[go: up one dir, main page]

CN109881162A - 一种基于等离子喷涂技术的溅射用靶材制备工艺 - Google Patents

一种基于等离子喷涂技术的溅射用靶材制备工艺 Download PDF

Info

Publication number
CN109881162A
CN109881162A CN201811447256.1A CN201811447256A CN109881162A CN 109881162 A CN109881162 A CN 109881162A CN 201811447256 A CN201811447256 A CN 201811447256A CN 109881162 A CN109881162 A CN 109881162A
Authority
CN
China
Prior art keywords
powder
plasma
plasma spraying
preparation process
sputtering target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811447256.1A
Other languages
English (en)
Inventor
芮瑛
吉和林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201811447256.1A priority Critical patent/CN109881162A/zh
Priority to US16/284,830 priority patent/US20200173007A1/en
Publication of CN109881162A publication Critical patent/CN109881162A/zh
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/02Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/447Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on phosphates, e.g. hydroxyapatite
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/10Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
    • C23C4/11Oxides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134Plasma spraying
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18After-treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491Manufacturing of targets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/052Li-accumulators
    • H01M10/0525Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M10/00Secondary cells; Manufacture thereof
    • H01M10/05Accumulators with non-aqueous electrolyte
    • H01M10/056Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
    • H01M10/0561Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of inorganic materials only
    • H01M10/0562Solid materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/04Processes of manufacture in general
    • H01M4/0402Methods of deposition of the material
    • H01M4/0421Methods of deposition of the material involving vapour deposition
    • H01M4/0423Physical vapour deposition
    • H01M4/0426Sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/24Electrodes for alkaline accumulators
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3201Alkali metal oxides or oxide-forming salts thereof
    • C04B2235/3203Lithium oxide or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/80Phases present in the sintered or melt-cast ceramic products other than the main phase
    • C04B2235/81Materials characterised by the absence of phases other than the main phase, i.e. single phase materials
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605Carbon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides
    • C23C14/0652Silicon nitride
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/085Oxides of iron group metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M2300/00Electrolytes
    • H01M2300/0017Non-aqueous electrolytes
    • H01M2300/0065Solid electrolytes
    • H01M2300/0068Solid electrolytes inorganic
    • H01M2300/0071Oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/48Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides
    • H01M4/50Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese
    • H01M4/505Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Structural Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Secondary Cells (AREA)
  • Battery Electrode And Active Subsutance (AREA)

Abstract

本发明公开了一种基于等离子喷涂技术的溅射用靶材制备工艺,步骤包括:将待喷涂粉体加工到用于等离子喷涂的粒度范围;对底板的表面进行满足等离子喷涂的表面处理;利用等离子体喷涂机将制备的待喷涂粉体喷涂在表面处理后的底板表面;对喷涂后的底板进行清洁和检测。该溅射用靶材制备工艺利用等离子喷涂技术进行靶材制备,具有较高的致密度(>93%的相对密度)和与初始粉末材料相当的高纯度;与热压或烧结方法相比,本发明的制备工艺既能够满足薄膜电池生产需要的大尺寸靶材制备要求,又能够用于电极材料的靶材制作。

Description

一种基于等离子喷涂技术的溅射用靶材制备工艺
技术领域
本发明涉及一种溅射用靶材制备工艺,尤其是一种基于等离子喷涂技术的溅射用靶材制备工艺。
背景技术
与传统的锂电池相比,薄膜锂电池具有一些优势。最明显的是尺寸小,能量密度高,循环寿命长。薄膜锂电池是由阴极和阳极两个电极和电解质组成。例如,阴极材料可以是LiCoO2、LiMn2O4、LiFePO4或其他材料。阳极可以是C、Si、Ge、Sn或各种氧化物、氮化物或氧氮化物。锂磷氧氮化物(LiPON)是薄膜锂电池中最常用的电解质材料之一,通常用物理气相淀积手段在氮气氛围下用磷酸锂靶镀膜产生。现有技术表明电解质对电池性能至关重要,因此溅射靶的制作也很重要。适用于溅射靶的高密度Li3PO4材料,常用有烧结和热压两种制造方法,这两种制造方法有一些共同的困难:(1)靶材尺寸难以做大,这里有两个关键因素,一是Li3PO4是脆性陶瓷材料,机械和热应力会导致开裂,二是随着所需炉膛尺寸的增大,炉膛压力、温度均匀性越来越难以控制,再加上相图复杂,想要得到密度高、纯度高的这种陶瓷材料,温度窗口相对较小;(2)接缝,如上所述,一个大尺寸的靶很难做成一块,需要把几块连接起来做成更大的一块,然而,接缝可能是靶材提早失效的原因之一。靶材与背板之间需要焊接/粘结,通常用铟焊或用耐高温的导电胶,这样接缝处容易造成污染;(3)相纯度,高密度和纯相很难同时存在,高温高压下常见的杂质是Li4P2O7,这是由磷酸锂失LiO2造成的,不同的相可能会有不同的溅射速率,最终导致靶材颗粒脱落;(4)工作气体通常仅限于惰性气体和其他不腐蚀气室部件的气体,否则会加速损耗或损坏反应炉里的部件,特别是石墨热场,这样没有喷涂法的灵活性。
发明内容
发明要解决的技术问题是:现有的工艺难以满足磷酸锂材料的溅射用靶材的制备要求。
技术方案:本发明所述的基于等离子喷涂技术的溅射用靶材制备工艺,包括如下步骤:
步骤1,将待喷涂粉体加工到用于等离子喷涂的粒度范围;
步骤2,对底板的表面进行满足等离子喷涂的表面处理;
步骤3,利用等离子体喷涂机将步骤1制备的待喷涂粉体喷涂在步骤2表面处理后的底板表面;
步骤4,对步骤3喷涂后的底板进行清洁和检测。
进一步地,步骤3中,利用等离子体喷涂机进行喷涂的具体步骤为:
步骤3.1,在常压或减压条件下,将工作气体吹入等离子体产生区;
步骤3.2,设定等离子体喷涂机的电弧直流功率,并在电弧稳定后利用载体气体将待喷涂粉体送入等离子体流中;
步骤3.3,调整等离子体喷涂机的喷枪头部与底板之间的喷射距离,移动等离子体喷涂机的喷枪将待喷涂粉体均匀喷涂在底板的指定区域上。
进一步地,步骤3.1中,工作气体为Ar、N2、O2、NH3、空气或其他惰性气体,工作气体吹入等离子体产生区的流速为1-100L/min。
进一步地,步骤3.1中,在将工作气体吹入等离子体产生区时,同时加入H2作为辅助工作气体。
进一步地,步骤3.2中,载体气体将待喷涂粉体送入等离子体流中的速率为1-100g/min。
进一步地,步骤3.2中,等离子体喷涂机的电弧直流功率为1-400kW。
进一步地,步骤3.3中,喷射距离为20-200mm,等离子体喷涂机的喷枪移动速度为2-500cm/s。
