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CN106494107A - A kind of laser index carving method for microelectronic package - Google Patents

A kind of laser index carving method for microelectronic package Download PDF

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Publication number
CN106494107A
CN106494107A CN201611103350.6A CN201611103350A CN106494107A CN 106494107 A CN106494107 A CN 106494107A CN 201611103350 A CN201611103350 A CN 201611103350A CN 106494107 A CN106494107 A CN 106494107A
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laser
layer
shell
marking method
coating
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唐利锋
莫仲
曹坤
陈寰贝
程凯
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CETC 55 Research Institute
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein

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  • Laser Beam Processing (AREA)

Abstract

本发明是一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:1)用AutoCAD或设备自带软件对激光标刻的内容进行编辑和储存;2)依据基材的类型选择合适的激光器,完成开机、设备校准、工装夹具和耗材的准备;3)设置工艺参数;4)用激光器所发射激光在基材上切割出步骤1)中所编辑的内容;5)镀覆形成中间镀层;7)将基材进行组装,形成外壳;8)在外壳上镀覆外壳镀层,形成成品;9)进行成品的性能指标检测。本发明的有益效果:1)激光标刻的图形、字符、条码清晰、永久不脱落,满足外壳气密性、耐盐雾性能等指标考核要求;2)为非接触式自动加工,具有运行灵活、速度快、无磨损等优点。The invention relates to a laser marking method for microelectronic packaging shells, which includes the following steps: 1) editing and storing the laser marking content with AutoCAD or the equipment's own software; 2) according to the type of substrate Select the appropriate laser to complete the preparation of start-up, equipment calibration, fixtures and consumables; 3) Set the process parameters; 4) Use the laser emitted by the laser to cut out the content edited in step 1) on the substrate; 5) Plating Form the intermediate coating; 7) Assemble the base material to form the shell; 8) Plating the shell coating on the shell to form a finished product; 9) Conduct performance index testing of the finished product. Beneficial effects of the present invention: 1) The graphics, characters, and barcodes marked by laser are clear and never fall off, meeting the evaluation requirements of air tightness of the shell, salt spray resistance and other indicators; 2) Non-contact automatic processing, with flexible operation , fast speed, no wear and other advantages.

Description

一种用于微电子封装外壳的激光标刻方法A laser marking method for microelectronic packaging shell

技术领域technical field

本发明涉及一种用于微电子封装外壳的激光标刻方法,属于微电子制造技术领域。The invention relates to a laser marking method for a microelectronic packaging shell, belonging to the technical field of microelectronic manufacturing.

背景技术Background technique

随着通信、航空航天、汽车和电子消费品等行业的发展和自动化水平的提高,对所用电子电路和器件的尺寸、功能以及稳定性要求越来越高;成品局部电路断开,唯一性标识等是实现局部功能、信息采集、追踪和管理的重要方法;传统采用丝网印刷、打印等方式适用于一致性较好,同一模板的产品,工艺灵活性低、不能连续编号,后续加工和使用过程易脱落;激光切割是利用高能量密度的激光束对目标作用,使目标表面发生物理或化学变化,从而获得设计图案的加工方式,具有图形、字符、条码清晰、永久不脱落;非接触式自动加工、运行灵活、速度快、无磨损等特点,但是由于基材本身特征、基材对激光的吸收、后续加工使用条件等不同,激光在材料上形成的切痕深度不同,从而导致产品外观、气密性、绝缘电阻、盐雾、机械冲击等性能降低。With the development of communication, aerospace, automobile and consumer electronics industries and the improvement of automation level, the requirements for the size, function and stability of electronic circuits and devices used are getting higher and higher; partial circuit disconnection of finished products, unique identification, etc. It is an important method to realize local functions, information collection, tracking and management; traditional methods such as screen printing and printing are suitable for products with good consistency and the same template, low process flexibility, continuous numbering, and subsequent processing and use. Easy to fall off; laser cutting is a processing method that uses high-energy-density laser beams to act on the target to cause physical or chemical changes on the target surface to obtain design patterns. It has clear graphics, characters and barcodes, and will never fall off; Processing, flexible operation, fast speed, no wear and other characteristics, but due to the characteristics of the substrate itself, the absorption of the substrate to the laser, and the conditions of subsequent processing, the depth of the cut marks formed by the laser on the material is different, resulting in product appearance, Airtightness, insulation resistance, salt spray, mechanical shock and other performance degradation.

