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CN106835037A - A kind of high rigidity, multicomponent nitride coatings of high elastic modulus and preparation method thereof - Google Patents

A kind of high rigidity, multicomponent nitride coatings of high elastic modulus and preparation method thereof Download PDF

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CN106835037A
CN106835037A CN201611153024.6A CN201611153024A CN106835037A CN 106835037 A CN106835037 A CN 106835037A CN 201611153024 A CN201611153024 A CN 201611153024A CN 106835037 A CN106835037 A CN 106835037A
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substrate
coating
elastic modulus
nitride coating
magnetron sputtering
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李伟
黄纯可
刘平
张柯
马凤仓
刘新宽
陈小红
何代华
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University of Shanghai for Science and Technology
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641Nitrides

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Abstract

本发明一种高硬度、高弹性模量的多组元氮化物涂层,其化学式为AlCrTiZrNbN,Al、Cr、Ti、Zr、Nb和N元素的原子比分别为8~12%:8~12%:8~12%:8~12%:8~12%:48~52%,涂层的厚度为2~5μm。本发明还提供了上述氮化物涂层的制备方法,先将基体表面作镜面抛光处理,然后经过丙酮、酒精的超声清洗,真空离子清洗后,采用射频反应溅射方法沉积AlCrTiZrNbN层,其中AlCrTiZrNbN多组元氮化物涂层由等原子摩尔比的AlCrTiZrNb合金靶材在(Ar+N2)气氛下制得。本发明的涂层具有高硬度和高弹性模量,可作为新型保护性涂层用于刀具、模具等多种服役场合。The present invention is a multi-component nitride coating with high hardness and high elastic modulus. Its chemical formula is AlCrTiZrNbN, and the atomic ratios of Al, Cr, Ti, Zr, Nb and N are respectively 8-12%: 8-12 %: 8~12%: 8~12%: 8~12%: 48~52%, the thickness of the coating is 2~5μm. The present invention also provides a method for preparing the above-mentioned nitride coating. Firstly, the surface of the substrate is subjected to mirror polishing, then ultrasonically cleaned with acetone and alcohol, and after vacuum ion cleaning, the AlCrTiZrNbN layer is deposited by radio frequency reactive sputtering, wherein AlCrTiZrNbN is mostly The component nitride coating is prepared from the AlCrTiZrNb alloy target with equiatomic molar ratio under (Ar+N 2 ) atmosphere. The coating of the invention has high hardness and high modulus of elasticity, and can be used as a novel protective coating in various service occasions such as cutting tools and molds.

Description

一种高硬度、高弹性模量的多组元氮化物涂层及其制备方法A multi-component nitride coating with high hardness and high elastic modulus and its preparation method

技术领域technical field

本发明属于材料表面工程领域,涉及一种涂层,具体来说是一种高硬度、高弹性模量的多组元氮化物涂层及其制备方法。The invention belongs to the field of material surface engineering and relates to a coating, in particular to a multi-component nitride coating with high hardness and high elastic modulus and a preparation method thereof.

背景技术Background technique

随着先进制造业的发展,对材料的切削往高速和干式两个方向发展,因此对刀具材料的表面性能提出了越来越高的要求,要求刀具材料表面具有较高的硬度、耐磨、耐腐蚀和较低的摩擦系数。涂层技术是提高刀具性能和寿命的重要途径。随着高速切削、干式切削等先进切削技术的不断发展,对刀具涂层的性能也提出了更高的要求,不仅要具备高硬度、高弹性模量、耐磨性和韧性等机械性能,还要具备抗高温氧化性能、耐蚀性以及较低的摩擦系数。传统的刀具涂层,如TiN、CrN甚至TiAlN涂层已逐渐不能满足苛刻的性能要求。With the development of advanced manufacturing industry, the cutting of materials is developing in two directions of high speed and dry cutting. Therefore, higher and higher requirements are put forward for the surface properties of tool materials, and the surface of tool materials is required to have higher hardness and wear resistance. , corrosion resistance and low coefficient of friction. Coating technology is an important way to improve tool performance and life. With the continuous development of advanced cutting technologies such as high-speed cutting and dry cutting, higher requirements are put forward for the performance of tool coatings. Not only must they have mechanical properties such as high hardness, high modulus of elasticity, wear resistance and toughness, It also has high temperature oxidation resistance, corrosion resistance and a low coefficient of friction. Traditional tool coatings, such as TiN, CrN and even TiAlN coatings, have gradually failed to meet the demanding performance requirements.

