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CN106785254B - Molybdenum disulfide thin film strip structure tunable terahertz wave filter - Google Patents

Molybdenum disulfide thin film strip structure tunable terahertz wave filter Download PDF

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Publication number
CN106785254B
CN106785254B CN201611206659.8A CN201611206659A CN106785254B CN 106785254 B CN106785254 B CN 106785254B CN 201611206659 A CN201611206659 A CN 201611206659A CN 106785254 B CN106785254 B CN 106785254B
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molybdenum disulfide
circular slot
film
rounded groove
disulfide film
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CN106785254A (en
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章乐
李九生
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China Jiliang University
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China Jiliang University
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P1/00Auxiliary devices
    • H01P1/20Frequency-selective devices, e.g. filters

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  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
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Abstract

The invention discloses a kind of adjustable THz wave filters of molybdenum disulfide film ribbon structure.It includes basal layer, silicon dioxide layer, right end rectangle molybdenum disulfide film, strip molybdenum disulfide film, left end rectangle molybdenum disulfide film, first rounded groove, second rounded groove, third rounded groove, 4th rounded groove, 5th semicircle fluting, 6th semicircle fluting, 7th rounded groove, 8th rounded groove, 9th rounded groove, tenth rounded groove, signal input part, signal output end, by adjusting the bias direct current voltage being applied between molybdenum disulfide film layer and basal layer, adjust the effective dielectric constant of molybdenum disulfide film, realize the adjustable filter function of terahertz signal.The advantages that present invention has structure simple, and size is small, and response is fast, and control method is flexibly easily realized.