进一步地,步骤3.3中,在喷枪将待喷涂粉体均匀喷涂在底板的指定区域上时,在吹送冷却气流围绕在喷涂火焰周围以控制底板温度。
进一步地,步骤3.3中,在喷枪将待喷涂粉体均匀喷涂在底板的指定区域上时,在底板的背面通冷却水以控制底板温度。
进一步地,底板的温度控制在小于等于90%待喷涂粉体的熔点。
进一步地,步骤1中,待喷涂粉体加工后的粒度范围为5-500um。
进一步地,步骤2中,满足等离子喷涂的表面处理包括增强附着力处理、调整热膨胀系数差值处理、污染物减少处理、表面粗糙度处理以及表面过渡层增设处理,在进行表面处理时,根据需要选择实施其中的一种处理或多种处理组合。
进一步地,步骤2中,底板为浮地、接地或另加直流偏置。
进一步地,底板为纯金属、合金或导电型非金属材质。
进一步地,待喷涂粉体为用于制备固态电池电解质的粉体中的单一粉体或几种粉体的混合粉体,或者为用于制备钠离子电池正负极材料的粉体中的单一粉体或几种粉体的混合粉体。
进一步地,用于制备固态电池电解质的粉体包括磷酸锂、硅酸锂、氮化硅、磷酸铁锂、Li(NiCoSl)O2、Li(Mn2O4)、硅、石墨、LiTiO3、LLTO、LLZO以及钴酸锂;用于制备钠离子电池正负极材料的粉体包括钠-过渡金属氧化物、钠-过渡金属磷酸盐及变种、钠-过渡金属硫酸盐、钠-过渡金属普鲁士蓝类化合物、硬碳、软碳以及过渡金属氧化物。
本发明与现有技术相比,其有益效果是:与热压和烧结工艺的一个很大的区别是,靶材材料是直接喷到基体上,不需要额外的键合步骤;利用等离子喷涂方法制备溅射用靶材,具有较高的密度(>93%的相对密度)和与初始粉末材料相当的高纯度;与热压或烧结方法相比具有一定的优越性,能够满足大尺寸薄膜锂电池生产需要的靶材的制备要求。
附图说明
图1为本发明的制备工艺流程图;
图2为本发明工艺制作的一种溅射靶材的截面扫描电子显微镜(SEM)图;
图3为本发明工艺制作的一种溅射靶材的X射线衍射(XRD)图。
具体实施方式
下面结合附图对本发明技术方案进行详细说明,但是本发明的保护范围不局限于所述实施例。
实施例1:
如图1所示,本发明公开的基于等离子喷涂技术的溅射用靶材制备工艺,包括如下步骤:
步骤1,将待喷涂粉体加工到用于等离子喷涂的粒度范围;
步骤2,对底板的表面进行满足等离子喷涂的表面处理;
步骤3,利用等离子体喷涂机将步骤1制备的待喷涂粉体喷涂在步骤2表面处理后的底板表面;
步骤4,对步骤3喷涂后的底板进行清洁和检测。
进一步地,步骤3中,利用等离子体喷涂机进行喷涂的具体步骤为:
步骤3.1,在常压或减压条件下,将工作气体吹入等离子体产生区;
步骤3.2,设定等离子体喷涂机的电弧直流功率,并在电弧稳定后利用载体气体将待喷涂粉体送入等离子体流中;
步骤3.3,调整等离子体喷涂机的喷枪头部与底板之间的喷射距离,移动等离子体喷涂机的喷枪将待喷涂粉体均匀喷涂在底板的指定区域上。
进一步地,步骤3.1中,工作气体为Ar、N2、O2、NH3、空气或其他惰性气体,工作气体吹入等离子体产生区的流速为1-100L/min。
进一步地,步骤3.1中,在将工作气体吹入等离子体产生区时,同时加入H2作为辅助工作气体。辅助工作气体H2的作用在于一方面可以控制失氧/氧化,一方面提供熵。
