CN107129137A - The cutting-off method of glass substrate and the manufacture method of glass substrate - Google Patents
The cutting-off method of glass substrate and the manufacture method of glass substrate Download PDFInfo
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- CN107129137A CN107129137A CN201710173236.9A CN201710173236A CN107129137A CN 107129137 A CN107129137 A CN 107129137A CN 201710173236 A CN201710173236 A CN 201710173236A CN 107129137 A CN107129137 A CN 107129137A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
- C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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Abstract
本发明提供一种玻璃基板的切断方法及玻璃基板的制造方法。所述玻璃基板的切断方法照射激光而将玻璃基板沿着切断预定线进行切断,其特征在于,使包含向玻璃基板的一方的表面照射激光的激光的照射区域的、玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲,在激光的照射区域中,从玻璃基板的一方的表面到另一方的表面为止的激光照射部加热至气化的温度以上,使激光的照射区域沿着玻璃基板的切断预定线相对于玻璃基板相对地移动。
The invention provides a method for cutting a glass substrate and a method for manufacturing the glass substrate. The glass substrate cutting method irradiates laser light to cut the glass substrate along the planned cutting line, wherein the glass substrate and the planned cutting line including the irradiation area of the laser beam irradiated to one surface of the glass substrate are set Part of the region in the orthogonal width direction is curved in the width direction of the glass substrate, and in the laser irradiation region, the laser irradiation part from one surface of the glass substrate to the other surface is heated to a temperature above the vaporization temperature, The irradiated area of the laser beam is moved relative to the glass substrate along the planned cutting line of the glass substrate.
Description
本申请为国际申请PCT/JP2014/061849于2015年10月28日进入中国国家阶段、申请号为201480024048.4、发明名称为“玻璃基板的切断方法及玻璃基板的制造方法”的申请的分案申请。This application is a divisional application of the international application PCT/JP2014/061849, which entered the Chinese national phase on October 28, 2015, with the application number 201480024048.4 and the title of the invention "Method for Cutting Glass Substrate and Method for Manufacturing Glass Substrate".
技术领域technical field
本发明涉及玻璃基板的切断方法及玻璃基板的制造方法。The present invention relates to a method for cutting a glass substrate and a method for manufacturing the glass substrate.
背景技术Background technique
作为玻璃基板的切断方法,研究了使用激光的切断方法。As a cutting method of a glass substrate, a cutting method using a laser has been studied.
例如专利文献1公开了一种在通过照射激光而刚形成了规定的深度的切口凹部之后利用压缩气体等进行强制冷却的玻璃基板的切断方法。For example, Patent Document 1 discloses a method of cutting a glass substrate by forcibly cooling with compressed gas or the like immediately after forming a notch concave portion of a predetermined depth by irradiation with laser light.
而且,在专利文献2中公开了一种玻璃基板的切断方法,向玻璃基板扫描并照射激光,在激光的照射部分使玻璃熔融,利用辅助气体将熔融的玻璃吹飞。In addition, Patent Document 2 discloses a glass substrate cutting method in which a glass substrate is scanned and irradiated with laser light, the glass is melted at the irradiated part of the laser light, and the molten glass is blown away by an assist gas.
【在先技术文献】【Prior technical literature】
【专利文献】【Patent Literature】
【专利文献1】日本国特开2004-059328号公报[Patent Document 1] Japanese Patent Laid-Open No. 2004-059328
【专利文献2】日本国特开昭60-251138号公报[Patent Document 2] Japanese Patent Laid-Open No. 60-251138
发明内容Contents of the invention
【发明要解决的课题】【Problems to be solved by the invention】
然而,根据专利文献1记载的玻璃基板的切断方法,包含通过向其切断面照射激光而形成的切口凹部所对应的部分和之后进行了强制冷却时在切口凹部的下部形成的部分,两者的表面特性不同。However, according to the method of cutting a glass substrate described in Patent Document 1, the part corresponding to the notch recess formed by irradiating the cut surface with laser light and the part formed under the notch recess during forced cooling thereafter are included. The surface properties are different.
这样在切断面中存在以切断方法为起因的表面特性不同的部分的情况下,为了形成产品而对切断面进行研磨,需要形成为表面特性均一的切断面。因此,关于切断面的研磨工序需要时间。In this way, when there are parts with different surface properties due to the cutting method in the cut surface, the cut surface needs to be polished to form a product with uniform surface properties. Therefore, it takes time to polish the cut surface.
而且,在刚照射了激光之后需要对玻璃基板喷吹压缩气体(辅助气体),因此存在玻璃基板的位置容易位移且切断精度下降的情况。Moreover, since it is necessary to blow compressed gas (assist gas) to the glass substrate immediately after irradiation of the laser beam, the position of the glass substrate tends to shift and cutting accuracy may decrease.
根据专利文献2记载的玻璃基板的切断方法,由于辅助气体的压力而玻璃基板的位置发生位移,存在切断时的精度有时会降低这样的问题。而且,根据激光的能量密度的不同,存在局部的玻璃的热变形量增大而玻璃基板产生龟裂的情况。此外,通过辅助气体除去了的熔融的玻璃附着、凝固于切断面或其周边,因此为了将其除去而研磨工序需要时间。According to the cutting method of the glass substrate described in Patent Document 2, the position of the glass substrate is displaced by the pressure of the assist gas, and there is a problem that accuracy at the time of cutting may decrease. In addition, depending on the energy density of the laser light, the amount of thermal deformation of the glass may locally increase to cause cracks in the glass substrate. In addition, since the molten glass removed by the assist gas adheres to and solidifies on the cut surface or its periphery, time is required for a polishing process to remove it.
本发明鉴于上述现有技术的课题,其目的在于提供一种与上述向玻璃基板喷吹辅助气体的以往的玻璃基板的切断方法相比、能够高精度地对玻璃基板进行切断加工,抑制玻璃基板的龟裂的产生、得到均一的切断面的玻璃基板的切断方法。In view of the problems of the prior art described above, an object of the present invention is to provide a method for cutting a glass substrate with high precision, and to suppress the glass substrate from being cut, compared with the above-mentioned conventional method of cutting a glass substrate in which assist gas is blown to the glass substrate. The occurrence of cracks and the cutting method of the glass substrate to obtain a uniform cut surface.
【用于解决课题的方案】【Proposal to solve the problem】
为了解决上述课题,本发明提供一种玻璃基板的切断方法,照射激光而沿着切断预定线将玻璃基板切断,其特征在于,使包含向所述玻璃基板的一方的表面照射所述激光的激光的照射区域的、所述玻璃基板的与切断预定线正交的宽度方向的一部分的区域在所述玻璃基板的所述宽度方向上弯曲,在所述激光照射区域中,从所述玻璃基板的一方的表面到另一方的表面为止的激光照射部加热至气化的温度以上,使所述激光的照射区域沿着所述玻璃基板的切断预定线相对于所述玻璃基板相对地移动。In order to solve the above-mentioned problems, the present invention provides a method for cutting a glass substrate, which cuts the glass substrate along a planned cutting line by irradiating laser light, wherein the method includes irradiating the laser light to one surface of the glass substrate. A part of the glass substrate in the width direction perpendicular to the line to cut is curved in the width direction of the glass substrate in the irradiated area of the laser beam, and in the laser irradiated area, from the The laser beam irradiating part from one surface to the other surface is heated to a gasification temperature or higher, and the laser beam irradiated area is relatively moved relative to the glass substrate along a line to cut of the glass substrate.
【发明效果】【Invention effect】
根据本发明的玻璃基板的切断方法,与以往的使用了辅助气体的玻璃基板的切断方法相比,能够高精度地对玻璃基板进行切断加工。而且,在切断时能够抑制向玻璃基板的龟裂的产生,能够形成为均一的切断面。According to the cutting method of the glass substrate of this invention, compared with the cutting method of the conventional glass substrate using an assist gas, it is possible to cut and process a glass substrate with high precision. Furthermore, the occurrence of cracks to the glass substrate can be suppressed during cutting, and a uniform cut surface can be formed.
附图说明Description of drawings
图1是本发明的实施方式的玻璃基板的切断方法的说明图。FIG. 1 : is explanatory drawing of the cutting method of the glass substrate concerning embodiment of this invention.
图2A是对在表面包含有凹凸的玻璃基板照射激光时的激光振荡装置与玻璃基板的一方的表面之间的距离的说明图。2A is an explanatory diagram of the distance between a laser oscillator and one surface of a glass substrate when a glass substrate having an uneven surface is irradiated with laser light.
图2B是对在表面包含有凹凸的玻璃基板照射激光时的激光振荡装置与玻璃基板的一方的表面之间的距离的说明图。2B is an explanatory diagram of the distance between the laser oscillator and one surface of the glass substrate when irradiating laser light to the glass substrate including unevenness on the surface.
图3是具备支承构件的搬运辊的构成例的说明图。FIG. 3 is an explanatory diagram of a configuration example of a conveyance roller provided with a support member.
图4是将具备支承构件的搬运辊配置在玻璃基板的搬运路径上的构成例的说明图。It is explanatory drawing of the structural example which arrange|positions the conveyance roller provided with a support member on the conveyance path of a glass substrate.
图5是将具备支承构件的搬运辊配置在玻璃基板的搬运路径上的构成例的说明图。It is explanatory drawing of the structural example which arrange|positions the conveyance roller provided with a support member on the conveyance path of a glass substrate.
图6是使玻璃基板的宽度方向的一部分的区域弯曲的搬运辊的构成例的说明图。It is explanatory drawing of the structural example of the conveyance roller which bends some regions of the width direction of a glass substrate.
图7是本发明的实施方式的玻璃基板的切断方法中的加热工序的说明图。7 is an explanatory diagram of a heating step in the method of cutting a glass substrate according to the embodiment of the present invention.
图8是本发明的实施方式的玻璃基板的切断方法中的冷却工序的说明图。8 is an explanatory diagram of a cooling step in the method of cutting a glass substrate according to the embodiment of the present invention.
图9是本发明的实施方式的玻璃基板的切断方法中的关于冷却工序中的析出物的说明图。FIG. 9 is an explanatory diagram of precipitates in a cooling step in the method for cutting a glass substrate according to the embodiment of the present invention.