Description

Molybdenum disulfide film ribbon structure is adjustable THz wave filter
Technical field
The present invention relates to THz wave filter more particularly to a kind of adjustable THz waves of molybdenum disulfide film ribbon structure Filter.
Background technique
Terahertz (THz) wave refers to electromagnetic wave of the frequency between 0.1~10THz (30~3mm of wavelength), is located at electromagnetism Between microwave and visible light wave in wave spectrum.Past, people were to this wave since the generation and detection of THz wave are more difficult The characteristic of section is known little about it.In recent years, as gradually maturation, the Terahertz Technology of THz source and Detection Techniques achieve quickly Development, show huge application value in fields such as communication, imaging, medicine, biology, chemistry.It is as Terahertz application Important component in system, the function elements such as Terahertz modulator, isolator, Polarization Controller, sensor are essential.If Meter processability is excellent, and Terahertz function element easy to use is a big hot spot of current Terahertz research field.
If Terahertz is used for communication aspects, we can get very high transmission rate, especially lead in satellite communication Domain.This allows for Terahertz communication being capable of the high secrecy satellite communication of very wide bandwidth progress.Although due to efficient Terahertz The shortage of emission source be commercialized it can't in the communications field must, but the realization of novel emitter and emission source will Break this limitation.Terahertz filter is one of the critical function component of Terahertz communication and imaging system, Terahertz filtering Deeply grinding for device ingeniously has far reaching significance to the application of Terahertz Science and Technology.The continuous depth studied with terahertz filter Enter, the specific implementation structure of the terahertz filter based on molybdenum disulfide film proposed successively in recent years largely promotees Into the research of the filter applied to terahertz wave band.
Summary of the invention
The present invention provides the molybdenum disulfide film that a kind of structure is simple, filtering performance is high to overcome the shortage of prior art Ribbon structure is adjustable THz wave filter.
In order to achieve the above object, technical scheme is as follows:
Molybdenum disulfide film ribbon structure is adjustable, and THz wave filter includes basal layer, silicon dioxide layer, right end rectangle Molybdenum disulfide film, strip molybdenum disulfide film, left end rectangle molybdenum disulfide film, the first rounded groove, the second rounded groove, Third rounded groove, the 4th rounded groove, the 5th semicircle fluting, the 6th semicircle fluting, the 7th rounded groove, the 8th circle Fluting, the 9th rounded groove, the tenth rounded groove, signal input part, signal output end;The upper layer of basal layer is silica Layer, the upper layer of silicon dioxide layer is covered with right end rectangle molybdenum disulfide film, strip molybdenum disulfide film, left end rectangle molybdenum disulfide Film, bar shaped molybdenum disulfide film are equipped with the first rounded groove, the second rounded groove, third rounded groove, the 4th circle and open Slot, the 5th semicircle fluting, the 6th semicircle fluting, the 7th rounded groove, the 8th rounded groove, the 9th rounded groove, the tenth Rounded groove, the first rounded groove, the second rounded groove, third rounded groove, the 4th rounded groove, the 5th semicircle fluting, 6th semicircle fluting, the 7th rounded groove, the 8th rounded groove, the 9th rounded groove, the tenth rounded groove are in two sulphur of bar shaped Change sequence arrangement from left to right, the left end of right end rectangle molybdenum disulfide film and the right side of bar shaped molybdenum disulfide film in the middle part of molybdenum film End is connected, and the left end of bar shaped molybdenum disulfide film is connected with the right end of left end rectangle molybdenum disulfide film, right end rectangle curing The right end of molybdenum film is connected with the right end of silicon dioxide layer, the left end of left end rectangle molybdenum disulfide film and a left side for silicon dioxide layer End is connected, and the left end of left end rectangle molybdenum disulfide film is equipped with signal input part, and the right end of right end rectangle molybdenum disulfide film is set There is signal output end;Terahertz signal is inputted from signal input part, is exported from signal output end.Molybdenum disulfide film layer and substrate The two poles of the earth of bias direct current voltage source are separately connected, the voltage for adjusting applied bias DC voltage source can change molybdenum disulfide film Effective dielectric constant realizes tunable filter effect so as to control the transmission of THz wave.