氧化铍、AlN、Cu、Mo、W、钢、可伐合金以及Cu/W和Cu/Mo等材料因热膨胀系数与芯片相近;优良的热传导率;化学性质稳定、非常好的电气性能;良好的EMI/RFI屏蔽能力;热膨胀系数与芯片相近、较低的密度,足够的强度和硬度;良好的加工或成形性能;可镀覆性、可焊性和耐蚀性优良,常用于实现对芯片支持、电连接、热吸收和发散;随着通信、航空航天、汽车和电子消费品等行业的发展和自动化水平的提高,对所用电子电路和器件的功能、尺寸、气密性、绝缘电阻、盐雾、机械冲击等稳定性要求越来越高,成品局部电路断开,唯一性标识等是实现局部功能、信息采集、追踪和管理的重要方法。Materials such as beryllium oxide, AlN, Cu, Mo, W, steel, Kovar alloy, and Cu/W and Cu/Mo are similar to chips due to their thermal expansion coefficients; excellent thermal conductivity; stable chemical properties, very good electrical properties; good EMI/RFI shielding ability; thermal expansion coefficient similar to chip, low density, sufficient strength and hardness; good processing or forming performance; excellent plating, solderability and corrosion resistance, often used to support chips , electrical connection, heat absorption and divergence; with the development of industries such as communications, aerospace, automobiles and consumer electronics and the improvement of automation levels, the functions, dimensions, airtightness, insulation resistance, salt spray of electronic circuits and devices used Stability requirements such as mechanical shock and mechanical shock are getting higher and higher. Partial circuit disconnection of finished products and unique identification are important methods to realize partial functions, information collection, tracking and management.

激光切割是在计算机的控制下,通过脉冲激光器放电输出具有一定功率、频率的脉冲激光束,该脉冲激光束经过光路传导、反射及聚焦透镜组聚焦在加工基材的表面上,形成一个细微的、高能量密度的光斑,焦斑在待加工材料表面附近产生瞬间高温熔化、汽化和强大气流使材料表面形成凹坑,在计算机精确控制下激光束与被加工材料按预先设定好的路线、速度、延时等进行相对运动达,从而得到设计的图形、字符、条码等,根据需要经中间层镀覆、组装、焊接和镀覆等工艺加工成为具有一定功能和用途的微电子封装外壳。Laser cutting is under the control of the computer, the pulsed laser beam with a certain power and frequency is output through the discharge of the pulsed laser, and the pulsed laser beam is focused on the surface of the processed substrate through optical transmission, reflection and focusing lens group to form a fine , high energy density spot, the focal spot near the surface of the material to be processed produces instantaneous high-temperature melting, vaporization and strong airflow to form pits on the surface of the material. Under the precise control of the computer, the laser beam and the material to be processed follow the preset route, Speed, delay, etc. are carried out relative movement, so as to obtain the designed graphics, characters, barcodes, etc., and process them into microelectronic packaging shells with certain functions and uses through intermediate layer plating, assembly, welding, and plating processes as required.

发明内容Contents of the invention

本发明提出的是一种用于微电子封装外壳的激光标刻方法,根据基材尺寸特征和对激光的吸收特性选择合适类型、输出功率、中心波长的激光器,首先对设计的图形、字符和条码等进行适当编辑,然后采用合适的加工工艺参数,经切割、中间层镀覆、组装、焊接和镀覆等工艺,其目的旨在使产品的外观和气密性、绝缘电阻、盐雾、机械冲击等性能得到大幅提高。What the present invention proposes is a kind of laser marking method used for microelectronic packaging casing, select the laser with suitable type, output power and central wavelength according to the size characteristics of the substrate and the absorption characteristics of the laser, firstly design the graphics, characters and Edit the bar code, etc., and then use the appropriate processing parameters, through cutting, intermediate layer plating, assembly, welding and plating, etc., the purpose is to make the product appearance and air tightness, insulation resistance, salt spray, mechanical Performance such as impact has been greatly improved.

