CN1007915B - 形成非晶态多元金属合金覆层的方法 - Google Patents
形成非晶态多元金属合金覆层的方法Info
- Publication number
- CN1007915B CN1007915B CN86104496A CN86104496A CN1007915B CN 1007915 B CN1007915 B CN 1007915B CN 86104496 A CN86104496 A CN 86104496A CN 86104496 A CN86104496 A CN 86104496A CN 1007915 B CN1007915 B CN 1007915B
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- amorphous
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- 238000000034 method Methods 0.000 title claims abstract description 44
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- 238000004519 manufacturing process Methods 0.000 title description 7
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- 239000002184 metal Substances 0.000 claims description 26
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- 239000000463 material Substances 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 13
- 238000000354 decomposition reaction Methods 0.000 claims description 11
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- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 229910052698 phosphorus Inorganic materials 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 8
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 5
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 5
- 229910052748 manganese Inorganic materials 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
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- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
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- 230000008020 evaporation Effects 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
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- 239000010949 copper Substances 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052755 nonmetal Inorganic materials 0.000 claims description 2
- 150000002902 organometallic compounds Chemical class 0.000 claims description 2
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- 238000007254 oxidation reaction Methods 0.000 claims description 2
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- 239000002243 precursor Substances 0.000 abstract 1
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- 238000006243 chemical reaction Methods 0.000 description 13
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- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
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- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910017604 nitric acid Inorganic materials 0.000 description 4
