CN101164138A - Cartesian Arm Cluster Tool Architecture - Google Patents

Abstract

A method and apparatus for processing a substrate using a multi-chamber processing system having increased throughput, enhanced system reliability, improved device yield performance, more reproducible wafer processing history, and a smaller footprint is provided. Various embodiments of the cluster tool may use two or more robots configured in a parallel process configuration to transfer substrates between the various process chambers retained in the processing racks so that the desired process sequence may be performed. In one aspect, the parallel process arrangement includes two or more robot assemblies adapted to move in vertical and horizontal directions to access a number of process chambers retained in the process racks. In one embodiment, a robot blade is adapted to confine a substrate such that the acceleration experienced by the substrate during the transfer process does not cause the position of the substrate on the robot blade to change.

Description

Cartesian Arm Cluster Tool Architecture

technical field

Embodiments of the present invention generally relate to an integrated processing system that includes multiple processing stations and robotic arms capable of simultaneously processing multiple substrates.

Background technique

The process of forming electronic devices is typically performed in a multi-chamber process system (eg, a cluster tool) capable of sequentially processing substrates (eg, semiconductor wafers) under a controlled process environment. Tools typically used to deposit (ie, coat) and develop photoresist materials are generally called automated photoresist coating and development tools (track lithography tool), or used to perform semiconductor cleaning processes, generally called wet/cleaning tools, typically The cluster tool includes a main frame housing at least one substrate transfer robot that transfers substrates between a cassette/cassette mounter and a plurality of process chambers coupled to the main frame. Cluster tools are typically used so that substrates can be processed in a reproducible manner under a controlled process environment. A controlled environment has many benefits, including minimizing contamination of substrate surfaces during transfer and during completion of various substrate processing steps. Processing in a controlled environment thus reduces defect generation and improves device yield.

The effectiveness of a substrate manufacturing process is usually weighed by two related and important factors, namely component yield and cost of ownership (CoO). These factors are important because they directly affect the production cost of an electronic component, thereby affecting the market competitiveness of a component manufacturer. CoO, which is affected by many factors, is greatly affected by the system and chamber capacity, in short, the number of substrates processed by the expected process program per hour. A process sequence is generally defined as a sequence of device manufacturing steps or process recipe steps that are performed in one or more process chambers in the cluster tool. A process sequence generally may contain several substrate (or wafer) electronic component manufacturing process steps. In an effort to reduce CoO, electronic component manufacturers spend a lot of time trying to optimize process sequences and chamber process times to achieve the maximum possible substrate throughput within the constraints of cluster tool configurations and chamber process times. In automated photoresist coating and developing cluster tools, because the chamber process time is short (for example, the process can be completed in about 1 minute), but the number of process steps required to complete a typical process sequence is large, it is used to complete Most of the process sequence time is spent transferring the substrate between the various process chambers. A typical automated photoresist coating and development process generally includes the following steps: depositing one or more uniform photoresist (or resist) layers on the surface of a substrate, and then transferring the substrate out of the cluster tool to a A separate stepper or scanning tool is used to pattern the substrate surface by exposing the photoresist layer to a photoresist conditioning electromagnetic radiation, followed by developing the patterned photoresist layer. If the throughput of the substrate in the cluster tool is not limited by the robotic arm, then the longest recipe step will limit the throughput of the process. This typically does not occur in automated photoresist coating and development process procedures due to their short process times and large number of process steps. Typical system throughput for conventional manufacturing processes, such as automated photoresist coating and development tools performing a typical process, is generally between 100-120 substrates per hour.

Other important factors in the CoO calculation are system reliability and system operating time. These factors are important to the profitability and/or availability of the cluster tool because the longer the system is unable to process a substrate, the more money the user loses due to the opportunity to process the substrate in the cluster tool loss. Consequently, cluster tool users and manufacturers spend a lot of time trying to develop reliable processes, reliable hardware and reliable systems with increased operating time.

Industry efforts to shrink semiconductor device dimensions to improve device processing speed and reduce device heat generation have reduced the industry's tolerance for process variation. To minimize process variation, an important factor in automating the photoresist coating and development process is ensuring that each substrate passing through the cluster tool has the same "wafer history." The wafer history of the substrates is typically monitored and controlled by process engineers to ensure that all device manufacturing process variables that may later affect device performance are controlled so that all substrates within the same batch are always processed in the same manner. To ensure that each substrate has the same "wafer history", each substrate needs to be subjected to the same repeatable substrate processing steps (e.g. consistent coating process, consistent hard copy process, consistent cooling process, etc. etc.), and the time between each process step is the same for each substrate. Lithographic device manufacturing processes can be insensitive to process recipe variables and time variations between recipe steps, which directly affect process variation and ultimately device performance. Therefore, there is a need for a cluster tool and supporting equipment capable of executing a process sequence that minimizes process variation and time variation between process steps. In addition, there is a need for cluster tools and supporting equipment capable of performing device manufacturing processes that give uniform and repeatable process results while achieving desired substrate throughput.

Therefore, a need exists for a system, a method and an apparatus that can process a substrate to meet required device performance targets and increase system throughput, thereby reducing process flow CoO.

Contents of the invention

The present invention generally provides a cluster tool for processing a substrate comprising a first process rack containing a first set of process chambers having two or more substrate process chambers stacked vertically, and A second group of process chambers having two or more substrate processing chambers stacked vertically, wherein the first and second groups of two or more substrate processing chambers have along a first A first side aligned, a first robotic arm assembly adapted to transfer a substrate to a substrate processing chamber in the first processing rack, wherein the first robotic arm assembly includes a first robotic arm that Having a robot blade having a substrate receiving surface, wherein the first robot arm is adapted to position a substrate at one or more points generally contained in a first plane, wherein the first plane is in the same direction as the parallel to a first direction and a second direction perpendicular to the first direction, a first movement assembly having an actuator assembly adapted to position the first robotic arm in a third direction generally perpendicular to the first plane, and a second movement assembly having an actuator assembly adapted to position the first robotic arm in a direction generally parallel to the first direction, and a transfer area in which the first robotic arm is housed, wherein when the When the substrate is disposed on the substrate receiving surface of the robot blade, the width of the conveying area is parallel to the second direction and is about 5% to about 50% larger than the dimension of the substrate in the second direction.

Embodiments of the present invention further provide a cluster tool for processing a substrate comprising a first process rack containing two or more groups of two or more substrate processing chambers stacked vertically, wherein the Two or more sets of two or more substrate processing chambers having first sides aligned along a first direction for accessing said substrate processing chambers therethrough, a second processing rack containing There are two or more groups of two or more substrate processing chambers stacked vertically, wherein the two or more groups of two or more substrate processing chambers have a second one side for accessing the substrate processing chamber therethrough, a first robotic arm assembly disposed between the first processing rack and the second processing rack, which is adapted to move a substrate from the first side transfer to a substrate processing chamber in the first processing rack, wherein the first robotic arm assembly includes a robotic arm adapted to position a substrate at one or more points generally accommodated in a horizontal plane , a vertical movement assembly having a motor adapted to position the arm in a direction generally parallel to the vertical direction, and a horizontal movement assembly having a motor adapted to position the arm in a direction generally parallel to the first direction a motor in the direction, a second robotic arm assembly disposed between the first process rack and the second process rack, which is adapted to transfer a substrate from the first side into the second process rack A material processing chamber, wherein the second robotic arm assembly includes a robotic arm adapted to place a substrate at one or more points generally accommodated in a horizontal plane, a vertical movement assembly having a position adapted to place the substrate at one or more points a motor for positioning the arm in a direction generally parallel to the vertical direction, and a horizontal movement assembly having a motor adapted to position the arm in a direction generally parallel to the first direction, and a third arm an assembly, disposed between the first processing rack and the second processing rack, adapted to transfer a substrate from the first side to a substrate processing chamber in the first processing rack or from the first side Transfer to the second processing rack, wherein the third robotic arm assembly includes a robotic arm adapted to position a substrate at one or more points generally accommodated in a horizontal plane, a vertical movement assembly having suitable a motor for positioning the arm in a direction generally parallel to the vertical direction, and a horizontal movement assembly having a motor adapted to position the arm in a direction generally parallel to the first direction.

The present invention further provides a cluster tool for processing a substrate comprising a first process rack containing two or more groups of two or more vertically stacked substrate processing chambers, wherein the two or more A set of two or more vertically stacked substrate processing chambers having first sides aligned along a first direction for accessing the substrate processing chambers therethrough, and along a second direction a second side arranged to access the substrate processing chamber therethrough, a first robotic arm assembly adapted to transfer a substrate from the first side to the substrate in the first processing rack The processing chamber, wherein the first robotic arm assembly includes a first robotic arm adapted to position a substrate at one or more points generally accommodated in a horizontal plane, a vertical movement assembly having a structure adapted to position a motor for positioning the first robotic arm in a direction generally parallel to the vertical direction, and a horizontal movement assembly having a motor adapted to position the first mechanical arm in a direction generally parallel to the first direction, and a second robotic arm assembly adapted to transfer a substrate from the second side to the substrate processing chamber in the first processing rack, wherein the second robotic arm assembly includes a second robotic arm that adapted to position a substrate at one or more points generally accommodated in a horizontal plane, a vertical movement assembly having a motor adapted to position the second robot arm in a direction generally parallel to the vertical direction, and a horizontal movement assembly having a motor adapted to position the second robotic arm in a direction generally parallel to the second direction.

Embodiments of the present invention further provide a cluster tool for processing a substrate, comprising two or more substrate processing chambers disposed within a cluster tool, a first robotic arm assembly adapted to process a substrate transported to the two or more substrate processing chambers, wherein the first robot arm assembly includes a first robot arm adapted to position a substrate in a first orientation, wherein the first robot arm includes A robotic arm blade having a first end and a substrate receiving surface adapted to receive and transport a substrate, a first connecting member having a first pivot point and a second A pivot point, a motor, is rotationally connected to the first connecting member at the second pivot point, and a first gear (gear), is connected to the first end of the blade of the mechanical arm and is connected to the first pivot point at the first pivot point. The first connecting member is rotatably connected, and a second gear is rotatably connected to the first gear and concentrically aligned with the second pivot point of the first connecting member, wherein the second gear is geared to the first gear ratio between about 3:1 to about 4:3, a first movement assembly adapted to position the first mechanical arm in a second direction generally perpendicular to the first direction, and a second movement An assembly having a motor adapted to position the first robotic arm in a third orientation generally perpendicular to the second orientation.

Embodiments of the present invention further provide a cluster tool for processing a substrate comprising a first process rack containing two or more groups of two or more vertically stacked substrate processing chambers, wherein the Two or more groups of two or more vertically stacked substrate processing chambers have first sides aligned along a first direction for accessing the substrate processing chambers therethrough, and along a a second side aligned in a second direction for accessing the substrate processing chamber therethrough, a first robotic arm assembly adapted to transfer a substrate from the first side into the first processing rack The substrate processing chamber of the present invention, wherein the first robotic arm assembly includes a first robotic arm adapted to position a substrate at one or more points generally accommodated in a horizontal plane, a vertical movement assembly having a motor adapted to orient the first robotic arm in a direction generally parallel to the vertical direction, and a horizontal movement assembly having a motor adapted to orient the first robotic arm in a direction generally parallel to the first direction a motor, and a second robot assembly adapted to transfer a substrate from the second side to a substrate processing chamber in the first processing rack, wherein the second robot assembly includes a second mechanical an arm adapted to position a substrate at one or more points generally accommodated in a horizontal plane, a vertical movement assembly having means adapted to position the second robotic arm in a direction generally parallel to the vertical direction a motor, and a horizontal movement assembly having a motor adapted to position the second robotic arm in a direction generally parallel to the second direction.

Embodiments of the present invention further provide a cluster tool for processing a substrate, comprising two or more substrate processing chambers disposed within a cluster tool, a first robotic arm assembly adapted to process a substrate transported to the two or more substrate processing chambers, wherein the first robot arm assembly includes a first robot arm adapted to position a substrate in a first orientation, wherein the first robot arm includes A robotic arm blade having a first end and a substrate receiving surface adapted to receive and transport a substrate, a first connecting member having a first pivot point and a second A pivot point, a motor, rotatably connected to the first connecting member at the second pivot point, a first gear, connected to the first end of the blade of the mechanical arm and connected to the first joint at the first pivot point The connecting member is rotatably connected, and a second gear is rotatably connected to the first gear and concentrically aligned with the second pivot point of the first connecting member, wherein the gear ratio of the second gear to the first gear is between Between about 3:1 and about 4:3, a first movement assembly adapted to position the first robotic arm in a second direction generally perpendicular to the first direction, and a second movement assembly having A motor adapted to position the first robotic arm in a third orientation generally perpendicular to the second orientation.

Embodiments of the present invention further provide an apparatus for conveying a substrate in a cluster tool comprising a first robotic arm adapted to position a substrate in one or more In point, a vertical movement assembly comprising a slide rail assembly comprising a block attached to a vertically positioned linear track, a support plate attached to the block and the first robotic arm, and an actuator adapted to vertically place the support plate in a vertical position along the linear track, and a horizontal movement assembly connected to the vertical movement assembly and having a horizontal actuator adapted to The first mechanical arm and the vertical moving assembly are arranged in the horizontal direction.

Embodiments of the present invention further provide an apparatus for conveying a substrate in a cluster tool comprising a first robotic arm adapted to position a substrate in one or more In point, a vertical movement assembly comprising an actuator assembly adapted to vertically dispose the first robotic arm, wherein the actuator assembly further comprises a vertical actuator adapted to vertically dispose the first robotic arm , and a vertical slide adapted to guide the first robotic arm as the vertical actuator mobilizes the first robotic arm, an enclosure having one or more side walls forming an interior region, the interior region Surrounding at least one component selected from the group consisting of a vertical actuator and the vertical slide, and a fan, in fluid communication with the interior region, adapted to generate a negative pressure within the enclosure, and a horizontal movement assembly having A horizontal actuator and a horizontal slide member adapted to position the first robotic arm in an orientation generally parallel to the first side of the first processing rack.

Embodiments of the present invention further provide an apparatus for transferring a substrate within a cluster tool comprising a first robot assembly adapted to position a substrate in a first orientation, wherein the first robot The assembly includes a robotic arm blade having a first end and a substrate receiving surface, a first connecting member having a first pivot point and a second pivot point, a first gear, and the robotic arm blade a first end connected to and rotatably connected to the first connecting member at the first pivot point, a second gear rotatably connected to the first gear and aligned with a second pivot point of the first connecting member, and a first motor, which is rotatably connected with the first connecting member, wherein the first motor is adapted to set the substrate receiving member by rotating the first connecting member and the first gear relative to the second gear. surface, a first moving assembly adapted to position the first robotic arm in a second direction generally perpendicular to the first direction, and a second moving assembly adapted to position the first robotic arm disposed in a third direction generally perpendicular to the second direction.

Embodiments of the present invention further provide an apparatus for conveying a substrate in a cluster tool comprising a first robot assembly adapted to position a substrate along a at one or more points of the arc, wherein the first robot assembly includes a robot blade having a first end and a substrate receiving surface, and a motor that rotates with the first end of the robot blade connected to a first moving assembly adapted to position the first robotic arm in a second direction generally perpendicular to the first plane, wherein the first moving assembly includes an actuator assembly adapted to vertically The first mechanical arm is set, wherein the actuator assembly further includes a vertical actuator, which is suitable for vertically setting the first mechanical arm, and a vertical slide rail, which is suitable for mobilizing the first mechanical arm on the vertical actuator. a robotic arm guiding the first robotic arm, an enclosure having one or more side walls forming an interior region surrounding at least one component selected from the group consisting of a vertical actuator and the vertical slide, and a fan in fluid communication with the interior region, which is adapted to generate negative pressure within the enclosure, and a second movement assembly, having a second actuator, which is adapted to position the first robotic arm In a third direction generally perpendicular to the second direction.

Embodiments of the present invention further provide an apparatus for transferring a substrate within a cluster tool comprising a first robot assembly adapted to position a substrate in a first orientation, wherein the first robot The assembly includes a robot blade having a first end and a substrate receiving surface, a first gear connected to the first end of the robot blade, a second gear rotatably connected to the first gear, and a A first motor, rotatably connected to the first gear, and a second motor, rotatably connected to the second gear, wherein the second motor is adapted to rotate the second gear relative to the first gear to create a variable a gear ratio, and a first movement assembly adapted to position the first mechanical arm in a second direction generally perpendicular to the first direction.

Embodiments of the present invention further provide an apparatus for transferring a substrate, comprising a base having a substrate supporting surface, a reaction member disposed on the base, a contact member, and a substrate adapted to An actuator pushing towards the reaction member is connected, and a braking member adapted to generally inhibit movement of the contact member when the contact member is arranged to push the substrate towards the reaction member.

Embodiments of the present invention further provide an apparatus for transferring a substrate, comprising a base having a support surface, a reaction member disposed on the base, an actuator connected to the base, a contact member, connected to the actuator, wherein the actuator is adapted to push the contact member towards an edge of a substrate that is disposed on the support surface and is supported by the reaction member, a brake member assembly comprising a brake member, and a brake actuation member, wherein the brake actuation member is adapted to urge the brake member toward the contact member to create a generally inhibited movement of the contact member during a substrate transfer restrictive force.

Embodiments of the present invention further provide an apparatus for transferring a substrate comprising a base having a support surface, a reaction member disposed on the base, a contact member assembly including an actuator, and a a contact member having a substrate contact surface and a compliant member disposed between the contact surface and the actuator, wherein the actuator is adapted to position the contact surface toward the reaction member surface substrate pushing, and a brake member assembly comprising a brake member, and a brake actuation member adapted to push the brake member toward the contact member to inhibit movement of the contact member during transport of a substrate Movement, and a sensor are connected to the contact member, wherein the sensor is adapted to sense the position of the contact surface.

Embodiments of the present invention further provide an apparatus for transferring a substrate, comprising a robot arm assembly including a first robot arm adapted to transfer a substrate disposed on a blade of a robot arm in a first direction, a A first moving assembly having an actuator adapted to position the first mechanical arm in a second orientation, and a second moving assembly connected to the first moving assembly and having a second actuator , which is adapted to arrange the first robot arm and the first moving assembly in a third direction generally perpendicular to the second direction, and a substrate gripping device connected to the blade of the robot arm, wherein the substrate gripper The pick-up device is suitable for supporting a substrate and includes a reaction member disposed on the blade of the robot arm, an actuator connected to the blade of the robot arm, and a contact member connected to the actuator, wherein the actuator The device is adapted to constrain a substrate by pushing the contact member toward an edge of the substrate disposed between the contact member and the reaction member, and a brake member assembly comprising a brake member and a brake actuator An actuating member adapted to push the braking member toward the contact member to inhibit movement of the contact member during transfer of a substrate.

Embodiments of the present invention further provide a method for conveying a substrate, comprising disposing a substrate on a substrate supporting device, interposed between a substrate contacting member and a reaction member disposed on the substrate supporting device In between, a substrate gripping force is generated using an actuator that pushes the substrate contact member toward the substrate and pushes the substrate toward the reaction member, and generates a restraining force that A brake assembly is adapted to inhibit movement of the substrate contacting member during conveyance of a substrate.

Embodiments of the present invention further provide a method for conveying a substrate, comprising disposing a substrate on a substrate supporting device, interposed between a substrate contacting member and a reaction member disposed on the substrate supporting device In between, an actuator having a connector is connected to the substrate contact member, and the connector connects the actuator to the substrate contact member, and an actuator is used to apply a gripping force to the substrate material, the actuator pushes the substrate contacting member toward the substrate and pushes the substrate toward the reaction member, storing energy in a compliant member disposed between the substrate contacting member and the connection Between the parts, restraining the movement of the connecting part after applying the gripping force, to minimize the amount of variation in the gripping force during the transfer of the substrate, and by sensing the substrate contact surface due to the stored in the compliant member The reduced movement of energy induces movement of the substrate.

Embodiments of the present invention further provide a method of transferring a substrate, comprising receiving a substrate disposed in a first process chamber on a robotic substrate support, wherein the step of receiving the substrate includes placing a The substrate is arranged on the substrate support of the robot arm, between a substrate contact member and a reaction member arranged on the substrate support of the robot arm, and an actuator is used to generate substrate gripping force, the actuator The actuator pushes the substrate contacting member toward the substrate and pushes the substrate toward the reaction member, and a brake assembly is provided to generate a restraining force against movement of the substrate contacting member during conveyance of a substrate , and utilizing a first robotic arm assembly to transfer the substrate and the robotic substrate support from a position within the first process chamber to a position within a second process chamber along Disposed at a distance from the first process chamber in a first direction, the first robotic arm assembly is adapted to position the substrate in a desired position in the first direction and in a second direction expected position, wherein the second direction is generally perpendicular to the first direction.

Embodiments of the present invention further provide a method of transporting a substrate in a cluster tool comprising utilizing a first robot assembly to transport a substrate to a first array of process chambers disposed along a first direction, The first robot assembly is adapted to position the substrate at a desired position in the first direction, and in a desired position in a second direction, wherein the second direction is generally perpendicular to the first direction, using a a second robot assembly for transferring a substrate to a second array of process chambers disposed along the first direction, the second robot assembly adapted to position the substrate at a desired location in the first direction, and disposed at a desired position in the second direction, and transporting a substrate to the first and second arrays of processing chambers disposed along the first direction using a third robotic arm assembly adapted to and disposing the substrate at an expected position in the first direction, and at an expected position in the second direction.

Embodiments of the present invention further provide a method of transporting a substrate in a cluster tool comprising utilizing a first robotic arm assembly to transport a substrate from a first through-chamber to an array disposed along a first direction a first array of processing chambers, the first robotic arm assembly adapted to position the substrate in a desired position in the first direction and in a desired position in a second direction, wherein the second direction is generally in line with The first direction is vertical, and a substrate is transferred from the first through-chamber to the first process chamber array using a second robotic arm assembly adapted to place the substrate in the first process chamber array. at a desired position in a first direction, and disposed at a desired position in a second direction, and transferring a substrate from a substrate cassette to the first through-chamber using a front-end robotic arm disposed in a front-end assembly , wherein the front end assembly is substantially adjacent to a transfer area containing the first process chamber array, the first robot assembly, and the second robot assembly.

Description of drawings

So that the manner in which the above-described features of the invention can be seen in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the Examples, some of which are illustrated in the accompanying drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.