本发明的技术解决方案:本发明提出的是一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:Technical solution of the present invention: what the present invention proposes is a kind of laser marking method that is used for the microelectronic packaging casing, and this method comprises the following steps:

1)用AutoCAD或设备自带软件对激光标刻的内容进行编辑和储存;1) Use AutoCAD or the software that comes with the device to edit and store the laser-marked content;

2)依据基材的类型选择合适的激光器,完成开机、设备校准、工装夹具和耗材的准备;2) Select the appropriate laser according to the type of substrate, and complete the preparation of start-up, equipment calibration, fixtures and consumables;

3)设置工艺参数;3) Set process parameters;

4)用激光器所发射激光在基材上切割出步骤1)中所编辑的内容;4) Cut out the content edited in step 1) on the substrate with the laser emitted by the laser;

5)镀覆形成防护性中间镀层;5) Plating to form a protective intermediate coating;

7)将基材进行组装,形成外壳;7) Assemble the substrate to form a shell;

8)在外壳上镀覆功能性镀层,形成成品;8) Coating a functional coating on the shell to form a finished product;

9)进行成品的性能指标检测。9) Conduct performance index testing of finished products.

本发明的有益效果:Beneficial effects of the present invention:

1)采用输出功率在0.5W~1000W,中心波长在100nm~2μm的光纤激光器、半导体激光器或CO2激光器在氧化铍、氮化铝、铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金、陶瓷等基材上切割出深度为0.1~200μm的图形、字符和条码等,经镀覆形成中间镀层层、组装、焊接和外壳镀覆等工艺,使激光标刻的图形、字符、条码清晰、永久不脱落,性能指标满足外壳考核要求;1) Fiber lasers, semiconductor lasers or CO2 lasers with an output power of 0.5W to 1000W and a center wavelength of 100nm to 2μm are used in beryllium oxide, aluminum nitride, copper, molybdenum, tungsten, steel, Kovar alloy, copper-tungsten alloy , copper-molybdenum alloy, ceramics and other substrates are cut out of graphics, characters and barcodes with a depth of 0.1 to 200 μm, and are plated to form an intermediate coating layer, assembled, welded and shell coated, so that the laser-marked graphics, The characters and barcodes are clear and never fall off, and the performance indicators meet the requirements of the shell assessment;

2)本发明为非接触式自动加工,具有运行灵活、速度快、无磨损等优点。2) The present invention is a non-contact automatic processing, which has the advantages of flexible operation, high speed, and no wear.

具体实施方式detailed description

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for microelectronic packaging housing, the method may further comprise the steps:

1)用AutoCAD或设备自带软件对激光标刻的内容进行编辑和储存;1) Use AutoCAD or the software that comes with the device to edit and store the laser-marked content;

2)依据基材的类型选择合适的激光器,完成开机、设备校准、工装夹具和耗材的准备;2) Select the appropriate laser according to the type of substrate, and complete the preparation of start-up, equipment calibration, fixtures and consumables;

3)设置工艺参数;3) Set process parameters;

4)用激光器所发射激光在基材上切割出步骤1)中所编辑的内容;4) Cut out the content edited in step 1) on the substrate with the laser emitted by the laser;

5)镀覆形成防护性中间镀层;5) Plating to form a protective intermediate coating;

7)将基材进行组装,形成外壳;组装时可用常规钎焊工艺进行焊接;7) Assemble the base material to form a shell; the conventional brazing process can be used for welding during assembly;

8)在外壳上镀覆功能性镀层,形成成品;8) Coating a functional coating on the shell to form a finished product;

9)进行成品的性能指标检测。9) Conduct performance index testing of finished products.

