CN106564888A - Method of preparing graphene nanoplate size through nanometer-distribution collision stripping and graphene nanoplate size - Google Patents
Method of preparing graphene nanoplate size through nanometer-distribution collision stripping and graphene nanoplate size Download PDFInfo
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- 238000000034 method Methods 0.000 title claims abstract description 54
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Abstract
The invention discloses a method of preparing graphene nanoplate size through nanometer-distribution collision stripping and the graphene nanoplate size. According to the method of preparing the graphene nanoplate size through nanometer-distribution collision stripping, the graphene nanoplate size is prepared through stripping by means of shear force generated by nanometer-distribution collision; a graphite raw material is dispersed into size, the size is distributed through the nanometer distribution technology, the distributed size collides with stop sheets arranged in a channel in a staggered manner, and so that shear is formed; the size which is not blocked by the first stop sheet can be stopped by other stop sheets, so that fine particles are generated, after the size is stopped and cut layer by layer, the graphene size is shorn layer by layer, and therefore the evenly dispersed graphene size is obtained. The graphene obtained through the method is uniform in particle size, safe, free of pollution, and mass continuous production can be achieved.
Description
Technical field
The present invention relates to a kind of stripping graphene microchip of the preparation with preferable particle diameter distribution that clash that shunted by nanometer is starched
The method of material.
Background technology
Single-layer graphene is that have to stablize the hexagonal crystal of chemical constitution, in complete Graphene mono-crystalline structures it is main with
sp2Based on hybrid orbital, therefore with good electric conductivity.In addition, it also shows good mechanical property, calorifics
Performance and optical property.Graphene is to have now been found that most thin while being also most hard nano material, with good mechanics and
Mechanical performance, is widely used in many fields, such as adds a small amount of Graphene to be greatly improved making for bearing in lubricating oil
Use the life-span.The Graphene of monolayer has preferable light transmission, and can be used for solar energy energy field has larger application space.With big
Continuous excavation of the family to Graphene performance, Graphene also will be more and more extensive in the application of industry-by-industry.
Because Graphene can be applicable in various fields, the irreplaceable effect of other materials is played, thus it is how big
Scale preparation structure is stable, the Graphene of excellent performance is the difficult problem for facing now.Preparing the method for Graphene at present mainly has
Physical method and chemical method, wherein physical method are the first-selections of large-scale production Graphene.Because being prepared using physical method
Chemical reaction is not related to during Graphene, product has relatively stable chemical constitution, can to greatest extent ensure graphite
The properties of alkene.But control cannot be thought in mechanical stripping process, the collision between granule is random, therefore obtained product
Quality is unstable, and distribution of particles is uneven；And organic solvent can be introduced during some mechanical strippings, such as liquid phase machinery is shelled
From method, this causes the solvent residues in Graphene to be not easy to remove, and causes contamination of products.The physical method for adopting at present is main
Including：Gas phase mechanical stripping method, the big class of liquid phase mechanical stripping method two.Chemical method prepares Graphene and can guarantee that graphene product matter
The stability of amount, but preparation process equipment requirements are high, high cost and should not produce in a large number, are prepared using chemical method in addition
Graphene is susceptible to oxidation, causes Graphene chemical constitution to change, and affects its physical and chemical performance.The change for adopting at present
Method mainly includes：Organic synthesis method, chemical vapour deposition technique, oxidation-reduction method etc..
Chinese patent patent application number 201310757079.8 discloses a kind of method for preparing Graphene, and the invention is first
Expanded graphite is formed by carrying out pretreatment to graphite, then prefabricated expanded graphite is carried out with the method for High-speed gas impacting
Mechanical stripping and grinding, to obtain graphene film.The method process is without chemical contamination, and efficiency is higher, but due to collision process not
Uniformly cause the quality and size of product unstable.
Chinese patent patent application number 201410783942.1 discloses a kind of method for preparing Graphene, and the invention is logical
Cross and prepared by Graphene to the method that metallic catalyst/carbon source mixture is thermally decomposed.The method can prepare uniform particle sizes'
Graphene, and repeatability is preferably, but the process energy consumption is larger, and unsuitable large area is generated.
