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CN109186434B - Non-contact sub-nanometer sensing method and device based on three-dimensional quantum tunneling - Google Patents

Non-contact sub-nanometer sensing method and device based on three-dimensional quantum tunneling Download PDF

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CN109186434B
CN109186434B CN201810889933.9A CN201810889933A CN109186434B CN 109186434 B CN109186434 B CN 109186434B CN 201810889933 A CN201810889933 A CN 201810889933A CN 109186434 B CN109186434 B CN 109186434B
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tunneling
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CN109186434A (en
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边星元
崔俊宁
陆叶盛
谭久彬
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Harbin Institute of Technology Shenzhen
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/004Measuring arrangements characterised by the use of electric or magnetic techniques for measuring coordinates of points
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/04Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/26Measuring arrangements characterised by the use of electric or magnetic techniques for measuring depth
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/28Measuring arrangements characterised by the use of electric or magnetic techniques for measuring contours or curvatures
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/54Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using means specified in two or more of groups G01D5/02, G01D5/12, G01D5/26, G01D5/42, and G01D5/48
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/54Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using means specified in two or more of groups G01D5/02, G01D5/12, G01D5/26, G01D5/42, and G01D5/48
    • G01D5/62Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable using means specified in two or more of groups G01D5/02, G01D5/12, G01D5/26, G01D5/42, and G01D5/48 using wave or particle radiation means not covered by group G01D5/58

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  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)

Abstract

A non-contact sub-nanometer sensing method and a device based on three-dimensional quantum tunneling belong to the precise sensing and measuring technology; aiming at a conductor measured object, the method adopts a three-dimensional quantum tunneling principle for sensing, firstly, an aiming gap between the measured object and a micrometering ball is adjusted to a tunneling working interval, then a bias electric field generating system is adopted to generate a bias voltage to be loaded between the micrometering ball and a measured object to form a bias electric field, then the aiming gap is converted into a sensing signal through the generation of the quantum tunneling effect, and then the aiming gap information is extracted through a tunneling signal detection system with sub-nanometer resolution; the invention also provides a sensing device; the invention effectively considers the characteristics of sub-nanometer resolution, three-dimensional isotropy and non-contact sensing, and can realize high resolution measurement of the micro-nano/micro structure with large depth-to-width ratio.

Description

基于三维量子隧穿的非接触亚纳米传感方法与装置Non-contact sub-nanometer sensing method and device based on three-dimensional quantum tunneling

技术领域technical field

本发明属于精密传感与测量技术领域,主要涉及一种基于三维量子隧穿的非接触亚纳米传感方法与装置。The invention belongs to the technical field of precision sensing and measurement, and mainly relates to a non-contact sub-nanometer sensing method and device based on three-dimensional quantum tunneling.

背景技术Background technique

随着当前精密加工制造水平的日益提高,具有大深宽比特征的微纳/微小结构在尖端技术领域得到应用,用于此类结构精密测量的传感方法与传感测头随之成为当前研究热点。高分辨力与瞄准精度、三维各向同性和无损伤快速测量能力是实现大深宽比结构高精度测量的关键要素。然而,将现有的精密测头及传感技术方案应用到具有大深宽比特征的结构测量时,很难实现亚纳米级高分辨力、三维各向同性、大深宽比测量能力和无损伤测量特性的有效兼顾和高精度测量。With the increasing level of precision machining and manufacturing, micro-nano/micro structures with large aspect ratio features are applied in cutting-edge technology fields, and sensing methods and sensing probes for precision measurement of such structures have become current Research hotspots. High resolution and aiming accuracy, three-dimensional isotropy and non-destructive rapid measurement capabilities are the key elements to realize high-precision measurement of large aspect ratio structures. However, it is difficult to achieve sub-nanometer high resolution, three-dimensional isotropy, large aspect ratio measurement capability and wireless Effective consideration of damage measurement characteristics and high-precision measurement.