图10是本发明的实验例1的玻璃基板的搬运速度及激光的能量密度与切断面的评价的关系的说明图。10 is an explanatory diagram of the relationship between the conveyance speed of the glass substrate, the energy density of the laser beam, and the evaluation of the cut surface in Experimental Example 1 of the present invention.
图11是本发明的实验例2的玻璃基板的搬运速度及激光的能量密度与切断面的评价的关系的说明图。11 is an explanatory diagram of the relationship between the conveyance speed of the glass substrate, the energy density of the laser beam, and the evaluation of the cut surface in Experimental Example 2 of the present invention.
图12是本发明的实验例3的玻璃基板的搬运速度及激光的能量密度与切断面的评价的关系的说明图。12 is an explanatory diagram of the relationship between the conveyance speed of the glass substrate, the energy density of the laser beam, and the evaluation of the cut surface in Experimental Example 3 of the present invention.
图13是本发明的实验例4的玻璃基板的搬运速度及激光的能量密度与切断面的评价的关系的说明图。13 is an explanatory diagram of the relationship between the conveyance speed of the glass substrate, the energy density of the laser beam, and the evaluation of the cut surface in Experimental Example 4 of the present invention.
图14是使玻璃基板的宽度方向的一部分的区域弯曲的其他的方法的说明图。14 is an explanatory diagram of another method of bending a part of the widthwise region of the glass substrate.
【标号说明】【Description of labels】
11 玻璃基板11 Glass substrate
12 激光12 lasers
33 支承构件33 Support member
40 保持构件40 holding member
71 激光照射部71 Laser Irradiation Department
72 激光照射部的周边部72 Peripheral part of laser irradiation part
81、82 析出物81, 82 Precipitates
具体实施方式detailed description
以下,参照附图,说明用于实施本发明的方式,但是本发明不受下述的实施方式的限制,不脱离本发明的范围而能够对下述的实施方式施加各种变形及置换。Hereinafter, modes for implementing the present invention will be described with reference to the drawings, but the present invention is not limited to the following embodiments, and various modifications and substitutions can be added to the following embodiments without departing from the scope of the present invention.
在本实施方式中,对于本发明的玻璃基板的切断方法的构成例进行说明。In this embodiment, the structural example of the cutting method of the glass substrate of this invention is demonstrated.
本实施方式的玻璃基板的切断方法是照射激光而将玻璃基板沿着切断预定线切断的玻璃基板的切断方法,具有以下的结构。The method for cutting a glass substrate according to the present embodiment is a method for cutting a glass substrate by irradiating laser light to cut the glass substrate along a line to cut, and has the following configuration.
使包含向玻璃基板的一方的表面照射激光的激光的照射区域的、玻璃基板的与切断预定线正交的宽度方向(以下,也记载为“玻璃基板的宽度方向”)的一部分的区域在玻璃基板的宽度方向上弯曲。A part of the glass substrate in the width direction (hereinafter also referred to as "the width direction of the glass substrate") perpendicular to the planned cutting line (hereinafter also referred to as "the width direction of the glass substrate") that includes the irradiation region of the laser that irradiates laser light to one surface of the glass substrate is placed on the glass substrate. The substrate is bent in the width direction.
并且,在激光的照射区域中,玻璃基板的从一方的表面到另一方的表面的激光照射部加热至气化的温度以上。In addition, in the irradiation region of the laser beam, the laser irradiation portion from one surface to the other surface of the glass substrate is heated to a temperature equal to or higher than the gasification temperature.
此外,是具有如下特征的玻璃基板的切断方法:使激光的照射区域沿着玻璃基板的切断预定线而相对于玻璃基板相对地移动。Moreover, it is the cutting method of the glass substrate which moves the irradiation area of a laser beam relatively with respect to a glass substrate along the line to cut of a glass substrate.
使用图1~图8,具体进行说明。It demonstrates concretely using FIGS. 1-8.
图1示意性地示出从照射激光一侧(一方的表面侧)的玻璃基板上表面观察通过本发明的玻璃基板切断方法将玻璃基板切断之处的结构。FIG. 1 schematically shows a structure where a glass substrate cut by the glass substrate cutting method of the present invention is viewed from the upper surface of the glass substrate on the laser irradiation side (one surface side).
玻璃基板11沿着图1中箭头A所示的方向被搬运,从未图示的激光振荡装置振荡出的激光12所照射的部分(激光照射区域)能够沿着玻璃基板上的切断预定线13移动。The glass substrate 11 is transported in the direction indicated by the arrow A in FIG. 1, and the portion irradiated with the laser light 12 oscillated from a laser oscillator not shown (laser irradiation area) can be along the planned cutting line 13 on the glass substrate. move.
并且,在本实施方式的玻璃基板的切断方法中,使包含激光的照射区域的玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲。关于这一点,以下进行说明。In addition, in the method for cutting a glass substrate according to the present embodiment, a part of the region in the width direction of the glass substrate including the irradiated region of the laser beam in the width direction perpendicular to the line to cut is bent in the width direction of the glass substrate. This point will be described below.
在玻璃基板的板厚较薄,尤其是玻璃基板被搬运的情况下,玻璃基板有时会产生褶皱。当在玻璃基板产生褶皱时,玻璃基板的表面包含凹凸。并且,在对表面包含有凹凸的玻璃基板照射激光时,如图2A所示向在搬运辊21上被搬运的玻璃基板11的凸部22照射激光的情况下,激光振荡装置23与玻璃基板11的一方的表面之间成为距离D1。相对于此,如图2B所示,向在搬运辊21上被搬运的玻璃基板11的凹部24照射激光的情况下,激光振荡装置23的位置不变化,因此激光振荡装置23与玻璃基板11的一方的表面之间比距离D1长,成为距离D2。这样,由于玻璃基板表面的凹凸而激光振荡装置与玻璃基板的一方的表面之间的距离变化,有时无法通过激光适当地对玻璃基板进行加热。When the thickness of the glass substrate is thin, especially when the glass substrate is conveyed, wrinkles may be generated in the glass substrate. When wrinkles are generated on the glass substrate, the surface of the glass substrate includes unevenness. And, when irradiating a laser beam to a glass substrate having irregularities on the surface, as shown in FIG. The distance D1 is between the surfaces of one side. On the other hand, as shown in FIG. 2B , when laser light is irradiated to the concave portion 24 of the glass substrate 11 conveyed on the conveying roller 21, the position of the laser oscillator 23 does not change, so the distance between the laser oscillator 23 and the glass substrate 11 The distance between one surface is longer than the distance D1, and becomes the distance D2. As described above, the distance between the laser oscillator and one surface of the glass substrate changes due to irregularities on the surface of the glass substrate, and the glass substrate may not be properly heated by laser light.
相对于此,使包含激光的照射区域的玻璃基板的与切断预定线正交的宽度方向的一部分的区域弯曲,由此至少对于玻璃基板的弯曲的部分能够抑制在玻璃基板产生褶皱的情况。因此,在激光照射区域中,能够使玻璃基板11的一方的表面与作为激光的光源的激光振荡装置之间的距离稳定,能够沿着玻璃基板的切断预定线适当地进行加热。并且,能够高精度地对玻璃基板进行切断加工,能够形成为均一的切断面。On the other hand, by bending a part of the glass substrate in the width direction perpendicular to the line to cut including the irradiation region of the laser beam, it is possible to suppress wrinkles in the glass substrate at least in the curved portion of the glass substrate. Therefore, in the laser irradiation area, the distance between one surface of the glass substrate 11 and the laser oscillator as the light source of the laser can be stabilized, and heating can be appropriately performed along the planned cutting line of the glass substrate. In addition, the glass substrate can be cut and processed with high precision, and can be formed as a uniform cut surface.
使包含向玻璃基板11的一方的表面照射激光12的激光的照射区域的、玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲的方法没有特别限定。需要说明的是,在玻璃基板的宽度方向上弯曲也可以说是使与搬运方向垂直的玻璃基板的截面向上方或下方弯曲。There is no particular limitation on the method of bending a part of the glass substrate in the width direction perpendicular to the line to cut, including the irradiation region of the laser beam 12 irradiated to one surface of the glass substrate 11 in the width direction of the glass substrate. In addition, bending in the width direction of a glass substrate can also be said to bend the cross section of the glass substrate perpendicular|vertical to a conveyance direction upwards or downwards.
在此,关于使上述玻璃基板的一部分的区域在玻璃基板的宽度方向上弯曲的方法的构成例,使用图3~图6及图14进行说明。图3示出具备支承构件33的搬运辊32的构成例。图4、图5示意性地示出从照射激光一侧(一方的表面侧)的玻璃基板上表面观察将图3所示的具备支承构件33的搬运辊32配置在玻璃基板的搬运路径上的构成例的结构。Here, a configuration example of a method of bending a part of the glass substrate in the width direction of the glass substrate will be described with reference to FIGS. 3 to 6 and 14 . FIG. 3 shows a configuration example of the conveyance roller 32 provided with the support member 33 . 4 and 5 schematically show the arrangement of the conveyance roller 32 provided with the support member 33 shown in FIG. Make up the structure of the example.
作为使玻璃基板的一部分的区域在玻璃基板的宽度方向上弯曲的方法,可列举以使包含激光的照射区域的玻璃基板的宽度方向的一部分的区域从玻璃基板的其他的部分的区域突出的方式、利用支承构件从玻璃基板的另一方的表面侧支承玻璃基板的方法。As a method of bending a part of the region of the glass substrate in the width direction of the glass substrate, a method in which a part of the region in the width direction of the glass substrate including the irradiation region of the laser beam protrudes from other regions of the glass substrate . A method of supporting a glass substrate from the other surface side of the glass substrate by a supporting member.
如图3所示,当在搬运辊32的宽度方向的一部分配置支承构件33时,能够利用该支承构件33,以使玻璃基板的一部分的区域31的表面比玻璃基板的其他的部分的区域34升高的方式,从玻璃基板的下表面侧(另一方的面侧)进行支承。As shown in FIG. 3 , when a support member 33 is arranged in a part of the width direction of the conveying roller 32, the support member 33 can be used to make the surface of a part of the region 31 of the glass substrate smaller than the surface of the region 34 of other parts of the glass substrate. In a raised form, the glass substrate is supported from the lower surface side (the other surface side).