Figure 1A is an isometric view illustrating an embodiment of the cluster tool of the present invention;

Figure 1B is a plan view of the process system shown in Figure 1A according to the present invention;

FIG. 1C is a side view showing an embodiment of a first process frame 60 according to the present invention;

FIG. 1D is a side view showing an embodiment of a second process rack 80 according to the present invention;

Figure 1E is a plan view of the process system shown in Figure 1B according to the present invention;

Figure 1F illustrates an embodiment of a process sequence that includes several process recipe steps that may be used with various embodiments of the cluster tools described herein;

FIG. 1G shows a plan view of the process system shown in FIG. 1B showing a substrate transport path through the cluster tool following the process sequence shown in FIG. 1F;

Figure 2A is a plan view of a process system according to the present invention;

Figure 2B is a plan view of the process system according to the present invention shown in Figure 2A;

Figure 2C shows a plan view of the process system shown in Figure 2B showing the substrate transport path through the cluster tool following the process sequence shown in Figure 1F;

Figure 3A is a plan view of a process system according to the present invention;

Figure 3B shows a plan view of the process system shown in Figure 3A showing the substrate transport path through the cluster tool following the process sequence shown in Figure 1F;

Figure 4A is a plan view of a process system according to the present invention;

Figure 4B shows a plan view of the process system shown in Figure 4A showing the substrate transport path through the cluster tool following the process sequence shown in Figure 1F;

Figure 5A is a plan view of a process system according to the present invention;

Figure 5B shows a plan view of the process system shown in Figure 5A showing the substrate transport path through the cluster tool following the process sequence shown in Figure 1F;

Figure 6A is a plan view of a process system according to the present invention;

Figure 6B shows a plan view of the process system shown in Figure 6A showing two possible substrate transfer paths through the cluster tool following the process sequence shown in Figure 1F;

Figure 6C is a plan view of a process system according to the present invention;

Figure 6D shows a plan view of the process system shown in Figure 6C showing two possible substrate transfer paths through the cluster tool following the process sequence shown in Figure 1F;

Figure 7A is a side view of an embodiment of an exchange chamber according to the present invention;

Figure 7B is a plan view of the process system shown in Figure 1B according to the present invention;

FIG. 8A is an isometric view showing another embodiment of the cluster tool shown in FIG. 1A with an attached protective cover in accordance with the present invention;

Figure 8B is a cross-sectional view of the cluster tool shown in Figure 8A in accordance with the present invention;

Figure 8C is a cross-sectional view of an arrangement according to the present invention;

Figure 9A is an isometric view illustrating an embodiment of a robotic arm that may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 10A is an isometric view illustrating an embodiment of a robotic arm hardware assembly having a single robotic arm assembly in accordance with the present invention;

Figure 10B is an isometric view illustrating an embodiment of a robotic arm hardware assembly having a dual robotic arm assembly in accordance with the present invention;

Figure 10C is a cross-sectional view of one embodiment of the robotic arm hardware assembly shown in Figure 10A in accordance with the present invention;

Figure 10D is a cross-sectional view of one embodiment of a robotic arm hardware assembly in accordance with the present invention;

Figure 10E is a cross-sectional view of one embodiment of the robotic arm hardware assembly shown in Figure 10A in accordance with the present invention;

FIG. 11A is a plan view of one embodiment of a robot assembly according to the present invention, showing several positions of the robot blade as it transfers a substrate into a process chamber;

Figure 11B shows several possible paths of the center point of the substrate as it is conveyed into a process chamber according to the present invention;

Figure 11C is a plan view of one embodiment of a robot assembly according to the present invention, showing several positions of the robot blades as they transfer a substrate into a process chamber;

Figure 11D is a plan view of one embodiment of a robot assembly according to the present invention, showing several positions of the robot blades as they transfer a substrate into a process chamber;

FIG. 11E is a plan view of one embodiment of a robot assembly according to the present invention, showing the positions of the robot blades as they transport a substrate into a process chamber;

Figure 11F is a plan view of one embodiment of a robot assembly according to the present invention, showing several positions of the robot blades as they transfer a substrate into a process chamber;

FIG. 11G is a plan view of one embodiment of a robot assembly according to the present invention, showing several positions of the robot blade as it transfers a substrate into a process chamber;

FIG. 11H is a plan view of one embodiment of a robot assembly according to the present invention, showing several positions of the robot blade as it transfers a substrate into a process chamber;

FIG. 11I is a plan view of an embodiment of a robot assembly according to the present invention, showing several positions of the robot blade as it transfers a substrate into a process chamber;

Figure 11J is a plan view of an embodiment of a robotic arm assembly according to the present invention;

Figure 11K is a plan view of a conventional SCARA manipulator of a manipulator assembly near a process rack;

Figure 12A is a cross-sectional view of the horizontal movement assembly shown in Figure 9A according to the present invention;

Figure 12B is a cross-sectional view of the horizontal movement assembly shown in Figure 9A according to the present invention;

Figure 12C is a cross-sectional view of the horizontal movement assembly shown in Figure 9A according to the present invention;

Figure 13A is a cross-sectional view of the vertical movement assembly shown in Figure 9A according to the present invention;

Figure 13B shows an isometric view of one embodiment of the robotic arm shown in Figure 13A, which may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 14A is an isometric view illustrating an embodiment of a robotic arm that may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 15A is an isometric view illustrating an embodiment of a robotic arm that may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 16A shows a plan view of one embodiment of a robot blade assembly that may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 16B shows a side cross-sectional view of one embodiment of the robot blade assembly shown in Figure 16A, which may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 16C shows a plan view of one embodiment of a robot blade assembly that may be adapted to transfer substrates in various embodiments of the cluster tool;

Figure 16D shows a plan view of one embodiment of a robotic blade assembly that may be adapted to transfer substrates in various embodiments of the cluster tool.

Description of main component symbols

5 external modules

9, 9A, 9B, 9C, 9D, 9E, 9F channel position

10 Cluster Tool 10A Cluster Tool Base

10B slit 11 mechanical arm assembly

11A First robotic arm assembly 11B Second robotic arm assembly

11C The third robotic arm assembly 11D The fourth robotic arm assembly

11E Fifth robotic arm assembly 11F Sixth robotic arm assembly

11G Seventh robotic arm assembly 11H Eighth robotic arm assembly

15 front-end manipulator assembly 15A horizontal movement assembly

15B robotic arm 15C robotic arm blade

24 front-end modules 25 central modules

40 Rear-end robotic arm assembly 40A base

40B slide rail assembly 40C support seat

40E Arm/Blade 45 Long Mount

60 first process rack 60A, 60B side

80 second process rack 80A, 80B side

85 robotic arm hardware components

86, 86A, 86B transfer robot arm assembly

87 robotic arm blades 87A, 87B blades

90 horizontal moving components Horizontal moving components under 90A

Horizontal moving component on 90B 91 transfer area

95 vertical movement components 101 system controller

105, 105D wafer box assembly 106 wafer box

110, 110A, 110B, 110C environmental control components

111 filter 112 filter unit

113 Sidewall 130 Post Exposure Baking (PEB) Chamber

160 coater/developer chambers

162 Wafer Edge Exposure Blob Removal (OEBR) Chamber

165 support chambers

170 Hexamethyldisilazane (HMDS) process chamber

180 cooling chambers 190 baking chambers

305 Double-rod linked robotic arm 306 Single-axis linked

310 first link 312 transmission system

313 enclosure 320 motor

321 support plate 352 fourth pulley

353 bearing axis 354 third pulley

354A Bearing                                                                                    

356 second pulley 356A bearing

358 first pulley 359 belt

532A base material accommodates components 533 exchange chamber

534 process chamber 536 external process system

560 Vertical Actuator Assembly 570 Vertical Support

571 drive belt 572 moving block

573 bearing block 574 linear track

575 pulley 575A, 575B drive belt pulley

576 pulley assembly 577 vertical slide rail assembly

580 fan assembly 581 tube

582 fan 584 enrichment area

585 slit 586 internal area

590 enclosure 591 outer wall

592 enclosure top 593 slits

601 Substrate support component 602 Enclosure

603 access port 610 support finger

611 substrate containing surface 800 integrated baking/cooling chamber

A1, A2, A3, A4, A5, A6, A7, A8, A9, A10 transmission path

C6 process chamber

Detailed ways

The present invention generally provides an apparatus and method for processing substrates using a multi-chamber processing system, such as a cluster tool, with increased system throughput, enhanced system reliability, improved component yield performance, More reproducible wafer process history (or wafer history), and smaller footprint. In one embodiment, the cluster tool is adapted to perform an automated photoresist coating and development process in which a substrate is coated with a photosensitive material and then conveyed to a stepper/scanner, which A photosensitive material is exposed to a type of radiation to form a pattern on the photosensitive material, and portions of the photosensitive material are then removed in a development process performed within the cluster tool. In another embodiment, the cluster tool is adapted to perform a wet/clean process sequence in which substrate cleaning processes are performed on a substrate in the cluster tool.

Figures 1-6 illustrate some of the several robotic arm and process chamber configurations that may be used with various embodiments of the present invention. Various embodiments of the cluster tool 10 typically use two or more robotic arms configured in a parallel process configuration to transfer between various process chambers that reside within the process rack (eg, components 60, 80, etc.) The substrate on which the intended process sequence can thus be performed. In one embodiment, the parallel process configuration comprises two or more manipulator assemblies 11 (elements 11A, 11B and 11C of FIGS. The substrate is moved in the horizontal direction, i.e. the direction of transport (x-direction) and the direction perpendicular to this transport direction (y-direction), so that it can be moved along the The substrates are processed in respective process chambers arranged in a transport direction. An advantage of the parallel processing configuration is that if one of the robotic arms becomes inoperable or removed for maintenance, the system can still continue to process substrates using the other robotic arms remaining in the system. In general, the various embodiments described herein are advantageous in that each column or group of substrate processing chambers has two or more service robots to provide increased throughput and enhanced system reliability. Additionally, embodiments described herein are generally configured to minimize and control particulate generation by the substrate transport mechanism to avoid component yield and substrate debris issues that can affect the CoO of the cluster tool. Another advantage of this configuration method is that the flexible and modular structure allows the user to configure the number of process chambers, process racks, and process manipulators required to meet the user's desired throughput. While FIGS. 1-6 illustrate one embodiment of a robot assembly 11 that may be used to perform aspects of the present invention, other types of robot assemblies 11 may be adapted to perform the same substrate transfer and setup functions, without departing from the essential scope of the invention.

First cluster tool configuration

A. System configuration

FIG. 1A is an isometric view of one embodiment of a cluster tool 10 illustrating several aspects of the invention that may be used to benefit. FIG. 1A shows an embodiment of the cluster tool 10 comprising three robotic arms and a process chamber adapted to access individual process chambers stacked vertically within a first process rack 60 and a second process rack 80. External mod 5. In an embodiment, when the cluster tool 10 is used to complete a lithography process, the external module 5 connected to the rear area 45 (not shown in Figure 1A) can be a step machine/scanner, performing some additional exposed process steps. One embodiment of the cluster tool 10, shown in FIG. 1A, includes a front module 24 and a central module 25.

Figure 1B is a plan view of the embodiment of the cluster tool 10 shown in Figure 1A. The front-end module 24 generally includes one or more wafer cassette assemblies 105 (eg, items 105A-D) and a front-end robot assembly 15 (FIG. 1B). The one or more wafer pod assemblies 105, or front opening wafer pods (FOUPs), are generally adapted to house one or more wafer cassette assemblies that may contain one or more substrates "W" or Wafer cassettes for wafers. In one embodiment, the front-end module 24 also includes one or more channel locations 9 (eg, elements 9A-C of FIG. 1B ).

In one embodiment, the central module 25 has a first manipulator assembly 11A, a second manipulator assembly 11B, a third manipulator assembly 11C, a back-end manipulator assembly 40, a first process frame 60 and a second process Rack 80. The first process rack 60 and the second process rack 80 contain various process chambers (such as coater/developer chambers, baking chambers, cooling chambers, wet cleaning chambers, etc., which will be discussed later ( 1C-D)) suitable for performing various process steps in a substrate process sequence.

Figures 1C and 1D show side views of an embodiment of the first process rack 60 and the second process rack 80 when standing on the side closest to the side 60A facing the first process rack 60 and the second process rack 80 When viewed, it will therefore correspond to the illustration shown in Figures 1-6. The first process rack 60 and the second process rack 80 generally contain one or more sets of vertically stacked process chambers, which are suitable for performing some desired semiconductor or flat panel display device manufacturing process steps on a substrate. For example, in FIG. 1C, the first process rack 60 has five groups, or five columns, of process chambers stacked vertically. Generally, these device manufacturing process steps may include depositing a material on the substrate surface, cleaning the substrate surface, etching the substrate surface, or exposing the substrate to some type of radiation to induce the substrate surface A physical or chemical change in one or more areas of a material. In one embodiment, the first process rack 60 and the second process rack 80 contain process chambers adapted to perform one or more lithography process steps. In one embodiment, process racks 60 and 80 may include one or more coater/developer chambers 160, one or more cooling chambers 180, one or more baking chambers 190, one or more a wafer edge exposure bulb removal (OEBR) chamber 162, one or more post-exposure bake (PEB) chambers 130, one or more support chambers 165, an integrated bake/cool chamber 800, and/or or one or more hexamethyldisilazane (HMDS) process chambers 170 . Exemplary coater/developer chambers, cooling chambers, bake chambers, OEBR chambers, PEB chambers, support chambers, integrated bake chambers that may be adapted to benefit from one or more aspects of the present invention Bake/cool chambers and/or HMDS process chambers are further described in commonly assigned U.S. patent application Ser. No. 11/112,281, filed April 22, 2005, which is hereby incorporated by reference in its entirety to incorporated herein to the extent inconsistent with the claimed invention. Examples of integrated bake/cool chambers that may be adapted to benefit from one or more aspects of the present invention are further co-assigned U.S. patent application Ser. No. 11/111,154, filed April 11, 2005 No. and US Patent Application Serial No. 11/111,353, which are hereby incorporated by reference in their entirety to the extent not inconsistent with the claimed invention. Examples of process chambers and/or systems that may be adapted to perform one or more cleaning processes on a substrate and that may be adapted to benefit from one or more aspects of the present invention are further presented on June 25, 2001 Commonly assigned U.S. Patent Application No. 09/891,849 and U.S. Patent Application No. 09/945,454, filed August 31, 2001, which are hereby incorporated by reference in their entirety without To the extent inconsistent, the claimed invention is incorporated herein.

In one embodiment, as shown in FIG. 1C , where the cluster tool 10 is adapted to perform a lithography-type process, the first process rack 60 may have eight coater/developer chambers 160 (labeled as CD1-8), eighteen cooling chambers 180 (designated as C1-18), eight baking chambers 190 (designated as B1-8), six PEB chambers 130 (designated as PEB1-6), two OEBR chambers 162 (designated 162) and/or six HMDS process chambers 170 (designated DP1-6). In one embodiment, as shown in FIG. 1D , where the cluster tool 10 is adapted to perform a lithography-type process, the second process rack 80 may have eight coater/developer chambers 160 (labeled as CD1-8), six integrated bake/cool chambers 800 (designated BC1-6), six HMDS process chambers 170 (designated DP1-6), and/or six support chambers 165 (designated S1-6). The orientation, location, type and number of process chambers shown in Figures 1C-D are not intended to limit the scope of the invention, but are merely intended to illustrate one embodiment of the invention.

Referring to FIG. 1B, in one embodiment, the front end robot assembly 15 is adapted to operate between a wafer cassette 106 housed within a wafer cassette assembly 105 (see elements 105A-D) and the one or more lane locations 9 ( See Figure 1B for transporting substrates between lane positions 9A-C). In another embodiment, the front-end manipulator assembly 15 is adapted to be adjacent to the front-end module within a wafer cassette 106 installed in a wafer cassette assembly 105 and within the first process rack 60 or a second process rack 80 24 for transferring substrates between one or more process chambers. The front-end manipulator assembly 15 generally includes a horizontal movement assembly 15A and a manipulator 15B, which combine to place a substrate at a desired horizontal and/or vertical position within the front-end module 24, or on the front-end module 24. On the adjacent position in central module 25. The front end robot assembly 15 is adapted to transfer one or more substrates using one or more robot blades 15C by using commands from a system controller 101 (discussed later). In one procedure, the front end robot assembly 15 is adapted to transfer a substrate from the cassette 106 to one of the lane positions 9 (eg, elements 9A-C of FIG. 1B ). Generally, a lane location is a substrate staging area, which may contain a lane process chamber, which possesses similar features to an exchange chamber 533 (see FIG. 7A ) or a conventional substrate cassette 106, and can be removed from A first robot arm receives a substrate so it can be removed and repositioned by a second robot arm. In one aspect, a channel process chamber installed in a channel location may be adapted to perform one or more process steps within a desired process sequence, for example, HMDS process steps or cooling/decreasing process steps or substrates Notch alignment. In one aspect, each lane location (elements 9A-C of FIG. 1B ) can be controlled by the central manipulator assembly (i.e., the first manipulator assembly 11A, the second manipulator assembly 11B, and the third manipulator assembly). Each access of component 11C).

Referring to Figures 1A-B, the first robotic arm assembly 11A, the second robotic arm assembly 11B, and the third robotic arm assembly 11C are adapted to transfer substrates to be accommodated in the first process rack 60 and the second process Each process chamber in rack 80. In one embodiment, for transferring substrates in the cluster tool 10, the first robot assembly 11A, the second robot assembly 11B, and the third robot assembly 11C have similarly configured robot assemblies 11, Each of these has at least a horizontal movement assembly 90 , a vertical movement assembly 95 , and a robotic arm hardware assembly 85 that communicate with a system controller 101 . In one embodiment, the side 60B of the first process frame 60 and the side 80A of the second process frame 80 are all along the respective robot arm assemblies (namely the first robot arm assembly 11A, the second robot arm assembly 11B , and the third robot arm assembly 11C) each of the horizontal movement assembly 90 (described later) is arranged in a parallel direction.

The system controller 101 is adapted to control the position and movement of various components used to complete the transfer process. The system controller 101 is generally designed to facilitate overall system control and automation, and typically includes a central processing unit (CPU) (not shown), memory (not shown), and support circuitry (or input/output) (not shown). The CPU may be used in an industrial setting to control various system functions, chamber processes and supporting hardware (e.g., detectors, robotic arms, motors, gas source hardware, etc.) and to monitor the system and chamber processes ( One of any type of computer processor such as chamber temperature, process program throughput, chamber process time, input/output signals, etc.). The memory is connected to the CPU and can be one or more types of readily available memory such as random access memory (RAM), read only memory (ROM), floppy disk, hard disk, or any other type digital storage, in situ or remotely. Software instructions and data can be encoded and stored in the memory to direct the CPU. The support circuitry is also connected to the CPU to support the processor in a known manner. The support circuits may include caches, power supplies, clock circuits, input/output circuits, subsystems, and the like. Programs (or computer instructions) readable by the system controller 101 determine what tasks can be performed on a substrate. Preferably, the system controller 101 can read the programmed software, which includes codes for executing codes related to monitoring and executing the process program work and each chamber process recipe step.

Referring to FIG. 1B, in an embodiment of the present invention, the first robotic arm assembly 11A is adapted to access the process chamber in the first process rack 60 from at least one side, such as the side 60B. Transfer substrates between chambers. In one aspect, the third robotic arm assembly 11C is adapted to access and transfer substrates between the process chambers in the second process rack 80 from at least one side, such as the side 80A. In one aspect, the second robotic arm assembly 11B is adapted to access and transfer substrates between the process chambers in the first process rack 60 from side 60B, and from side 80A in the second process Substrates are transferred between the process chambers within the rack 80 . FIG. 1E shows a plan view of the embodiment of the cluster tool 10 shown in FIG. 1B in which the robot blade 87 of the second robot assembly 11B extends through side 60B into the process chamber in the first process rack 60 . The ability to extend the robotic blade 87 into and retract the robotic blade 87 from the process chamber is typically provided by the horizontal motion assembly 90, vertical motion assembly 95, and robotic hardware assembly 85. The coordinated movement of the parts and components is accomplished by using commands sent from the system controller 101. The ability to "overlap" two or more robotic arms on each other is advantageous, such as the first robotic arm assembly 11A and the second robotic arm assembly 11B, or the second robotic arm assembly 11B and the third robotic arm assembly 11B. Arm assembly 11C, as it allows for substrate transfer redundancy, can improve the cluster reliability and also increase substrate throughput. Robot "overlap" is generally the ability of two or more robots to access and/or independently transfer substrates between the same process chambers of the rack. The ability for two or more robots to redundantly access a process chamber can be an important implementation aspect to prevent system robot transfer bottlenecks as it allows an underutilized robot to help limit the throughput of the system . As a result, substrate throughput can be increased, wafer history of substrates can be more reproducible, and system reliability can be improved by balancing the workload of each robotic arm during a process sequence.

In one embodiment of the present invention, each overlapping manipulator assembly (such as elements 11A, 11B, 11C, 11D, 11E, etc. in Figures 1-6) can simultaneously access each other horizontally adjacent (x direction) ) or vertically adjacent (z-direction) process chambers. For example, when using the cluster tool configuration shown in FIGS. 1B and 1C, the first robot arm assembly 11A can access the process chamber CD6 in the first process rack 60, while the second robot arm assembly 11B can access Simultaneously access process chamber CD5 without colliding or interfering with each other. In another example, when using the cluster tool configuration shown in FIGS. 1B and 1D, the third robotic arm assembly 11C can access the process chamber C6 in the second processing rack 80, and the second mechanical The arm assembly 11B can access the process chamber DP6 simultaneously without colliding or interfering with each other.

In one aspect, the system controller 101 is adapted to adjust the delivery of the substrate through the cluster tool based on the calculated optimal throughput, or to work around an inoperable process chamber. The feature of the system controller 101 that allows it to optimize its capacity is called the logical scheduler. The logical scheduler prioritizes job and substrate movement based on input from the user and various sensors throughout the cluster tool. The logical scheduler may be adapted to view a list of future jobs requested by each robot (e.g., front robot assembly 15, first robot assembly 11A, second robot assembly 11B, third robot assembly 11C, etc.) , which is stored in the memory of the system controller 101 to help balance the load assigned to each robotic arm. Using the system controller 101 to maximize the use of the cluster tool improves the CoO of the cluster tool, makes wafer history more reproducible, and improves the reliability of the cluster tool.

