的需求。Due to recent improvements in image quality, speed, and compactness, devices that form and record images using electrophotographic methods such as intermediate transfer belts, conveyors in copiers, laser printers, image printers, facsimile machines, and multifunction Compared with traditional conditions such as belts, the use conditions are more stringent. In particular, due to the miniaturization of the device, the roller drums for the intermediate transfer belt and the conveyor belt are smaller, so the pressure applied to the curved part of the roller increases, and due to the high speed, the tension applied to the belt increases, thus causing the belt to elongate The factors of breakage and breakage increase, thereby increasing the demand for seamless belts excellent in durability.
作为用于中间传输带的半导体带,迄今为止已知的有由橡胶材料、氟基材料(偏二氟乙烯)、聚碳酸酯树脂材料、聚酰亚胺树脂材料、聚酰胺酰亚胺树脂材料等制成的薄膜形成的半导体带(例如参见文献1-3)。As the semiconductor belt used for the intermediate transmission belt, there are hitherto known materials made of rubber material, fluorine-based material (vinylidene fluoride), polycarbonate resin material, polyimide resin material, polyamideimide resin material Semiconductor strips formed from thin films made by such as (for example, see literature 1-3).
然而,这种传统的带具有由于近来速度、紧凑性和图像质量的改进,在运行过程中施加在带上的载荷增加,因而存在长期使用中的变形、转印图像的改变、破裂等问题。However, such conventional belts have problems of deformation in long-term use, changes of transferred images, cracking, etc., due to recent improvements in speed, compactness, and image quality, with increased load applied to the belt during operation.
[参考文献1]JP-A-5-200904[Reference 1] JP-A-5-200904
[参考文献2]JP-A-6-228335[Reference 2] JP-A-6-228335
[参考文献3]JP-A-10-63115[Reference 3] JP-A-10-63115
发明概述Summary of the invention
本发明的一个目的是提供一种耐用性优异的半导体聚酰亚胺薄膜,并且在该半导体聚酰亚胺薄膜用作电子照相记录装置中的中间传输带或输送带的情况下,在沿着小直径辊向该带施加应力的状态下,长期运转期间在该带上施加载荷时,该带几乎不或从不变形或破裂,并且没有调色剂图像改变和转印扩散。An object of the present invention is to provide a semiconductive polyimide film excellent in durability, and in the case where the semiconductive polyimide film is used as an intermediate transfer belt or conveyor belt in an electrophotographic recording device, In a state where the small-diameter rollers apply stress to the belt, the belt hardly or never deforms or breaks when a load is applied to the belt during long-term operation, and there is no toner image change and transfer bleeding.
本发明的发明人已经广泛研究以求实现上述目的,并发现使用抗疲劳性和抗弯性优异的半导体聚酰亚胺薄膜作为中间传输带,显著减小长期运转中带出现的变形和破裂,从而得到本发明。The inventors of the present invention have made extensive studies to achieve the above objects, and found that using a semiconductor polyimide film excellent in fatigue resistance and bending resistance as an intermediate transfer belt significantly reduces deformation and cracking of the belt during long-term operation, Thereby the present invention is obtained.
本发明的半导体聚酰亚胺薄膜具有:在25℃和60%RH的表面电阻率常用对数为9至15logΩ/平方;体积电阻率的常用对数为8至15logΩ·cm;按照JISK7118进行疲劳试验重复次数为107时,疲劳应力为160MPa或更大;按照JISP8115进行MIT测试耐弯曲次数为2,000次或更多。用实施例中描述的方法测量表面电阻率、体积电阻率、疲劳应力和耐弯曲次数。The semiconductor polyimide film of the present invention has: the common logarithm of the surface resistivity at 25° C. and 60% RH is 9 to 15 logΩ/square; the common logarithm of the volume resistivity is 8 to 15 logΩ·cm; fatigue is carried out according to JISK7118 The fatigue stress is 160 MPa or more when the number of test repetitions is 107; the number of bending resistance in the MIT test according to JISP8115 is 2,000 times or more. Surface resistivity, volume resistivity, fatigue stress, and number of times of bending resistance were measured by the methods described in Examples.
具有上述特征的半导体聚酰亚胺薄膜具有良好的刚性和性之间的平衡,并且抗疲劳性和抗弯性优异。因此,当该半导体聚酰亚胺薄膜长时间用作中间传输带和输送带时,抑制由于带的弯曲应力和疲劳产生的裂缝和破裂是可能的。The semiconductive polyimide film having the above characteristics has a good balance between rigidity and rigidity, and is excellent in fatigue resistance and bending resistance. Therefore, when the semiconductive polyimide film is used as an intermediate transmission belt and conveyor belt for a long period of time, it is possible to suppress cracks and cracks due to bending stress and fatigue of the belt.
优选从包含至少一种以下物质的聚酰胺酸性溶液中获得本发明的半导体聚酰亚胺薄膜:包含以下重复单元的共聚物:组分A,其中由酰亚胺键连接为四羧酸残基的全芳香骨架和为二胺残基的对亚苯基骨架;和组分B,其中由酰亚胺键连接为四羧酸残基的全芳香骨架和为二胺残基的二苯基醚骨架;和以下的共混物:包含组分A作为重复单元的聚合物;和包含组分B作为重复单元的聚合物,其中组分A和组分B的组成摩尔比率(A/B)为7/3至3/7。The semiconducting polyimide film of the present invention is preferably obtained from a polyamide acidic solution comprising at least one of: a copolymer comprising repeating units of: Component A, wherein tetracarboxylic acid residues are linked by imide linkages and Component B, in which the fully aromatic backbone of tetracarboxylic acid residues and the diphenyl ether of diamine residues are linked by imide bonds Skeleton; And following blend: comprise the polymkeric substance of component A as repeating unit; And comprise the polymkeric substance of component B as repeating unit, wherein the constituent molar ratio (A/B) of component A and component B is 7/3 to 3/7.