目前,现有的精密测头及传感技术方案根据基本原理可分为三种类型:即微力接触式测量方案、扫描探针方案和聚焦光探针方案。微力接触式测量方案很难同时获得匹配的垂直于测杆的二维平面内和轴向敏感特性,测头姿态误差等问题较为突出,很难实现真正三维测量,且由于测力变形与损伤的存在其动态特性差,无法实现无损伤快速测量;扫描探针与聚焦光探针一般只具有一维敏感特性,不具有实现横向高分辨的潜力,配合运动扫描最多只能实现二维半测量,不具有真正三维测量能力。因此,针对大深宽比结构的测量,亟需提出一种兼具亚纳米级高分辨力、真正三维、大深宽比测量能力和非接触测量特征的传感技术方案。At present, the existing precision measuring head and sensing technology solutions can be divided into three types according to the basic principles: the micro-force contact measurement solution, the scanning probe solution and the focused light probe solution. It is difficult for the micro-force contact measurement scheme to obtain the matching two-dimensional in-plane and axial sensitivity characteristics perpendicular to the measuring rod at the same time. Problems such as the attitude error of the measuring head are more prominent, and it is difficult to achieve true three-dimensional measurement. Due to its poor dynamic characteristics, it is impossible to achieve rapid measurement without damage; scanning probes and focused light probes generally only have one-dimensional sensitivity characteristics, and do not have the potential to achieve high lateral resolution. With motion scanning, they can only achieve two-and-a-half-dimensional measurement at most. Does not have true three-dimensional measurement capability. Therefore, for the measurement of large aspect ratio structures, it is urgent to propose a sensing technology solution with sub-nanometer high resolution, true three-dimensional, large aspect ratio measurement capabilities and non-contact measurement features.

针对该问题,哈尔滨工业大学提出一种基于球面散射电场原理的传感测量方法(1.Ultraprecision 3D probing system based on spherical capacitiveplate.Sensors and Actuators A:Physical,2010;2.基于球形电容极板的超精密非接触式三维瞄准与测量传感器,中国专利号:ZL200910072143.2)。该传感技术方案的技术特点为:(1)首次将球面散射电场原理应用于金属测球使其作为球形电容极板实现了非接触式测量,使该测头具有了无损伤快速测量的能力;(2)该技术方案的传感特性与金属测球的直径关系密切,随着金属测球直径减小其传感分辨力随之变差;目前已工程实现的最小测球直径为500μm,目前尚无法测量微纳尺度的大深宽比结构。In response to this problem, Harbin Institute of Technology proposed a sensing measurement method based on the principle of spherical scattering electric field (1. Ultraprecision 3D probing system based on spherical capacitive plate. Sensors and Actuators A: Physical, 2010; 2. Ultraprecision 3D probing system based on spherical capacitive plate. Precision non-contact 3D aiming and measuring sensor, Chinese patent number: ZL200910072143.2). The technical features of this sensing technology solution are: (1) For the first time, the principle of spherical scattering electric field is applied to a metal measuring ball to make it as a spherical capacitive plate to realize non-contact measurement, so that the measuring head has the ability of rapid measurement without damage ; (2) The sensing characteristics of this technical solution are closely related to the diameter of the metal measuring ball, and the sensing resolution becomes worse as the diameter of the metal measuring ball decreases; the minimum diameter of the measuring ball that has been realized in the project is 500 μm, At present, it is still impossible to measure the large aspect ratio structure of the micro-nano scale.

重庆理工大学提出一种基于隧道效应的纳米位移传感器方案(一种基于隧道效应的接触式纳米位移传感器,中国专利号:ZL201010101154.1)。该方案的技术特点为:(1)该方案是一种微力接触式测量方案,测量过程中测头接触被测物体,通过导杆将待测面表面的垂向高度变化传递至探针与石墨块的间距上,并利用一维隧道效应原理将探针与石墨块的间距作为敏感单元进行传感,可以实现垂向纳米级的高分辨力;(2)由于该传感技术方案采用的是探针,只具备垂向高分辨力测量能力,基本不具备水平向测量能力,即只具有垂向一维测量能力而不具有三维测量能力,故无法测量大深宽比微小结构尺寸参数和水平向几何参数;(3)由于测头与被测件需要接触才能使探针和石墨块间发生隧道效应,存在划伤待测面和测头的风险,则该接触式传感技术方案动态特性较差,很难实现快速无损伤测量;(4)与所有接触式测头一样,测杆长度增大其测量力变形会不可避免地引入误差导致精度下降。Chongqing University of Technology proposed a nano-displacement sensor scheme based on tunnel effect (a contact nano-displacement sensor based on tunnel effect, Chinese Patent No.: ZL201010101154.1). The technical characteristics of this scheme are: (1) This scheme is a micro-force contact measurement scheme. During the measurement process, the probe touches the object to be measured, and the vertical height change of the surface to be measured is transmitted to the probe and graphite through the guide rod. block spacing, and use the one-dimensional tunnel effect principle to sense the distance between the probe and the graphite block as a sensitive unit, which can achieve vertical nanoscale high resolution; (2) because the sensing technology scheme uses Probes only have vertical high-resolution measurement capabilities, and basically do not have horizontal measurement capabilities, that is, they only have vertical one-dimensional measurement capabilities but not three-dimensional measurement capabilities, so they cannot measure the size parameters and horizontal dimensions of small structures with large aspect ratios. (3) Since the probe and the measured object need to be in contact to cause tunneling between the probe and the graphite block, there is a risk of scratching the surface to be measured and the probe, so the dynamic characteristics of the contact sensing technology scheme Poor, it is difficult to achieve fast and non-destructive measurement; (4) Like all contact probes, the measurement force deformation will inevitably introduce errors and lead to a decrease in accuracy when the length of the measuring rod increases.