In one embodiment, the system controller 101 is also adapted to avoid collisions between overlapping robotic arms and optimize substrate throughput. In one embodiment, the system controller 101 is further programmed to monitor and control the movement of the horizontal movement assembly 90, the vertical movement assembly 95, and the movement of the robotic arm hardware assembly 85 of all robotic arms within the cluster tool to avoid Collisions between the aforementioned robotic arms are eliminated and system throughput is improved by allowing all robotic arms to move simultaneously. This so-called "collision avoidance system" can be implemented in a number of ways, but generally the system controller 101 utilizes various sensors placed on the robot arm(s) or within the cluster tool to monitor each collision during the transfer process. Position of a robotic arm to avoid collisions. In one aspect, the system controller is adapted to actively vary the movement and/or route of each robotic arm during the transfer process to avoid collisions and minimize transfer path length.

B. Transmission program example

FIG. 1F shows an example of a substrate processing sequence 500 through the cluster tool 10 in which some process steps (eg, devices 501 - 520 ) may be performed after each of transfer steps A ₁ -A ₁₀ has been completed. One or more of the process steps 501-520 may require performing vacuum and/or fluid processing steps on a substrate to deposit a material on the substrate surface, clean the substrate surface to etch the substrate surface, or The substrate is exposed to some type of radiation to induce a physical or chemical change in one or more regions on the substrate. Typical examples of processes that can be performed are lithography process steps, substrate cleaning process steps, CVD deposition steps, ALD deposition steps, electroplating process steps, or electroless plating process steps. FIG. 1G shows an example of transfer steps that a substrate may follow as it passes through a cluster tool configured like the cluster tool shown in FIG. 1B following the process sequence 500 described in FIG. 1F . In this example, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to the chamber located at the lane position 9C along transfer path _A1 , thus The channeling step 502 can be performed on the substrate. In one embodiment, the channel step 502 must set or leave the substrate so that another robotic arm can pick up the substrate from the channel position 9C. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the third robotic arm assembly 11C following the transfer path _A2 , where the process step 504 is performed on the substrate. After the processing step 504 is completed, the substrate is then transferred to the second processing chamber 532 by the third robotic arm assembly 11C along the transfer path _A3 . After performing the process step 506, the substrate is then transported by the second robotic arm assembly 11B, following the transport path _A4 , to the exchange chamber 533 (FIG. 7A). After performing the process step 508 , the substrate is then transported by the back-end robotic arm assembly 40 , following the transport path A ₅ , to the external process system 536 , where a process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 , following the transfer path A ₆ , to the exchange chamber 533 , where the processing step 512 is performed. In one embodiment, the process steps 508 and 512 must place or leave the substrate so that another robotic arm can pick up the substrate from the exchange chamber 533 . After performing the processing step 512 , the second robotic arm assembly 11B is then used to transfer the substrate along the transfer path A ₇ to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the first robotic arm assembly 11A. After the process step 516 is completed, the first robotic arm assembly 11A follows the transfer path _A9 to transfer the substrate to the channel chamber disposed at the channel position 9A. In one embodiment, the lane step 518 must set or leave the substrate so that another robotic arm can pick up the substrate from the lane location 9A. After the passage step 518 is performed, the substrate is then conveyed by the front end robot assembly 15, following the conveyance path _A10 , to the wafer cassette assembly 105D.

In one embodiment, process steps 504, 506, 510, 514, and 516 are photoresist coating steps, bake/cool steps, exposure steps performed in a stepper/scanner module, post-exposure The baking/cooling step, and the developing step are further described in commonly assigned U.S. Patent Application Serial No. 11/112,281, filed April 22, 2005, which is hereby incorporated by reference herein . The bake/cool step and the post-exposure bake/cool step can be performed within a single process chamber, or an internal robot (not shown) can be used in the bake zone of an integrated bake/cool chamber and cooling zone transmission. While FIGS. 1F-G illustrate examples of process sequences that may be used to process substrates within a cluster tool 10, more or less complex process sequences and/or transfer sequences may be implemented without departing from the invention. basic range.

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed between locations or process chambers within the cluster tool 10 .

Second cluster tool configuration

A. System configuration

2A is a plan view of one embodiment of a cluster tool 10 having a front end robot assembly 15, a back end robot assembly 40, a system controller 101, and four process racks (elements 60 and 80) disposed between Robotic arm assembly 11 (FIGS. 9-11; elements 11A, 11B, 11C, and 11D of FIG. 2A), all adapted to perform at least A form of implementation. The embodiment shown in Figure 2A is identical to the configuration shown in Figures 1A-F, except for the addition of a fourth manipulator assembly 11D and channel location 9D, so the same reference numerals are used where appropriate. The cluster tool configuration approach shown in Figure 2A is advantageous when substrate throughput is limited by the manipulator, as the addition of a fourth manipulator assembly 11D can assist in unburdening the other manipulators and also create some redundancy , which allows the system to process substrates when one or more central robotic arms are inoperable. In one embodiment, the side 60B of the first process rack 60 and the side 80A of the second process rack 80 are all along the sides of each mechanical arm assembly (such as the first mechanical arm assembly 11A, the second mechanical arm assembly 11B, etc.) horizontal movement assembly 90 (Figs. 9A and 12A-C) are arranged in parallel directions.

In one aspect, the first robotic arm assembly 11A is adapted to access and transfer substrates between the process chambers within the first process rack 60 from side 60B. In one aspect, the third robotic arm assembly 11C is adapted to access from side 80A and transfer substrates between the process chambers within the second process rack 80 . In one aspect, the second robotic arm assembly 11B is adapted to access and transfer substrates between the process chambers within the first process rack 60 from side 60B. In one aspect, the fourth robotic arm assembly 11D is adapted to access and transfer substrates between the process chambers within the second process rack 80 from side 80A. In one embodiment, the second robotic arm assembly 11B and the fourth robotic arm assembly 11D are further adapted to access the process chambers in the first process rack 60 from side 60B, and access the second process rack from side 80A. 80 within the process chamber.

FIG. 2B shows a plan view of the embodiment of the cluster tool 10 shown in FIG. 2A with the robot blade 87 of the second robot assembly 11B extending through side 60B into the process chamber in the first process rack 60 . The ability to extend the manipulator blade 87 into and/or retract the manipulator blade 87 from a process chamber is typically moved in concert with the components of the manipulator assembly 11, which are housed in the horizontal Movement component 90 , vertical movement component 95 , and robotic arm hardware component 85 are implemented by using commands from the system controller 101 . As noted above, the second robotic arm assembly 11B and the fourth robotic arm assembly 11D together with the system controller 101 can be adapted to allow for "overlap" between each of the robotic arms in the cluster tool, allowing the system control The controller's logic scheduler prioritizes job and substrate movement based on input from the user and various sensors throughout the cluster tool, and an anti-collision system is also available to allow the robotic arm to optimally way to transport the substrate through the system. Using the system controller 101 to maximize the use of the cluster tool improves the CoO of the cluster tool, makes wafer history more reproducible, and improves system reliability.

B. Transmission program example

FIG. 2C shows an example of a transfer step sequence configured by the cluster tool shown in FIG. 2A that can be used to complete the process sequence described in FIG. 1F. In this example, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to the chamber located at the lane position 9C along transfer path _A1 , thus The channeling step 502 can be performed on the substrate. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the third robotic arm assembly 11C following the transfer path _A2 , where the process step 504 is performed on the substrate. After the process step 504 is completed, the substrate is then transported to the second process chamber 532 by the fourth robotic arm assembly 11D following the transport path _A3 . After performing the process step 506 , the substrate is then transferred to the exchange chamber 533 by the fourth robotic arm assembly 11D along the transfer path A ₄ . After performing the process step 508 , the substrate is then transported by the back-end robotic arm assembly 40 , following the transport path A ₅ , to the external process system 536 , where a process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 along the transfer path A ₆ to the exchange chamber 533 ( FIG. 7A ), where the processing step 512 is performed. After performing the processing step 512 , the fourth robot arm assembly 11D is used to transfer the substrate along the transfer path A ₇ to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the second robotic arm assembly 11B. After the process step 516 is completed, the first robotic arm assembly 11A follows the transfer path _A9 to transfer the substrate to the channel chamber disposed at the channel position 9A. After performing the channeling step 518, the substrate is then transported by the front end robot assembly 15, following the transport path _A10 , to the wafer cassette assembly 105D.

In one embodiment, the transfer path _A7 can be divided into two transfer steps, which may require the fourth robotic arm assembly 11D to pick up the substrate from the exchange chamber 533 and transfer it to the fourth lane Position 9D, where it is then picked up by the second robotic arm assembly 11B and delivered to the process chamber 534 . In one embodiment, each channel chamber can be controlled by any one central manipulator assembly (i.e. the first manipulator assembly 11A, the second manipulator assembly 11B, the third manipulator assembly 11C and the fourth manipulator assembly 11D) access. In another embodiment, the second robotic arm assembly 11B can pick up the substrate from the exchange chamber 533 and transfer it to the process chamber 534 .

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed within the cluster tool 10 .

Third Cluster Tool Configuration

A. System configuration

3A is a plan view of one embodiment of a cluster tool 10 having a front end robot assembly 15, a back end robot assembly 40, a system controller 101, and three Robotic arm assembly 11 (FIGS. 9-11; elements 11A, 11B, and 11C of FIG. 3A), all adapted to perform at least one implementation of a desired substrate processing sequence utilizing each of the processing chambers within the processing rack appearance. The embodiment shown in Figure 3A is identical to the configuration shown in Figures 1A-F, except for the placement of the first robotic arm assembly 11A and channel location 9A on side 60A of the first process rack 60 and the arrangement of the second The three-arm assembly 11C and lane location 9C are provided on side 80B of the second process rack 80 outboard, and therefore the same reference numerals are used where appropriate. An advantage of this cluster tool configuration is that if one of the robotic arms of the central module 25 fails, the system can still use the other two robotic arms to continue processing substrates. This configuration also eliminates, or minimizes, the need for collision avoidance-type control features for the robotic arm to transport the substrate between process chambers mounted within each process rack, since the immediately adjacent placement of the robotic arm is eliminated. entities overlap. Another advantage of this configuration method is that the flexible and modular structure allows the user to configure the number of process chambers, process racks, and process manipulators required to meet the user's desired throughput.

In this configuration, the first robot assembly 11A is adapted to access the process chambers within the first process rack 60 from side 60A, and the third robot assembly 11C is adapted to access the second chamber from side 80B. The process chamber in the process rack 80, and the second robotic arm assembly 11B is adapted to access the process chamber in the first process rack 60 from side 60B, and access the second process chamber from side 80A The process chamber within rack 80. In one embodiment, the side 60B of the first process frame 60 and the side 80A of the second process frame 80 are all along the , the third mechanical arm assembly 11C) and the horizontal moving assembly 90 (described later) are arranged in a parallel direction.

The first manipulator assembly 11A, the second manipulator assembly 11B, and the third manipulator assembly 11C together with the system controller 101 may be adapted to allow for "overlap" between the respective manipulators and to allow for the system controller's A logical scheduler prioritizes job and substrate movement based on input from the user and various sensors throughout the cluster tool. Improving CoO using the cluster tool structure and the cooperation of the system controller 101 to maximize the utilization of the cluster tool can make wafer history more reproducible and improve system reliability.

B. Transmission program example

FIG. 3B shows an example of a sequence of transfer steps through the cluster tool shown in FIG. 3A that may be used to accomplish the process sequence described in FIG. 1F. In this example, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to the chamber located at the lane position 9C along transfer path _A1 , thus The channeling step 502 can be performed on the substrate. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the third robotic arm assembly 11C following the transfer path _A2 , where the process step 504 is performed on the substrate. After the processing step 504 is completed, the substrate is then transferred to the second processing chamber 532 by the third robotic arm assembly 11C along the transfer path _A3 . After performing the process step 506, the substrate is then transported by the second robotic arm assembly 11B, following the transport path _A4 , to the exchange chamber 533 (FIG. 7A). After performing the process step 508 , the substrate is then transported by the back-end robotic arm assembly 40 , following the transport path A ₅ , to the external process system 536 , where a process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 along the transfer path A ₆ to the exchange chamber 533 ( FIG. 7A ), where the processing step 512 is performed. After performing the processing step 512 , the second robotic arm assembly 11B is then used to transfer the substrate along the transfer path A ₇ to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the second robotic arm assembly 11B. After the process step 516 is completed, the first robotic arm assembly 11A follows the transfer path _A9 to transfer the substrate to the channel chamber disposed at the channel position 9A. After performing the channeling step 518, the substrate is then transported by the front end robot assembly 15, following the transport path _A10 , to the wafer cassette assembly 105D.

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed within the cluster tool 10 .

Fourth cluster tool configuration

A. System configuration

Figure 4A is a plan view of one embodiment of a cluster tool 10 having a front end robot assembly 15, a back end robot assembly 40, a system controller 101 and two process racks (elements 60 and 80) disposed around Robotic arm assemblies 11 (FIGS. 9-11; elements 11B, and 11C of FIG. 4A), all adapted to perform at least one aspect of a desired substrate processing sequence utilizing each of the processing chambers within the processing rack . The embodiment shown in FIG. 4A is identical to the configuration shown in FIG. 3A, except for the exclusion of the first robotic arm assembly 11A and lane location 9A on side 60A of the first processing rack 60, so where appropriate Use the same component symbols. An advantage of this system configuration method is that it provides easy access to the chambers installed in the first process rack 60, thus making one or more process chambers installed in the first process rack 60 It is possible to go offline and come online while the cluster tool is still processing the substrate. Another advantage is that the third robot assembly 11C and/or the second process rack 80 can be brought online while the second robot assembly 11B is being used to process a substrate. This configuration also allows process chambers with short chamber process times that are often used in a process sequence to be placed in the second process rack 80 so that they can be operated by the two central robots (i.e. elements 11B and 11C) service, while reducing robotic arm transfer limiting bottlenecks and thus improving system throughput. This configuration also eliminates or minimizes the need for collision avoidance-type control features for the robotic arms to transport the substrate between process chambers mounted within a process rack, since each robotic arm is eliminated from accessing other robotic arms. Physical violation of arm space. Another advantage of this configuration method is that the flexible and modular structure allows the user to configure the number of process chambers, process racks, and process manipulators required to meet the user's desired throughput.

In this configuration, the third robot assembly 11C is adapted to access and transfer substrates between the process chambers within the second process rack 80 from side 80A, while the second robot assembly 11B is adapted to access from side 80A Side 60B accesses and transfers substrates between the process chambers in the first process rack 60 , and transfers substrates between the process chambers in the second process rack 80 from side 80A. In one embodiment, the side 60B of the first process frame 60 and the side 80A of the second process frame 80 are all along the ) The horizontal movement assembly 90 (described later) is arranged in a parallel direction.

As discussed above, the second manipulator assembly 11B and the third manipulator assembly 11C together with the system controller 101 may be adapted to allow the system controller's logical scheduler to Inputs from various sensors within the system prioritize work and substrate movement. Improving CoO using the cluster tool structure and the cooperation of the system controller 101 to maximize the utilization of the cluster tool can make wafer history more reproducible and improve system reliability.

B. Transmission program example

Figure 4B shows an example of a sequence of delivery steps through the cluster tool shown in Figure 4A that may be used to accomplish the process sequence described in Figure 1F. In this embodiment, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to the chamber located at the lane position 9B following transfer path _A1 , thus The channeling step 502 can be performed on the substrate. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the third robotic arm assembly 11C following the transfer path _A2 , where the process step 504 is performed on the substrate. After the processing step 504 is completed, the substrate is then transferred to the second processing chamber 532 by the third robotic arm assembly 11C along the transfer path _A3 . After performing the process step 506, the substrate is then transported by the third robotic arm assembly 11C, following the transport path _A4 , to the exchange chamber 533 (FIG. 7A). After performing the process step 508 , the substrate is then transported by the back-end robotic arm assembly 40 , following the transport path A ₅ , to the external process system 536 , where a process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 along the transfer path A ₆ to the exchange chamber 533 ( FIG. 7A ), where the processing step 512 is performed. After performing the processing step 512 , the second robotic arm assembly 11B is then used to transfer the substrate along the transfer path A ₇ to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the second robotic arm assembly 11B. After the process step 516 is completed, the second robotic arm assembly _11B transfers the substrate to the channel chamber disposed at the channel position 9A along the transport path A9. After performing the channeling step 518, the substrate is then transported by the front end robot assembly 15, following the transport path _A10 , to the wafer cassette assembly 105D.

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed within the cluster tool 10 .

Fifth cluster tool configuration

A. System configuration

Figure 5A is a plan view of one embodiment of a cluster tool 10 having a front end robot assembly 15, a rear end robot assembly 40, a system controller 101 and four robot assemblies arranged around a single process rack (element 60) 11 ( FIGS. 9-11 ; elements 11A, 11B, 11C, and 11D of FIG. 5A ), all adapted to perform at least one aspect of a desired substrate processing sequence utilizing various process chambers within processing rack 60 . The embodiment shown in Figure 5A is similar to the configuration shown above, and therefore the same reference numerals are used where appropriate. This configuration reduces substrate transfer bottlenecks experienced by systems with three or fewer robotic arms, since four robotics that can redundantly access the process chambers mounted within the process rack 60 are used. arm. This configuration is particularly useful in removing robot-bound bottlenecks, which typically occur in a process sequence where the number of process steps is high and the chamber processing time is short.

In this configuration, the first robot assembly 11A and the second robot assembly 11B are adapted to access and transfer substrates between the process chambers within the process rack 60 from side 60A, while the third The robot assembly 11C and the fourth robot assembly 11D are adapted to access from side 60B and transfer substrates between the process chambers within the process rack 60 .

The first robotic arm assembly 11A and the second robotic arm assembly 11B, and the third robotic arm assembly 11C and the fourth robotic arm assembly 11D together with the system controller 101 may be adapted to allow "overlap" between the respective robotic arms. , which allows the system controller's logic scheduler to prioritize jobs and substrate movement based on input from the user and various sensors throughout the cluster tool, and also employs a collision avoidance system, To allow the robotic arm to optimally transport the substrate through the system. Improving CoO using the cluster tool structure and the cooperation of the system controller 101 to maximize the utilization of the cluster tool can make wafer history more reproducible and improve system reliability.

B. Transmission program example

Figure 5B shows an example of a sequence of delivery steps through the cluster tool shown in Figure 5A that may be used to accomplish the process sequence described in Figure 1F. In this example, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to the chamber located at the lane position 9C along transfer path _A1 , thus The channeling step 502 can be performed on the substrate. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the third robotic arm assembly 11C following the transfer path _A2 , where the process step 504 is performed on the substrate. After the process step 504 is completed, the substrate is then transported to the second process chamber 532 by the fourth robotic arm assembly 11D following the transport path _A3 . After performing the process step 506, the substrate is then transported by the fourth robotic arm assembly 11D, following the transport path _A4 , to the exchange chamber 533 (FIG. 7A). After performing the process step 508 , the substrate is then transported by the back-end robotic arm assembly 40 , following the transport path A ₅ , to the external process system 536 , where a process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 along the transfer path A ₆ to the exchange chamber 533 ( FIG. 7A ), where the processing step 512 is performed. After the processing step 512 is performed, the substrate is then transported by the first robotic arm assembly 11A, following the transport path A ₇ , to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the first robotic arm assembly 11A. After the process step 516 is completed, the second robotic arm assembly 11B transfers the substrate along the transfer path A ₉ to the channel chamber disposed at the channel position 9B. After performing the channeling step 518, the substrate is then transported by the front end robot assembly 15, following the transport path _A10 , to the wafer cassette assembly 105D.

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed within the cluster tool 10 .

Sixth cluster tool configuration

A. System configuration

Figure 6A is a plan view of one embodiment of a cluster tool 10 having a front end robot assembly 15, a back end robot assembly 40, a system controller 101 and eight process racks (elements 60 and 80) disposed around Robotic arm assembly 11 (FIGS. 9-11; elements 11A, 11B, 11C, and 11D-11H of FIG. 6A), all adapted to perform at least one of a desired substrate processing sequence utilizing each process chamber within the processing rack Implementation style. The embodiment shown in Figure 6A is similar to the configuration shown above, and thus the same reference numerals are used where appropriate. This configuration reduces substrate transfer bottlenecks experienced by systems with fewer robotic arms by using eight robotic arms that can redundantly access the process chambers housed within the process racks 60 and 80 . This configuration is particularly useful in removing robot-bound bottlenecks, which typically occur in a process sequence where the number of process steps is high and the chamber processing time is short.

In this configuration, the first robotic arm assembly 11A and the second robotic arm assembly 11B are adapted to access the process chambers in the first processing rack 60 from side 60A, while the seventh robotic arm assembly 11G and the eighth robotic arm assembly 11H is adapted to access the process chambers in the second process rack 80 from side 80A. In one embodiment, the third robotic arm assembly 11C and the fourth robotic arm assembly 11D can access the process chambers in the first process rack 60 from side 60B. In an embodiment, the fifth robotic arm assembly 11E and the sixth robotic arm assembly 11F are adapted to access the process chambers in the second process rack 80 from side 80B. In one embodiment, the fourth robotic arm assembly 11D is further adapted to access the process chamber in the second processing rack 80 from side 80B, and the fifth robotic arm assembly 11E is further adapted to access the process chamber from side 60B The process chambers in the first process rack 60 are accessed.

The manipulator assemblies 11A-H together with the system controller 101 can be adapted to allow "overlapping" between the individual manipulators, allowing the system controller's logical scheduler to Inputs from various sensors within the robot prioritize work and substrate movement, and an anti-collision system can also be used to allow the robotic arm to optimally transport substrates through the system. Improving CoO using the cluster tool structure and the cooperation of the system controller 101 to maximize the utilization of the cluster tool can make wafer history more reproducible and improve system reliability.