本发明人发现,生产抗疲劳性和抗弯性优异的聚酰亚胺薄膜可以通过使用包含共聚物或共混物的聚酰胺酸溶液,其中共聚物或共混物包含预定比例的形成刚性骨架(组分A)的成分和形成柔性骨架(组分B)的成分。上述组成的聚酰亚胺薄膜在连续长时间用作中间传输带等时具有良好的耐久性。The present inventors have found that the production of a polyimide film excellent in fatigue resistance and bending resistance can be achieved by using a polyamic acid solution comprising a copolymer or a blend containing a predetermined proportion of polyimide forming a rigid skeleton. Components (component A) and components forming a flexible backbone (component B). The polyimide film of the above composition has good durability when used continuously for a long period of time as an intermediate conveyor belt or the like.
本发明的中间传输带和输送带包含上述的半导体聚酰亚胺薄膜。该半导体聚酰亚胺薄膜的抗疲劳性和抗弯性优异。因此,在该半导体聚酰亚胺薄膜作为电子照相记录装置的中间传输带或输送带的情况下,所述带将发生更少的变形和破裂,并且能够长时间内在记录纸上转印良好的图像,不会引起调色剂图像改变和转印扩散。The intermediate transfer belt and conveyor belt of the present invention comprise the above-mentioned semiconductive polyimide film. The semiconductor polyimide film is excellent in fatigue resistance and bending resistance. Therefore, in the case where the semiconductive polyimide film is used as an intermediate transfer belt or conveyer belt of an electrophotographic recording device, the belt will be less deformed and broken, and can transfer a good image on a recording paper for a long time. image without causing toner image changes and transfer bleeding.
根据本发明,可得到抗疲劳性和抗弯性优异的半导体聚酰亚胺薄膜。通过使用该薄膜用于通过电子照相方法形成和记录图像装置中的中间传输系统和输送系统,可提供高图像质量、高速和紧凑的系统,其中用电子照相方法形成和记录图像的装置例如为复印机、激光打印机、图像印刷机、传真机和多功能打印机(MFP)。According to the present invention, a semiconductor polyimide film excellent in fatigue resistance and bending resistance can be obtained. By using the film for an intermediate transport system and a conveyance system in an apparatus for forming and recording images by electrophotography, a high-image-quality, high-speed and compact system can be provided, wherein the apparatus for forming and recording images by electrophotography is, for example, a copying machine , laser printers, image printers, fax machines and multifunction printers (MFPs).
发明的详细说明Detailed Description of the Invention
在下文中,将详细说明本发明实施例。Hereinafter, embodiments of the present invention will be described in detail.
本发明半导体聚酰亚胺薄膜在25℃和60%RH下的表面电阻率常用对数为9至15(logΩ/平方),并可优选为10至12(logΩ/平方)。例如,用于中间传输带时,当表面电阻率低于9(logΩ/平方)时出现白斑,表面电阻率大于15(logΩ/平方)时出现转印扩散。The common logarithm of the surface resistivity of the semiconductor polyimide film of the present invention at 25° C. and 60% RH is 9 to 15 (logΩ/square), and may preferably be 10 to 12 (logΩ/square). For example, when used in an intermediate transfer belt, white spots appear when the surface resistivity is lower than 9 (logΩ/square), and transfer diffusion occurs when the surface resistivity is greater than 15 (logΩ/square).
半导体聚酰亚胺薄膜的体积电阻率常用对数为8至15(logΩ·cm),可优选为9.5至12(logΩ·cm)。当体积电阻率低于8(logΩ·cm)时出现白斑,当体积电阻率大于15(logΩ·cm)时出现转印扩散。The common logarithm of the volume resistivity of the semiconductor polyimide film is 8 to 15 (logΩ·cm), preferably 9.5 to 12 (logΩ·cm). White spots appear when the volume resistivity is lower than 8 (logΩ·cm), and transfer diffusion occurs when the volume resistivity exceeds 15 (logΩ·cm).
按照JIS K7118的疲劳试验,重复次数为107时测定本发明半导体聚酰亚胺薄膜的疲劳应力为160MPa或更大,可优选为170MPa或更大。当疲劳应力低于160MPa时,连续长期使用中在应力集中时带的弯曲导致断裂等。此处使用的疲劳应力是指疲劳试验中,重复直到107次时没有断裂的带承受的应力上限值。According to the fatigue test of JIS K7118, the fatigue stress of the semiconductor polyimide film of the present invention measured at 107 repetitions is 160 MPa or greater, preferably 170 MPa or greater. When the fatigue stress is lower than 160 MPa, bending of the belt at the time of stress concentration in continuous long-term use leads to breakage or the like. The fatigue stress used here refers to the upper limit value of the stress that the belt does not break when repeated up to 10 7 times in the fatigue test.
按照JIS P8115的MIT测试测定,本发明聚酰亚胺薄膜耐弯曲次数为2,000次或更多,并可优选为5,000次或更多。当耐弯曲次数低于2,000次时,连续使用期间应力集中时带可能发生断裂。According to the MIT test of JIS P8115, the polyimide film of the present invention has a bending resistance of 2,000 times or more, and preferably 5,000 times or more. When the number of times of bending resistance is less than 2,000 times, the belt may break when stress is concentrated during continuous use.
