CN1094604C - 着色感光性树脂组合物 - Google Patents
着色感光性树脂组合物 Download PDFInfo
- Publication number
- CN1094604C CN1094604C CN94191324A CN94191324A CN1094604C CN 1094604 C CN1094604 C CN 1094604C CN 94191324 A CN94191324 A CN 94191324A CN 94191324 A CN94191324 A CN 94191324A CN 1094604 C CN1094604 C CN 1094604C
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- CN
- China
- Prior art keywords
- composition
- mentioned
- red
- compound
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
| 色 | 波长 | 透明度 | 膜厚 |
| 红 | 620nm | 90% | 1μm |
| 兰 | 460nm | 75% | 1μm |
| 绿 | 540nm | 68% | 1μm |
| 简称(添加量) | 化合物名 |
| 添加剂I(1%) | 壬基酚烯化氧10摩尔加成物 |
| 添加剂II(1%) | 月桂酸二乙醇酰胺 |
| 添加剂III(1%) | 对十二烷基苯横酸钠 |
| 添加剂IV(0.5%) | 月桂酸酯钠 |
| 添加剂V(0.5%) | 脱水山梨醇月桂酸-酯烯化氧20摩尔加成物 |
| 添加剂VI(0.5%) | 聚乙二醇(分子量1000) |
| 添加剂VII(0.5%) | 聚乙二醇(分子量600)油酸-酯 |
| 添加剂VIII(0.2%) | 月桂醇烯化氧20摩尔加成物 |
| 添加剂IX(0.2%) | 十六烷基乙基吗啉鎓乙氧硫化物 |
| 添加剂X(0.1%) | 异丙醇 |
Claims (8)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP348391/93 | 1993-12-27 | ||
| JP34839193 | 1993-12-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1118629A CN1118629A (zh) | 1996-03-13 |
| CN1094604C true CN1094604C (zh) | 2002-11-20 |
Family
ID=18396713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN94191324A Expired - Fee Related CN1094604C (zh) | 1993-12-27 | 1994-12-12 | 着色感光性树脂组合物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5641594A (zh) |
| EP (1) | EP0686877A4 (zh) |
| KR (1) | KR100330637B1 (zh) |
| CN (1) | CN1094604C (zh) |
| WO (1) | WO1995018399A1 (zh) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100334506C (zh) * | 2002-10-04 | 2007-08-29 | 株式会社东进世美肯 | 利用感光性树脂的感光性树脂组合物 |
| CN105607421A (zh) * | 2014-11-14 | 2016-05-25 | 罗门哈斯电子材料韩国有限公司 | 着色感光性树脂组合物以及由其制备的遮光隔片 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5942368A (en) * | 1996-04-23 | 1999-08-24 | Konica Corporation | Pigment dispersion composition |
| US5871871A (en) * | 1996-09-20 | 1999-02-16 | International Business Machines Corporation | Stabilized multi-layered structure of color filters on a silicon chip and a method for making |
| WO2000014603A1 (en) * | 1998-09-04 | 2000-03-16 | Polaroid Corporation | Process for preparing a color filter or overlay |
| KR100533379B1 (ko) * | 1999-09-07 | 2005-12-06 | 주식회사 하이닉스반도체 | 유기 난반사 방지막용 조성물과 이의 제조방법 |
| CN1462284A (zh) | 2000-08-16 | 2003-12-17 | 部鲁尔科学公司 | 用于滤色片应用的光敏树脂组合物 |
| JP4555988B2 (ja) * | 2004-09-08 | 2010-10-06 | 日立化成工業株式会社 | 感光性エレメント |
| JP5448352B2 (ja) * | 2008-03-10 | 2014-03-19 | 富士フイルム株式会社 | 着色硬化性組成物、カラーフィルタ、及び、固体撮像素子 |
| JP6064666B2 (ja) * | 2013-02-20 | 2017-01-25 | Jsr株式会社 | 硬化性組成物、着色画素及びその形成方法、並びにカラーフィルタ |
| KR101686187B1 (ko) | 2015-08-07 | 2016-12-13 | 주식회사 쏠락 | 튜브 단부 절삭장치 |
| KR20250001149U (ko) | 2024-01-16 | 2025-07-23 | 서윤식 | 양면 백챔버 교체용 절삭공구 |
| KR20250001636U (ko) | 2024-04-29 | 2025-11-05 | 서윤식 | 양면 백챔버 가공용 교체공구 |
| KR20250001635U (ko) | 2024-04-29 | 2025-11-05 | 서윤식 | 양면 백챔버 가공용 교체공구 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5032923A (zh) * | 1973-07-23 | 1975-03-29 | ||
| JPS5236697B2 (zh) * | 1974-09-09 | 1977-09-17 | ||
| JPS5664335A (en) * | 1979-10-29 | 1981-06-01 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS60237403A (ja) * | 1984-05-10 | 1985-11-26 | Toppan Printing Co Ltd | カラ−フィルタ−およびその製造方法 |
| JPS62102241A (ja) * | 1985-10-30 | 1987-05-12 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
| US5190845A (en) * | 1987-07-28 | 1993-03-02 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin composition and color filter comprising a polymer dyeable with an anionic dye, an azide compound and a compound with at least two acrylol groups |
| JPH0695211B2 (ja) * | 1987-12-09 | 1994-11-24 | 松下電器産業株式会社 | カラーフィルタ |
