CN106938407A - The dynamic magnetorheological finishing device and its polishing method of a kind of controllable moving field - Google Patents
The dynamic magnetorheological finishing device and its polishing method of a kind of controllable moving field Download PDFInfo
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- CN106938407A CN106938407A CN201710094141.8A CN201710094141A CN106938407A CN 106938407 A CN106938407 A CN 106938407A CN 201710094141 A CN201710094141 A CN 201710094141A CN 106938407 A CN106938407 A CN 106938407A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/005—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using a magnetic polishing agent
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/002—Grinding heads
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- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
技术领域technical field
本发明涉及超精密加工技术领域,尤其涉及一种用于光电子/微电子半导体基片及光学表面的平面平坦化加工,具有可控动磁场的动态磁流变抛光装置及其抛光方法。The invention relates to the technical field of ultra-precision processing, in particular to a dynamic magnetorheological polishing device with a controllable dynamic magnetic field and a polishing method thereof, which are used for flattening processing of optoelectronic/microelectronic semiconductor substrates and optical surfaces.
背景技术Background technique
随着科技的进步以及需求的增长,对光学元件光学性能的要求越来越高,要求其表面精度需要达到超光滑程度(粗糙度Ra达到1nm以下),面形精度也有较高的要求(形状精度达到0.5微米以下)。而在最近十年较为热门的LED应用领域中,单晶硅(Si)、单晶锗(Ge)、砷化镓(GaAs)、单晶碳化硅(SiC)和蓝宝石(Al2O3)等作为其半导体衬底材料,同样要求具有超平坦和超光滑的表面(粗糙度Ra达到0.3nm以下)才能满足外延膜生长的要求,并且要求无缺陷、无损伤。平坦化加工成为光学元件和半导体基片必不可少的工序,其传统工艺主要是高效研磨、超精密抛光、化学机械抛光和磁流变抛光,其加工质量和精度直接决定了光学器件及半导体器件的性能。With the advancement of science and technology and the growth of demand, the requirements for the optical performance of optical components are getting higher and higher, and the surface precision is required to reach ultra-smoothness (roughness Ra is less than 1nm), and the surface shape precision also has higher requirements (shape Accuracy reaches below 0.5 microns). In the popular LED application fields in the last decade, single crystal silicon (Si), single crystal germanium (Ge), gallium arsenide (GaAs), single crystal silicon carbide (SiC) and sapphire (Al2O3) are used as semiconductors. The substrate material also requires an ultra-flat and ultra-smooth surface (roughness Ra below 0.3nm) to meet the requirements of epitaxial film growth, and requires no defects and no damage. Planarization processing has become an essential process for optical components and semiconductor substrates. The traditional processes are mainly high-efficiency grinding, ultra-precision polishing, chemical mechanical polishing and magnetorheological polishing. The processing quality and precision directly determine the optical devices and semiconductor devices. performance.
磁流变抛光技术(Magnetorheological finishing,MRF)是20世纪90年代由KORDONSKI及其合作者将电磁学、流体动力学、分析化学、加工工艺学等相结合而提出的一种新型的光学表面加工方法,具有抛光效果好、不产生次表面损伤、适合复杂表面加工等传统抛光所不具备的优点,已发展成为一种革命性光学表面加工方法,特别适合轴对称非球面的超精密加工,广泛应用于大型光学元件表面的最后加工工序,但在实际加工过程中,会出现加工效率低等问题。Magnetorheological finishing (MRF) is a new optical surface processing method proposed by KORDONSKI and his collaborators in the 1990s by combining electromagnetics, fluid dynamics, analytical chemistry, and processing technology. , has the advantages that traditional polishing does not have, such as good polishing effect, no subsurface damage, and suitable for complex surface processing. It has developed into a revolutionary optical surface processing method, especially suitable for ultra-precision processing of axisymmetric aspheric surfaces, and is widely used. It is the final processing procedure on the surface of large optical components, but in the actual processing process, there will be problems such as low processing efficiency.