The material of the basal layer is P-type silicon material, and length is 28~30 μm, and width is 10~12 μm, with a thickness of 2~ 4μm.The length of the silicon dioxide layer is 28~30 μm, and width is 10~12 μm, with a thickness of 2~4 μm.The right end square Shape molybdenum disulfide film is identical with the shape size of left end rectangle molybdenum disulfide film, and length is 8~10 μm, and width is 3~5 μm.The length of the bar shaped molybdenum disulfide film is 22~28 μm, and width is 4~6 μm.First rounded groove and the The size of ten rounded grooves is identical, and radius is 3~4 μm.The size phase of second rounded groove and the 9th rounded groove Together, radius is 2.5~3.5 μm.The third rounded groove is identical as the size of the 8th rounded groove, and radius is 2~3 μm.4th rounded groove is identical as the size of the 7th rounded groove, and radius is 1.5~2.5 μm.Described the 5th half Rounded groove is identical as the size of the 6th semicircle fluting, and radius is 1~2 μm.
Detailed description of the invention:
Fig. 1 is the adjustable THz wave filter three dimensional structure diagram of molybdenum disulfide film ribbon structure;
Fig. 2 is the adjustable THz wave filter top view of molybdenum disulfide film ribbon structure;
Fig. 3 is the signal output end power output figure of the adjustable THz wave filter of molybdenum disulfide film ribbon structure.
Specific embodiment
As shown in Figures 1 to 3, the adjustable THz wave filter of molybdenum disulfide film ribbon structure includes basal layer 1, titanium dioxide Silicon layer 2, right end rectangle molybdenum disulfide film 3, strip molybdenum disulfide film 4, left end rectangle molybdenum disulfide film 5, first are round The 6, second rounded groove 7 of fluting, third rounded groove 8, the 10, the 6th semicircle of semicircle fluting of the 4th rounded groove the 9, the 5th are opened Slot 11, the 7th rounded groove 12, the 8th rounded groove 13, the 9th rounded groove 14, the tenth rounded groove 15, signal input part 16, signal output end 17;The upper layer of basal layer 1 is silicon dioxide layer 2, and the upper layer of silicon dioxide layer 2 is covered with two sulphur of right end rectangle Change molybdenum film 3, strip molybdenum disulfide film 4, left end rectangle molybdenum disulfide film 5, bar shaped molybdenum disulfide film 4 is equipped with first Rounded groove 6, the second rounded groove 7, third rounded groove 8, the 10, the 6th semicircle of semicircle fluting of the 4th rounded groove the 9, the 5th Shape fluting the 11, the 7th rounded groove 12, the 8th rounded groove 13, the 9th rounded groove 14, the tenth rounded groove 15, first is round The 6, second rounded groove 7 of fluting, third rounded groove 8, the 10, the 6th semicircle of semicircle fluting of the 4th rounded groove the 9, the 5th are opened Slot 11, the 7th rounded groove 12, the 8th rounded groove 13, the 9th rounded groove 14, the tenth rounded groove 15 are in bar shaped curing Sequence arranges from left to right at molybdenum film 4 middle part, left end and the bar shaped molybdenum disulfide film 4 of right end rectangle molybdenum disulfide film 3 Right end is connected, and the left end of bar shaped molybdenum disulfide film 4 is connected with the right end of left end rectangle molybdenum disulfide film 5, right end rectangle two The right end of vulcanization molybdenum film 3 is connected with the right end of silicon dioxide layer 2, the left end of left end rectangle molybdenum disulfide film 5 and titanium dioxide The left end of silicon layer 2 is connected, and the left end of left end rectangle molybdenum disulfide film 5 is equipped with signal input part 16, right end rectangle molybdenum disulfide The right end of film 3 is equipped with signal output end 17, and terahertz signal is inputted from signal input part 16, exports from signal output end 17, It is equipped with one bias direct current voltage source between molybdenum disulfide film layer and substrate, adjusts the voltage of applied bias DC voltage source The effective dielectric constant of molybdenum disulfide film can be changed, so as to control the transmission of THz wave, realize tunable filter effect Fruit.
The material of the basal layer 1 is P-type silicon material, and length is 28~30 μm, and width is 10~12 μm, with a thickness of 2 ~4 μm.The length of the silicon dioxide layer 2 is 28~30 μm, and width is 10~12 μm, with a thickness of 2~4 μm.The right side End moment shape molybdenum disulfide film 3 is identical with the shape size of left end rectangle molybdenum disulfide film 5, and length is 8~10 μm, width It is 3~5 μm.The length of the bar shaped molybdenum disulfide film 4 is 22~28 μm, and width is 4~6 μm.Described first is round Fluting 6 is identical as the size of the tenth rounded groove 15, and radius is 3~4 μm.Second rounded groove 7 and the 9th is round The size of fluting 14 is identical, and radius is 2.5~3.5 μm.The size of the third rounded groove 8 and the 8th rounded groove 13 Identical, radius is 2~3 μm.4th rounded groove 9 is identical as the size of the 7th rounded groove 12, and radius is 1.5 ~2.5 μm.The semicircle fluting 10 of described the 5th is identical as the size of the 6th semicircle fluting 11, and radius is 1~2 μm.
