CN108165938B - Preparation method of hetero-junctions photochemistry array and products thereof and application - Google Patents
Preparation method of hetero-junctions photochemistry array and products thereof and application Download PDFInfo
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- CN108165938B CN108165938B CN201711383553.XA CN201711383553A CN108165938B CN 108165938 B CN108165938 B CN 108165938B CN 201711383553 A CN201711383553 A CN 201711383553A CN 108165938 B CN108165938 B CN 108165938B
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- 238000002360 preparation method Methods 0.000 title claims abstract description 17
- 239000010408 film Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 14
- 239000010409 thin film Substances 0.000 claims abstract description 13
- 239000002071 nanotube Substances 0.000 claims abstract description 12
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000000231 atomic layer deposition Methods 0.000 claims abstract description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 9
- 239000001257 hydrogen Substances 0.000 claims abstract description 9
- 238000009832 plasma treatment Methods 0.000 claims abstract description 9
- 238000005530 etching Methods 0.000 claims abstract description 8
- 239000011521 glass Substances 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 238000003851 corona treatment Methods 0.000 claims abstract description 3
- 238000012545 processing Methods 0.000 claims description 8
- 239000002120 nanofilm Substances 0.000 claims description 2
- 230000001737 promoting effect Effects 0.000 claims description 2
- 238000010521 absorption reaction Methods 0.000 abstract description 3
- 238000006056 electrooxidation reaction Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000001228 spectrum Methods 0.000 abstract 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 13
- 229910052961 molybdenite Inorganic materials 0.000 description 10
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 7
- 238000001027 hydrothermal synthesis Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
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- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
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- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/20—Light-sensitive devices
- H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
- H01G9/2031—Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
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Abstract
The present invention provides preparation method of a kind of hetero-junctions photochemistry array and products thereof and application, prepares one layer of Ti film using magnetron sputtering cosputtering in FTO substrate of glass, obtains TiO using electrochemical etching method2Nano-pipe array thin film carries out corona treatment in a hydrogen atmosphere, and prepares one layer of MoS in nanotube surface using atomic layer deposition on this basis2Nano thin-film.A kind of preparation method of hetero-junctions photochemistry array provided by the invention has the use of the technology of high repeatability by magnetron sputtering, electrochemical corrosion, plasma treatment and atomic layer deposition etc., it is ensured that the repetition stability of prepared array.Preparation method of the present invention is controllable, and preferably, products obtained therefrom has wide spectrum absorption characteristics to repeatability, greatly improves the utilization efficiency of sunlight.
Description
Technical field
The invention belongs to photochemistry fields, and in particular to a kind of hetero-junctions (TiO2/MoS2) photochemistry array preparation method
And products thereof and application it is different.
Background technique
Nowadays, with the development of economy, industrialization degree is higher and higher, enjoy they to life offer convenience it is same
When, problem of environmental pollution is also at the unavoidable problem of people.
TiO2Have the characteristics that excellent physicochemical properties are stablized, be widely used in dye-sensitized solar cells and
The fields such as photolysis water hydrogen.But pure TiO2Photoelectrochemical behaviour is due to its wide band gap (visible absorption is weaker), big electricity
The disadvantages of sub- hole-recombination rate and low active site, limit its performance.And MoS2It (is can absorb visible with narrow band gap
Light) the advantages that, with TiO2Good complementarity can be formed.TiO2/MoS2Composite material is because be provided simultaneously with TiO2And MoS2It is unique
Physicochemical properties, band gap can be effectively reduced, there are synergistic effects, therefore show in photochemistry field huge potential
Value, receives researcher and widely favors.Such as document " MoS2Modify TiO2Nano-tube array photoelectrochemical behaviour research "
(Journal of Inorganic Materials, 2016,31 (11): 1237-1241) are substrate using Ti piece, prepare TiO by anodic oxidation2It receives
Then mitron array prepares nano flower-like structure MoS in nanotube surface using hydro-thermal method2, significantly improve the photochemical of material
Learn performance.
Summary of the invention
In order to overcome the deficiencies of the prior art, it is an object of that present invention to provide a kind of preparation sides of hetero-junctions photochemistry array
Method, to mention the TiO of arch large area, high repeatability2/MoS2Heterojunction array.
Another object of the present invention is: providing a kind of hetero-junctions photochemistry array product of above method preparation.
Another object of the present invention is to: a kind of application of the said goods is provided.
The object of the invention is realized by following proposal: a kind of preparation method of hetero-junctions photochemistry array, in FTO glass base
Bottom prepares one layer of Ti film using magnetron sputtering cosputtering, obtains TiO using electrochemical etching method2Nano-pipe array thin film,
Corona treatment is carried out to the film, and prepares one layer of MoS in nanotube surface2Nano thin-film comprising the steps of:
(1) one layer of Ti film is prepared using magnetron sputtering cosputtering in FTO substrate of glass;
(2) TiO is obtained using electrochemical etching method2Nano-pipe array thin film;
(3) in a hydrogen atmosphere, plasma treatment is carried out to above-mentioned film;
(4) one layer of MoS is grown in nanotube surface using atomic layer deposition2Nano thin-film.
Wherein, Ti film thickness described in step (1) is 500-800nm.