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- 239000000126 substance Substances 0.000 description 4
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- -1 dipolymer Substances 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
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- 230000000171 quenching effect Effects 0.000 description 3
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000006555 catalytic reaction Methods 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
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- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PXFBZOLANLWPMH-UHFFFAOYSA-N 16-Epiaffinine Natural products C1C(C2=CC=CC=C2N2)=C2C(=O)CC2C(=CC)CN(C)C1C2CO PXFBZOLANLWPMH-UHFFFAOYSA-N 0.000 description 1
- IPUZLQMXYWRUPU-UHFFFAOYSA-N C(=O)=[Fe](C=C)C=C Chemical compound C(=O)=[Fe](C=C)C=C IPUZLQMXYWRUPU-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910017060 Fe Cr Inorganic materials 0.000 description 1
- 229910002544 Fe-Cr Inorganic materials 0.000 description 1
- 229910017116 Fe—Mo Inorganic materials 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- FVESRZSALBPPGF-UHFFFAOYSA-N [C].[Mo].[Cr] Chemical compound [C].[Mo].[Cr] FVESRZSALBPPGF-UHFFFAOYSA-N 0.000 description 1
- FVMYUBUCNQABOJ-UHFFFAOYSA-N [Cr].C(=O)=C1CC=CC=C1 Chemical compound [Cr].C(=O)=C1CC=CC=C1 FVMYUBUCNQABOJ-UHFFFAOYSA-N 0.000 description 1
- RYZGGGMGTVKVLI-UHFFFAOYSA-N [Mo].[CH]1C=CC=C1 Chemical compound [Mo].[CH]1C=CC=C1 RYZGGGMGTVKVLI-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- FQNHWXHRAUXLFU-UHFFFAOYSA-N carbon monoxide;tungsten Chemical group [W].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-].[O+]#[C-] FQNHWXHRAUXLFU-UHFFFAOYSA-N 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- UPHIPHFJVNKLMR-UHFFFAOYSA-N chromium iron Chemical compound [Cr].[Fe] UPHIPHFJVNKLMR-UHFFFAOYSA-N 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
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- FWARNCMTCYKUBS-UHFFFAOYSA-N ethyl n-(ethoxycarbonylcarbamoyl)carbamate Chemical compound CCOC(=O)NC(=O)NC(=O)OCC FWARNCMTCYKUBS-UHFFFAOYSA-N 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
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- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- KWUUWVQMAVOYKS-UHFFFAOYSA-N iron molybdenum Chemical compound [Fe].[Fe][Mo][Mo] KWUUWVQMAVOYKS-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229940074869 marquis Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- OTYNBGDFCPCPOU-UHFFFAOYSA-N phosphane sulfane Chemical compound S.P[H] OTYNBGDFCPCPOU-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- VBUNOIXRZNJNAD-UHFFFAOYSA-N ponazuril Chemical compound CC1=CC(N2C(N(C)C(=O)NC2=O)=O)=CC=C1OC1=CC=C(S(=O)(=O)C(F)(F)F)C=C1 VBUNOIXRZNJNAD-UHFFFAOYSA-N 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