Embodiment 1
Molybdenum disulfide film ribbon structure is adjustable THz wave filter:
As shown in Fig. 1~2, molybdenum disulfide film ribbon structure is adjustable, and THz wave filter includes basal layer 1, titanium dioxide Silicon layer 2, right end rectangle molybdenum disulfide film 3, strip molybdenum disulfide film 4, left end rectangle molybdenum disulfide film 5, first are round The 6, second rounded groove 7 of fluting, third rounded groove 8, the 10, the 6th semicircle of semicircle fluting of the 4th rounded groove the 9, the 5th are opened Slot 11, the 7th rounded groove 12, the 8th rounded groove 13, the 9th rounded groove 14, the tenth rounded groove 15, signal input part 16, signal output end 17;The upper layer of basal layer 1 is silicon dioxide layer 2, and the upper layer of silicon dioxide layer 2 is covered with two sulphur of right end rectangle Change molybdenum film 3, strip molybdenum disulfide film 4, left end rectangle molybdenum disulfide film 5, bar shaped molybdenum disulfide film 4 is equipped with first Rounded groove 6, the second rounded groove 7, third rounded groove 8, the 10, the 6th semicircle of semicircle fluting of the 4th rounded groove the 9, the 5th Shape fluting the 11, the 7th rounded groove 12, the 8th rounded groove 13, the 9th rounded groove 14, the tenth rounded groove 15, first is round The 6, second rounded groove 7 of fluting, third rounded groove 8, the 10, the 6th semicircle of semicircle fluting of the 4th rounded groove the 9, the 5th are opened Slot 11, the 7th rounded groove 12, the 8th rounded groove 13, the 9th rounded groove 14, the tenth rounded groove 15 are in bar shaped curing Sequence arranges from left to right at molybdenum film 4 middle part, left end and the bar shaped molybdenum disulfide film 4 of right end rectangle molybdenum disulfide film 3 Right end is connected, and the left end of bar shaped molybdenum disulfide film 4 is connected with the right end of left end rectangle molybdenum disulfide film 5, right end rectangle two The right end of vulcanization molybdenum film 3 is connected with the right end of silicon dioxide layer 2, the left end of left end rectangle molybdenum disulfide film 5 and titanium dioxide The left end of silicon layer 2 is connected, and the left end of left end rectangle molybdenum disulfide film 5 is equipped with signal input part 16, right end rectangle molybdenum disulfide The right end of film 3 is equipped with signal output end 17;Terahertz signal is inputted from signal input part 16, is exported from signal output end 17, It is equipped with one bias direct current voltage source between molybdenum disulfide film layer and basal layer 1, adjusts applied bias DC voltage source Voltage can change the effective dielectric constant of molybdenum disulfide film, so as to control the transmission of THz wave, realize adjustable filtering Device effect.
The material of basal layer is P-type silicon material, and length is 28 μm, and width is 10 μm, with a thickness of 2 μm.Silicon dioxide layer Length is 28 μm, and width is 10 μm, with a thickness of 2 μm.Right end rectangle molybdenum disulfide film and left end rectangle molybdenum disulfide film Shape size is identical, and length is 8 μm, and width is 3 μm.The length of bar shaped molybdenum disulfide film is 22 μm, and maximum width is 4 μ M is tightened with two sides left end rectangle molybdenum disulfide film and right end rectangle molybdenum disulfide film junction in gradual change.First is round It slots identical as the size of the tenth rounded groove, radius is 3 μm.The size phase of second rounded groove and the 9th rounded groove Together, radius is 2.5 μm.Third rounded groove is identical as the size of the 8th rounded groove, and radius is 2 μm.4th circle is opened Slot is identical as the size of the 7th rounded groove, and radius is 1.5 μm.The size of 5th semicircle fluting and the 6th semicircle fluting Identical, radius is 1 μm.The performance indexes of molybdenum disulfide film ribbon structure is adjustable THz wave filter uses COMSOL Multiphysics software is tested, by adjust bias voltage, obtain it is as shown in Figure 3 for molybdenum disulfide it is thin THz wave filter signal output end power output figure that film ribbon structure is adjustable, as seen from the figure, when applied voltage be 0.2eV, When input THz wave is f=1.95THz, output power 90.5%;When applied voltage is 0.4eV, input THz wave is f When=2.01THz, output power 91.8%;It is defeated when applied voltage is 0.6eV, and input THz wave is f=2.13THz Power is 92.5% out.