至于聚酰亚胺树脂,优选使用包含以下的聚酰胺酸溶液:包含组分A和组分B重复单元的共聚物,组分A中由酰亚胺键连接为四羧酸残基的全芳香骨架和为二胺残基的对亚苯基骨架,组分B中由酰亚胺键连接为四羧酸残基的全芳香骨架和为二胺残基的二苯基醚骨架;和/或包含组分A作为重复单元的聚合物与包含组分B作为重复单元的聚合物的共混物。As for the polyimide resin, it is preferable to use a polyamic acid solution comprising: a copolymer comprising repeating units of Component A and Component B; Skeleton and a p-phenylene skeleton that is a diamine residue, a fully aromatic skeleton that is a tetracarboxylic acid residue connected by an imide bond in component B and a diphenyl ether skeleton that is a diamine residue; and/or Blends of polymers comprising component A as repeating units and polymers comprising component B as repeating units.
组分A和组分B的组成摩尔比率(A/B)可优选为7/3至3/7,更加优选6/4至4/6。当具有刚性骨架的组分A超过上述比例时,由于柔性低,尽管弹性增加,但是抗弯性降低。当具有柔性骨架的组分B超过上述比例时,尽管柔性和拉伸性能增加,但抗弯性变得低于共聚物和共混物的抗弯性。The composition molar ratio (A/B) of component A and component B may be preferably 7/3 to 3/7, more preferably 6/4 to 4/6. When the component A having a rigid skeleton exceeds the above ratio, the bending resistance decreases although the elasticity increases due to low flexibility. When the component B with a flexible backbone exceeds the above ratio, although the flexibility and tensile properties increase, the bending resistance becomes lower than that of the copolymers and blends.
四羧酸二酐优选用于产生全芳香骨架,其实例包括均苯四酸二酐(PMDA)、3,3',4,4'-二苯基四羧酸二酐(BPDA)、2,3,6,7-萘四羧酸二酐、1,2,5,6-萘四羧酸二酐、1,4,5,8-萘四羧酸二酐等。其中,BPDA是特别适用的。Tetracarboxylic dianhydrides are preferably used to generate fully aromatic backbones, examples of which include pyromellitic dianhydride (PMDA), 3,3',4,4'-diphenyltetracarboxylic dianhydride (BPDA), 2, 3,6,7-naphthalene tetracarboxylic dianhydride, 1,2,5,6-naphthalene tetracarboxylic dianhydride, 1,4,5,8-naphthalene tetracarboxylic dianhydride, and the like. Among them, BPDA is particularly suitable.
同样,对苯二胺(PDA)优选用作产生对亚苯基骨架的二胺组分。用于产生二苯基醚骨架,优选4,4'-二氨基二苯基醚、3,3'-二氨基二苯基醚等用作二胺组分,其中优选4,4'-二氨基二苯基醚(DDE)。Also, p-phenylenediamine (PDA) is preferably used as the diamine component generating the p-phenylene skeleton. Used to produce diphenyl ether skeletons, preferably 4,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, etc. as diamine components, among which 4,4'-diamino Diphenyl ether (DDE).
为了制备本发明的半导体聚酰亚胺薄膜,从制备聚酰胺酸溶液开始。In order to prepare the semiconductor polyimide film of the present invention, a polyamic acid solution is prepared.
采用已知方法制备聚酰胺酸,例如将导电试剂分散成溶液,将催化剂加入至该溶液,并在这样得到的分散溶剂中,以预定混合比例溶解并聚合四羧酸二酐和二胺;通过在溶剂中以预定混合比例溶解并聚合四羧酸二酐和二胺,然后将导电试剂加入该溶液得到聚酰胺酸溶液的方法等。Polyamic acid is prepared by a known method, such as dispersing a conductive agent into a solution, adding a catalyst to the solution, and in the dispersion solvent thus obtained, dissolving and polymerizing tetracarboxylic dianhydride and diamine in a predetermined mixing ratio; by Dissolving and polymerizing tetracarboxylic dianhydride and diamine in a solvent in a predetermined mixing ratio, and then adding a conductive agent to the solution to obtain a polyamic acid solution, etc.
考虑到溶解性等,用于本发明的溶剂可以优选是极性溶剂,其实例包括N,N-二烷基酰胺,例如N,N-二甲基甲酰胺、N,N-二甲基乙酰胺、N,N-二乙基甲酰胺和N,N-二乙基乙酰胺、N,N-二甲基甲氧基乙酰胺、二甲基亚砜、六甲基磷三酰胺、N-甲基-2-吡咯烷酮(NMP)、吡啶、二甲基砜(dimethylsulfon)、二甲基环丁砜等。In consideration of solubility and the like, the solvent used in the present invention may preferably be a polar solvent, examples of which include N,N-dialkylamides such as N,N-dimethylformamide, N,N-dimethylacetamide Amide, N,N-diethylformamide and N,N-diethylacetamide, N,N-dimethylmethoxyacetamide, dimethyl sulfoxide, hexamethylphosphoric triamide, N- Methyl-2-pyrrolidone (NMP), pyridine, dimethylsulfon (dimethylsulfon), dimethylsulfolane, and the like.
