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CN107908084A - A kind of new-type inorganic environmental protection moves back film liquid - Google Patents

A kind of new-type inorganic environmental protection moves back film liquid Download PDF

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Publication number
CN107908084A
CN107908084A CN201711165820.6A CN201711165820A CN107908084A CN 107908084 A CN107908084 A CN 107908084A CN 201711165820 A CN201711165820 A CN 201711165820A CN 107908084 A CN107908084 A CN 107908084A
Authority
CN
China
Prior art keywords
back film
new
environmental protection
moves back
film liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201711165820.6A
Other languages
Chinese (zh)
Inventor
赵志斌
欧胜
肖红星
孙宝林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DONGGUAN GUANGHUA CHEMICAL Co Ltd
Original Assignee
DONGGUAN GUANGHUA CHEMICAL Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DONGGUAN GUANGHUA CHEMICAL Co Ltd filed Critical DONGGUAN GUANGHUA CHEMICAL Co Ltd
Priority to CN201711165820.6A priority Critical patent/CN107908084A/en
Publication of CN107908084A publication Critical patent/CN107908084A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • G03F7/425Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

The invention discloses a kind of new-type inorganic environmental protection to move back film liquid, it includes the material of following parts by weight;Inorganic alkali compound 1% 10%, azole compounds 0.01% 5%, shield tin oxygen scavenger 1% 5%, move back 0.05% 1% excess water of film accelerator.Pass through above-mentioned material proportion, the new-type inorganic environmental protection of the present invention moves back that film liquid can quickly peel off the resist layer dry film after graphic plating on circuit board and the etching to copper, tin is extremely low, it is low that the COD value of caused waste liquid and complexing power after film liquid moves back film use are moved back through the new-type inorganic environmental protection, the intractability of waste liquid can be thus effectively reduced, and reaches the disposable standard easily discharged.