所述激光标刻的内容为图形和/或字符和/或条码。The content of the laser marking is graphics and/or characters and/or barcodes.

所述的基材是氧化铍、氮化铝、铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金、陶瓷中的一种。The base material is one of beryllium oxide, aluminum nitride, copper, molybdenum, tungsten, steel, Kovar alloy, copper-tungsten alloy, copper-molybdenum alloy and ceramics.

所述的激光器是光纤激光器、半导体激光器、CO2激光器中的一种;Described laser is a kind of in fiber laser, semiconductor laser, CO 2 laser;

所述激光器的输出功率为0.5 W~1000W,激光器所发射激光的中心波长为100nm~2μm;所述的工艺参数包括额定输出功率、切割圈数、切割速度 、延时;其中额定输出功率为0.5 W~1000W、切割圈数为1~100、切割速度为10 mm~1000mm/s、延时为10~1000μs。The output power of the laser is 0.5 W to 1000 W, and the central wavelength of the laser emitted by the laser is 100 nm to 2 μm; the process parameters include rated output power, number of cutting circles, cutting speed, and time delay; wherein the rated output power is 0.5 W~1000W, the number of cutting circles is 1~100, the cutting speed is 10 mm~1000mm/s, and the time delay is 10~1000μs.

所述成品上图形和/或字符和/或条码的深度为0.1μm~100μm。The depth of the graphics and/or characters and/or barcodes on the finished product is 0.1 μm˜100 μm.

所述中间防护性镀层是银层、铜层、锡层、镍层、铬层、金层中的一种,镀层厚度为0.1μm~20μm;所述外壳功能性镀层是银层、铜层、锡层、镍层、铬层、金层中的一种,镀层厚度为0.1μm~20μm;通过镀层,标刻的图形、字符、条码清晰、可永久不脱落,满足外壳气密性、耐盐雾性能等指标考核要求。The intermediate protective coating is one of silver layer, copper layer, tin layer, nickel layer, chromium layer and gold layer, and the thickness of the coating is 0.1 μm to 20 μm; the functional coating of the shell is silver layer, copper layer, One of the tin layer, nickel layer, chromium layer, and gold layer, the thickness of the coating is 0.1 μm to 20 μm; through the coating, the marked graphics, characters, and barcodes are clear and will not fall off permanently, meeting the airtightness of the shell and salt resistance Fog performance and other indicators assessment requirements.

所述依据基材的类型选择合适的激光器,具体为可以采用二氧化碳激光器、UV激光器切割氧化铍、氮化铝、氧化铝陶瓷等;采用Nd:YAG激光器,UV激光器切割铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金。According to the type of base material, the appropriate laser is selected, specifically carbon dioxide laser, UV laser can be used to cut beryllium oxide, aluminum nitride, alumina ceramics, etc.; Nd:YAG laser, UV laser can be used to cut copper, molybdenum, tungsten, steel , Kovar alloy, copper-tungsten alloy, copper-molybdenum alloy.

所述中间镀层起到防护性、功能性和装饰性作用。The intermediate coating plays protective, functional and decorative roles.

实施例1Example 1

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for a microelectronic package housing, the method comprising the steps of:

a)用AutoCAD进行图形和字符编辑,采用宋体,字符高度2.0mm;a) Use AutoCAD to edit graphics and characters, using Song typeface, and the character height is 2.0mm;

b)选择UV激光器、二氧化碳激光器切割氧化铍、氮化铝、氧化铝陶瓷等,激光器额定输出功率在10W,激光器所发射激光的中心波长为355nm,10.6um;完成开机,工作台、摄像头及焦距校准,选择适合的工装夹具和耗材准备;b) Choose UV laser or carbon dioxide laser to cut beryllium oxide, aluminum nitride, alumina ceramics, etc., the rated output power of the laser is 10W, and the central wavelength of the laser emitted by the laser is 355nm, 10.6um; complete the start-up, workbench, camera and focal length Calibration, selection of suitable fixtures and consumables preparation;