用于本发明的导电试剂实例包括碳黑,例如ketjen黑和乙炔黑,金属例如铝和镍,氧化锡和类金属氧化物化合物的导电和半导体粉末,钛酸钾等,导电聚合物例如聚苯胺和聚乙炔等,并且这些物质可以单独使用或两种或更多种组合使用,对类型没有限定。本发明中,考虑到导电性赋予作用、均匀分散性等,优选单独使用碳黑或与其它导电物质结合使用。Examples of conductive agents used in the present invention include carbon black such as ketjen black and acetylene black, conductive and semiconductive powders of metals such as aluminum and nickel, tin oxide and metalloid oxide compounds, potassium titanate, etc., conductive polymers such as polyaniline and polyacetylene, etc., and these substances may be used alone or in combination of two or more, and the type is not limited. In the present invention, carbon black is preferably used alone or in combination with other conductive substances in view of the conductivity-imparting effect, uniform dispersibility, and the like.
可以根据导电试剂的类型来选择导电试剂的含量,基于树脂的量,可优选为约5至30wt%,更加优选10至25wt%。当含量低于5wt%时,电阻均匀性降低,有时导致使用期间表面电阻率的显著降低。当该含量超过30wt%时,难以获得所需的电阻,并且得到的模制材料变得不合乎需要的脆弱。The content of the conductive agent may be selected according to the type of the conductive agent, and may be preferably about 5 to 30 wt%, more preferably 10 to 25 wt%, based on the amount of the resin. When the content is less than 5 wt%, the uniformity of resistance decreases, sometimes resulting in a significant decrease in surface resistivity during use. When the content exceeds 30 wt%, it is difficult to obtain desired electrical resistance, and the resulting molding material becomes undesirably brittle.
可以采用已知的分散方法作为分散导电试剂的方法,并且可以采用球磨机、砂磨机、行星式混合器、三辊式研磨机、超声波分散等进行分散工作。此外,为了获得均匀分散,可以使用分散剂,例如表面活性剂。该分散剂没有特别限定,只要它满足本发明目的,其实例包括分散稳定剂,例如聚合物分散剂、表面活性剂和无机盐,其中优选表面活性剂。A known dispersion method can be used as a method for dispersing the conductive agent, and a ball mill, a sand mill, a planetary mixer, a three-roll mill, ultrasonic dispersion, etc. can be used for the dispersion work. Furthermore, in order to obtain uniform dispersion, a dispersant such as a surfactant may be used. The dispersant is not particularly limited as long as it satisfies the object of the present invention, and examples thereof include dispersion stabilizers such as polymer dispersants, surfactants and inorganic salts, among which surfactants are preferred.
聚合物分散剂的实例包括聚(N-乙烯基-2-吡咯烷酮)、聚(N,N'-二乙基丙烯酰基叠氮化物)、聚(N-乙烯基甲酰胺)、聚(N-乙烯基乙酰胺)、聚(N-乙烯基邻苯二甲酰胺)、聚(N-乙烯基酰胺琥珀酸酯)、聚(N-乙烯基脲)、聚(N-乙烯基哌啶酮)、聚(N-乙烯基己内酰胺)、聚(N-乙烯基噁唑啉)等,可以加入一种或多种聚合物分散剂。Examples of polymeric dispersants include poly(N-vinyl-2-pyrrolidone), poly(N,N'-diethylacryloyl azide), poly(N-vinylformamide), poly(N- vinylacetamide), poly(N-vinylphthalamide), poly(N-vinylamide succinate), poly(N-vinylurea), poly(N-vinylpiperidone) , poly(N-vinyl caprolactam), poly(N-vinyl oxazoline), etc., one or more polymer dispersants can be added.
表面活性剂的实例包括羧酸型、硫酸酯型和磺酸型阴离子表面活性剂、季铵型、脂肪族胺型和咪唑啉型阳离子表面活性剂、氧化胺型、甘氨酸型和甜菜碱型两性离子表面活性剂,和醚型、酯型、氨基醚型、醚酯型和烷醇酰胺型非离子型表面活性剂。Examples of surfactants include carboxylic acid type, sulfate ester type and sulfonic acid type anionic surfactants, quaternary ammonium type, aliphatic amine type and imidazoline type cationic surfactants, amine oxide type, glycine type and betaine type amphoterics Ionic surfactants, and nonionic surfactants of ether, ester, amino ether, ether ester and alkanolamide types.
为了提高半导体聚酰亚胺薄膜的机械强度和耐用性,可以优选将催化剂加入至聚酰亚胺酸溶液。In order to improve the mechanical strength and durability of the semiconductive polyimide film, a catalyst may preferably be added to the polyimide acid solution.
催化剂的实例包括叔胺例如三甲胺、三乙胺、三亚乙基二胺、三丁胺、二甲基苯胺、吡啶、9-甲基吡啶、6-甲基吡啶、γ-甲基吡啶、异喹啉和二甲基吡啶,以及有机碱,例如1,5-二氮杂二环[4.3.0]壬烷-5,1,4-二氮杂二环[2.2.2]辛烷、和1,8-二氮杂二环[5.4.0]十一碳烯-7,其中考虑到稳定性和容易控制亚胺化反应,优选叔胺,特别优选异喹啉。Examples of catalysts include tertiary amines such as trimethylamine, triethylamine, triethylenediamine, tributylamine, dimethylaniline, pyridine, 9-picoline, 6-picoline, γ-picoline, iso quinoline and lutidine, and organic bases such as 1,5-diazabicyclo[4.3.0]nonane-5,1,4-diazabicyclo[2.2.2]octane, and Among 1,8-diazabicyclo[5.4.0]undecene-7, tertiary amines are preferable in consideration of stability and easy control of imidization reaction, and isoquinoline is particularly preferable.