并且,如图4所示,可以将配置在沿图中块形箭头A所示的方向被搬运的玻璃基板的搬运路径上的多个搬运辊32中的至少一部分的搬运辊32设为如上所述具备支承构件33的搬运辊32。通过这样构成搬运辊,能够在图4中的区域41所示的范围内使玻璃基板的宽度方向的一部分的区域弯曲。即,能够使与搬运方向垂直的玻璃基板的截面向上方弯曲。需要说明的是,此时,能够以使激光12的照射区域至少处于上述区域41内的方式选择配置具备上述支承构件33的搬运辊的部位。And, as shown in FIG. 4, at least a part of the conveying rollers 32 of the plurality of conveying rollers 32 arranged on the conveying path of the glass substrate conveyed in the direction shown by the block arrow A in the figure can be set as above. The conveyance roller 32 provided with the support member 33 is mentioned above. By configuring the conveyance roller in this way, it is possible to bend a part of the width direction of the glass substrate within the range shown by the region 41 in FIG. 4 . That is, the cross section of the glass substrate perpendicular|vertical to a conveyance direction can be curved upward. In this case, it is possible to select and arrange the position of the conveyance roller provided with the support member 33 so that the irradiation area of the laser beam 12 is at least within the area 41 .
在图4中,示出了仅在搬运辊32的宽度方向的一方的端部侧设有支承构件33的例子,但没有限定为上述方式。根据玻璃基板的切断预定线13的数量,可以在玻璃基板的宽度方向中的多个部位设置支承构件33。例如在将玻璃基板的宽度方向的两端部切断的情况下,关于搬运辊32的宽度方向的另一方的端部侧也可以设置支承构件33。In FIG. 4 , an example in which the support member 33 is provided only on one end side in the width direction of the conveyance roller 32 is shown, but it is not limited to the above-mentioned form. Depending on the number of planned cutting lines 13 of the glass substrate, the support member 33 may be provided at a plurality of locations in the width direction of the glass substrate. For example, when cutting the both ends of the width direction of a glass substrate, you may provide the support member 33 with respect to the other end part side of the width direction of the conveyance roller 32.
需要说明的是,关于在搬运辊32形成的支承构件33的结构没有特别限定。如图4所示,在按照各搬运辊32来形成支承构件33的情况下,例如作为支承构件33而在搬运辊32配置O型环等,由此关于搬运辊32表面的宽度方向的一部区域能够形成环状的凸部。而且,也可以不按照各搬运辊32设置,而如图5所示通过卷挂在多个搬运辊间的带状引导构件即传送带来构成支承构件33。这种情况下,在图5中区域41所示的范围内,也能够使玻璃基板11的与切断预定线正交的宽度方向的一部分的区域弯曲。即,能够使与搬运方向垂直的玻璃基板的截面向上方弯曲。In addition, the structure of the support member 33 formed in the conveyance roller 32 is not specifically limited. As shown in FIG. 4 , when the supporting member 33 is formed for each conveying roller 32 , for example, an O-ring or the like is disposed on the conveying roller 32 as the supporting member 33 , thereby a part of the width direction of the conveying roller 32 surface is The region can form an annular protrusion. Furthermore, instead of being provided for each conveyance roller 32, the support member 33 may be constituted by a conveyor belt which is a belt-shaped guide member wound between a plurality of conveyance rollers as shown in FIG. 5 . Even in this case, within the range indicated by the region 41 in FIG. 5 , a part of the region of the glass substrate 11 in the width direction perpendicular to the line to cut can be bent. That is, the cross section of the glass substrate perpendicular|vertical to a conveyance direction can be curved upward.
支承构件如上所述其结构没有特别限定,但是优选如图5所示,通过卷挂在多个搬运辊间的带状引导构件来构成支承构件。这是因为,在通过卷挂于搬运辊间的带状引导构件来构成支承构件的情况下,在搬运辊间也能够通过该支承构件从另一方的面侧支承玻璃基板,能够均一地保持玻璃基板的弯曲的部分的形状,能够进一步抑制褶皱的产生。The structure of the support member is not particularly limited as described above, but it is preferable that the support member is constituted by a belt-shaped guide member wound between a plurality of conveyance rollers as shown in FIG. 5 . This is because, when the support member is constituted by a belt-shaped guide member wound between the conveyance rollers, the glass substrate can be supported from the other surface side by the support member between the conveyance rollers, and the glass substrate can be uniformly held. The shape of the curved portion of the substrate can further suppress the occurrence of wrinkles.
关于图3所示的支承构件33的高度H没有特别限定,可以根据切断的玻璃基板的板厚等任意选择。The height H of the supporting member 33 shown in FIG. 3 is not particularly limited, and can be arbitrarily selected according to the plate thickness of the glass substrate to be cut, and the like.
而且,关于支承构件33的与玻璃基板相接的面的形状没有特别限定,可以如图3所示为平坦的形状,而且,也可以是在搬运辊的宽度方向上弯曲的形状。Furthermore, the shape of the surface of the support member 33 in contact with the glass substrate is not particularly limited, and may be a flat shape as shown in FIG. 3 , or may be a curved shape in the width direction of the conveyance roller.
作为使玻璃基板的与切断预定线正交的宽度方向的一部分的区域弯曲的其他的方法,可列举例如图6所示的方法,即激光照射区域周边的一部分的搬运辊32由具有直径比其他的部分细的部分61的搬运辊32构成。As another method of bending a part of the region in the width direction perpendicular to the planned cutting line of the glass substrate, for example, the method shown in FIG. The conveying roller 32 constitutes the thin portion 61 of the portion.
这样,通过在搬运辊32上设置直径比其他的部分细的部分61,从而在搬运辊32的表面形成凹部(concave)。因此,在该凹部,玻璃基板挠曲,如图6所示,在直径比其他的部分细的部分61与其他的部分的交界附近也能够使玻璃基板11弯曲。即,能够使与搬运方向垂直的玻璃基板的截面向下方弯曲。Thus, by providing the conveyance roller 32 with the portion 61 whose diameter is smaller than other portions, a concave portion (concave) is formed on the surface of the conveyance roller 32 . Therefore, the glass substrate bends in this concave portion, and as shown in FIG. 6 , the glass substrate 11 can also be bent in the vicinity of the boundary between the portion 61 having a smaller diameter than other portions and other portions. That is, the cross section of the glass substrate perpendicular to the conveyance direction can be bent downward.
作为不依赖于搬运辊的形状而使玻璃基板的与切断预定线正交的宽度方向的一部分的区域弯曲的方法,可列举例如图14所示的方法,即使由搬运辊或台等保持构件40保持的玻璃基板11的所述一部分的区域从保持构件40露出,利用自重使所述一部分的区域挠曲而弯曲。需要说明的是,在保持构件40为台时,使玻璃基板11及激光振荡装置中的至少一方移动,对玻璃基板11进行切断加工。As a method of bending a part of the region of the glass substrate in the width direction perpendicular to the line to cut regardless of the shape of the conveyance roller, for example, the method shown in FIG. The part of the held glass substrate 11 is exposed from the holding member 40 , and the part of the region is bent by its own weight. It should be noted that, when the holding member 40 is a table, at least one of the glass substrate 11 and the laser oscillator is moved to perform cutting processing on the glass substrate 11 .
如以上那样使包含激光12的照射区域的该玻璃基板的宽度方向的一部分的区域弯曲时,激光12的照射区域优选配置在玻璃基板的弯曲的部分中的斜面部分。这样,在如图3、图6及图14所示的弯曲的玻璃基板的斜面部分,在从另一方的表面(下表面)侧支承玻璃基板的搬运辊32、支承构件33或保持构件40与玻璃基板11之间产生间隙。因此,在照射激光时,能够抑制搬运辊32、支承构件33等被加热的情况,能够抑制搬运辊32等的损伤。When bending a part of the glass substrate in the width direction including the irradiation region of the laser beam 12 as described above, the irradiation region of the laser beam 12 is preferably arranged on a slope in the curved portion of the glass substrate. In this way, in the slope portion of the curved glass substrate as shown in FIGS. A gap is generated between the glass substrates 11 . Therefore, when the laser beam is irradiated, it is possible to suppress the conveyance roller 32, the support member 33, and the like from being heated, and it is possible to suppress damage to the conveyance roller 32 and the like.
激光12的相对于玻璃基板的入射角度没有特别限定。例如图3、图6、图14的图中所示,激光12能够以与玻璃基板的未弯曲的区域即例如图3中的玻璃基板的其他的部分的区域34的玻璃基板表面大致垂直的方式进行照射。而且,也可以根据激光12的照射区域的玻璃基板的倾斜角来调整照射激光12的角度。即,也可以在激光的照射区域中以使玻璃基板11的表面与激光12大致垂直的方式将激光12向玻璃基板11照射。The incident angle of the laser beam 12 with respect to the glass substrate is not specifically limited. For example, as shown in FIG. 3 , FIG. 6 , and FIG. 14 , the laser light 12 can be substantially perpendicular to the glass substrate surface of the unbent region of the glass substrate, that is, for example, the region 34 of other parts of the glass substrate in FIG. 3 . Irradiate. Furthermore, the angle at which the laser beam 12 is irradiated may be adjusted according to the inclination angle of the glass substrate in the irradiation area of the laser beam 12 . That is, the glass substrate 11 may be irradiated with the laser light 12 so that the surface of the glass substrate 11 is substantially perpendicular to the laser light 12 in the irradiation area of the laser light.
而且,在图3的情况下,玻璃基板呈抛物线形状地弯曲,因此该弯曲的部分中的斜面在图中右侧和图中左侧产生。因此,也可以如箭头12′所示那样向图中左侧的斜面照射激光。In addition, in the case of FIG. 3 , since the glass substrate is curved in a parabolic shape, slopes in the curved portion are generated on the right side and the left side in the figure. Therefore, it is also possible to irradiate the laser beam to the slope on the left side in the figure as shown by the arrow 12'.