Plasma treatment described in step (3), refers under vacuum, is passed through hydrogen atmosphere, carries out plasma to film
Processing, plasma power 20W, processing time are 3-5 minutes.
MoS2 nano film thickness described in step (4) is 2-8nm.
The present invention provides a kind of hetero-junctions photochemistry array product, is prepared according to any of the above-described the method.
The present invention provides a kind of application of hetero-junctions photochemistry array product in the utilization efficiency for promoting sunlight.
A kind of preparation method of hetero-junctions photochemistry array provided by the invention, by magnetron sputtering, electrochemical corrosion, etc.
Ion processing and atomic layer deposition etc. have the use of the technology of high repeatability, it is ensured that the repetition of prepared array is steady
It is qualitative.Meanwhile the present invention utilizes plasma treatment, increases TiO2The active site of nanotube surface, atomic layer deposition can
In TiO2Nanotube surface uniform deposition MoS2Nano thin-layer greatly improves the area of hetero-junctions, than with the methods of hydro-thermal method into
Row MoS2Modification, modification efficiency has and is obviously improved.Preparation method of the present invention has preferably repeatability, and products obtained therefrom has width
Spectral absorption feature greatly improves the utilization efficiency of sunlight.
Detailed description of the invention
Fig. 1 is the SEM figure of hetero-junctions photochemistry array prepared by embodiment 1;
Fig. 2 is the current density performance map of hetero-junctions photochemistry array prepared by embodiment 1.
Specific embodiment
Embodiment 1
A kind of preparation method of hetero-junctions photochemistry array product:
(1) one layer of 500nmTi film is prepared using magnetron sputtering cosputtering in FTO substrate of glass;
(2) TiO is obtained using electrochemical etching method2Nano-pipe array thin film;
(3) in a hydrogen atmosphere, plasma treatment is carried out to above-mentioned film, processing power 20w is handled the time 4 minutes;
(4) one layer of 5nm thickness nanometer MoS is grown in nanotube surface using atomic layer deposition2Film.Fig. 1 is prepared
The SEM of hetero-junctions photochemistry array schemes.
As electrochemical working electrode, under solar simulator environment, current density test is carried out, light source light energy is close
Degree is maintained at 100mW/cm2, Fig. 2 is shown in the current density performance map of prepared hetero-junctions photochemistry array.
Embodiment 2
A kind of preparation method of hetero-junctions photochemistry array product:
(1) one layer of 600nmTi film is prepared using magnetron sputtering cosputtering in FTO substrate of glass;
(2) TiO is obtained using electrochemical etching method2Nano-pipe array thin film;
(3) in a hydrogen atmosphere, plasma treatment is carried out to above-mentioned film, processing power 20w is handled the time 3 minutes;
(4) one layer of 2nm thickness nanometer MoS is grown in nanotube surface using atomic layer deposition2Film.
Embodiment 3
A kind of preparation method of hetero-junctions photochemistry array product
(1) one layer of 800nmTi film is prepared using magnetron sputtering cosputtering in FTO substrate of glass;
(2) TiO is obtained using electrochemical etching method2Nano-pipe array thin film;
(3) in a hydrogen atmosphere, plasma treatment is carried out to above-mentioned film, processing power 20w is handled the time 5 minutes;
(4) one layer of 8nm thickness nanometer MoS is grown in nanotube surface using atomic layer deposition2Film.
The various embodiments described above sample under solar simulator environment, carries out current density as electrochemical working electrode
Test, light source optical energy density are maintained at 100mW/cm2。
The present invention provides a kind of TiO2/MoS2Heterojunction array, can large area preparation, function admirable is reproducible.
Claims (3)
1. a kind of preparation method of hetero-junctions photochemistry array, which is characterized in that splashed altogether in FTO substrate of glass using magnetron sputtering
One layer of Ti film of preparation is penetrated, obtains TiO using electrochemical etching method2Nano-pipe array thin film carries out plasma to the film
Body processing, and one layer of MoS is prepared in nanotube surface2Nano thin-film comprising the steps of:
(1) one layer of Ti film is prepared using magnetron sputtering cosputtering in FTO substrate of glass;
(2) TiO is obtained using electrochemical etching method2Nano-pipe array thin film;
(3) in a hydrogen atmosphere, plasma treatment is carried out to above-mentioned film;
(4) one layer of MoS is grown in nanotube surface using atomic layer deposition2Nano thin-film;
Ti film thickness described in step (1) is 500-800nm;
Plasma treatment described in step (3), refers under vacuum, is passed through hydrogen atmosphere, carries out corona treatment to film,
Plasma power is 20W, and the processing time is 3-5 minutes;
MoS described in step (4)2Nano film thickness is 2-8nm.
2. a kind of hetero-junctions photochemistry array, it is characterised in that be prepared method according to claim 1.
3. a kind of application of hetero-junctions photochemistry array according to claim 2 in the utilization efficiency for promoting sunlight.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023287284A1 (en) * | 2021-07-12 | 2023-01-19 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Thin film porous catalyst sheet |
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| CN105408516A (en) * | 2013-07-31 | 2016-03-16 | 建国大学校产学协力团 | MoS2 thin film and its manufacturing method |
| CN105845739A (en) * | 2016-05-17 | 2016-08-10 | 天津理工大学 | Two-dimensional nano sheet layer transition metal sulfide bidirectional switch device |
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