CN100547366C - phase-shifting transverse shear interferometer - Google Patents
phase-shifting transverse shear interferometer Download PDFInfo
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- CN100547366C CN100547366C CNB2007100451472A CN200710045147A CN100547366C CN 100547366 C CN100547366 C CN 100547366C CN B2007100451472 A CNB2007100451472 A CN B2007100451472A CN 200710045147 A CN200710045147 A CN 200710045147A CN 100547366 C CN100547366 C CN 100547366C
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- 238000010008 shearing Methods 0.000 claims abstract description 85
- 230000003287 optical effect Effects 0.000 claims abstract description 13
- 239000000463 material Substances 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 11
- 230000007246 mechanism Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- 238000005259 measurement Methods 0.000 abstract description 6
- 238000001514 detection method Methods 0.000 abstract description 3
- 230000010363 phase shift Effects 0.000 description 23
- 238000006073 displacement reaction Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 230000008859 change Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
- G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
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Abstract
一种移相横向剪切干涉仪，由第一起偏器、输入平行平板、第二起偏器、第三起偏器、第一剪切平板、第二剪切平板、输出平行平板、四分之一波片、检偏器、CCD相机和计算机组成，该移相横向剪切干涉仪为等光程干涉光学系统，剪切量连续可调，非常适合于短相干长度光束的波前测量，能满足不同光束口径和测量精度要求的波前检测。
A phase-shifting transverse shearing interferometer is composed of a first polarizer, an input parallel plate, a second polarizer, a third polarizer, a first shearing plate, a second shearing plate, an output parallel plate, a quarter wave plate, an analyzer, a CCD camera and a computer. The phase-shifting transverse shearing interferometer is an equal optical path interference optical system with a continuously adjustable shearing amount, which is very suitable for wavefront measurement of short coherence length light beams and can meet wavefront detection requirements of different light beam apertures and measurement accuracy.
Description
Technical field
The present invention relates to optical interferometry, is a kind of phase shifting lateral direction shearing interferometer, and particularly a kind of aplanatism is interfered, the continuously adjustable phase shifting lateral direction shearing interferometer of shearing displacement.
Background technology
The lateral shearing interference method is wavefront to be measured to be duplicated wavefront interfere with it, the systematic error of having been introduced when having avoided adopting standard wave preceding, have simple structure, low environmental requirement and high measuring accuracy, in wavefront measurement, bringing into play more and more important effect with its original advantage.In lateral shearing interferometer, introduce phase shift technology formation phase shifting lateral direction shearing interferometer and can further improve its performance, handle, provide wavefront three-dimensional appearance etc. as the robotization that improves sensitivity and measuring accuracy, realization interferogram.
Formerly technology [1] is (referring to Liu Xiaojun, Zhang Ming, Li Zhu. " development of road phase shift shear interference measuring instrument altogether ". HUST's journal, vol.27, No.3,16-18,1999) a kind of phase shifting lateral direction shearing interferometer described, it utilizes the birefringence effect of crystal to produce shearing displacement, adopts the polarization phase-shift theory to carry out phase shift.If adopt aplanatic combined type birefringece crystal, it can be the phase shift shearing interferometer that aplanatism is interfered.If change its shearing displacement by the rotation birefringece crystal, then it can not keep the aplanatism interference condition.Therefore, this phase shifting lateral direction shearing interferometer can not obtain aplanatism interference and the continuously adjustable feature of shearing displacement simultaneously.
Formerly technology [2] is (referring to DeVon W.Griffin. " Phase-shifting interferometer " .Optics Letter, Vol.26, No.3,140-141,2001) phase shifting lateral direction shearing interferometer that adopts simple shear to cut element has been described, it is to be clipped in liquid crystal retardation device between the flat board as phase shifting component, by changing the phase shift that control voltage produces continuous variable.This phase shift shearing interferometer does not need fine registration, and structure is comparatively simple, but it is the phase shift shearing interferometer that non-aplanatism is interfered, and its horizontal shear capacity can not be adjusted.
