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CN100508243C - OLED devices that emit red light - Google Patents

OLED devices that emit red light Download PDF

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CN100508243C
CN100508243C CNB2006101235584A CN200610123558A CN100508243C CN 100508243 C CN100508243 C CN 100508243C CN B2006101235584 A CNB2006101235584 A CN B2006101235584A CN 200610123558 A CN200610123558 A CN 200610123558A CN 100508243 C CN100508243 C CN 100508243C
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CN1964097A (en
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柯贤军
邝颂贤
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Truly Semiconductors Ltd
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Abstract

本发明公开了一种发红光的OLED器件,包括基板、阳极、置于阳极上的空穴注入层、置于空穴注入层上的空穴传输层、置于空穴传输层上的发红光层、置于发红光层上的电子传输层、置于电子传输层上的电子注入层、置于电子注入层上的阴极层,在所述空穴传输层与发光层之间或/和发光层与电子传输层之间设置有用于提高发光效率的嵌入层。此结构在原来结构的基础上嵌入一层,因此不会与其它结构或者做法相冲突。嵌入后的器件,光谱没有变化,效率有了明显提高。

The invention discloses a red light-emitting OLED device, which comprises a substrate, an anode, a hole injection layer placed on the anode, a hole transport layer placed on the hole injection layer, and a light emitting layer placed on the hole transport layer. Red light layer, electron transport layer placed on the red light emitting layer, electron injection layer placed on the electron transport layer, cathode layer placed on the electron injection layer, between the hole transport layer and the light emitting layer or/ An embedding layer for improving luminous efficiency is arranged between the luminescent layer and the electron transport layer. This structure embeds a layer on top of the original structure, so it doesn't conflict with other structures or practices. After embedding, the spectrum of the device does not change, and the efficiency has been significantly improved.

Description

发红光的OLED器件 OLED devices that emit red light

技术领域 technical field

本发明涉及一种有机电致发光显示器件OLED,尤其是涉及一种发红光的OLED器件。The invention relates to an organic electroluminescence display device OLED, in particular to a red light-emitting OLED device.

背景技术 Background technique

有机电致发光器件(即organic light emitting diode简称OLED)结构包括基板、阳极、阴极,在阳极和阴极之间是各种功能有机/无机层,包括但不限于空洞注入层(HIL),空洞传输层(HTL),发光层(EML),电子传输层(ETL),电子注入层(EIL)。为了提高效能,发光层的结构往往是主体/客体掺杂系统,即利用能量转移的原理把有机发光染料掺进有机发光主体里使得有机发光染料受激发光。The structure of organic electroluminescent devices (that is, organic light emitting diode referred to as OLED) includes a substrate, an anode, and a cathode. Between the anode and the cathode are various functional organic/inorganic layers, including but not limited to hole injection layers (HIL), hole transport layer (HTL), light emitting layer (EML), electron transport layer (ETL), electron injection layer (EIL). In order to improve the efficiency, the structure of the light-emitting layer is often a host/guest doping system, that is, the organic light-emitting dye is doped into the organic light-emitting host by using the principle of energy transfer, so that the organic light-emitting dye is excited to emit light.

目前发红光的OLED器件发光层广泛做法是采用双主体单掺杂的方法,具体的结构为:ITO/2TNATA:F4TCNQ(3%,100nm)/NPB(20nm)/Alq3+rubrene:red dopant(2%,50nm)/BPhen(20nm)/LiF(1nm)/Al(150nm)。但是受到材料的限制,红色器件的发光效率一直都没有很大的提高,目前红色器件效率最高可以达到6CD/A左右。At present, the common method of emitting red light-emitting OLED devices is to adopt the method of double main body single doping, and the specific structure is: ITO/2TNATA: F4TCNQ (3%, 100nm)/NPB (20nm)/Alq3+rubrene: red dopant ( 2%, 50nm)/BPhen(20nm)/LiF(1nm)/Al(150nm). However, due to the limitation of materials, the luminous efficiency of red devices has not been greatly improved. At present, the efficiency of red devices can reach about 6CD/A.

发明目的purpose of invention

本发明的目的在于提供一种能提高发光效率的红色OLED器件。The object of the present invention is to provide a red OLED device capable of improving luminous efficiency.

