CN106298839A - Display device and display floater thereof - Google Patents
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- CN106298839A CN106298839A CN201510297118.XA CN201510297118A CN106298839A CN 106298839 A CN106298839 A CN 106298839A CN 201510297118 A CN201510297118 A CN 201510297118A CN 106298839 A CN106298839 A CN 106298839A
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- chock insulator
- touch pad
- supporting layer
- substrate
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- 239000000463 material Substances 0.000 claims description 12
- 229910010272 inorganic material Inorganic materials 0.000 claims description 5
- 239000011147 inorganic material Substances 0.000 claims description 5
- 239000012811 non-conductive material Substances 0.000 claims description 5
- 239000011368 organic material Substances 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
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- 239000011248 coating agent Substances 0.000 claims description 3
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- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 208000034699 Vitreous floaters Diseases 0.000 claims 11
- 239000004020 conductor Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 48
- 239000000956 alloy Substances 0.000 description 14
- 229910045601 alloy Inorganic materials 0.000 description 14
- 238000000034 method Methods 0.000 description 10
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Abstract
The present invention provides a kind of display device and display floater thereof, and display floater includes: substrate, multiple display elements, is formed on described substrate；Multiple chock insulator matters, are formed on described substrate, and between adjacent described display element, the thickness of described chock insulator matter is more than or equal to the thickness of described display element；Cover plate is relative with described substrate；Multiple touch pads, are formed on described cover plate；Supporting layer, is formed on described touch pad, between described display element and described touch pad, and contacts with at least part of chock insulator matter in the plurality of chock insulator matter；And frit, it is formed between described substrate and described cover plate, the most described frit, described substrate and described cover plate form a sealing space, and the plurality of display element, the plurality of chock insulator matter, the plurality of touch pad and described supporting layer are formed in described sealing space.Display device and display floater thereof that the present invention provides are prevented from noise and produce, and improve panel deformation.
Description
Technical field
The present invention relates to Display Technique field, particularly relate to display device and display floater thereof.
Background technology
In recent years, OLED (Organic Light-Emitting Diode, Organic Light Emitting Diode) technology
Quickly grow, have become as and most possibly substitute LCD (Liquid Crystal Display, liquid crystal display)
Prospect technology.Generally, OLED element at least include anode, negative electrode and be positioned at anode and negative electrode it
Between organic luminous layer.Wherein, in OLED element, organic luminous layer and electrode are highly susceptible to water oxygen
Erosion, thus big senior general reduces the life-span of OLED element, therefore, the encapsulation technology of OLED element
Have become as one of core of present stage research.
At present, the encapsulation of OLED element includes that drying sheet (Getter) pastes the coating of UV glue, face encapsulation
The multiple method such as (Face Seal), frit (Frit) encapsulation, thin-film package.Wherein, frit envelope
Dress is that glass dust adds other raw material furnishing frit, then is coated on substrate by frit, then and
Cover plate para-position, the method for packing finally with laser, frit-sintered hardened.
In frit encapsulation process, during by substrate and cover plate para-position, as it is shown in figure 1, due to frit
140 are coated on substrate 110, and cover plate 130 needs certain pressure can be tight with frit 140
Laminating.Pressure during para-position can cause substrate 110 and cover plate 130 all to produce miniature deformation, and frit
The thickness of 140 only has several microns, so this deformation can cause cover plate 130 to be pressed on display element 120,
Cause the damage of display element 120, affect the performance of display floater.
Further, since the integrated touch technology of display floater being controlled display floater is by all kinds of displays
Device is extensively quoted, and with the display floater main flow the most now of touch controllable function.There is touch controllable function
Display floater as in figure 2 it is shown, be formed with touch pad (sensor pad) 150 on cover plate 130.With
Fig. 1 is similar to, and needs cover plate 130 is applied pressure, easily cause touch pads 150 to be pressed in during due to encapsulation
On display element 120, or cause touch pad 150 the nearest with the electrode distance of display element 120, lead
Cause the generation of interference signal.
Summary of the invention
The defect that the present invention exists to overcome above-mentioned prior art, it is provided that one prevents noise from producing, and
Improve display device and the display floater thereof of panel deformation.