进一步地,步骤3.2中,载体气体将待喷涂粉体送入等离子体流中的速率为1-100g/min。载体气体可以为空气和/或N2,主要用于将待喷涂粉体送入等离子体流中。
进一步地,步骤3.2中,等离子体喷涂机的电弧直流功率为1-400kW。
进一步地,步骤3.3中,喷射距离为20-200mm,等离子体喷涂机的喷枪移动速度为2-500cm/s。
进一步地,步骤3.3中,在喷枪将待喷涂粉体均匀喷涂在底板的指定区域上时,在吹送冷却气流围绕在喷涂火焰周围以控制底板温度。冷却气体可以采用氮气或空气,对底板的温度控制能够有利于控制变形并提高粉体的利用率。
进一步地,步骤3.3中,在喷枪将待喷涂粉体均匀喷涂在底板的指定区域上时,在底板,背面通冷却水以控制底板温度。对底板的温度控制能够有利于控制变形并提高粉体的利用率。
进一步地,底板的温度控制在小于等于90%待喷涂粉体的熔点。
进一步地,步骤1中,待喷涂粉体加工后的粒度范围为5-500um。
进一步地,步骤2中,满足等离子喷涂的表面处理包括增强附着力处理、调整热膨胀系数差值处理、污染物减少处理、表面粗糙度处理以及表面过渡层增设处理,在进行表面处理时,根据需要选择实施其中的一种处理或多种处理组合。
进一步地,步骤2中,底板为浮地、接地或另加直流偏置。
进一步地,底板为纯金属、合金或导电型非金属材质。例如铜、钛、钼或不锈钢。
进一步地,待喷涂粉体为用于制备固态电池电解质的粉体中的单一粉体或几种粉体的混合粉体,或者为用于制备钠离子电池正负极材料的粉体中的单一粉体或几种粉体的混合粉体。
进一步地,用于制备固态电池电解质的粉体包括磷酸锂、硅酸锂、氮化硅、磷酸铁锂、Li(NiCoSl)O2、Li(Mn2O4)、硅、石墨、LiTiO3、LLTO、LLZO以及钴酸锂;用于制备钠离子电池正负极材料的粉体包括钠-过渡金属氧化物、钠-过渡金属磷酸盐及变种、钠-过渡金属硫酸盐、钠-过渡金属普鲁士蓝类化合物、硬碳、软碳、合金以及过渡金属氧化物。
如图2和3所示,以Li3PO4粉体为例,利用本发明公开的等离子喷涂方法制备的Li3PO4靶在SEM和XRD的分析下显示接近纯Li3PO4相,与起始的Li3PO4粉末组成一致。本发明公开的制备工艺不仅适用于电解质选材Li3PO4及其类似陶瓷材料,也适用于电极,如LiCoO2等。等离子喷涂适用于大批量生产和低成本生产。
与现有的工艺方法相比:(1)不需要焊接,靶材直接喷在底板上;(2)可以根据不同的大小进行调整,并且不存在基本的尺寸限制;(3)对靶材厚度没有基本的限制,特别是薄的靶材,这是很难用其他方法制备而成的,特别是大尺寸薄靶材;(4)对靶材形状没限制,比如平面式、滚筒式都可以;(5)用过的靶材可以重新喷涂以重复使用,而不需要去掉全部剩余的材料;(6)喷涂过程可以集成到PVD工艺流水线中,以保持每次PVD处理的厚度相同;(7)与各种底板材料附着力强;(8)可用于直接形成薄膜,而不只是制造靶材;(9)可用于纯粉或混合粉的非反应性、甚至反应性沉积;(10)具备循环沉积/等离子表面处理工艺的能力;(11)用同一个靶能够分层或图案化沉积不同的材料。
如上所述,尽管参照特定的优选实施例已经表示和表述了本发明,但其不得解释为对本发明自身的限制。在不脱离所附权利要求定义的本发明的精神和范围前提下,可对其在形式上和细节上作出各种变化。