德国埃尔朗根-纽伦堡大学的学者提出一种基于肖特基辐射效应的传感测量方案(1.Schottky emission effect in surface topography:Method andapplication.International Journal of Nanomanufacturing,2011;2.Electricalprobing for dimensional micro metrology.CIRP Journal of Manufacturing Scienceand Technology,2008)。该传感技术方案的技术特点为:(1)该方案采用肖特基辐射效应作为传感原理,为非接触式传感原理,理论上可以实现无损伤快速测量;(2)该研究文献是一个原理性的初步探索,测头是采用实心金属棒与金属球直接焊接构成,未针对大深宽比结构的测量给出完整、具体的技术解决方案,未给出测头机械结构、信号传输和屏蔽干扰等的技术方案,无法实现大深宽比结构的实际工程测量。Schottky Schottky emission effect in surface topography: Method and application. International Journal of Nanomanufacturing, 2011; 2. Electrical probing for dimensional micro metrology. CIRP Journal of Manufacturing Science and Technology, 2008). The technical characteristics of the sensing technology scheme are: (1) The scheme uses the Schottky radiation effect as the sensing principle, which is a non-contact sensing principle, and can theoretically achieve rapid measurement without damage; (2) The research literature is A preliminary exploration of the principle, the probe is composed of solid metal rods and metal balls directly welded, no complete and specific technical solutions have been given for the measurement of structures with large aspect ratios, and no mechanical structure and signal transmission of the probe have been given Technical solutions such as shielding and shielding interference cannot realize the actual engineering measurement of structures with large aspect ratios.

综上,通过传感测量方法与装置的创新,提供一种有效兼顾传感的亚纳米分辨力、三维各向同性、大深宽比测量能力和无损伤快速测量能力的传感技术方案,对大深宽比微纳/微小结构的精密测量具有重大意义。In summary, through the innovation of sensing measurement methods and devices, a sensing technology solution that effectively takes into account the sub-nanometer resolution, three-dimensional isotropy, large aspect ratio measurement capability and non-destructive rapid measurement capability of sensing is provided. The precision measurement of micro-nano/microstructures with large aspect ratio is of great significance.

发明内容Contents of the invention

本发明的目的就是针对上述现有技术的大深宽比微纳/微小结构精密测量存在的问题,提供一种基于三维量子隧穿的非接触亚纳米传感方法与装置,以期实现传感的亚纳米分辨力、三维各向同性特性、大深宽比和无损伤快速测量能力的有效兼顾。The purpose of the present invention is to provide a non-contact sub-nano sensing method and device based on three-dimensional quantum tunneling to solve the problems existing in the high-aspect-ratio micro-nano/micro-structure precision measurement in the prior art, in order to realize the sensing An effective combination of sub-nanometer resolution, three-dimensional isotropic properties, large aspect ratio and non-destructive rapid measurement capabilities.

本发明的技术解决方案是:Technical solution of the present invention is:

一种基于三维量子隧穿的非接触亚纳米传感方法,所述传感方法包括以下步骤:A non-contact sub-nanometer sensing method based on three-dimensional quantum tunneling, the sensing method comprising the following steps:

①采用测头姿态调整机构对隧穿测头相对被测件的姿态进行调整,使隧穿测头进入瞄准姿态;再用测量驱动机构驱动隧穿测头或被测件,在两者之间的相对距离进入隧穿工作区间后,测量驱动机构停止驱动;① Use the probe attitude adjustment mechanism to adjust the attitude of the tunneling probe relative to the measured piece, so that the tunneling probe enters the aiming attitude; then use the measurement drive mechanism to drive the tunneling probe or the tested piece, between the two After the relative distance enters the tunneling working area, the measuring driving mechanism stops driving;

②采用偏置电场发生系统产生偏置电压加载在微测球和被测件之间形成偏置电场,尔后通过对偏置电场的调整和控制,使微测球和被测件之间发生三维量子隧穿效应,将微测球与被测件之间的瞄准间隙转化为传感信号;②A bias electric field generation system is used to generate a bias voltage to form a bias electric field between the micrometer ball and the tested object, and then through the adjustment and control of the bias electric field, a three-dimensional Quantum tunneling effect, which converts the aiming gap between the micrometer ball and the tested object into a sensing signal;

③采用隧穿信号检测系统对上述②中传感信号进行检测和处理,根据瞄准间隙和传感信号之间对应关系的模型,以亚纳米分辨力提取微测球和被测件之间的瞄准间隙信息,实现三维、亚纳米分辨力传感与测量。③A tunneling signal detection system is used to detect and process the sensing signal in the above ②, and according to the model of the corresponding relationship between the aiming gap and the sensing signal, the aiming distance between the micrometer ball and the measured object is extracted with sub-nanometer resolution. Gap information to realize three-dimensional, sub-nanometer resolution sensing and measurement.