c)工艺参数设置,输出功率5 W、切割圈数2、速度120mm/s、延时500μs;c) Process parameter setting, output power 5 W, number of cutting circles 2, speed 120mm/s, delay 500μs;

d)用激光在基材上切割设计的图形、字符和条码等并完成必要的指标检测;d) Cut the designed graphics, characters and barcodes on the substrate with laser and complete the necessary index detection;

e)在基材上镀镍,厚度在2μm;e) Nickel plating on the substrate with a thickness of 2 μm;

f)零件组装,用常规钎焊工艺进行焊接;f) Assemble the parts and weld them with a conventional brazing process;

g)防护性、功能性和装饰性金层镀覆,镀层厚度在2μm;g) Protective, functional and decorative gold plating, with a thickness of 2 μm;

h)成品性能指标检测。h) Testing of performance indicators of finished products.

实施例2Example 2

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for a microelectronic package housing, the method comprising the steps of:

a)用设备自带软件进行图形和字符编辑,采用宋体,字符高度2.0mm;a) Use the software that comes with the device to edit graphics and characters, using Song typeface, and the character height is 2.0mm;

b)选择UV激光器,Nd:YAG激光器切割铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金等,激光器额定输出功率在20 W,激光器所发射激光的中心波长在355nm ,1064nm;完成开机,工作台、摄像头及焦距校准,选择适合的工装夹具和耗材准备;b) Choose UV laser, Nd:YAG laser cutting copper, molybdenum, tungsten, steel, Kovar, copper-tungsten alloy, copper-molybdenum alloy, etc., the rated output power of the laser is 20 W, and the center wavelength of the laser emitted by the laser is 355nm. 1064nm; complete booting, calibration of workbench, camera and focal length, selection of suitable fixtures and consumables;

c)工艺参数设置,输出功率12 W、切割圈数5、速度300mm/s、延时500μs;c) Process parameter setting, output power 12 W, number of cutting circles 5, speed 300mm/s, delay 500μs;

d)用激光在基材上切割设计的图形、字符和条码等并完成必要的指标检测;d) Cut the designed graphics, characters and barcodes on the substrate with laser and complete the necessary index detection;

e)在基材上镀镍,厚度在5μm;e) Nickel plating on the substrate with a thickness of 5 μm;

f)零件组装,用常规钎焊工艺进行焊接;f) Assemble the parts and weld them with a conventional brazing process;

g)防护性、功能性和装饰性金层镀覆,镀层厚度在10μm;g) Protective, functional and decorative gold plating, with a thickness of 10 μm;

h)成品性能指标检测。h) Testing of performance indicators of finished products.

实施例3Example 3

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for a microelectronic package housing, the method comprising the steps of:

a)用AutoCAD进行图形和字符编辑,采用宋体,字符高度2.0mm;a) Use AutoCAD to edit graphics and characters, using Song typeface, and the character height is 2.0mm;

b)选择UV激光器切割氧化铍、氮化铝、氧化铝陶瓷,激光器额定输出功率在10W,激光器所发射激光的中心波长为355nm,10.6um;完成开机,工作台、摄像头及焦距校准,选择适合的工装夹具和耗材准备;b) Choose a UV laser to cut beryllium oxide, aluminum nitride, and alumina ceramics. The rated output power of the laser is 10W, and the center wavelength of the laser emitted by the laser is 355nm, 10.6um. Preparation of fixtures and consumables;

c)工艺参数设置,输出功率5 W、切割圈数2、速度120mm/s、延时500μs;c) Process parameter setting, output power 5 W, number of cutting circles 2, speed 120mm/s, delay 500μs;

d)用激光在基材上切割设计的图形、字符和条码等并完成必要的指标检测;d) Cut the designed graphics, characters and barcodes on the substrate with laser and complete the necessary index detection;

e)在基材上镀镍,厚度在2μm;e) Nickel plating on the substrate with a thickness of 2 μm;

f)零件组装,用常规钎焊工艺进行焊接;f) Assemble the parts and weld them with a conventional brazing process;

g)防护性、功能性和装饰性金层镀覆,镀层厚度在2μm;g) Protective, functional and decorative gold plating, with a thickness of 2 μm;

h)成品性能指标检测。h) Testing of performance indicators of finished products.