上述目的可通过以下的技术措施来实现:一种发红光的OLED器件,包括基板、阳极、置于阳极上的空穴注入层、置于空穴注入层上的空穴传输层、置于空穴传输层上的发红光层、置于发红光层上的电子传输层、置于电子传输层上的电子注入层、置于电子注入层上的阴极层,其特征在于:在所述空穴传输层与发光层之间或/和发光层与电子传输层之间设置有用于提高发光效率的嵌入层。The above object can be achieved through the following technical measures: a red light-emitting OLED device, comprising a substrate, an anode, a hole injection layer placed on the anode, a hole transport layer placed on the hole injection layer, The red light-emitting layer on the hole transport layer, the electron transport layer placed on the red light-emitting layer, the electron injection layer placed on the electron transport layer, and the cathode layer placed on the electron injection layer are characterized in that: An embedding layer for improving luminous efficiency is provided between the hole transport layer and the light emitting layer or/and between the light emitting layer and the electron transport layer.

本发明所述的嵌入层厚度为0.01nm~1nm之间。The thickness of the embedding layer described in the present invention is between 0.01nm and 1nm.

本发明所述嵌入层采用的材料为红荧七(rubrene)或其衍生物。The material used for the embedding layer in the present invention is rubrene or its derivatives.

本发明所述发光层的发光材料为荧光材料或磷光材料。The luminescent material of the luminescent layer in the present invention is a fluorescent material or a phosphorescent material.

此发明在发光层(EML)与电子传输层(ETL)之间或者空穴传输层(HTL)与发光层(EML)之间加入一非常薄的红荧七嵌入层。此结构在原来结构的基础上嵌入一层,因此不会与其它结构或者做法相冲突。在其它层结构和厚度完全一致的情况下,比较是否插入薄层红荧七嵌入的器件效果。插入后的器件效率较之未插入前,光谱没有变化,效率有了明显提高。This invention adds a very thin red fluorescent seven intercalation layer between the light emitting layer (EML) and the electron transport layer (ETL) or between the hole transport layer (HTL) and the light emitting layer (EML). This structure embeds a layer on top of the original structure, so it doesn't conflict with other structures or practices. In the case of other layer structures and thicknesses being exactly the same, compare the device effects of inserting or not inserting a thin layer of red fluorescent seven. Compared with the uninserted device, the efficiency of the inserted device has no change in the spectrum, and the efficiency has been significantly improved.

比较结构A(传统器件结构)和B(带薄红荧七嵌入到传统结构里),A,B的效率分别是5.84CD/A和7.33CD/。B结构比A结构的效率提高了1.49CD/A,而器件的颜色并没有改变(A和B色坐标都是0.65,0.34)(可从图2看到)。Comparing structures A (traditional device structure) and B (with thin red fluorescent seven embedded in the traditional structure), the efficiencies of A and B are 5.84CD/A and 7.33CD/, respectively. The efficiency of the B structure is increased by 1.49CD/A compared with the A structure, but the color of the device has not changed (A and B color coordinates are both 0.65, 0.34) (see Figure 2).

通过这样的改变后,从电流-电压(图3)和亮度-电压(图4)曲线来看,结构B器件的电压有一点上升,陡度也稍微变大。但是其光谱没有变化,只是亮度明显增强。After such a change, from the current-voltage (Figure 3) and brightness-voltage (Figure 4) curves, the voltage of the structure B device is slightly increased, and the steepness is also slightly increased. However, its spectrum has not changed, but its brightness has increased significantly.

效率提高的原因有两个:There are two reasons for this increase in efficiency:

1)薄红荧七嵌入层形成了空穴捕捉中心(hole trap center),在复合时,把本该逃离发光层的一部分激子限制在发光层的边缘,有效地阻挡了一部分激子使其在边缘发光使其在边缘再次受激发而发光;1) The thin red fluorescent seven intercalation layer forms a hole trap center. During recombination, some excitons that should have escaped from the light-emitting layer are confined to the edge of the light-emitting layer, effectively blocking some excitons so that they Lighting at the edge causes it to be excited again at the edge to emit light;

2)薄红荧七嵌入层本身发光,通过

Figure C200610123558D0005132541QIETU
能量传输,把能量转移到红色发光材料,使其发光。而且由于空穴捕捉中心的作用,对整个器件的平衡起到了有利作用,同时器件的寿命也得到了提高。2) The thin red fluorescent seven embedding layer itself emits light, through
Figure C200610123558D0005132541QIETU
Energy transfer, transferring energy to red luminescent material, making it glow. Moreover, due to the function of the hole capturing center, the balance of the whole device is played a favorable role, and the lifetime of the device is also improved at the same time.