2004年,台湾学者叶均蔚教授突破合金设计的传统观念,创新性地提出了多组元高熵合金(high-entropy alloy,HEA)。高熵合金是指包含5~13种组元,并能形成高熵固溶体的合金。由于高熵效应,高熵合金凝固后不仅不会形成数目众多的金属间化合物,反而呈现出简单的面心立方(FCC) 或体心立方(BCC) 结晶相。高熵合金在铸态和完全回火态都会析出纳米相结构,甚至是非晶结构,呈现高温析出强化现象。大量研究表明,高熵合金具有传统合金所无法比拟的性能。In 2004, Taiwanese scholar Professor Ye Junwei broke through the traditional concept of alloy design and innovatively proposed a multi-component high-entropy alloy (HEA). High-entropy alloys refer to alloys that contain 5 to 13 components and can form high-entropy solid solutions. Due to the high entropy effect, the solidified high entropy alloy not only does not form a large number of intermetallic compounds, but presents a simple face-centered cubic (FCC) or body-centered cubic (BCC) crystal phase. High-entropy alloys will precipitate nano-phase structures, even amorphous structures, in the as-cast state and in the fully tempered state, showing a high-temperature precipitation strengthening phenomenon. A large number of studies have shown that high-entropy alloys have properties that cannot be compared with traditional alloys.

高熵合金涂层具有高强度、高硬度、高耐回火软化、高耐磨性、高抗氧化性和耐腐蚀等优异性能,在工具刀具模具应用方面展现出很大潜力,这为涂层的材料体系选择提供了一个很好的契机。High-entropy alloy coatings have excellent properties such as high strength, high hardness, high resistance to temper softening, high wear resistance, high oxidation resistance and corrosion resistance, and have shown great potential in the application of tools, tools and molds. The choice of material system provides a good opportunity.

通过查文献得知,硬质复合涂层目前已经通过多种方法成功制得,也诸多体系中也获得了高硬度,对该类涂层的研究也取得了不少有益的成果。通过查询,检索到如下有关硬质复合涂层的中国专利:According to literature review, hard composite coatings have been successfully prepared by various methods, and high hardness has also been obtained in many systems. The research on this type of coatings has also achieved many beneficial results. Through the query, the following Chinese patents related to hard composite coatings were retrieved:

申请号为201010176320的专利涉及了一种纳米复合钛铬硅氮化物刀具涂层,属于陶瓷涂层领域。本发明公开了一种纳米复合钛铬硅氮化物刀具涂层及其制备方法,刀具基体为WC/Co硬质合金,涂层包含有过渡层的钛铬硅氮化物涂层,其中含有钛,铬,硅,氮元素,晶粒大小在5~15nm,涂层厚度1~4μm,涂层显微硬度26GPa,高温稳定性达到1068℃以上,本发明的纳米复合钛铬硅氮化物涂层刀具采用离子镀与溅射镀相结合的方式制备的涂层刀具,适用于高速条件下的高硬度钢材料切削加工。The patent application No. 201010176320 relates to a nanocomposite titanium chromium silicon nitride tool coating, which belongs to the field of ceramic coatings. The invention discloses a nanocomposite titanium-chromium-silicon-nitride tool coating and a preparation method thereof. The tool substrate is WC/Co hard alloy, and the coating contains a transition layer of titanium-chromium-silicon nitride coating, which contains titanium, Chromium, silicon, and nitrogen elements, the grain size is 5-15nm, the coating thickness is 1-4μm, the coating microhardness is 26GPa, and the high-temperature stability reaches above 1068°C. The nanocomposite titanium-chromium-silicon nitride-coated tool of the present invention The coated tool prepared by combining ion plating and sputtering plating is suitable for cutting high-hardness steel materials under high-speed conditions.

申请号为200510095785的专利涉及一种内燃机汽缸的内壁应用的硬质复合纳米陶瓷薄膜的涂层,属于陶瓷涂层领域。在内燃机汽缸的内壁应用的硬质复合纳米陶瓷薄膜的涂层,本涂层可以利用通用的淀积固体薄膜的加工技术加以实现,该淀积固体薄膜的加工技术包括真空蒸发、磁控溅射、离子束溅射、离子镀、液相外延、化学束外延、分子束外延、脉冲激光淀积、电化学淀积、化学气相沉积及物理气相沉积;该在内燃机汽缸的内壁应用的硬质复合纳米陶瓷薄膜的涂层的基本方法是应用淀积固体薄膜的技术,在内燃机汽缸的内壁淀积一种及一种以上的硬质复合纳米陶瓷薄膜的涂层;该涂层用以使内燃机汽缸的内壁发生材料的表面改性;该涂层的总体维氏硬度HV不小于3350;该涂层的整体厚度不超过60μm;内燃机汽缸的内壁包括汽油机内燃机汽缸的内壁、柴油机内燃机汽缸的内壁。The patent with application number 200510095785 relates to a hard composite nano-ceramic film coating applied to the inner wall of an internal combustion engine cylinder, which belongs to the field of ceramic coatings. The coating of the hard composite nano-ceramic thin film applied on the inner wall of the cylinder of an internal combustion engine can be realized by a general processing technology for depositing a solid film. The processing technology for depositing a solid film includes vacuum evaporation, magnetron sputtering , ion beam sputtering, ion plating, liquid phase epitaxy, chemical beam epitaxy, molecular beam epitaxy, pulsed laser deposition, electrochemical deposition, chemical vapor deposition and physical vapor deposition; The basic method of the coating of nano-ceramic film is to apply the technology of depositing solid film, and deposit one or more coatings of hard composite nano-ceramic film on the inner wall of the internal combustion engine cylinder; the coating is used to make the internal combustion engine cylinder The surface modification of the inner wall of the material occurs; the overall Vickers hardness HV of the coating is not less than 3350; the overall thickness of the coating is not more than 60 μm; the inner wall of the internal combustion engine cylinder includes the inner wall of the gasoline engine internal combustion engine cylinder and the inner wall of the diesel engine internal combustion engine cylinder.