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- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
- C22C38/40—Ferrous alloys, e.g. steel alloys containing chromium with nickel
- C22C38/48—Ferrous alloys, e.g. steel alloys containing chromium with nickel with niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12576—Boride, carbide or nitride component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12951—Fe-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
- Soft Magnetic Materials (AREA)
Abstract
一种非晶形的多金属合金覆层组成方法的公开。更确切地说,这里述及的是一种化学蒸汽沉积方法,其中起始化合物在控制参数下在基质上引起分解,使覆层在基质上形成,即为大体上非晶形的多金属合金。更好的非晶形的合金成分也加以说明,就是按权利要求方法的标准合成。
Description
本发明涉及非晶态多元金属合金覆层的形成方法。此方法使制造低成本的具有非晶态的金属覆层和非金属覆层的制品成为可能。本方法尤其可用于制造非晶态磁性薄膜和耐蚀覆层。
由于非晶态金属合金材料具有其独特的综合机械、化学和物理性能,近年来人们对非晶态金属合金材料越来越感兴趣。非晶态金属合金材料的性质可能是由于其不规则的原子结构所造成的,这种结构保证了这些材料的化学均匀性和无扩散缺陷,比如位错和晶界,众所周知这些缺陷限制了晶体材料的性能。非晶态特性是缺少长程周期性,相反,晶态特性是长程周期性的。
通常,非晶态材料在室温下的稳定性取决于晶核生长的各种不同的动力势垒以及阻碍稳定晶核生成的形核阻力。这些阻力,一般存在于下列过程中,当把材料制成非晶态的时侯,首先加热至熔融状态,然后快速淬火或在形核的温度范围内迅速冷却,其速率足够迅速防止有效形核产生。此冷却速率为106℃/秒数量级。急速冷却显著地增大熔融合金的粘度和迅速减少原子扩散的距离。这可以有效地防止晶核的形成并产生亚稳或非晶态相。
方法中所提出的这些冷却速率包括由液体的溅射、真空蒸发、等离子喷覆和直接冷却。已发现用一种方法生产的合金往往不同于用另一种方法生产的合金,即使两者在理论上是经过同样的过程。
由于已知各种合金直接在液态下淬火可以制成各种形式的合金,如薄膜、带状物和线材等各种类型的生产,所以发现直接在液态下淬火这
种技术在商业上取得巨大成功。美国专利第3,856,513号Chen等人说明了新型金属合金结构是由熔融状态直接冷却取得的并对该方法作了一般讨论。
由熔融状态急速冷却而形成的基本上全是非晶态金属薄片的厚度和带状物的厚度,是由冷却时材料的热传导率来限制的。通常这种薄膜的厚度小于50微米。这种关于合成非晶态金属合金形式的限制已在其他能够制造别的形状的非晶态金属合金方法中开始积极研究。
Sawmer于1984年9月在德国维尔茨堡举行的关于快速淬火金属的第15届国际会议上公开了在多层结构型中的固态反应形成的非晶态Zr-Co合金,其厚度介于100和500埃(A)之间的锆和钴薄膜层叠在一起,并在约180℃加热处理。这是一种用于在每一邻近层的界面上形成一种非晶态Zr-Co相的扩散方法。
同样,R.B.Schwartz和W.L.Johnson在1983年8月1日出版的第51卷第5期的物理杂志中以“用纯多晶态金属的固态反应形成的一种非晶态合金”阐述了以纯多晶态的Au和La薄膜在温度约为50℃和80℃之间的固态互扩散。这些方法是依据两种金属膜在物理上的亲和来限制反应。
共同未决的专利申请USSN586,380题为“非晶态金属合金粉末及其固态分解反应的合成”以及USSN588,014题为“非晶态金属合金粉末及其固态化学还原反应的合成”公开了取得粉末状非晶态金属合金的新方法。
尽管有这些最新发展,但由于受到适用材料形式的限制而阻碍了非晶态金属合金的广泛使用。所以仍然需要人们寻求合成所需形状和形式的非晶态金属合金的新方法。尤其需要一种非晶态的多元金属合金覆层的经济的形成方法。
当发现许多非晶态金属合金对周围酸碱介质有耐蚀时,由于不能得
到覆层这种形式,所以均未述及覆层材料,Matsumoto等人的美国专利4,318,738公开了多元金属碳系非晶态合金能耐蚀而只提粉末、线材或片状。耐蚀非晶态金属合金领域中所需要的是在商业上可行的生产这种作为覆层合金的方法。
非晶态多元金属合金覆层也可用于催化反应、电化学反应、信息存储的磁性薄膜以及装饰用金属膜和(或)消费用品。
很明显,形成非晶态多元金属合金覆层的低成本生产方法是对非晶态金属合金及其应用的重要贡献。
于是,本发明的目的是提供一种用于非晶态的多元金属合金覆层合成的方法。