一种基于三维量子隧穿的非接触亚纳米传感装置,包括隧穿测头、隧穿信号处理系统、测头姿态调整机构、防撞安全保护机构、测量驱动机构,所述隧穿测头由微测球、信号传输机构、屏蔽机构、装卡机构、信号连接器、绝缘部件和信号线构成,所述微测球与信号传输机构的下端相连接,信号传输机构的上端通过信号线与信号连接器相连,信号传输机构的主体位于屏蔽机构中,屏蔽机构装配在装卡机构上,在屏蔽机构内配装绝缘部件,信号连接器连接信号传输电缆,屏蔽机构、装卡机构和信号连接器的外壳与信号传输电缆的屏蔽层无缝连接;所述隧穿信号处理系统由偏置电场发生系统、隧穿信号检测系统、限流单元、通信电缆和仪器主控计算机构成,所述偏置电场发生系统和隧穿信号检测系统通过通信电缆分别与仪器主控计算机连接;隧穿测头的信号连接器、限流单元、隧穿信号检测系统、偏置电场发生系统、被测件通过信号传输电缆依次串接,构成传感信号检测回路;隧穿测头装配在所述测头姿态调整机构上,所述测头姿态调整机构与所述防撞安全保护机构固定装配,测量驱动机构安装在防撞安全保护机构或被测件上。A non-contact sub-nanometer sensing device based on three-dimensional quantum tunneling, including a tunneling probe, a tunneling signal processing system, a probe attitude adjustment mechanism, an anti-collision safety protection mechanism, and a measurement drive mechanism. The tunneling probe It is composed of a micrometer ball, a signal transmission mechanism, a shielding mechanism, a card loading mechanism, a signal connector, an insulating part and a signal line. The micrometer ball is connected to the lower end of the signal transmission mechanism, and the upper end of the signal transmission mechanism is connected to the The signal connectors are connected, the main body of the signal transmission mechanism is located in the shielding mechanism, the shielding mechanism is assembled on the clamping mechanism, and insulating parts are assembled in the shielding mechanism, the signal connector is connected to the signal transmission cable, and the shielding mechanism, the clamping mechanism and the signal connection The shell of the device is seamlessly connected with the shielding layer of the signal transmission cable; the tunneling signal processing system is composed of a bias electric field generation system, a tunneling signal detection system, a current limiting unit, a communication cable and an instrument main control computer. The electric field generation system and the tunneling signal detection system are respectively connected to the main control computer of the instrument through communication cables; the signal connector of the tunneling probe, the current limiting unit, the tunneling signal detection system, the bias electric field generation The signal transmission cables are sequentially connected in series to form a sensor signal detection circuit; the tunneling probe is assembled on the probe attitude adjustment mechanism, the probe attitude adjustment mechanism is fixedly assembled with the anti-collision safety protection mechanism, and the measurement drive mechanism Installed on the anti-collision safety protection mechanism or the tested part.

本发明的技术创新性及产生的良好技术效果在于:The technological innovation of the present invention and the good technical effect that produces are in:

(1)采用三维量子隧穿原理实现精密传感,同时实现了亚纳米分辨力和非接触测量能力,在微测球直径小至1μm时仍能保证亚纳米分辨力传感特性不变从而显著降低了最小可测量尺寸;采用非接触测量方式可实现无损伤快速测量,而且避免了摩擦、磨损及损伤待测件,避免测量力变形制约测量精度与可测深宽比的问题,保证了测头的动态特性;(1) The principle of three-dimensional quantum tunneling is used to realize precise sensing, and at the same time, it realizes sub-nanometer resolution and non-contact measurement capabilities. When the diameter of the micrometer ball is as small as 1 μm, the sensing characteristics of sub-nanometer resolution can still be kept unchanged, thus significantly The minimum measurable size is reduced; the non-contact measurement method can realize fast measurement without damage, and avoid friction, wear and damage to the test piece, and avoid the problem that the measurement force deformation restricts the measurement accuracy and the measurable depth-to-width ratio. dynamic characteristics of the head;