申请号为201010192876的发明涉及硬质合金上的高硬度纳米复合涂层。具体描述了在硬质合金切削工具或其他工件衬底上通过形成多晶金刚石涂层或包括耐火金属碳化物和多晶金刚石的复合涂层来产生粘合表面涂层的方法。通过顺序的化学气相沉积工艺沉积该涂层,首先使用特定的氢气和耐火金属卤化物的气体混合物来沉积耐火金属碳化物的基层。这一步随后是第二步,在第二步中,从包括烃和氢气的气体混合物中沉积多晶金刚石。也设想了在第二步中共沉积耐火金属碳化物和金刚石以产生强化的金刚石涂层。The invention with application number 201010192876 relates to a high-hardness nanocomposite coating on cemented carbide. Specifically described is a method of producing a bonded surface coating on a cemented carbide cutting tool or other workpiece substrate by forming a polycrystalline diamond coating or a composite coating comprising refractory metal carbide and polycrystalline diamond. The coating is deposited by a sequential chemical vapor deposition process, first using a specific gas mixture of hydrogen and refractory metal halide to deposit a base layer of refractory metal carbide. This step is followed by a second step in which polycrystalline diamond is deposited from a gas mixture comprising hydrocarbons and hydrogen. It is also envisaged to co-deposit refractory metal carbide and diamond in a second step to produce a strengthened diamond coating.

申请号为201010274793的专利涉及了一种硬质合金基体表面制备纳米结构氮钇锆硬质涂层的方法,在硬质合金基体表面制备纳米结构氮钇锆硬质涂层的方法,涉及一种硬质合金。提供一种采用磁控溅射法,在硬质合金基体表面制备纳米结构氮钇锆硬质涂层的方法。在经过机械抛光、超声清洗以及离子源清洗处理过的硬质合金基体表面,采用直流和射频反应共溅射沉积,控制总压强0.3~0.5Pa、氮气流量15~20%,Zr靶材直流功率为250W,Y靶材的射频电源功率为50~200W,基体温度为300℃,沉积时间90min,溅射沉积完成后得到氮钇锆硬质涂层,为纳米复合结构且涂层具有高的硬度。The patent with the application number 201010274793 relates to a method for preparing a nanostructured yttrium-zirconium nitride hard coating on the surface of a cemented carbide substrate. Carbide. Provided is a method for preparing a nanostructure yttrium-zirconium nitride hard coating on the surface of a hard alloy substrate by using a magnetron sputtering method. On the surface of the cemented carbide substrate that has been treated by mechanical polishing, ultrasonic cleaning and ion source cleaning, direct current and radio frequency reactive co-sputtering are used to deposit, the total pressure is controlled at 0.3-0.5Pa, the nitrogen flow rate is 15-20%, and the direct current power of the Zr target 250W, the RF power of the Y target is 50-200W, the substrate temperature is 300°C, and the deposition time is 90min. After the sputtering deposition is completed, a hard coating of yttrium zirconium nitride is obtained, which is a nanocomposite structure and the coating has high hardness. .