为了提高磁流变的抛光效率,专利CN200610132495.9基于磁流变抛光原理和集群作用机理提出了一种基于磁流变效应的平坦化研磨抛光方法及其抛光装置,并开展了大量的试验研究,却发现利用抛光液循环方式难以实现“微磨头”的持续更新和凸起使工件表面加工均匀性问题难以解决。针对平面加工均匀性问题,专利CN201510801886.4提出了一种动态磁场自锐的磁流变柔性抛光垫发生装置及其抛光方法,完好地实现了磁流变柔性抛光垫在加工过程中对工件的恒压力加工,并且能使磨料在加工过程中实时更新自锐,但是由于该专利中装置结构的限制,因磁流变效应产生的“微磨头”间距较大,在加工过程中工件空行程较长,影响了加工效率,而且需要改变磁场强度时要拆卸抛光盘进行永磁体更换,步骤比较繁琐。In order to improve the polishing efficiency of magnetorheology, patent CN200610132495.9 proposed a planarization grinding and polishing method and polishing device based on magnetorheological effect based on magnetorheological polishing principle and cluster action mechanism, and carried out a large number of experimental studies However, it is found that it is difficult to realize the continuous renewal of the "micro-grinding head" by using the circulation method of the polishing liquid, and the protrusion makes it difficult to solve the problem of the uniformity of the workpiece surface processing. Aiming at the uniformity of plane processing, patent CN201510801886.4 proposes a dynamic magnetic field self-sharpening magnetorheological flexible polishing pad generator and its polishing method, which fully realizes the magnetorheological flexible polishing pad’s ability to control the workpiece during processing. Constant pressure processing, and the abrasive can be updated and self-sharpening in real time during the processing process, but due to the limitation of the device structure in the patent, the distance between the "micro-grinding heads" produced by the magneto-rheological effect is relatively large, and the workpiece idle travel during the processing It is longer, which affects the processing efficiency, and when the magnetic field strength needs to be changed, the polishing disc must be disassembled to replace the permanent magnet, and the steps are cumbersome.
本发明在上述研究的基础上,提出一种可控动磁场的动态磁流变平坦化抛光装置及其抛光方法,优化结构,用励磁线圈取代永磁体,以改变电流大小的方式来调节磁场范围和强度,在“微磨头”自锐更新的前提下,缩短了“微磨头”之间的间距,延长有效加工时间,改善了磁流变柔性抛光垫加工性能,提高磁流变的抛光效率,实现工件的均匀加工。On the basis of the above research, the present invention proposes a dynamic magneto-rheological flattening polishing device with a controllable dynamic magnetic field and its polishing method, optimizes the structure, replaces the permanent magnet with an excitation coil, and adjusts the range of the magnetic field by changing the magnitude of the current and strength, under the premise of self-sharpening of the "micro-grinding heads", the distance between the "micro-grinding heads" is shortened, the effective processing time is prolonged, the processing performance of the magnetorheological flexible polishing pad is improved, and the magnetorheological polishing is improved. Efficiency, to achieve uniform processing of the workpiece.
发明内容Contents of the invention
本发明的目的在于克服现有技术的不足,提供一种加工效率高、装置结构简单、操作方便且具有可控动磁场的动态磁流变抛光装置。The object of the present invention is to overcome the deficiencies of the prior art and provide a dynamic magnetorheological polishing device with high processing efficiency, simple device structure, convenient operation and controllable dynamic magnetic field.
本发明的另一目的在于克服现有技术的不足,提供一种基于上述抛光装置的抛光方法。Another object of the present invention is to overcome the deficiencies of the prior art and provide a polishing method based on the above polishing device.
本发明的目的通过下述技术方案实现:The object of the present invention is achieved through the following technical solutions:
一种可控动磁场的动态磁流变抛光装置,所述抛光装置应用于半导体基片得加工,主要包括底座、驱动单元、转动托盘、杯形抛光盘、用于承托转动托盘的支撑套筒和用于控制磁场强弱的可控动磁场单元。所述支撑套筒竖直固定在底座中部,所述驱动单元设置在底座上。所述转动托盘由盘部和颈部组成,转动托盘的颈部插入支撑套筒内,并与驱动单元传动连接,由驱动单元带着转动托盘转动。所述杯形抛光盘固定安装在转动托盘的盘部上,杯形抛光盘内装有磁流变液,在转动托盘转动后对工件进行打磨。A dynamic magnetorheological polishing device with a controllable dynamic magnetic field. The polishing device is applied to the processing of semiconductor substrates, and mainly includes a base, a drive unit, a rotating tray, a cup-shaped polishing disc, and a support sleeve for supporting the rotating tray. A cylinder and a controllable dynamic magnetic field unit for controlling the strength of the magnetic field. The supporting sleeve is fixed vertically in the middle of the base, and the driving unit is arranged on the base. The rotating tray is composed of a disc and a neck. The neck of the rotating tray is inserted into the supporting sleeve and is connected with the drive unit, and the driving unit drives the rotating tray to rotate. The cup-shaped polishing disc is fixedly installed on the disc portion of the rotating tray, and the cup-shaped polishing disc is filled with magnetorheological fluid, and the workpiece is polished after the rotating tray rotates.