(2)该传感技术方案可实现三维各向同性特性传感从而具备了三维测量能力,不仅可以测量微纳/微小大深宽比结构的形状/形貌特征,更可以测量垂直深度、横向尺寸、空间坐标的几何参数的测量,具备各向同性、三维亚纳米分辨力和精度的特性;(2) The sensing technology solution can realize three-dimensional isotropic characteristic sensing and has three-dimensional measurement capability. It can not only measure the shape/morphological characteristics of micro/nano/small large aspect ratio structures, but also measure vertical depth, lateral The measurement of geometric parameters of size and space coordinates has the characteristics of isotropy, three-dimensional sub-nanometer resolution and precision;

(3)本技术方案由于采用三维量子隧穿原理和微测球结构,可实现三维各向同性和非接触的传感特性,因而可解决现有传感技术方案在测量导体材料的大深宽比微纳/微小结构时精度随深宽比增加而降低的问题,可提高最大可测深宽比。(3) Due to the use of the three-dimensional quantum tunneling principle and the micrometer ball structure, this technical solution can realize three-dimensional isotropic and non-contact sensing characteristics, so it can solve the problem of measuring the large depth and width of the conductor material in the existing sensing technology solution The problem that the accuracy decreases with the increase of the aspect ratio when compared with the micro/nano/micro structure can increase the maximum measurable aspect ratio.

本发明可有效兼顾亚纳米分辨力、三维各向同性、大深宽比测量能力,为大深宽比微纳/微小结构精密测量提供了一种有效的传感测量方法与装置。The invention can effectively take into account sub-nanometer resolution, three-dimensional isotropy, and large aspect ratio measurement capability, and provides an effective sensing measurement method and device for precision measurement of large aspect ratio micro/nano/micro structures.

附图说明Description of drawings

图1为测量驱动机构安装在防撞安全保护机构上的基于三维量子隧穿的非接触亚纳米传感装置结构示意图;Figure 1 is a schematic structural diagram of a non-contact sub-nanometer sensing device based on three-dimensional quantum tunneling in which the measurement drive mechanism is installed on the anti-collision safety protection mechanism;

图2为测量驱动机构安装在被测件上的基于三维量子隧穿的非接触亚纳米传感装置结构示意图;Fig. 2 is a schematic structural diagram of a non-contact sub-nano sensing device based on three-dimensional quantum tunneling in which the measurement drive mechanism is installed on the measured object;

图3为被测间距与隧道电流关系的一个实测结果。Figure 3 is an actual measurement result of the relationship between the measured distance and the tunnel current.

图中件号说明:1隧穿测头、2隧穿信号处理系统、3测头姿态调整机构、4防撞安全保护机构、5测量驱动机构、6微测球、7信号传输机构、8屏蔽机构、9装卡机构、10信号连接器、11信号传输电缆、12偏置电场发生系统、13隧穿信号检测系统、14限流单元、15被测件、16通信电缆、17仪器主控计算机、18绝缘部件、19信号线。Part number description in the figure: 1 Tunneling probe, 2 Tunneling signal processing system, 3 Probe attitude adjustment mechanism, 4 Anti-collision safety protection mechanism, 5 Measurement drive mechanism, 6 Micro measuring ball, 7 Signal transmission mechanism, 8 Shielding mechanism, 9 card loading mechanism, 10 signal connector, 11 signal transmission cable, 12 bias electric field generation system, 13 tunneling signal detection system, 14 current limiting unit, 15 DUT, 16 communication cable, 17 instrument main control computer , 18 insulation components, 19 signal wires.

具体实施方式Detailed ways

下面结合附图对本发明的具体实施方式进行详细说明。Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

一种基于三维量子隧穿的非接触亚纳米传感方法,所述传感方法包括以下步骤:A non-contact sub-nanometer sensing method based on three-dimensional quantum tunneling, the sensing method comprising the following steps:

①采用测头姿态调整机构对隧穿测头相对被测件的姿态进行调整,使隧穿测头进入瞄准姿态;再用测量驱动机构驱动隧穿测头或被测件,在两者之间的相对距离进入隧穿工作区间后,测量驱动机构停止驱动;① Use the probe attitude adjustment mechanism to adjust the attitude of the tunneling probe relative to the measured piece, so that the tunneling probe enters the aiming attitude; then use the measurement drive mechanism to drive the tunneling probe or the tested piece, between the two After the relative distance enters the tunneling working area, the measuring driving mechanism stops driving;

②采用偏置电场发生系统产生偏置电压加载在微测球和被测件之间形成偏置电场,尔后通过对偏置电场的调整和控制,使微测球和被测件之间发生三维量子隧穿效应,将微测球与被测件之间的瞄准间隙转化为传感信号;②A bias electric field generation system is used to generate a bias voltage to form a bias electric field between the micrometer ball and the tested object, and then through the adjustment and control of the bias electric field, a three-dimensional Quantum tunneling effect, which converts the aiming gap between the micrometer ball and the tested object into a sensing signal;

