CN108455876A - 一种金色低辐射镀膜玻璃及其制备方法 - Google Patents
一种金色低辐射镀膜玻璃及其制备方法 Download PDFInfo
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- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
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Abstract
本发明公开了一种金色低辐射镀膜玻璃及其制备方法。该金色低辐射镀膜玻璃包括玻璃基板和依次镀于玻璃基板上的镀膜层，镀膜层包括第一介质层、第二介质层、第一保护层、银层、第二保护层、第三介质层和第三保护层。本发明提供的镀膜玻璃，采用第一介质层、第二介质层和第三介质层三层介质层，不仅能够提高该膜层的抗损伤性能，还能够调节该镀膜玻璃的透射比、反射比和颜色，使其色泽更加纯正均匀；采用第一保护层、第二保护层和第三保护层三层保护层，能够提高该镀膜玻璃中银层的抗氧化性能，延长该镀膜玻璃的有效存储时间，降低该镀膜玻璃生产过程中的质量控制难度。本发明提供的镀膜玻璃制备方法，操作简单，成本低廉，适于工业化生产。
Description
技术领域
本发明涉及镀膜玻璃技术领域，具体涉及一种金色低辐射镀膜玻璃及其制备方法。
背景技术
低辐射镀膜玻璃，又称Low-E玻璃，是在玻璃表面镀制包括银层在内的多层金属或其它化合物组成的膜系产品。由于银层具有低辐射的特性，低辐射玻璃对可见光有较高的透射率，对红外线有很高的反射率，具有良好的隔热性能。低辐射镀膜玻璃对波长范围0.78μm～2.50μm的红外线具有较高反射比，有良好的隔热保温性能，该产品集装饰建筑外观、控制光线、调节热量、节约能源、改善环境等多种功能为一体，在建筑、交通、娱乐等多种行业应用广泛。
现有的金色镀膜玻璃主要采用低磁控溅射镀膜技术进行加工制造，该技术的实质是在普通滞留(射频)溅射技术的基础上发展起来的，其通过磁场对荷能粒子(主要是电子)的约束，提高气体分子的离化率，可以在比较高的真空状态下较快沉积高质量的薄膜材料。简而言之，通过电子离化气体分子而产生的离子(如典型的Ar+)轰击靶材来实现薄膜沉积的。即采用带有几十电子伏特以上动能的粒子或粒子束照射固体表面，靠近固体表面的原子会获得入射粒子带来的能量而脱离固体表面且自身具有一定能量，在飞行一定距离后碰撞基片沉积而形成薄膜。溅射发生的过程如下：入射粒子在进入靶材表面过程中与靶材原子发生弹性碰撞，入射粒子的一部分能量传给了靶材的原子，当靶材原子获得的能量超过了周围存在的其他原子形成的束缚(势垒)，这种原子从靶材晶格阵点被撞出，当被碰出的粒子飞行过程中将与其它靶材粒子发生相互碰撞，最终沉积在基片表面。
现有的金色镀膜玻璃主要采用介质靶材(介质层)、金属靶材(保护层)、纯铜靶材、功能靶材(低辐射层)材料在普通浮法玻璃上按照一定的沉积顺序和沉积厚度镀膜形成金色外观色调。该种玻璃存在着外观色调不纯正、抗氧化性能较低、抗损伤能力差等缺陷。
发明内容
本发明的目的在于克服现有技术的上述缺陷，提供一种金色低辐射镀膜玻璃。
为了达到上述目的，本发明所采用的技术方案如下：
一种金色低辐射镀膜玻璃，包括玻璃基板和依次镀于所述玻璃基板上的镀膜层，所述镀膜层包括第一介质层、第二介质层、第一保护层、银层、第二保护层、第三介质层和第三保护层。
优选的，所述第一介质层和所述第三介质层均为Si3N4层。
优选的，所述第二介质层为SiO2层。
优选的，所述第一介质层、所述第二介质层和所述第三介质层的厚度均为25-50nm。
优选的，所述第一保护层和所述第二保护层均为NiCr合金。
优选的，所述第一保护层和所述第二保护层的厚度均为1.5-3nm。
优选的，所述第三保护层为石墨烯。
优选的，所述石墨烯通过喷涂石墨烯溶液后烘干形成。
优选的，所述第三保护层的厚度为3-5nm。