The present invention provides a kind of display floater, including: substrate, multiple display elements, it is formed at described base
On plate；Multiple chock insulator matters, are formed on described substrate, and between adjacent described display element, institute
State the thickness thickness more than or equal to described display element of chock insulator matter；Cover plate is relative with described substrate；Many
Individual touch pad, is formed on described cover plate；Supporting layer, is formed on described touch pad, between described aobvious
Show between element and described touch pad, and contact with at least part of chock insulator matter in the plurality of chock insulator matter；
And frit, it is formed between described substrate and described cover plate, the most described frit, described substrate
A sealing space is formed with described cover plate, and the plurality of display element, the plurality of chock insulator matter, described
Multiple touch pads and described supporting layer are formed in described sealing space.
Preferably, described supporting layer include multiple fid, each described fid be positioned at described chock insulator matter and
Between described touch pad.
Preferably, generally circular in shape, square, the rhombus of each described fid and/or rectangle.
Preferably, described fid correspondence is positioned at immediately below the central authorities of touch pad.
Preferably, described fid correspondence contacts multiple described chock insulator matters.
Preferably, the area of described supporting layer account for described touch pad the gross area more than 1/3rd.
Preferably, the thickness of described supporting layer is
Preferably, the material of described supporting layer is electrically non-conductive material.
Preferably, described electrically non-conductive material is inorganic material, and described inorganic material is silicon oxide or silicon nitride；
Or described electrically non-conductive material is organic material, described organic material is photoresistance.
Preferably, the coating of described supporting layer is formed on described touch pad.
Preferably, described display element includes: TFT element, is formed on described substrate；OLED unit
Part, is formed on described TFT element, and wherein, described OLED element is the OLED of negative electrode outgoing
Element, described supporting layer is between the negative electrode and described touch pad of described OLED element；Or it is described
OLED element is the OLED element of anode outgoing, and described supporting layer is between the sun of described OLED element
Between pole and described touch pad.
The present invention also provides for a kind of display device including above-mentioned display floater.
Compared with prior art, the present invention, by arranging supporting layer between touch pad and display element, props up
Support layer contacts with chock insulator matter (photo spacer) and is supported by chock insulator matter, and then increases touch pad and display
Distance between element upper end electrode, reduces the interference signal produced due to hypotelorism.Further,
Supporting layer coordinates the effect also acting as support with chock insulator matter, prevents cover plate from producing deformation of subsiding due to encapsulation.
Accompanying drawing explanation
Its example embodiment is described in detail, above and other feature of the present invention and excellent by referring to accompanying drawing
Point will be apparent from.
Fig. 1 shows structural representation prior art, display floater.
The structural representation of display floater that Fig. 2 shows prior art, that there is touch controllable function.
Fig. 3 show according to embodiments of the present invention, the structural representation of the display floater with touch controllable function
Figure.
Fig. 4 A shows according to embodiments of the present invention, the display floater with touch controllable function of negative electrode outgoing
Structural representation.
Fig. 4 B shows according to embodiments of the present invention, the display floater with touch controllable function of anode outgoing
Structural representation.
Fig. 5 A and Fig. 5 B shows according to embodiments of the present invention, fid and the schematic diagram of touch pad.
Fig. 6 A to Fig. 6 G according to embodiments of the present invention, there is the manufacturing process of the display floater of touch controllable function
Structural representation.
Wherein, description of reference numerals is as follows:
110,210,210A, 210B, 410 substrates
120,220,420 display element
221A, 221B TFT element
222A, 224B anode
223A, 223B organic function layer
224A, 222B negative electrode
225A, 225B OLED element
130,230,430 cover plate
140,240,440 frit
150,250,350A, 350B, 450 touch pads
260,360A, 360B, 460 chock insulator matters
270,470 supporting layer
470A, 470B fid
Detailed description of the invention
It is described more fully with example embodiment referring now to accompanying drawing.But, example embodiment can
Implement in a variety of forms, and be not understood as limited to embodiment set forth herein；On the contrary, it is provided that this
A little embodiments make the present invention will fully and completely, and the design of example embodiment are passed on all sidedly
To those skilled in the art.The most identical reference represents same or similar structure, thus
Repetition thereof will be omitted.