申请号为200810197643本发明公开了一种Ti-Si-N纳米晶-非晶复合超硬涂层的制备方法。该方法利用磁场控制的高密度电弧放电使Ti电弧靶蒸发Ti,通入氮气和蒸发出的Ti反应生成TiN,同时通入硅烷,把硅烷(SiN↓[4])离化分解成Si离子和H离子,Si离子和氮反应生成Si3N4。在偏压下,TiN晶体和Si3N4相同时竞争生长于工件基体上成膜,形成Ti-Si-N纳米晶-非晶复合涂层。本发明制备的Ti-Si-N纳米晶复合涂层具有涂层硬度高、附着力强、涂层生长速率快、生产效率高、生产成本低、涂层设备结构简单等特点,根据使用要求可在硬质合金、不锈钢、碳钢等各类工件上进行不同厚度Ti-Si-N纳米晶-非晶复合超硬涂层的制备。The application number is 200810197643, and the invention discloses a preparation method of a Ti-Si-N nanocrystalline-amorphous composite superhard coating. This method utilizes a high-density arc discharge controlled by a magnetic field to evaporate Ti on the Ti arc target, and nitrogen gas is introduced to react with the evaporated Ti to form TiN, while silane is introduced to ionize and decompose silane (SiN↓[4]) into Si ions and H ions, Si ions and nitrogen react to form Si 3 N 4 . Under the bias voltage, TiN crystal and Si 3 N 4 compete to grow on the workpiece substrate to form a film at the same time, forming a Ti-Si-N nanocrystalline-amorphous composite coating. The Ti-Si-N nanocrystalline composite coating prepared by the present invention has the characteristics of high coating hardness, strong adhesion, fast coating growth rate, high production efficiency, low production cost, and simple structure of coating equipment. Preparation of Ti-Si-N nanocrystalline-amorphous composite superhard coatings with different thicknesses on various workpieces such as cemented carbide, stainless steel, and carbon steel.

然而,上述现有的涂层仍存在着硬度、摩擦系数不能满足高速切削和干式切削的性能要求的缺点,以及涂层性能、沉积条件以及沉积效率无法兼顾的问题。However, the above-mentioned existing coatings still have the disadvantages that the hardness and friction coefficient cannot meet the performance requirements of high-speed cutting and dry cutting, and the problems that the coating performance, deposition conditions and deposition efficiency cannot be balanced.

发明内容Contents of the invention

针对现有技术中的上述技术问题,本发明提供了一种高硬度、高弹性模量的多组元氮化物涂层及其制备方法,所述的这种高硬度、高弹性模量的多组元氮化物涂层及其制备方法要解决现有技术中的涂层存在着硬度、摩擦系数不能满足高速切削和干式切削的性能要求,以及涂层性能、沉积条件以及沉积效率无法兼顾的技术问题。Aiming at the above-mentioned technical problems in the prior art, the present invention provides a multi-component nitride coating with high hardness and high elastic modulus and a preparation method thereof, the multi-component nitride coating with high hardness and high elastic modulus The component nitride coating and its preparation method should solve the problem that the hardness and friction coefficient of the coating in the prior art cannot meet the performance requirements of high-speed cutting and dry cutting, and the coating performance, deposition conditions and deposition efficiency cannot be balanced. technical problem.

本发明提供了一种高硬度、高弹性模量的多组元氮化物涂层,其化学式为AlCrTiZrNbN,Al、Cr、Ti、Zr、Nb和N元素的原子比分别为8~12%:8~12%:8~12%:8~12%:8~12%:48~52%,所述涂层的厚度为2~5μm。The invention provides a multi-component nitride coating with high hardness and high elastic modulus. Its chemical formula is AlCrTiZrNbN, and the atomic ratios of Al, Cr, Ti, Zr, Nb and N elements are 8-12%: 8 ~12%: 8~12%: 8~12%: 8~12%: 48~52%, the thickness of the coating is 2~5 μm.

进一步的,Al、Cr、Ti、Zr、Nb和N元素按原子比计算为10%:10%:10%:10%:10%:50%。Further, Al, Cr, Ti, Zr, Nb and N elements are calculated as 10%: 10%: 10%: 10%: 10%: 50% by atomic ratio.

进一步的,所述的涂层具有面心立方晶体结构。Further, the coating has a face-centered cubic crystal structure.

本发明还提供了上述的一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,包括如下步骤:The present invention also provides a method for preparing the above-mentioned multi-component nitride coating with high hardness and high elastic modulus, comprising the following steps:

1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到3*10-3Pa ~8*10-3Pa后开Ar气,维持真空度在2-4Pa,采用中频的射频对基体进行20~40min的离子轰击,功率为80-100W;1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Into the sample chamber, evacuate to 3*10 -3 Pa ~8*10 -3 Pa, then turn on Ar gas, maintain the vacuum at 2-4Pa, use intermediate frequency radio frequency to bombard the substrate with ions for 20~40min, the power is 80-100W;