Description

A kind of new-type inorganic environmental protection moves back film liquid
Technical field
The present invention relates to the liquid decorporated in printed circuit board fabrication line road used in dry film, more particularly to one kind to be applied to figure New-type inorganic environmental protection in shape electroplating technology printed circuit board (PCB) processing procedure moves back film liquid.
Background technology
In the manufacturing process of graphic plating technique printed circuit board (PCB), circuit board needs coating dry film after by preceding processing (Resist layer), layer pattern against corrosion is then formed by exposure imaging process, then form tin guarantor in copper wire by process Sheath, and upper tin will not then be crossed on the copper of dry film covering by having, and then expose unwanted copper by moving back film liquid and dry film being peeled off, Unwanted copper is etched away by alkaline etching liquid, finally the protective layer used tin stripping liquid of tin is decorporated to form required circuit.
It should further be noted that the film liquid of moving back used in traditional outer layer SES techniques is that organic type moves back film liquid, organic type Film liquid is moved back to the aggressive extremely low of tin protective layer, but the waste liquid COD higher of its generation, metal complexing capability is extremely strong, thus can Increase the intractability to waste liquid and increase corresponding processing cost.
With continuous improvement of the society to environmental requirement, inorganic type moves back film liquid and gradually selects to use by producer;It is however, inorganic Type moves back film liquid, and to move back film liquid than organic type to the aggressiveness of tin protective layer high, and film liquid is moved back to tin for inorganic type in anti-retaining membrane process Excessive attack corrosion and cause defect and scrap, in graphic plating technique, common practices is to thicken tin protective layer, still Production cost can so be increased.
With accelerating development for circuit printing industry, in the market is badly in need of a kind of COD extremely low to tin protective layer aggressiveness, low Value, low metal complexing power move back film liquid.
The content of the invention
The purpose of the present invention is to solve the shortcomings of the prior art and a kind of new-type inorganic environmental protection is provided and moves back film liquid, this is new Formula inorganic environmental protection, which moves back film liquid, can quickly peel off resist layer dry film after graphic plating on circuit board and to the etching pole of copper, tin It is low, move back after film liquid moves back film use that the COD value of caused waste liquid and complexing power are low through the new-type inorganic environmental protection, thus may be used To be effectively reduced the intractability of waste liquid, and reach the disposable standard easily discharged.
To reach above-mentioned purpose, the present invention is achieved through the following technical solutions.
A kind of new-type inorganic environmental protection moves back film liquid, includes the material of following parts by weight, specifically:
Inorganic alkali compound 1%-10%;
Azole compounds 0.01%-5%;
Protect tin oxygen scavenger 1%-5%;
Move back film accelerator 0.05%-1%;
Excess water;
The new-type inorganic environmental protection moves back film liquid and moves back film liquid for alkalescence, and inorganic alkali compound moves back film liquid as the new-type inorganic environmental protection The source of alkaline environment and the stripper as resist layer dry film, inorganic alkali compound is that its aqueous solution is alkali in inorganic compound The sylvite or sodium salt of property;
Azole compounds are that the uncorroded compound of tin layers is protected under alkaline environment;
Tin oxygen scavenger is protected to protect the phosphate or boride of the not oxidized attack of tin layers under alkaline environment;
It is to accelerate resist layer dry film peeling rate under alkaline environment and reduce to move back film liquid to tin layers attack time to move back film accelerator Auxiliary agent;
The new-type inorganic environmental protection moves back film liquid and uses method used below, specifically:First by the electricity after graphic plating process Road plate moves back film liquid, circuit board by the way of immersion or spray under 50 DEG C of temperature conditionss by the new-type inorganic environmental protection Cleaned up again with water after moving back film process, then carrying out drying and processing, finally using the circuit board after drying X-Ray detectors detect the degree that fixed position tin layers are corroded, while detect the COD value and complexing energy using rear waste liquid Power.
Further, a kind of new-type inorganic environmental protection moves back film liquid, includes the material of following parts by weight, specifically:
Inorganic alkali compound 2%-8%;
Azole compounds 0.05%-3%;
Protect tin oxygen scavenger 2%-5%;
Move back film accelerator 0.05%-0.5%;
Excess water.
Wherein, the inorganic alkali compound is sodium hydroxide, potassium hydroxide, sodium carbonate, sodium acid carbonate, potassium carbonate, phosphoric acid One or more kinds of mixing in sodium.
Wherein, the azole compounds are one kind in benzotriazole, imidazoles, benzimidazole, methyl benzotriazazole Or two or more mixing.
Wherein, the shield tin oxygen scavenger is ammonium di-hydrogen phosphate, sodium hypophosphite, sodium borohydride, dimethylamine borane, hydroboration One or more kinds of mixing in potassium, ammonium borohydride.
Wherein, the film accelerator that moves back is aminated compounds ammonium hydroxide, monoethanolamine, diethanol amine, triethanolamine, tetramethyl One or more kinds of mixing in ammonium hydroxide, heptadecyl-amine.