Described feature, structure or characteristic can be combined in one or more reality in any suitable manner
Execute in mode.In the following description, it is provided that many details thus provide the embodiment party to the present invention
Fully understanding of formula.But, one of ordinary skill in the art would recognize that, do not have in specific detail or
More, or use other method, constituent element, material etc., it is also possible to put into practice technical scheme.
In some cases, known features, material or operation are not shown in detail or describe to avoid obscuring this
Bright.
The accompanying drawing of the present invention is only used for illustrating relative position relation, and the thickness at some position have employed lavishes praise on oneself
Plotting mode is so that understanding, the thickness in accompanying drawing does not represent the proportionate relationship of actual thickness.Herein
The upper and lower relation of each layer comprises directly contact, or upper and lower corresponding relation during non-direct contact.
Fig. 3 illustrates the structural representation of display floater according to embodiments of the present invention.Display floater includes base
Plate 210, multiple display element 220, multiple chock insulator matter 260, cover plate 230, multiple touch pad 250,
Supporting layer 270 and frit 240.Substrate 210 is relative with cover plate 230, and substrate 210 and lid
Plate 230 is preferably face glass.Frit 240 is formed between substrate 210 and cover plate 230, mat
This frit 240, substrate 210 and cover plate 230 form a sealing space, and multiple display element 220,
Multiple chock insulator matters 260, multiple touch pad 250 and supporting layer 270 are formed in this sealing space.
Multiple display elements 220 are formed on substrate 210.Specifically, each display element includes TFT unit
Part and OLED element.TFT element is formed on substrate, and OLED element is formed on TFT element.
According to the illumination mode of OLED element, OLED element has different structures.
In one embodiment, OLED element is the OLED element (Fig. 4 A) of negative electrode outgoing.Negative electrode goes out
OLED element 225A penetrated is included on TFT element 221A the anode 222A, organic sequentially formed
Functional layer 223A and negative electrode 224A.Organic function layer 223A includes the sky arranged on anode successively
Cave implanted layer, hole transmission layer, luminescent layer, electrode transport layer and electron injecting layer.
Specifically, for the OLED element of negative electrode outgoing, anode 222A is total reflection anode, its
For metal or the alloy firm electrode of high reflectance, for example, it may be the alloy electricity of Ag electrode, Ag
Pole, Al electrode, the alloy electrode of Al, Cu electrode, the alloy electrode of Cu, Pt electrode or the conjunction of Pt
Gold electrode etc..Negative electrode 224A is transparency electrode, uses transparent or semitransparent material to make, such as, and can
Be ITO, IZO, AZO, ZTO, Al and alloy firm, Mg and alloy firm thereof, Ag and
Its alloy firm etc..
In another embodiment, OLED element is the OLED element (Fig. 4 B) of anode outgoing.Anode
OLED element 225B of outgoing be included on TFT element 221B sequentially form negative electrode 222B, have
Machine functional layer 223B and negative electrode 224B.Organic function layer 223B includes setting on negative electrode successively
Electron injecting layer, electron transfer layer, luminescent layer, hole transmission layer and hole injection layer.
Specifically, for the OLED element of anode outgoing, negative electrode 222B is total reflection negative electrode, its
For metal or the alloy firm electrode of high reflectance, for example, it may be the alloy electricity of Ag electrode, Ag
Pole, Al electrode, the alloy electrode of Al, Cu electrode, the alloy electrode of Cu, Pt electrode or the conjunction of Pt
Gold electrode etc..Anode 224B is transparency electrode, uses transparent or semitransparent material to make, such as, and can
Be ITO, IZO, AZO, ZTO, Al and alloy firm, Mg and alloy firm thereof, Ag and
Its alloy firm etc..
Multiple chock insulator matters 260 are formed on substrate, and between Adjacent display elements 220.Chock insulator matter
The shape of 260, it is preferable that for round table-like.In certain embodiments, chock insulator matter 260 can be other
Integrated rule or irregularly shaped.In further embodiments, chock insulator matter 260 can also be by
Base and protrusion composition.Base is the most round table-like, and protrusion is preferably hemispherical or semielliptical
Shape.The thickness of chock insulator matter 260 is more than or equal to the thickness of display element 220.
Touch pad 250 is formed on cover plate 230.Touch pad 250 can have a various implementation, such as,
Can be by being arranged in multiple sensor electrodes of cover plate 230 one side to the operation of cover plate 230 another side
Object detects.Cover plate 230 is relative with substrate 210, and makes touch pad 250 and display element 220
Relatively.