本发明另一个目的是提供一种新颖的非晶态的多元金属合金覆层。
本发明还有一个目的是提供一种新颖、耐蚀的非晶态的多元金属合金覆层。
通过下面说明及所附权利要求的描述对本技术领域的技术人员来说,本发明的这些和其他目的是显而易见的。
本发明是关于在一种基底上沉积一种大体上为非晶态的多元金属覆层的方法,该方法包括以下步骤:
(a)准备含金属的起始化合物,化合物里含有非晶态多元金属覆层所需要的金属,并使该化合物在非晶态多元金属覆层形成的结晶温度以下分解。
(b)在密闭系统中加热基底,使温度至少达到起始化合物分解的温度。
(c)使起始化合物蒸发。
(d)蒸发的起始化合物与基底在密闭系统中接触,至使大体上为非晶态覆层在基底上形成。
本发明也可以把含有磷、硼、氮、砷、硫、硅和碳的起始化合物加
入到封闭系统中,以便把这些元素掺入到大体上为非晶态多元金属覆层中。
本发明也涉及用上述方法形成的大体上为非晶态多元金属合金覆层,特别是关于具有下式的大体上为非晶态的多元金属合金覆层:
MaM′ bRc
这里,M为至少一种元素选自于Mo、W、Nb和Ta组成的一组元素;
M′为至少一种元素选自于;Fe、Ni、Co、Mn和Cr组成的一组元素;和
R为至少一种元素选自于;P、B、N、As、S、Si和C组成的一组元素;和
其中,a的范围为大约0.15至大约0.85;
b的范围为大约0.15至大约0.85;和
C的范围为0至大约0.25;和
限制条件为:当M′是Cr时,那么总数(除Cr外的M′元素的下标b与c的总和)将为0.15;
其中所说的覆层是由上述方法所形成。
本文所说的多元金属合金覆层是大体上为非晶态合金。本文所用“大体上”一词是指一种非晶态多元金属覆层在用X光衍射分析时显示至少有50%为非晶态。多元金属覆层至少有80%是非晶态较好,最好的是X光衍射分析显示大约100%为非晶态。本文所用的“非晶态多元金属合金”词组指的是含金属的非晶态合金,也可以包含非金属元素。
大体上为非晶形多金属覆层可以由下式来代表:
MaM′ bRc
其中,M为至少一种元素选自Mo、W、Nb、和Ta组成的一组元素;和
M′为至少一种元素选自Fe、Ni、Co、Mn和Cr组成的一组元素;和
R为至少一种元素选自P、B、N、As、S、Si和C组成的一组元素;
a围为大约0.15至大约0.85;
b的范围为大约0.15至大约0.85;和
c的范围为0至大约0.25;
限制条件为:当M′是Cr时,那么总数(除Cr外的M′元素的下标b与c的总和)将为0.15。
a、b和c的范围如下较好:
a的范围为大约0.2至大约0.7;
b的范围为大约0.2至大约0.8
c的范围为0至大约0.2
最好,a、b和c的范围如下:
a的范围为大约0.2至大约0.4;
b的范围为大约0.4至大约0.8;和
c的范围为0至大约0.2。
例如这些大体上为非晶态的多元金属合金所包含的成份包括:MOa(Fe-Cr)b、MoaCrbCc、MOaCrbNc和MOaFeb
上述的说明和式子并不是用来限制根据本文所述方法形成的覆层的材料。所属技术人员很容易使用或修改本文所述的方法以合成其他覆层成份。
本文所示的方法包括分解至少两种含金属的起始化合物以组成大体上为非晶态的多元金属合金。含金属的起始化合物是选择的,使它们的分解温度比将要形成的大体上为非晶态的金属合金形成的结晶温度低。适用于本方法的起始化合物可包括有机金属化合物,如含有由饱和和(或)不饱和烃、芳香族环烃或杂芳香化合物配位体组成的有机金属配位体的单体、二聚物、三聚物和聚合物。这些化合物的例子和它们的分
解温度表示于下列表1中。
表1
含金属起始化合物
化合物 近似的分解温度(℃)
六羰基钼 150
六羰基铬 170
五羰基铁 140
三羰基丁二烯铁 200
六羰基钨 170
氯化钽(v) 250
三羰基苯铬 200
双(环戊二烯基)钼
三羰基二聚物 200
八羰基二钴 75
四羰基镍 100
十羰基锰 175
九羰基铁 125
另一些起始化合物可以是非金属化合物,包括氮、碳、硼、磷、砷、硫和硅,也可以是挥发性的,以便于把这些元素加入到大体上为非晶态的多元金属合金中。这些化合物的例子包括氮、氨、硅烷化合物和氯化硅烷化合物、甲烷、乙烷、砷、胂、磷、膦硫化氢、甲苯和乙硼烷。
起始化合物也可以是卤素化合物、氧化物、硝酸盐、氮化物、碳化物、硼化物或含金属盐,并把起始化合物的分解温度限制为比将要合成的大体上为非晶态的多元金属合金的结晶温度低。
基底可以是金属或非金属的,唯一限制的是要经受住沉积过程的参数。基底一般加热温度大约为100℃至大约700℃。对于大多数沉积反
应所需温度范围是由大约250℃至大约400℃。不受主要过程影响的基底例子包括玻璃、钛、钢、铜、碳、氧化铝和镍。必须注意,基底可含任何构型,包括缠结和复杂的构型,并将以本文所述方法均匀镀覆。
为主过程提供的封闭系统是用来防止大体上为非晶态的覆层受污染。根据要合成的大体上为非晶态的金属合金覆层,保持在封闭系统中的气氛可以是真空,惰性气氛或活性气氛。不同于注入反应室时由起始化合物衍生的没有元素结合于其中的覆层镀覆,最好在真空或惰性条件下下进行。载气如氢、氛和氩可通过封闭系统。大体上为非晶态的多元金属覆层材料,其中至少一种覆层材料成分可以被结合于含非金属起始化合物,可以在一种包括含非金属化合物的气氛(例如氮、氨、甲烷、乙烷和硼烷等)一个大气压下合成。也可使用20℃时是液体或固体的起始化合物,但蒸发温要稍提高。这些化合物可配置于封闭反应系统,由于加热,为沉积过程提供了活性气氛。
封闭系统保持大约1×10-6乇至大约700乇的压力下。其他沉积覆层的方法,例如电子束蒸发、等离子喷镀、等离子溅射和离子渗镀需要高真空技术和(或)不能获得象本文所述的蒸汽沉积可提供的高均匀度。