Formerly technology [3] is (referring to Jae Bong Song, Yun Woo Lee, In Won Lee, Yong-Hee Lee. " Simple phase-shifting method in a wedge-plate lateral-shearing interferometer " .Applied Optics, Vol43, No.20,3989-39929,2004) described the phase shifting lateral direction shearing interferometer of a kind of single wedge as shearing elements in, it produces phase shift by parallel mobile wedge in surface level, and phase shifting accuracy is higher.But its shearing displacement is non-adjustable, also is simultaneously the phase shift shearing interferometer that a kind of non-aplanatism is interfered.
Formerly technology [4] is (referring to Sanjib Chatterjee. " Measurement of single-pass wavefrontdistortion of optical components with phase shifting Jamin interferometer " .OpticalEngineering, Vol.43, No.4,872-8799,2004) a kind of phase shifting lateral direction shearing interferometer based on refined quick interferometer has been described, it carries out trace with a wedge in the double wedge plate and moves to produce phase shift, but the shearing displacement of this interferometer is non-adjustable equally, and its just is similar to equal optical path interference in the phase shift process.
Summary of the invention
The objective of the invention is to overcome the deficiency of above-mentioned technology formerly, a kind of phase shifting lateral direction shearing interferometer is provided.This phase shifting lateral direction shearing interferometer is the aplanatism interference optics, is very suitable for the wavefront measurement of short-phase dry length light beam, and shearing displacement can continuously change, and can satisfy the wavefront detection that different beam sizes and measuring accuracy require.
Technical solution of the present invention is as follows:
A kind of phase shifting lateral direction shearing interferometer, shear flat board, the second shearing flat board, output parallel flat, quarter-wave plate, analyzer, CCD camera and computing machine by first polarizer, input parallel flat, second polarizer, the 3rd polarizer, first and form, its position relation is as follows:
First polarizer be in the input parallel flat a side and in input path, incident beam and described input parallel flat are at 45, material and the parallel placement identical of described output parallel flat and described input parallel flat with thickness, between described input parallel flat and output parallel flat, second polarizer and first is set in the reflected light path of the first medium face of described input parallel flat to be sheared dull and stereotyped, the 3rd polarizer and second is set in the reflected light path of the second medium face of described input parallel flat to be sheared dull and stereotyped, dull and stereotyped and second material and the vergence direction on the contrary symmetry placement identical of shearing flat board of described first shearing with thickness, this first shearing flat board and second is sheared the dull and stereotyped mechanism that carries out reverse rotation around common axis simultaneously that has, the material of described second polarizer and the 3rd polarizer is identical with thickness, be quarter-wave plate successively in the emitting light path of described output parallel flat, analyzer and CCD camera, the output terminal of this CCD camera links to each other with described input end and computer.
The inclined to one side utensil of described the first continuously changes the axial rotating mechanism of its printing opacity, and described analyzer has and continuously changes the axial rotating mechanism of its printing opacity.
The plane of incidence of described input parallel flat is in the surface level, and described second polarizer is vertical mutually with the light transmission shaft of the 3rd polarizer, and parallel or vertical with the plane of incidence of input parallel flat.The quick shaft direction and the surface level of described quarter-wave plate are at 45.
The light transmission shaft direction of the quick shaft direction of described quarter-wave plate and second polarizer, the 3rd polarizer is angle at 45 respectively.
It can be optical parallel plate that the described first shearing flat board and second is sheared flat board, and then their optical material is identical with thickness.If described first shears dull and stereotyped and the second shearing flat board optics plate wedge, then their optical material, thickness are identical with the angle of wedge.Described first shears dull and stereotyped and second to shear dull and stereotyped vergence direction opposite, can wind common axis reverse rotation simultaneously perpendicular to the plane of incidence with the change shearing displacement.
Described first polarizer, second polarizer, the 3rd polarizer and analyzer can be ahrens prisms, perhaps polaroid, perhaps other linearly polarized light generator.
Described input parallel flat is identical with the optical material of exporting parallel flat and thickness is equal.
Described quarter-wave plate can be birefringece crystal wave plate or rib build phase delay device.
Described computing machine is the computing machine with phase shift shear interference striped process software.