Claims (16)

1.一种基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,包括如下步骤:
步骤1,将待喷涂粉体加工到用于等离子喷涂的粒度范围;
步骤2,对底板的表面进行满足等离子喷涂的表面处理;
步骤3,利用等离子体喷涂机将步骤1制备的待喷涂粉体喷涂在步骤2表面处理后的底板表面;
步骤4,对步骤3喷涂后的底板进行清洁和检测。
2.根据权利要求1所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3中,利用等离子体喷涂机进行喷涂的具体步骤为:
步骤3.1,在常压或减压条件下,将工作气体吹入等离子体产生区;
步骤3.2,设定等离子体喷涂机的电弧直流功率,并在电弧稳定后利用载体气体将待喷涂粉体送入等离子体流中;
步骤3.3,调整等离子体喷涂机的喷枪头部与底板之间的喷射距离,移动等离子体喷涂机的喷枪将待喷涂粉体均匀喷涂在底板的指定区域上。
3.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.1中,工作气体为Ar、N2、O2、NH3、空气或其他惰性气体,工作气体吹入等离子体产生区的流速为1-100L/min。
4.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.1中,在将工作气体吹入等离子体产生区时,同时加入H2作为辅助工作气体。
5.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.2中,载体气体将待喷涂粉体送入等离子体流中的速率为1-100g/min。
6.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.2中,等离子体喷涂机的电弧直流功率为1-400kW。
7.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.3中,喷射距离为20-200mm,等离子体喷涂机的喷枪移动速度为2-500cm/s。
8.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.3中,在喷枪将待喷涂粉体均匀喷涂在底板的指定区域上时,在吹送冷却气流围绕在喷涂火焰周围以控制底板温度。
9.根据权利要求2所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤3.3中,在喷枪将待喷涂粉体均匀喷涂在底板的指定区域上时,在底板的背面通冷却水以控制底板温度。
10.根据权利要求8或9所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,底板的温度控制在小于等于90%待喷涂粉体的熔点。
11.根据权利要求1所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤1中,待喷涂粉体加工后的粒度范围为5-500um。
12.根据权利要求1所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤2中,满足等离子喷涂的表面处理包括增强附着力处理、调整热膨胀系数差值处理、污染物减少处理、表面粗糙度处理以及表面过渡层增设处理,在进行表面处理时,根据需要选择实施其中的一种处理或多种处理组合。
13.根据权利要求1所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,步骤2中,底板为浮地、接地或另加直流偏置。
14.根据上述任一项权利要求所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,底板为纯金属、合金或导电型非金属材质。
15.根据上述任一项权利要求所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,待喷涂粉体为用于制备固态电池电解质的粉体中的单一粉体或几种粉体的混合粉体,或者为用于制备钠离子电池正负极材料的粉体中的单一粉体或几种粉体的混合粉体。
16.根据权利要求15所述的基于等离子喷涂技术的溅射用靶材制备工艺,其特征在于,用于制备固态电池电解质的粉体包括磷酸锂、硅酸锂、氮化硅、磷酸铁锂、Li(NiCoSl)O2、Li(Mn2O4)、硅、石墨、LiTiO3、LLTO、LLZO以及钴酸锂;用于制备钠离子电池正负极材料的粉体包括钠-过渡金属氧化物、钠-过渡金属磷酸盐及变种、钠-过渡金属硫酸盐、钠-过渡金属普鲁士蓝类化合物、硬碳、软碳以及过渡金属氧化物。
CN201811447256.1A 2018-11-29 2018-11-29 一种基于等离子喷涂技术的溅射用靶材制备工艺 Pending CN109881162A (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201811447256.1A CN109881162A (zh) 2018-11-29 2018-11-29 一种基于等离子喷涂技术的溅射用靶材制备工艺
US16/284,830 US20200173007A1 (en) 2018-11-29 2019-02-25 Sputtering target preparation process based on plasma spray technology

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811447256.1A CN109881162A (zh) 2018-11-29 2018-11-29 一种基于等离子喷涂技术的溅射用靶材制备工艺

Publications (1)

Publication Number Publication Date
CN109881162A true CN109881162A (zh) 2019-06-14

Family

ID=66924980

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811447256.1A Pending CN109881162A (zh) 2018-11-29 2018-11-29 一种基于等离子喷涂技术的溅射用靶材制备工艺

Country Status (2)

Country Link
US (1) US20200173007A1 (zh)
CN (1) CN109881162A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112080943A (zh) * 2020-09-11 2020-12-15 杨春云 一种功能性环保无纺布及其制备方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210150978A (ko) * 2020-06-03 2021-12-13 에이에스엠 아이피 홀딩 비.브이. 샤워 플레이트, 기판 처리 장치 및 기판 처리 방법