附图说明 Description of drawings

图1为设有红荧七嵌入薄层的红光OLED器件整体结构示意图。FIG. 1 is a schematic diagram of the overall structure of a red OLED device with a red fluorescent seven embedded thin layer.

图2为比较设有红荧七嵌入薄层和没设红荧七嵌入薄层的两种器件结构的EL光谱。Figure 2 is a comparison of the EL spectra of two device structures with and without a red fluorescent seven embedded thin layer.

图3为比较设有红荧七嵌入薄层和没设红荧七嵌入薄层两种器件结构的电压-电流密度曲线。Fig. 3 is a comparison of the voltage-current density curves of two device structures with red fluorescent seven embedded thin layer and without red fluorescent seven embedded thin layer.

图4为比较设有红荧七嵌入薄层和没设红荧七嵌入薄层两种器件结构的电流-亮度曲线。Figure 4 is a comparison of the current-brightness curves of two device structures with red fluorescent seven embedded thin layer and without red fluorescent seven embedded thin layer.

具体实施方式 Detailed ways

小分子有机发光二极管的制作原理是在预先蒸镀好ITO的基板上,在高真空腔里,用蒸镀的方式在玻璃基板上沉积多层功能层和发光层薄膜。在这里ITO用作透明阳极。此发光器件的制作步骤如下:The production principle of small molecule organic light-emitting diodes is to deposit multi-layer functional layers and light-emitting layer films on a glass substrate by evaporation in a high vacuum chamber on a pre-evaporated ITO substrate. Here ITO is used as transparent anode. The fabrication steps of this light-emitting device are as follows:

(a)已清洗干净的ITO基板10。(a) The cleaned ITO substrate 10 .

(b)阳极ITO 11基板用O2plasma处理。(b) The anode ITO 11 substrate was treated with O 2 plasma.

(c)镀有机膜层顺序依次是:空穴注入层12,空穴传输层13,红荧七嵌入薄层14,发红光层15,红荧七嵌入薄层16,电子传输层17,电子注入层18。上述嵌入薄层14和16也可只选其中一层。(c) The sequence of coating organic film layers is: hole injection layer 12, hole transport layer 13, red fluorescent seven embedded thin layer 14, red light emitting layer 15, red fluorescent seven embedded thin layer 16, electron transport layer 17, Electron injection layer 18 . The above-mentioned embedding thin layers 14 and 16 may also be only one of them.

(d)空穴注入层的制作方法是用两种材料以主体和掺杂的方式混蒸,形成P型结构,以降低器件电压。掺杂的浓度控制在0.5%~10%。每个蒸发源的蒸发速率和温度都是独立控制。发红光层15发光材料为荧光材料或磷光材料。(d) The manufacturing method of the hole injection layer is to use two materials in the form of host and doping to form a P-type structure, so as to reduce the voltage of the device. The concentration of doping is controlled at 0.5%-10%. Evaporation rate and temperature are independently controlled for each evaporation source. The light emitting material of the red light emitting layer 15 is a fluorescent material or a phosphorescent material.

(e)蒸镀嵌入层时用低速率控制或者温度控制,蒸镀速率尽可能地小,这样膜的均匀性较好。一般速率控制在0.001~0.5,由于红荧七嵌入的能量转移效率是100%,所以此红荧七嵌入层不需要太厚,厚度设置在0.01nm~1nm之间。蒸镀的时间不长,不会影响到生产节拍。嵌入层采用的材料为红荧七或其衍生物。上述其他各层按常规处理。(e) When evaporating the embedded layer, use low rate control or temperature control, and the evaporation rate should be as small as possible, so that the uniformity of the film is better. The general rate is controlled at 0.001~0.5 , because the energy transfer efficiency of the red fluorescent seven intercalation is 100%, so the red fluorescent seven intercalation layer does not need to be too thick, and the thickness is set between 0.01nm and 1nm. The evaporation time is not long and will not affect the production beat. The material used for the embedding layer is red fluorescent seven or its derivatives. The other layers above are processed as usual.