但是,在玻璃基板的弯曲的部分具有多个斜面的情况下,支承构件33优选以如下方式支承玻璃基板:在从玻璃基板的其他的部分的区域突出的、玻璃基板的宽度方向的一部分的区域中的、玻璃基板的宽度方向的端部侧的斜面上配置激光的照射区域。即,激光的照射区域优选处于玻璃基板的宽度方向的端部侧的斜面。However, when the curved portion of the glass substrate has a plurality of slopes, it is preferable that the support member 33 supports the glass substrate in a region of a part of the width direction of the glass substrate protruding from other regions of the glass substrate. Among them, the irradiation area of the laser beam is arranged on the slope on the side of the end portion in the width direction of the glass substrate. That is, it is preferable that the irradiation area|region of a laser beam exists in the slope of the end part side of the width direction of a glass substrate.
如上所述,只要使至少包含激光的照射区域的玻璃基板的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲即可,关于玻璃基板的长度方向使玻璃基板弯曲的范围没有特别限定。即,可以仅对于玻璃基板的长度方向中的激光的照射区域的范围,使玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲。需要说明的是,在此所说的玻璃基板的长度方向表示与玻璃基板的搬运方向平行的方向。As described above, only a part of the width direction of the glass substrate including at least the irradiation region of the laser beam is bent in the width direction of the glass substrate, and the range of bending the glass substrate in the longitudinal direction of the glass substrate is not particularly limited. That is, a part of the glass substrate in the width direction perpendicular to the line to cut can be bent in the width direction of the glass substrate only in the range of the laser irradiation region in the longitudinal direction of the glass substrate. In addition, the longitudinal direction of the glass substrate mentioned here shows the direction parallel to the conveyance direction of a glass substrate.
但是,优选在从玻璃基板的激光的照射区域到沿着玻璃基板的切断预定线相隔规定距离的部分为止的范围,使包含玻璃基板的切断预定线的玻璃基板的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲。However, it is preferable to make a part of the width direction of the glass substrate including the planned cutting line of the glass substrate in the range from the irradiation region of the laser beam of the glass substrate to the part separated by a predetermined distance along the planned cutting line of the glass substrate on the glass substrate. The substrate is bent in the width direction.
如上所述,关于至少包含激光的照射区域的玻璃基板的与切断预定线正交的宽度方向的一部分的区域,若使玻璃基板弯曲,则与未弯曲的情况相比,在激光的照射区域能够抑制褶皱的产生。然而,例如在对玻璃基板进行搬运的情况下,当要在激光的照射区域的紧前方使玻璃基板如上述那样弯曲时,存在褶皱的产生的抑制程度不充分的情况。因此,优选在比激光的照射区域靠例如玻璃基板的搬运方向的上游侧的规定的范围,关于包含玻璃基板的切断预定线的玻璃基板的宽度方向的一部分的区域,以使玻璃基板的切断预定线配置在斜面上的方式使玻璃基板弯曲。As mentioned above, if the glass substrate is bent in a part of the width direction of the glass substrate including at least the irradiation area of the laser beam, which is perpendicular to the line to cut, the laser irradiation area can Suppresses wrinkles. However, for example, in the case of conveying a glass substrate, if the glass substrate is bent as described above immediately before the irradiation area of the laser beam, the generation of wrinkles may not be sufficiently suppressed. Therefore, it is preferable to make the planned cutting of the glass substrate a part of the width direction of the glass substrate including the planned cutting line of the glass substrate in a predetermined range on the upstream side of the conveyance direction of the glass substrate, for example, from the irradiation area of the laser light. The glass substrate is bent in such a way that the lines are arranged on the slope.
例如图4所示配置具备支承构件33的搬运辊32的情况下,优选使激光12的照射区域到达比在玻璃基板的搬运方向的最上游侧配置的具备该支承构件33的搬运辊32的顶点位置靠下游侧处。即,在图4的情况下,优选在比X-X′线靠玻璃基板的搬运方向下游侧处配置激光的照射区域。而且,尤其是在照射激光时为了防止搬运辊32等的损伤,激光12的照射区域优选配置在搬运辊32之间。For example, when the conveyance roller 32 equipped with the supporting member 33 is arranged as shown in FIG. located on the downstream side. That is, in the case of FIG. 4, it is preferable to arrange|position the irradiation area|region of a laser beam in the conveyance direction downstream side of a glass substrate rather than X-X' line. Moreover, in order to prevent damage to the conveyance roller 32 etc. especially when irradiating laser light, it is preferable to arrange the irradiation area of the laser beam 12 between the conveyance rollers 32 .
如以上那样,在本实施方式的玻璃基板的切断方法中,使包含激光的照射区域的玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲。并且,在照射激光12的部分(激光的照射区域),玻璃基板的从一方的表面到另一方的表面的激光照射部被加热(加热工序)。此外,已经被照射了激光的区域14由于玻璃基板11被搬运而从激光的照射区域分离,激光照射后的激光照射部(被照射激光而玻璃气化了的部分)15的周边部被冷却(冷却工序)。关于这一点,以下使用图1、图7、图8进行说明。需要说明的是,在图1、图7、图8中为了便于记载,关于激光的照射区域的周边也记载为平坦的形状。而且,玻璃基板的切断预定线13虽然示于图中,但并不是在实际的玻璃基板上设置的线。As described above, in the method for cutting a glass substrate according to the present embodiment, a part of the region in the width direction of the glass substrate including the irradiated region of the laser beam in the width direction perpendicular to the line to cut is bent in the width direction of the glass substrate. And in the part irradiated with the laser beam 12 (irradiation area|region of a laser beam), the laser irradiation part from one surface of a glass substrate to the other surface is heated (heating process). In addition, the region 14 that has been irradiated with laser light is separated from the irradiated region of laser light due to the glass substrate 11 being transported, and the peripheral portion of the laser irradiated portion (the portion where the glass is vaporized by irradiating laser light) 15 after laser irradiation is cooled ( cooling process). This point will be described below using FIG. 1 , FIG. 7 , and FIG. 8 . In addition, in FIG. 1, FIG. 7, and FIG. 8, for convenience of description, the periphery of the laser irradiation area is also described as a flat shape. Moreover, although the planned cutting line 13 of a glass substrate is shown in a drawing, it is not a line provided on the actual glass substrate.
能够应用本实施方式的玻璃基板的切断方法的玻璃基板的组成没有特别限定,能够应用于各种玻璃基板。可列举例如无碱硼硅酸玻璃、硼硅酸玻璃、钠钙玻璃、高硅玻璃、其他的以氧化硅为主成分的氧化物系玻璃等。The composition of the glass substrate to which the cutting method of the glass substrate of this embodiment can be applied is not specifically limited, It can apply to various glass substrates. Examples thereof include alkali-free borosilicate glass, borosilicate glass, soda lime glass, high silica glass, and other oxide-based glasses mainly composed of silicon oxide.
而且,关于玻璃基板的厚度也没有特别限定,例如能够根据使用的激光振荡装置的输出等而任意选择。Also, the thickness of the glass substrate is not particularly limited, and can be arbitrarily selected, for example, according to the output of the laser oscillator to be used.
但是,在玻璃基板的板厚较薄的情况下尤其是在玻璃基板容易产生褶皱。而且,在本实施方式的玻璃基板的切断方法中,在激光的照射区域,关于从玻璃基板的一方的表面到另一方的表面的激光照射部,即玻璃基板的整个板厚方向,加热至玻璃气化的温度以上。从以上的2点的理由出发,在玻璃基板的板厚较薄的情况下特别地发挥效果。因此,例如,玻璃基板的板厚优选为3.0mm以下,更优选为1.0mm以下,进一步优选为0.5mm以下,特别优选为0.2mm以下。关于下限值没有特别限定。However, when the thickness of the glass substrate is thin, especially the glass substrate tends to be wrinkled. And in the cutting method of the glass substrate of this embodiment, in the irradiation area of laser, with respect to the laser irradiation part from one surface of glass substrate to the other surface, namely the whole board thickness direction of glass substrate, heat to glass substrate. above the gasification temperature. From the reasons of the above two points, the effect is exhibited particularly when the plate thickness of the glass substrate is thin. Therefore, for example, the plate thickness of the glass substrate is preferably 3.0 mm or less, more preferably 1.0 mm or less, still more preferably 0.5 mm or less, particularly preferably 0.2 mm or less. There is no particular limitation on the lower limit.
而且,图1所示的玻璃基板的形状为矩形,但是玻璃基板的形状也没有特别限定。例如,可以是通过浮法或下拉法等的玻璃基板成形装置成形的带状的玻璃基板。Moreover, although the shape of the glass substrate shown in FIG. 1 is rectangular, the shape of a glass substrate is not specifically limited, either. For example, it may be a ribbon-shaped glass substrate formed by a glass substrate forming apparatus such as a float method or a down-draw method.
接下来,说明在激光的照射区域(向玻璃基板照射激光的部分)进行的加热工序。图7是将图1的B-B′线处的截面中的激光12的照射区域周边放大表示的图。Next, the heating process performed in the irradiation area|region of a laser beam (the part where a laser beam is irradiated to a glass substrate) is demonstrated. FIG. 7 is an enlarged view showing the periphery of the irradiated area of the laser light 12 in the cross section on the line B-B' in FIG. 1 .
在本发明的玻璃基板的切断方法中,通过如上述那样向玻璃基板照射激光12,而在激光的照射区域进行加热工序。In the cutting method of the glass substrate of this invention, a heating process is performed in the irradiation area|region of a laser beam by irradiating the laser beam 12 to a glass substrate as mentioned above.
关于玻璃基板的激光的照射区域,从玻璃基板的一方的表面到玻璃基板的另一方的表面的激光的照射部71被加热至玻璃气化的温度以上。在此,玻璃基板的一方的表面是指激光入射一侧的面,另一方的表面是指其相对面。因此,关于激光的照射部71,玻璃气化而在短时间内沿着激光的照射方向(玻璃基板的厚度方向)形成贯通孔。Regarding the irradiation area of the laser beam of the glass substrate, the laser irradiation part 71 from one surface of the glass substrate to the other surface of the glass substrate is heated to a temperature equal to or higher than the glass vaporization temperature. Here, the one surface of a glass substrate means the surface on the laser incident side, and the other surface means the opposing surface. Therefore, in the irradiation part 71 of a laser beam, glass vaporizes, and a through-hole is formed along the irradiation direction of a laser beam (thickness direction of a glass substrate) in a short time.
