[go: up one dir, main page]

CN100401009C - Long working distance interference microscope system - Google Patents

Long working distance interference microscope system Download PDF

Info

Publication number
CN100401009C
CN100401009C CNB2006100829570A CN200610082957A CN100401009C CN 100401009 C CN100401009 C CN 100401009C CN B2006100829570 A CNB2006100829570 A CN B2006100829570A CN 200610082957 A CN200610082957 A CN 200610082957A CN 100401009 C CN100401009 C CN 100401009C
Authority
CN
China
Prior art keywords
polarized light
working distance
linearly polarized
long working
wollaston prism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2006100829570A
Other languages
Chinese (zh)
Other versions
CN1862219A (en
Inventor
段俐
康琦
胡良
阿燕
于泳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institute of Mechanics of CAS
Original Assignee
Institute of Mechanics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Mechanics of CAS filed Critical Institute of Mechanics of CAS
Priority to CNB2006100829570A priority Critical patent/CN100401009C/en
Publication of CN1862219A publication Critical patent/CN1862219A/en
Application granted granted Critical
Publication of CN100401009C publication Critical patent/CN100401009C/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

本发明公开了一种长工作距干涉显微镜系统,包括:起偏器、分束器、长工作距显微镜和由两个光轴互相垂直的双折射直角棱镜粘合而成的渥拉斯顿棱镜,光源经过所述起偏器形成线偏振光,并经所述分束器反射后再通过所述渥拉斯顿棱镜,将入射线偏振光分成两束具有微小夹角并且振动方向互相垂直的线偏振光,该两束光投射到被测量样品上,从被测量样品表面反射回的两束正交线偏振光经原路返回,由所述渥拉斯顿棱镜重新复合共线,并经过一四分之一波片形成椭圆偏振光,再经过一检偏器后形成偏振方向相同的线偏振光。本发明对机械振动、空气扰动、以及温度变化等外界环境不敏感,其垂直测量分辨率达到50个纳米量级,具有50mm以上的工作距离。

Figure 200610082957

The invention discloses a long working distance interference microscope system, comprising: a polarizer, a beam splitter, a long working distance microscope and a Wollaston prism formed by bonding two birefringent right-angle prisms whose optical axes are perpendicular to each other , the light source passes through the polarizer to form linearly polarized light, and after being reflected by the beam splitter, it passes through the Wollaston prism to split the incident linearly polarized light into two beams with a small angle and the vibration directions are perpendicular to each other Linearly polarized light, the two beams of light are projected onto the sample to be measured, and the two beams of orthogonal linearly polarized light reflected from the surface of the sample to be measured return through the original path, are recombined and collinear by the Wollaston prism, and pass through A quarter-wave plate forms elliptically polarized light, and then passes through an analyzer to form linearly polarized light with the same polarization direction. The invention is insensitive to external environments such as mechanical vibration, air disturbance, and temperature change, and its vertical measurement resolution reaches 50 nanometers, and has a working distance of more than 50 mm.

Figure 200610082957

Description

长工作距干涉显微镜系统 Long working distance interference microscope system

技术领域 technical field

本发明涉及一种干涉显微镜系统。The invention relates to an interference microscope system.

背景技术 Background technique

许多学科领域的科学问题对微尺度的测量技术提出了越来越高的需求,微米量级的测量技术已经不能满足科学发展的需要,纳米尺度的测量技术研究已成为测量学领域努力实现的目标。目前已经存在的高精度的微尺度测量技术如原子力显微镜、扫描隧道显微镜等可以提供很高的测量精度,但是它们对机械振动、空气扰动、以及温度变化等外界环境非常敏感,并且是接触式测量,应用范围受到了一定的限制。Scientific problems in many disciplines have put forward higher and higher demands on micro-scale measurement technology. Micro-scale measurement technology can no longer meet the needs of scientific development. The research on nano-scale measurement technology has become the goal that the field of metrology strives to achieve. . Existing high-precision micro-scale measurement technologies such as atomic force microscopes and scanning tunneling microscopes can provide high measurement accuracy, but they are very sensitive to external environments such as mechanical vibration, air disturbance, and temperature changes, and are contact measurements. , the scope of application is limited.

发明内容 Contents of the invention

针对上述存在的问题,本发明的目的在于提供一种长工作距干涉显微镜系统,该显微镜系统能够实现纳米尺度的定量测量。In view of the above existing problems, the object of the present invention is to provide a long working distance interference microscope system, which can realize quantitative measurement at the nanometer scale.