Chinese patent patent application number 201510437868.2 discloses a kind of method for preparing Graphene water paste, should
Invention has been obtained the preferable Graphene slurry of dispersibility by the graphite that the ultrasound in water entered intercalation processing.The method adopts one
Footwork is prepared for Graphene slurry, simplifies and first prepares Graphene and then in the tedious steps for preparing Graphene slurry.But the party
Method still has that repeatability is poor.
Chinese patent patent application number 201010197119.1 discloses a kind of method for preparing Graphene, and the invention passes through
Fine particle is added in process of lapping to increase the collision probability of graphene particles, so as to improve mechanical stripping efficiency.The party
Method is comparing direct ball milling or stirring is peeled off etc. that method can improve the charge stripping efficiency of Graphene, improves the yield of Graphene.But
It is in certain distribution that prolonged stirring causes the fluid in container in liquid phase stripping process, and fluid is always anti-in certain area
Resurgent is moved, and reduces the mutual collision between granule, so that charge stripping efficiency declines.
Problem present in Graphene process is prepared for above-mentioned physics and chemical method, the present invention is proposed using nanometer point
Stream colliding technique prepares Graphene slurry.The technology is the distribution baffle plate straggly in arc pipe, and the perforate on baffle plate, so as to
Change fluid flow regime in flow process, increase between graphene particles, graphene particles and baffle plate, graphene particles with
Mutual collision between aperture, is peeled off by impact several times and reaches preferable peeling effect.
The content of the invention
Present invention is primarily aimed at the method that a kind of nanometer of shunting head-on collision stripping prepares Graphene slurry is provided, its feature
It is to adopt special mechanical stripping equipment to improve charge stripping efficiency, concrete technical scheme is as follows：
Weigh a certain amount of commercially available graphite and be positioned over freeze-day with constant temperature certain hour in 80 DEG C of Ovenized drying oven, to remove
The moisture and other impurities of graphite surface absorption, cools down standby；
Weigh a certain amount of surfactant to be dissolved in organic solvent, by step after all dissolvingsThe stone of pretreatment
Ink is poured into and is dissolved with the organic solution of surfactant, stir and soak a period of time obtain graphite dispersing solution；
Adjust the quantity of aperture on baffle plate and baffle plate in nanometer shunting head-on collision homogenizer；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with certain speed and flows through mechanical stripping cavity, completes mechanical stripping mistake
Journey；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the collection to Graphene slurry；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then filtering residue is cleaned with the organic solvent for preparing graphite suspension；
The binding agent of certain mass is weighed, binding agent is mixed with Graphene slurry, and make it completely molten under magnetic stirring
Solution；
Filler, functional additive are added to into stepGraphene suspension in, then stir under vacuum certain
Time makes it uniformly mix, and obtains Graphene slurry；
StepDescribed nanometer shunting head-on collision homogenizer has two kinds of curved channel and straight tube-like passage；
StepThe baffle number of described nanometer shunting head-on collision homogenizer can change between 10-40；
StepLittle hole number on described nanometer shunting head-on collision homogenizer stage casing baffle plate can change between 20-40；
StepAperture size on described nanometer shunting head-on collision homogenizer stage casing baffle plate can be in the anaplasia of 1-4 square centimeters
Change.
Preferably, the graphite raw material chooses natural flake graphite, graphite powder, expanded graphite, highly oriented graphite, unformed
One kind in carbon.
Preferably, in the organic solution, the mass percent of intercalator is 5-20%.
Preferably, graphite soaks 1h in organic solution, so that intercalation is fully carried out, improves charge stripping efficiency.
Preferably, the surfactant is selected from tetramethyl ammonium hydrogen carbonate, tetraethyl ammonium hydrogen carbonate, tetrabutyl bicarbonate
One or more kinds of mixture in ammonium, dodecyl tetramethyl guanidine carbonate and cetyl tetramethylammonium guanidine carbonate.
Preferably, the organic solvent is selected from butyl acetate, diethyl carbonate, DBE, ethyl carbitol acetate, carbonic acid
Methyl ethyl ester, butyl carbitol acetate, butyl cellosolve acetate, Allyl carbonate, DMSO, dimethyl succinate, Propylene Glycol
Any one or two kinds of in methyl ether acetate, NMP, dimethylbenzene, dibutyl phthalate, dimethyl carbonate and diphenyl carbonate
Combination above.