具体的,所述可控动磁场单元包括变频电源装置、电线旋转接头和若干组励磁线圈。所述励磁线圈安装在转动托盘的盘部内,所述变频电源装置固定在底座上,所述电线旋转接头安装在转动托盘颈部的底端,通过电线分别与励磁线圈和变频电源装置连接,采用电线旋转接头可以使变频电源装置和励磁线圈之间在转动托盘高速旋转的情况下依然保持电气连接。在接通电源后,各个励磁线圈产生特定强度的磁场,从而使磁流变液形成若干“微磨头”,这些“微磨头”会随着转动托盘的旋转而转动,从而对工件实现超精密加工。Specifically, the controllable dynamic magnetic field unit includes a variable frequency power supply device, a wire rotary joint and several sets of excitation coils. The excitation coil is installed in the disc portion of the rotating tray, the variable frequency power supply device is fixed on the base, the electric wire rotary joint is installed at the bottom of the neck of the rotating tray, and is respectively connected with the excitation coil and the variable frequency power supply device through wires. The electric wire rotary joint can keep the electrical connection between the variable frequency power supply unit and the excitation coil when the rotating tray rotates at high speed. After the power is turned on, each excitation coil generates a magnetic field with a specific strength, so that the magnetorheological fluid forms several "micro-grinding heads", and these "micro-grinding heads" will rotate with the rotation of the rotating tray, so as to achieve ultra-fine grinding on the workpiece. Precision Machining.
具体的,所述驱动单元用于带着转动托盘旋转,主要包括传动电机、主动轮和从动轮。所述传动电机固定在底座上,所述主动轮安装在传动电机的输出轴上,所述从动轮安装在转动托盘的颈部,与转动托盘固定连接。所述从动轮通过传动带与主动轮传动连接,由传动电机驱动转动托盘旋转。当传动电机启动时,其输出轴通过主动轮、传动带和从动轮将动力输送到转动托盘上。Specifically, the drive unit is used to drive the rotating tray to rotate, and mainly includes a transmission motor, a driving wheel and a driven wheel. The transmission motor is fixed on the base, the driving wheel is installed on the output shaft of the transmission motor, and the driven wheel is installed on the neck of the rotating tray, and is fixedly connected with the rotating tray. The driven wheel is connected to the driving wheel through a transmission belt, and the rotating tray is driven by a transmission motor to rotate. When the transmission motor starts, its output shaft transmits power to the rotating tray through the driving wheel, driving belt and driven wheel.
进一步的,所述抛光装置还包括设置在转动托盘颈部上的轴承端盖、一对转盘轴承、内套筒和外套筒。所述轴承端盖安装转动托盘的盘部与支撑套筒之间,用于将转动托盘主轴定位在支撑套筒内部,并保证其转动时的精度,防止转动托盘上端在转动过程中出现偏摆现象,影响加工效果。所述转盘轴承安装在支撑套筒内,所述内套筒和外套筒设置于转盘轴承之间,所述转动托盘的颈部插入内套筒内,所述内套筒套入外套筒内。所述内套筒和外套筒对转盘轴承起固定作用,主要用于定位转盘轴承的内圈和外圈。Further, the polishing device also includes a bearing end cover arranged on the neck of the rotary tray, a pair of turntable bearings, an inner sleeve and an outer sleeve. The bearing end cover is installed between the disk portion of the rotating tray and the supporting sleeve, and is used to position the main shaft of the rotating tray inside the supporting sleeve, ensure the accuracy of its rotation, and prevent the upper end of the rotating tray from swaying during the rotation process. Phenomenon, affect the processing effect. The turntable bearing is installed in the supporting sleeve, the inner sleeve and the outer sleeve are arranged between the turntable bearings, the neck of the rotating tray is inserted into the inner sleeve, and the inner sleeve is inserted into the outer sleeve Inside. The inner sleeve and the outer sleeve fix the slewing bearing and are mainly used for positioning the inner ring and the outer ring of the slewing bearing.
作为本发明的优选方案,所述变频电源装置采用低频高压交变电源。优选的,所述变频电源装置采用电压为0.5KV-5KV且频率为0.1-5Hz的交变电源。所述变频电源装置可以采用谐振波、锯齿波、三角波等波形,同时确保是低频高压交流电源,这样设计的好处在于有利形成一个行波磁场,通过改变电压和频率的大小可以实现磁场和“微磨头”更新频率的调节,从而获得更好的抛光效果。As a preferred solution of the present invention, the variable-frequency power supply device adopts a low-frequency high-voltage alternating power supply. Preferably, the variable frequency power supply device adopts an alternating power supply with a voltage of 0.5KV-5KV and a frequency of 0.1-5Hz. The variable frequency power supply device can adopt waveforms such as resonant waves, sawtooth waves, and triangular waves, and at the same time ensure that it is a low-frequency high-voltage AC power supply. The advantage of this design is that it is beneficial to form a traveling wave magnetic field. By changing the magnitude of the voltage and frequency, the magnetic field and "micro" can be realized. "Grinding head" update frequency adjustment, so as to obtain better polishing effect.