加入的催化剂量可以优选为0.04至0.3摩尔当量,更加优选0.1至0.2摩尔当量,相对于聚酰胺酸溶液中1摩尔当量的聚酰胺酸。The amount of catalyst added may be preferably 0.04 to 0.3 molar equivalent, more preferably 0.1 to 0.2 molar equivalent, relative to 1 molar equivalent of polyamic acid in the polyamic acid solution.
聚酰胺酸溶液中单体浓度(溶剂中四羧酸二酐和二胺(ex.PDA+DDE))可以优选为5%至30%,尽管取决于不同条件该浓度可以改变。此外,溶解和聚合期间反应温度可以优选设置为80℃或更小,更加优选5℃至50℃,反应时间通常可以为5至10小时。The monomer concentration (tetracarboxylic dianhydride and diamine (ex. PDA+DDE) in the solvent) in the polyamic acid solution may preferably be 5% to 30%, although the concentration may vary depending on conditions. In addition, the reaction temperature during dissolution and polymerization may preferably be set to 80°C or less, more preferably 5°C to 50°C, and the reaction time may generally be 5 to 10 hours.
可以通过加热干燥除去聚酰胺酸溶液的溶剂,除去脱水循环封闭水,并完成酰亚胺转化反应,而获得本发明的聚酰亚胺薄膜。当聚酰胺酸溶液为溶液形式时,考虑到容易模制,优选对聚酰胺酸溶液进行模制。The polyimide film of the present invention can be obtained by heating and drying to remove the solvent of the polyamic acid solution, removing the dehydration circulating closed water, and completing the imide conversion reaction. When the polyamic acid solution is in a solution form, it is preferable to mold the polyamic acid solution in view of easy molding.
至于无缝带模制方法,可以按照常规方法采用合适的方法,例如通过浸泡、离心模制、涂布、圆筒方块挤出法(cylindrical dice extrusion)等将聚酰胺酸溶液涂布在圆筒形模具内部圆周或外部圆周上的方法;其中用合适的方法例如用聚酰胺酸溶液填充浇铸模具获得环形制品,通过干燥将该环形的制品形成为带状型材,加热形成的制品以实现聚酰胺酸的酰亚胺转换,并从模具脱模模制品的方法等(JP-A-61-95361,JP-A-64-22514,JP-A-3-180309,等)。模制无缝带中,可以进行适当的处理例如脱模剂处理和消泡处理。As for the seamless belt molding method, a suitable method can be adopted according to a conventional method, such as coating the polyamic acid solution on a cylinder by soaking, centrifugal molding, coating, cylindrical dice extrusion, etc. A method on the inner circumference or outer circumference of a shaped mold; wherein a casting mold is filled with a suitable method such as polyamic acid solution to obtain a ring-shaped product, the ring-shaped product is formed into a strip-shaped profile by drying, and the formed product is heated to realize polyamide Acid imide conversion, and methods of releasing molded articles from molds, etc. (JP-A-61-95361, JP-A-64-22514, JP-A-3-180309, etc.). In the molded seamless belt, appropriate treatments such as release agent treatment and defoaming treatment may be performed.
实施例Example
现在参考实施例和对比实施例更详细地举例说明本发明,但是应当理解本发明不受其限定。按照如下所述方法测量实施例中评价项等。Now, the present invention is illustrated in more detail with reference to Examples and Comparative Examples, but it should be construed that the present invention is not limited thereto. The evaluation items and the like in the examples were measured according to the methods described below.
实施例1Example 1
通过将39.4g碳黑(Special Black4;Degussa的产品)和非离子表面活性剂(烷基二乙醇氧化胺;0.5wt%,相对于碳黑)加入至944.7g N-甲基-2-吡咯烷酮(NMP)得到分散碳黑的NMP溶液,随后使用球磨机搅拌12小时。将4.3g异喹啉加入至分散碳黑的NMP溶液(0.2mol,相对于1mol聚酰胺酸)后,加入146.8g BPDA、37.8g PDA和30.0g DDE(组分A/组分B=7/3),随后在氮气气氛下聚合。由聚合反应稠化后,在65℃下搅拌混合物7小时,得到分散碳的聚酰胺酸溶液(调节碳黑至24wt%,相对于聚酰亚胺树脂组分)。By adding 39.4 g of carbon black (Special Black4; a product of Degussa) and a nonionic surfactant (alkyldiethanolamine oxide; 0.5 wt %, relative to carbon black) to 944.7 g of N-methyl-2-pyrrolidone ( NMP) to obtain an NMP solution in which carbon black was dispersed, followed by stirring for 12 hours using a ball mill. After adding 4.3g isoquinoline to the NMP solution (0.2mol, relative to 1mol polyamic acid) of carbon black, add 146.8g BPDA, 37.8g PDA and 30.0g DDE (component A/component B=7/ 3), followed by polymerization under nitrogen atmosphere. After thickening by the polymerization reaction, the mixture was stirred at 65° C. for 7 hours to obtain a carbon-dispersed polyamic acid solution (carbon black was adjusted to 24% by weight relative to the polyimide resin component).
使用圆形方粒将如此得到的聚酰胺酸溶液均匀涂布在圆筒形模具的内表面上,随后在130℃加热20分钟,然后在30分钟内将温度升至360℃,以除去剩余溶剂,除去脱水循环封闭水和亚胺化反应,随后冷却至室温。然后,从模具脱模模制品,得到直径100mm、厚度80μm、长度500mm的无缝带。The polyamic acid solution thus obtained was uniformly coated on the inner surface of a cylindrical mold using round square pellets, followed by heating at 130°C for 20 minutes, and then raising the temperature to 360°C within 30 minutes to remove the remaining solvent , to remove the dehydration cycle blocking water and imidization reaction, followed by cooling to room temperature. Then, the molded product was released from the mold to obtain a seamless belt having a diameter of 100 mm, a thickness of 80 μm, and a length of 500 mm.