B. Transmission program example

FIG. 6B shows an example of a first process sequence that may be used to complete the process sequence described in FIG. 1F through the transfer step of the cluster tool shown in FIG. 6A. In this example, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to lane chamber 9F following transfer path _A1 so that it can be placed on the substrate The pipeline step 502 is completed. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the sixth robotic arm assembly 11F following the transfer path _A2 , where the process step 504 is performed on the substrate. After the processing step 504 is completed, the substrate is then transferred to the second processing chamber 532 by the sixth robotic arm assembly 11F following the transfer path _A3 . After performing the process step 506, the substrate is then transported by the sixth robotic arm assembly 11F, following the transport path _A4 , to the exchange chamber 533 (FIG. 7A). After performing the process step 508 , the substrate is then transported by the back-end robotic arm assembly 40 , following the transport path A ₅ , to the external process system 536 , where a process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 along the transfer path A ₆ to the exchange chamber 533 ( FIG. 7A ), where the processing step 512 is performed. After performing the processing step 512 , the fifth robotic arm assembly 11E is then used to transfer the substrate along the transfer path A ₇ to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the fifth robotic arm assembly 11E. After the process step 516 is completed, the fifth robotic arm assembly _11E transports the substrate to the channel chamber disposed at the channel position 9E along the transport path A9. After performing the channeling step 518, the substrate is then transported by the front end robot assembly 15, following the transport path _A10 , to the wafer cassette assembly 105D.

FIG. 6B also shows an example of a second process sequence using a different process chamber within the second process rack 80 having a transfer step performed concurrently with the first sequence. As shown in Figures 1C-D, the first and second processing racks generally contain process chambers (eg, CD1-8, BC1-6 of Fig. 1D). Therefore, in this configuration method, each process sequence can be executed by using any process chamber installed in the process rack. In one example, the second process sequence is the same process sequence as the first process sequence (discussed above), which contains the same transfer steps A ₁ -A ₁₀ , depicted here as A ₁ ′-A ₁₀ ′ , respectively use the seventh and eighth central manipulators (ie, elements 11G-11H) instead of the fifth and sixth central manipulator assemblies (ie, elements 11E-11F), as described above.

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed within the cluster tool 10 .

Seventh cluster tool configuration

A. System configuration

FIG. 6C is a plan view of an embodiment of a cluster tool 10 similar in configuration to that shown in FIG. 6A, except that one of the robot arm assemblies (i.e., robot arm assembly 11D) has been removed to reduce system width while still providing High system throughput. Thus, in this configuration the cluster tool 10 has a front end robot assembly 15, a back end robot assembly 40, a system controller 101 and seven robot assemblies 11 ( FIGS. 9-11; elements 11A-11C, and 11E-11H of FIG. 6C), all are adapted to perform at least one aspect of a desired substrate processing sequence utilizing various process chambers within a processing rack. The embodiment shown in Figure 6C is similar to the configuration shown above, and therefore the same reference numerals are used where appropriate. This configuration reduces substrate transfer bottlenecks experienced by systems with fewer robotic arms by using seven robotic arms that can redundantly access the process chambers housed within the process racks 60 and 80 . This configuration is particularly useful in removing robot-bound bottlenecks, which typically occur in a process sequence where the number of process steps is high and the chamber processing time is short.

In this configuration, the first robotic arm assembly 11A and the second robotic arm assembly 11B are adapted to access the process chambers in the first processing rack 60 from side 60A, while the seventh robotic arm assembly 11G and the eighth robotic arm assembly 11H is adapted to access the process chambers in the second process rack 80 from side 80A. In one embodiment, the third robotic arm assembly 11C and the fifth robotic arm assembly 11E are adapted to access the process chambers in the first process rack 60 from side 60B. In an embodiment, the fifth robotic arm assembly 11E and the sixth robotic arm assembly 11F are adapted to access the process chambers in the second process rack 80 from side 80B.

The manipulator assemblies 11A-11C and 11E-11H together with the system controller 101 can be adapted to allow "overlapping" between the individual manipulators, allowing the system controller's logical scheduler to Inputs from various sensors within the cluster tool prioritize work and substrate movement, and an anti-collision system may also be used to allow robotic arms to optimally transport substrates through the system. Improving CoO using the cluster tool structure and the cooperation of the system controller 101 to maximize the utilization of the cluster tool can make wafer history more reproducible and improve system reliability.

B. Transmission program example

FIG. 6D shows an example of a first process sequence that may be used to complete the process sequence described in FIG. 1F through the transfer step of the cluster tool shown in FIG. 6C. In this example, the substrate is removed from a wafer cassette assembly 105 (item #105D) by the front end robot assembly 15 and transferred to lane chamber 9F following transfer path _A1 so that it can be placed on the substrate The pipeline step 502 is completed. Once the access step 502 is completed, the substrate is then transferred to the first process chamber 531 by the sixth robotic arm assembly 11F following the transfer path _A2 , where the process step 504 is performed on the substrate. After the processing step 504 is completed, the substrate is then transferred to the second processing chamber 532 by the sixth robotic arm assembly 11F following the transfer path _A3 . After performing the process step 506, the substrate is then transported by the sixth robotic arm assembly 11F, following the transport path _A4 , to the exchange chamber 533 (FIG. 7A). After the processing step 508 is performed, the substrate is then transported by the back-end manipulator assembly 40 along the transport path A ₅ to the external process system 536 , where the process step 510 is performed. After the processing step 510 is performed, the substrate is then transferred by the back-end robotic arm assembly 40 along the transfer path A ₆ to the exchange chamber 533 ( FIG. 7A ), where the processing step 512 is performed. After performing the processing step 512 , the fifth robotic arm assembly 11E is then used to transfer the substrate along the transfer path A ₇ to the processing chamber 534 , where the processing step 514 is performed. The substrate is then transported along the transport path A ₈ by the fifth robotic arm assembly 11E. After the process step 516 is completed, the fifth robotic arm assembly _11E transports the substrate to the channel chamber disposed at the channel position 9E along the transport path A9. After performing the channeling step 518, the substrate is then transported by the front end robot assembly 15, following the transport path _A10 , to the wafer cassette assembly 105D.

FIG. 6D also shows an example of a second process sequence using a different process chamber within the second process rack 80 having a transfer step performed concurrently with the first sequence. As shown in Figures 1C-D, the first and second processing racks generally contain process chambers (eg, CD1-8, BC1-6 of Fig. 1D). Therefore, in this configuration method, each process sequence can be executed by using any process chamber installed in the process rack. In one example, the second process sequence is the same process sequence as the first process sequence (discussed above), which contains the same transfer steps A ₁ -A ₁₀ , depicted here as A _{1 ′} -A ₁₀ ′ , respectively use the seventh and eighth central manipulators (ie, elements 11G-11H) instead of the fifth and sixth central manipulator assemblies (ie, elements 11E-11F), as described above.

Furthermore, in one embodiment, the cluster tool 10 is not connected to or communicates with an external process system 536, so the backend robot assembly 40 is not part of the cluster tool configuration, and the transfer steps A5-A6 and process steps 510 will not perform on this substrate. In this configuration, all process steps and transfer steps are performed within the cluster tool 10 .

Rear Arm Assembly

In one embodiment, as shown in FIGS. 1-6, the central module 25 includes a rear manipulator assembly 40 adapted to reside in the outer module 5 and, for example, an exchange chamber 533. Substrates are transferred between the process chambers in the second process rack 80 . Referring to FIG. 1E , in one embodiment, the rear end robotic arm assembly 40 generally comprises a conventional horizontally articulated robotic arm (SCARA) having a single arm/blade 40E. In another embodiment, the back end robot assembly 40 may be a SCARA type robot having two independently controllable arms/blades (not shown) to exchange substrates and / or transfer the substrate. The two independently controllable arm/blade type robots can be advantageous, for example, when the robot has to remove a substrate from a desired location before placing a substrate down at the same location. An exemplary two independently controllable arm/blade type robotic arm is available from Asyst Technologies, Vermont, CA. One embodiment of the cluster tool 10 does not incorporate a rear robot assembly 40, although FIGS. 1-6 illustrate configurations that include the rear robot assembly 40.

FIG. 7A shows an embodiment of an exchange chamber 533 that may be disposed within the support chamber 165 (FIG. ID) of a process rack (eg, components 60, 80). In one embodiment, the exchange chamber 533 is adapted to receive and retain a substrate so that at least two robotic arms within the cluster tool 10 can deposit or pick up a substrate. In one embodiment, the rear robot assembly 40 and at least one robot in the central module 25 are adapted to store and/or receive a substrate from the exchange chamber 533 . The exchange chamber 533 generally includes a substrate support assembly 601 , an enclosure 602 , and at least one access port 603 formed on a sidewall of the enclosure 602 . The substrate support assembly 601 generally has a plurality of support fingers 610 (six shown in FIG. 7A ) with a substrate receiving surface 611 for supporting and retaining a substrate disposed thereon. The enclosure 602 typically has one or more structures enclosing the sidewalls of the substrate support assembly 601 to control the surrounding environment of the substrate while it resides within the exchange chamber 533 . The access port 603 is typically an opening in the side wall of the enclosure 602 that allows access by an external robotic arm to pick up or drop substrates onto the support fingers 610 . In one aspect, the substrate support assembly 601 is adapted to allow substrates to be placed on and removed from the substrate-receiving surface 611 by being adapted to be separated by at least 90 degrees. Two or more robotic arms that access the enclosure 602 at angles.

In one embodiment of the cluster tool 10, as shown in FIG. 7B, the base 40A of the rear manipulator assembly 40 is mounted on a support base 40C connected to a slide rail assembly 40B, so the base 40A may be positioned at any point along the length of slide rail assembly 40B. In this configuration, the backend robot assembly 40 may be adapted to transfer substrates from the first process rack 60 , the second process rack 80 and/or from process chambers within the external module 5 . The slide assembly 40B may generally include a linear ball bearing slide (not shown) and linear actuators (not shown), which are well known in the art, to set the support base 40C and rest thereon. Rear-end robotic arm assembly 40 . The linear actuator may be a drive linear brushless servo motor available from Danaher Motion, Inc. of Wood Dale, Illinois. As shown in FIG. 7B, the slide rail assembly 40B may be oriented in the y direction. In this configuration, in order to avoid collisions with the manipulator assemblies 11A, 11B or 11C, the controller would be adapted to move the slide rail assembly 40B without hitting other central manipulator assemblies (i.e. elements 11A, 11A, 11C). 11B, etc.) move only the rear robot arm assembly 40. In one embodiment, the rear manipulator assembly 40 is mounted on a slide rail assembly 40B, which is configured so that it does not interfere with other central manipulator assemblies.

environmental control

Figure 8A shows an embodiment of a cluster tool 10 having an additional environmental control assembly 110 enclosed within the cluster tool 10 to provide a controlled process environment for each substrate in which a desired process sequence is performed processing steps. Figure 8A shows the configuration of the cluster tool 10 shown in Figure 1A with an environmental enclosure placed over the process chamber. The environmental control assembly 110 generally includes one or more filter units 112, one or more fans (not shown), and an optional cluster tool base 10A. In one aspect, one or more sidewalls 113 are added to the cluster tool 10 to enclose the cluster tool 10 and provide a controlled environment for performing the substrate processing steps. In general, the environmental control assembly 110 is adapted to control air velocity, flow regime (eg, laminar flow or turbulent flow), and the level of particulate contamination within the cluster tool 10 . In one aspect, the environmental control module 110 can also control air temperature, relative humidity, static electricity in the air, and other typical process parameters that can be controlled using ventilation and air conditioning (HVAC) systems compatible with conventional cleanrooms . In operation, the environmental control assembly 110 utilizes a fan (not shown) to introduce air from a source (not shown) or area located external to the cluster tool 10, which then sends the air through a filter 111 and then through the cluster tool 10, and leave the cluster tool 10 through the cluster tool base 10A. In one embodiment, the filter 111 is a high efficiency particulate air (HEPA) filter. The cluster tool base 10A is generally the floor, or bottom area of the cluster tool, which contains slots 10B (FIG. 12A) or allows air pushed through the cluster tool 10 by the fan(s) to exit the cluster tool 10 other pores.

FIG. 8A further illustrates an embodiment of the environmental control assembly 110 having a plurality of different environmental control assemblies 110A-C that provide a controlled process environment in which to perform various substrate treatments of a desired process sequence. step. Each different environmental control assembly 110A-C is provided on each mechanical arm assembly 11 in the central module 25 (such as elements 11A, 11B, etc. in FIGS. 1-6 ) to separately control each mechanical arm assembly Airflow on 11. This configuration is particularly advantageous in the configuration shown in Figures 3A and 4A because the robotic arm assemblies are physically isolated from each other by the process rack. Each of the various environmental control assemblies 110A-C typically includes a filter unit 112, a fan (not shown) and an optional cluster tool base 10A to exhaust controlled air.

Figure 8B shows a cross-sectional view of an environmental control assembly 110 with a single filter unit 112 mounted on the cluster tool 10, and viewed with a cross-sectional plane parallel to the y and z directions. In this configuration, the environmental control assembly 110 has a single filter unit 112, one or more fans (not shown), and a cluster tool base 10A. In this configuration, air is delivered vertically from the environmental control assembly 110 into the cluster tool 10 (element A), around the process racks 60, 80 and robotic arm assemblies 11A-C, and out of the cluster tool base 10A . In one embodiment, the side wall 113 is suitable for enclosing and forming a process area in the cluster tool 10, so the process environment around the process chambers in the process racks 60, 80 can be determined by the process environment. The air control delivered by the environmental control assembly 110 .

FIG. 8C shows a cross-sectional view of an environmental control assembly 110 having a plurality of different environmental control assemblies 110A-C mounted on the cluster tool 10 and viewed with a section plane parallel to the y and z directions ( See Figure 1A). In this configuration, the environmental control assembly 110 includes a cluster tool base 10A, three environmental control assemblies 110A-C, a first process rack 60 that extends to the lower surface 114 of the environmental control assemblies 110A-C or above, and a second process rack 80 extending to or above the lower surface 114 of the environmental control assemblies 110A-C. Generally, each of the three environmental control assemblies 110A-C includes one or more fans (not shown) and a filter 111 . In this configuration, air is conveyed vertically from each of the environmental control assemblies 110A-C into the cluster tool 10 (see element A), between the process racks 60, 80 and the robotic arm assemblies 11A-C, and out of the cluster tool 10. The cluster tool base 10A. In one embodiment, the side wall 113 is suitable for enclosing and forming a process area in the cluster tool 10, so the process environment around the process chambers in the process racks 60, 80 can be determined by the process environment. The air control delivered by the environmental control assembly 110 .

In another embodiment, the cluster tool 10 is placed in a clean room environment that is adapted to convey low particulate air through the cluster tool 10 at a desired velocity and out of the cluster tool base 10A. In this configuration, the environmental control component 110 is generally not required and therefore not used. Controlling the properties of the air and the environment surrounding the process chambers retained within the cluster tool 10 is an important factor in the control and/or minimization of particulate accumulation, which can cause component yield issues due to particulate contamination.

Robotic Arm Components

In general, the various embodiments of the cluster tool 10 described herein are advantageous over prior art configurations because the reduced size of the robotic arm assembly (eg, element 11 of FIG. 9A ) results in a reduced cluster tool footprint, as well as minimized A robot design in which a robot arm enters the space occupied by other cluster tool components (eg, robot arms, process chambers) during the process of transferring substrates. Reduced entity violations avoid collisions between the robotic arm and other components. While reducing the cluster tool footprint, embodiments of the robotic arm described herein also have particular advantages in that the number of axes that need to be controlled to perform transfer actions is reduced. This aspect of implementation is important because it improves the reliability of the robotic arm assembly and thus the reliability of the cluster tool. The importance of this aspect of implementation is clearer by noting that the reliability of a system is directly proportional to the product of the reliability of each component in the system. So a robotic arm with three 99% uptime actuators is always better than four 99% uptime actuators, because each has three 99% uptime actuators The system is up 97.03% of the time, while the four actuators each have 99% up time are 96.06%.

Embodiments of the cluster tool 10 described herein also have advantages over prior art configurations by reducing the number of channel chambers (eg, elements 9A-C of FIG. 1B ) required to transport substrates through the cluster tool. Prior art cluster tool configurations typically have two or more channel chambers installed in the process sequence, or have temporary substrate retention stations, so that the cluster tool robot can be positioned at the one or more channels during the process sequence. A robot arm centrally located between process chambers and another robot arm centrally located between one or more other process chambers transfers substrates. The process of sequentially placing substrates in multiple lane chambers that do not perform subsequent process steps wastes time, reduces the availability of the robotic arm(s), wastes space within the cluster tool, and increases the (etc.) ) loss of the mechanical arm. The increase in channel steps also has a negative impact on component yield due to the increased number of times substrates are changed hands, which increases the amount of particulate contamination on the backside. Furthermore, substrate processing sequences that contain multiple pass steps will naturally have different substrate wafer histories unless the time each substrate spends in the pass chamber is controlled. Controlling the time in the channel chamber adds system complexity by adding a process variable and likely compromising the maximum achievable substrate throughput. Aspects of the present invention, as described herein, avoid the difficulties of these prior art configurations because the cluster tool configuration typically only has the capability to perform a process before performing a process on the substrate and after all process steps have been completed on the substrate. The access steps (eg, steps 502 and 518 of FIG. 1F ), therefore typically have little or no impact on the substrate wafer history, and do not significantly increase the substrate transfer time of the process sequence, because removing channel steps between the process steps.

In the case of system throughput limited by robotic arms, the maximum substrate throughput of the cluster tool is governed by the total number of robotic arms moved to complete the process sequence and the time required to move the robotic arms. The time required for a robot to complete a desired movement is typically limited by the robot hardware, distance between process chambers, substrate cleanliness considerations, and system control limitations. Generally, the movement time of the robot arm does not change greatly due to the different types of the robot arm, and it is quite consistent in the industry. Therefore, a cluster tool that can complete a process with fewer robotic arm movements will have a higher system throughput than a cluster tool that requires more movement to complete a process, such as a cluster tool with multiple lane steps.

Cartesian Arm Configuration

FIG. 9A shows an embodiment of a robotic arm assembly 11 that may be used as one or more robotic arm assemblies 11 such as elements 11A-H shown in FIGS. 1-6. The robotic arm assembly 11 generally includes a robotic arm hardware assembly 85 , one or more vertical robotic arm assemblies 95 and one or more horizontal robotic arm assemblies 90 . The system can thus be utilized to place substrates at any desired x, y, and z position within the cluster tool 10 by the coordinated movement of the robotic arm hardware assembly 85, vertical robotic arm assembly 95, and horizontal robotic arm assembly 90. Instructions communicated by the controller 101.

The robot hardware assembly 85 generally includes one or more transfer robot assemblies 86 adapted to place, transfer and place one or more substrates using commands communicated from the system controller 101 . In one embodiment, the transfer robot assembly 86 shown in FIGS. 9-11 is adapted to transfer substrates on a horizontal plane, such as a plane including the X and Y directions shown in FIG. 11A, because each transfer robot assembly 86 Movement of components. In one aspect, the transfer robot assembly 86 is adapted to transfer substrates in a plane generally parallel to the substrate support surface 87C ( FIG. 10C ) of the robot blade 87 . Figure 10A shows an embodiment of the robot hardware assembly 85 that includes a single transfer robot assembly 86 adapted to transfer substrates. Figure 10B shows an embodiment of the robot hardware assembly 85 that includes two transfer robot assemblies 86 positioned in opposite directions from each other so that the robot blades 87A-B (and the first coupling member 310A-310B) are placed a short distance apart. The configuration shown in Figure 10B, or an "up/down" robot blade configuration, can be advantageous, for example, when it is desired to remove a substrate from a process chamber before placing another substrate to be processed in the same process chamber. When removing a substrate in the middle, without moving the robotic arm hardware assembly 85 out of its home position to move the "removed" substrate to another chamber (ie, "swap" the substrate). In another aspect, this configuration may allow the robot to fill all of the robot blades and then transfer the substrates in groups of two or more to the desired location in the tool . The process of grouping substrates into groups of two or more can help improve the substrate throughput of the cluster tool by reducing the amount of robotic arm movement required to transport the substrates. Although the transfer robot assembly 86 depicted in FIGS. 10A-B is a two-bar linkage robot 305 type robot (FIG. 10C), this configuration is not intended to limit the embodiments that may be discussed herein. The orientation and type of manipulator components used together. In general, an embodiment of a robot hardware assembly 85 with two transfer robot assemblies 86, such as that shown in FIG. The discussion of the single transfer robot assembly 86 is also intended to describe the components of the dual robot assembly implementation(s).

An advantage of the cluster tool and robot configuration shown in FIGS. 9-11 is to minimize the size of the area surrounding a transfer robot assembly 86 in which the robot parts and substrates are free to move without interfering with Other cluster tool components outside the robot arm assembly 11 collide. The area in which the robot arm and substrate can move freely is called the "transfer area" (element 91 of FIG. 11C). The transfer area 91 can generally be defined as the space (x, y and z directions) where a robot arm can move freely without colliding with other cluster tool components when a substrate is left on the blade. Although the transfer area can be described as a space, generally the most important implementation aspect of the transfer area is the horizontal area (x and y directions) that the transfer area occupies, as it directly affects the cluster tool footprint and CoO. The horizontal area of the transfer area is an important factor in defining the footprint of the cluster tool, because the smaller the horizontal components of the transfer area, the smaller the individual robotic arm assemblies (e.g., elements 11A, 11B, 11C of FIGS. 1-6) etc.) can be closer to each other or the robot arm can be closer to the process rack. One factor in defining the size of the transfer area is the need to identify that the transfer area is large enough to reduce or avoid a robotic arm entity encroaching on the space occupied by other cluster tool components. The embodiment described herein is superior to the prior art in that it orients the mechanical arm assembly 86 components retract along the transport direction (x-direction) of the horizontal movement assembly 90 way in the transfer zone.

