CN106336957A - Water-based grinding fluid cleaning agent and preparation method thereof - Google Patents
Water-based grinding fluid cleaning agent and preparation method thereof Download PDFInfo
- Publication number
- CN106336957A CN106336957A CN201610714806.6A CN201610714806A CN106336957A CN 106336957 A CN106336957 A CN 106336957A CN 201610714806 A CN201610714806 A CN 201610714806A CN 106336957 A CN106336957 A CN 106336957A
- Authority
- CN
- China
- Prior art keywords
- water
- lapping liquid
- water base
- base lapping
- grinding fluid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 29
- 238000000227 grinding Methods 0.000 title abstract description 10
- 239000012530 fluid Substances 0.000 title abstract description 9
- 239000012459 cleaning agent Substances 0.000 title abstract description 7
- 238000002360 preparation method Methods 0.000 title description 5
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 239000002270 dispersing agent Substances 0.000 claims abstract description 8
- 239000004094 surface-active agent Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims abstract description 4
- 239000007788 liquid Substances 0.000 claims description 28
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- 238000003756 stirring Methods 0.000 claims description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- 239000002738 chelating agent Substances 0.000 claims description 6
- 238000013329 compounding Methods 0.000 claims description 5
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 claims description 5
- 229940051841 polyoxyethylene ether Drugs 0.000 claims description 5
- 229920000056 polyoxyethylene ether Polymers 0.000 claims description 5
- 229920002125 Sokalan® Polymers 0.000 claims description 4
- 239000004584 polyacrylic acid Substances 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 2
- 239000002253 acid Substances 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 2
- 150000001412 amines Chemical class 0.000 claims 1
- 229920000058 polyacrylate Polymers 0.000 claims 1
- 238000004140 cleaning Methods 0.000 abstract description 9
- 239000012895 dilution Substances 0.000 abstract description 2
- 238000010790 dilution Methods 0.000 abstract description 2
- 239000008139 complexing agent Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- -1 hydrogen Sodium oxide Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 125000005233 alkylalcohol group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005474 detonation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002113 nanodiamond Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/825—Mixtures of compounds all of which are non-ionic
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/044—Hydroxides or bases
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/36—Organic compounds containing phosphorus
- C11D3/364—Organic compounds containing phosphorus containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/36—Organic compounds containing phosphorus
- C11D3/365—Organic compounds containing phosphorus containing carboxyl groups
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3703—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3715—Polyesters or polycarbonates
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3757—(Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions
- C11D3/3765—(Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions in liquid compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Detergent Compositions (AREA)
Abstract
A water-based grinding fluid cleaning agent is characterized by comprising the following raw materials (by weight): 3-10% of strong base, 3-8% of a compound complexing agent, 1-5% of ethanolamine, 1-5% of a dispersant, 3-7% of a compound surfactant and the rest of water. The above raw materials are mixed and stirred in proportion to obtain the water-based grinding fluid cleaning agent. The prepared grinding fluid cleaning agent can effectively remove small particles adhered to the surface of a workpiece during workpiece grinding and has an excellent cleaning effect. Rust-proofing time reaches 1 hour and above. The product is suitable for cleaning of different grinding fluids. As the grinding fluid cleaning agent is water-based, the product is environment friendly and will not cause pollution. Use concentration is as low as 5%. By water-based dilution, the cleaning process is simple and convenient to operate.
Description
Technical field
The invention belongs to abluent technical field, particularly to a kind of water base lapping liquid abluent and preparation method thereof.
Background technology
Lapping liquid can be divided into according to the difference of abrasive material: diamond grinding fluid, Silica abrasive liquid, cerium oxide abrasive liquid
Deng wherein, diamond grinding fluid can be divided into: single-crystal diamond lapping liquid again, polycrystalline diamond lapping liquid, detonation Nano diamond
Lapping liquid.Contain tiny mineral powder in lapping liquid, can remain in process of lapping on metal spring thin slice, its surface contains
Have very tiny nano level powder, using conventional aqueous cleaning agent be difficult to dissolving peel off, even can clean stripping,
The workpiece having cleaned can be made to be easy to get rusty, and the resistant to rust time of the workpiece after production requirement cleaning should be more than 10min,
The beat of production equipment could be met.
Content of the invention
For the problems referred to above, the present invention provides a kind of water base lapping liquid abluent and preparation method thereof, can effectively clean and grind
Molecule residual in grinding fluid, and ensure workpiece will not be caused corrode.