将如此得到的带切割为宽度250mm,并通过连续耐久性试验进行评价。连续运转240小时后,带中既不存在裂缝也不发生破裂,说明该带耐用性优异。测量该带的表面电阻率、体积电阻率、拉伸强度、拉伸弹性、疲劳应力和耐弯曲次数。结果列于表1。The tape thus obtained was cut to a width of 250 mm, and evaluated by a continuous durability test. After 240 hours of continuous operation, neither cracks nor cracks occurred in the belt, indicating that the belt has excellent durability. The surface resistivity, volume resistivity, tensile strength, tensile elasticity, fatigue stress and number of times of bending resistance of the belt were measured. The results are listed in Table 1.
实施例2Example 2
通过将39.4g碳黑(Special Black4;Degussa的产品)和非离子表面活性剂(烷基二乙醇氧化胺;0.5wt%,相对于碳黑)加入至944.7g N-甲基-2-吡咯烷酮(NMP)得到分散碳黑的NMP溶液,随后使用球磨机搅拌12小时。将4.5g异喹啉加入至分散碳黑的NMP溶液(0.2mol,相对于1mol聚酰胺酸)后,加入146.8g BPDA,27.0g PDA和50.1g DDE(组分A/组分B=5/5),随后在氮气气氛下聚合。由聚合反应稠化后,在65℃搅拌混合物7小时,得到110Pa·s分散碳的聚酰胺酸溶液(调节碳黑至23wt%,相对于聚酰亚胺树脂组分)。除了上述条件外,以和实施例中相同的方法得到无缝带。By adding 39.4 g of carbon black (Special Black4; a product of Degussa) and a nonionic surfactant (alkyldiethanolamine oxide; 0.5 wt %, relative to carbon black) to 944.7 g of N-methyl-2-pyrrolidone ( NMP) to obtain an NMP solution in which carbon black was dispersed, followed by stirring for 12 hours using a ball mill. After 4.5g isoquinoline is added to the NMP solution (0.2mol, relative to 1mol polyamic acid) of dispersing carbon black, add 146.8g BPDA, 27.0g PDA and 50.1g DDE (component A/component B=5/ 5), followed by polymerization under nitrogen atmosphere. After thickening by the polymerization reaction, the mixture was stirred at 65° C. for 7 hours to obtain a polyamic acid solution of 110 Pa·s dispersed carbon (adjusting carbon black to 23 wt % relative to the polyimide resin component). Except for the above conditions, seamless belts were obtained in the same manner as in Examples.
将这样得到的带切割为宽度250mm,并通过连续耐久性试验进行评价。连续运转240小时后,带中既不存在裂缝也不发生破裂,说明该带耐用性优异。测量该带的表面电阻率、体积电阻率、拉伸强度、拉伸弹性、疲劳应力和耐弯曲次数。结果列于表1。The tape thus obtained was cut to a width of 250 mm, and evaluated by a continuous durability test. After 240 hours of continuous operation, neither cracks nor cracks occurred in the belt, indicating that the belt has excellent durability. The surface resistivity, volume resistivity, tensile strength, tensile elasticity, fatigue stress and number of times of bending resistance of the belt were measured. The results are listed in Table 1.
实施例3Example 3
通过将39.4g碳黑(Special Black4;Degussa的产品)和非离子表面活性剂(烷基二乙醇氧化胺;0.5wt%,相对于碳黑)加入至944.7g N-甲基-2-吡咯烷酮(NMP)得到分散碳黑的NMP溶液,随后使用球磨机搅拌12小时。将4.7g异喹啉加入至分散碳黑的NMP溶液(0.2mol,相对于1mol聚酰胺酸)后,加入146.8g BPDA、16.2g PDA和70.1g DDE(组分A/组分B=3/7),随后在氮气气氛下聚合。由聚合反应稠化后,在65℃搅拌混合物7小时,以得到110Pa·s分散碳的聚酰胺酸溶液(调节碳黑至19wt%,相对于聚酰亚胺树脂组分)。除了上述条件外,以和实施例中相同的方法得到无缝带。By adding 39.4 g of carbon black (Special Black4; a product of Degussa) and a nonionic surfactant (alkyldiethanolamine oxide; 0.5 wt %, relative to carbon black) to 944.7 g of N-methyl-2-pyrrolidone ( NMP) to obtain an NMP solution in which carbon black was dispersed, followed by stirring for 12 hours using a ball mill. After 4.7g isoquinoline is added to the NMP solution (0.2mol, relative to 1mol polyamic acid) of dispersing carbon black, add 146.8g BPDA, 16.2g PDA and 70.1g DDE (component A/component B=3/ 7), followed by polymerization under nitrogen atmosphere. After thickening by the polymerization reaction, the mixture was stirred at 65° C. for 7 hours to obtain a polyamic acid solution of 110 Pa·s dispersed carbon (adjusting carbon black to 19 wt % with respect to the polyimide resin component). Except for the above conditions, seamless belts were obtained in the same manner as in Examples.
将这样得到的带切割为宽度250mm,并通过连续耐久性试验进行评价。连续运转240小时后,带中既不存在裂缝也不发生破裂,说明该带耐用性优异。测量该带的表面电阻率、体积电阻率、拉伸强度、拉伸弹性、疲劳应力和耐弯曲次数。结果列于表1。The tape thus obtained was cut to a width of 250 mm, and evaluated by a continuous durability test. After 240 hours of continuous operation, neither cracks nor cracks occurred in the belt, indicating that the belt has excellent durability. The surface resistivity, volume resistivity, tensile strength, tensile elasticity, fatigue stress and number of times of bending resistance of the belt were measured. The results are listed in Table 1.