进一步的,所述励磁线圈包括线圈绕线基体和若干匝数的铜线,所述线圈绕线基体上等间距设有绕线圆柱体,所述铜线缠绕在绕线圆柱体上。作为本发明的优选方案,所述线圈绕线基体上的相邻两个绕线圆柱体的绕线方向相反,从而使绕线圆柱体的端面形成多个N极、S极相间的环形回路磁场,在交变电源的作用下产生电磁力,实现“微磨头”的环形驱动。Further, the excitation coil includes a coil winding base and several turns of copper wire, winding cylinders are arranged at equal intervals on the coil winding base, and the copper wires are wound on the winding cylinders. As a preferred solution of the present invention, the winding directions of the two adjacent winding cylinders on the coil winding base are opposite, so that the end faces of the winding cylinders form a plurality of N-pole and S-pole alternate ring loop magnetic fields , the electromagnetic force is generated under the action of the alternating power supply to realize the circular drive of the "micro-grinding head".
本发明的另一目的通过下述技术方案实现:Another object of the present invention is achieved through the following technical solutions:
一种可控动磁场的动态磁流变抛光装置的抛光方法,该方法具体包括如下步骤:A polishing method of a dynamic magnetorheological polishing device with a controllable dynamic magnetic field, the method specifically includes the following steps:
步骤S1:利用石蜡将工件贴在工具头上,工件下表面与杯形抛光盘上表面平行,调节工件下表面与杯形抛光盘之间的间隙为0.5mm—5mm;Step S1: Utilize paraffin to stick the workpiece on the tool head, the lower surface of the workpiece is parallel to the upper surface of the cup-shaped polishing disc, and the gap between the lower surface of the workpiece and the cup-shaped polishing disc is adjusted to be 0.5mm-5mm;
步骤S2:根据加工工件的特点和加工要求,在去离子水中加入如下三种磨料中的至少两种磨料,三种磨料分别是浓度为2%~15%的微米级磨料、浓度为2%~15%的亚微米级磨料、浓度为2%~15%的纳米级磨料,及去离子水中加入浓度为2%~20%的亚微米级羰基铁粉及浓度为3%~15%的微米级羰基铁粉,及加入浓度为3%~15%的分散剂和浓度为1%~6%的防锈剂,磨料加入后充分搅拌并通过超声波震动5~30分钟,形成磁流变液;Step S2: according to the characteristics of the processed workpiece and the processing requirements, add at least two of the following three abrasives to the deionized water, the three abrasives are respectively micron-scale abrasives with a concentration of 2% to 15%, and a concentration of 2% to 15%. 15% of submicron abrasives, 2% to 15% of nanoscale abrasives, and 2% to 20% of submicron carbonyl iron powder and 3% to 15% of micron grade abrasives in deionized water Carbonyl iron powder, dispersant with a concentration of 3% to 15%, and antirust agent with a concentration of 1% to 6%. After the abrasive is added, it is fully stirred and vibrated by ultrasonic waves for 5 to 30 minutes to form a magnetorheological fluid;
步骤S3:将磁流变液倒入杯形抛光盘中,根据加工工件的特点和加工要求,调节变频电源装置的输出电流大小,从而产生磁场,在杯形抛光盘的上表面形成若干个动态微磨头,这些微磨头构成打磨工件的柔性抛光垫;Step S3: Pour the magnetorheological fluid into the cup-shaped polishing disc, adjust the output current of the variable frequency power supply device according to the characteristics of the processed workpiece and processing requirements, thereby generating a magnetic field, and forming several dynamic magneto-rheological fluids on the upper surface of the cup-shaped polishing disc. micro-grinding heads, which constitute a flexible polishing pad for grinding the workpiece;
步骤S4:启动传动电机,通过传动带带动转动托盘高速旋转,并且驱动工具头高速旋转和低速摆动,对工件表面材料进行均匀抛光。Step S4: Start the transmission motor, drive the rotating tray to rotate at high speed through the transmission belt, and drive the tool head to rotate at high speed and swing at low speed, so as to uniformly polish the surface material of the workpiece.