并且,关于激光的照射部71的周边部72,也通过来自激光的照射部的传热而被加热。In addition, the peripheral portion 72 of the laser irradiation portion 71 is also heated by heat transfer from the laser irradiation portion.
这样,在加热工序或刚进行该加热工序之后,即,在激光照射时(玻璃气化时)或刚进行激光照射之后,不向所述激光照射部喷吹辅助气体(不使用辅助气体),能够在短时间内对于激光照射部使玻璃气化。因此,不会产生玻璃基板的位置错动等而能够高精度地进行加工,能够抑制玻璃基板的龟裂的产生。In this way, during the heating process or immediately after the heating process, that is, at the time of laser irradiation (at the time of glass vaporization) or immediately after laser irradiation, the assist gas is not blown to the laser irradiation part (the assist gas is not used), It is possible to vaporize glass in a laser irradiation part in a short time. Therefore, it is possible to perform processing with high precision without occurrence of positional displacement of the glass substrate, and to suppress the occurrence of cracks in the glass substrate.
作为加热工序中的激光的照射条件没有限定,只要以如下的方式进行选择即可:在玻璃基板的激光照射区域中,以从玻璃基板的一方的表面(激光入射一侧的面)侧到另一方的表面侧的激光照射部能够加热至玻璃的气化温度以上。The irradiation conditions of the laser light in the heating process are not limited, as long as they are selected in the following manner: in the laser irradiation region of the glass substrate, from one surface (the surface on which the laser light is incident) of the glass substrate to the other The laser irradiation part on one surface side can be heated to more than the gasification temperature of glass.
具体而言,例如,只要根据作为被切断物的玻璃基板的板厚、玻璃组成、玻璃基板的搬运速度(激光的照射区域的相对于玻璃基板的相对移动速度)等,关于激光照射部以能够如上述那样加热的方式选择激光的能量密度等即可。例如能够通过预先进行预备试验而算出。Specifically, for example, as long as the plate thickness of the glass substrate as the object to be cut, the glass composition, the conveyance speed of the glass substrate (the relative moving speed of the laser irradiation area with respect to the glass substrate), etc., the laser irradiation part can be selected. The energy density of the laser light and the like may be selected for the method of heating as described above. For example, it can be calculated by performing a preliminary test in advance.
尤其是激光的照射区域的相对于玻璃基板的相对移动速度设为v(m/小时)、所述激光的能量密度设为E(W/mm2)、玻璃基板的板厚设为t(mm)的情况下,优选以满足E≥50×t×v的关系的方式调整照射的激光的能量密度。In particular, the relative moving speed of the irradiation region of the laser light with respect to the glass substrate is v (m/hour), the energy density of the laser light is E (W/mm 2 ), and the thickness of the glass substrate is t (mm ), it is preferable to adjust the energy density of the irradiated laser light so as to satisfy the relationship of E≧50×t×v.
在满足上述规定的状态下进行包含加热工序的玻璃基板的切断,由此在激光的照射区域中,能够将从玻璃基板的一方的表面到玻璃基板的另一方的表面的激光照射部可靠地加热至玻璃气化的温度以上。Cutting of the glass substrate including the heating step is carried out in a state satisfying the above-mentioned requirements, whereby in the laser irradiation region, the laser irradiation portion from one surface of the glass substrate to the other surface of the glass substrate can be reliably heated. Above the temperature of glass vaporization.
关于向玻璃基板照射的激光的点径(玻璃基板的一方的表面中的激光的射束径)也没有限定,可以根据所要求的加工精度等进行选择。The spot diameter of the laser beam irradiated to the glass substrate (beam diameter of the laser beam on one surface of the glass substrate) is also not limited, and can be selected according to required processing accuracy and the like.
需要说明的是,关于使用的激光的种类没有特别限定,只要通过向玻璃基板照射振荡的激光,而能够关于该照射的部分对玻璃基板进行加热即可。具体而言,可以使用例如CO2激光、受激准分子激光、铜蒸镀激光、YAG激光等。In addition, the kind of laser beam used is not specifically limited, What is necessary is just to heat a glass substrate about the part irradiated by irradiating the laser beam which oscillates to a glass substrate. Specifically, CO 2 laser, excimer laser, copper vapor deposition laser, YAG laser, etc. can be used, for example.
在加热工序中,通过如上所述向玻璃基板照射激光,对于激光照射部而使玻璃气化。因此,在激光照射部及其周边产生气化了的玻璃成分(气体)。上述成分向配置在激光的光路上的激光振荡装置的透镜或反射镜等光学系统的表面析出、附着时,存在无法对于玻璃基板照射充分的能量的激光的情况、无法向所希望的部位照射激光的情况等,可能会给玻璃基板的加工精度等造成影响。因此,优选通过向玻璃基板照射激光来将气化了的玻璃成分除去。即,在加热工序中,优选将气化了的所述激光照射部的玻璃成分除去。关于将气化了的玻璃成分除去的装置,没有特别限定,可以使用对气化了的玻璃成分进行吸引的机构、利用气体将气化了的玻璃成分吹飞的机构等。关于其配置只要根据使用的装置进行选择即可,只要以如下方式配置即可:不阻碍加热工序并能够将气化了的玻璃成分在向配置于激光的光路上的透镜、反射镜等附着之前除去。例如,在图7中,可考虑如73所示配置在照射激光的部分的附近的情况。In a heating process, glass is vaporized with respect to a laser irradiation part by irradiating a laser beam to a glass substrate as mentioned above. Therefore, vaporized glass components (gas) are generated in the laser irradiation portion and its surroundings. When the above-mentioned components are precipitated or adhered to the surface of an optical system such as a lens or a mirror of a laser oscillation device disposed on the optical path of the laser light, it may not be possible to irradiate the glass substrate with laser light of sufficient energy, and it may not be possible to irradiate the laser light to the desired position. conditions, etc., may affect the processing accuracy of the glass substrate. Therefore, it is preferable to remove vaporized glass components by irradiating laser light to the glass substrate. That is, in the heating step, it is preferable to remove the vaporized glass component of the laser irradiation portion. The device for removing the vaporized glass component is not particularly limited, and a mechanism for sucking the vaporized glass component, a mechanism for blowing the vaporized glass component away with gas, or the like can be used. As for its arrangement, it only needs to be selected according to the device used, as long as it is arranged in such a way that the heating process is not hindered and the vaporized glass component can be attached to the lens, reflector, etc. arranged on the optical path of the laser. remove. For example, in FIG. 7 , it is conceivable that the laser beams are arranged near the part where the laser beam is irradiated as indicated by 73 .
需要说明的是,在使用利用气体将气化了的玻璃成分吹飞的机构的情况下,使用的气体的种类没有特别限定,但是由于在玻璃基板被激光加热的部分的周边使用,因此优选使用不燃性气体。具体而言,可以使用例如氮、氩等惰性气体、空气等。而且,这种情况下,为了防止玻璃基板的位置的位移,优选将气体以避免接触玻璃基板的方式供给。In addition, in the case of using a mechanism that blows off vaporized glass components using gas, the type of gas used is not particularly limited, but it is preferably used because it is used around the portion of the glass substrate heated by laser. Non-flammable gas. Specifically, inert gases such as nitrogen and argon, air, and the like can be used, for example. Moreover, in this case, in order to prevent the displacement of the position of a glass substrate, it is preferable to supply gas so that it may not contact a glass substrate.
接下来,对冷却工序进行说明。Next, the cooling step will be described.
冷却工序是在照射了激光之后,通过搬运玻璃基板,使激光照射后的激光照射部(已经照射了激光的部分)从激光的照射区域远离,对激光照射部的周边部进行冷却。In the cooling step, after laser irradiation, the glass substrate is conveyed, and the laser irradiation part after laser irradiation (the part that has been irradiated with laser light) is separated from the laser irradiation area to cool the peripheral part of the laser irradiation part.
在冷却工序中,如图7所示,对激光照射部(在加热工序中被照射激光而气化了的部分)71的周边部72进行冷却。在冷却时,如图8所示,该周边部72的至少一部分存在作为大致线状的析出物81、82而向玻璃基板表面(玻璃基板的一方的表面及/或另一方的表面)析出的情况。这是由于玻璃的导热率低,因此在加热工序后,在冷却工序中该周边部72内产生温度斜度,因此推认为由于在该周边部72内产生的应力而周边部72的至少一部分被排除而在玻璃基板上析出的情况。需要说明的是,在图中,析出物81、82向玻璃基板的上表面(一方的表面)析出,但是也存在向下表面(另一方的表面)侧析出的情况。而且,在冷却工序中析出物析出的部位根据冷却条件等进行变化,因此没有特别限定,但是例如该析出物81、82在比激光12的照射区域靠玻璃基板的搬运方向的下游侧处且从激光12的照射区域偏离的位置析出。In the cooling step, as shown in FIG. 7 , the peripheral portion 72 of the laser irradiation portion (part irradiated with laser light and vaporized in the heating step) 71 is cooled. During cooling, as shown in FIG. 8 , at least a part of the peripheral portion 72 is deposited on the surface of the glass substrate (one surface and/or the other surface of the glass substrate) as substantially linear precipitates 81 and 82. Condition. This is because the thermal conductivity of glass is low, so after the heating process, a temperature gradient occurs in the peripheral portion 72 in the cooling process, so it is presumed that at least a part of the peripheral portion 72 is heated due to the stress generated in the peripheral portion 72. Precipitation on the glass substrate was excluded. In the figure, the precipitates 81 and 82 precipitate on the upper surface (one surface) of the glass substrate, but may also precipitate on the lower surface (the other surface) side. In addition, in the cooling step, the site where the precipitates are deposited varies depending on the cooling conditions and the like, so it is not particularly limited. The position where the irradiation area of the laser beam 12 deviates is deposited.
这样,将激光照射部的周边部72的至少一部分从照射了激光的切断面排除,因此最终能够得到均一的切断面。In this way, at least a part of the peripheral portion 72 of the laser irradiated portion is excluded from the cut surface irradiated with laser light, so that a uniform cut surface can be finally obtained.