对比例1Comparative example 1
通过将39.4g碳黑(Special Black4;Degussa的产品)和非离子表面活性剂(烷基二乙醇氧化胺;0.5wt%,相对于碳黑)加入至944.7g N-甲基-2-吡咯烷酮(NMP)得到分散碳黑的NMP溶液,随后使用球磨机搅拌12小时。将4.0g异喹啉加入至分散碳黑的NMP溶液(0.2mol,相对于1mol聚酰胺酸)后,加入146.8g BPDA和54.0g PDA(组分A/组分B=10/0),随后在氮气气氛下聚合。由聚合反应稠化后,在65℃搅拌混合物7小时,得到分散碳的聚酰胺酸溶液(调节碳黑至23wt%,相对于聚酰亚胺树脂组分)。除了上述条件外,以和实施例中相同的方法得到无缝带。By adding 39.4 g of carbon black (Special Black4; a product of Degussa) and a nonionic surfactant (alkyldiethanolamine oxide; 0.5 wt %, relative to carbon black) to 944.7 g of N-methyl-2-pyrrolidone ( NMP) to obtain an NMP solution in which carbon black was dispersed, followed by stirring for 12 hours using a ball mill. After adding 4.0g isoquinoline to the NMP solution (0.2mol, relative to 1mol polyamic acid) of carbon black dispersed, add 146.8g BPDA and 54.0g PDA (component A/component B=10/0), then Polymerized under nitrogen atmosphere. After thickening by the polymerization reaction, the mixture was stirred at 65° C. for 7 hours to obtain a carbon-dispersed polyamic acid solution (carbon black was adjusted to 23% by weight relative to the polyimide resin component). Except for the above conditions, seamless belts were obtained in the same manner as in Examples.
将这样得到的带切割为宽度250mm,并通过连续耐久性试验进行评价。经过约30小时后带破裂。测量该带的表面电阻率、体积电阻率、拉伸强度、拉伸弹性、疲劳应力和耐弯曲次数。结果列于表1。The tape thus obtained was cut to a width of 250 mm, and evaluated by a continuous durability test. After about 30 hours the band ruptured. The surface resistivity, volume resistivity, tensile strength, tensile elasticity, fatigue stress and number of times of bending resistance of the belt were measured. The results are listed in Table 1.
对比例2Comparative example 2
通过将39.4g碳黑(Special Black4;Degussa的产品)和非离子表面活性剂(烷基二乙醇氧化胺;0.5wt%,相对于碳黑)加入至944.7g N-甲基-2-吡咯烷酮(NMP)得到分散碳黑的NMP溶液,随后使用球磨机搅拌12小时。将4.0g异喹啉加入至分散碳黑的NMP溶液(0.2mol,相对于1mol聚酰胺酸)后,加入146.8g BPDA和100.1g DDE(组分A/组分B=0/10),随后在氮气气氛下聚合。由聚合反应稠化后,在65℃搅拌混合物7小时,以得到分散碳的聚酰胺酸溶液(调节碳黑至19wt%,相对于聚酰亚胺树脂组分)。除了上述条件外,以和实施例中相同的方法得到无缝带。By adding 39.4 g of carbon black (Special Black4; a product of Degussa) and a nonionic surfactant (alkyldiethanolamine oxide; 0.5 wt %, relative to carbon black) to 944.7 g of N-methyl-2-pyrrolidone ( NMP) to obtain an NMP solution in which carbon black was dispersed, followed by stirring for 12 hours using a ball mill. After adding 4.0g isoquinoline to the NMP solution (0.2mol, relative to 1mol polyamic acid) of carbon black dispersed, add 146.8g BPDA and 100.1g DDE (component A/component B=0/10), then Polymerized under nitrogen atmosphere. After thickening by the polymerization reaction, the mixture was stirred at 65° C. for 7 hours to obtain a carbon-dispersed polyamic acid solution (carbon black was adjusted to 19% by weight relative to the polyimide resin component). Except for the above conditions, seamless belts were obtained in the same manner as in Examples.
将这样得到的带切割为宽度250mm,并通过连续耐久性试验进行评价。经过约70小时后带破裂。测量该带的表面电阻率、体积电阻率、拉伸强度、拉伸弹性、疲劳应力和耐弯曲次数。结果列于表1。The tape thus obtained was cut to a width of 250 mm, and evaluated by a continuous durability test. The band ruptured after about 70 hours. The surface resistivity, volume resistivity, tensile strength, tensile elasticity, fatigue stress and number of times of bending resistance of the belt were measured. The results are listed in Table 1.
评估方法assessment method
1.测量表面电阻率和体积电阻率1. Measuring Surface Resistivity and Volume Resistivity
使用HIRESTA UP HCP-HT450(Mitsubishi Chemical Corporation的产品,探针:UR),在外加电压100V和电压施加时间10秒的条件下,测量在25℃和60%RH下的表面电阻率和体积电阻率。Using HIRESTA UP HCP-HT450 (product of Mitsubishi Chemical Corporation, probe: UR), the surface resistivity and volume resistivity at 25°C and 60%RH were measured under the conditions of an applied voltage of 100V and a voltage application time of 10 seconds .