把起始化合物放入封闭系统并用任何已知的方法加热使化合物蒸发。挥发性化合物直接射向保留在封闭系统(该系统温度高于起始化合物分解温度)中的基底上。由于和基底接触,起始化合物分解,覆层材料便沉积在基底上形成覆层。这种覆层均匀、能附着且经济,可附着在任何类型和构型的基底上。这些覆层大体上为非晶态的多元金属覆层,一般具有极好的耐蚀性质。因此,这些覆层可用于化学反应容器的内表面上、暴露于海水或其他强腐蚀性环境的结构金属上以及运输酸性和(或)碱性化学物品的管道和泵的内表面上。这些非晶态覆层也可用于催化反应和电化学反应,以及作为信息存储的磁性薄膜和供装饰用的金属薄膜和(或)消费用品。这些覆层的更多用途,对于本技术领域的技术人员来
说是显而易见的。
下面的例子表明本文所公开的制造非晶态多元金属合金覆层方法的效果。很清楚,这些实施例旨在说明本发明,而不是对本发明范围的限制。
例1
这个实施例是说明根据本发明的方法制取具有近似成分Fe60Mo20Cr20的大体上为非晶态的多金属合金覆层。
五羰基铁,Fe(CO)5,大约在140℃分解;六羰基钼,Mo(CO)6,大约在150℃分解而不熔融;和六羰基铬,Cr(CO)6,大约在170℃分解,将它们分别储存于不锈钢容器。每个容器分别与一个化学蒸汽相沉积反应室相连,而羰基产物流入反应室则由计量阀所控制。当计量阀在关闭位置时,容器里装的羰基化合物被加热到大约60℃。
化学蒸汽相沉积反应器加热至大约70℃而连接每一个羰基室至沉积反应器的管道则加热至大约90℃。在反应器里边,玻璃基底架在铜加热部件上,该部件保持大约340℃。在大约1.2乇的压力下,让五羰基铁与等摩尔的六羰基钼和六羰基铬流同时流过反应器。这些材料进入沉积反应器被蒸发并冲向加热的基底,在那上面分解。
15分钟后,获得了厚度大约为10,000埃的覆层。用X-光衍射分析,证实这覆层为近似成份Fe60Mo20Cr20的大体为非晶态的多元金属合金。
若干份薄膜,以室温和不同环境为条件测定其耐蚀性。覆层测定的结果如下:
测定条件(25℃) 腐蚀率(毫米/年)
1N氢氟酸 0.00
浓氢氟酸(50%) 0.00
1N硝酸 0.002
浓硝酸 0.18
1N盐酸 0.00
氢氧化钾/水(50/50%(重量)) 1.00
由这些测定结果可以看出,在强酸强碱下,大体上为非晶态的覆层显示极好的耐蚀性。
例2
这个实施例说明大体上为非晶态的多元金属合金覆层具有近似成分Cr40Mo40N20。
这成分的制备,类似上述例1所述方法,利用六羰基钼和六羰基铬。在这实施例中,以氮气与25%(重量)氨(NH4)混合物代替例1所用的六羰基铁。让氮气和氨的混合物流过反应器,这样在反应器里就可以维持大约1.2乇的压力。羰基容器、管道、反应器和基底的温度与例1所述的相同。计量阀打开让等摩尔的六羰基钼和六羰基铬与氮气和氨气流一道进入反应器并与加热的玻璃基底接触。
X-光衍射分析证实沉积在玻璃基底上的大体上为非晶态的金属合金覆层有近似成分Cr40Mo40N20。
例3
这实施例说明含大致成分Cr40Mo40C20的大体上为非晶态的多元金属合金覆层的形成。
在这实施例中,除了用甲苯进气代替含氮和25%(重量)氨气流,其他采用与上述例2相同的步骤。这甲苯气流流过反应器,在反应器里产生1.2乇的气体压力。按照上述例2所述的合成步骤,使等摩尔量
羰基材料进入反应室,与甲苯气流冲向加热的玻璃基底。在玻璃基底上沉积的大体上为非晶态的多元金属覆层,由X-光衍射分析证实覆层有近似成分Mo40Cr40C20
然后以与测定例1非晶态铁-钼-铬组合物相同的环境为条件来测定这覆层耐蚀性。此非晶态铬-钼-碳组合物的腐蚀性测定结果如下:
测定条件 腐蚀率(毫米/年)
1N氢氟酸 0.00
浓氢氟酸(50%) 0.00
1N硝酸 0.00
浓硝酸 0.00
1N盐酸 0.00
氢氧化钾/水(50/50重量%) 0.00
可以看出,按本发明合成的大体上为非晶态的多元金属合金,当覆层在腐蚀性极大的酸性和碱性环境中其起作用的电位没有显著下降。
例4
这实施例说明铁-钼非晶态合金的形成。
六羰基钼和五羰基铁分别放置于不锈钢容器。计量阀和管道让每种材料与反应室连通。加热的玻璃基底在反应室里沉积,并且使反应室保持在大约200℃。基底的温度保持在大约375℃。反应室以氩气清洗,此后保持部份氩气真空,大约10和100毫乇之间。计量阀打开,将等摩尔量的羰基材料通入反应室并射向基底。覆层在基底上形成,根据X-光衍射分析,鉴定为一种非晶态铁-钼材料。
上述实施例显示按本文公开的形成新的大体上为非晶态的多元金属合金覆层,其中至少有两种含金属的起始化合物使覆层在基底上面形成。
在没有违反本发明公开的精神和说明的情况下,含金属的起始化合
物、基底、反应温度和其他反应条件,可以由前面所述的规范来决定。本发明的范围包括属于所附权利要求范围内的改进和变更。
Claims (8)
1、一种在基底上沉积大体上为非晶态的多元金属合金覆层的方法,该方法包括以下步骤:
(a)准备至少两种含金属的起始化合物,各含有所说的非晶态的多元金属覆层所需要的一种金属,这些起始化合物的分解温度要低于将要形成的非晶态多元金属覆层的结晶温度,
(b)在封闭系统中把上述基底加热到至少为上述起始化合物的分解温度,
(c)使上述起始化合物蒸发,
(d)蒸发的起始化合物与基底在上述系统中接触,使上述大体上为非晶态的多元金属覆层在上述基底上形成;
上述大体上为非晶态多元金属覆层由下式表示:
MaM1 bRc
其中,M为至少一种选自于Mo、W、Nb和Ta的元素,
M′为至少一种选自于Fe、Ni、Co、Mn和Cr的元素,
R为至少一种选自于P、B、N、As、S、Si和C的元素,
a范围为大约0.15至大约0.85,
b范围为大约0.15至大约0.85,
c范围为0至大约0.25,限制条件为当M包括Cr时,那么总数(除Cr外的M′元素的下标b与C的总和)至少为0.15
2、按照权利要求1的方法,其中所说的含金属起始化合物包括有机金属化合物。
3、按照权利要求1的方法,其中还提供有非金属辅助起始化合物,该起始化合物包括一些选自于氮、碳、硼、磷、砷、硫和硅这一组中的元素。
4、按照权利要求1的方法,其中所说的基底包括一种选自于玻璃、钛、铜、钢、碳、氧化铝和镍的材料。