Referring to FIG. 11J, the horizontal area can generally be divided into two parts, a width "W ₁ " (y-direction) and a length "L" (x-direction). Embodiments described herein have further advantages in that the reduced width "W ₁ " of the clearance area around the robot arm ensures that the robot arm can reliably place substrates within a process chamber. This can be understood by noting that conventional SCARA manipulators (eg, item CR in FIG. 11K ) generally have arms (eg, item A ₁ ) extending a distance from the center of the arm (eg, item C) when retracted. The reduced width “W ₁ ” has the advantage over conventional multi-link horizontally articulated robotic arm (SCARA) type robotic arms which increase the relative distance of said robotic arms from each other (ie width “W ₂ ”), Because the area around the arm must be clear so that the arm component can be oriented rotationally without interfering with other cluster tool components (eg, other arms, process rack components). Conventional SCARA-style robotic arm arrangements are also more complex than some of the embodiments described herein because they also have more axes to control to orient and place the substrate within a process chamber. Referring to FIG. 11J, in one embodiment, the width _W1 of the transfer region 91 is about 5% to about 50% larger than the dimension of the substrate (ie, substrate "S" in FIG. 11J). In an example where the substrate is a 300 mm semiconductor wafer, the width W ₁ of the transfer region would be between about 315 mm and about 450 mm, and preferably between about 320 mm and about 360 mm. Referring to FIG. 1B, in one example, for a 300 mm substrate processing tool, the distance between side 60B of the first process rack 60 and side 80A of the second process rack 80 may be about 945 mm (eg 315%). In another example, for a 300 mm substrate processing tool, the distance between side 60B of the first processing rack 60 and side 80A of the second processing rack 80 may be about 1350 mm (eg, 450%). It should be noted that the transfer area is generally intended to describe the area around the robot arm in which the robot arm can move until it moves to the process sequence once its blades have been retracted after picking up a substrate in a desired position up to the start position (SP) outside the next process chamber in the

Double-rod linkage robotic arm assembly

Figures 10A and 10C illustrate an embodiment of a transfer manipulator assembly 86 of the type two-bar link manipulator 305, which generally includes a support plate 321, a first link member 310, a manipulator blade 87, a transmission system 312 (Fig. 10C), an enclosure 313 and a motor 320. In this configuration, the transfer robot assembly 86 is coupled to the vertical movement assembly 95 via the support plate 321 coupled to the vertical actuator assembly 560 (FIG. 13A). Figure 10C shows a cross-sectional view of one embodiment of the transfer robot assembly 86 of the dual link robot 305 type. The transmission system 312 of the dual-link robotic arm 305 generally includes one or more power transmitting elements (power transmitting elements), which are adapted to move the robotic arm blades 87 by movement of the power transmitting elements, such as by motors. 320 rotations. In general, the transmission system 312 may contain conventional gears, pulleys, etc., which are adapted to transmit rotational or transfer motion from one element to the next. The term "gear" as used herein is generally intended to describe a component that is rotatably connected to a second component by belts, teeth, or other typical means, and is adapted to transfer from one component to another. Generally, a gear, as used herein, may be a conventional gear-type device or a pulley-type device, which may include, but is not limited to, for example, a spur gear, a bevel gear, a rack ( rack) and/or pinion, worm gear, timing pulley, and v-belt pulley. In one embodiment, the transmission system 312 , as shown in FIG. 10C , includes a first pulley system 355 and a second pulley system 361 . The first pulley system 355 has a first pulley 358 connected to the motor 320, a second pulley 356 connected to the first connecting member 310, and a belt 359 connecting the first pulley 358 and the second pulley 356, Therefore, the motor 320 can drive the first connecting member 310 . In one aspect, the plurality of bearings 356A are adapted to allow the second pulley 356 to rotate about the axis V ₁ of the third pulley 354 .

The second pulley system 361 has a third pulley 354 connected to the support plate 321, a fourth pulley 352 connected to the blade 87, and a belt 362 connecting the third pulley 354 and the fourth pulley 352, so the first Rotation of the coupling member 310 causes the blade 87 to rotate about the bearing axis 353 connected to the first coupling member 310 (pivot V ₂ in FIG. 11A ). When conveying a substrate, the motor drives the first pulley 358, which causes the second pulley 356 and first connecting member 310 to rotate, which in turn causes the first connecting member 310 and belt 362 to rotate around a stationary Angular rotation of the third pulley 354 rotates the fourth pulley 352 . In one embodiment, the motor 320 and system controller 101 are adapted to form a closed-loop control system that allows the angular position of the motor 320 and all components connected thereto to be controlled. In one embodiment, the motor 320 is a stepper motor or a DC servo motor.

In one embodiment, the transmission ratio (such as diameter ratio, gear tooth number ratio) of the first pulley system 355 and the second pulley system 361 can be designed to achieve the desired path (element _P1 in the 11C or 11D ) shape and decomposition, will move along the path when the substrate is placed by a transfer robot assembly 86. The transmission ratio will then be defined as the ratio of the size of the driving element to the size of the element being driven, or in this case, for example, the number of teeth of the third pulley 354 relative to the number of teeth of the fourth pulley 352 . Thus, for example, when the first coupling member 310 rotates 270 degrees, it causes the blade 87 to rotate 180 degrees, which equates to a 0.667 gear ratio or a 3:2 gear ratio. The term gear ratio is intended to mean that the _D1 revolution of the first gear results in the _D2 revolution of the second gear, or the _D1 : _D2 ratio. Thus, a 3:2 ratio means that three revolutions of the first gear will cause two revolutions of the second gear, so the size of the first gear must be about two-thirds the size of the second gear. In one embodiment, the gear ratio of the third pulley 354 to the fourth pulley 352 is between about 3:1 and about 4:3, preferably between about 2:1 and about 3:2.

FIG. 10E shows another embodiment of a transfer manipulator assembly 86 of the type of a dual link manipulator 305, which generally includes a support plate 321, a first connecting member 310, a manipulator blade 87, and a transmission system 312. (Fig. 10E), an enclosure 313, a motor 320 and a second motor 371. The embodiment shown in Figure 10E is similar to the embodiment shown in Figure 10C, except that in this configuration the rotational position of the third pulley 354 can be adjusted using the second motor 371 and instructions from the controller 101 outside. Since Figures 10C and 10E are similar, the same element numbers will be used for clarity. In this configuration, the transfer robot assembly 86 is connected to the vertical movement assembly 95 via the support plate 321 connected to the vertical actuator assembly 560 (FIG. 13A). Figure 10E shows a side cross-sectional view of the transfer robot assembly 86 of the dual link robot 305 model. The transmission system 312 of the biaxially linked manipulator 305 generally includes two power transmission elements adapted to use the movement of the motor 320 and/or the second motor 371 to move the manipulator blade 87 . In general, the drive system 312 may include gears, pulleys, etc. that are adapted to transmit rotational or transfer motion from one element to the next. In one embodiment, the transmission system 312 includes a first pulley system 355 and a second pulley system 361 . The first pulley system 355 has a first pulley 358 connected to the motor 320, a second pulley 356 connected to the first connecting member 310, and a belt 359 connecting the first pulley 358 and the second pulley 356, Therefore, the motor 320 can drive the first connecting member 310 . In one aspect, the plurality of bearings 356A are adapted to allow the second pulley 356 to rotate about the axis V ₁ of the third pulley 354 . In one embodiment, not shown in Figure 10E, the bearing 356A is mounted on a feature formed on the support plate 321 instead of the third pulley 354 as shown in Figure 10E superior.

The second pulley system 361 has a third pulley 354 connected to the second motor, a fourth pulley 352 connected to the blade 87, and a belt 362 connecting the third pulley 354 and the fourth pulley 352, so the first Rotation of the coupling member 310 causes the blade 87 to rotate about the bearing axis 353 connected to the first coupling member 310 (pivot V ₂ in FIG. 11A ). The second motor 371 is installed on the support plate 321 . When conveying a substrate, the motor 320 drives the first pulley 358, which causes the second pulley 356 and the first connecting member 310 to rotate, which in turn causes the first connecting member 310 and the belt 362 to rotate around the Angular rotation of the third pulley 354 rotates the fourth pulley 352 . In this configuration, relative to the configuration shown in FIG. 10C, the third pulley can rotate when the motor 320 rotates the first coupling member 310, which causes the third pulley 354 and the fourth pulley 352 to The gear ratio between them can be changed by adjusting the relative movement between the third pulley 354 and the fourth pulley 352. It will be noted that the gear ratio affects the movement of the manipulator blade 87 relative to the first coupling member 310 . In this configuration, the gear ratio is not determined by the size of the gears and can be changed during different phases of the robot blade transfer motion to achieve the desired robot blade transfer path (see Figure 11D). In one embodiment, the motor 320, the second motor 371 and the system controller 101 are adapted to form a closed loop control system that allows the angular position of the motor 320, the angular position of the second motor 371 and the All components can be controlled. In one embodiment, the motor 320 and the second motor 371 are stepper motors or DC servo motors.

FIGS. 11A-D illustrate plan views of one embodiment of a robot assembly 11 that uses a dual-bar linkage robot 305 configuration to transfer and place substrates in a second process chamber 532 that resides within the cluster tool 10. in the expected position. The dual-link robotic arm 305 generally includes a motor 320 (FIGS. 10A-C), a first coupling member 310, and a robotic arm blade 87 that are connected such that rotation of the motor 320 causes the first Linkage member 310 rotates, which in turn causes the robot blade 87 to rotate and/or translate along a desired path. The advantage of this configuration method is that the robot arm transfers a substrate to the desired position in the cluster tool, and the component of the robot arm does not extend into the current occupied by another robot arm or system component, or will Capabilities within the occupied space.

11A-C illustrate the movement of a transfer robot assembly 86 housed within a robot hardware assembly 85 by, in real-time (eg, corresponding to FIGS. 11A-C , respectively) T ₀ -T ₂ ) show several successive images of the position of each transfer robot arm assembly 86 component. Referring to Fig. 11A, at time _T0 , the transfer robot arm assembly 86 is generally placed in a desired vertical orientation (z direction) using the vertical movement assembly 95 components, and the horizontal movement assembly 90 components Set in a desired horizontal direction (x-direction). The position of the manipulator at _T0 , shown in Figure 11A, will be referred to herein as the starting position (item SP). Referring to FIG. 11B, at time _T1 , the first linkage member 310 in the dual-link robotic arm 305 is rotated about pivot point V1, thereby causing the coupled robotic arm blade 87 to pivot about a pivot point _V1 . The pivot point V ₂ is shifted and rotated, while the position of the transfer robot arm assembly 86 in the x direction is adjusted using the components of the horizontal movement assembly 90 and the system controller 101 . Referring to FIG. 11C, at time _T2 , the manipulator blade 87 extends in the y-direction from the centerline _C1 of the transfer area 91 by an expected distance (element _Y1 ), and is positioned at an expected x-direction position (element X ₁ ) to place the substrate in the desired final position (item FP), or a handover position of the process chamber 532 . Once the robot arm has positioned the substrate in the final position, the substrate can then be transferred to the process chamber substrate containment component, such as a lifter or other substrate support component (eg, item 11A Figure 532A). After transferring the substrate onto the process chamber housing component, the robot blade can then be retracted following the steps described above but in reverse order.

FIG. 11C further shows an example of a possible path (item P ₁ ) of the substrate center point as it moves from the initial position to the final position, as shown in FIGS. 11A-C above. In an embodiment of the present invention, the shape of the path can be changed by adjusting the rotational position of the first coupling member 310 relative to the position of the transfer robot arm assembly 86 along the x direction using the horizontal movement assembly 90 . This feature is advantageous because the shape of the curve can be specifically adapted to allow a robotic blade 87 to access the process chamber without colliding with or violating other mechanical components such as the respective process chamber substrate containing components (e.g., element 532A). The transfer area 91 of the arm. This advantage becomes particularly apparent when a process chamber is configured to be accessed from a number of different directions, or orientations, thereby limiting the locations of the substrate-containing components that can be used to reliably support a substrate. and orientation and avoid collisions between the manipulator blade 87 and the substrate containing components.

FIG. 11D shows some examples of possible paths P ₁ -P ₃ that may be used to transport substrates into desired locations within the process chamber 532 . The paths P ₁ -P ₃ shown in Figures 11D-F are intended to illustrate the movement of the substrate center point, or the center point of the substrate support area of the robot arm blade 87, as it is assembled by the robot arm assembly 11 when setting. The substrate transfer path _P2 shown in FIG. 11D shows the path of a substrate when the transfer ratio of the second pulley system 361 of a transfer robot arm assembly 86 is 2:1. Because the movement of the substrate is linear when using a 2:1 gear ratio, this configuration eliminates the need to translate the robot hardware assembly 85 in the X direction as the robot blade 87 extends in the Y direction. The reduced movement complexity benefits of this configuration can in some cases be designed so as not to interfere with the reliability of the robot blade 87 as the substrate is conveyed into the process chamber from various sides of the process chamber. The base material accommodates component effects.

11E-11F illustrate the multi-stage transfer movement of a substrate into the process chamber 532 . In one embodiment, the multi-stage transfer movement is divided into three transfer paths (paths P ₁ -P ₃ ) that can be used to transfer the substrate into the process chamber 532 ( FIG. 11E ) or out of the process chamber ( FIG. 11E ). Figure 11F). This configuration is particularly useful in reducing the high accelerations experienced by the substrate and robot assembly 11 during the transfer process, and also reduces the robot movement complexity by using as much as possible single axis control during the transfer process. Spend. The high accelerations experienced by the robot arm can generate vibrations in the robot arm assembly, which can affect the positional accuracy of the transfer process, the reliability of the robot arm assembly, and possibly the positioning of the substrate on the robot arm blades. move. It is believed that one cause of the high acceleration experienced by the robotic arm assembly 11 arises when using coordinated motions. The term "coordinated movement" as used herein is intended to describe the simultaneous movement of two or more axes (e.g., transfer robot assembly 86, horizontal movement assembly 90, vertical movement assembly 95) to move a substrate from one point to the next. a little.

FIG. 11E shows a multi-stage transfer movement of three transfer paths for transferring a substrate onto a substrate-containing component 532A within the process chamber 532 . Before performing the multi-stage transfer movement process, the transfer robot arm assembly 86 is generally placed in the starting position (SP of FIG. to a desired vertical orientation (z direction), and use the horizontal movement assembly 90 to move components to a desired horizontal position (x direction). In one aspect, once the substrate is at the starting position, the substrate is then moved along path P1 using the transfer robot assembly 86, the horizontal movement assembly 90, and the system controller ₁₀₁ . Move to this final position (FP). In another embodiment, the substrate is arranged along the path _P1 with a reduced number of control axes, for example only one control axis. For example, a single axis of control may be achieved by controlling the transfer robot assembly 86 in communication with the controller 101 to move the robot blade, and thus the substrate. In this configuration, the use of a single axis greatly simplifies the control of the movement of the substrate or robotic arm and reduces the time required to move from the starting point to the intermediate position. The next step in this multi-stage transfer movement process is to move the component in the z direction using the vertical movement assembly 95, or vertically move the substrate containing component using a substrate containing component actuator (not shown). assembly to transfer the substrate onto the process chamber substrate containment component, such as a lift or other substrate support component (eg, element 532A of FIG. 11A ). In one aspect, as shown in FIGS. 11E and 11F , the transfer robot assembly 86 is adapted to transfer the substrate W in a plane parallel to the X and Y directions, as shown by paths P1 and P3 .

After delivering the substrate to the process chamber to accommodate components, the robot blades may then be retracted following paths _P2 and _P3 . The path P ₂ , in some cases, may require coordinated movement between the transfer robot assembly 86 and the horizontal translation assembly 90 to ensure that the robot blade 87 does not collide when retracting from the process chamber 532 to the substrate support component 532A. In one embodiment, as shown in Figure 11E, the path _P2 , which describes the movement of the center point of the substrate support area of the robot blade 87, is a linear path extending from the final position (FP) to some intermediate point (IP) between the final position and the end point (EP) position. Generally, the intermediate point is the point at which the robot blade has retracted far enough so that it does not come into contact with any chamber components when moving to the end position in a simplified or accelerated motion along path _P3 . In one aspect, once the robot blade is at the intermediate point, the substrate is moved along path _P3 using the transfer robot assembly 86, the horizontal movement assembly 90, and the system controller 101 to that endpoint. In one aspect, the substrate is positioned at the end point (EP) using only one control axis, such as by movement of the transfer robot assembly 86 in communication with the controller 101 . In this configuration method, the use of a single axis greatly simplifies movement control and reduces the time required to move from the intermediate point (IP) to the end point (EP) position.

FIG. 11F shows a multi-stage transfer movement of three transfer paths for removing a substrate from the substrate-containing component 532A within the process chamber 532 . Before performing the multi-stage transfer movement process, shown in Figure 11F, the transfer robot arm assembly 86 is generally placed in the initial position (SP of Figure 11F), which may require the use of the vertical movement assembly 95 The component moves the substrate to a desired vertical orientation (z-direction) and the component moves to a desired horizontal position (x-direction) using the horizontal movement assembly 90 . In one aspect, once the substrate is at the starting position, the substrate is then moved along path P1 using the transfer robot assembly 86, the horizontal movement assembly 90, and the system controller ₁₀₁ . Move to that intermediate location (IP). Generally, the intermediate point is the point at which the arm blade has been extended far enough so that it does not come into contact with any chamber components when moved to the intermediate point in a simplified or accelerated motion along path _P1 . In another embodiment, the substrate is positioned along path _P1 with a reduced number of control axes. For example, a single axis of control may be achieved by controlling the transfer robot assembly 86 in communication with the controller 101 to move the robot blade, and thus the substrate. In this configuration, the use of a single axis greatly simplifies the control of the movement of the substrate or robotic arm and reduces the time required to move from the starting point to the intermediate position.

After transferring the substrate to the intermediate position, the robot blade can further extend into the chamber along the path _P2 . The path P ₂ , in some cases, may require coordinated movement between the transfer robot assembly 86 and the horizontal translation assembly 90 to ensure that the robot blades 87 do not collide as they extend into the process chamber 532 The substrate support component 532A. In one aspect, as shown in Figure 11F, the path _P2 , which describes the movement of the center point of the substrate support area of the robot blade 87, is a linear path extending from the intermediate point (IP) to this final position (FP). After the robot blade has been placed in the final position, the transfer robot assembly 86 is then moved in the z direction using the vertical movement assembly 95, or vertically using a substrate containing component actuator (not shown). Moving the substrate containment component 532A removes the substrate from the process chamber substrate containment component 532A.

After removing the substrate from the process chamber containing components, the robotic arm blade can be retracted following path _P3 . The path P ₃ may, in some cases, require coordinated movement between the transfer robot assembly 86 and the horizontal translation assembly 90 . In one aspect, the substrate is positioned at the end point (EP) using only one control axis, such as by movement of the transfer robot assembly 86 in communication with the controller 101 . In this configuration method, the use of a single axis greatly simplifies movement control and reduces the time required to move from the final position (FP) to the end point (EP) position. In one embodiment, as shown in Figure 11F, the path _P3 , which describes the movement of the center point of the substrate support area of the robot blade 87, is a non-linear path from the final position (FP) Extended to certain endpoints (EP).

Single-axis robotic arm assembly

Figures 10D and 11G-I illustrate another embodiment of a robot assembly 11 in which the transfer robot assembly 86A is configured as a single axis link 306 (FIG. 10D) to transfer and place substrates while remaining in the The desired location of the second process chamber 532 within the cluster tool 10 . The single-axis linkage 306 generally includes a motor 320 (FIG. 10D) and a robot blade 87 that are connected such that rotation of the motor 320 causes the robot blade 87 to rotate. The advantage of this configuration is the ability of the robotic arm to transport a substrate to a desired location within the cluster tool with only a single axis that is less complex and more cost-effective to control the blade 87 while also reducing the mechanical The opportunity for an arm component to extend into a space that may be occupied by another robotic arm during this transfer process.

FIG. 10D shows a side cross-sectional view of a uniaxial linkage 306 generally containing a motor 320 , a support plate 321 and a robotic arm blade 87 connected to the motor 320 . In one embodiment, as shown in FIG. 10D , the arm blade 87 is connected to a first pulley assembly 355 . The first pulley assembly 355 has a first pulley 358 connected to the motor 320 , a second pulley 356 connected to the arm blade 87 , and a belt 359 connected to the first pulley 358 and the second pulley 356 . In this configuration, the second pulley 356 is mounted on the pivot 364 connected to the support plate 321 through the bearing 354A, so that the motor 320 can rotate the blade of the robot arm. In one embodiment of the single-axis link 306, the blade 87 of the robotic arm is directly connected to the motor 320, so as to reduce the number of components of the robotic arm, reduce the cost and complexity of the robotic arm assembly, and reduce maintenance of the second arm. 355 components required in a pulley system. The single axis link 306 may be advantageous because of the simplified motion control system, and thus improved robotic arm and system reliability.

11G-J are plan views of a single-axis link 306 type transfer robot assembly 86 showing the movement of the single-axis link 306 by, in real-time (e.g., object T ₀ -T ₂ ) show several successive images of the positions of the various transfer robot arm assembly 86 components. Referring to Fig. 11G, at time _T0 , the transfer robot arm assembly 86 is generally placed in a desired vertical orientation (z direction) using the vertical movement assembly 95 components, and the horizontal movement assembly 90 components Set in a desired horizontal direction (x-direction). The position of the manipulator at _T0 , shown in Figure 11C, will be referred to herein as the starting position (item SP discussed above). Referring to FIG. 11H, at time _T1 , the robot blade 87 rotates about the pivot point _V1 , thereby causing the robot blade 87 to rotate, while the position of the transfer robot assembly 86 in the x direction is determined by The system controller 101 to adjust. Referring to FIG. 11I, at time _T2 , the robotic arm blade 87 has rotated to a desired angle, and the robotic arm assembly has been placed at a desired x-direction position, so the substrate is in the process chamber 532 On the expected final position (object FP) within, or on the handover position. FIG. 11D , discussed above, also shows some examples of possible paths P ₁ -P ₃ that may be used to transport substrates into desired locations in the process chamber 532 using the uniaxial link 306 . After transferring the substrate onto the process chamber housing component, the robot blade can then be retracted following the steps described above but in reverse order.

Move components horizontally

FIG. 12A shows a cross-sectional view of an embodiment of the horizontal movement assembly 90 along a plane parallel to the y-direction. FIG. 12B is a side sectional view of an embodiment of the manipulator assembly 11 that has been centrally cut to length of the horizontal movement assembly 90 . The horizontal movement assembly 90 generally includes an enclosure 460 , an actuator assembly 443 and an elongated mount 451 . The actuator assembly 443 typically includes at least one horizontal linear slide assembly 468 and a moving assembly 442 . The vertical moving assembly 95 is connected with the horizontal moving assembly 90 through the elongated mounting base 451 . The elongated mounting base 451 is a structural member supporting various loads created when the horizontal moving assembly 90 sets the vertical moving assembly 95 . The horizontal movement assembly 90 generally includes two horizontal linear slide assemblies 468, each of which has a linear track 455, a bearing block 458, and a support mount 452 that supports the elongated mount 451 and the vertical movement assembly 95 the weight of. This configuration thus provides for smooth and accurate transfer of the vertical movement assembly 95 along the length of the horizontal movement assembly 90 . The linear track 455 and the bearing blocks 458 may be linear ball bearing slides or conventional linear guides, which are well known in the art.