2.疲劳试验2. Fatigue test
根据JIS K-7118通过冲孔得到的哑铃型(dumbbel)No.3(JIS K6771(K6301))形式的样品,并使用气动强度试验机(Shimadzu Corporation的产品;SERVO PULSER EHF-F01,4880型控制装置),在22℃至25℃、最大载荷应力300MPa、最小载荷应力30MPa、频率15Hz(正弦波形)和重复次数107次的条件下,测量疲劳应力(直到107次不破裂承受的应力上限值)。A sample in the form of dumbbell No. 3 (JIS K6771 (K6301)) obtained by punching according to JIS K-7118, and controlled using a pneumatic strength tester (product of Shimadzu Corporation; SERVO PULSER EHF-F01, Model 4880) device), under the conditions of 22°C to 25°C, maximum load stress of 300MPa, minimum load stress of 30MPa, frequency of 15Hz (sinusoidal waveform) and repetitions of 107 times, the fatigue stress was measured (until 107 times of stress without rupture) limit).
3.MIT测试3. MIT test
根据JIS P-8115使用宽度15mm的测试样品,并使用MIT测试仪(Tester Sangyo Co.,Ltd.的产品),在270度弯曲角(左和右)、175次/分钟的弯曲速度和9.8N载荷的条件下进行测量。开始测试后直至测试样品破裂承受的次数测定为耐弯曲次数。Using a test sample with a width of 15mm according to JIS P-8115, and using an MIT tester (product of Tester Sangyo Co., Ltd.), at a bending angle of 270 degrees (left and right), a bending speed of 175 times/min, and 9.8N Measured under load conditions. The number of times the test sample was subjected after the start of the test until the rupture of the test sample was determined as the number of times of resistance to bending.
4.测量拉伸强度和拉伸弹性4. Measuring Tensile Strength and Tensile Elasticity
根据JIS K6771(K6301),使用通过冲孔得到的哑铃型No.3形式的带测试样品进行测量。According to JIS K6771 (K6301), measurement is performed using a tape test sample in the form of dumbbell No. 3 obtained by punching.
5.连续耐久性测试5. Continuous durability test
将得到的半导体聚酰亚胺带切割为宽度250mm,并固定在辊直径10mm的旋转设备上,辊速度为10米/分钟,带张力为2kg/250mm。进行240小时连续运转,以评价带的破损。The resulting semiconducting polyimide tape was cut to a width of 250 mm and fixed on a rotating device with a roll diameter of 10 mm at a roll speed of 10 m/min and a tape tension of 2 kg/250 mm. Continuous operation was performed for 240 hours to evaluate belt breakage.
如表1所示,组分A和组分B组成摩尔比率在预定范围内的实施例1至3中的各个带在连续运转240小时后没有裂缝和破裂,说明其耐用性优异。相反,其中组分A和组分B组成摩尔比率超出预定范围的对比例1和2中的各个带在连续运转数十小时后破裂。As shown in Table 1, each of the belts in Examples 1 to 3 in which the compositional molar ratio of Component A and Component B was within a predetermined range had no cracks and cracks after 240 hours of continuous operation, indicating excellent durability. In contrast, each of the belts in Comparative Examples 1 and 2 in which the compositional molar ratio of Component A and Component B was out of the predetermined range ruptured after several tens of hours of continuous operation.
虽然已经参考其具体实施方式详细描述,在不脱离其精神和范围的情况下可以作出的多种改变和改进对于本领域普通技术人员是显而易见的。Although it has been described in detail with reference to specific embodiments thereof, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope thereof.
本申请基于2005年9月28日提交的日本专利申请No.2005-281865,其中全部内容此处引入作为参考。This application is based on Japanese Patent Application No. 2005-281865 filed on September 28, 2005, the entire contents of which are incorporated herein by reference.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200710089720 CN101274989B (en) | 2007-03-27 | 2007-03-27 | Semi-conductor polyimide film |
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| Application Number | Priority Date | Filing Date | Title |
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| CN 200710089720 CN101274989B (en) | 2007-03-27 | 2007-03-27 | Semi-conductor polyimide film |
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| CN101274989A CN101274989A (en) | 2008-10-01 |
| CN101274989B true CN101274989B (en) | 2012-12-26 |
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| CN 200710089720 Expired - Fee Related CN101274989B (en) | 2007-03-27 | 2007-03-27 | Semi-conductor polyimide film |
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| JP7447452B2 (en) * | 2019-12-06 | 2024-03-12 | 富士フイルムビジネスイノベーション株式会社 | Endless belt, transfer device, and image forming device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5939498A (en) * | 1998-04-07 | 1999-08-17 | E. I. Du Pont De Nemours And Company | High modulus polyimide blend |
| US6281324B1 (en) * | 1998-12-21 | 2001-08-28 | Nitto Denko Corporation | Semiconductive belt |
| US6352750B1 (en) * | 1999-08-12 | 2002-03-05 | Gunze Limited | Seamless tubular electrically-semiconductive aromatic polymide film and process for producing the same |
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2007
- 2007-03-27 CN CN 200710089720 patent/CN101274989B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5939498A (en) * | 1998-04-07 | 1999-08-17 | E. I. Du Pont De Nemours And Company | High modulus polyimide blend |
| US6281324B1 (en) * | 1998-12-21 | 2001-08-28 | Nitto Denko Corporation | Semiconductive belt |
| US6352750B1 (en) * | 1999-08-12 | 2002-03-05 | Gunze Limited | Seamless tubular electrically-semiconductive aromatic polymide film and process for producing the same |
Non-Patent Citations (1)
| Title |
|---|
| JP特开2006-323081A 2006.11.30 |
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