实施例4Example 4

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for a microelectronic package housing, the method comprising the steps of:

a)用AutoCAD进行图形和字符编辑,采用宋体,字符高度2.0mm;a) Use AutoCAD to edit graphics and characters, using Song typeface, and the character height is 2.0mm;

b)选择二氧化碳激光器切割氧化铍、氮化铝、氧化铝陶瓷,激光器额定输出功率在10W,激光器所发射激光的中心波长为355nm,10.6um;完成开机,工作台、摄像头及焦距校准,选择适合的工装夹具和耗材准备;b) Choose a carbon dioxide laser to cut beryllium oxide, aluminum nitride, and alumina ceramics. The rated output power of the laser is 10W, and the center wavelength of the laser emitted by the laser is 355nm, 10.6um. Preparation of fixtures and consumables;

c)工艺参数设置,输出功率5 W、切割圈数2、速度120mm/s、延时500μs;c) Process parameter setting, output power 5 W, number of cutting circles 2, speed 120mm/s, delay 500μs;

d)用激光在基材上切割设计的图形、字符和条码等并完成必要的指标检测;d) Cut the designed graphics, characters and barcodes on the substrate with laser and complete the necessary index detection;

e)在基材上镀镍,厚度在2μm;e) Nickel plating on the substrate with a thickness of 2 μm;

f)零件组装,用常规钎焊工艺进行焊接;f) Assemble the parts and weld them with a conventional brazing process;

g)防护性、功能性和装饰性金层镀覆,镀层厚度在2μm;g) Protective, functional and decorative gold plating, with a thickness of 2 μm;

h)成品性能指标检测。h) Testing of performance indicators of finished products.

实施例5Example 5

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for a microelectronic package housing, the method comprising the steps of:

a)用设备自带软件进行图形和字符编辑,采用宋体,字符高度2.0mm;a) Use the software that comes with the device to edit graphics and characters, using Song typeface, and the character height is 2.0mm;

b)选择UV激光器切割铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金,激光器额定输出功率在20 W,激光器所发射激光的中心波长在355nm ,1064nm;完成开机,工作台、摄像头及焦距校准,选择适合的工装夹具和耗材准备;b) Choose UV laser to cut copper, molybdenum, tungsten, steel, Kovar alloy, copper-tungsten alloy, copper-molybdenum alloy, the rated output power of the laser is 20 W, and the center wavelength of the laser emitted by the laser is 355nm, 1064nm; complete the start-up and work Stage, camera and focal length calibration, selection of suitable fixtures and consumables preparation;

c)工艺参数设置,输出功率12 W、切割圈数5、速度300mm/s、延时500μs;c) Process parameter setting, output power 12 W, number of cutting circles 5, speed 300mm/s, delay 500μs;

d)用激光在基材上切割设计的图形、字符和条码等并完成必要的指标检测;d) Cut the designed graphics, characters and barcodes on the substrate with laser and complete the necessary index detection;

e)在基材上镀镍,厚度在5μm;e) Nickel plating on the substrate with a thickness of 5 μm;

f)零件组装,用常规钎焊工艺进行焊接;f) Assemble the parts and weld them with a conventional brazing process;

g)防护性、功能性和装饰性金层镀覆,镀层厚度在10μm;g) Protective, functional and decorative gold plating, with a thickness of 10 μm;

h)成品性能指标检测。h) Testing of performance indicators of finished products.