1)一个采用多靶磁控溅射仪,由摩尔比为1:1:1:1:1的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:氩气流量:10-50sccm; N2流量:5-30sccm;射频电源功率:150-300W,自转速度:10 r/min,时间:7200s;靶基距:3-7cm;总气压范围0.2-0.8Pa;基片温度范围60-200℃,获得高硬度、高弹性模量的多组元氮化物涂层。1) A step of using a multi-target magnetron sputtering apparatus to perform magnetron sputtering reaction deposition on a substrate with an AlCrTiZrNb alloy target with a molar ratio of 1:1:1:1:1; the cleaned substrate is placed in Multi-target magnetron sputtering instrument and stay before AlCrTiZrNb alloy target material, the condition of above-mentioned magnetron sputtering reaction deposition is: argon gas flow: 10-50sccm; N flow: 5-30sccm ; RF power supply: 150- 300W, rotation speed: 10 r/min, time: 7200s; target base distance: 3-7cm; total air pressure range: 0.2-0.8Pa; substrate temperature range: 60-200°C, to obtain multiple sets of high hardness and high elastic modulus Nitride coating.

进一步的,所述的基体为金属、硬质合金或陶瓷基体。Further, the substrate is a metal, hard alloy or ceramic substrate.

本发明采用射频反应溅射的方式,AlCrTiZrNbN多组元氮化物涂层沉积在金属、硬质合金或陶瓷基体上形成。AlCrTiZrNbN多组元氮化物涂层厚度为2~5μm。AlCrTiZrNbN多组元氮化物涂层是由等原子摩尔比的AlCrTiZrNb合金靶材在(Ar+N2)气氛下制得。所述的AlCrTiZrNbN多组元氮化物涂层具有面心立方晶体结构。AlCrTiZrNb合金靶材在(Ar+N2)气氛下获得具有成分调制结构的纳米复合涂层,通过调整N2和Ar的比例,控制涂层的成分。The invention adopts the way of radio frequency reactive sputtering, and the AlCrTiZrNbN multi-element nitride coating is deposited on the metal, hard alloy or ceramic substrate to form. The thickness of the AlCrTiZrNbN multi-component nitride coating is 2-5 μm. The AlCrTiZrNbN multi-component nitride coating is prepared from an AlCrTiZrNb alloy target with an equiatomic molar ratio under (Ar+N 2 ) atmosphere. The AlCrTiZrNbN multi-component nitride coating has a face-centered cubic crystal structure. The AlCrTiZrNb alloy target is used in (Ar+N 2 ) atmosphere to obtain a nanocomposite coating with a composition modulation structure, and the composition of the coating can be controlled by adjusting the ratio of N 2 and Ar.

本发明和已有技术相比,其技术进步是显著的。本发明提供了一种高硬度、高弹性模量的AlCrTiZrNbN多组元氮化物涂层,克服了现有技术的涂层高硬度、弹性模量不能满足,以及涂层生产效率低、容易对环境造成污染的技术问题。本发明的涂层可在高硬度、高耐磨等场合下服役,可广泛应用于刀具、模具的保护性涂层等。本涂层的制备工艺还具有工艺简单、沉积速度快、成本低、对环境无污染等特点。Compared with the prior art, the technical progress of the present invention is remarkable. The invention provides an AlCrTiZrNbN multi-component nitride coating with high hardness and high elastic modulus, which overcomes the high hardness and unsatisfactory elastic modulus of the coating in the prior art, as well as the low production efficiency of the coating and the easy damage to the environment. Technical problems causing pollution. The coating of the invention can be used in high hardness, high wear resistance and other occasions, and can be widely used in protective coatings of cutting tools and molds. The preparation process of the coating also has the characteristics of simple process, fast deposition speed, low cost, no pollution to the environment and the like.

具体实施方式detailed description

下面通过具体实施例对本发明作进一步的详细说明,但并不限制本发明。The present invention will be described in further detail below through specific examples, but the present invention is not limited.

本发明所用的制备、表征和测量仪器:Preparation, characterization and measuring instruments used in the present invention:

JGP-450型磁控溅射系统,中科院沈阳科学仪器研制中心有限公司JGP-450 Magnetron Sputtering System, Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences

D8 Advance型X射线衍射仪,德国Bruker公司D8 Advance X-ray diffractometer, Bruker, Germany

NANO Indenter G200型纳米压痕仪,美国安捷伦科技公司NANO Indenter G200 nanoindenter, Agilent Technologies, USA

Tecnai G2 20型高分辨透射电子显微镜,美国FEI公司Tecnai G 2 20 high-resolution transmission electron microscope, American FEI company

Quanta FEG450型扫描电子显微镜(附带Oxford能谱仪),美国FEI公司Quanta FEG450 scanning electron microscope (with Oxford energy spectrometer), American FEI company

实施例1Example 1

一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,包括如下步骤:A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到5*10-3Pa后开Ar气,维持真空度在2-4Pa,采用13.56Hz(中频)的射频对基体进行20~40min的离子轰击,功率为80-100W;所述的基体为Cu。1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Into the sample chamber, after vacuuming to 5*10 -3 Pa, turn on Ar gas, maintain the vacuum at 2-4Pa, use 13.56Hz (intermediate frequency) radio frequency to bombard the substrate with ions for 20-40min, and the power is 80-100W ; The matrix is Cu.