Technique effect of the present invention is as follows:
1, phase shifting lateral direction shearing interferometer of the present invention, the introducing of phase shift technology make shearing interferometer can further improve its performance, handle, provide wavefront three-dimensional appearance etc. as the robotization that improves sensitivity and measuring accuracy, realization interferogram.
2, the wavefront applicable to different beam sizes and measuring accuracy requirement detects.First of phase shifting lateral direction shearing interferometer of the present invention is sheared dull and stereotyped and the second shearing flat board can make shearing displacement adjustable continuously around common axis reverse rotation simultaneously.The variation of shearing displacement can be satisfied the requirement of different beam sizes and measuring accuracy.
3, can carry out wavefront to the light beam of short-phase dry length detects.Be the aplanatism interference optics in the phase shifting lateral direction shearing interferometer of the present invention, can carry out the wavefront detection the light beam even the white light of short-phase dry length.
Description of drawings
Fig. 1 is the structural representation of phase shifting lateral direction shearing interferometer of the present invention.
Fig. 2 is Φ=10mm for the present invention at tested beam size, when shearing displacement is 2.5mm, and the phase-shift interference that when analyzer rotates 45 ° successively, obtains.
Fig. 3 is Φ=10mm for the present invention at tested beam size, when shearing displacement is 4mm, and the phase-shift interference that when analyzer rotates 45 ° successively, obtains.
Embodiment
At first consult Fig. 1, Fig. 1 is the structural representation of phase shifting lateral direction shearing interferometer embodiment of the present invention.As seen from the figure, phase shifting lateral direction shearing interferometer of the present invention is by first polarizer 1, input parallel flat 2,, second polarizer 3, the 3rd polarizer 4, first shear dull and stereotyped 5, second and shear dull and stereotyped 6, output parallel flat 7, quarter-wave plate 8, analyzer 9, CCD camera 10 and computer processing system 11 and form.
First polarizer 1 be in the input parallel flat 2 a side and in its input path.Incident beam is at 45 with input parallel flat 2.Input parallel flat 2 and material and the parallel placement identical of exporting parallel flat 7 with thickness.First shear dull and stereotyped 5 and second shear dull and stereotyped 6 material identical with thickness and symmetrical be positioned over import parallel flat 2 and export parallel flat 7 between, the vergence direction that flat board 6 is sheared in first shearing dull and stereotyped 5 and second is opposite, can carry out reverse rotation, direction shown in arrow among Fig. 1 simultaneously around common axis.The material of second polarizer 3 and the 3rd polarizer 4 is identical with thickness, all is in after the input parallel flat 2, and first shears dull and stereotyped 5 and second sheared before dull and stereotyped 6.Quarter-wave plate 8 and analyzer 9 place after the output parallel flat 7 and at its emitting light path.Place CCD cameras 10 in analyzer 9 back, the output terminal of this CCD camera links to each other with the input end of described process computer system 11.
First polarizer 1 can rotate continuously to change its light transmission shaft direction.The plane of incidence of input parallel flat 2 is in the surface level.The light transmission shaft of second polarizer 3, the 3rd polarizer 4 is parallel respectively, perpendicular to surface level.The quick shaft direction of quarter-wave plate 8 and surface level angle at 45.Analyzer 9 can rotate continuously to change its light transmission shaft direction.
The course of work of the present invention is as follows:
Light beam to be measured becomes linearly polarized light after through first analyzer 1, be incident on the input parallel flat 2 with 45 ° of incident angles, be divided into two-way after first dielectric surface 21 of process input parallel flat 2 and the reflection of second dielectric surface 22, the two-way light beam forms the orthogonal linearly polarized light in polarization direction through orthogonal second polarizer 3 in polarization direction and the 3rd polarizer 4 backs respectively, then respectively through the dull and stereotyped 6 back generation lateral shears of dull and stereotyped 5 and second shearing of the first opposite shearing of vergence direction, close bundle after first dielectric surface 71 of last two-way light beam process output parallel flat 7 and the reflection of second dielectric surface 72, closing light beam behind the bundle produces through quarter-wave plate 8 and analyzer 9 backs and interferes, substep rotates analyzer 9 and forms phase-shift interference, and image is gathered by CCD10 and input computing machine 11 carries out Flame Image Process.