③采用隧穿信号检测系统对上述②中传感信号进行检测和处理,根据瞄准间隙和传感信号之间对应关系的模型,以亚纳米分辨力提取微测球和被测件之间的瞄准间隙信息,实现三维、亚纳米分辨力传感与测量。③A tunneling signal detection system is used to detect and process the sensing signal in the above ②, and according to the model of the corresponding relationship between the aiming gap and the sensing signal, the aiming distance between the micrometer ball and the measured object is extracted with sub-nanometer resolution. Gap information to realize three-dimensional, sub-nanometer resolution sensing and measurement.

一种基于三维量子隧穿的非接触亚纳米传感装置,包括隧穿测头1、隧穿信号处理系统2、测头姿态调整机构3、防撞安全保护机构4、测量驱动机构5,所述隧穿测头1由微测球6、信号传输机构7、屏蔽机构8、装卡机构9、信号连接器10、绝缘部件18和信号线19构成,所述微测球6与信号传输机构7的下端相连接,信号传输机构7的上端通过信号线19与信号连接器10相连,信号传输机构7的主体位于屏蔽机构8中,屏蔽机构8装配在装卡机构9上,在屏蔽机构8内配装绝缘部件18,信号连接器10连接信号传输电缆11,屏蔽机构8、装卡机构9和信号连接器10的外壳与信号传输电缆11的屏蔽层无缝连接;所述隧穿信号处理系统2由偏置电场发生系统12、隧穿信号检测系统13、限流单元14、通信电缆16和仪器主控计算机17构成,所述偏置电场发生系统12和隧穿信号检测系统13通过通信电缆16分别与仪器主控计算机17连接;隧穿测头1的信号连接器10、限流单元14、隧穿信号检测系统13、偏置电场发生系统12、被测件15通过信号传输电缆11依次串接,构成传感信号检测回路;隧穿测头1装配在所述测头姿态调整机构3上,所述测头姿态调整机构3与所述防撞安全保护机构4固定装配,测量驱动机构5安装在防撞安全保护机构4或被测件15上。A non-contact sub-nanometer sensing device based on three-dimensional quantum tunneling, including a tunneling probe 1, a tunneling signal processing system 2, a probe attitude adjustment mechanism 3, an anti-collision safety protection mechanism 4, and a measurement drive mechanism 5. The tunneling probe 1 is composed of a micrometer ball 6, a signal transmission mechanism 7, a shielding mechanism 8, a card loading mechanism 9, a signal connector 10, an insulating component 18 and a signal line 19. The micrometer ball 6 and the signal transmission mechanism The lower ends of 7 are connected, and the upper end of signal transmission mechanism 7 is connected with signal connector 10 through signal line 19. The main body of signal transmission mechanism 7 is located in shielding mechanism 8, and shielding mechanism 8 is assembled on the card-loading mechanism 9. The insulating part 18 is equipped inside, the signal connector 10 is connected to the signal transmission cable 11, and the shell of the shielding mechanism 8, the clamping mechanism 9 and the signal connector 10 is seamlessly connected with the shielding layer of the signal transmission cable 11; the tunneling signal processing The system 2 is composed of a bias electric field generation system 12, a tunneling signal detection system 13, a current limiting unit 14, a communication cable 16, and an instrument main control computer 17. The bias electric field generation system 12 and the tunneling signal detection system 13 communicate The cables 16 are respectively connected to the main control computer 17 of the instrument; the signal connector 10 of the tunneling probe 1, the current limiting unit 14, the tunneling signal detection system 13, the bias electric field generation system 12, and the DUT 15 pass through the signal transmission cable 11 connected in series to form a sensing signal detection circuit; the tunneling probe 1 is assembled on the probe attitude adjustment mechanism 3, the probe attitude adjustment mechanism 3 is fixedly assembled with the anti-collision safety protection mechanism 4, and the measurement drive The mechanism 5 is installed on the anti-collision safety protection mechanism 4 or the tested object 15 .

所述微测球6采用不锈钢或碳化钨材料制成,球体表面镀金或铂材料薄膜。The micrometer ball 6 is made of stainless steel or tungsten carbide, and the surface of the ball is plated with a thin film of gold or platinum.

所述微测球6直径在φ1μm~φ1mm范围内。The diameter of the micrometer ball 6 is within the range of φ1 μm˜φ1 mm.

所述测头姿态调整机构3为二维柔性铰链、二维气浮轴承或气浮球轴承结构。The probe attitude adjustment mechanism 3 is a two-dimensional flexible hinge, two-dimensional air bearing or air bearing structure.