实施例6Example 6

一种用于微电子封装外壳的激光标刻方法,该方法包括如下步骤:A laser marking method for a microelectronic package housing, the method comprising the steps of:

a)用设备自带软件进行图形和字符编辑,采用宋体,字符高度2.0mm;a) Use the software that comes with the device to edit graphics and characters, using Song typeface, and the character height is 2.0mm;

b)选择Nd:YAG激光器切割铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金,激光器额定输出功率在20 W,激光器所发射激光的中心波长在355nm ,1064nm;完成开机,工作台、摄像头及焦距校准,选择适合的工装夹具和耗材准备;b) Choose Nd:YAG laser to cut copper, molybdenum, tungsten, steel, Kovar alloy, copper-tungsten alloy, copper-molybdenum alloy, the rated output power of the laser is 20 W, and the center wavelength of the laser emitted by the laser is 355nm, 1064nm; complete the start-up , workbench, camera and focal length calibration, selection of suitable fixtures and consumables preparation;

c)工艺参数设置,输出功率12 W、切割圈数5、速度300mm/s、延时500μs;c) Process parameter setting, output power 12 W, number of cutting circles 5, speed 300mm/s, delay 500μs;

d)用激光在基材上切割设计的图形、字符和条码等并完成必要的指标检测;d) Cut the designed graphics, characters and barcodes on the substrate with laser and complete the necessary index detection;

e)在基材上镀镍,厚度在5μm;e) Nickel plating on the substrate with a thickness of 5 μm;

f)零件组装,用常规钎焊工艺进行焊接;f) Assemble the parts and weld them with a conventional brazing process;

g)防护性、功能性和装饰性金层镀覆,镀层厚度在10μm;g) Protective, functional and decorative gold plating, with a thickness of 10 μm;

h)成品性能指标检测。h) Testing of performance indicators of finished products.

Claims (7)