Corresponding in the interference image a bit, the wavefront of the two-way light beam by second polarizer 3 and the 3rd polarizer 4 can be expressed as Aexp (j θ with complex amplitude
a) and Bexp (j θ
b), wherein A, B are respectively the amplitude of two-way light beam, θ
aAnd θ
bBe respectively the phase place of two-way light beam.Might as well be that the position angle is expressed as φ with the angle between the quick shaft direction of the light transmission shaft direction of analyzer 9 and quarter-wave plate 8, then Dui Ying interference light intensity can be expressed as
In above-mentioned interference light intensity computing formula, therefore the additive phase that 2 φ produce when being rotation analyzer 9 just can carry out the phase shift adjusting when analyzer 9 rotations, and its phase shift variable quantity is azimuthal twice of analyzer 9.Gather a series of phase-shift interference images in the process of rotation analyzer 9, it is poor that computing machine 11 utilizes the interference image process software can solve in the interference image every bit corresponding phase, and machine 11 further processing can obtain high-precision wavefront testing result as calculated.
Fig. 1 is the structural drawing of most preferred embodiment of the present invention, and its concrete structure and statement parameter are as follows:
Input parallel flat 2 is 155mm * 70mm * 40mm with the size of output parallel flat 7, and its material is K9 glass.First shears dull and stereotyped 5 and second shearing dull and stereotyped 6 is the optics plate wedge, and its thickness is 40mm, and its material is K9 glass.First shears dull and stereotyped 5 and second shearing dull and stereotyped 6 can rotate in 0～30 ° of scope continuously, can realize the adjustable continuously of shearing displacement.It is 100: 1 polaroid that first polarizer 1, second polarizer 3 and the 3rd polarizer 4 are extinction ratio, and its bore is Φ 40mm.Analyzer 9 is 100: 1 a polaroid for extinction ratio, and its bore is Φ 50mm.Quarter-wave plate 8 is that the phase delay accuracy of measurement is the quartz wave-plate of λ/300 (wherein λ is 632.8nm), and its bore is Φ 50mm.
Present embodiment is that Φ 10mm, wavelength are that the light beam to be measured of 632.8nm carries out wavefront and detects to bore, and its interference image is received by CCD camera 10.In the present embodiment, when shearing displacement is 2.5mm, the light transmission shaft direction of analyzer 9 is identical with the quick shaft direction of quarter-wave plate 8 when being φ=0 °, and light beam to be measured enters the interference image gathered by CCD camera 10 behind the present embodiment shown in Fig. 2 (a).Analyzer 9 rotates 45 ° when making φ be followed successively by 45 °, 90 °, 135 ° successively, and promptly one by one during 90 ° of phase shifts, the interference image that CCD camera 10 is gathered is shown in Fig. 2 (b)～(d).When shearing displacement is 4mm, when the angle between the fast axle of the light transmission shaft of analyzer 9 and quarter-wave plate 8 is 0 °, 45 °, 90 °, 135 °, can obtain the phase-shift interference shown in Fig. 3 (a)～(d).Can find out significantly each comfortable four width of cloth interference image of interference fringe from Fig. 2,3 displacement has taken place successively that not only shearing displacement is adjustable for visible present embodiment, and can realize the phase shift of lateral shearing interference image well.
Claims (8)
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| CNB2007100451472A CN100547366C (en) | 2007-08-22 | 2007-08-22 | phase-shifting transverse shear interferometer |
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Cited By (1)
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|---|---|---|---|---|
| EP3176552A4 (en) * | 2014-07-30 | 2018-02-14 | Hamamatsu Photonics K.K. | Collimation evaluation device and collimation evaluation method |
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| CN111256582B (en) * | 2020-01-22 | 2021-09-07 | 中国计量大学 | Transient phase-shifting transverse shear interferometer and measurement method |
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| CN114545584B (en) * | 2022-02-17 | 2023-11-03 | 长沙麓邦光电科技有限公司 | Fitting consistency verification method for wedge-shaped flat shearing interferometer |
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| US10260987B2 (en) | 2014-07-30 | 2019-04-16 | Hamamatsu Photonics K.K. | Collimation evaluation device and collimation evaluation method |
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