Preferably, graphene suspension 60-80%, filler 10-20%, binding agent 0-5%, functional additive 0-5%.
Preferably, binding agent is selected from includes phenolic resin, epoxy resin, polyester resin, vinylite, polyurethane tree
The combination of any one or more in fat, polyketone resin, ethyl cellulose.
Preferably, filler selected from any one of glass dust, SnO2, ZnO, Al2O3, TiO2, SiO2 or two kinds with
Upper combination.
Preferably, VTES is selected as coupling agent, used as advection agent, ethanol is used as disappearing for BYK-161
Infusion and sagging inhibitor.
Compared with prior art, employing nanometer proposed by the present invention shunting colliding technique prepare graphene microchip slurry just like
Lower advantage：
1st, after using nanometer shunting colliding technique, the collision probability between granule is greatly improved, and is conducive to improving the machinery of graphite
Charge stripping efficiency, improves raw material availability and product yield；
2nd, it is postoperative to hitting using nanometer shunting, can be with impact several times between graphite granule, between graphite and baffle plate and aperture, can
So that the particle diameter distribution of Graphene is more uniform；
3rd, this method is capable of achieving extensive, consecutive production, and production cost, yield is high and nontoxic in production process, harmless.
Description of the drawings
Graphene slurry is prepared using nanometer shunting head-on collision stripping to further illustrate, is illustrated by accompanying drawing.
Accompanying drawing 1 is nanometer shunting head-on collision homogenizer cut-away view.
Accompanying drawing 2 is baffle plane schematic diagram in stage casing.
Label declaration in figure：
1 leading portion；
2 stage casings；
3 back segments；
11 leading portion diverters；
12 leading portion fixed parts；
21 stage casing baffle plates；
211 baffle plate apertures；
31 back segment fixed parts.
Specific embodiment
By specific embodiment, the present invention is described in further detail, but this should not be interpreted as into model of the invention
Enclose and be only limitted to Examples below.In the case of without departing from said method thought of the present invention, according to ordinary skill knowledge
The various replacements made with customary means or change, should be included in the scope of the present invention.
Embodiment 1
Weigh the commercially available graphite of 500g and be positioned over freeze-day with constant temperature 2h in 80 DEG C of Ovenized drying oven, to remove graphite surface
The moisture and other impurities of absorption, cools down standby；
150g tetrabutyl ammonium hydrogen carbonate is weighed, and is dissolved in 850g propylene carbonate solvents, prepared and there is surfactant
Carbonic allyl ester solution, by step after all dissolvingsThe graphite of pretreatment is poured into and is dissolved with the organic molten of surfactant
In liquid, stir and soak 1h and obtain graphite dispersing solution；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with the speed of 0.5m/s by nanometer shunting head-on collision homogenizer, baffle plate
Quantity is 20, and the little hole number on baffle plate is 40, and the size of aperture is 3 square centimeters, and nanometer shunting head-on collision homogenizer is arc；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the receipts to graphene microchip slurry
Collection；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then cleaning 3 times is carried out to filtering residue with a small amount of Allyl carbonate；
Weigh 70g stepsIn be graphene microchip dispersion liquid and 10g ethyl celluloses, ethyl cellulose is micro- with Graphene
Piece dispersion liquid mixes, and is under magnetic stirring completely dissolved it；
15g glass dust, 1g VTESs, 1g BYK-161 advection agents, 1g ethanol, 2g sagging inhibitor are added
It is added to stepGraphene microchip dispersion liquid in, 3h is then stirred under vacuum makes it uniform mixed, obtains Graphene
Microplate slurry.