本发明的工作过程和原理是:本发明利用交变电场通过励磁线圈产生动态磁场,并基于行波磁场的原理对磁流变液产生环形推动力,使磁流变液在杯形抛光盘表面形成环形旋转的“微磨头”。传动电机通过带着转动托盘旋转,使杯形抛光盘内的“微磨头”高速转动,同时工件自身也在旋转和摆动,这样设计可以使工件表面打磨更光滑、加工效率更高。另外,通过励磁交变电源频率和电压的优化组合,可以实现磁场动态变化并可精确控制。The working process and principle of the present invention are: the present invention utilizes an alternating electric field to generate a dynamic magnetic field through an excitation coil, and generates a circular driving force on the magnetorheological fluid based on the principle of a traveling wave magnetic field, so that the magnetorheological fluid is placed on the surface of the cup-shaped polishing disc. Form a circular rotating "micro-grinding head". The transmission motor rotates with the rotating tray to make the "micro-grinding head" in the cup-shaped polishing disc rotate at high speed, and the workpiece itself is also rotating and swinging. This design can make the surface of the workpiece smoother and the processing efficiency is higher. In addition, through the optimal combination of frequency and voltage of the excitation alternating current power supply, the dynamic change of the magnetic field can be realized and precisely controlled.
与现有技术相比,本发明还具有以下优点:Compared with the prior art, the present invention also has the following advantages:
(1)本发明所提供的可控动磁场的动态磁流变抛光装置采用励磁线圈取代永磁体可以根据加工需求实现磁场范围和强度的快速调节。(1) The dynamic magnetorheological polishing device with controllable dynamic magnetic field provided by the present invention uses excitation coils instead of permanent magnets to realize rapid adjustment of the range and intensity of the magnetic field according to processing requirements.
(2)本发明所提供的可控动磁场的动态磁流变抛光装置采用可精确调节磁场强度的励磁线圈,免去了拆卸杯形抛光盘的繁琐步骤,使抛光装置的整体结构更加优化、更合理。(2) The dynamic magnetorheological polishing device with controllable dynamic magnetic field provided by the present invention adopts an exciting coil that can precisely adjust the magnetic field strength, which eliminates the cumbersome steps of disassembling the cup-shaped polishing disc, and makes the overall structure of the polishing device more optimized. more reasonable.
(3)本发明所提供的可控动磁场的动态磁流变抛光装置采用多组励磁线圈产生多个柔性微磨头,并使微磨头之间的间距缩短,从而延迟了有效的加工时间,大大地提高了加工效率,获得理想的加工效果。(3) The dynamic magnetorheological polishing device with controllable dynamic magnetic field provided by the present invention adopts multiple sets of excitation coils to generate a plurality of flexible micro-grinding heads, and shortens the distance between the micro-grinding heads, thereby delaying the effective processing time , greatly improving the processing efficiency and obtaining the ideal processing effect.
附图说明Description of drawings
图1是本发明提供的动态磁流变抛光装置的结构剖视图。Fig. 1 is a structural sectional view of a dynamic magnetorheological polishing device provided by the present invention.
图2是本发明提供的动态磁流变抛光装置形成的微磨头示意图。Fig. 2 is a schematic diagram of a micro-grinding head formed by the dynamic magnetorheological polishing device provided by the present invention.
图3是本发明可控动磁场的动态磁流变抛光装置的抛光示意图。Fig. 3 is a polishing schematic diagram of the dynamic magnetorheological polishing device with controllable dynamic magnetic field of the present invention.
图4是本发明所提供的单个线圈绕线基体的立体图。Fig. 4 is a perspective view of a single coil winding substrate provided by the present invention.
图5是本发明所提供的单个线圈绕线基体的工作原理图。Fig. 5 is a working principle diagram of a single coil winding substrate provided by the present invention.
图6是本发明所提供的励磁线圈基于行波磁场的工作原理图。Fig. 6 is a working principle diagram of the excitation coil provided by the present invention based on the traveling wave magnetic field.