Beneficial effects of the present invention are:A kind of new-type inorganic environmental protection of the present invention moves back film liquid, it includes following The material of parts by weight;Inorganic alkali compound 1%-10%, azole compounds 0.01%-5%, protect tin oxygen scavenger 1%-5%, move back film accelerator 0.05%-1% excess waters;The new-type inorganic environmental protection moves back film liquid and moves back film liquid for alkalescence, and inorganic alkali compound is new-type inorganic as this Environment-friendly type moves back the source of film liquid alkaline environment and the stripper as resist layer dry film, and inorganic alkali compound is in inorganic compound Its aqueous solution is alkaline sylvite or sodium salt;Azole compounds are that the uncorroded compound of tin layers is protected under alkaline environment; Tin oxygen scavenger is protected to protect the phosphate or boride of the not oxidized attack of tin layers under alkaline environment;Move back film accelerator be Accelerate resist layer dry film peeling rate under alkaline environment and reduce to move back auxiliary agent of the film liquid to tin layers attack time.Pass through above-mentioned material Proportioning, new-type inorganic environmental protection of the invention move back film liquid can quickly peel off resist layer dry film after graphic plating on circuit board and Etching to copper, tin is extremely low, and the COD value of caused waste liquid and complexing after film liquid moves back film use are moved back through the new-type inorganic environmental protection Ability is low, can thus be effectively reduced the intractability of waste liquid, and reaches the disposable standard easily discharged.
Embodiment
With reference to specific embodiment, the present invention will be described.
Embodiment one, a kind of new-type inorganic environmental protection move back film liquid, include the material of following parts by weight, specifically:
Sodium hydroxide 3%;
Benzotriazole 0.5%;
Sodium hypophosphite 2%;
Excess water.
For the new-type inorganic environmental protection of the present embodiment one moves back film liquid, carrying out moving back film use and to circuit using it Plate is carried out during moving back film process, and the circuit board after graphic plating process is first used leaching under 50 DEG C of temperature conditionss The mode of bubble or spray moves back film liquid by the new-type inorganic environmental protection of the present embodiment one, and circuit board is used again after moving back film process Water is cleaned up, and is then carrying out drying and processing, is finally detected the circuit board after drying using X-Ray detectors solid The degree that tin layers are corroded is put in positioning, while detects the COD value and complexing power using rear waste liquid.
By above-mentioned material proportion, the new-type inorganic environmental protection of the present embodiment one, which moves back film liquid, can quickly peel off graphic plating Resist layer dry film on the circuit board and etching to copper, tin is extremely low afterwards, is moved back after film liquid moves back film use through the new-type inorganic environmental protection The COD value and complexing power of caused waste liquid are low, can thus be effectively reduced the intractability of waste liquid, and reach easy place Manage the standard easily discharged.
Embodiment two, a kind of new-type inorganic environmental protection move back film liquid, include the material of following parts by weight, specifically:
Potassium hydroxide 4%;
Benzotriazole 1%;
Sodium borohydride 1%;
Excess water.
Wherein, the new-type inorganic environmental protection of the present embodiment two moves back the application method of film liquid and the new-type inorganic ring of embodiment one The application method that guarantor's type moves back film liquid is identical.
By above-mentioned material proportion, the new-type inorganic environmental protection of the present embodiment two, which moves back film liquid, can quickly peel off graphic plating Resist layer dry film on the circuit board and etching to copper, tin is extremely low afterwards, is moved back after film liquid moves back film use through the new-type inorganic environmental protection The COD value and complexing power of caused waste liquid are low, can thus be effectively reduced the intractability of waste liquid, and reach easy place Manage the standard easily discharged.
Embodiment three, a kind of new-type inorganic environmental protection move back film liquid, include the material of following parts by weight, specifically:
Sodium hydroxide 5%;
Methyl benzotriazazole(TTA) 0.5%;
Benzotriazole 0.5%;
Dimethylamine borane 1%;
Excess water.
Wherein, the new-type inorganic environmental protection of the present embodiment three moves back the application method of film liquid and the new-type inorganic ring of embodiment one The application method that guarantor's type moves back film liquid is identical.
By above-mentioned material proportion, the new-type inorganic environmental protection of the present embodiment three, which moves back film liquid, can quickly peel off graphic plating Resist layer dry film on the circuit board and etching to copper, tin is extremely low afterwards, is moved back after film liquid moves back film use through the new-type inorganic environmental protection The COD value and complexing power of caused waste liquid are low, can thus be effectively reduced the intractability of waste liquid, and reach easy place Manage the standard easily discharged.
Now by above-described embodiment one, embodiment two, embodiment three new-type inorganic environmental protection move back film liquid with the prior art Common inorganic type moves back film liquid, organic type moves back film liquid and compares and analyzes.Wherein, common inorganic type moves back film liquid and uses following weight The material of part:Sodium hydroxide 5%, excess water;Common inorganic type moves back the application method of film liquid and the new-type inorganic environment-friendly of embodiment one The application method that type moves back film liquid is identical(Specific detection data are with reference to control embodiment one).Common organic type move back film liquid use with The material of lower parts by weight:Monoethanolamine 5%, ethylenediamine 3%, excess water;Common organic type moves back the application method and embodiment of film liquid The application method that one new-type inorganic environmental protection moves back film liquid is identical(Specific detection data are with reference to control embodiment two).
Implement one, two, three and control embodiment one, two the results detailed in following table.
  Tin planar condition COD value(PPM) Sting tin speed (um/min) Move back the film time
Embodiment one Minimum corrosion tin colourless is temporary 19500.2 0.0064 71
Embodiment two Minimum corrosion tin colourless is temporary 18782.1 0.0061 71
Embodiment three Minimum corrosion tin colourless is temporary 19882.2 0.0057 72
Compare embodiment one Heavy corrosion tin face blacks 20048.4 0.1159 75
Compare embodiment two Corrosion-free tin colourless is temporary 28856808 0.0018 74
Above content is only presently preferred embodiments of the present invention, for those of ordinary skill in the art, according to the present invention's Thought, there will be changes, this specification content should not be construed as to the present invention in specific embodiments and applications Limitation.