Embodiment 2
Weigh the commercially available graphite of 500g and be positioned over freeze-day with constant temperature 2h in 80 DEG C of Ovenized drying oven, to remove graphite surface
The moisture and other impurities of absorption, cools down standby；
150g tetrabutyl ammonium hydrogen carbonate is weighed, and is dissolved in 850g propylene carbonate solvents, prepared and there is surfactant
Carbonic allyl ester solution, by step after all dissolvingsThe graphite of pretreatment is poured into and is dissolved with the organic molten of surfactant
In liquid, stir and soak 1h and obtain graphite dispersing solution；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with the speed of 2m/s by nanometer shunting head-on collision homogenizer, the number of baffle plate
Measure as 20, the little hole number on baffle plate is 40, the size of aperture is 3 square centimeters, nanometer shunting head-on collision homogenizer is arc；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the collection to Graphene slurry；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then cleaning 3 times is carried out to filtering residue with a small amount of Allyl carbonate；
Weigh 70g stepsIn be graphene microchip dispersion liquid and 10g ethyl celluloses, ethyl cellulose is starched with Graphene
Material mixing, and under magnetic stirring it is completely dissolved it；
15g glass dust, 1g VTESs, 1g BYK-161 advection agents, 1g ethanol, 2g sagging inhibitor are added
It is added to stepGraphene microchip dispersion liquid in, 3h is then stirred under vacuum makes it uniform mixed, obtains Graphene
Microplate slurry.
Embodiment 3
Weigh the commercially available graphite of 500g and be positioned over freeze-day with constant temperature 2h in 80 DEG C of Ovenized drying oven, to remove graphite surface
The moisture and other impurities of absorption, cools down standby；
150g tetrabutyl ammonium hydrogen carbonate is weighed, and is dissolved in 850g propylene carbonate solvents, prepared and there is surfactant
The carbonic allyl ester solution of agent, by step after all dissolvingsThe graphite of pretreatment is poured into and is dissolved with the organic of surfactant
In solution, stir and soak 1h and obtain graphite dispersing solution；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with the speed of 2m/s by nanometer shunting head-on collision homogenizer, the number of baffle plate
Measure as 40, the little hole number on baffle plate is 40, the size of aperture is 3 square centimeters, nanometer shunting head-on collision homogenizer is arc；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the receipts to graphene microchip slurry
Collection；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then cleaning 3 times is carried out to filtering residue with a small amount of Allyl carbonate；
Weigh 70g stepsIn be graphene microchip dispersion liquid and 10g ethyl celluloses, ethyl cellulose and Graphene point
Dispersion liquid mixes, and is under magnetic stirring completely dissolved it；
15g glass dust, 1g VTESs, 1g BYK-161 advection agents, 1g ethanol, 2g sagging inhibitor are added
It is added to stepGraphene microchip dispersion liquid in, 3h is then stirred under vacuum makes it uniform mixed, obtains Graphene
Microplate slurry.
Embodiment 4
Weigh the commercially available graphite of 500g and be positioned over freeze-day with constant temperature 2h in 80 DEG C of Ovenized drying oven, to remove graphite surface
The moisture and other impurities of absorption, cools down standby；
150g tetrabutyl ammonium hydrogen carbonate is weighed, and is dissolved in 850g propylene carbonate solvents, prepared and there is surfactant
Carbonic allyl ester solution, by step after all dissolvingsThe graphite of pretreatment is poured into and is dissolved with the organic molten of surfactant
In liquid, stir and soak 1h and obtain graphite dispersing solution；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with the speed of 2m/s by nanometer shunting head-on collision homogenizer, the number of baffle plate
Measure as 40, the little hole number on baffle plate is 20, the size of aperture is 3 square centimeters, nanometer shunting head-on collision homogenizer is arc；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the collection to Graphene slurry；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then cleaning 3 times is carried out to filtering residue with a small amount of Allyl carbonate；
Weigh 70g stepsIn be graphene microchip dispersion liquid and 10g ethyl celluloses, ethyl cellulose is micro- with Graphene
Piece dispersion liquid mixes, and is under magnetic stirring completely dissolved it；
15g glass dust, 1g VTESs, 1g BYK-161 advection agents, 1g ethanol, 2g sagging inhibitor are added
It is added to stepGraphene microchip dispersion liquid in, 3h is then stirred under vacuum makes it uniform mixed, obtains Graphene
Microplate slurry.