Supporting layer 270 is formed on touch pad 250, between display element 220 and touch pad 250,
And contact with at least part of chock insulator matter 260 in multiple chock insulator matters 260.In order to reduce display element 220
Upper end electrode and touch pad 250 between signal disturbing, the material of supporting layer preferably, is not lead
Electric material.In one embodiment, the material of supporting layer is inorganic material, such as silicon oxide or silicon nitride.
In another embodiment, the material of supporting layer is organic material, such as photoresistance.The thickness of supporting layer is preferred
Ground isSupporting layer 270 preferably includes multiple fid.Each fid is positioned at chock insulator matter
Between 260 and touch pad 250.See Fig. 5 A and Fig. 5 B.Each fid 370A (370B) is corresponding
It is positioned at 350A immediately below the central authorities of touch pad (350B), and the multiple chock insulator matter 360A of corresponding contact
(360B).Generally circular in shape, square, the rhombus of fid and/or rectangle.Such as, shown in Fig. 5 A
Circular support material 370A and Fig. 5 B shown in quadrate support material 370B.The gross area of fid accounts for
The area of touch pad 350A (350B) more than 1/3rd, it is preferable that the gross area of fid
Account for the area 1/2nd of touch pad 350A (350B).
Wherein, substrate 210 is encapsulated by frit 240 with cover plate 230, supporting layer 270 and chock insulator matter 260
Contact.Chock insulator matter 260 is to its supporting role of supporting layer 270, chock insulator matter 260 and supporting layer 270 phase
Coordinate, improve the deformation of encapsulation cover plate 230, and then protection display element 220 is injury-free.
Fig. 6 A to Fig. 6 G illustrates the process of the manufacture method of the display floater according to the present invention, specifically,
The manufacture method that the present invention provides comprises the steps:
First, it is provided that substrate 410, it is preferable that a glass substrate is provided.
Substrate 410 is formed display element 420.Specifically, this step is included on substrate 410
Form TFT element, TFT element is formed OLED element.Luminescence side according to OLED element
Formula, OLED element can have different structures.
On substrate 410 formed chock insulator matter 460, chock insulator matter 460 between Adjacent display elements 420,
The thickness of chock insulator matter 460 is more than the thickness of display element 420.Chock insulator matter 460 can use photoetching method shape
Become, such as, use the photoetching production line that a series of lithographic equipment is formed to form chock insulator matter.Specifically,
Coat a layer photoetching glue initially with glue spreader in evaporation surface, then use exposure machine that photoresist is entered
Row exposure, uses developing machine to develop photoresist, uses curing to solidify photoresist,
End form becomes certain thickness and the chock insulator matter of property device.In some change case, it is also possible to use sputtering, sink
The method such as long-pending forms chock insulator matter 460.
There is provided cover plate 430, it is preferable that provide a glass cover-plate.
Cover plate 430 is formed touch pad 450.Preferably, can be formed in the one side of cover plate 430
Multiple sensor electrodes, to detect the object of operation on cover plate 430 another side.
Touch pad 450 is coated with supporting layer 470.Form supporting layer mode and can have multiple, such as:
Spin coating, sputtering, PVD, CVD, high-frequency sputtering, magnetron sputtering, thermal spraying, hot evaporation etc..
Coated glass material 440 on substrate 410.Frit 440 is coated with around display element 420.
Making cover plate 430 relative with substrate 410, chock insulator matter 460 is relative with supporting layer 470.
Use laser to be sintered by frit 440 and then base plate for packaging 410 and cover plate 430, wherein, support
Layer 470 contact chock insulator matter 460.
The present invention may be provided for including that the display device of above-mentioned display floater, this display device can be flat
The display device of plate computer, the display device of mobile device, the display device of desktop computer or above-knee
The display device etc. of type computer.
Compared with prior art, the present invention, by arranging supporting layer between touch pad and display element, props up
Support layer contacts with chock insulator matter and is supported by chock insulator matter, and then increases the electrode of touch pad and display element upper end
Between distance, reduce the interference signal that produces due to hypotelorism.Further, supporting layer with every
Underbed coordinates the effect also acting as support, prevents cover plate from producing deformation of subsiding due to encapsulation.