为实现上述目的,发明一种长工作距干涉显微镜系统,包括:起偏器、分束器、长工作距显微镜和由两个光轴互相垂直的双折射直角棱镜粘合而成的渥拉斯顿(Wollaston)棱镜,光源经过所述起偏器形成线偏振光,并经所述分束器反射后再通过所述渥拉斯顿棱镜,将入射线偏振光分成两束具有微小夹角并且振动方向互相垂直的线偏振光,该两束光投射到被测量样品上,从被测量样品表面反射回的两束正交线偏振光经原路返回,由所述渥拉斯顿棱镜重新复合共线,并经过一四分之一波片形成椭圆偏振光,再经过一检偏器后形成偏振方向相同的线偏振光,发生干涉,通过长工作距显微镜和CCD相机接收图像信号,再传输给设置有图像处理软件的计算机进行图像采集和处理。In order to achieve the above purpose, a long working distance interference microscope system is invented, including: a polarizer, a beam splitter, a long working distance microscope and a Wollas bonded by two birefringent rectangular prisms whose optical axes are perpendicular to each other. Wollaston (Wollaston) prism, the light source forms linearly polarized light through the polarizer, and then passes through the Wollaston prism after being reflected by the beam splitter, and the incident linearly polarized light is divided into two beams with a small angle and Linearly polarized light with vibration directions perpendicular to each other. The two beams of light are projected onto the sample to be measured, and the two beams of orthogonal linearly polarized light reflected from the surface of the sample to be measured return through the original path and are recombined by the Wollaston prism. Collinear, and pass through a quarter-wave plate to form elliptically polarized light, and then pass through an analyzer to form linearly polarized light with the same polarization direction, interference occurs, and the image signal is received by a long working distance microscope and a CCD camera, and then transmitted Perform image acquisition and processing on a computer equipped with image processing software.

本发明通过采用非接触式的表面形貌光学测量技术,它将干涉技术、长工作距显微镜技术、图像采集及处理技术、相移技术等相结合,实现纳米尺度的定量测量。本发明对机械振动、空气扰动、以及温度变化等外界环境不敏感,其垂直测量分辨率达到50个纳米量级,具有50mm以上的工作距离,可以观察到一般的光学显微镜难以分辨到的细节,可应用于多种学科领域。The invention adopts the non-contact surface topography optical measurement technology, which combines interference technology, long working distance microscope technology, image acquisition and processing technology, phase shift technology, etc., to realize the quantitative measurement of nanoscale. The invention is not sensitive to external environments such as mechanical vibration, air disturbance, and temperature changes, and its vertical measurement resolution reaches 50 nanometers, with a working distance of more than 50mm, and can observe details that are difficult to distinguish by ordinary optical microscopes. Applicable to various disciplines.

附图说明 Description of drawings

图1为本发明结构示意图。Fig. 1 is a schematic diagram of the structure of the present invention.

图2为采用本发明检测的平晶和介质膜实物照片。Fig. 2 is a real photo of a flat crystal and a dielectric film detected by the present invention.

图3为平晶表面四步相移干涉条纹。Figure 3 shows the four-step phase shift interference fringes on the flat crystal surface.

图4为图3的表面型貌图。FIG. 4 is a surface topography diagram of FIG. 3 .

图5为介质膜表面干涉条纹。Figure 5 shows the interference fringes on the surface of the dielectric film.

图6为介质膜表面形变与渥拉斯顿棱镜基础形变之和。Figure 6 shows the sum of the surface deformation of the dielectric film and the basic deformation of the Wollaston prism.

图7为图6的介质膜表面型貌图。FIG. 7 is a surface topography diagram of the dielectric film in FIG. 6 .

图8和图9为原子力显微镜测量介质膜表面结果。Figure 8 and Figure 9 are the results of measuring the surface of the dielectric film by the atomic force microscope.