在冷却工序中产生所述析出物,为了得到均一的切断面而优选以适当的冷却速度对激光照射部的周边部进行冷却。该冷却速度可以根据激光的照射区域的相对于玻璃基板的相对移动速度而变化。因此,优选进行预备实验等且以在冷却工序中产生上述析出物的方式选择激光的照射区域的相对于玻璃基板的相对移动速度。The above-mentioned precipitates are generated in the cooling step, and in order to obtain a uniform cut surface, it is preferable to cool the peripheral portion of the laser irradiation portion at an appropriate cooling rate. This cooling rate can be changed according to the relative movement speed of the irradiation area of a laser beam with respect to a glass substrate. Therefore, it is preferable to select the relative movement speed of the irradiation area|region of a laser beam with respect to a glass substrate so that the said precipitate may generate|occur|produce in a cooling process etc. by carrying out a preliminary experiment.
激光的照射区域的相对于玻璃基板的相对移动速度如上所述可以根据预备实验等进行选择,虽然不是特定的值,但是可以设为例如144(m/小时)以上。The relative movement speed of the irradiation area of the laser beam with respect to the glass substrate can be selected based on the preliminary experiment etc. as mentioned above, although it is not a specific value, For example, it can set it as 144 (m/hour) or more.
在冷却工序中,当产生析出物81、82时,根据析出物81、82的温度或两者之间的距离等,而存在析出物81与析出物82粘结的情况。进而根据情况的不同,当析出物81与析出物82粘结时,存在难以从激光照射部71的周边部72排出该周边部72的一部分而玻璃基板的切断面无法成为均一的切断面的情况。然而,在本实施方式的玻璃基板的切断方法中,使包含激光的照射区域的、玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲。因此,例如图9所示,在析出物81、82的温度特别高的激光照射部(在加热工序中被照射激光而气化的部分)71的周边,被切断的一方侧的玻璃基板91与另一方侧的玻璃基板92的高度不同。因此,在激光照射部71周边,能抑制析出物81、82彼此的粘结,其结果是,能够更可靠地将切断面形成为均一的切断面。In the cooling step, when the precipitates 81 and 82 are generated, the precipitates 81 and the precipitates 82 may be bonded depending on the temperature of the precipitates 81 and 82 or the distance therebetween. Furthermore, depending on the situation, when the precipitates 81 and precipitates 82 are bonded, it may be difficult to discharge a part of the peripheral portion 72 from the peripheral portion 72 of the laser irradiation portion 71, and the cut surface of the glass substrate may not be a uniform cut surface. . However, in the method for cutting a glass substrate according to the present embodiment, a part of the region in the width direction of the glass substrate perpendicular to the line to cut, including the irradiated region of the laser beam, is bent in the width direction of the glass substrate. Therefore, as shown in FIG. 9, for example, in the periphery of the laser irradiation portion (the portion that is irradiated with laser light and vaporized in the heating process) 71 where the temperature of the precipitates 81 and 82 is particularly high, the cut glass substrate 91 and the The glass substrate 92 on the other side has different heights. Therefore, in the periphery of the laser irradiation part 71, the adhesion of the precipitates 81 and 82 can be suppressed, and as a result, the cut surface can be more reliably formed as a uniform cut surface.
需要说明的是,析出物81在搬运辊间析出,并向另一方侧的玻璃基板92的上表面侧或下表面侧析出。在图9中为了便于附图的记载,看起来析出物81向搬运辊的下端部侧旋入,但是析出物81即使向另一方侧的玻璃基板92的下表面侧析出的情况下,也位于例如玻璃基板92与搬运辊之间而不会阻碍搬运辊的行为。In addition, the deposit 81 deposits between conveyance rollers, and deposits to the upper surface side or the lower surface side of the glass substrate 92 of the other side. In FIG. 9, in order to facilitate the description of the drawings, it seems that the precipitate 81 is screwed into the lower end side of the conveying roller, but even if the precipitate 81 is precipitated to the lower surface side of the glass substrate 92 on the other side, it is also located For example, between the glass substrate 92 and the conveyance roller, the behavior of the conveyance roller will not be hindered.
在冷却工序中产生的析出物81、82有时也会成为冷却的妨碍,因此优选除去在激光照射部的周边部产生的析出物。作为除去该析出物的方法,没有特别限定,例如,可以通过利用气体进行喷吹、进行吸引除去、利用刷或干扰板等除去等的方法而简单地进行除去。The precipitates 81 and 82 generated in the cooling step may also hinder cooling, so it is preferable to remove the precipitates generated in the peripheral portion of the laser irradiation portion. The method for removing the precipitate is not particularly limited, and it can be easily removed by, for example, blowing with gas, removing by suction, removing with a brush or an interference plate, or the like.
需要说明的是,在利用气体吹飞析出物的情况下,会向玻璃基板赋予振动等,为了避免给玻璃基板的切断精度造成影响而优选使用低压的气体。In addition, when the precipitate is blown off with gas, vibration etc. are given to a glass substrate, and it is preferable to use low pressure gas in order not to affect the cutting precision of a glass substrate.
冷却工序如上所述对激光照射后的激光照射部的周边部72进行冷却,关于其冷却温度没有限定。例如,激光照射部的周边部优选在激光照射部的加热后冷却至玻化温度以下。The cooling step cools the peripheral portion 72 of the laser irradiation portion after laser irradiation as described above, and the cooling temperature is not limited. For example, the peripheral portion of the laser irradiation part is preferably cooled to a glass transition temperature or lower after heating of the laser irradiation part.
此时,在加热工序后,在利用周边气氛的温度进行冷却的情况下,周边温度优选至少为玻化温度以下,优选100℃以下,特别优选40℃以下。需要说明的是,在此所说的周边温度至少是进行冷却工序的部分的周边的温度,但是优选是包含进行切断的玻璃基板整体的周边的温度。At this time, when cooling is performed by the temperature of the surrounding atmosphere after the heating step, the surrounding temperature is preferably at least the glass transition temperature or lower, preferably 100°C or lower, particularly preferably 40°C or lower. In addition, the peripheral temperature mentioned here is the temperature of the periphery of the part which performs a cooling process at least, but it is preferable that it is the temperature of the periphery including the whole glass substrate which cut|disconnects.
到此为止说明的本实施方式的玻璃基板的切断方法尤其是优选使用于以沿着玻璃基板的搬运方向的切断线将玻璃基板切断时。The cutting method of the glass substrate of this embodiment demonstrated so far is especially suitable when cutting a glass substrate along the cutting line along the conveyance direction of a glass substrate.
并且,通常在制造玻璃基板时,为了使玻璃基板成为所希望的尺寸,而将玻璃基板的宽度方向的两端部以沿着玻璃基板的搬运方向的切断线切断,但是此时可以优选使用本实施方式的玻璃基板的切断方法。这种情况下,在将玻璃基板的宽度方向的两端部切断后,仅使用宽度方向的中央部作为产品,因此在玻璃基板的宽度方向的两端部即耳部切断后,优选从玻璃基板的搬运路径分离。In addition, when manufacturing a glass substrate, in order to make the glass substrate into a desired size, both ends in the width direction of the glass substrate are cut along the cutting line along the conveying direction of the glass substrate. The cutting method of the glass substrate of embodiment. In this case, after the both ends of the width direction of the glass substrate are cut, only the central part of the width direction is used as a product. The handling path is separated.
具体而言,例如,在比加热工序靠玻璃基板的搬运方向下游侧设置耳部分离单元,通过耳部分离单元能够将切断后的玻璃基板的耳部变更为从玻璃基板的搬运方向背离的方向并进行分离。Specifically, for example, an ear separation unit is provided on the downstream side in the conveyance direction of the glass substrate relative to the heating step, and the ear part of the cut glass substrate can be changed to a direction away from the conveyance direction of the glass substrate by the ear separation unit. and separate.
耳部分离单元的具体的结构没有特别限定,但是例如可以通过搬运辊和耳部稳定保持单元构成,该搬运辊成为玻璃基板的耳部的方向变更的支点,该耳部稳定保持单元在成为支点的搬运辊的相反侧与玻璃基板的耳部接触而与搬运辊一起按压耳部。The specific structure of the ear separation unit is not particularly limited, but may be constituted by, for example, a conveying roller that becomes a fulcrum for changing the direction of the ear of the glass substrate and an ear stabilizing unit that serves as a fulcrum. The opposite side of the conveyance roller contacts the ear part of a glass substrate, and presses an ear part together with a conveyance roller.
分离后的玻璃基板的耳部向与搬运路径不同的副搬运路径导入,能够与玻璃基板的中央部不同地另行回收。The ear portion of the separated glass substrate is introduced into a sub-conveyance path different from the conveyance path, and can be collected separately from the central portion of the glass substrate.
在以上的本实施方式的玻璃基板的切断方法的说明中,以在搬运辊32上被水平搬运的玻璃基板为例说明了本实施方式的玻璃基板的切断方法。然而,本实施方式的玻璃基板的切断方法没有限定为被水平搬运的玻璃基板的切断,对于例如通过下拉法等成形、被垂直搬运的玻璃基板也可以适用。这种情况下,例如从玻璃基板的一方的面,通过按压构件,能够使包含照射激光的激光的照射区域的、玻璃基板的与切断预定线正交的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲。并且,通过如上所述进行加热工序、冷却工序,对于被垂直搬运的玻璃基板也能够同样地切断。In the above description of the cutting method of the glass substrate of this embodiment, the glass substrate horizontally conveyed on the conveyance roller 32 was taken as an example and the cutting method of the glass substrate of this embodiment was demonstrated. However, the cutting method of the glass substrate of this embodiment is not limited to the cutting of the glass substrate conveyed horizontally, For example, it is applicable also to the glass substrate formed by the down-down method etc. and conveyed vertically. In this case, for example, from one side of the glass substrate, by pressing the member, a part of the region in the width direction of the glass substrate that includes the irradiation region of the laser irradiated with laser light and perpendicular to the planned cutting line can be placed on the side of the glass substrate. Curved across the width. Moreover, by performing a heating process and a cooling process as mentioned above, it can cut|disconnect similarly also about the glass substrate conveyed vertically.
而且,在对玻璃基板进行垂直搬运的情况下,在将玻璃基板的宽度方向两端部切断时也可以优选使用本实施方式的玻璃基板的切断方法。这种情况下,也优选使切断后的玻璃基板的宽度方向的两端部从玻璃基板的搬运路径分离。Moreover, when vertically conveying a glass substrate, the cutting method of the glass substrate of this embodiment can also be used preferably when cutting the width direction both ends of a glass substrate. Also in this case, it is preferable to separate the both ends of the width direction of the glass substrate after cutting from the conveyance path of a glass substrate.