More than it is particularly shown and described the illustrative embodiments of the present invention.It should be understood that the present invention
It is not limited to disclosed embodiment, is included in scope on the contrary, it is intended to contain
Interior various amendments and equivalent replacement.
Claims (12)
1. a display floater, it is characterised in that including:
Substrate；
Multiple display elements, are formed on described substrate；
Multiple chock insulator matters, are formed on described substrate, and between adjacent described display element, described
The thickness of chock insulator matter is more than or equal to the thickness of described display element；
Cover plate is relative with described substrate；
Multiple touch pads, are formed on described cover plate；
Supporting layer, is formed on described touch pad, between described display element and described touch pad,
And contact with at least part of chock insulator matter in the plurality of chock insulator matter；And
Frit, is formed between described substrate and described cover plate, the most described frit, described substrate
A sealing space is formed with described cover plate, and the plurality of display element, the plurality of chock insulator matter, described
Multiple touch pads and described supporting layer are formed in described sealing space.
2. display floater as claimed in claim 1, it is characterised in that described supporting layer includes multiple
Timbering, each described fid is between described chock insulator matter and described touch pad.
3. display floater as claimed in claim 2, it is characterised in that being shaped as of each described fid
Circular, square, rhombus and/or rectangle.
4. display floater as claimed in claim 2, it is characterised in that described fid correspondence is positioned at institute
State immediately below the central authorities of touch pad.
5. display floater as claimed in claim 2, it is characterised in that the contact of described fid correspondence is many
Individual described chock insulator matter.
6. display floater as claimed in claim 1 or 2, it is characterised in that the area of described supporting layer
Account for described touch pad the gross area more than 1/3rd.
7. display floater as claimed in claim 1, it is characterised in that the thickness of described supporting layer is
8. display floater as claimed in claim 1, it is characterised in that the material of described supporting layer is not
Conductive material.
9. display floater as claimed in claim 8, it is characterised in that
Described electrically non-conductive material is inorganic material, and described inorganic material is silicon oxide or silicon nitride；Or
Described electrically non-conductive material is organic material, and described organic material is photoresistance.
10. display floater as claimed in claim 1, it is characterised in that the coating of described supporting layer is formed
On described touch pad.
11. display floaters as claimed in claim 1, it is characterised in that described display element includes:
TFT element, is formed on described substrate；
OLED element, is formed on described TFT element,
Wherein, described OLED element is the OLED element of negative electrode outgoing, and described supporting layer is between described
Between negative electrode and the described touch pad of OLED element；Or
Described OLED element is the OLED element of anode outgoing, and described supporting layer is between described OLED
Between anode and the described touch pad of element.
12. 1 kinds of display devices, it is characterised in that include showing described in any one of claim 1 to 11
Show panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510297118.XA CN106298839A (en) | 2015-06-03 | 2015-06-03 | Display device and display floater thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510297118.XA CN106298839A (en) | 2015-06-03 | 2015-06-03 | Display device and display floater thereof |
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| Publication Number | Publication Date |
|---|---|
| CN106298839A true CN106298839A (en) | 2017-01-04 |
Family
ID=57655683
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510297118.XA Pending CN106298839A (en) | 2015-06-03 | 2015-06-03 | Display device and display floater thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108520883A (en) * | 2018-04-12 | 2018-09-11 | 武汉华星光电半导体显示技术有限公司 | OLED touch-control display panels and preparation method thereof |
| CN108630110A (en) * | 2018-04-24 | 2018-10-09 | 昆山国显光电有限公司 | Display screen and preparation method thereof, display device |
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| CN112259700A (en) * | 2020-10-23 | 2021-01-22 | 上海天马有机发光显示技术有限公司 | Display panel, display device, and molding method of display panel |
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| WO2020124917A1 (en) * | 2018-12-18 | 2020-06-25 | 武汉华星光电半导体显示技术有限公司 | Display device |
| CN112259700A (en) * | 2020-10-23 | 2021-01-22 | 上海天马有机发光显示技术有限公司 | Display panel, display device, and molding method of display panel |
| CN112259700B (en) * | 2020-10-23 | 2023-01-13 | 武汉天马微电子有限公司 | Display panel, display device and forming method of display panel |
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