(f)蒸镀阴极铝19。(f) Cathode aluminum 19 is evaporated.

(g)在后盖上贴好干燥剂,然后点胶封装,整个流程都在纯N2环境中进行。(g) Paste a desiccant on the back cover, and then dispense glue for packaging. The whole process is carried out in a pure N 2 environment.

通过上述步骤制得的本发明实施例一:ITO/2TNATA:F4TCNQ(3%,100nm)/NPB(20nm)/rubrene(0.01~1nm)/Alq3+rubrene:red dopant(2%,50nm)/BPhen(20nm)/LiF(1nm)/Al(150nm)Embodiment 1 of the present invention made by the above steps: ITO/2TNATA: F4TCNQ (3%, 100nm)/NPB (20nm)/rubrene (0.01~1nm)/Alq3+rubrene: red dopant (2%, 50nm)/BPhen (20nm)/LiF(1nm)/Al(150nm)

通过上述步骤制得的本发明实施例二:ITO/2TNATA:F4TCNQ(3%,100nm)/NPB(20nm)/Alq3+rubrene:red dopant(2%,50nm)/rubrene(0.01~1nm)/BPhen(20nm)/LiF(1nm)/Al(150nm)Embodiment 2 of the present invention made by the above steps: ITO/2TNATA: F4TCNQ (3%, 100nm)/NPB (20nm)/Alq3+rubrene: red dopant (2%, 50nm)/rubrene (0.01~1nm)/BPhen (20nm)/LiF(1nm)/Al(150nm)

通过上述步骤制得的本发明实施例三:ITO/2TNATA:F4TCNQ(3%,100nm)/NPB(20nm)/rubrene(0.01~1nm)/Alq3+rubrene:reddopant(2%,50nm)/rubrene(0.01~1nm)/BPhen(20nm)/LiF(1nm)/Al(150nm)。Embodiment 3 of the present invention obtained by the above steps: ITO/2TNATA: F4TCNQ (3%, 100nm)/NPB (20nm)/rubrene (0.01~1nm)/Alq3+rubrene: reddopant (2%, 50nm)/rubrene ( 0.01~1nm)/BPhen(20nm)/LiF(1nm)/Al(150nm).

传统结构的效率和电压分别是5.84CD/A和5.92V@50mA/cm2,而本发明上述实施例一和二的效率和电压分别可以达到7.33CD/A和6.28V@50mA/cm2。实施例三的效率和电压分别可以达到7.28CD/A和6.97V。The efficiency and voltage of the traditional structure are 5.84CD/A and 5.92V@50mA/cm2 respectively, while the efficiency and voltage of the first and second embodiments of the present invention can reach 7.33CD/A and 6.28V@50mA/cm2 respectively. The efficiency and voltage of Example 3 can reach 7.28CD/A and 6.97V respectively.

Claims (4)

1, a kind of OLED device that glows, comprise substrate, anode, place the hole injection layer on the anode, place the hole transmission layer on the hole injection layer, place the rubescent photosphere on the hole transmission layer, place the electron transfer layer on the rubescent photosphere, place the electron injecting layer on the electron transfer layer, place the cathode layer on the electron injecting layer, it is characterized in that: between described hole transmission layer and luminescent layer, be provided with the embeding layer that is used to improve luminous efficiency, perhaps be provided with the embeding layer that is used to improve luminous efficiency between luminescent layer and the electron transfer layer, perhaps simultaneously at luminescent layer and electron transfer layer, be provided with the embeding layer that is used to improve luminous efficiency between the hole transmission layer.
2, according to the described OLED device that glows of claim 1, it is characterized in that: described embeding layer thickness is between 0.01nm~1nm.
3, according to the described OLED device that glows of claim 1, it is characterized in that: the material that described embeding layer adopts is red glimmering seven.
4, according to the described OLED device that glows of claim 1, it is characterized in that: the luminescent material of described luminescent layer is fluorescent material or phosphor material.
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