具体实施方式 Detailed ways

如图1所示,本发明包括:起偏器2、放大镜3、分束器10、长工作距显微镜7和由两个光轴互相垂直的双折射直角棱镜粘合而成的渥拉斯顿(Wollaston)棱镜5,光源1经过起偏器2形成线偏振光,通过放大镜3放大并经分束器10反射后,再通过渥拉斯顿棱镜5,将入射线偏振光分成两束具有微小夹角并且振动方向互相垂直的线偏振光,该两束光投射到被测量样品11上,从被测量样品表面反射回的两束正交线偏振光经原路返回,由渥拉斯顿棱镜5重新复合共线,再由反射镜4反射,经过一四分之一波片6形成椭圆偏振光,再经过一检偏器9后形成偏振方向相同的线偏振光,发生干涉,通过长工作距显微镜7和CCD相机8接收图像信号,再传输给设置有图像处理软件的计算机12进行图像处理,在长工作距显微镜7和CCD相机8之间设置毛玻璃13,以便于CCD相机8采集图像。计算机12通过传统的图像处理方法,即傅立叶变换法和四步相移法对图像进行计算和还原,将干涉图像还原为表面形貌图。As shown in Fig. 1, the present invention includes: polarizer 2, magnifying glass 3, beam splitter 10, long working distance microscope 7 and Wollaston formed by bonding two birefringent right-angle prisms whose optical axes are perpendicular to each other. (Wollaston) prism 5, the light source 1 forms linearly polarized light through the polarizer 2, is amplified by the magnifying glass 3 and reflected by the beam splitter 10, and then passes through the Wollaston prism 5, and the incident linearly polarized light is divided into two beams with tiny The two beams of linearly polarized light with angles and vibration directions perpendicular to each other are projected onto the sample 11 to be measured, and the two beams of orthogonal linearly polarized light reflected from the surface of the sample to be measured return through the original path and are passed by the Wollaston prism 5 recombines collinearly, and is reflected by the reflector 4 again, passes through a quarter-wave plate 6 to form elliptically polarized light, and then passes through an analyzer 9 to form linearly polarized light with the same polarization direction, interference occurs, and passes through a long working The microscope 7 and the CCD camera 8 receive the image signal, and then transmit it to the computer 12 provided with image processing software for image processing, and a ground glass 13 is arranged between the long working distance microscope 7 and the CCD camera 8, so that the CCD camera 8 collects images. The computer 12 calculates and restores the image through traditional image processing methods, namely Fourier transform method and four-step phase shift method, and restores the interference image to a surface topography map.

如图2所示,为用本发明检测的平晶和介质膜实物照片,如图3所示,为图2的平晶表面四步相移干涉条纹,图4为图3的表面型貌图,图3和图4分别给出平晶表面干涉条纹和表面型貌图,代表了渥拉斯顿棱镜产生的基础条纹,图5为介质膜表面干涉条纹,图6为介质膜表面形变与Wollaston棱镜基础形变之和,图7为图6的介质膜表面型貌图,图8和图9给出了原子力显微镜测量介质膜表面结果,最大变形为52nm,表明干涉显微镜可以实现50纳米形变的测量。As shown in Figure 2, it is a photo of flat crystal and dielectric film detected by the present invention, as shown in Figure 3, it is a four-step phase shift interference fringe on the flat crystal surface of Figure 2, and Figure 4 is a surface profile diagram of Figure 3 , Fig. 3 and Fig. 4 show the interference fringes and surface topography diagrams of the flat crystal surface respectively, which represent the basic fringes produced by the Wollaston prism. The sum of the basic deformation of the prism, Figure 7 is the surface topography of the dielectric film in Figure 6, Figure 8 and Figure 9 show the results of the surface of the dielectric film measured by the atomic force microscope, the maximum deformation is 52nm, indicating that the interference microscope can achieve the measurement of 50 nm deformation .

Claims (1)

1. long working distance interference microscope system, it is characterized in that, comprise: the polarizer, beam splitter, long working distance microscope and the wollaston prism that is bonded by two mutually perpendicular birefringence right-angle prisms of optical axis, light source forms linearly polarized light through the described polarizer, amplify by magnifier, and behind described beam splitter reflection again by described wollaston prism, incident ray polarized light is divided into two bundles has small angle and the mutually perpendicular linearly polarized light of direction of vibration, this two-beam projects on the measured sample, return through former road from two bundle orhtogonal linear polarizaiton light of measured sample return reflection surface, by the compound again conllinear of described wollaston prism, and through quarter-wave plate formation elliptically polarized light, again through forming the identical linearly polarized light in polarization direction behind the analyzer, interfere, receive picture signal by long working distance microscope and CCD camera, be transferred to the computing machine that is provided with image processing software again and carry out Flame Image Process, be provided with a frosted glass between long working distance microscope and the CCD camera, the long working distance microscope at first outputs to picture signal on the frosted glass, and then carries out image signal's collection by the CCD camera.
CNB2006100829570A 2006-06-21 2006-06-21 Long working distance interference microscope system Expired - Fee Related CN100401009C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNB2006100829570A CN100401009C (en) 2006-06-21 2006-06-21 Long working distance interference microscope system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNB2006100829570A CN100401009C (en) 2006-06-21 2006-06-21 Long working distance interference microscope system

Publications (2)

Publication Number Publication Date
CN1862219A CN1862219A (en) 2006-11-15
CN100401009C true CN100401009C (en) 2008-07-09

Family

ID=37389698

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2006100829570A Expired - Fee Related CN100401009C (en) 2006-06-21 2006-06-21 Long working distance interference microscope system