2)采用多靶磁控溅射仪,由等原子摩尔比的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:Ar气流量10sccm,N2流量20sccm,射频反应溅射功率300W,时间7200s,基片温度120℃,沉积气压为0.4Pa,得到AlCrTiZrNbN多组元氮化物涂层厚度约2.8μm。2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equal atomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and left Before the AlCrTiZrNb alloy target, the above magnetron sputtering reactive deposition conditions are: Ar gas flow 10sccm, N 2 flow 20sccm, RF reactive sputtering power 300W, time 7200s, substrate temperature 120°C, deposition pressure 0.4Pa , the thickness of the AlCrTiZrNbN multi-component nitride coating is about 2.8 μm.

通过扫描电镜附带的能谱仪(EDS)测量,多组元氮化物涂层中Al、Cr、Ti、Zr、Nb和N元素按原子比计算为10.15%:8.97%:11.04%:9.76%:10.25%:49.83%。获得涂层的硬度为28.7GPa,弹性模量为319GPa。Measured by the energy dispersive spectrometer (EDS) attached to the scanning electron microscope, the Al, Cr, Ti, Zr, Nb and N elements in the multi-component nitride coating are calculated as 10.15% by atomic ratio: 8.97%: 11.04%: 9.76%: 10.25%: 49.83%. The obtained coating has a hardness of 28.7GPa and an elastic modulus of 319GPa.

实施例2Example 2

一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,包括如下步骤:A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到5*10-3Pa后开Ar气,维持真空度在2-4Pa,采用13.56Hz的射频对基体进行20~40min的离子轰击,功率为80-100W;所述的基体为Al。1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Introduce the sample chamber, evacuate to 5*10 -3 Pa, turn on Ar gas, maintain the vacuum at 2-4Pa, use 13.56Hz radio frequency to bombard the substrate with ions for 20-40min, and the power is 80-100W; The matrix is Al.

2)采用多靶磁控溅射仪,由等原子摩尔比的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:Ar气流量15sccm,N2流量20sccm,射频反应溅射功率300W,时间7200s,基片温度80℃,沉积气压为0.8Pa,得到AlCrTiZrNbN多组元氮化物涂层厚度约3.1μm。2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equal atomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and left Before the AlCrTiZrNb alloy target, the above magnetron sputtering reactive deposition conditions are: Ar gas flow 15 sccm, N 2 flow 20 sccm, radio frequency reactive sputtering power 300W, time 7200s, substrate temperature 80 ℃, deposition pressure 0.8Pa , the thickness of AlCrTiZrNbN multi-component nitride coating is about 3.1 μm.

通过扫描电镜附带的能谱仪(EDS)测量,多组元氮化物涂层中Al、Cr、Ti、Zr、Nb和N元素按原子比计算为9.40%:9.52%:9.72%:11.04%:8.98%:51.34%。获得涂层的硬度为30.6GPa,弹性模量为336GPa。Measured by the energy dispersive spectrometer (EDS) attached to the scanning electron microscope, the Al, Cr, Ti, Zr, Nb and N elements in the multi-component nitride coating are calculated as 9.40% by atomic ratio: 9.52%: 9.72%: 11.04%: 8.98%: 51.34%. The obtained coating has a hardness of 30.6GPa and an elastic modulus of 336GPa.

实施例3Example 3

一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,包括如下步骤:A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到5*10-3Pa后开Ar气,维持真空度在2-4Pa,采用13.56Hz的射频对基体进行20~40min的离子轰击,功率为80-100W;所述的基体为陶瓷基体。1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Introduce the sample chamber, evacuate to 5*10 -3 Pa, turn on Ar gas, maintain the vacuum at 2-4Pa, use 13.56Hz radio frequency to bombard the substrate with ions for 20-40min, and the power is 80-100W; The substrate is a ceramic substrate.

2)采用多靶磁控溅射仪,由等原子摩尔比的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:Ar气流量15sccm,N2流量15sccm,射频反应溅射功率300W,时间7200s,基片温度160℃,沉积气压为0.4Pa,得到AlCrTiZrNbN多组元氮化物涂层厚度约3.8μm。2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equiatomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and stops Before the AlCrTiZrNb alloy target, the above magnetron sputtering reactive deposition conditions are: Ar gas flow 15 sccm, N 2 flow 15 sccm, radio frequency reactive sputtering power 300W, time 7200s, substrate temperature 160 ℃, deposition pressure 0.4Pa , the thickness of the AlCrTiZrNbN multi-component nitride coating is about 3.8 μm.