Embodiment 5
Weigh the commercially available graphite of 500g and be positioned over freeze-day with constant temperature 2h in 80 DEG C of Ovenized drying oven, to remove graphite surface
The moisture and other impurities of absorption, cools down standby；
150g tetrabutyl ammonium hydrogen carbonate is weighed, and is dissolved in 850g propylene carbonate solvents, prepared and there is surfactant
Carbonic allyl ester solution, by step after all dissolvingsThe graphite of pretreatment is poured into and is dissolved with the organic molten of surfactant
In liquid, stir and soak 1h and obtain graphite dispersing solution；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with the speed of 2m/s by nanometer shunting head-on collision homogenizer, the number of baffle plate
Measure as 40, the little hole number on baffle plate is 20, the size of aperture is 1 square centimeter, nanometer shunting head-on collision homogenizer is arc；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the collection to Graphene slurry；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then cleaning 3 times is carried out to filtering residue with a small amount of Allyl carbonate；
Weigh 70g stepsIn be Graphene point microplate dispersion liquid and 10g ethyl celluloses, ethyl cellulose is micro- with Graphene
Piece dispersion liquid mixes, and is under magnetic stirring completely dissolved it；
15g glass dust, 1g VTESs, 1g BYK-161 advection agents, 1g ethanol, 2g sagging inhibitor are added
It is added to stepGraphene microchip dispersion liquid in, 3h is then stirred under vacuum makes it uniform mixed, obtains Graphene
Microplate slurry.
Embodiment 5
Weigh the commercially available graphite of 500g and be positioned over freeze-day with constant temperature 2h in 80 DEG C of Ovenized drying oven, to remove graphite surface
The moisture and other impurities of absorption, cools down standby；
150g tetrabutyl ammonium hydrogen carbonate is weighed, and is dissolved in 850g propylene carbonate solvents, prepared and there is surfactant
Carbonic allyl ester solution, by step after all dissolvingsThe graphite of pretreatment is poured into and is dissolved with the organic molten of surfactant
In liquid, stir and soak 1h and obtain graphite dispersing solution；
By stepThe graphite dispersing solution that middle Jing intercalation processings are crossed is continuously injected in nanometer shunting head-on collision homogenizer, and is given
Leading portion cavity arranges certain pressure, makes graphite dispersing solution with the speed of 2m/s by nanometer shunting head-on collision homogenizer, the number of baffle plate
Measure as 40, the little hole number on baffle plate is 20, the size of aperture is 1 square centimeter, nanometer shunting head-on collision homogenizer is straight tube-like
Type；
A slurry collection device is connect in nanometer shunting head-on collision homogenizer hindfoot portion, to complete the collection to Graphene slurry；
By stepThe slurry of middle collection is filtered with the copper mesh of 300 mesh, to ensure the graphene particles size point for obtaining
Cloth is more uniform, then cleaning 3 times is carried out to filtering residue with a small amount of Allyl carbonate；
Weigh 70g stepsIn be Graphene point microplate dispersion liquid and 10g ethyl celluloses, ethyl cellulose is micro- with Graphene
Piece dispersion liquid mixes, and is under magnetic stirring completely dissolved it；
15g glass dust, 1g VTESs, 1g BYK-161 advection agents, 1g ethanol, 2g sagging inhibitor are added
It is added to stepGraphene microchip dispersion liquid in, 3h is then stirred under vacuum makes it uniform mixed, obtains Graphene
Microplate slurry.
Claims (10)
1. it is a kind of that the method that preparation graphene microchip slurry is peeled off in head-on collision is shunted by nanometer, it is characterised in that to be shunted using nanometer
Head-on collision stripping method prepares the more uniform graphene microchip slurry of particle diameter distribution, specifically includes following steps：
Graphite raw material is put into freeze-day with constant temperature 3h in 80 DEG C of box-type drying stove, with remove graphite surface absorption moisture and its
His impurity；
The organic solution with surfactant is prepared, then by stepIn graphite pour in organic solution and carry out intercalation
Reaction, and obtain graphite dispersing solution after stirring；
By stepIn to graphite dispersing solution pour into nanometer shunting head-on collision peel-off device in, and to pan feeding chamber apply a level pressure
Power, makes graphite dispersing solution with certain speed through equipment, completes mechanical stripping process；
By stepThe copper mesh of slurry Jing 300 for obtaining carries out filtration treatment, and filtering residue is cleaned, is filtered, and obtains particle diameter
The more uniform graphene suspension of distribution；
To stepFiller, binding agent, functional additive are added in the graphene suspension for obtaining, and is stirred in a vacuum
To Graphene slurry；
Wherein described nanometer shunting head-on collision homogenizer mainly includes that leading portion part flow arrangement, stage casing are equal with certain amount aperture
Even staggered baffle plate and back segment product collecting device；
Described nanometer shunting head-on collision homogenizer has two kinds of curved channel and straight tube-like passage；
The baffle number of described nanometer shunting head-on collision homogenizer can change between 10-40；Little hole number on baffle plate can be
Change between 20-40；Aperture size on baffle plate can change between 1-4 square centimeters.
2. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：The graphite raw material chooses in natural flake graphite, graphite powder, expanded graphite, highly oriented graphite, agraphitic carbon
Kind.
3. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：In the organic solution, the mass percent of intercalator is 5-20%.
4. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：Graphite soaks 1h in organic solution, so that intercalation is fully carried out, improves charge stripping efficiency.
5. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：The surfactant is selected from tetramethyl ammonium hydrogen carbonate, tetraethyl ammonium hydrogen carbonate, tetrabutyl ammonium hydrogen carbonate, dodecane
One or more kinds of mixture in base tetramethyl guanidine carbonate and cetyl tetramethylammonium guanidine carbonate.
6. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：The organic solvent is selected from butyl acetate, diethyl carbonate, DBE, ethyl carbitol acetate, Ethyl methyl carbonate, fourth
Base carbitol acetate, butyl cellosolve acetate, Allyl carbonate, DMSO, dimethyl succinate, propylene glycol monomethyl ether acetic acid
The group of any one or more in ester, NMP, dimethylbenzene, dibutyl phthalate, dimethyl carbonate and diphenyl carbonate
Close.
7. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：Different according to product performance demands, rate of flow of fluid, baffle number, little hole number and aperture size can be in certain models
Enclose interior change.
8. a kind of method for shunting head-on collision stripping preparation graphene microchip slurry by nanometer is required according to right 1, it is special
Levy and be：Organic solvent used by cleaning filtering residue is to prepare the solvent used by dispersion liquid.
It is 9. a kind of that the graphene microchip slurry that preparation is peeled off in head-on collision is shunted by nanometer, it is characterised in that：The graphene microchip
The preparation method told by any one of claim 1-8 is obtained.
10. a kind of described graphene microchip slurry that head-on collision stripping preparation is shunted by nanometer, its feature are required according to right 9
It is：Graphene suspension 60-80%, filler 10-20%, binding agent 0-5%, functional additive 0-5%.
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| CN109835889A (en) * | 2019-04-16 | 2019-06-04 | 江苏碳谷二维世界科技有限公司 | A kind of the mechanical stripping device and graphene preparation method of graphene |
| CN110054179A (en) * | 2019-05-29 | 2019-07-26 | 张新庄 | Ball shaped nano graphene production technology |
| TWI859160B (en) * | 2018-10-12 | 2024-10-21 | 英商先進材料發展有限公司 | Method of preparing nanoplatelets from a 3d layered material, apparatus using the same |
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| CN105110318A (en) * | 2015-07-23 | 2015-12-02 | 深圳市国创新能源研究院 | Graphene aqueous slurry, and preparation method thereof |
| CN105869770A (en) * | 2016-03-30 | 2016-08-17 | 成都新柯力化工科技有限公司 | Graphene conductive paste prepared by mechanical stripping and preparation method of graphene conductive paste |
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| CN204735123U (en) * | 2015-04-17 | 2015-11-04 | 杨川明 | Nano split collider homogenizer |
| CN105110318A (en) * | 2015-07-23 | 2015-12-02 | 深圳市国创新能源研究院 | Graphene aqueous slurry, and preparation method thereof |
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| TWI859160B (en) * | 2018-10-12 | 2024-10-21 | 英商先進材料發展有限公司 | Method of preparing nanoplatelets from a 3d layered material, apparatus using the same |
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