Country Status (1)

Country Link
CN (1) CN100401009C (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100941980B1 (en) * 2007-11-14 2010-02-11 한국표준과학연구원 High speed large area precision measuring device and method
CN101726844B (en) * 2008-10-21 2011-11-23 财团法人工业技术研究院 Interferometric Phase Contrast Microscopy
CN102539400B (en) * 2011-12-31 2013-10-09 广东工业大学 A high-precision fluorescence anisotropic microscopic imaging device and method
DE102017101829A1 (en) * 2017-01-31 2018-08-02 Carl Zeiss Microscopy Gmbh Arrangement for increasing the resolution of a laser scanning microscope
CN111426285A (en) * 2019-01-10 2020-07-17 上海明念激光科技有限公司 Cylinder outer surface detection device based on all-optical light field calculation

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2148311Y (en) * 1992-06-17 1993-12-01 哈尔滨工业大学 Surface microscopic appearance superprecision laser probe
US5420717A (en) * 1992-02-18 1995-05-30 Olympus Optical Co., Ltd. Adjustable-contrast microscope
CN2375961Y (en) * 1999-06-08 2000-04-26 束继祖 Real-time on-line diagnostic device for material fatigue crack test
US6721094B1 (en) * 2001-03-05 2004-04-13 Sandia Corporation Long working distance interference microscope
US6804009B2 (en) * 2000-05-03 2004-10-12 The Regents Of The University Of California Wollaston prism phase-stepping point diffraction interferometer and method
US20050146708A1 (en) * 2002-04-11 2005-07-07 Xunqing Shi Systems and methods for deformation measurement

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5420717A (en) * 1992-02-18 1995-05-30 Olympus Optical Co., Ltd. Adjustable-contrast microscope
CN2148311Y (en) * 1992-06-17 1993-12-01 哈尔滨工业大学 Surface microscopic appearance superprecision laser probe
CN2375961Y (en) * 1999-06-08 2000-04-26 束继祖 Real-time on-line diagnostic device for material fatigue crack test
US6804009B2 (en) * 2000-05-03 2004-10-12 The Regents Of The University Of California Wollaston prism phase-stepping point diffraction interferometer and method
US6721094B1 (en) * 2001-03-05 2004-04-13 Sandia Corporation Long working distance interference microscope
US20050146708A1 (en) * 2002-04-11 2005-07-07 Xunqing Shi Systems and methods for deformation measurement

Also Published As

Publication number Publication date
CN1862219A (en) 2006-11-15

Similar Documents

Publication Publication Date Title
JP7383048B2 (en) Displacement measuring device, displacement measuring method and photolithography device
CN102937411B (en) Double-frequency grating interferometer displacement measurement system
TWI401413B (en) Apparatus and method for measuring surface topography of an object
CN103307986B (en) A kind of two degrees of freedom heterodyne grating interferometer displacement measurement system
CN101893429B (en) Super-precision surface measuring system based on polarization phase-shifting microscopy interference technology
CN101691998B (en) Two-dimensional laser autocollimator
CN103673891B (en) A kind of grating difference interference self-collimation measurement device
CN106517086B (en) A kind of large area high-resolution wide visual field on-line measurement device and its measurement method
CN101666630B (en) Method and device for detecting precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry
WO2020052056A1 (en) Five-degree-of-freedom heterodyne grating interferometry system
CN106052569A (en) Heterodyne one/two-dimensional raster-displacement coarse/fine measurement system
CN109470173B (en) Double-channel simultaneous phase shift interference microscope system
CN105300273B (en) Dynamic Point Diffraction Interferometer with Adjustable Fringe Contrast
Ren et al. A three-dimensional small angle measurement system based on autocollimation method
CN108895986B (en) Microscopic three-dimensional topography measurement device based on fringe imaging projection
Huang et al. An optical glass plane angle measuring system with photoelectric autocollimator
CN102878935A (en) Device and method for measuring optical off-plane displacement field based on shearing speckle interference
CN101458073A (en) Multifunction measuring set based on laser micro-interference
CN101031830A (en) Optical sensor using low-coherence interferometry
CN100401009C (en) Long working distance interference microscope system
Kao et al. High resolution planar encoder by retro-reflection
CN106247947B (en) A kind of thick/thin measuring system of two/three-dimensional grating of heterodyne system displacement
CN1051975A (en) Contactless integrated measuring unit for mechanical vibration
CN108253897B (en) Large-range high-precision point diffraction interference three-dimensional coordinate measuring method
CN200969000Y (en) Long working distance interference microscope

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20080709

Termination date: 20160621