所述屏蔽机构8和所述信号传输电缆11均为多同轴结构。Both the shielding mechanism 8 and the signal transmission cable 11 are of multi-coaxial structure.

下面结合图1和图3给出本发明的一个实施例。图1为本发明的基于三维量子隧穿的非接触亚纳米传感装置结构示意图。本实施例中测量驱动机构5驱动隧穿测头1。被测件15的待测面为小孔内圆柱面。隧穿测头1中微测球6采用不锈钢球,表面镀金材料的薄膜。屏蔽机构8壁厚为20μm。信号传输机构7通过焊接与微测球6在电气上连接。屏蔽机构8与信号传输机构7同轴装配构成同轴结构,两者通过绝缘材料构成的绝缘部件18进行绝缘,各部件之间可靠绝缘与定位。屏蔽机构8装卡在装卡机构9上,而装卡机构9装配在测头姿态调整机构3上,测头姿态调整机构3与防撞安全保护机构4装配。测头姿态调整机构3为二维柔性铰链结构。防撞安全保护机构4采用磁吸式保护机构,固定在测量驱动机构5上。测量驱动机构5具有亚纳米级位移分辨力。偏置电场发生系统12和隧穿信号检测系统13通过通信电缆16与仪器主控计算机17相连,并由仪器主控计算机17对二者进行控制。An embodiment of the present invention is given below with reference to FIG. 1 and FIG. 3 . FIG. 1 is a schematic structural diagram of a non-contact sub-nanometer sensing device based on three-dimensional quantum tunneling of the present invention. In this embodiment, the measurement driving mechanism 5 drives the tunneling probe 1 . The surface to be tested of the tested piece 15 is a cylindrical surface in a small hole. The micro measuring ball 6 in the tunneling probe 1 is a stainless steel ball, and the surface is plated with a thin film of a gold material. The wall thickness of the shielding mechanism 8 is 20 μm. The signal transmission mechanism 7 is electrically connected with the micrometer ball 6 by welding. The shielding mechanism 8 and the signal transmission mechanism 7 are coaxially assembled to form a coaxial structure, and the two are insulated by an insulating component 18 made of insulating material, and the components are reliably insulated and positioned. The shielding mechanism 8 is clamped on the clamping mechanism 9, and the clamping mechanism 9 is assembled on the probe attitude adjustment mechanism 3, and the probe attitude adjustment mechanism 3 is assembled with the anti-collision safety protection mechanism 4. The probe attitude adjustment mechanism 3 is a two-dimensional flexible hinge structure. The anti-collision safety protection mechanism 4 adopts a magnetic suction type protection mechanism and is fixed on the measurement driving mechanism 5 . The measurement drive mechanism 5 has sub-nanometer displacement resolution. The bias electric field generation system 12 and the tunneling signal detection system 13 are connected to the instrument main control computer 17 through the communication cable 16, and the instrument main control computer 17 controls both.

首先调整隧穿测头1与被测件15的相对位置,控制测量驱动机构5驱动隧穿测头1使其微测球6逐步接近被测件15的待测面,两者之间的相对距离逐渐减小直至进入隧穿工作区间内,此时调整偏置电场发生系统12使其输出设定的恒定电压加载在微测球6与被测件15间形成偏置电场,通过对偏置电场的调整和控制,使微测球6和被测件15之间发生三维量子隧穿效应,微测球6与被测件15的间隙信息转化为传感信号。同时监控隧穿信号处理系统2,通过控制隧穿信号检测系统13对该传感信号进行处理,即可得到被测件15与微测球6的瞄准间隙。归一化被测间距与归一化隧穿电流关系的一个实测曲线如图3所示,可据此建立测量模型。First, adjust the relative position of the tunneling probe 1 and the measured object 15, and control the measurement driving mechanism 5 to drive the tunneling probe 1 so that the micro-probe 6 gradually approaches the surface to be measured of the measured object 15. The distance gradually decreases until it enters the tunneling working range. At this time, the bias electric field generating system 12 is adjusted so that the output set constant voltage is applied to form a bias electric field between the micrometer ball 6 and the tested object 15. The adjustment and control of the electric field causes a three-dimensional quantum tunneling effect to occur between the micrometer ball 6 and the test piece 15, and the gap information between the micrometer ball 6 and the test piece 15 is converted into a sensing signal. At the same time, the tunneling signal processing system 2 is monitored, and the sensing signal is processed by controlling the tunneling signal detection system 13 to obtain the aiming gap between the measured object 15 and the micrometer ball 6 . A measured curve of the relationship between the normalized measured distance and the normalized tunneling current is shown in Figure 3, and a measurement model can be established accordingly.