上述附图中的标号说明:Explanation of the labels in the above-mentioned accompanying drawings:
1-传动电机、2-第一固定螺钉、3-主动轮、4-平键、5-传动带、6-从动轮、7-电线旋转接头、8-第二固定螺钉、9-电线组、10-底座、11-第三固定螺钉、12-变频电源装置、13-第四固定螺钉、14-励磁线圈、15-转动托盘、16-第五固定螺钉、17-杯形抛光盘、18-轴承端盖、19-支撑套筒、20-转盘轴承、21-内套筒、22-外套筒、23-第六固定螺钉、24-磁场、25-线圈绕线基体、26-磁流变抛光工作液、27-柔性抛光垫、28-工件、29-工具头。1-transmission motor, 2-first fixing screw, 3-driving wheel, 4-flat key, 5-transmission belt, 6-driven wheel, 7-wire rotary joint, 8-second fixing screw, 9-wire group, 10 -base, 11-third fixing screw, 12-variable frequency power supply unit, 13-fourth fixing screw, 14-excitation coil, 15-rotating tray, 16-fifth fixing screw, 17-cup-shaped polishing disc, 18-bearing End cover, 19-supporting sleeve, 20-turntable bearing, 21-inner sleeve, 22-outer sleeve, 23-sixth fixing screw, 24-magnetic field, 25-coil winding substrate, 26-magnetorheological polishing Working liquid, 27-flexible polishing pad, 28-workpiece, 29-tool head.
具体实施方式detailed description
为使本发明的目的、技术方案及优点更加清楚、明确,以下参照附图并举实施例对本发明作进一步说明。In order to make the object, technical solution and advantages of the present invention more clear and definite, the present invention will be further described below with reference to the accompanying drawings and examples.
实施例1:Example 1:
如图1、图2和图3所示,本发明公开了一种可控动磁场的动态磁流变抛光装置,该抛光装置主要包括有传动电机1,第一固定螺钉2,主动轮3,平键4,传动带5,从动轮6,电线旋转接头7,第二固定螺钉8,电线9,底座10,第三固定螺钉11,变频电源装置12,第四固定螺钉13,励磁线圈14,转动托盘15,第五固定螺钉16,杯形抛光盘17,轴承端盖18,支撑套筒19,转盘轴承20,内套筒21,外套筒22,第六固定螺钉23,磁场24。其中传动电机1和变频电源装置12分别用第一固定螺钉2和第三固定螺钉13固定在底座10上,主动轮3用平键4连接在电机的输出轴上,从动轮6和转动托盘15通过第二固定螺钉8连接在一起,杯形抛光盘17又通过第五固定螺钉16连接在转动托盘15上,励磁线圈14用第四固定螺钉13固定在转盘上端面,同时线圈通过电线组9和电线旋转接头7连接在变频电源装置12上,而且在转动托盘15下端轴部安装有一对转盘轴承20,轴承的内圈和外圈分别由内套筒21和外套筒22进行压紧固定,轴承上端有端盖18进行定位,下端由从动轮6进行定位,在轴承外部有支撑套筒19对外套筒22进行定位固定,同时起到支撑作用,支撑套筒19用第六固定螺钉23固定在底座10上。传动带5连接主动轮3和从动轮6,在电机的带动下整个抛光装置转动,励磁线圈14通电后,形成一个动态的磁场24。As shown in Fig. 1, Fig. 2 and Fig. 3, the present invention discloses a dynamic magnetorheological polishing device with a controllable dynamic magnetic field. The polishing device mainly includes a transmission motor 1, a first fixing screw 2, a driving wheel 3, Flat key 4, transmission belt 5, driven wheel 6, wire rotary joint 7, second fixing screw 8, wire 9, base 10, third fixing screw 11, frequency conversion power supply device 12, fourth fixing screw 13, excitation coil 14, rotation Tray 15, fifth set screw 16, cup-shaped polishing disc 17, end cap 18, support sleeve 19, turntable bearing 20, inner sleeve 21, outer sleeve 22, sixth set screw 23, magnetic field 24. Wherein the transmission motor 1 and the variable frequency power supply device 12 are respectively fixed on the base 10 with the first fixing screw 2 and the third fixing screw 13, the driving wheel 3 is connected on the output shaft of the motor with the flat key 4, and the driven wheel 6 and the rotating tray 15 Connected together by the second fixing screw 8, the cup-shaped polishing disc 17 is connected on the rotating tray 15 by the fifth fixing screw 16, the excitation coil 14 is fixed on the upper end surface of the turntable by the fourth fixing screw 13, and the coil is passed through the wire group 9 at the same time. It is connected with the electric wire rotary joint 7 on the variable frequency power supply device 12, and a pair of turntable bearings 20 are installed on the lower end shaft of the rotating tray 15, and the inner ring and outer ring of the bearings are pressed and fixed by the inner sleeve 21 and the outer sleeve 22 respectively. , the upper end of the bearing is positioned by an end cover 18, the lower end is positioned by the driven wheel 6, and there is a support sleeve 19 outside the bearing to position and fix the outer sleeve 22, and at the same time play a supporting role. The support sleeve 19 uses the sixth fixing screw 23 fixed on the base 10. The transmission belt 5 connects the driving wheel 3 and the driven wheel 6, and the whole polishing device rotates under the drive of the motor. After the exciting coil 14 is energized, a dynamic magnetic field 24 is formed.