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US20050040030A1 (en) * 2003-08-20 2005-02-24 Mcdonald Peter H. Method of treating sputtering target to reduce burn-in time and sputtering target thereof and apparatus thereof
CN1306643C (zh) * 2001-08-29 2007-03-21 松下电器产业株式会社 用于制造锂二次电池的方法和设备
US20100136365A1 (en) * 2007-06-27 2010-06-03 Pilkington Group Limited Heat treatable coated glass pane
CN102395701A (zh) * 2009-04-10 2012-03-28 圣戈班涂敷技术公司 通过热喷镀制备靶的方法
CN105349951A (zh) * 2015-11-03 2016-02-24 基迈克材料科技(苏州)有限公司 采用等离子喷涂工艺制备锌合金氧化物靶材的方法
CN207331055U (zh) * 2017-07-10 2018-05-08 深圳市众诚达应用材料科技有限公司 可在常压和低压间转换的喷涂设备
CN108296061A (zh) * 2017-09-26 2018-07-20 烟台史密得机电设备制造有限公司 一种静电喷涂枪辅助装置
CN108707870A (zh) * 2018-05-24 2018-10-26 宁波森利电子材料有限公司 高致密度的硅铝旋转靶材的制备方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
CN1306643C (zh) * 2001-08-29 2007-03-21 松下电器产业株式会社 用于制造锂二次电池的方法和设备
US20050040030A1 (en) * 2003-08-20 2005-02-24 Mcdonald Peter H. Method of treating sputtering target to reduce burn-in time and sputtering target thereof and apparatus thereof
US20100136365A1 (en) * 2007-06-27 2010-06-03 Pilkington Group Limited Heat treatable coated glass pane
CN102395701A (zh) * 2009-04-10 2012-03-28 圣戈班涂敷技术公司 通过热喷镀制备靶的方法
CN105349951A (zh) * 2015-11-03 2016-02-24 基迈克材料科技(苏州)有限公司 采用等离子喷涂工艺制备锌合金氧化物靶材的方法
CN207331055U (zh) * 2017-07-10 2018-05-08 深圳市众诚达应用材料科技有限公司 可在常压和低压间转换的喷涂设备
CN108296061A (zh) * 2017-09-26 2018-07-20 烟台史密得机电设备制造有限公司 一种静电喷涂枪辅助装置
CN108707870A (zh) * 2018-05-24 2018-10-26 宁波森利电子材料有限公司 高致密度的硅铝旋转靶材的制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112080943A (zh) * 2020-09-11 2020-12-15 杨春云 一种功能性环保无纺布及其制备方法

Also Published As

Publication number Publication date
US20200173007A1 (en) 2020-06-04

Similar Documents

Publication Publication Date Title
TWI441937B (zh) 形成用於電解質薄膜之濺鍍靶材的方法
US8652431B2 (en) Metal fluorophosphate synthesis and use as an active material for a battery electrode
CN105489845A (zh) 一种基于pvd制备全固态锂离子电池用薄层金属锂基负极的方法
US20100264017A1 (en) Method for depositing ceramic thin film by sputtering using non-conductive target
CN102664261B (zh) 一种高导电率锂离子电池正极材料的制备方法
CN114411125A (zh) 一种高熵金属氧化物涂层及其制备方法与应用
CN109576679A (zh) 一种燃料电池双极板碳涂层连续沉积系统及其应用
CN102361073A (zh) 一种锂离子电池硅铝碳复合负极材料的制备方法
CN104561877A (zh) 一种热喷涂镍基自熔合金非晶涂层
JP2018527693A (ja) ナノ構造化層の製造方法
CN109881162A (zh) 一种基于等离子喷涂技术的溅射用靶材制备工艺
CN114481048A (zh) 高导电耐蚀非晶/纳米晶复合共存的涂层及其制法与应用
CN112436105A (zh) 一种预锂化负极极片及其制备方法
CN110880593B (zh) 固态电解质改性钛酸锂负极材料及其制备方法
CN111900366B (zh) 一种含锂SiOx粉体的制备方法
CN111129435A (zh) 一种薄膜锂电池及界面修饰层的制备方法
Xu et al. Fabrication of nickel foam/nickel phosphide (Ni/Ni2P) composite for dendrite-free and long-life lithium metal anodes
CN106997946A (zh) 硅‑铜复合材料、制备方法及在锂离子电池中的应用
CN109167061A (zh) 一种全固态薄膜锂离子电池3d薄膜负极及其制备方法
CN105449168A (zh) 具有界面修饰层的金属基固态薄膜锂电池正极的制备方法
CN108390013A (zh) 一种锂离子电池电极材料表面纳米金属修饰方法
CN103682334B (zh) 一种纳米氧化锌包覆的硅酸锰锂正极材料的制备方法
CN112614967A (zh) 一种锂离子电池正极材料的制备方法及其产品
CN116590718A (zh) 一种高熵碳化物的制备方法
CN117766746A (zh) 一种三维锂金属电池负极及其制备方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20190614