通过扫描电镜附带的能谱仪(EDS)测量,多组元氮化物涂层中Al、Cr、Ti、Zr、Nb和N元素按原子比计算为9.76%:10.52%:9.05%:10.21%:11.79%:48.67%。获得涂层的硬度为32.3GPa,弹性模量为358GPa。Measured by the energy dispersive spectrometer (EDS) attached to the scanning electron microscope, the Al, Cr, Ti, Zr, Nb and N elements in the multi-component nitride coating are calculated as 9.76% by atomic ratio: 10.52%: 9.05%: 10.21%: 11.79%: 48.67%. The obtained coating has a hardness of 32.3GPa and an elastic modulus of 358GPa.

实施例4Example 4

一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,包括如下步骤:A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到5*10-3Pa后开Ar气,维持真空度在2-4Pa,采用13.56Hz的射频对基体进行20~40min的离子轰击,功率为80-100W;所述的基体为硬质合金。1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Introduce the sample chamber, evacuate to 5*10 -3 Pa, turn on Ar gas, maintain the vacuum at 2-4Pa, use 13.56Hz radio frequency to bombard the substrate with ions for 20-40min, and the power is 80-100W; The substrate is cemented carbide.

2)采用多靶磁控溅射仪,由等原子摩尔比的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:Ar气流量15sccm,N2流量12sccm,射频反应溅射功率300W,时间7200s,基片温度200℃,沉积气压为0.2Pa,得到AlCrTiZrNbN多组元氮化物涂层厚度约4.4μm。2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equal atomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and left Before the AlCrTiZrNb alloy target, the above magnetron sputtering reactive deposition conditions are: Ar gas flow 15 sccm, N 2 flow 12 sccm, radio frequency reactive sputtering power 300W, time 7200s, substrate temperature 200 ℃, deposition pressure 0.2Pa , the thickness of the AlCrTiZrNbN multi-component nitride coating is about 4.4 μm.

通过扫描电镜附带的能谱仪(EDS)测量,多组元氮化物涂层中Al、Cr、Ti、Zr、Nb和N元素按原子比计算为10.55%:10.20%:8.96%:10.34%:9.08%:50.87%。获得涂层的硬度为35.9GPa,弹性模量为384GPa。Measured by the energy dispersive spectrometer (EDS) attached to the scanning electron microscope, the Al, Cr, Ti, Zr, Nb and N elements in the multi-component nitride coating are calculated as 10.55% by atomic ratio: 10.20%: 8.96%: 10.34%: 9.08%: 50.87%. The obtained coating has a hardness of 35.9GPa and an elastic modulus of 384GPa.

实施例5Example 5

一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,包括如下步骤:A method for preparing a multi-component nitride coating with high hardness and high elastic modulus, comprising the steps of:

1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到5*10-3Pa后开Ar气,维持真空度在2-4Pa,采用13.56Hz的射频对基体进行20~40min的离子轰击,功率为80-100W;所述的基体为陶瓷基体。1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning, during which the substrate is packed Introduce the sample chamber, evacuate to 5*10 -3 Pa, turn on Ar gas, maintain the vacuum at 2-4Pa, use 13.56Hz radio frequency to bombard the substrate with ions for 20-40min, and the power is 80-100W; The substrate is a ceramic substrate.

2)采用多靶磁控溅射仪,由等原子摩尔比的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:Ar气流量18sccm,N2流量12sccm,射频反应溅射功率300W,时间7200s,基片温度180℃,沉积气压为0.6Pa,得到AlCrTiZrNbN多组元氮化物涂层厚度约3.2μm。2) Using a multi-target magnetron sputtering apparatus, the step of magnetron sputtering reaction deposition is carried out on the substrate by an AlCrTiZrNb alloy target with an equal atomic molar ratio; the cleaned substrate is placed in a multi-target magnetron sputtering apparatus and left Before the AlCrTiZrNb alloy target, the above magnetron sputtering reactive deposition conditions are: Ar gas flow rate 18sccm, N2 flow rate 12sccm, RF reactive sputtering power 300W, time 7200s, substrate temperature 180°C, deposition pressure 0.6Pa , the thickness of the AlCrTiZrNbN multi-component nitride coating is about 3.2 μm.

通过扫描电镜附带的能谱仪(EDS)测量,多组元氮化物涂层中Al、Cr、Ti、Zr、Nb和N元素按原子比计算为10.44%:9.77%:10.18%:9.42%:11.30%:48.89%。获得涂层的硬度为34.6GPa,弹性模量为370GPa。Measured by the energy dispersive spectrometer (EDS) attached to the scanning electron microscope, the Al, Cr, Ti, Zr, Nb and N elements in the multi-component nitride coating are calculated as 10.44% by atomic ratio: 9.77%: 10.18%: 9.42%: 11.30%: 48.89%. The obtained coating has a hardness of 34.6GPa and an elastic modulus of 370GPa.