在本实施例中,柔性抛光垫27中“微磨头”在抛光盘内平面位置示意图如图2所示。In this embodiment, a schematic diagram of the planar position of the "micro-grinding head" in the flexible polishing pad 27 in the polishing disc is shown in FIG. 2 .
本发明还公开了一种可控动磁场的动态磁流变抛光装置的抛光方法,该方法的具体步骤如下:The invention also discloses a polishing method of a dynamic magnetorheological polishing device with a controllable dynamic magnetic field. The specific steps of the method are as follows:
步骤S1:利用石蜡将工件28贴在工具头29上,工件28下表面与杯形抛光盘17上表面平行,调节工件28下表面与杯形抛光盘17之间的间隙为1mm;Step S1: Utilize paraffin to stick workpiece 28 on the tool head 29, the lower surface of workpiece 28 is parallel to the upper surface of cup-shaped polishing disc 17, and the gap between the lower surface of workpiece 28 and the cup-shaped polishing disc 17 is adjusted to be 1mm;
步骤S2:根据直径为100mm的单晶碳化硅的特点和加工要求,在去离子水中加入浓度为4%的粒径为4微米的金刚石磨料、浓度为3%的粒径为200纳米金刚石磨料,去离子水中加入浓度为3%的粒径500纳米级羰基铁粉及浓度为3%的粒径4微米级羰基铁粉,及加入浓度为3%的分散剂和浓度为3%的防锈剂,充分搅拌后通过超声波震动30分钟,形成磁流变液26;Step S2: According to the characteristics and processing requirements of single crystal silicon carbide with a diameter of 100mm, adding a concentration of 4% to the deionized water is a diamond abrasive with a particle diameter of 4 microns, and a concentration of 3% with a particle diameter of 200 nanometers. Add carbonyl iron powder with a particle size of 500 nanometers at a concentration of 3% and carbonyl iron powder with a particle size of 4 microns at a concentration of 3% in deionized water, and add a dispersant with a concentration of 3% and an antirust agent with a concentration of 3%. , after fully stirring, vibrate ultrasonically for 30 minutes to form magnetorheological fluid 26;
步骤S3:将磁流变抛光工作液26倒入杯形抛光盘17中,调节变频电源装置12的输出电流大小,产生一定范围和足够强度的磁场24,在杯形抛光盘17的上表面形成数个动态“微磨头”组成的柔性抛光垫27;Step S3: Pour the magnetorheological polishing working fluid 26 into the cup-shaped polishing disc 17, adjust the output current of the variable frequency power supply device 12, generate a magnetic field 24 with a certain range and sufficient strength, and form a magnetic field 24 on the upper surface of the cup-shaped polishing disc 17. A flexible polishing pad 27 composed of several dynamic "micro-grinding heads";
步骤S4:启动传动电机1,调节转速为120rpm,带动转动托盘15高速旋转,驱动工具头29转速为-200rpm,摆动速度10次/分,摆幅10mm,加工时间为90min,实现单晶碳化硅表面材料的高效率超光滑均匀抛光。Step S4: start the transmission motor 1, adjust the rotating speed to 120rpm, drive the rotating tray 15 to rotate at a high speed, drive the tool head 29 to rotate at -200rpm, swing at a speed of 10 times/min, swing at 10mm, and process for 90 minutes to realize single crystal silicon carbide High-efficiency ultra-smooth and uniform polishing of surface materials.
请参考图3,图3为本发明可控动磁场的动态磁流变抛光装置的抛光示意图。Please refer to FIG. 3 . FIG. 3 is a polishing diagram of a dynamic magnetorheological polishing device with a controllable dynamic magnetic field according to the present invention.
本发明实施例中,励磁线圈14是由若干匝数导电性能好的铜线绕在多个线圈绕线基体25上组成,并通过第四固定螺钉13固定在转动托盘上。线圈绕线基体25相邻的两个圆柱体上导电铜线的绕向方向相反,基于行波磁场的原理,从而在基体6个圆柱端面形成N极、S极相间隔的环形回路磁场,在交流电源供电下,垂直于磁流变液26的磁感应强度分量By产生感应电流Jz,进而产生电磁力Fx,实现“微磨头”环形驱动作用。In the embodiment of the present invention, the excitation coil 14 is composed of several turns of copper wire with good electrical conductivity wound on a plurality of coil winding substrates 25 , and is fixed on the rotating tray by the fourth fixing screw 13 . The winding directions of the conductive copper wires on the two adjacent cylinders of the coil winding base 25 are opposite. Based on the principle of traveling wave magnetic field, an annular loop magnetic field with N poles and S poles spaced apart is formed on the six cylinder end faces of the base body. Under the AC power supply, the magnetic induction intensity component By perpendicular to the magnetorheological fluid 26 generates an induced current Jz, and then generates an electromagnetic force Fx to realize the circular driving effect of the "micro grinding head".