The present invention solves above-mentioned technical problem and be the technical scheme is that a kind of water base lapping liquid abluent, its feature
It is: include the raw material of following percentage by weight
Further, described highly basic is sodium hydroxide or/and potassium hydroxide.
Further, described compounding chelating agent be one of hedp, atmp, edtmpa, papemp, pbtca or two kinds or
Three kinds or four kinds or five kinds.
Further, described ethanolamine is one of monoethanolamine, diethanolamine, triethanolamine or two or three.
Further, described dispersant is poly, poly acrylic acid, poly salt, poly acrylic acid
One of salt or two or three or four kinds.
Further, described compound surfactant is rd 129b, rd127, fatty alcohol-polyoxyethylene ether 3 ether, poly alkyl alcohol
One of oxygen vinyl Ether 9 ether or two or three or four kinds.
A kind of preparation method method of water base lapping liquid abluent it is characterised in that: be proportionally added into 3-8% compound complexation
Agent, 3-10% highly basic and water, stirring 15-20min allows it fully to react, then 1-5% ethanolamine, 1-5% dispersant, 3- successively
7% compound surfactant, stirring 10-15min obtains water base lapping liquid abluent.
It is an advantage of the current invention that: 1, the lapping liquid abluent of present invention configuration can effectively remove when workpiece grinds and be attached to
The molecule on surface, cleaning performance is good, and the rust-proofing time reaches more than 1 hour；
2nd, the abluent of the present invention is aqueous cleaning agent it is adaptable to the cleaning of different lapping liquid, using water base to environment friend
Good, do not result in pollution；
3rd, concentration of the present invention as little as 5%, using aqueous-based dilution, matting is simple, is easy to operate.
Specific embodiment
Below in conjunction with embodiment, technical scheme is clearly and completely described with the reality it is clear that described
Applying example is a part of embodiment of the present invention, rather than whole embodiments.Based on the embodiment in the present invention, the common skill in this area
The every other embodiment that art personnel are obtained under the premise of not making creative work, broadly falls into the model of present invention protection
Enclose.
Embodiment 1:
By 5% compounding chelating agent (hedp:atmp:edtmpa:papemp:pbtca=1:1:1:1:1), 8% highly basic (hydrogen
Sodium oxide) and 78% water, stirring 15-20min allows it fully to react, then 2% diethanolamine, 2% dispersant (poly- Malaysia successively
Acid: poly acrylic acid=1:1), 5% compound surfactant (rd 129b:rd127: fatty alcohol-polyoxyethylene ether 3 ether:
Fatty alcohol-polyoxyethylene ether 9 ethers=1:1:1:1), stirring 10-15min obtains water base lapping liquid abluent.
Embodiment 2
By 5% compounding chelating agent (hedp), 8% highly basic (sodium hydroxide) and 78% water, stirring 15-20min makes it abundant
Reaction, then 2% diethanolamine, 2% dispersant (poly), 5% compound surfactant (rd 129b) successively, stirring
10-15min obtains water base lapping liquid abluent.
Embodiment 3
By 5% compounding chelating agent (hedp:atmp:edtmpa=1:2:1), 8% highly basic (sodium hydroxide) and 78% water, stir
Mixing 15-20min allows it fully to react, then 2% diethanolamine, 2% dispersant (poly salt: poly propylene successively
Hydrochlorate=1:1), 5% compound surfactant (rd 129b:rd127=1:2), to obtain water base lapping liquid clear for stirring 10-15min
Lotion.
Cleaning: 1 60-65 DEG C of bath temperature degree, cleans 3min, drips liquid 30s；2 55-60 DEG C of bath temperature degree, 5% concentration, cleaning
3min；3-50 DEG C of 1-2% of 40 DEG C of bath temperature degree rinsing 3min；4 groove drip liquid dry up；Send down antirust operation.
Cleaning performance, any surface finish noresidue；Antirust 1 day -2 days of energy.
Various embodiments above only in order to technical scheme to be described, is not intended to limit；Although with reference to aforementioned each reality
Apply example the present invention has been described in detail, it will be understood by those within the art that: it still can be to aforementioned each
Technical scheme described in embodiment is modified, or carries out equivalent to wherein some or all of technical characteristic；And
These modifications or replacement, do not make the essence of appropriate technical solution depart from the scope of various embodiments of the present invention technical scheme.