Referring to Figures 12A-B, the moving assembly 442 generally includes an elongated mount 451, a horizontal arm actuator 367 (Figures 10A and 12A), a drive belt 440, and two or more drive belt pulleys 454A , which is adapted to control the position of the vertical movement assembly 95 along the length of the horizontal movement assembly 90. Generally speaking, the drive belt 440 is connected (eg, glued, latched, or clamped) to the elongated mount 451 to form a continuous loop extending along the length of the horizontal movement assembly 90 , and The ends are supported by the two or more drive belt pulleys 454A. Figure 12B shows a configuration with four drive belt pulleys 454A. In one embodiment, the horizontal arm actuator 367 is connected to one of the drive belt pulleys 454A such that rotational movement of the pulley 454A causes the drive belt 440 and elongated mount connected to the vertical movement assembly 95 to 451 moves along the horizontal linear slide assembly 468. In one embodiment, the horizontal robotic arm actuator 367 is a direct drive linear brushless servo motor adapted to move the robotic arm relative to the horizontal linear slide assembly 468 .

The enclosure 460 generally includes a base 464 , one or more outer walls 463 and an enclosure roof 462 . The enclosure 460 is suitable for covering and supporting components in the horizontal moving assembly 90 for safety and pollution reduction. Because particles are generated by mechanical parts that rotate, slide, or come into contact with each other, it is important to ensure that the components within the horizontal movement assembly 90 do not contaminate substrate surfaces as the substrates are conveyed through the cluster tool 10 . The enclosure 460 thus forms an enclosed region that minimizes the chances of particles generated within the enclosure 460 reaching the surface of the substrate. Particulate contamination has a direct impact on component yield and therefore the CoO of the cluster tool.

The enclosure top plate 462 has a plurality of slits 471 , which enable the plurality of support mounts 452 of the horizontal linear slide assembly 468 to extend through the enclosure top plate 462 and connect with the elongate mounts 451 . In one embodiment, the width of the slit 471 (the dimension of the opening in the y-direction) is tailored to minimize the chance of particles reaching the outside of the horizontal moving assembly 90 .

The base 464 of the enclosure 460 is a structural member designed to support the loads created by the weight of the elongated mount 451 and vertical movement assembly 95, as well as the loads created by the movement of the vertical movement assembly 95 . In one embodiment, the base 464 further includes a plurality of base slits 464A, which are arranged along the length of the horizontal moving assembly 90 to allow the air entering the slits 471 of the enclosed top plate 462 to pass through the slits 464A. The base slot 464A exits the enclosure and then exits the slot 10B formed in the cluster tool base 10A. In one embodiment of the cluster tool 10, the cluster tool base 10A is not used, so the horizontal translation assembly 90 and process rack may be placed on the floor of the area in which the cluster tool 10 is installed. In one aspect, the base 464 is positioned on the cluster tool base 10A, or floor, using the enclosure supports 461 to provide unrestricted and consistent air flow through the horizontal movement assembly 90. flow path. In an embodiment, the enclosure support 461 may also be suitable as a known shock absorber. Airflow generated by the environmental control assembly 110 or clean room environment through the enclosure 460 in one direction, preferably downward, can help reduce the chances of particles generated within the enclosure 460 reaching substrate surfaces. In one embodiment, the slit 471 and the base slit 464A formed in the enclosure top plate 462 are configured to limit the amount of air flowing out of the environmental control assembly 110 so that A pressure drop of at least 0.1"wg is achieved between the exterior of the capping plate 462 and the interior region of the enclosure 460. In one embodiment, the central region of the enclosure 460 is formed to move this region from the horizontal using the inner wall 465 The rest of the assembly is isolated.The addition of an inner wall 465 minimizes air recirculation into the enclosure 460 and acts as an airflow directing feature.

Referring to FIGS. 12A and 13A , in one embodiment of the enclosure 460 , the drive belt is positioned to form a small gap between the drive belt 440 and the drive belt slot 472 formed in the enclosure top plate 462 . This configuration may be advantageous in order to avoid particles generated within the enclosure 40 from reaching outside the enclosure 460 .

Referring to FIG. 12C, in another embodiment of the enclosure 460, a fan unit 481 may be attached to the base 464 and adapted to flow from the enclosure through a base slot 464A formed in the base 464. Seal 460 draws air inside. In another aspect, the fan unit 481 forces particulate-laden air through a filter 482 to remove particulates before it exits through the cluster tool base 10A or floor (see item A). In this configuration, a fan 483, housed in the fan unit, is designed to create a negative pressure within the enclosure 460, so that air outside the enclosure is drawn into the enclosure, confining the enclosure. Possibility of escape of particulates generated within enclosure 460 . In one embodiment, the filter 482 is a HEPA type filter or other type of filter that removes generated particulates from the air. In one aspect, the length and width of the slit 471 and the size of the fan 483 are selected such that the pressure drop generated between a point outside the enclosure 460 and a point inside the enclosure 460 is moderate. Between about 0.02 inches of water (~5 Pa) and about 1 inch of water (~250 Pa).

In an embodiment of the horizontal moving assembly 90 , a protective belt 479 is provided to cover the slit 471 to prevent particles generated inside the horizontal moving assembly 90 from reaching the substrate. In this arrangement, the protective belt 479 forms a continuous loop extending along the length of the horizontal movement assembly 90 and is disposed within the slot 471 so that a gap is formed between the protective belt 479 and the enclosure top plate 462. The open area is as small as possible. Generally, the guard strap 479 is connected (eg, glued, latched, or clamped) to the support mount 452 to form a continuous loop extending along the length of the horizontal movement assembly 90 and The ends are supported by the two or more drive belt pulleys (not shown). In the configuration shown in FIG. 12C , the guard strap 479 is attachable to the support mount 452 (not shown) at the level of the slot 471 and passes through a channel 478 made in the base 464. The horizontal moving assembly 90 goes around to form a continuous loop. The protective belt(s) 479 thus surround the inner region of the horizontal movement assembly 90 .

Move components vertically

One embodiment of the vertical movement assembly 95 is shown in Figures 13A-B. Figure 13A is a plan view of the vertical movement assembly 95 showing various implementations of the design. The vertical movement assembly 95 generally includes a vertical support 570 , a vertical actuator assembly 560 , a fan assembly 580 , a support plate 321 , and a vertical enclosure 590 . The vertical support 570 is generally a structural member that is bolted, welded, or mounted on the elongated mount 451 and is adapted to support various components within the vertical movement assembly 95 .

The fan assembly 580 generally includes a fan 582 and a tube 581 forming a solid area 584 in fluid communication with the fan 582 . The fan 582 is generally an element adapted to move air using some mechanical means, such as rotating fan blades, moving bellows, moving partitions, or moving high-precision mechanical gears. The fan 582 is adapted to create a negative pressure in the inner area 586 of the enclosure 590 relative to the outer portion of the enclosure 590 by creating a negative pressure in the solid area 584, which is combined with the plurality of slits formed on the tube 581 585 is in fluid communication with the interior region 586 . In one aspect, the number, size and distribution of the slots 585 , which may be circular, oval or rectangular, are designed to draw air evenly from all areas of the vertical movement assembly 95 . In one embodiment, the interior area 586 may also be adapted to accommodate a plurality of cables (not shown) for communicating signals between components of the various manipulator hardware components 85 and vertical movement components 95 and with the system controller 101. out). In one aspect, the fan 582 is adapted to convey air exhausted from the interior region 586 into the central region 430 of the horizontal movement assembly 90 where it passes through the base slot 464A from the horizontal movement assembly. 90 discharge.

The vertical actuator assembly 560 generally includes a vertical motor 507 ( FIGS. 12A and 13B ), a pulley assembly 576 ( FIG. 13B ), and a vertical rail assembly 577 . The vertical slide assembly 577 generally includes a linear track 574 and a bearing block 573 that connects to the vertical support 570 and the moving block 572 of the pulley assembly 576 . The vertical slide rail assembly 577 is adapted to guide and provide smooth and accurate transfer of the manipulator hardware assembly 85 and also support the weight and loads created by movement of the manipulator hardware assembly 85 along the length of the vertical movement assembly 95 . The linear track 574 and the bearing blocks 573 may be linear ball bearing slides, precision shaft slide systems, or conventional linear slides, which are well known in the art. Typical linear roller bearing slides, precision shaft slide systems, or conventional linear slides are available from SKF USA or the Daedal Division of Parker Hannifin Corporation of Irwin, Pennsylvania.

Referring to Figures 13A and 13B, the pulley assembly 576 generally includes a drive belt 571, a moving block 572, and two or more pulleys 575 (e.g., elements 575A and 575B) rotatably connected to the vertical support 570 and vertical motor 507 , so that a support plate (eg, elements 321A-321B of FIG. 13B ), and thus the robotic arm hardware assembly 85, can be disposed along the length of the vertical movement assembly 95. Generally, the drive belt 571 is connected (eg, glued, latched, or clamped) to the moving block 572 to form a continuous loop extending along the length of the vertical moving assembly 95 and at the end of the vertical moving assembly 95 is supported by the two or more drive belt pulleys 575 (eg elements 575A and 575B). Figure 13B shows a configuration with two drive belt pulleys 575A-B. In one aspect, the vertical motor 507 is connected to the drive belt pulley 575B such that rotational movement of the pulley 575B causes the drive belt 571 and the support plate(s), and thus the arm hardware assembly 85, along The vertical linear slide assembly 577 moves. In one embodiment, the vertical motor 507 is a direct drive linear brushless servo motor adapted to move the arm hardware assembly 85 relative to the vertical rail assembly 577, thus eliminating the need for the drive belt 571 and two or A plurality of pulleys 575.

The vertical enclosure 590 generally includes one or more outer walls 591 and an enclosure top 592 (FIG. 9A) and slots 593 (FIGS. 9A, 12A and 13A). The vertical enclosure 590 is suitable for covering components in the vertical moving assembly 95 for safety and pollution reduction. In one embodiment, the vertical enclosure 590 is connected to and supported by the vertical support 570 . Because particles are generated by mechanical parts that rotate, slide, or come into contact with each other, it is important to ensure that the components within the vertical movement assembly 95 do not contaminate the substrate surface as the substrate is conveyed through the cluster tool 10 . The enclosure 590 thus forms an enclosed region that minimizes the chances of particles generated within the enclosure 590 reaching the surface of the substrate. Particulate contamination has a direct impact on component yield and therefore the CoO of the cluster tool. Thus, in one aspect, the size (i.e., length and width) of the slot 593 and/or the size (e.g., flow rate) of the fan 582 are configured to minimize the number of particles that can escape from the vertical movement assembly 95 change. In one embodiment, the length (Z-direction) and width (X-direction) of the slot 593 and the size of the fan 582 are selected such that a point outside the outer wall 591 and the inner region 586 create a The pressure drop is between about 0.02 inch water column (~5 Pa) and about 1 inch water column (~250 Pa). In one aspect, the width of the slot 593 is between about 0.25 inches and about 6 inches.

Embodiments described herein are generally superior to prior art designs in that they are adapted to lift the robotic arm components with components that must fold, nest, or retract within themselves to achieve their lowest vertical position. The issue arises because the lowest position of the robotic arm is limited by the size and orientation of the vertically moving components that must fold, nest, or retract within itself due to interference with the vertically moving components. The position of this prior art vertically moving component when it cannot be retracted any further is often referred to as the "dead space" or "solid height" because this lowest arm position is limited by the stated Fact that retracts the limitation of item height. Generally speaking, the embodiments described herein avoid this problem because the bottom of the one or more transfer robot arm assemblies 86 is not supported by the components in the vertical movement assembly 95 below, so the lowest position is only It is limited by the length of the linear track 574 and the size of the mechanical arm hardware assembly 85 components. In one embodiment, as shown in FIGS. 13A-13B , the manipulator assembly is supported by a support plate 321 mounted on the vertical rail assembly 577 in a cantilever manner. It should be noted that the component configurations of the support plate 321 and the arm hardware assembly 85 shown in Sections 10C-10E are not intended to limit the scope of the invention described herein, since the support plate 321 and the arm hardware The orientation of assembly 85 may be adjusted to achieve a desired structural stiffness, and/or a desired vertical trajectory for vertically moving assembly 95 .

The embodiment of the vertical movement assembly 95 described herein is also superior to prior art vertical movement designs, such as those that must fold, nest, or retract within themselves, due to movement of the arm hardware assembly 85 due to movement along a Improved precision and/or accuracy due to forced movement of the vertical slide assembly 577. Therefore, in one embodiment of the present invention, the movement of the robotic arm hardware assembly is always guided by a rigid member (such as the vertical slide rail assembly 577), which provides the structural rigidity and positional accuracy of the component, when it While moving along the length of the vertical movement assembly 95.

Dual horizontal moving component configuration method

FIG. 14A shows an embodiment of the manipulator assembly 11 using two horizontal translation assemblies 90 that may be used as one or more of the manipulator arm assemblies 11A-H shown in FIGS. 1-6 above. In this configuration, the manipulator assembly 11 generally includes a manipulator hardware assembly 85, a vertical movement assembly 95, and two horizontal manipulator assemblies 90 (eg, elements 90A and 90B). A substrate can thus be positioned at any desired x, y position using the coordinated movement of the robotic arm hardware assembly 85, vertical robotic arm assembly 95, and horizontal robotic arm assembly 90A-B and commands from the system controller 101. and z position. An advantage of this configuration is that during the dynamic movement of the vertical movement assembly 95 along the conveying direction (x-direction), the rigidity of the structure of the robot arm assembly 11 can be increased, allowing higher accelerations during movement and thus improved Substrate transfer time.

In one embodiment, the components of the vertical movement assembly 95 , the upper horizontal movement assembly 90B and the lower horizontal movement assembly 90A contain the same basic components as those discussed above, and thus the same reference numerals are used where appropriate. In one embodiment, the vertical movement assembly 95 is connected to the lower elongated mount 451A and the upper elongated mount 451B along the x-direction using the movement assembly 442 that resides in each of the horizontal movement assemblies 90A and 90B. set up. In another embodiment of the mechanical arm assembly 11, a single moving assembly 442 is installed on one of the horizontal moving assemblies (such as element 90A), while the other horizontal moving assembly (such as element 90B) functions only as a support to guide one end of the vertical movement assembly 95.

Substrate grouping

In an effort to be more competitive in the market and thus the need to reduce cost of ownership, electronic component manufacturers typically spend a great deal of time trying to optimize process schedules and chamber process times within the known constraints of cluster tool structures and Maximum substrate throughput possible at chamber process times. In process sequences with short chamber process times and a large number of process steps, a large portion of the time for processing a substrate is taken up by the process of transporting the substrate between the various process chambers of a cluster tool. In one embodiment of the cluster tool 10, the CoO is reduced by grouping substrates and transporting and processing the substrates in groups of two or more. Such parallel processing thus increases system throughput and reduces the movement a robotic arm must make to transfer a batch of substrates between the process chambers, thus reducing wear on the robotic arm and increasing system reliability.

In one embodiment of the cluster tool 10, the front manipulator assembly 15, the manipulator assembly 11 (eg elements 11A, 11B, etc. of FIGS. 1-6 ) and/or the rear manipulator assembly 40 may Suitable for conveying substrates in groups of two or more to improve system throughput by processing said substrates in parallel. For example, in one aspect, the robotic arm hardware assembly 85 has a plurality of independently controllable transfer robotic arm assemblies 86A and 86B (FIG. 10B) for picking up one or more The substrate is then transferred and placed within a plurality of subsequent processing chambers. In another aspect, each transfer robot assembly 86 (eg, 86A or 86B) is adapted to pick up, transfer, and drop multiple substrates separately. In this case, for example, a robotic hardware assembly 85 having two transfer robotic arm assemblies 86 may be adapted to use a first blade 87A to pick up substrate "W" from a first process chamber and then move it to a second process chamber A substrate can be picked up by the second blade 87B, so the two substrates can be transferred and put down in a group.

In one embodiment of the robot assembly 11, as shown in FIG. 15A, the robot hardware assembly 85 comprises two robot hardware assemblies 85 (e.g., elements 85A and 85B) having at least one transfer robot assembly 86, which are separated by a desired distance or height (element A), and adapted to simultaneously pick up or drop down substrates from two different process chambers. The distance between the two robot arm hardware assemblies 85, or the height difference A, can be configured to correspond to the interval between the two process chambers installed in the process rack, so that the robot arm assembly 11 can simultaneously The two process chambers are accessed. This configuration is particularly advantageous in improving substrate throughput and cluster tool reliability due to the ability to transfer two or more substrates in groups.

Robotic arm blade hardware configuration method

Figures 16A-16D illustrate an embodiment of a robotic blade assembly 900 that may be used with certain embodiments described herein to support and retain a substrate "W" as it is conveyed by a robotic arm assembly 10 hours through the cluster tool. In one embodiment, the manipulator blade assembly 900 may be adapted to replace the blade 87 and thus be compatible with the described blade shown in FIGS. 10A-10E at the connection point (element CP) formed on the blade base 901. The first pulley system 355 or the second pulley system 361 are connected by components. The robotic blade assembly 900 of the present invention is adapted to grip, "grab," or restrain a substrate "W" so that the acceleration experienced by the substrate during the transfer process does not displace the substrate from the robotic blade assembly. 900 to a known location. Movement of the substrate during the transfer process can generate particles that reduce the substrate positioning accuracy and repeatability of the robotic arm. In the worst case, the acceleration would cause the substrate to fall off the robot blade assembly 900 .

The acceleration experienced by the substrate can be divided into three parts: a horizontal radial acceleration part, a horizontal axial acceleration part and a vertical acceleration part. The acceleration experienced by the substrate occurs when the substrate is accelerated or decelerated in the X, Y and Z directions during movement of the substrate through the cluster tool 10 . Referring to Fig. 16A, the horizontal radial acceleration component and the horizontal axial acceleration component are shown as forces _FA and _FR , respectively. The force experienced is related to the mass of the substrate times the substrate acceleration minus any friction created between the substrate and the manipulator blade assembly 900 components. In the embodiments described above, this radial acceleration typically occurs as the substrate is rotated into position by a transfer robot assembly 86 and can act in either direction (ie, +Y or -Y). The axial acceleration typically occurs when the substrate is positioned in the X direction by movement of the horizontal movement assembly 90 and/or the transfer robot assembly 86, and can act in either direction (i.e., +X or -X direction) . The vertical acceleration typically occurs when the substrate is positioned in the z direction by the vertical movement assembly 95, and can act in either direction (ie, +Z or -Z direction) or when the cantilever beam induces vibrations in the structure.

FIG. 16A is a schematic plan view of one embodiment of the robot blade assembly 900, which is adapted to support the substrate "W". The blade assembly 900 of the mechanical arm generally includes a blade base 901, an actuator 910, a brake mechanism 920, a position sensor 930, a clamp assembly 905, and one or more reaction members 908 (for example, a ), and one or more substrate support components 909. The clamp assembly 905 generally includes a clamp plate 906 and one or more contact members 907 (ie, two contact members shown in FIG. 16A ) mounted on the clamp plate 906 . The clamping plate 906, contact member 907, reaction member 908, and blade base 901 can be made of metal (such as aluminum, nickel-coated aluminum, SST), ceramic materials (such as silicon carbide), or materials that can reliably withstand the mechanical arm. The blade assembly 900 is made of a plastic material that experiences an acceleration (eg, 10-30 m/s ² ) during the transfer process and does not generate or attract particles due to interaction with the substrate. FIG. 16B is a schematic side cross-sectional view of the manipulator blade assembly 900 shown in FIG. 16A , which has been cut through the center of the manipulator blade assembly 900 . For the sake of simplicity, the component corners (such as the contact member 907 ) are arranged behind the section plane of FIG. 16B , but the brake assembly 930 remains in this figure.

Referring to Figures 16A and 16B, in use the substrate "W" is pressed against the reaction by the gripping force (F ₁ ) delivered to the substrate "W" by the actuator 910 through the contact member 907 of the clamp assembly 905 The retention surface 908B of the member 908 . In one aspect, the contact member 907 is adapted to contact and force the edge "E" of the substrate "W" against the retention surface 908B. In one aspect, the gripping force may be between about 0.01 and about 3 kilogram force (kgf). In one embodiment, as shown in FIG. 16A, the contact members 907 are intended to be spaced at an angular distance "A" to provide axial and radial support of the substrate as it is moved by the robotic arm assembly. 11 when sending.

The process of constraining the substrate so that it can be reliably transported through the cluster tool 10 using the robotic blade assembly 900 typically requires three steps to complete. It should be noted that one or more of the steps described below may be performed simultaneously or sequentially without departing from the basic scope of the invention as described herein. Before starting the process of picking up a substrate, the clamp assembly 905 is retracted in the +X direction (not shown). This first step begins when a substrate is drawn from a substrate support component (e.g., element 532A of FIGS. 11A-11I, channel positions 9A-H of FIGS. Residing on the reaction member 908 and on the substrate support surfaces 908A and 909A on the substrate support component 909 . Next, the clamp assembly 905 is moved in the X direction until the substrate is delivered to the gripping force "W" by the actuator 910 through the contact member 907 and the reaction member 908 of the clamp assembly 905 to the substrate (F ₁ ) is limited to the arm blade assembly 900 . In a final step, the detent mechanism 920 holds, or "locks," the clamp assembly 905 in place to prevent acceleration of the substrate during the transfer process from significantly altering the gripping force (F ₁ ), thus allowing the substrate to move relative to the support surface. After the brake mechanism 920 restrains the clamp assembly 905 , the substrate can be transferred to another point of the cluster tool 10 . To place the substrate on a substrate support component, the above steps may be performed in reverse order.