请参考图4和图5,图4是本发明中单个线圈绕线基体三维示意图和工作原理图,图6是本发明的励磁线圈基于行波磁场的工作原理图。Please refer to FIG. 4 and FIG. 5. FIG. 4 is a three-dimensional schematic diagram and a working principle diagram of a single coil winding substrate in the present invention, and FIG. 6 is a working principle diagram of the exciting coil of the present invention based on a traveling magnetic field.
在上述实施例中,变频电源装置12选用低频高压交变电源,具体可以为0.5-5kV且频率为0.1-5Hz的交变电源,当然该电源的选用不限于此。In the above embodiment, the variable frequency power supply device 12 is a low-frequency high-voltage alternating power supply, specifically an alternating power supply of 0.5-5 kV and a frequency of 0.1-5 Hz, of course, the selection of the power supply is not limited thereto.
上述实施例中,加工对象不仅限于单晶碳化硅,也可以加工其他的半导体材料料,比如单晶硅、蓝宝石等,但需要根据加工对象的特点和加工要求,在去离子水中加入如下三种磨料中的至少两种磨料,三种磨料分别是浓度为2%~15%的微米级磨料、浓度为2%~15%的亚微米级磨料、浓度为2%~15%的纳米级磨料,及去离子水中加入浓度为2%~20%的亚微米级羰基铁粉及浓度为3%~15%的微米级羰基铁粉,及加入浓度为3%~15%的分散剂和浓度为1%~6%的防锈剂,充分搅拌后通过超声波震动5~30分钟,形成加工该材料的相应磁流变液26。In the above-mentioned embodiment, the processing object is not limited to single crystal silicon carbide, and other semiconductor materials, such as single crystal silicon, sapphire, etc., can also be processed, but it is necessary to add the following three types in deionized water according to the characteristics of the processing object and processing requirements At least two kinds of abrasives in the abrasives, the three kinds of abrasives are micron-scale abrasives with a concentration of 2% to 15%, submicron abrasives with a concentration of 2% to 15%, and nanoscale abrasives with a concentration of 2% to 15%, and deionized water with a concentration of 2% to 20% of submicron carbonyl iron powder and a concentration of 3% to 15% of micron carbonyl iron powder, and a concentration of 3% to 15% of a dispersant and a concentration of 1 % to 6% of anti-rust agent, fully stirred and vibrated by ultrasonic waves for 5 to 30 minutes to form the corresponding magnetorheological fluid 26 for processing the material.
本发明利用交变电场通过励磁线圈14产生动态磁场,并基于行波磁场的原理产生环形推动力,在杯形抛光盘17表面形成环形旋转的微磨头,通过励磁交变电源频率和电压的优化组合,实现磁场动态可控,用励磁线圈14取代永磁体不仅可以实现磁场范围和强度的快速调节,免去了拆卸杯形抛光盘17的繁琐步骤,而且整体结构更加优化,缩短柔性微磨头之间的间距从而延长了有效加工时间,提升了加工效率。The present invention utilizes an alternating electric field to generate a dynamic magnetic field through an excitation coil 14, and generates a ring-shaped driving force based on the principle of a traveling wave magnetic field, forming a ring-shaped rotating micro-grinding head on the surface of the cup-shaped polishing disc 17. Optimize the combination to realize the dynamic controllability of the magnetic field. Using the excitation coil 14 instead of the permanent magnet can not only realize the rapid adjustment of the magnetic field range and strength, but also eliminate the cumbersome steps of disassembling the cup-shaped polishing disc 17, and the overall structure is more optimized, shortening the length of the flexible micro-grinding process. The distance between the heads prolongs the effective processing time and improves the processing efficiency.
上述实施例为本发明较佳的实施方式,但本发明的实施方式并不受上述实施例的限制,其他的任何未背离本发明的精神实质与原理下所作的改变、修饰、替代、组合、简化,均应为等效的置换方式,都包含在本发明的保护范围之内。The above-mentioned embodiment is a preferred embodiment of the present invention, but the embodiment of the present invention is not limited by the above-mentioned embodiment, and any other changes, modifications, substitutions, combinations, Simplifications should be equivalent replacement methods, and all are included in the protection scope of the present invention.
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Application publication date: 20170711 |