1.一种用于微电子封装外壳的激光标刻方法,其特征是包括如下步骤:1. a kind of laser marking method that is used for microelectronic packaging shell, is characterized in that comprising the steps: 1)用AutoCAD或设备自带软件对激光标刻的内容进行编辑和储存;1) Use AutoCAD or the software that comes with the device to edit and store the laser-marked content; 2)依据基材的类型选择合适的激光器,完成开机、设备校准、工装夹具和耗材的准备;2) Select the appropriate laser according to the type of substrate, and complete the preparation of start-up, equipment calibration, fixtures and consumables; 3)设置工艺参数;3) Set process parameters; 4)用激光器所发射激光在基材上切割出步骤1)中所编辑的内容;4) Cut out the content edited in step 1) on the substrate with the laser emitted by the laser; 5)镀覆形成中间防护性镀层;5) Plating forms an intermediate protective coating; 7)将基材进行组装,形成外壳;7) Assemble the base material to form a shell; 8)在外壳上镀覆功能性镀层,形成成品;8) Coating a functional coating on the shell to form a finished product; 9)进行成品的性能指标检测。9) Carry out performance index testing of finished products. 2.根据权利要求1所述的一种用于微电子封装外壳的激光标刻方法,其特征是所述激光标刻的内容为图形和/或字符和/或条码。2. A laser marking method for a microelectronic package housing according to claim 1, wherein the content of the laser marking is graphics and/or characters and/or barcodes. 3.根据权利要求1所述的一种用于微电子封装外壳的激光标刻方法,其特征是所述的基材可以是氧化铍、氮化铝、铜、钼、钨、钢、可伐合金、铜钨合金、铜钼合金、陶瓷中的一种。3. A kind of laser marking method that is used for microelectronic package shell according to claim 1, it is characterized in that described base material can be beryllium oxide, aluminum nitride, copper, molybdenum, tungsten, steel, Kovar One of alloys, copper-tungsten alloys, copper-molybdenum alloys, and ceramics. 4. 根据权利要求1所述的一种用于微电子封装外壳的激光标刻方法,其特征是所述的激光器是光纤激光器、半导体激光器、CO2激光器中的一种;所述激光器的输出功率为0.5 W~1000W,激光器所发射激光的中心波长为100nm~2μm。4. a kind of laser marking method that is used for microelectronic packaging shell according to claim 1 is characterized in that described laser device is a kind of in fiber laser device, semiconductor laser device, CO2 laser device; The output of described laser device The power ranges from 0.5 W to 1000 W, and the center wavelength of the laser light emitted by the laser ranges from 100 nm to 2 μm. 5.根据权利要求1所述的一种用于微电子封装外壳的激光标刻方法,其特征是5. A kind of laser marking method that is used for microelectronic package shell according to claim 1, it is characterized in that 所述的工艺参数包括额定输出功率、切割圈数、切割速度 、延时;其中额定输出功率为0.5 W~1000W、切割圈数为1~100、切割速度为10 mm~1000mm/s、延时为10~1000μs。The process parameters described include rated output power, number of cutting circles, cutting speed, and time delay; wherein the rated output power is 0.5 W-1000 W, the number of cutting circles is 1-100, the cutting speed is 10 mm-1000 mm/s, and the time delay is 10 ~ 1000μs. 6.根据权利要求1所述的一种用于微电子封装外壳的激光标刻方法,其特征是所述成品上图形和/或字符和/或条码的深度为0.1μm~100μm。6 . A laser marking method for microelectronic packaging shells according to claim 1 , characterized in that the depth of the graphics and/or characters and/or barcodes on the finished product is 0.1 μm to 100 μm. 7.根据权利要求1所述的一种用于微电子封装外壳的激光标刻方法,其特征是所述中间防护性镀层是银层、铜层、锡层、镍层、铬层、金层中的一种,镀层厚度为0.1μm~20μm,功能性镀层是银层、铜层、锡层、镍层、铬层、金层中的一种,镀层厚度为0.1μm~20μm。7. A kind of laser marking method that is used for microelectronics packaging shell according to claim 1, it is characterized in that described intermediate protective coating is silver layer, copper layer, tin layer, nickel layer, chromium layer, gold layer One of them, the thickness of the coating is 0.1 μm to 20 μm, and the functional coating is one of silver layer, copper layer, tin layer, nickel layer, chromium layer and gold layer, and the thickness of the coating is 0.1 μm to 20 μm.
CN201611103350.6A 2016-12-05 2016-12-05 A kind of laser index carving method for microelectronic package Pending CN106494107A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108688321A (en) * 2017-04-11 2018-10-23 细美事有限公司 Utilize the printing process of the printing equipment with ink jet head unit

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN200998940Y (en) * 2007-01-08 2008-01-02 李毅 Solar cell laser marking device
US20110088924A1 (en) * 2009-10-16 2011-04-21 Michael Nashner Sub-surface marking of product housings
CN102242334A (en) * 2011-07-06 2011-11-16 中国科学院上海技术物理研究所 Processing method of local laser blackening for coating metalwork
CN102310658A (en) * 2010-06-29 2012-01-11 吴华 Marker for integrated circuit packaged chip

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN200998940Y (en) * 2007-01-08 2008-01-02 李毅 Solar cell laser marking device
US20110088924A1 (en) * 2009-10-16 2011-04-21 Michael Nashner Sub-surface marking of product housings
CN102310658A (en) * 2010-06-29 2012-01-11 吴华 Marker for integrated circuit packaged chip
CN102242334A (en) * 2011-07-06 2011-11-16 中国科学院上海技术物理研究所 Processing method of local laser blackening for coating metalwork

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
于兆勤 等: "《机械制造技术训练(第二版)》", 31 August 2015, 华中科技大学出版社 *
张志勇 等: "《包装机械选用手册》", 31 January 2012, 机械工业出版社 *
强颖怀: "《材料表面工程技术》", 31 May 2016, 中国矿业大学出版社 *
赵巍 等: "激光标刻系统研究综述", 《天津工程师范学院学报》 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108688321A (en) * 2017-04-11 2018-10-23 细美事有限公司 Utilize the printing process of the printing equipment with ink jet head unit

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