In an embodiment of the robotic arm blade assembly 900, the brake mechanism 920 is adapted to limit the movement of the clamp assembly 905 in at least one direction (eg, +X direction) during transfer. The ability to constrain movement of the jaw assembly 905 in the direction opposite to the gripping force (F ₁ ) supplied by the jaw assembly 905 prevents the horizontal axial acceleration(s) from significantly reducing the gripping force, thereby allowing the Substrates may move, which may generate particulates, or fall from the blade assembly 900 during transport. In another embodiment, the braking mechanism 920 is adapted to limit the movement of the clamp assembly 905 in at least two directions (eg, +X and −X directions). In this configuration, the ability to constrain movement of the jaw assembly in a direction parallel to the direction of the gripping force (F ₁ ) prevents the horizontal axial acceleration(s) from causing a significant increase in the gripping force, which could cause a substantial increase in the gripping force. The material is damaged or chipped, or significantly reduced, which may generate particles or allow the substrate to fall. In yet another embodiment, the braking mechanism 905 is adapted to constrain all six degrees of freedom of the clamp assembly 905 to avoid, or minimize, movement of the substrate. The ability to restrict movement of the jaw assembly 905 in a desired direction may be accomplished using components adapted to restrict movement of the jaw assembly 905 . Typical components that may be used to restrict movement of the clamp assembly 905 include conventional latch mechanisms (eg, latch-type mechanisms), or other similar devices. In one aspect, movement of the clamp assembly 905 is limited by a mechanism that supplies a limiting force (element _F2 of FIG. 16A), such as the opposing brake assembly 920A discussed above.

In one embodiment, a position sensor 930 is used to sense the position of the clamping plate 906 so that the controller 101 can determine the status of the blade assembly 900 at any point during the transfer. In one embodiment, the position sensor 930 is adapted to sense that no substrate is disposed on the blade assembly 900, or that the substrate has been misaligned on the support surface (elements 908A and 909A), by noting The clamping plate 906 moves too far in the −X direction because of the distance between the position of the clamping plate 906 and the force transmitted by the actuator 910 . Likewise, the position sensor 930 and controller 101 may be adapted to sense the presence of a substrate by noting that the position of the clamping plate 906 is within an acceptable range of positions corresponding to the presence of a substrate. In one embodiment, the position sensor 930 is composed of a plurality of optical position sensors placed on desired points, a linear differential transformer (LVDT) or a The position of other comparable position sensing devices.

Figure 16C schematically illustrates a plan view of one embodiment of a blade assembly (element 900A) having an opposite brake assembly 920A replacing the schematic representation of brake mechanism 920 of Figure 16A. The opposing detent assembly 920A is adapted to restrain the clamping plate 906 in position during substrate transfer. The embodiment shown in Figure 16C is similar to the configuration shown in Figures 16A-B, except for the addition of the opposing detent assembly 920A, actuator assembly 910A, and support components, so for simplicity, the The same element symbols are used where appropriate. Embodiments of the manipulator blade assembly 900A generally include a blade base 901, an actuator assembly 910A, an opposing detent mechanism 920A, a position sensor 930, a clamp assembly 905, a reaction member 908, and a Substrate support component 909 . In one embodiment, the clamping plate 906 is mounted on a linear slide (not shown) connected to the blade base 901 to align and constrain the clamping plate 906 in a desired direction (eg, X direction) movement.

In one embodiment, the actuator assembly 910A includes an actuator 911, an actuator connecting rod 911A, a connecting member 912, a slide rail assembly 914, a connecting member 915, and the connecting member 912 A connecting plate 916 connected to and connected to the clamping plate 906 through the connecting member 915 . The joint member 912 may be a conventional joint or "floating joint" commonly used to join various motion control components together. In one embodiment, the connecting plate 916 is directly connected to the actuator connecting rod 911A of the actuator 911 . The slide assembly 914 may be a conventional linear slide assembly, or a ball bearing slide, which is connected to the link plate 916 to align and guide the movement of the link plate and thus the clamping plate 906 . The actuator 911 is adapted to set the clamping plate 906 by moving the connecting rod 911A, connecting member 912 , connecting member 915 , and connecting plate 916 . In one embodiment, the actuator 911 is an air cylinder, a linear motor or other comparable devices and force transmission devices.

In one embodiment, the opposing brake assembly 920A includes an actuator 921 connected to the blade base 901 and coupled to a brake contact member 922 . In this configuration, the opposing detent assembly 921A is adapted to "lock," or restrain, the clamping plate 906 from a restraining force _F2 derived from the opposing detent assembly 920A. In one embodiment, the limiting force F ₂ is formed by friction formed between the connecting plate 916 and the brake contact member 922 when the actuator 921 forces (element F ₃ ) the brake contact member 922 When leaning against the connecting plate 916. In this configuration, the slide rail assembly 914 is designed to accept a side load generated by the braking force F ₃ delivered by the actuator 921 . The resulting restraining force F ₃ holding the clamping plate 906 in position is equal to the braking force multiplied by the static friction created between the braking contact member 922 and the connecting plate 916 . The size of the actuator 921, and the selection of brake contact member 922 and the web 916 material and surface treatment can be optimized to ensure that the resulting restraining force is always greater than that generated during the acceleration of the substrate during transport. Any force is great. In one aspect, the resulting restraining force _F2 is in the range of about 0.5 and about 3.5 kilogram force (kgf). In one embodiment, the braking contact member 922 can be made of rubber or polymer materials, such as polyurethane, ethylene-propylene rubber (EPDM), natural rubber or other suitable polymer materials, and the connection Plate 916 is made of aluminum alloy or stainless steel alloy. In one embodiment, the linkage rod 911A of the actuator is directly coupled to the clamping plate 906, and the brake contact member 922 of the opposing brake assembly 920A is adapted to contact the linkage rod 911A or the clamping plate to Avoid its movement.

Figure 16D schematically illustrates a plan view of an embodiment of the blade assembly 900A having a different configuration of the reverse detent assembly 920A than that shown in Figure 16C. In this configuration, the reverse brake assembly 920A includes a lever arm 923 connected to the brake contact member 922 at one end, the actuator 921 at the other end of the lever arm, and Pivot point "P" somewhere in between. In one aspect, the pivot point is connected to the blade base 901 and is adapted to support the lever arm 923 and feed from the actuator 921 when the braking contact member 922 is pressed against the connecting plate 916 . Force F ₄ to the lever arm 923 . In this configuration, by strategically placing the pivot point "P", the lever arm 923 can be utilized to create a mechanical advantage that can be used to supply more force than is possible directly with the actuator 921 to create component contact. The attained force is the braking force F ₃ and thus the limiting force F ₂ .

FIG. 16D also shows an embodiment of the blade assembly 900A that includes a compliant member 917 disposed between the clamping plate 906 and connecting member 915 to help sense the presence or absence of a substrate on the blade assembly 900A. The compliant member typically adds an additional degree of freedom in conjunction with the setup sensor 930 and controller 101 to sense the presence or absence of the substrate on the blade assembly 900A once the restraining force F ₂ has been applied to the attachment plate 916 . If no other degrees of freedom exist in the blade assembly 900A, the limiting force _F2 that prevents or inhibits movement of the clamping plate 906 would thus be undetectable by the position sensor 930 and controller 101 before or during substrate transfer. Movement or loss of substrate.

Therefore, in one embodiment, the actuator assembly 910 generally includes an actuator 911, an actuator linkage 911A, a connecting member 912, a slide rail assembly 914, a connecting member 915, a compliance member 917 , a clamping plate slide rail assembly 918 , and a connecting plate 916 connected to the connecting member 912 and connected to the clamping plate 906 through the connecting member 915 and the compliance member 917 . The clamp plate slide assembly 918 is typically a conventional linear slide assembly, or ball bearing slide, which is coupled to the clamp plate 906 to align and guide its movement.

The compliant member 917 is generally an elastic component, such as a spring, flexure or other similar device, which can transmit sufficient force to release the potential energy generated by its flexion during the application of the gripping force _F1 , so as to be in the base. Moving the clamp plate 906 by an amount easily measurable by the position sensor 930 when the material moves or "strays". In one aspect, the compliant member 917 is a spring with a spring rate low enough that it can achieve a "firm height" when applying the gripping force _F1 to the substrate. In another aspect, the connecting member 915, compliant member 917, and clamping plate 906 are designed such that when the gripping force _F1 is applied, the connecting member 915 contacts the clamping plate 906, or The bottom contact is on the clamp plate. An advantage of these types of configurations is that they avoid changes in the gripping force _F1 during transport, since the compliant member 917 cannot flex further due to the acceleration experienced by the substrate during transport, which reduces the resulting particle count and avoid loss of the substrate.

The following steps are intended to show an example of how the compliant member 917 may be used to sense the presence of the substrate on the blade assembly 900A after applying the restraining force F ₂ to the connection plate 916 . In the first step, the actuator 911 applies the gripping force _F1 to the substrate through the contact member 907 and the reaction member 908 within the clamp assembly 905, which deflects the compliant member 917 allowing the The amount by which the gap "G" between the connecting member 915 and the clamping plate 906 is reduced. The controller 101 then checks to confirm that the clamping plate 906 is in an acceptable position by monitoring and noting the information received from the position sensor 930 . Once the substrate is sensed, and thus at the intended location on the blade assembly 900A, the restraining force _F2 is applied to the web 916 to restrain it in a direction parallel to the direction of the gripping force ( _F1 ) of the mobile. Then if the substrate moves, and/or becomes "un-gripped", the potential energy generated within the compliant member 917, due to the deflection during application of the gripping force F ₁ , will cause the clamp The nipper 906 moves away from the restrained connection plate 916 , which is then sensed by the position sensor 930 and the controller 101 . Movement of the clamping plate 906 registered by the position sensor 930 will cause the controller 101 to stop the transfer process or prevent the transfer process from occurring, which can help avoid damage to the substrate and system.

While the foregoing is directed to embodiments of the present invention, other and further embodiments of the present invention can be devised without departing from the essential scope thereof, which is defined by the appended claims.

Claims (87)

1. cluster tool of handling a base material, it comprises at least:

One first processing procedure frame, contain:

One first group of two or more process chamber that vertically stack; And

One second group of two or more process chamber that vertically stack, wherein two or more substrate process chambers of this first and second group have one first side of arranging along a first direction;

One first mechanical arm assembly is suitable for transmitting the substrate process chamber of a base material to this first processing procedure frame, and wherein this first mechanical arm assembly comprises:

One first mechanical arm, have a mechanical arm blade and a position base material receiving surface thereon, wherein this first mechanical arm defines a transit area, and be suitable for a base material is arranged on one or more aspect that is contained in usually in one first plane, wherein this first plane and this first direction and parallel with the vertical second direction of this first direction;

One first moving assembly is suitable for this first mechanical arm is arranged on vertical with this first plane usually third direction; And

One second moving assembly is suitable for this first mechanical arm is arranged on parallel with this first direction usually direction;

Wherein when this base material is set on the base material receiving surface of this mechanical arm blade, the width of this transit area parallel with this second direction and than the substrate sizes of this second direction about 5% to about 50%.

2. cluster tool as claimed in claim 1, wherein above-mentioned mechanical arm assembly more comprises:

One second mechanical arm has the mechanical arm blade that has a base material receiving surface, and wherein this second mechanical arm is suitable for a base material is arranged on one or more aspect that is contained in usually in one second plane, and wherein this first plane and this second plane separate a segment distance.

3. cluster tool as claimed in claim 1, the first wherein above-mentioned moving assembly more comprises:

One actuator assemblies is suitable for vertically being provided with this first mechanical arm, and wherein this actuator assemblies more comprises:

One vertical actuator is suitable for vertically being provided with this first mechanical arm; And

One vertical slide rail is suitable for guiding this first mechanical arm when it is transferred by this vertical actuator;

One seals, and has an interior zone, and it is the spare part that is selected from a group that is made up of this vertical actuator and this vertical slide rail around at least one; And

One fan, with this interior zone fluid communication, it is to be suitable for sealing the inner negative pressure that produces at this.

4. cluster tool as claimed in claim 1, wherein above-mentioned cluster tool more comprises:

One second processing procedure frame, contain:

One first group of two or more process chamber that vertically stack; And

One second group of two or more process chamber that vertically stack, wherein two or more substrate process chambers of this first and second group have one first side of arranging along a first direction;

One second mechanical arm assembly is suitable for transmitting the substrate process chamber of a base material to this second processing procedure frame, and wherein this second mechanical arm assembly comprises:

One second mechanical arm, have one second a mechanical arm blade and a position base material receiving surface thereon, wherein this second mechanical arm defines a transit area, and be suitable for a base material is arranged on one or more aspect that is contained in usually in one second plane, wherein this second plane and this first direction and parallel with the vertical second direction of this first direction;

One first moving assembly has an actuator assemblies, is suitable for this second mechanical arm is arranged on vertical with this second plane usually third direction; And

One second moving assembly has an actuator assemblies, is suitable for this second mechanical arm is arranged on parallel with this first direction usually direction;

Wherein when this base material is set on the base material receiving surface of this second mechanical arm blade, the width of this second transit area parallel with this second direction and than the substrate sizes of this second direction about 5% to about 50%.

5. cluster tool as claimed in claim 4, wherein above-mentioned cluster tool more comprises:

One three-mechanical arm assembly is suitable for transmitting the substrate process chamber of a base material to this first processing procedure frame and this second processing procedure frame, and wherein this three-mechanical arm assembly comprises:

One three-mechanical arm, have a three-mechanical arm blade and a position base material receiving surface thereon, wherein this three-mechanical arm defines a transit area, and be suitable for a base material is arranged on one or more aspect that is contained in usually in one the 3rd plane, wherein the 3rd plane and this first direction and parallel with the vertical second direction of this first direction;

One first moving assembly has an actuator assemblies, is suitable for this second mechanical arm is arranged on vertical with the 3rd plane usually third direction; And

One second moving assembly has an actuator assemblies, is suitable for this second mechanical arm is arranged on parallel with this first direction usually direction;

Wherein when this base material is set on the base material receiving surface of this three-mechanical arm blade, the width of the 3rd transit area parallel with this second direction and than the substrate sizes of this second direction about 5% to about 50%.

6. cluster tool of handling a base material, it comprises at least:

One first processing procedure frame, it contains two or more group with two or more substrate process chambers of vertically stacking, wherein these two or more substrate process chambers of two or more group have one first side of arranging along a first direction, to pass through the described substrate process chamber of this side access;

One second processing procedure frame, it contains two or more group with two or more substrate process chambers of vertically stacking, wherein these two or more substrate process chambers of two or more group have one first side of arranging along a first direction, to pass through the described substrate process chamber of this side access;

One first mechanical arm assembly is arranged between this first processing procedure frame and this second processing procedure frame, and it is to be suitable for a base material is sent to substrate process chamber this first processing procedure frame from this first side, and wherein this first mechanical arm assembly comprises:

One mechanical arm is suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this mechanical arm is arranged on usually a vertical actuator assemblies on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this mechanical arm is arranged on usually a motor on the direction parallel with this first direction;

One second mechanical arm assembly is arranged between this first processing procedure frame and this second processing procedure frame, and it is to be suitable for a base material is sent to substrate process chamber this second processing procedure frame from this first side, and wherein this second mechanical arm assembly comprises:

One mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this mechanical arm is arranged on usually a vertical actuator assemblies on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this mechanical arm is arranged on usually a motor on the direction parallel with this first direction; And

One three-mechanical arm assembly, be arranged between this first processing procedure frame and this second processing procedure frame, it is to be suitable for a base material is sent to the substrate process chamber this first processing procedure frame or is sent to this second processing procedure frame from this first side from this first side, and wherein this three-mechanical arm assembly comprises:

One mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this mechanical arm is arranged on usually a vertical actuator assemblies on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this mechanical arm is arranged on usually a motor on the direction parallel with this first direction.

7. cluster tool as claimed in claim 6, more comprising one seals, it has one or more sidewall that forms a process zone, be provided with this first processing procedure frame, the second processing procedure frame, the first mechanical arm assembly, second mechanical arm assembly and the three-mechanical arm assembly in this process zone, wherein a fan is to be suitable for making air by a filter and enter this process zone.

8. cluster tool as claimed in claim 7 more comprises one the 4th mechanical arm assembly, and it is arranged in this process zone, and is suitable for transmitting a base material and passes in and out a process chamber and in this first processing procedure frame and be positioned at this and seal outside position.

9. cluster tool as claimed in claim 6 more comprises:

One the 4th mechanical arm assembly, it is to be provided with between this first processing procedure frame and this second processing procedure frame, be suitable for a base material is sent to the substrate process chamber this first processing procedure frame or is sent to this second processing procedure frame from this first side from this first side, wherein the 4th mechanical arm assembly comprises:

One mechanical arm, it is to be suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this mechanical arm is arranged on usually a vertical actuator assemblies on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this mechanical arm is arranged on usually a motor on the direction parallel with this first direction.

10. cluster tool as claimed in claim 6 more comprises:

One wafer cassette, it is suitable for keeping somewhere two or more base materials; And

One first passage chamber, it is suitable for receiving a base material from a front end robot arm and this first mechanical arm assembly;

One second channel chamber, it is suitable for receiving a base material from this front end robot arm and this second mechanical arm assembly;

One third channel chamber, it is suitable for receiving a base material from this front end robot arm and this three-mechanical arm assembly; And

This front end robot arm is to be suitable for transmitting a base material to pass in and out a wafer cassette and this first, second and the third channel chamber.

11. cluster tool as claimed in claim 6, in the first wherein above-mentioned mechanical arm assembly move horizontally in assembly, this second mechanical arm assembly move horizontally assembly, and this three-mechanical arm assembly in move horizontally assembly each more comprise:

One seals, and has one or more sidewall and a pedestal, and it is around an interior zone; And

One or more fan component, itself and this interior zone fluid communication of sealing.

12. cluster tool as claimed in claim 6, the first wherein above-mentioned mechanical arm assembly, the second mechanical arm assembly, and the three-mechanical arm assembly in mechanical arm more comprise basically:

One mechanical arm blade, it is suitable for receiving and transmitting a base material; And

One motor exchanges with this mechanical arm blade rotation.

13. cluster tool as claimed in claim 6, the first wherein above-mentioned mechanical arm assembly, the second mechanical arm assembly, and the three-mechanical arm assembly in mechanical arm more comprise basically:

One mechanical arm blade has one first end and a base material receiving surface, and wherein this base material receiving surface is suitable for receiving and transmitting a base material;

One first coupling member, it has one first pivoting point, and it is the center rotation that first end of this mechanical arm blade is suitable for it; And

One motor exchanges with this mechanical arm blade rotation with this first coupling member.

14. cluster tool as claimed in claim 6, the vertical moving assembly in the vertical moving assembly in the first wherein above-mentioned mechanical arm assembly, this second mechanical arm assembly, and this three-mechanical arm assembly in each of vertical moving assembly more comprise:

One seals, and has one or more sidewall and filter, and it is around an interior zone; And

One fan component, itself and this interior zone fluid communication of sealing, and be suitable for removing a fluid and by this filter from this interior zone.

15. cluster tool as claimed in claim 6, the first wherein above-mentioned mechanical arm assembly, the second mechanical arm assembly, and each of three-mechanical arm assembly more comprise:

One seals, and has one or more sidewall and filter, and it is around an interior zone; And

One or more fan component, itself and this interior zone fluid communication of sealing, and be suitable for making air flows to pass through this filter towards this first, second or three-mechanical arm.

16. cluster tool as claimed in claim 6, the first wherein above-mentioned mechanical arm assembly, the second mechanical arm assembly, and each of three-mechanical arm assembly more comprise:

One second mechanical arm, it is suitable for a base material is arranged on one second horizontal plane, and wherein this horizontal plane and this second horizontal plane separate a segment distance.

17. cluster tool as claimed in claim 6, each of the vertical moving assembly in wherein above-mentioned first, second and the three-mechanical arm assembly more comprises:

This vertical actuator assemblies, it comprises:

One vertical actuator is suitable for vertically being provided with this first mechanical arm; And

One vertical slide rail is suitable for guiding this first mechanical arm when it is transferred by this vertical actuator;

One seals, and has an interior zone, and it is the spare part that is selected from a group of this vertical actuator and this vertical slide rail formation around at least one; And

One fan, with this interior zone fluid communication, it is to be suitable for sealing the inner negative pressure that produces at this.

18. a cluster tool of handling a base material, it comprises at least:

One first processing procedure frame, it contains two or more group with two or more substrate process chambers that vertically stack, wherein these two or more substrate process chambers that vertically stack of two or more group have one first side of arranging along a first direction, to pass through the described substrate process chamber of this side access; And one second side of arranging along a second direction, with by the described substrate process chamber of this side access;

One first mechanical arm assembly, it is to be suitable for a base material is sent to substrate process chamber this first processing procedure frame from this first side, wherein this first mechanical arm assembly comprises:

One first mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this first mechanical arm is arranged on usually a motor on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this first mechanical arm is arranged on usually a motor on the direction parallel with this first direction; And

One second mechanical arm assembly, it is to be suitable for a base material is sent to substrate process chamber this first processing procedure frame from this second side, wherein this second mechanical arm assembly comprises:

One second mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this second mechanical arm is arranged on usually a motor on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this second mechanical arm is arranged on usually a motor on the direction parallel with this second direction.

19. cluster tool as claimed in claim 18 more comprises:

One three-mechanical arm assembly, it is to be suitable for a base material is sent to substrate process chamber this first processing procedure frame from this first side, wherein this three-mechanical arm assembly comprises:

One three-mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in the horizontal plane;

One vertical moving assembly has and is suitable for this three-mechanical arm is arranged on usually a motor on the direction parallel with this vertical direction; And

One moves horizontally assembly, has to be suitable for this three-mechanical arm is arranged on usually a motor on the direction parallel with this first direction.

20. cluster tool as claimed in claim 18 more comprises:

One second processing procedure frame, it contains two or more group with two or more substrate process chambers of vertically stacking, wherein these two or more substrate process chambers that vertically stack of two or more group have one first side of arranging along this first direction, to pass through the described substrate process chamber of this side access; And

This first mechanical arm assembly, it is to be suitable for a base material is sent to substrate process chamber this second processing procedure frame from this first side.

21. cluster tool as claimed in claim 18 more comprises:

One wafer cassette, it is suitable for keeping somewhere two or more base materials; And

One first passage chamber, it is suitable for receiving a base material from a front end robot arm and this first mechanical arm assembly;

One second channel chamber, it is suitable for receiving a base material from this front end robot arm and this second mechanical arm assembly; And

This front end robot arm is to be suitable for transmitting a base material to pass in and out a wafer cassette and this first and second channel chamber.

22. cluster tool as claimed in claim 18, in the first wherein above-mentioned mechanical arm assembly move horizontally in assembly and this second mechanical arm assembly move horizontally assembly each more comprise:

One seals, and has one or more sidewall and a pedestal, and it is around an interior zone; And

One or more fan component, itself and this interior zone fluid communication of sealing.