Claims (5)

1.一种高硬度、高弹性模量的多组元氮化物涂层,其特征在于:其化学式为AlCrTiZrNbN,Al、Cr、Ti、Zr、Nb和N元素的原子比分别为8~12%:8~12%:8~12%:8~12%:8~12%:48~52%,所述涂层的厚度为2~5μm。1. A multi-component nitride coating with high hardness and high elastic modulus, characterized in that: its chemical formula is AlCrTiZrNbN, and the atomic ratios of Al, Cr, Ti, Zr, Nb and N elements are 8 to 12% respectively : 8~12%: 8~12%: 8~12%: 8~12%: 48~52%, the thickness of the coating is 2~5 μm. 2.根据权利要求1所述的一种高硬度、高弹性模量的多组元氮化物涂层,其特征在于:其中,Al、Cr、Ti、Zr、Nb和N元素按原子比计算为10%:10%:10%:10%:10%:50%。2. a kind of high hardness, high elastic modulus multi-component nitride coating according to claim 1, is characterized in that: wherein, Al, Cr, Ti, Zr, Nb and N element are calculated as 10%: 10%: 10%: 10%: 10%: 50%. 3.根据权利要求1所述的一种高硬度、高弹性模量的多组元氮化物涂层,其特征在于所述的涂层具有面心立方晶体结构。3. A multi-component nitride coating with high hardness and high elastic modulus according to claim 1, characterized in that said coating has a face-centered cubic crystal structure. 4.权利要求1所述的一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,其特征在于包括如下步骤:4. the preparation method of a kind of high hardness, high elastic modulus multi-component nitride coating described in claim 1, is characterized in that comprising the steps: 1)一个对基体进行清洗的步骤,将经打磨镜面抛光处理后的基体在酒精和丙酮中利用15~30kHz超声波清洗10~15min;然后进行离子清洗,在进行离子清洗的过程中,将基体装进进样室,抽真空到3*10-3Pa ~8*10-3Pa后开Ar气,维持真空度在2-4Pa,采用中频的射频对基体进行20~40min的离子轰击,功率为80-100W;1) A step of cleaning the substrate, cleaning the polished and mirror-polished substrate with 15-30kHz ultrasonic waves in alcohol and acetone for 10-15 minutes; then performing ion cleaning. During the ion cleaning process, the substrate is packed Into the sample chamber, evacuate to 3*10 -3 Pa ~8*10 -3 Pa, then turn on Ar gas, maintain the vacuum at 2-4Pa, use intermediate frequency radio frequency to bombard the substrate with ions for 20~40min, the power is 80-100W; 2)一个采用多靶磁控溅射仪,由摩尔比为1:1:1:1:1的AlCrTiZrNb合金靶材在基体上进行磁控溅射反应沉积的步骤;将清洗后的基体置入多靶磁控溅射仪并停留在AlCrTiZrNb合金靶材之前,上述的磁控溅射反应沉积的条件为:氩气流量:10-50sccm; N2流量:5-30sccm;射频电源功率:150-300W,自转速度:10 r/min,时间:7200s;靶基距:3-7cm;总气压范围0.2-0.8Pa;基片温度范围60-200℃,获得高硬度、高弹性模量的多组元氮化物涂层。2) A step of using a multi-target magnetron sputtering apparatus to perform magnetron sputtering reaction deposition on the substrate with an AlCrTiZrNb alloy target with a molar ratio of 1:1:1:1:1; the cleaned substrate is placed in Multi-target magnetron sputtering instrument and stay before AlCrTiZrNb alloy target material, the condition of above-mentioned magnetron sputtering reaction deposition is: argon gas flow: 10-50sccm; N flow: 5-30sccm ; RF power supply: 150- 300W, rotation speed: 10 r/min, time: 7200s; target base distance: 3-7cm; total air pressure range: 0.2-0.8Pa; substrate temperature range: 60-200°C, to obtain multiple sets of high hardness and high elastic modulus Nitride coating. 5.根据权利要求4所述的一种高硬度、高弹性模量的多组元氮化物涂层的制备方法,其特征在于:所述的基体为金属、硬质合金或陶瓷基体。5 . The method for preparing a high-hardness, high-elastic-modulus multi-component nitride coating according to claim 4 , wherein the substrate is a metal, hard alloy or ceramic substrate. 5 .
CN201611153024.6A 2016-12-14 2016-12-14 A kind of high rigidity, multicomponent nitride coatings of high elastic modulus and preparation method thereof Pending CN106835037A (en)

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