以上,说明了本发明的玻璃基板的切断方法,但是在上述玻璃基板的切断方法中,不是将辅助气体向玻璃基板喷吹,因此能够抑制玻璃基板的位置的位移,能够高精度地对玻璃基板进行切断加工。而且,能够在切断时抑制玻璃基板的龟裂的产生,能够形成为表面特性均一的切断面。As above, the glass substrate cutting method of the present invention has been described, but in the glass substrate cutting method described above, the auxiliary gas is not blown to the glass substrate, so the displacement of the position of the glass substrate can be suppressed, and the glass substrate can be cut with high precision. Carry out cutting processing. Furthermore, generation of cracks in the glass substrate can be suppressed during cutting, and a cut surface with uniform surface properties can be formed.
可以将以上说明的本实施方式的玻璃基板的切断方法应用于玻璃基板的制造工序,形成为使用了该玻璃基板的切断方法的玻璃基板的制造方法。The cutting method of the glass substrate of this embodiment demonstrated above can be applied to the manufacturing process of a glass substrate, and it can be set as the manufacturing method of a glass substrate using this cutting method of a glass substrate.
在上述玻璃基板的制造方法中,能够高精度地对玻璃基板进行切断加工,能够在切断时抑制玻璃基板的龟裂的产生,能够形成为均一的切断面,因此能得到玻璃基板的制造成品率的提高、研磨工序中的切断面的研磨时间的缩短或研磨工序省略的效果。In the method for manufacturing a glass substrate as described above, the glass substrate can be cut and processed with high precision, the generation of cracks in the glass substrate can be suppressed during cutting, and a uniform cut surface can be formed, so the manufacturing yield of the glass substrate can be obtained. Improvement, shortening of the grinding time of the cut surface in the grinding process, or the effect of omitting the grinding process.
【实施例】【Example】
以下列举并说明了具体的实施例,但是本发明没有限定为这些实施例。Specific examples are listed and described below, but the present invention is not limited to these examples.
[实验例1][Experimental example 1]
在本实验例中,使激光的能量密度、激光的照射区域的相对于玻璃基板的相对移动速度变化而将玻璃基板切断,对于切断后的玻璃基板的切断面进行了评价。In this experimental example, the glass substrate was cut while changing the energy density of the laser light and the relative movement speed of the laser irradiation region with respect to the glass substrate, and the cut surface of the cut glass substrate was evaluated.
当玻璃基板的切断时,根据图1所示的结构,对于纵100mm、横100mm、板厚0.1mm的由无碱硼硅酸玻璃构成的玻璃基板(旭硝子株式会社制商品名:AN100),一边以规定的搬运速度搬运玻璃基板,一边沿着切断预定线将使用了CO2激光的激光以点径为约0.3mm且成为规定的能量密度的方式进行照射。在进行切断时,玻璃基板的周边温度(环境温度)为室温(25℃)。When cutting the glass substrate, according to the structure shown in FIG. While conveying the glass substrate at a predetermined conveying speed, laser light using a CO 2 laser was irradiated along the line to cut so that the spot diameter was approximately 0.3 mm and a predetermined energy density was obtained. When cutting, the peripheral temperature (environmental temperature) of the glass substrate was room temperature (25° C.).
而且,此时,如图3、图4所示,在搬运辊32设置支承构件33,一边使包含照射激光的激光的照射区域的玻璃基板的宽度方向的一部分的区域在玻璃基板的宽度方向上弯曲,一边进行激光的照射。此时,激光12如图3中箭头12所示向玻璃基板的宽度方向的端部侧的斜面照射。而且,如图4所示,支承构件33设于2个搬运辊32,在设有支承构件33的搬运辊32之间配置了激光12的照射区域。And at this time, as shown in FIG. 3 and FIG. 4 , a support member 33 is provided on the conveying roller 32 so that a part of the width direction of the glass substrate including the irradiation region of the laser irradiated laser is positioned in the width direction of the glass substrate. We bend and perform irradiation of laser light. At this time, the laser light 12 is irradiated to the slope of the edge part side of the width direction of a glass substrate as shown by the arrow 12 in FIG. Moreover, as shown in FIG. 4, the support member 33 is provided in the two conveyance rollers 32, and the irradiation area|region of the laser beam 12 is arrange|positioned between the conveyance roller 32 provided with the support member 33.
对于进行了切断之后的玻璃基板,将未能切断的玻璃基板评价为C,将虽然能够切断但是在照射了激光的部分未观察到析出物而目视确认了切断面时未变得均一、或者在玻璃基板产生了龟裂的玻璃基板评价为B。将能够切断玻璃基板且目视能够确认到均一的切断面的玻璃基板评价为A。结果如表1及图10所示。图10是将表1的结果的一部分进行坐标图化后的图。For the glass substrate after cutting, the glass substrate that could not be cut was evaluated as C, and although it could be cut, no precipitate was observed in the part irradiated with laser light, and the cut surface did not become uniform when visually confirmed, or The evaluation of the glass substrate which cracked in the glass substrate was B. The glass substrate which can cut|disconnect a glass substrate and can visually confirm the uniform cut surface was evaluated as A. The results are shown in Table 1 and Figure 10. FIG. 10 is a graph in which some of the results in Table 1 are graphed.
[表1][Table 1]
在图10所示的坐标图中,在激光的照射区域的相对于玻璃基板的相对移动速度(在此为玻璃基板的搬运速度)设为v(m/小时)、所述激光的能量密度设为E(W/mm2)、玻璃基板的板厚设为t(mm)的情况下,直线X是E=50×t×v的直线。In the graph shown in FIG. 10 , the relative moving speed (here, the conveying speed of the glass substrate) in the irradiation area of the laser light with respect to the glass substrate is set as v (m/hour), and the energy density of the laser light is set as When it is E (W/mm 2 ), and the plate thickness of the glass substrate is t (mm), the straight line X is a straight line of E=50×t×v.
并且,直线Y表示在冷却工序中产生了析出物的、激光的照射区域的相对于玻璃基板的相对移动速度(在此为玻璃基板的搬运速度)的最小值,这种情况下为144(m/小时)。And, the straight line Y represents the minimum value of the relative moving speed (here, the conveying speed of the glass substrate) of the irradiated region of the laser light with respect to the glass substrate in which precipitates have occurred in the cooling process, and in this case, it is 144 (m /Hour).
根据图10,A评价分布在由直线X和直线Y围成的范围内,能量密度比直线X小的情况成为C评价,搬运速度比直线Y慢的情况成为B评价。According to FIG. 10 , the A evaluation is distributed within the range surrounded by the straight line X and the straight line Y. When the energy density is lower than the straight line X, it becomes the C evaluation, and when the transport speed is slower than the straight line Y, it becomes the B evaluation.
这考虑是因为,首先,在各激光的照射区域的相对于玻璃基板的相对移动速度(玻璃基板的搬运速度)中,在照射了直线X以上的能量密度的激光的情况下,对于激光的照射区域中的从玻璃基板的一方的表面到另一方的表面的激光照射区域,能够可靠地加热至玻璃气化的温度以上。This is because, first, in the relative movement speed (transportation speed of the glass substrate) of each laser irradiation area with respect to the glass substrate, in the case of irradiating the laser beam with an energy density equal to or higher than the straight line X, the irradiation of the laser beam Among the regions, the laser-irradiated region from one surface of the glass substrate to the other surface can be reliably heated to a temperature equal to or higher than the glass vaporization temperature.
并且考虑是因为,通过进而形成为直线Y以上的搬运速度,能够将激光照射后的激光照射区域的周边部充分冷却,作为析出物能够从切断面部分排除,因此能够形成为表面特性均一的切断面。In addition, it is considered that by further setting the conveying speed higher than that of the straight line Y, the peripheral portion of the laser irradiation region after laser irradiation can be sufficiently cooled, and precipitates can be removed from the cut surface, so that a cut with uniform surface properties can be formed. noodle.
即,在成为了C评价的玻璃基板中,无法赋予对于激光的照射区域的相对于玻璃基板的相对移动速度(玻璃基板的搬运速度)来说充分的激光的能量,对于激光的照射区域,未能直至玻璃基板的另一方的表面为止加热至玻璃气化的温度以上(对于玻璃基板的整个板厚方向的范围无法充分升温)。因此,推认为无法切断玻璃基板。That is, in the glass substrate which became C evaluation, the energy of the laser light sufficient for the relative movement speed (transportation speed of the glass substrate) with respect to the glass substrate of the irradiation area of a laser beam cannot be given, and the irradiation area of a laser beam is not enough. It is possible to heat up to the other surface of the glass substrate to a temperature equal to or higher than the vaporization temperature of the glass (the temperature cannot be raised sufficiently over the entire thickness direction of the glass substrate). Therefore, it is presumed that the glass substrate cannot be cut.
而且,成为了B评价的玻璃基板能够照射对于激光的照射区域的相对于玻璃基板的相对移动速度(玻璃基板的搬运速度)来说充分的能量密度的激光,因此能进行玻璃基板的切断。Furthermore, the glass substrate having B evaluation can be irradiated with laser light having sufficient energy density for the relative movement speed of the laser irradiation area with respect to the glass substrate (transportation speed of the glass substrate), so the glass substrate can be cut.
然而,激光的照射区域的相对于玻璃基板的相对移动速度(玻璃基板的搬运速度)不充分,激光照射后的激光照射区域的周边部的冷却速度变慢,该周边部作为析出物无法排除而残留,推认为切断面未变得均一。或者,激光照射后的激光照射区域的周边部的温度由于玻璃基板被搬运而冷却时,由于不是所希望的冷却速度,因此推认为在切断面及其周边产生了龟裂。However, the relative movement speed (transportation speed of the glass substrate) of the laser irradiation area with respect to the glass substrate is insufficient, and the cooling rate of the peripheral portion of the laser irradiation area after laser irradiation becomes slow, and the peripheral portion cannot be excluded as precipitates. Remains, it is presumed that the cut surface did not become uniform. Alternatively, when the temperature of the peripheral portion of the laser irradiation region after laser irradiation is cooled by conveyance of the glass substrate, since the cooling rate is not desired, cracks are presumed to have occurred on the cut surface and its periphery.