Claims (6)

1. a kind of new-type inorganic environmental protection moves back film liquid, it is characterised in that includes the material of following parts by weight, specifically:
Inorganic alkali compound 1%-10%;
Azole compounds 0.01%-5%;
Protect tin oxygen scavenger 1%-5%;
Move back film accelerator 0.05%-1%;
Excess water;
The new-type inorganic environmental protection moves back film liquid and moves back film liquid for alkalescence, and inorganic alkali compound moves back film liquid as the new-type inorganic environmental protection The source of alkaline environment and the stripper as resist layer dry film, inorganic alkali compound is that its aqueous solution is alkali in inorganic compound The sylvite or sodium salt of property;
Azole compounds are that the uncorroded compound of tin layers is protected under alkaline environment;
Tin oxygen scavenger is protected to protect the phosphate or boride of the not oxidized attack of tin layers under alkaline environment;
It is to accelerate resist layer dry film peeling rate under alkaline environment and reduce to move back film liquid to tin layers attack time to move back film accelerator Auxiliary agent;
The new-type inorganic environmental protection moves back film liquid and uses method used below, specifically:First by the electricity after graphic plating process Road plate moves back film liquid, circuit board by the way of immersion or spray under 50 DEG C of temperature conditionss by the new-type inorganic environmental protection Cleaned up again with water after moving back film process, then carrying out drying and processing, finally using the circuit board after drying X-Ray detectors detect the degree that fixed position tin layers are corroded, while detect the COD value and complexing energy using rear waste liquid Power.
2. a kind of new-type inorganic environmental protection according to claim 1 moves back film liquid, it is characterised in that includes following parts by weight Material, specifically:
Inorganic alkali compound 2%-8%;
Azole compounds 0.05%-3%;
Protect tin oxygen scavenger 2%-5%;
Move back film accelerator 0.05%-0.5%;
Excess water.
3. a kind of new-type inorganic environmental protection according to claim 2 moves back film liquid, it is characterised in that:The inorganic alkali compound For one or more kinds of mixing in sodium hydroxide, potassium hydroxide, sodium carbonate, sodium acid carbonate, potassium carbonate, sodium phosphate.
4. a kind of new-type inorganic environmental protection according to claim 3 moves back film liquid, it is characterised in that:The azole compounds are One or more kinds of mixing in benzotriazole, imidazoles, benzimidazole, methyl benzotriazazole.
5. a kind of new-type inorganic environmental protection according to claim 4 moves back film liquid, it is characterised in that:It is described shield tin oxygen scavenger be In ammonium di-hydrogen phosphate, sodium hypophosphite, sodium borohydride, dimethylamine borane, potassium borohydride, ammonium borohydride it is one or two kinds of with On mixing.
6. a kind of new-type inorganic environmental protection according to claim 5 moves back film liquid, it is characterised in that:The film accelerator that moves back is One kind in aminated compounds ammonium hydroxide, monoethanolamine, diethanol amine, triethanolamine, tetramethylammonium hydroxide, heptadecyl-amine or two The mixing of the kind above.
CN201711165820.6A 2017-11-21 2017-11-21 A kind of new-type inorganic environmental protection moves back film liquid Pending CN107908084A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201711165820.6A CN107908084A (en) 2017-11-21 2017-11-21 A kind of new-type inorganic environmental protection moves back film liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
CN107908084A true CN107908084A (en) 2018-04-13