相应地，本发明还提供了一种上述氧化金色低辐射镀膜玻璃的制备方法，包括如下步骤：
a、准备玻璃基板；
b、在玻璃基板上沉积第一介质层；
c、在第一介质层上沉积第二介质层；
d、在第二介质层上沉积第一保护层；
e、在第一保护层上沉积银层；
f、在银层上沉积第二保护层；
g、在第二保护层上沉积第三介质层；
h、在第三介质层上喷涂第三保护层。
与现有技术相比，本发明具有如下有益效果：
1、本发明提供的金色低辐射镀膜玻璃，采用第一介质层、第二介质层和第三介质层三层介质层，不仅能够提高该膜层的抗损伤性能，还能够调节该镀膜玻璃的透射比、反射比和颜色，使其色泽更加纯正均匀。
2、本发明提供的金色低辐射镀膜玻璃，采用第一保护层、第二保护层和第三保护层三层保护层，能够提高该镀膜玻璃中银层的抗氧化性能，延长该镀膜玻璃的有效存储时间，降低该镀膜玻璃生产过程中的质量控制难度；
3、本发明提供的制备金色低辐射镀膜玻璃的方法，操作简单，成本低廉，适于工业化生产。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其它附图。
图1是本发明实施例提供的的金色低辐射镀膜玻璃的剖视图；
其中：1-玻璃基板，2-第一介质层，3-第二介质层，4-第一保护层，5-银层，6-第二保护层，7-第三介质层，8-第三保护层。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有作出创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
本发明提供一种金色低辐射镀膜玻璃，包括玻璃基板和依次镀于所述玻璃基板上的镀膜层，所述镀膜层包括从内向外依次设置的第一介质层、第二介质层、第一保护层、银层、第二保护层、第三介质层和第三保护层。
本发明的一个实施方式中，所述的玻璃基板可以是任何能够得到的玻璃基板。
本发明的一个实施方式中，所述第一介质层和所述第三介质层均为Si3N4层，所述第二介质层为SiO2层，并且所述第一介质层、所述第二介质层和所述第三介质层的厚度均为25-50nm。
本发明的一个实施方式中，所述第一保护层和所述第二保护层均为NiCr合金，并且所述第一保护层和所述第二保护层的厚度均为1.5-3nm。
本发明的一个实施方式中，所述第三保护层为石墨烯，所述石墨烯通过喷涂石墨烯溶液后烘干形成，所述石墨烯的厚度为3-5nm。
本发明的一个实施方式中，所述银层的厚度为10-20nm。
相应地，本发明还提供了一种制备上述金色低辐射镀膜玻璃的方法，包括如下步骤：
a、准备玻璃基板；
b、在玻璃基板上沉积第一介质层；
c、在第一介质层上沉积第二介质层；
d、在第二介质层上沉积第一保护层；
e、在第一保护层上沉积银层；
f、在银层上沉积第二保护层；
g、在第二保护层上沉积第三介质层；
h、在第三介质层上喷涂第三保护层。
在本发明中，对于沉积工艺和沉积工艺的工艺参数没有具体的限制，优选地，第一介质层、第二介质层、第一保护层、银层、第二保护层和第三介质层均可以使用溅射方法沉积。对于现有技术中的多种沉积方法，本领域技术人员根据目标膜层的组成和厚度选择合适或优选的沉积工艺参数，其中，工艺参数包括可能涉及到的溅射气氛、靶材材质、溅射时间。
在本发明中，对于喷涂工艺和喷涂工艺的工艺参数没有具体的限制，只需将配制好的石墨烯溶液喷涂在第三介质层表面，并将喷涂石墨烯溶液后的镀膜玻璃在160℃进行烘干。本发明提供的上述氧化金色低辐射镀膜玻璃的制备方法，操作简单，成本低廉，适于工业化生产。
实施例1
本实施例提供了一种金色低辐射镀膜玻璃，包括玻璃基板1和依次镀于所述玻璃基板1上的镀膜层，所述镀膜层由内到外共有7个膜层，具体包括：第一介质层2为Si3N4，厚度为30nm；第二介质层3为SiO2，厚度为25nm；第一保护层4为NiCr，厚度为1.5nm；银层5厚度为10nm；第二保护层6为NiCr，厚度为2nm；第三介质层7为Si3N4，厚度为35nm；第三保护层8为石墨烯，厚度为3nm。
实施例2