相对于此,可认为A评价的玻璃基板对应于激光的照射区域的相对于玻璃基板的相对移动速度(玻璃基板的搬运速度)能够适当地选择激光的能量密度。因此,可认为对于激光的照射区域,从玻璃基板的一方的表面到另一方的表面,加热至玻璃气化的温度以上。此外,由于玻璃基板的搬运速度适当,因此可认为激光照射后的激光照射区域的周边部以适当的冷却速度被冷却,该激光照射后的激光照射区域的周边部作为析出物被排除,能得到均一的切断面。On the other hand, it is considered that the energy density of the laser beam can be appropriately selected with respect to the relative movement speed (transportation speed of the glass substrate) of the glass substrate of the A evaluation relative to the glass substrate corresponding to the irradiated area of the laser beam. Therefore, it is considered that the irradiated region of the laser beam is heated from one surface of the glass substrate to the other surface to a temperature equal to or higher than the gasification temperature of the glass. In addition, since the conveyance speed of the glass substrate is appropriate, it is considered that the peripheral portion of the laser irradiation region after laser irradiation is cooled at an appropriate cooling rate, and the peripheral portion of the laser irradiation region after laser irradiation is excluded as precipitates, and it is possible to obtain Uniform cut surface.
[实验例2][Experimental example 2]
在本实验例中,除了进行切断的玻璃基板的板厚为0.2mm以外,与实验例1同样,使激光的能量密度、激光的照射区域的相对于玻璃基板的相对移动速度变化而将玻璃基板切断,对于切断后的玻璃基板的切断面进行了评价。In this experimental example, except that the plate thickness of the glass substrate to be cut was 0.2 mm, the energy density of the laser light and the relative moving speed of the irradiation area of the laser light with respect to the glass substrate were changed in the same manner as in Experimental Example 1, and the glass substrate was cut. Cutting evaluated the cut surface of the glass substrate after cutting.
结果如表2、图11所示。图11是将表2的结果进行了坐标图化后的图。The results are shown in Table 2 and Figure 11. FIG. 11 is a graph obtained by graphing the results of Table 2. FIG.
【表2】【Table 2】
在图11所示的坐标图中,直线X也是上述的E=50×t×v(t=0.2mm)的直线。In the graph shown in FIG. 11 , the straight line X is also a straight line of E=50×t×v (t=0.2 mm) described above.
而且,直线Y表示在冷却工序中产生了析出物的、激光的照射区域的相对于玻璃基板的相对移动速度(在此为玻璃基板的搬运速度)的最小值,这种情况下为144(m/小时)。And, the straight line Y represents the minimum value of the relative moving speed (here, the conveying speed of the glass substrate) of the irradiated region of the laser light relative to the glass substrate in which precipitates have occurred in the cooling process, and in this case, it is 144 (m /Hour).
根据这种情况,能够确认到A评价分布在由直线X和直线Y围成的范围内的情况。From this, it can be confirmed that the A evaluations are distributed within the range surrounded by the straight line X and the straight line Y.
[实验例3][Experimental example 3]
在本实验例中,除了进行切断的玻璃基板的板厚为0.3mm以外,与实验例1同样,使激光的能量密度、激光的照射区域的相对于玻璃基板的相对移动速度变化而将玻璃基板切断,对于切断后的玻璃基板的切断面进行了评价。In this experimental example, except that the plate thickness of the glass substrate to be cut was 0.3 mm, the energy density of the laser light and the relative moving speed of the irradiation area of the laser light with respect to the glass substrate were changed in the same manner as in Experimental Example 1, and the glass substrate was cut. Cutting evaluated the cut surface of the glass substrate after cutting.
结果如表3、图12所示。图12是将表3的结果进行了坐标图化后的图。The results are shown in Table 3 and Figure 12. FIG. 12 is a graph obtained by graphing the results of Table 3. FIG.
【表3】【table 3】
在图12所示的坐标图中,直线X也是上述的E=50×t×v(t=0.3mm)的直线。In the graph shown in FIG. 12 , the straight line X is also a straight line of E=50×t×v (t=0.3 mm) described above.
而且,直线Y表示在冷却工序中产生了析出物的、激光的照射区域的相对于玻璃基板的相对移动速度(在此为玻璃基板的搬运速度)的最小值,这种情况下为144(m/小时)。And, the straight line Y represents the minimum value of the relative moving speed (here, the conveying speed of the glass substrate) of the irradiated region of the laser light relative to the glass substrate in which precipitates have occurred in the cooling process, and in this case, it is 144 (m /Hour).
在本实验例中,使玻璃基板的搬运速度不变化,使照射的激光的能量密度变化而进行玻璃基板的切断。根据这种情况,在使激光的能量密度增加而形成为比直线X大的能量密度的情况下,关于激光的照射区域,从玻璃基板的一方的表面到另一方的表面对于激光照射区域能够加热至玻璃气化的温度以上,能够确认到成为A评价的情况。In this experimental example, the glass substrate was cut without changing the conveyance speed of the glass substrate and changing the energy density of the irradiated laser light. In this case, when the energy density of the laser beam is increased to have an energy density greater than that of the straight line X, the laser irradiated area can be heated from one surface of the glass substrate to the other surface of the laser irradiated area. It can be confirmed that it becomes A evaluation when it reaches the glass vaporization temperature or more.
[实验例4][Experimental example 4]
在本实验例中,除了进行切断的玻璃基板的板厚为0.6mm以外,与实验例1同样,使激光的能量密度、激光的照射区域的相对于玻璃基板的相对移动速度变化而将玻璃基板切断,对于切断后的玻璃基板的切断面进行了评价。In this experimental example, except that the plate thickness of the glass substrate to be cut was 0.6 mm, the energy density of the laser light and the relative moving speed of the irradiation area of the laser light with respect to the glass substrate were changed in the same manner as in Experimental Example 1, and the glass substrate was cut. Cutting evaluated the cut surface of the glass substrate after cutting.
结果如表4、图13所示。图13是将表4的结果进行了坐标图化的图。The results are shown in Table 4 and Figure 13. FIG. 13 is a graph of the results of Table 4. FIG.
【表4】【Table 4】
在图13所示的坐标图中,直线X也是上述的E=50×t×v(t=0.6mm)的直线。In the graph shown in FIG. 13 , the straight line X is also a straight line of E=50×t×v (t=0.6 mm) described above.
而且,直线Y表示在冷却工序中产生了析出物的、激光的照射区域的相对于玻璃基板的相对移动速度(在此为玻璃基板的搬运速度)的最小值,这种情况下为144(m/小时)。And, the straight line Y represents the minimum value of the relative moving speed (here, the conveying speed of the glass substrate) of the irradiated region of the laser light relative to the glass substrate in which precipitates have occurred in the cooling process, and in this case, it is 144 (m /Hour).
在本实验例中,照射的激光的能量密度比直线X低。因此,可认为无法赋予对于激光的照射区域的相对于玻璃基板的相对移动速度(玻璃基板的搬运速度)来说充分的激光的能量,关于激光的照射部,无法直至玻璃基板的另一方的表面为止加热至玻璃基板气化的温度以上。因此,可认为无法切断玻璃基板而成为C评价。In this experimental example, the energy density of the irradiated laser light was lower than that of the straight line X. Therefore, it is considered that sufficient laser energy cannot be given to the relative moving speed (transportation speed of the glass substrate) of the laser irradiation area with respect to the glass substrate, and the irradiation part of the laser cannot reach the other surface of the glass substrate. until it is heated to a temperature above the vaporization temperature of the glass substrate. Therefore, it is considered that the glass substrate cannot be cut and it becomes C evaluation.
以上,利用实施方式等说明了玻璃基板的切断方法及玻璃基板的制造方法,但是本发明没有限定为上述实施方式等。在权利要求书记载的本发明的主旨的范围内,能够进行各种变形、变更。As mentioned above, although the cutting method of a glass substrate and the manufacturing method of a glass substrate were demonstrated using embodiment etc., this invention is not limited to said embodiment etc.. Various modifications and changes are possible within the scope of the gist of the present invention described in the claims.
Claims (12)
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| JP6379392B2 (en) * | 2013-05-28 | 2018-08-29 | Agc株式会社 | Glass substrate cutting method and glass substrate manufacturing method |
| JP6579040B2 (en) | 2016-05-31 | 2019-09-25 | 日本電気硝子株式会社 | Manufacturing method of glass roll |
| JP6738043B2 (en) * | 2016-05-31 | 2020-08-12 | 日本電気硝子株式会社 | Glass film manufacturing method |
| JP2018024536A (en) * | 2016-08-08 | 2018-02-15 | 日本電気硝子株式会社 | Method for cutting belt-like glass film |
| KR102410719B1 (en) * | 2017-02-07 | 2022-06-20 | 니폰 덴키 가라스 가부시키가이샤 | Method for manufacturing glass film |
| JP6748920B2 (en) * | 2017-03-13 | 2020-09-02 | 日本電気硝子株式会社 | Glass film manufacturing method |
| JP6909403B2 (en) * | 2017-07-31 | 2021-07-28 | 日本電気硝子株式会社 | Glass film manufacturing method |
| WO2019065533A1 (en) * | 2017-09-27 | 2019-04-04 | 三星ダイヤモンド工業株式会社 | Cutting device for glass substrate, cutting method, program, and storage medium |
| JP6883282B2 (en) * | 2017-11-27 | 2021-06-09 | 日本電気硝子株式会社 | Glass roll manufacturing method |
| WO2020111282A1 (en) | 2018-11-30 | 2020-06-04 | Hoya株式会社 | Method for manufacturing glass plate, method for chamfering glass plate, and method for manufacturing magnetic disk |
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- 2014-04-28 CN CN201710173236.9A patent/CN107129137A/en active Pending
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| CN105164073A (en) | 2015-12-16 |
| TWI651280B (en) | 2019-02-21 |
| JP6379392B2 (en) | 2018-08-29 |
| TW201504173A (en) | 2015-02-01 |
| JPWO2014192482A1 (en) | 2017-02-23 |
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| CN105164073B (en) | 2018-06-12 |
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