Claims (7)
1. a kind of water base lapping liquid abluent it is characterised in that: include following percentage by weight raw material
2. a kind of water base lapping liquid abluent according to claim 1 it is characterised in that: described highly basic be sodium hydroxide
Or/and potassium hydroxide.
3. a kind of water base lapping liquid abluent according to claim 1 it is characterised in that: described compounding chelating agent is
One of hedp, atmp, edtmpa, papemp, pbtca or two or three or four kinds or five kinds.
4. a kind of water base lapping liquid abluent according to claim 1 it is characterised in that: described ethanolamine be an ethanol
One of amine, diethanolamine, triethanolamine or two or three.
5. a kind of water base lapping liquid abluent according to claim 1 it is characterised in that: described dispersant be poly- Malaysia
Acid, one of poly acrylic acid, poly salt, poly acrylates or two or three or four kinds.
6. a kind of water base lapping liquid abluent according to claim 1 it is characterised in that: described compound surfactant is
One of rd 129b, rd127, fatty alcohol-polyoxyethylene ether 3 ether, fatty alcohol-polyoxyethylene ether 9 ether or two or three or four
Kind.
7. a kind of method of the water base lapping liquid abluent prepared as described in claim 1-6 it is characterised in that: be proportionally added into
3-8% compounds chelating agent, 3-10% highly basic and water, and stirring 15-20min allows it fully to react, then successively 1-5% ethanolamine,
1-5% dispersant, 3-7% compound surfactant, stirring 10-15min obtains water base lapping liquid abluent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610714806.6A CN106336957A (en) | 2016-08-24 | 2016-08-24 | Water-based grinding fluid cleaning agent and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610714806.6A CN106336957A (en) | 2016-08-24 | 2016-08-24 | Water-based grinding fluid cleaning agent and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106336957A true CN106336957A (en) | 2017-01-18 |
Family
ID=57825102
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610714806.6A Pending CN106336957A (en) | 2016-08-24 | 2016-08-24 | Water-based grinding fluid cleaning agent and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106336957A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114085715A (en) * | 2021-11-29 | 2022-02-25 | 厦门普诺尔新材料科技有限公司 | Water-based grinding fluid cleaning agent and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004277659A (en) * | 2003-03-18 | 2004-10-07 | Kao Corp | Method for producing detergent particles |
| CN101400773A (en) * | 2006-03-31 | 2009-04-01 | 花王株式会社 | Cleaning composition |
| CN101979491A (en) * | 2010-11-10 | 2011-02-23 | 南通海迅天恒纳米科技有限公司 | Cleaning agent for glass lens of mobile phone |
| CN102102050A (en) * | 2009-12-22 | 2011-06-22 | 江西凤凰富士能光学有限公司 | Optical element cleaning agent and cleaning method thereof |
| CN104853853A (en) * | 2012-12-05 | 2015-08-19 | 花王株式会社 | Method for cleaning glass substrate |
-
2016
- 2016-08-24 CN CN201610714806.6A patent/CN106336957A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004277659A (en) * | 2003-03-18 | 2004-10-07 | Kao Corp | Method for producing detergent particles |
| CN101400773A (en) * | 2006-03-31 | 2009-04-01 | 花王株式会社 | Cleaning composition |
| CN102102050A (en) * | 2009-12-22 | 2011-06-22 | 江西凤凰富士能光学有限公司 | Optical element cleaning agent and cleaning method thereof |
| CN101979491A (en) * | 2010-11-10 | 2011-02-23 | 南通海迅天恒纳米科技有限公司 | Cleaning agent for glass lens of mobile phone |
| CN104853853A (en) * | 2012-12-05 | 2015-08-19 | 花王株式会社 | Method for cleaning glass substrate |
Non-Patent Citations (1)
| Title |
|---|
| 廖文胜等: "<<宾馆与家用洗涤剂配方设计>>", 31 January 2000, 中国轻工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114085715A (en) * | 2021-11-29 | 2022-02-25 | 厦门普诺尔新材料科技有限公司 | Water-based grinding fluid cleaning agent and preparation method thereof |
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| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: 300000 Tianjin city Xiqing District North Industrial Park Fu Sheng Road No. 13 Applicant after: Tianjin new materials Co., Ltd. Address before: 300000 Tianjin city Xiqing District North Industrial Park Fu Sheng Road No. 13 Applicant before: Tianjin Primetech Chemical Co., Ltd. |
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| CB02 | Change of applicant information | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170118 |
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| RJ01 | Rejection of invention patent application after publication |