图2为本发明的另一种实施方式,测量驱动机构5驱动被测件15。将被测件15固定在测量驱动机构5上,由测量驱动机构5带动被测件15接近隧穿测头1的微测球6从而完成测量。隧穿测头1与测头姿态调整机构3及防撞安全保护机构4连接固定,可安装在坐标机的Z轴运动机构上以便于测量。FIG. 2 shows another embodiment of the present invention, the measurement drive mechanism 5 drives the object under test 15 . Fix the test piece 15 on the measurement drive mechanism 5, and the test drive mechanism 5 drives the test piece 15 close to the micro-probe 6 of the tunneling probe 1 to complete the measurement. The tunneling probe 1 is connected and fixed with the probe attitude adjustment mechanism 3 and the anti-collision safety protection mechanism 4, and can be installed on the Z-axis motion mechanism of the coordinate machine for easy measurement.

Claims (3)

1. A method for sensing by using a non-contact sub-nanometer sensing device based on three-dimensional quantum tunneling is characterized by comprising the following steps: the non-contact sub-nanometer sensing device based on three-dimensional quantum tunneling comprises a tunneling measuring head (1), a tunneling signal processing system (2), a measuring head posture adjusting mechanism (3), an anti-collision safety protection mechanism (4) and a measurement driving mechanism (5); the tunneling measuring head (1) is composed of a micro measuring ball (6), a signal transmission mechanism (7), a shielding mechanism (8), a card installing mechanism (9), a signal connector (10), an insulating part (18) and a signal line (19), wherein the micro measuring ball (6) is connected with the lower end of the signal transmission mechanism (7), the diameter of the micro measuring ball (6) is in the range of phi 1 mu m-phi 1mm and is made of stainless steel or tungsten carbide materials, a gold or platinum material film is plated on the surface of a ball body, the upper end of the signal transmission mechanism (7) is connected with the signal connector (10) through the signal line (19), the main body of the signal transmission mechanism (7) is located in the shielding mechanism (8), the shielding mechanism (8) is assembled on the card installing mechanism (9), the insulating part (18) is assembled in the shielding mechanism (8), the signal connector (10) is connected with the signal transmission cable (11), and the shells of the shielding mechanism (8), the card installing mechanism (9) and the signal connector (10) are connected with a shielding layer of the signal transmission cable (11); the tunneling signal processing system (2) is composed of a bias electric field generating system (12), a tunneling signal detecting system (13), a current limiting unit (14), a communication cable (16) and an instrument main control computer (17), wherein the bias electric field generating system (12) and the tunneling signal detecting system (13) are respectively connected with the instrument main control computer (17) through the communication cable (16); a signal connector (10), a current limiting unit (14), a tunneling signal detection system (13), a bias electric field generation system (12) and a tested piece (15) of the tunneling probe (1) are sequentially connected in series through a signal transmission cable (11) to form a sensing signal detection loop; the tunneling measuring head (1) is assembled on the measuring head posture adjusting mechanism (3), the measuring head posture adjusting mechanism (3) is fixedly assembled with the anti-collision safety protection mechanism (4), and the measuring driving mechanism (5) is installed on the anti-collision safety protection mechanism (4) or a measured piece (15);
the sensing method comprises the following steps:
(1) adjusting the posture of the tunneling measuring head relative to the measured piece by adopting a measuring head posture adjusting mechanism to enable the tunneling measuring head to enter an aiming posture; then, the tunneling measuring head or the measured piece is driven by the measuring driving mechanism, and the measuring driving mechanism stops driving after the relative distance between the tunneling measuring head and the measured piece enters a tunneling working interval;
(2) a bias electric field generating system is adopted to generate bias voltage to be loaded between the micro measuring ball and the measured piece to form a bias electric field, then, the three-dimensional quantum tunneling effect is generated between the micro measuring ball and the measured piece through the adjustment and control of the bias electric field, and the aiming gap between the micro measuring ball and the measured piece is converted into a sensing signal;
(3) and (3) detecting and processing the sensing signals in the step (2) by adopting a tunneling signal detection system, and extracting aiming gap information between the micro-measuring ball and the measured piece by using sub-nanometer resolution according to a model of the corresponding relation between the aiming gap and the sensing signals so as to realize three-dimensional and sub-nanometer resolution sensing and measurement.
2. The method of claim 1, wherein: the measuring head posture adjusting mechanism (3) is of a two-dimensional flexible hinge, a two-dimensional air bearing or an air ball bearing structure.
3. The method of claim 1, wherein: the shielding mechanism (8) and the signal transmission cable (11) are both of a multi-coaxial structure.
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