| JPH01200353A (ja) * | 1988-02-05 | 1989-08-11 | Japan Synthetic Rubber Co Ltd | 感放射線性着色樹脂組成物 |
| DE3920228A1 (de) * | 1989-06-21 | 1991-01-10 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JPH047373A (ja) * | 1990-04-23 | 1992-01-10 | Chisso Corp | カラーフィルター用インキ |
| JPH0416546A (ja) * | 1990-05-02 | 1992-01-21 | Mitsubishi Materials Corp | 複合体 |
| JP2975063B2 (ja) * | 1990-08-06 | 1999-11-10 | チッソ株式会社 | 光硬化性インキ |
| JP2571869B2 (ja) * | 1990-08-27 | 1997-01-16 | インダストリアル・テクノロジー・リサーチ・インステイテユート | アルカリ溶液で現像可能な液体写真用組成物 |
| JP3004044B2 (ja) * | 1990-10-29 | 2000-01-31 | 東洋合成工業株式会社 | 感光性着色樹脂組成物 |
| JP2923348B2 (ja) * | 1990-11-14 | 1999-07-26 | 積水フアインケミカル 株式会社 | 光硬化性の着色組成物 |
| JPH04223468A (ja) * | 1990-12-25 | 1992-08-13 | Sekisui Fine Chem Kk | 光硬化性着色樹脂組成物 |
| EP0501433B1 (en) * | 1991-02-28 | 1997-05-07 | E.I. Du Pont De Nemours And Company | Photosensitive compositions using solvent dispersible interpenetrating polymer networks |
| JP2768120B2 (ja) * | 1991-11-11 | 1998-06-25 | 凸版印刷株式会社 | 光硬化性アクリル系着色組成物 |
| JP2934561B2 (ja) * | 1992-03-19 | 1999-08-16 | 積水フアインケミカル株式会社 | 水性着色レジスト材、その現像方法及びカラーフィルターの製造方法 |
| US5368976A (en) * | 1992-03-27 | 1994-11-29 | Japan Synthetic Rubber Co., Ltd. | Pigment-dispersed color-filter composition comprising an alkali-soluble block copolymer as a binder |
| JP3094403B2 (ja) * | 1992-03-27 | 2000-10-03 | ジェイエスアール株式会社 | 顔料分散型カラーフィルター用組成物 |
| JPH05313008A (ja) * | 1992-05-12 | 1993-11-26 | Sekisui Chem Co Ltd | カラーレジストとこれを用いたカラーフィルターの製造方法 |
-
1994
- 1994-12-12 US US08/507,301 patent/US5641594A/en not_active Expired - Fee Related
- 1994-12-12 CN CN94191324A patent/CN1094604C/zh not_active Expired - Fee Related
- 1994-12-12 WO PCT/JP1994/002085 patent/WO1995018399A1/ja not_active Ceased
- 1994-12-12 EP EP95902942A patent/EP0686877A4/en active Pending
- 1994-12-12 KR KR1019950703655A patent/KR100330637B1/ko not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100334506C (zh) * | 2002-10-04 | 2007-08-29 | 株式会社东进世美肯 | 利用感光性树脂的感光性树脂组合物 |
| CN105607421A (zh) * | 2014-11-14 | 2016-05-25 | 罗门哈斯电子材料韩国有限公司 | 着色感光性树脂组合物以及由其制备的遮光隔片 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0686877A4 (en) | 1996-06-05 |
| EP0686877A1 (en) | 1995-12-13 |
| US5641594A (en) | 1997-06-24 |
| WO1995018399A1 (en) | 1995-07-06 |
| CN1118629A (zh) | 1996-03-13 |
| KR100330637B1 (ko) | 2002-11-30 |
| KR960071390A (ko) | 1996-02-24 |
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Legal Events
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C53 | Correction of patent of invention or patent application | ||
| CB02 | Change of applicant information |
Address after: Virgin Islands (British) Applicant after: Clariant Finance (BVI) Ltd. Address before: Tokyo, Japan Applicant before: Hoechst Japan Ltd. |
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Free format text: CORRECT: APPLICANT; FROM: HOECHST JAPAN LIMITED TO: CLARIANT FINANCE (JAPAN) K.K. |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CI01 | Publication of corrected invention patent application |
Correction item: Address of the patentee Correct: [73]...... Hitko building False: [73]...... Hitko Xia Number: 47 Page: 281 Volume: 18 |
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| CI03 | Correction of invention patent |
Correction item: Address of the patentee Correct: [73]...... Hitko building False: [73]...... Hitko Xia Number: 47 Page: The title page Volume: 18 |
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| COR | Change of bibliographic data |
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| ERR | Gazette correction |
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| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |