CN106908004B - A kind of distance measurement system and its application based on vectorial field - Google Patents
A kind of distance measurement system and its application based on vectorial field Download PDFInfo
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- CN106908004B CN106908004B CN201710050790.8A CN201710050790A CN106908004B CN 106908004 B CN106908004 B CN 106908004B CN 201710050790 A CN201710050790 A CN 201710050790A CN 106908004 B CN106908004 B CN 106908004B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
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- Length Measuring Devices By Optical Means (AREA)
Abstract
本发明公开了一种基于矢量光场的距离探测系统及其应用，包括矢量光源、反光镜、双透镜、双缝、凸透镜、光电探测器和信号处理系统；将双缝设置在初始点位置，将光电探测器设置在待测点位置，所述矢量光源向反光镜发射矢量光，矢量光经反光镜反射后，经双透镜调整光路宽度后，然后射入双缝，产生干涉图样；根据光电探测器测得的光信息获得所述待测物体的距离。该系统具有测量精度高，且结构简单，安装方便，价格低廉，适用范围广的特点。
The invention discloses a distance detection system based on a vector light field and its application, comprising a vector light source, a reflector, a double lens, a double slit, a convex lens, a photoelectric detector and a signal processing system; the double slit is set at the initial point position, The photodetector is set at the position to be measured, and the vector light source emits vector light to the reflector. After the vector light is reflected by the reflector, the width of the optical path is adjusted by the double lens, and then injected into the double slit to generate an interference pattern; according to the photoelectric The light information measured by the detector obtains the distance of the object to be measured. The system has the characteristics of high measurement accuracy, simple structure, convenient installation, low price and wide application range.
Description
Technical field
The present invention relates to vector flash ranging displacement field more particularly to a kind of distance measurement system based on vectorial field and its
Using.
Background technique
Laser interferance method displacement.This is a kind of relative measurement, it can not measure an absolute distance of the object from instrument,
But the relative distance of two testees can be measured.Its principle is a Michelson's interferometer, is become using reflecting mirror distance
The variation of interference fringe measures when change, and reflecting mirror moves to object B from object A, and the quantity of interference fringe variation reflects it
Distance.This measurement request condition is higher, but can be with precise measurement, it is also most accurate one in current all measurement means
Kind.And vectorial field displacement, it is the technological innovation moved to optical location, so that original interference fringe is become from one-dimensional
Two dimension greatly improves system sensitivity, so that displacement measurement is more accurate.
Summary of the invention
The purpose of the invention is to provide a kind of distance measurement system of interference fringe using vectorial field and its answer
With, have measurement accuracy high, and structure is simple, it is easy for installation, it is cheap, it is applied widely the features such as.
The present invention is achieved through the following technical solutions: a kind of distance measurement system based on vectorial field, including vector
Light source, reflective mirror, double lens, double slit, convex lens, photodetector and signal processing system；Double slit is arranged in initial point
It sets, by photodetector setting in tested point position, the vector light source emits vector light to reflective mirror, and vector light is through reflective mirror
After reflection, after double lens adjusts optical path width, the light beam that radius is ε is formed, double slit is then injected, interference is generated, through convex lens
After mirror focuses, photodetector is injected, photodetector measures the light intensity I of any point P in interference pattern, and is input at signal
Reason system, signal processing system obtain initial point to the distance between tested point d=π bx/ (λ δ) by calculating, wherein and δ=
arccos[(I-2)/(2(cos2mθB))], m is topological charge number, and b is slit spacing, and x is water of the P point to interference pattern central point
Flat distance, θB=arccos (b/ (2 ε)), λ are vector optical wavelength.
Further, the double slit template is micro-structure double slit.
Further, the photodetector is planar array detector or linear array detector, can also be pixilated detectors.
A kind of application of distance measurement system in straight-line displacement sensing, the application be, by the photodetector and to
Object connection is surveyed, the double slit is arranged on the extended line of object under test linear motion, the light measured according to photodetector
The real-time displacement of object under test described in information acquisition.
The beneficial effects of the present invention are: it is high that the system has measurement accuracy, and structure is simple, and easy for installation, price is low
Honest and clean, applied widely feature.
Detailed description of the invention
Fig. 1 is demonstration of the vector beam by double slit；
Fig. 2 is two-slit interference schematic device；
Fig. 3 is that vector beam projects schematic diagram；
Fig. 4 is when initial phase is 0, and topological charge number 1 regulates and controls interference fringe pattern when parameter is 1.
In figure, vector light source 1, reflective mirror 2, double lens 3, double slit 4, convex lens 5, photodetector 6, signal processing system
7。
Specific embodiment
As shown in figure 3, a kind of distance measurement system based on vectorial field, including vector light source 1, reflective mirror 2, double lens
3, double slit 4, convex lens 5, photodetector 6 and signal processing system 7；Double slit 4 is arranged in initial point position, by photodetection
The setting of device 6 emits vector light to reflective mirror 2 in tested point position, the vector light source 1, and vector light is after the reflection of reflective mirror 2, warp
After double lens 3 adjusts optical path width, the light beam that radius is ε is formed, double slit 4 is then injected, generate interference, planoconvex lens 5 focus
Afterwards, photodetector 6 is injected, the generation of interference fringe is realized by the following method:
The distribution of light intensity formula of known any mixed polarization states vectorial field are as follows:
Wherein r=(x2+y2)1/2, as through double lens 3 adjust optical path width after beam radius, r=ε, θ=arctan
(y/x), m is topological charge number, θ0For the initial phase of vector light, l/r0Change speed parameter for the polarization state of vector light radially.
exAnd eyUnit vector respectively on the direction x and the direction y, A0Amplitude is indicated, in next reckoning, it is believed that A is located at
Any point is steady state value on beam cross section.R indicates that on the x/y plane where slit, origin is to examining in cartesian coordinate system
Examine distance a little.θ is the azimuth of the polar coordinate system where beam cross-section.As shown in Figure 1, there are AB two on x/y plane
Slit, the distance between slit is b, while the distance of AB slit to origin is identical, and is parallel to each other, slit vertical with x-axis
Width is a.After monochromatic mixed polarization states vectorial field represented by by formula passes through two slits, it can be equivalent to two times
Grade linear light source, is finally overlapped on the plane of vision being parallel to after x/y plane.We take d be slit to plane of vision away from
From.Assuming that the width of slit is sufficiently small and infinite in length, furthermore the scale of slit spacing b be sewn to plane of vision distance d phase
It is more sufficiently small than also.
It decomposes vectorial field and carries out theoretical calculation:
Mixed polarization states vectorial field is decomposed into two component polarization light of x Yu the direction y, it is independent opposite to each other.Expression
Formula is write respectively
Ex(θ)=cos [+2 π l (r/r of m θ0)+θ0]
Ey(θ)=sin [+2 π l (r/r of m θ0)+θ0]
When light beam reaches AB slit, light beam can regard as shown in Figure 1, it can be seen from the figure that only lucky position
Light in slit position can just pass through slit.Slit AB is symmetrical about y-axis, therefore is located at y-coordinate value on two slits
The azimuth of origin corresponding to identical two points is respectively θ A and θ B.We can be found that θ A and θ B supplementary angle relationship, i.e. θ each other
A=π-θ B.When the x of decomposition and the polarized light field in the direction y pass through AB slit, expression formula be can be written as:
The light intensity expression Ix of the direction x polarization state component and the direction y polarization state component after interference can be write out respectively
With Iy.We enable first
Then the light intensity expression of Ix and Iy, which can simplify, is written as:
Wherein δ is to pass through the phase difference between two slit beam of AB.In Tomas Young's tow-slit experiment, as shown in figure 3-2,
If the initial phase of incident light source is φ 0 (t), it is the amount being randomly generated, and receives respectively at inspecting position P and comes from (QAP)
It is written as respectively with the phase of (QBP) two optical disturbances:
Then phase difference is
Total interference strength formula is
I (x, y)=Ix(x,y)+Iy(x, y)=2+2cos (2m θB)cosδ
The π bx/ of δ=2 (λ d)
Wherein d is distance of the plane where double slit to plane where photoelectric sensor, that is, measured required for us
Distance.
That is d=2 π bx/ (λ δ).
Below by the reliability of following experimental verification the method for the invention:
Test distance 5cm, 20cm, 1m are set, according to arrangement vector light source 1 shown in Fig. 3, reflective mirror 2, double
Lens 3, double slit 4, convex lens 5, photodetector 6 and signal processing system 7；Double slit 4 is arranged in initial point position, by photoelectricity
The setting of detector 6 emits vector light to reflective mirror 2 in tested point position, the vector light source 1, and vector light is reflected through reflective mirror 2
Afterwards, after double lens 3 adjusts optical path width, the light beam that radius is ε is formed, double slit 4 is then injected, generates interference, planoconvex lens 5
After focusing, photodetector 6 is injected, photodetector 6 measures the light intensity I of any point P in interference pattern, and is input at signal
Reason system 7, signal processing system 7 obtain initial point to the distance between tested point d=2 π bx/ (λ δ) by calculating, wherein δ
=arccos [(I-2)/(2 (cos2m θB))]；
M is topological charge number, and b is slit spacing, and x is horizontal distance of the P point to interference pattern central point, θB=arccos
(b/ (2 ε)), λ are vector optical wavelength.
The result output of three measurement distances is as shown in the table:
| Set distance | 5cm | 20cm | 1m |
| Measurement result | 5.002cm | 19.998cm | 100.003cm |
The present invention also provides application of the above-mentioned distance measurement system in straight-line displacement sensing, which is, by the light
Electric explorer 7 is connect with object under test, the double slit 4 is arranged on the extended line of object under test linear motion, according to photoelectricity
The optical information that detector 7 measures obtains the real-time displacement of the object under test.
Claims (4)
1. a kind of distance measurement system based on vectorial field, which is characterized in that including vector light source (1), reflective mirror (2), double
Lens (3), double slit (4), convex lens (5), photodetector (6) and signal processing system (7)；Double slit (4) are arranged initial
Point position, by photodetector (6) setting in tested point position, the vector light source (1) emits vector light to reflective mirror (2),
Vector light is after reflective mirror (2) are reflected, and after double lens (3) adjust optical path width, forms the light beam that radius is ε, then injects
Double slit (4) generates interference, after planoconvex lens (5) focus, injects photodetector (6), photodetector (6) measures interference pattern
The light intensity I of any point P in sample, and signal processing system (7) are input to, signal processing system (7) obtains initial point by calculating
To the distance between tested point d=2 π bx/ (λ δ), wherein δ=arccos [(I-2)/(2 (cos2m θB))]；
M is topological charge number, and b is slit spacing, and x is horizontal distance of the P point to interference pattern central point, θB=arccos (b/ (2
ε)), λ is vector optical wavelength；
When detecting straight-line displacement, the photodetector is connect with object under test, the double slit is arranged in object under test
On the extended line of linear motion, the real-time displacement of the object under test is obtained according to the optical information that photodetector measures.
2. distance measurement system according to claim 1, which is characterized in that the double slit (4) is micro-structure double slit.
3. distance measurement system according to claim 1, which is characterized in that the photodetector (6) is that face battle array is visited
Survey device or linear array detector or pixilated detectors.
4. a kind of application method of the distance measurement system described in claim 1 in straight-line displacement sensing, which is characterized in that the party
Method is to connect the photodetector (6) with object under test, and object under test linear motion is arranged in the double slit (4)
On extended line, the real-time displacement of the object under test is obtained according to the optical information that photodetector (6) measures.
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| CN109375397B (en) * | 2018-12-12 | 2021-04-30 | 浙江理工大学 | Orthogonal circularly polarized light ranging system based on vector vortex light beams |
| CN109557679B (en) * | 2019-01-07 | 2020-10-27 | 浙江理工大学 | Linear polarization light generation device of vector light beam based on radial polarization change |
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| CN101846553A (en) * | 2010-03-30 | 2010-09-29 | 北京理工大学 | Device and method for measuring polarization state by two-slit interference method |
| CN102607435A (en) * | 2012-03-27 | 2012-07-25 | 黑龙江工程学院 | Device and method for measuring thickness of optical film by adopting double-slit interference method |
| CN203687880U (en) * | 2014-01-20 | 2014-07-02 | 浙江大学 | Optical displacement measuring system |
| CN104034268A (en) * | 2014-07-01 | 2014-09-10 | 西安工业大学 | Two-slit interference fringe decoding spectrum confocal displacement sensor and displacement measurement method thereof |
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