本实施例提供了一种金色低辐射镀膜玻璃，包括玻璃基板1和依次镀于所述玻璃基板1上的镀膜层，所述镀膜层由内到外共有7个膜层，具体包括：第一介质层2为Si3N4，厚度为40nm；第二介质层3为SiO2，厚度为30nm；第一保护层4为NiCr，厚度为1.5nm；银层5厚度为15nm；第二保护层6为NiCr，厚度为2nm；第三介质层7为Si3N4，厚度为35nm；第三保护层8为石墨烯，厚度为3.5nm。
实施例3
本实施例提供了一种金色低辐射镀膜玻璃，包括玻璃基板1和依次镀于所述玻璃基板1上的镀膜层，所述镀膜层由内到外共有7个膜层，具体包括：第一介质层2为Si3N4，厚度为50nm；第二介质层3为SiO2，厚度为35nm；第一保护层4为NiCr，厚度为2.5nm；银层5厚度为20nm；第二保护层6为NiCr，厚度为3nm；第三介质层7为Si3N4，厚度为40nm；第三保护层8为石墨烯，厚度为5nm。
在上述金色低辐射镀膜玻璃中，第一介质层2、第二介质层3和第三介质层7的主要作用是调节该金色低辐射镀膜玻璃的透射比、反射比和颜色，并提高该膜层的抗损伤性能。第一保护层4、第二保护层6和第三保护层8的主要作用是提高该镀膜玻璃中银层5的抗氧化性能。
以上所述仅为本发明的优选实施例而已，并不用于限制本发明，对于本领域的技术人员来说，其依然可以对前述实施例所记载的技术方案进行修改，或者对其中部分技术特征进行等同替换，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。
Claims (10)
1.一种金色低辐射镀膜玻璃，其特征在于，包括玻璃基板(1)和依次镀于所述玻璃基板(1)上的镀膜层，所述镀膜层包括第一介质层(2)、第二介质层(3)、第一保护层(4)、银层(5)、第二保护层(6)、第三介质层(7)和第三保护层(8)。
2.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第一介质层(2)和所述第三介质层(7)均为Si3N4层。
3.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第二介质层(3)为SiO2层。
4.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第一介质层(2)、所述第二介质层(3)和所述第三介质层(7)的厚度均为25-50nm。
5.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第一保护层(4)和所述第二保护层(6)均为NiCr合金。
6.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第一保护层(4)和所述第二保护层(6)的厚度均为1.5-3nm。
7.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第三保护层(8)为石墨烯，所述石墨烯通过喷涂石墨烯溶液后烘干形成。
8.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述第三保护层(8)的厚度为3-5nm。
9.根据权利要求1所述的一种金色低辐射镀膜玻璃，其特征在于，所述银层(5)的厚度为10-20nm。
10.一种制备权利要求1-9中任一项所述的金色低辐射镀膜玻璃的方法，其特征在于，包括如下步骤：
a、准备玻璃基板(1)；
b、在玻璃基板(1)上沉积第一介质层(2)；
c、在第一介质层(2)上沉积第二介质层(3)；
d、在第二介质层(3)上沉积第一保护层(4)；
e、在第一保护层(4)上沉积银层(5)；
f、在银层(5)上沉积第二保护层(6)；
g、在第二保护层(6)上沉积第三介质层(7)；
h、在第三介质层(7)上喷涂第三保护层(8)。
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