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110093639A (en) * 2019-04-22 2019-08-06 深圳市泓达环境科技有限公司 A kind of shield tin additive and etching solution
CN110113872A (en) * 2019-04-29 2019-08-09 武汉利之达科技股份有限公司 A kind of PCB moves back membrane process, manufacturing method and system
CN110597026A (en) * 2019-09-26 2019-12-20 上海富柏化工有限公司 Dry film removing process for flexible circuit board
CN111118501A (en) * 2020-01-07 2020-05-08 深圳市星扬高新科技有限公司 Tin surface protective agent and preparation method thereof
CN113755851A (en) * 2021-09-10 2021-12-07 珠海市板明科技有限公司 Tin surface protective agent and film stripping liquid for circuit board production
CN114276712A (en) * 2022-01-21 2022-04-05 深圳市松柏实业发展有限公司 Ink stripping liquid and stripping process of circuit board ink
CN120035052A (en) * 2025-04-22 2025-05-23 深圳市大正瑞地科技有限公司 Method for removing dehumidifying film in printed circuit board selection process and printed circuit board

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CN101042543A (en) * 2006-03-23 2007-09-26 株式会社东进世美肯 Chemical cleaning composition for cleaning resist remover
CN102163011A (en) * 2011-04-29 2011-08-24 西安东旺精细化学有限公司 Stripping liquid composition of photoresist
CN102221791A (en) * 2011-04-29 2011-10-19 西安东旺精细化学有限公司 Photoresist stripper composition
CN105573071A (en) * 2015-05-26 2016-05-11 叶旖婷 Efficient and environment-friendly film-stripping solution capable of keeping copper surface bright and concentrated solution of film-stripping solution

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101042543A (en) * 2006-03-23 2007-09-26 株式会社东进世美肯 Chemical cleaning composition for cleaning resist remover
CN102163011A (en) * 2011-04-29 2011-08-24 西安东旺精细化学有限公司 Stripping liquid composition of photoresist
CN102221791A (en) * 2011-04-29 2011-10-19 西安东旺精细化学有限公司 Photoresist stripper composition
CN105573071A (en) * 2015-05-26 2016-05-11 叶旖婷 Efficient and environment-friendly film-stripping solution capable of keeping copper surface bright and concentrated solution of film-stripping solution

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110093639A (en) * 2019-04-22 2019-08-06 深圳市泓达环境科技有限公司 A kind of shield tin additive and etching solution
CN110113872A (en) * 2019-04-29 2019-08-09 武汉利之达科技股份有限公司 A kind of PCB moves back membrane process, manufacturing method and system
CN110597026A (en) * 2019-09-26 2019-12-20 上海富柏化工有限公司 Dry film removing process for flexible circuit board
CN111118501A (en) * 2020-01-07 2020-05-08 深圳市星扬高新科技有限公司 Tin surface protective agent and preparation method thereof
CN113755851A (en) * 2021-09-10 2021-12-07 珠海市板明科技有限公司 Tin surface protective agent and film stripping liquid for circuit board production
CN114276712A (en) * 2022-01-21 2022-04-05 深圳市松柏实业发展有限公司 Ink stripping liquid and stripping process of circuit board ink
CN120035052A (en) * 2025-04-22 2025-05-23 深圳市大正瑞地科技有限公司 Method for removing dehumidifying film in printed circuit board selection process and printed circuit board

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Application publication date: 20180413