5、按照权利要求1的方法,其中所说的基底被加热到大约100℃和700℃之间。
6、按照权利要求1的方法,其中所说的封闭系统的压力维持在大约1×10-6乇至大约700乇。
7、一种带有大体上为非晶态的多元金属合金覆层的制品,该制品包括基底和大体上为非晶态多元金属合金覆层,其特征在于,
上述大体上为非晶态多元金属覆层由下式表示
MaM′b Rc
其中,M为至少一种选自Mo、W、Nb和Ta的元素,
M′为至少一种选自Fe、Ni、Co、Mn和Cr的元素,
R为至少一种选自于P、B、N、As、S、Si和C,中的元素,
a范围为大约0.15至大约0.85,
b范围为大约0.15至大约0.85,
c范围为0至大约0.25,
限制条件为:当M′包括Cr时,那么总数(除Cr外的M′元素的下标b与c的总和)至少为0.15,
8、按照权利要求7的带有大体上为非晶态多元金属合金的制品,其中所说合金含的非金属元素选自磷、硼、氮、砷、硫、硅和碳。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75170585A | 1985-07-03 | 1985-07-03 | |
| US751705 | 1985-07-03 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN86104496A CN86104496A (zh) | 1986-12-31 |
| CN1007915B true CN1007915B (zh) | 1990-05-09 |
Family
ID=25023134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN86104496A Expired CN1007915B (zh) | 1985-07-03 | 1986-07-02 | 形成非晶态多元金属合金覆层的方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4851296A (zh) |
| EP (1) | EP0207759B1 (zh) |
| JP (1) | JPS6277464A (zh) |
| KR (1) | KR900007457B1 (zh) |
| CN (1) | CN1007915B (zh) |
| AU (1) | AU588608B2 (zh) |
| BR (1) | BR8603100A (zh) |
| CA (1) | CA1292646C (zh) |
| DE (1) | DE3687720T2 (zh) |
| ZA (1) | ZA864911B (zh) |
Families Citing this family (81)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6379931A (ja) * | 1986-09-24 | 1988-04-09 | Mitsubishi Metal Corp | 高耐食アモルフアスニツケル合金 |
| JPS63312965A (ja) * | 1987-06-16 | 1988-12-21 | Meidensha Electric Mfg Co Ltd | 高耐食性コ−テイング材 |
| JPH0627327B2 (ja) * | 1987-06-30 | 1994-04-13 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | Ib族金属の付着方法 |
| JP2564197B2 (ja) * | 1989-08-22 | 1996-12-18 | トヨタ自動車株式会社 | アモルファス金属膜及びその製造方法 |
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| CN109200951A (zh) * | 2017-06-29 | 2019-01-15 | 刘志红 | 一种催化反应器及生产方法 |
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| SG10201806896UA (en) * | 2018-08-14 | 2020-03-30 | Attometal Tech Pte Ltd | Amorphous inner-surface coated pipe and method for preparing the same |
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| US20200360990A1 (en) | 2019-05-17 | 2020-11-19 | Molten Metal Equipment Innovations, Llc | Molten Metal Transfer System and Method |
| US11873845B2 (en) | 2021-05-28 | 2024-01-16 | Molten Metal Equipment Innovations, Llc | Molten metal transfer device |
| US12146508B2 (en) | 2022-05-26 | 2024-11-19 | Molten Metal Equipment Innovations, Llc | Axial pump and riser |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3018194A (en) * | 1959-08-03 | 1962-01-23 | Ethyl Corp | Metal plating process |