Claims (10)

1.一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于包括基底层(1)、二氧化硅层(2)、右端矩形二硫化钼薄膜(3)、条状二硫化钼薄膜(4)、左端矩形二硫化钼薄膜(5)、第一圆形开槽(6)、第二圆形开槽(7)、第三圆形开槽(8)、第四圆形开槽(9)、第五半圆形开槽(10)、第六半圆形开槽(11)、第七圆形开槽(12)、第八圆形开槽(13)、第九圆形开槽(14)、第十圆形开槽(15)、信号输入端(16)、信号输出端(17);基底层(1)的上层为二氧化硅层(2),二氧化硅层(2)的上层铺有右端矩形二硫化钼薄膜(3)、条状二硫化钼薄膜(4)、左端矩形二硫化钼薄膜(5),条形二硫化钼薄膜(4)上设有第一圆形开槽(6)、第二圆形开槽(7)、第三圆形开槽(8)、第四圆形开槽(9)、第五半圆形开槽(10)、第六半圆形开槽(11)、第七圆形开槽(12)、第八圆形开槽(13)、第九圆形开槽(14)、第十圆形开槽(15),第一圆形开槽(6)、第二圆形开槽(7)、第三圆形开槽(8)、第四圆形开槽(9)、第五半圆形开槽(10)、第六半圆形开槽(11)、第七圆形开槽(12)、第八圆形开槽(13)、第九圆形开槽(14)、第十圆形开槽(15)在条形二硫化钼薄膜(4)中部自左向右顺序排列,右端矩形二硫化钼薄膜(3)的左端与条形二硫化钼薄膜(4)的右端相连,条形二硫化钼薄膜(4)的左端与左端矩形二硫化钼薄膜(5)的右端相连,右端矩形二硫化钼薄膜(3)的右端与二氧化硅层(2)的右端相连,左端矩形二硫化钼薄膜(5)的左端与二氧化硅层(2)的左端相连,左端矩形二硫化钼薄膜(5)的左端设有信号输入端(16),右端矩形二硫化钼薄膜(3)的右端设有信号输出端(17),太赫兹信号从信号输入端(16)输入,从信号输出端(17)输出;二硫化钼薄膜层与基底分别连接偏置直流电压源的两极,调节外加偏置直流电压源的电压会改变二硫化钼薄膜的有效介电常数。1. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter is characterized in that it comprises a base layer (1), a silicon dioxide layer (2), a rectangular molybdenum disulfide thin film (3) at the right end, a strip-shaped two Molybdenum sulfide film (4), left-end rectangular molybdenum disulfide film (5), first circular slot (6), second circular slot (7), third circular slot (8), fourth circular slot Shape slotting (9), fifth semicircular slotting (10), sixth semicircular slotting (11), seventh circular slotting (12), eighth circular slotting (13), The nine circular slot (14), the tenth circular slot (15), the signal input end (16), the signal output end (17); the upper layer of the base layer (1) is a silicon dioxide layer (2), two The upper layer of the silicon oxide layer (2) is covered with a rectangular molybdenum disulfide film (3) at the right end, a strip-shaped molybdenum disulfide film (4), a rectangular molybdenum disulfide film (5) at the left end, and a strip-shaped molybdenum disulfide film (4). There are a first circular slot (6), a second circular slot (7), a third circular slot (8), a fourth circular slot (9), and a fifth semicircular slot ( 10), the sixth semicircular slot (11), the seventh circular slot (12), the eighth circular slot (13), the ninth circular slot (14), the tenth circular slot (15), the first circular slot (6), the second circular slot (7), the third circular slot (8), the fourth circular slot (9), the fifth semicircular slot Slot (10), sixth semicircular slot (11), seventh circular slot (12), eighth circular slot (13), ninth circular slot (14), tenth circular slot The grooves (15) are arranged sequentially from left to right in the middle of the strip-shaped molybdenum disulfide film (4), and the left end of the rectangular molybdenum disulfide film (3) at the right end is connected to the right end of the strip-shaped molybdenum disulfide film (4). The left end of the molybdenum disulfide film (4) is connected to the right end of the left rectangular molybdenum disulfide film (5). The right end of the right rectangular molybdenum disulfide film (3) is connected to the right end of the silicon dioxide layer (2). The left end of the molybdenum film (5) is connected with the left end of the silicon dioxide layer (2), the left end of the left end rectangular molybdenum disulfide film (5) is provided with a signal input end (16), and the right end of the right end rectangular molybdenum disulfide film (3) is provided with a signal input end (16). A signal output terminal (17) is provided, and the terahertz signal is input from the signal input terminal (16) and output from the signal output terminal (17). The voltage applied to the DC voltage source changes the effective dielectric constant of the molybdenum disulfide film. 2.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的基底层(1)的材料为P型硅材料,长度为28~30μm,宽度为10~12μm,厚度为2~4μm。2. A molybdenum disulfide thin film strip structure tunable terahertz wave filter according to claim 1, characterized in that the material of the base layer (1) is P-type silicon material, and the length is 28-30 μm , the width is 10~12μm, and the thickness is 2~4μm. 3.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的二氧化硅层(2)的长度为28~30μm,宽度为10~12μm,厚度为2~4μm。3. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the length of the silicon dioxide layer (2) is 28~30 μm, and the width is 10~ 12μm, the thickness is 2~4μm. 4.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的右端矩形二硫化钼薄膜(3)和左端矩形二硫化钼薄膜(5)的形状大小相同,长度均为8~10μm,宽度为3~5μm。4. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the right end rectangular molybdenum disulfide thin film (3) and the left rectangular molybdenum disulfide thin film (5) ) have the same shape and size, with a length of 8-10 μm and a width of 3-5 μm. 5.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的条形二硫化钼薄膜(4)的长度为22~28μm,宽度为4~6μm。5. The adjustable terahertz wave filter according to claim 1, characterized in that the strip-shaped molybdenum disulfide film (4) has a length of 22-28 μm and a width of 22-28 μm. 4~6μm. 6.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的第一圆形开槽(6)与第十圆形开槽(15)的尺寸相同,半径均为3~4μm。6. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the first circular slot (6) and the tenth circular slot (15) ) are the same size, and the radius is 3~4 μm. 7.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的第二圆形开槽(7)与第九圆形开槽(14)的尺寸相同,半径均为2.5~3.5μm。7. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the second circular slot (7) and the ninth circular slot (14) ) are the same size, and the radius is 2.5~3.5 μm. 8.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的第三圆形开槽(8)与第八圆形开槽(13)的尺寸相同,半径均为2~3μm。8. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the third circular slot (8) and the eighth circular slot (13 ) are of the same size, with a radius of 2–3 μm. 9.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的第四圆形开槽(9)与第七圆形开槽(12)的尺寸相同,半径均为1.5~2.5μm。9. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the fourth circular slot (9) and the seventh circular slot (12 ) are the same size, and the radius is 1.5~2.5 μm. 10.根据权利要求1所述的一种二硫化钼薄膜条带结构可调太赫兹波滤波器,其特征在于所述的第五半圆形开槽(10)与第六半圆形开槽(11)的尺寸相同,半径均为1~2μm。10. A molybdenum disulfide thin film strip structure adjustable terahertz wave filter according to claim 1, characterized in that the fifth semicircular slot (10) and the sixth semicircular slot The dimensions of (11) are the same, and the radius is 1~2 μm.
CN201611206659.8A 2016-12-23 2016-12-23 Molybdenum disulfide thin film strip structure tunable terahertz wave filter Expired - Fee Related CN106785254B (en)

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