23. cluster tool as claimed in claim 18, first wherein above-mentioned mechanical arm assembly and the mechanical arm in the second mechanical arm assembly more comprise basically:

One mechanical arm blade, it is suitable for receiving and transmitting a base material; And

One motor exchanges with this mechanical arm blade rotation.

24. cluster tool as claimed in claim 18, first wherein above-mentioned mechanical arm assembly and the mechanical arm in the second mechanical arm assembly more comprise basically:

One mechanical arm blade has one first end and a base material receiving surface, and wherein this base material receiving surface is suitable for receiving and transmitting a base material;

One first coupling member, it has one first pivoting point, and it is the center rotation that first end of this mechanical arm blade is suitable for it; And

One motor exchanges with this mechanical arm blade rotation with this first coupling member.

25. cluster tool as claimed in claim 18, each of the vertical moving assembly in the vertical moving assembly in the first wherein above-mentioned mechanical arm assembly and this second mechanical arm assembly more comprises:

One seals, and has one or more sidewall and filter, and it is around an interior zone; And

One fan component, itself and this interior zone fluid communication of sealing, and be suitable for removing a fluid and by this filter from this interior zone.

26. cluster tool as claimed in claim 18, first wherein above-mentioned mechanical arm assembly and each of the second mechanical arm assembly more comprise:

One seals, and has one or more sidewall and filter, and it is around an interior zone; And

One or more fan component, itself and this interior zone fluid communication of sealing, and be suitable for making air flows to pass through this filter towards this first, second or three-mechanical arm.

27. cluster tool as claimed in claim 18, first wherein above-mentioned mechanical arm assembly and each of the second mechanical arm assembly more comprise:

One second mechanical arm, it is suitable for a base material is arranged on one second horizontal plane, and wherein this horizontal plane and this second horizontal plane separate a segment distance.

28. a cluster tool of handling a base material, it comprises at least:

Two or more substrate process chambers are arranged on one and troop in the instrument;

One first mechanical arm assembly, it is suitable for a base material is sent to this two or more substrate process chambers, and wherein this first mechanical arm assembly comprises:

One first mechanical arm, it is suitable for a base material is arranged on the first direction, and wherein this first mechanical arm comprises:

One mechanical arm blade has one first end and a base material receiving surface, and wherein this base material receiving surface is suitable for receiving and transmitting a base material;

One first coupling member, it has one first pivot point and one second pivot point;

One motor is rotatably connected with this first coupling member at this second pivot point place;

One first gear is connected with first end of this mechanical arm blade, and is rotatably connected with this first coupling member at this first pivot point place; And

One second gear is rotatably connected with this first gear, and with concentric alignment of second pivot point of this first coupling member, wherein the gear of this this first gear of second gear mesh is than between about 3: 1 to about 4: 3;

One first moving assembly, it is to be suitable for this first mechanical arm is arranged on vertical with this first direction usually second direction; And

One second moving assembly has and is suitable for this first mechanical arm is arranged on usually a motor on the third direction vertical with this second direction.

29. troop one and to transmit the equipment of a base material in the instrument for one kind, it comprises at least:

One first mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in one first plane;

One vertical moving assembly comprises:

One slide track component, it contains the block that is connected with the linear track of a perpendicular positioning;

One supporting bracket is connected with this first mechanical arm with this block; And

One actuator, it is suitable for along this linear track this supporting bracket being vertically set on the upright position; And

One moves horizontally assembly, and it is to be connected with this vertical moving assembly, and has a horizontal actuator, and it is suitable for being provided with in the horizontal direction this first mechanical arm and this vertical moving assembly.

30. equipment as claimed in claim 29 more comprises one second and moves horizontally assembly, it is connected with this vertical moving assembly, and has one second horizontal actuator, and it is suitable for this first mechanical arm and this vertical moving assembly are arranged on the horizontal direction.

31. equipment as claimed in claim 29 more comprises an environment control assembly, has a fan, it is to be suitable for promoting air by a filter and towards a base material that is arranged on this first mechanical arm.

32. equipment as claimed in claim 29 more comprises:

One second mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in one second plane; And

This vertical moving assembly more comprises:

One second supporting bracket is connected with this linear track and this second mechanical arm, and wherein this second supporting bracket is connected with this linear track by this block or one second block that is connected with this linear track; And

This actuator is further adapted for along this track this second supporting bracket is vertically set on the upright position;

Wherein second plane of this second mechanical arm normally with first plane parallel of this first mechanical arm, and this second plane is arranged on this first plane one segment distance place is arranged.

33. equipment as claimed in claim 29, wherein above-mentioned vertical moving assembly more comprises:

One seals, and has one or more sidewall that forms an interior zone, and this interior zone is selected from the spare part of a group of this actuator and this slide track component formation around at least one;

One slit is formed on one of this one or more sidewall that seals;

This supporting bracket extends through this slit; And

One fan, be further adapted for this seal outside a bit and produce between this interior zone between about 0.02 and about 1 inch water column height between a pressure reduction.

34. troop one and to transmit the equipment of a base material in the instrument for one kind, it comprises at least:

One first mechanical arm, it is suitable for a base material is arranged on one or more aspect that is contained in usually in one first plane;

One vertical moving assembly comprises:

One actuator assemblies, it is suitable for vertically being provided with this first mechanical arm, and wherein this actuator assemblies more comprises:

One vertical actuator, it is suitable for vertically being provided with this first mechanical arm; And

One vertical slide rail, it is suitable for guiding this first mechanical arm when being transferred by this vertical actuator;

One seals, and has the sidewall that one or more forms an interior zone, and this interior zone is the spare part that is selected from a group of this vertical actuator and this vertical slide rail formation around at least one; And

One fan, with this interior zone fluid communication, it is to be suitable for sealing the inner negative pressure that produces at this; And

One moves horizontally assembly, has a horizontal actuator and a horizontal slide rail member, and it is to be suitable on parallel with first side of this first a processing procedure frame usually direction this first mechanical arm being set.

35. equipment as claimed in claim 34, the wherein above-mentioned assembly that moves horizontally more comprises:

One second seals, and has one or more sidewall, and it second seals the inner interior zone that forms around this horizontal slide rail member and at this; And

One fan, with this interior zone fluid communication, it is to be suitable for second sealing the inner negative pressure that produces at this.

36. equipment as claimed in claim 34, wherein above-mentioned vertical moving assembly more comprises:

One slit is formed on one of this one or more sidewall that seals;

One supporting bracket extends through this slit, and is connected with this first mechanical arm with this vertical slide rail; And

This fan be further adapted for this seal outside a bit and produce between this interior zone between about 0.02 and about 1 inch water column height between a pressure reduction.

37. equipment as claimed in claim 34 more comprises an environment control assembly, has a fan, it is to be suitable for promoting air by a filter and towards a base material that is arranged on this first mechanical arm.

38. troop one and to transmit the equipment of a base material in the instrument for one kind, it comprises at least:

One first mechanical arm assembly, it is suitable for a base material is arranged on the first direction, and wherein this first mechanical arm assembly comprises:

One mechanical arm blade has one first end and a base material receiving surface;

One first coupling member, it has one first pivot point and one second pivot point;

One first gear is connected with first end of this mechanical arm blade and is rotatably connected with this first coupling member at this first pivot point place;

One second gear is rotatably connected with this first gear and aligns with second pivot point of this first coupling member; And

One first motor, it is to be rotatably connected with this first coupling member, wherein this first motor is suitable for by rotating this first coupling member with respect to this second gear and first gear is provided with this base material receiving surface;

One first moving assembly, it is to be suitable for this first mechanical arm is arranged on vertical with this first direction usually second direction; And

One second moving assembly, it is to be suitable for this first mechanical arm is arranged on vertical with this second direction usually third direction.

39. equipment as claimed in claim 38, the second wherein above-mentioned gear compares between about 3: 1 and about 4: 3 with respect to the gear of this first gear.

40. equipment as claimed in claim 38, the second wherein above-mentioned gear is connected with one second motor, wherein is suitable for adjusting the rotary speed of this first coupling member with respect to this second gear with the controller that this first motor exchanges with this second motor during this transmission processing procedure.

41. troop one and to transmit the equipment of a base material in the instrument for one kind, it comprises at least:

One first mechanical arm assembly, it is suitable for a base material is arranged on and is contained in usually in one first plane on one or more aspect of an arc, and wherein this first mechanical arm assembly comprises:

One mechanical arm blade has one first end and a base material receiving surface; And

One motor, it is rotatably connected with first end of this mechanical arm blade;

One first moving assembly, it is to be suitable for this first mechanical arm is arranged on vertical with this first plane usually second direction, wherein this first moving assembly comprises:

One actuator assemblies, it is suitable for vertically being provided with this first mechanical arm, and wherein this actuator assemblies more comprises:

One vertical actuator, it is suitable for vertically being provided with this first mechanical arm; And

One vertical slide rail, it is suitable for guiding this first mechanical arm when being transferred by this vertical actuator;

One seals, and has the sidewall that one or more forms an interior zone, and this interior zone is selected from the spare part of a group of this vertical actuator and this vertical slide rail composition around at least one; And

One fan, with this interior zone fluid communication, it is to be suitable for sealing the inner negative pressure that produces at this; And

One second moving assembly has one second actuator, and it is to be suitable for this first mechanical arm is arranged on vertical with this second direction usually third direction.

42. equipment as claimed in claim 41, the second wherein above-mentioned moving assembly more comprises:

One second seals, and has one or more sidewall, and it second seals the inner interior zone that forms around this second actuator and at this; And

One fan, with this interior zone fluid communication, it is to be suitable for second sealing the inner negative pressure that produces at this.

43. troop one and to transmit the equipment of a base material in the instrument for one kind, it comprises at least:

One first mechanical arm assembly, it is suitable for a base material is arranged on the first direction, and wherein this first mechanical arm assembly comprises:

One mechanical arm blade has one first end and a base material receiving surface;

One first gear is connected with first end of this mechanical arm blade;

One second gear is rotatably connected with this first gear; And

One first motor is rotatably connected with this first gear; And

One second motor is rotatably connected with this second gear;

Wherein this second motor is suitable for rotating this second gear with respect to this first gear, to create a variable gear ratio; And

One first moving assembly, it is to be suitable for this first mechanical arm is arranged on vertical with this first direction usually second direction.

44. equipment as claimed in claim 43 more comprises one second moving assembly, it is suitable for this first mechanical arm is arranged on vertical with this second direction usually third direction.

45. equipment as claimed in claim 43, wherein above-mentioned second direction is vertical with this first direction usually.

46. an equipment that transmits a base material, it comprises at least:

One pedestal has a substrate support surface;

One reactive means is arranged on this pedestal;

One contact member and is suitable for a base material is connected towards the actuator that this reactive means promotes; And

One braking element, it when this reactive means promote is suitable for prevailingly suppress the moving of this contact member through being provided with this base material at this contact member.

47. equipment as claimed in claim 46, wherein above-mentioned restraint are the generations that contacts that utilizes between this braking element and this contact member.

48. equipment as claimed in claim 46 more comprises an inductor, it is connected with this contact member, and is suitable for responding to the position of this contact member.

49. equipment as claimed in claim 46 more comprises a controller, exchanges with this inductor with this actuator, to respond to the dislocation of a base material on this stayed surface.

50. an equipment that transmits a base material, it comprises at least:

One pedestal has a stayed surface;

One reactive means is arranged on this pedestal;

One actuator is connected with this pedestal;

One contact member is connected with this actuator, and wherein this actuator is suitable for this contact member towards being arranged on this stayed surface, and the edge that is supported a base material at an edge by this reactive means promotes;

One braking element assembly comprises:

One braking element; And

One brake actuation member, wherein this brake actuation member is suitable for this braking element is promoted towards this contact member, can suppress the restraint that this contact member moves prevailingly to create during a base material transmits.

51. equipment as claimed in claim 50, wherein above-mentioned restraint are the generations that contacts that utilizes between this braking element and this contact member.

52. equipment as claimed in claim 50, wherein above-mentioned restraint are the frictional force that produces between a surface of this contact member and this braking element.

53. equipment as claimed in claim 50 more comprises an inductor, it is connected with this contact member, and is suitable for responding to the position of this contact member.

54. equipment as claimed in claim 53 more comprises a controller, exchanges with this inductor with this actuator, to respond to the dislocation of a base material on this stayed surface.

55. an equipment that transmits a base material, it comprises at least:

One pedestal has a stayed surface;

One reactive means is arranged on this pedestal;

One contact member assembly comprises:

One actuator; And

One contact member, have a base material contact surface and and comply with member (compliantmember), it is arranged between this contact surface and this actuator, and wherein this actuator is to be suitable for this contact surface is promoted towards the base material that a surface that leans on this reactive means is provided with; And

One braking element assembly comprises:

One braking element: and

One brake actuation member is suitable for this braking element is promoted towards this contact member, with moving of this contact member during suppressing a base material and transmitting; And

One inductor is connected with this contact member, and wherein this inductor is suitable for responding to the position of this contact surface.

56. equipment as claimed in claim 55, the wherein above-mentioned member of complying with is a spring.

57. equipment as claimed in claim 55, wherein above-mentioned braking element assembly more comprises a lever arm, has one first end that is connected with this brake actuation member, and one second end that is connected with this braking element, wherein this lever arm is connected with a pivoting point, and be suitable for producing the braking force that this contact member of inhibition moves, and it is the power that produces greater than this brake actuation member.

58. an equipment that transmits a base material, it comprises at least:

One mechanical arm assembly, contain:

One first mechanical arm, it is suitable for transmitting a base material that is arranged on the mechanical arm blade on the first direction;

One first moving assembly has an actuator, and it is suitable for this first mechanical arm is arranged on the second direction; And

One second moving assembly is connected with this first moving assembly and has one second actuator, and it is suitable for this first mechanical arm and this first moving assembly are arranged on vertical with this second direction usually third direction; And

One base material grabbing device is connected with this mechanical arm blade, and wherein this base material grabbing device is suitable for supporting a base material, and contains:

One reactive means is arranged on this mechanical arm blade;

One actuator is connected with this mechanical arm blade;

One contact member is connected with this actuator, and wherein this actuator is suitable for by this contact member is limited this base material towards the edge promotion that is arranged on the base material between this contact member and this reactive means; And

One braking element assembly comprises:

One braking element; And

One brake actuation member is suitable for this braking element is promoted towards this contact member, suppresses moving of this contact member with during transmitting at a base material.

59. equipment as claimed in claim 58, wherein above-mentioned base material grabbing device more comprises an inductor, and it is connected with this contact member, and is suitable for responding to the position of this contact member.

60. equipment as claimed in claim 58, wherein above-mentioned base material grabbing device more comprises a controller, exchanges with this inductor with this actuator, to respond to the dislocation of a base material on this stayed surface.

61. equipment as claimed in claim 58, wherein above-mentioned base material grabbing device more comprises complies with member, and it is arranged between this contact member and this actuator, and is suitable at this actuator this contact member storage power when a substrate surface promotes.

62. a method that transmits a base material, it comprises at least:

One base material is arranged on the substrate support, between the base material contact member and a reactive means that are arranged on this substrate support;

Utilize an actuator to produce the base material grasping force, this actuator promotes this base material contact member towards this base material, and this base material is promoted towards this reactive means; And

Produce a restraint, it is suitable for utilizing during transmitting a base material brake assemblies to suppress moving of this base material contact member.

63. method as claimed in claim 62, wherein above-mentioned restraint are to produce after this grasping force is applied to this base material.

64. method as claimed in claim 62 more comprises and utilizes a controller to respond to moving of this base material contact member.

65. method as claimed in claim 62 more comprises:

With this substrate support be set together the beginning position on;

This substrate support is sent to a final position from this original position; And

Execution is arranged on step on this substrate support with a base material, produces this base material grasping force, and produces this restraint.

66. method as claimed in claim 62, more comprise a base material that utilizes one first mechanical arm assembly will be arranged on this substrate support and be sent to the one first process chamber array that is provided with along a first direction, this first mechanical arm assembly is suitable for this base material is arranged on the desired location on this first direction and on the desired location on the second direction, and wherein this second direction is vertical with this first direction usually.

67. a method that transmits a base material, it comprises at least:

One base material is arranged on the substrate support, between the base material contact member and a reactive means that are arranged on this substrate support;

The actuator that will have a connection piece is connected with this base material contact member, and this connector is connected this actuator with this base material contact member;

Utilize an actuator to apply grasping force to this base material, this actuator promotes this base material contact member towards this base material, and this base material is promoted towards this reactive means;

Store energy in one and comply with in the member, it is arranged between this base material contact member and this connector;

After applying this grasping force, limit moving of this connector, to minimize the amount of variability that transmits this grasping force during the base material; And

Respond to moving of this base material by this base material contact surface of induction because be stored in moving of this minimizing of complying with the energy in the member.

68. as the described method of claim 67, more comprise when the base material contact member of sensing be moved beyond user's value of defining the time stop moving of this substrate support.

69. as the described method of claim 67, more comprise a base material that utilizes one first mechanical arm assembly will be arranged on this substrate support and be sent to the one first process chamber array that is provided with along a first direction, this first mechanical arm assembly is suitable for this substrate support is arranged on the desired location on this first direction and on the desired location on the second direction, and wherein this second direction is vertical with this first direction usually.

70. as the described method of claim 69, wherein above-mentioned second direction is aimed on a vertical direction usually.

71. a method that transmits a base material, it comprises at least:

A base material that is arranged in one first process chamber is received on the mechanical arm substrate support, and the step that wherein receives this base material comprises:

One base material is arranged on this mechanical arm substrate support, between the base material contact member and a reactive means that are arranged on this mechanical arm substrate support;

Utilize an actuator to produce the base material grasping force, this actuator promotes this base material contact member towards this base material, and this base material is promoted towards this reactive means; And

One brake assemblies is set, suppresses the restraint that this base material contact member moves during transmitting a base material, to produce; And

Utilize one first mechanical arm assembly that this base material and this mechanical arm substrate support are sent to a position in one second process chamber from the position in this first process chamber, this second process chamber is to be arranged on this first process chamber along a first direction one segment distance place is arranged, this first mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and be arranged on the desired location of a second direction, wherein this second direction is vertical with this first direction usually.

72. as the described method of claim 71, wherein above-mentioned restraint is to produce after this grasping force is applied to this base material.

73., more comprise and utilize a controller to respond to moving of this base material contact member as the described method of claim 71.

74. as the described method of claim 71, wherein above-mentioned second direction is aimed on a vertical direction usually.

75. troop one and to transmit the method for a base material in the instrument for one kind, it comprises at least:

Utilize one first mechanical arm assembly one base material to be sent to the one first process chamber array that is provided with along a first direction, this first mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and be arranged on the desired location of a second direction, wherein this second direction is vertical with this first direction usually;

Utilize one second mechanical arm assembly one base material to be sent to the one second process chamber array that is provided with along this first direction, this second mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and is arranged on the desired location of this second direction; And

Utilize a three-mechanical arm assembly one base material to be sent to first and second process chamber array that is provided with along this first direction, this three-mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and is arranged on the desired location of this second direction.

76. as the described method of claim 75, wherein above-mentioned three-mechanical arm assembly comes down to adjoin with this first and second mechanical arms assembly.

77. as the described method of claim 76, wherein above-mentioned three-mechanical arm assembly is arranged on this first and second mechanical arms inter-module.

78. as the described method of claim 75, first wherein above-mentioned mechanical arm assembly to the three-mechanical arm assembly and second mechanical arm assembly to the three-mechanical arm assembly be greater than between about 5% and about 50% at interval than the processing procedure surface size of a base material.

79. as the described method of claim 75, the distance of the center line of the first wherein above-mentioned mechanical arm assembly to the center line of the center line of this three-mechanical arm assembly and this second mechanical arm assembly to the center line of this three-mechanical arm assembly is between between about 315mm and about 450mm, and the distance between wherein said center line is to measure on substantially vertical with this first direction direction.

80. as the described method of claim 75, the wherein above-mentioned center line that is arranged on the base material on this first mechanical arm assembly or this second mechanical arm assembly during the processing procedure that transmits a base material on this first direction to the distance of the center line that is arranged on the base material on this three-mechanical arm assembly is greater than about 5% and about 50% than the processing procedure surface size of a base material.

81. as the described method of claim 75, more comprise and utilize one the 4th mechanical arm assembly one base material to be sent to first and second process chamber array that is provided with along this first direction, the 4th mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and is arranged on the desired location of this second direction.

82. as the described method of claim 75, more be included in and be formed on one of one first actuator assemblies periphery and produce the pressure be lower than atmospheric pressure in sealing, this first actuator assemblies is to be contained in this first mechanical arm assembly, this second mechanical arm assembly and this three-mechanical arm assembly, and wherein this first actuator assemblies is suitable for this base material is arranged on this second direction.

83. troop one and to transmit the method for a base material in the instrument for one kind, it comprises at least:

Utilize one first mechanical arm assembly one base material to be sent to the one first process chamber array that is provided with along a first direction from one first saturating cavity chamber, this first mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and be arranged on the desired location of a second direction, wherein this second direction is vertical with this first direction usually;

Utilize one second mechanical arm assembly that one base material is sent to this first process chamber array from this first saturating cavity chamber, this second mechanical arm assembly is suitable for this base material is arranged on the desired location of this first direction, and is arranged on the desired location of a second direction; And

The front end robot arm that utilization is arranged in the front end assemblies is sent to this first saturating cavity chamber with a base material from a base material casket, and wherein this front end assemblies adjoins with a transit area that contains this first process chamber array, this first mechanical arm assembly and this second mechanical arm assembly in fact.

84. as the described method of claim 83, more comprise and utilize this first or second mechanical arm assembly that one base material is sent to this first process chamber array from one second saturating cavity chamber, wherein this second saturating cavity chamber be on this first direction, be provided with and this first process chamber array at least one process chamber between a segment distance is arranged.

85. as the described method of claim 83, more comprise a front end assemblies, have a front end robot arm that is suitable for a base material is sent to from a base material casket this first saturating cavity chamber.

86. as the described method of claim 83, wherein above-mentioned front end robot arm, the first mechanical arm assembly and the second mechanical arm assembly are further adapted for transmission one base material and pass in and out one second saturating cavity chamber.

87. as the described method of claim 83, more be included in and be formed on one of one first actuator assemblies periphery and produce the pressure be lower than atmospheric pressure in sealing, this first actuator assemblies is to be contained in this first mechanical arm assembly and this second mechanical arm assembly, and wherein this first actuator assemblies is suitable for this base material is arranged on this second direction.

Images