| US3061464A (en) * | 1959-10-09 | 1962-10-30 | Ethyl Corp | Method of metal plating with a group iv-b organometallic compound |
| US3061465A (en) * | 1959-10-09 | 1962-10-30 | Ethyl Corp | Method of metal plating with a group iv-b organometallic compound |
| US3083550A (en) * | 1961-02-23 | 1963-04-02 | Alloyd Corp | Process of coating vitreous filaments |
| US3206325A (en) * | 1961-09-14 | 1965-09-14 | Alloyd Corp | Process for producing magnetic product |
| US3071493A (en) * | 1961-11-15 | 1963-01-01 | Ethyl Corp | Metal plating process |
| US3244554A (en) * | 1962-10-10 | 1966-04-05 | Ethyl Corp | Metal alloy plating process |
| US3479219A (en) * | 1966-01-17 | 1969-11-18 | Ibm | Method of fabricating magnetic recording media |
| DE2966240D1 (en) * | 1978-02-03 | 1983-11-10 | Shin Gijutsu Kaihatsu Jigyodan | Amorphous carbon alloys and articles manufactured therefrom |
| DE3133871A1 (de) * | 1981-08-27 | 1983-03-10 | M.A.N. Maschinenfabrik Augsburg-Nürnberg AG, 8000 München | Verfahren zur herstellung homogener beschichtungen aus zwei oder mehreren metallen und/oder metallverbindungen |
| AU560521B2 (en) * | 1982-10-18 | 1987-04-09 | Energy Conversion Devices Inc. | Layered amorphous semiconductor alloys |
-
1986
- 1986-06-24 CA CA000512281A patent/CA1292646C/en not_active Expired - Fee Related
- 1986-06-27 EP EP86305012A patent/EP0207759B1/en not_active Expired - Lifetime
- 1986-06-27 DE DE8686305012T patent/DE3687720T2/de not_active Expired - Fee Related
- 1986-07-02 AU AU59495/86A patent/AU588608B2/en not_active Ceased
- 1986-07-02 BR BR8603100A patent/BR8603100A/pt unknown
- 1986-07-02 CN CN86104496A patent/CN1007915B/zh not_active Expired
- 1986-07-02 ZA ZA864911A patent/ZA864911B/xx unknown
- 1986-07-03 KR KR1019860005375A patent/KR900007457B1/ko not_active Expired
- 1986-07-03 JP JP61157164A patent/JPS6277464A/ja active Pending
- 1986-11-17 US US06/931,494 patent/US4851296A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0207759A2 (en) | 1987-01-07 |
| CN86104496A (zh) | 1986-12-31 |
| DE3687720T2 (de) | 1993-06-09 |
| KR900007457B1 (ko) | 1990-10-10 |
| DE3687720D1 (de) | 1993-03-25 |
| KR870001320A (ko) | 1987-03-13 |
| EP0207759A3 (en) | 1988-12-14 |
| CA1292646C (en) | 1991-12-03 |
| EP0207759B1 (en) | 1993-02-10 |
| BR8603100A (pt) | 1987-02-17 |
| US4851296A (en) | 1989-07-25 |
| AU5949586A (en) | 1987-01-08 |
| AU588608B2 (en) | 1989-09-21 |
| ZA864911B (en) | 1987-03-25 |
| JPS6277464A (ja) | 1987-04-09 |
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